JPH0774466A - Manufacture of printed wiring board - Google Patents
Manufacture of printed wiring boardInfo
- Publication number
- JPH0774466A JPH0774466A JP21975193A JP21975193A JPH0774466A JP H0774466 A JPH0774466 A JP H0774466A JP 21975193 A JP21975193 A JP 21975193A JP 21975193 A JP21975193 A JP 21975193A JP H0774466 A JPH0774466 A JP H0774466A
- Authority
- JP
- Japan
- Prior art keywords
- conductor
- synthetic resin
- resin sheet
- wiring board
- printed wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は印刷配線板の製造方法に
係り、特に配線層間を貫通型の導体配線部で接続する構
成を備え、かつ高密度な配線および実装が可能な信頼性
の高い印刷配線板を、工数の低減を図りながら、歩留ま
り良好に製造し得る方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a printed wiring board, and more particularly, it has a structure in which wiring layers are connected by a through-type conductor wiring portion, and high-density wiring and mounting are highly reliable. The present invention relates to a method capable of manufacturing a printed wiring board with a good yield while reducing the number of steps.
【0002】[0002]
【従来の技術】たとえば両面型印刷配線板もしくは多層
型印刷配線板においては、両面導電パターンなどの配線
層間の電気的な接続を、次のようにして行っている。た
とえば両面方印刷配線板の場合は、両面銅箔張り基板の
所定位置に穴明け加工(穿設加工)を施し、穿設した穴
の内壁面を含め、全面に化学メッキ処理を施してから、
電気メッキ処理で厚付けし、穴の内壁面の金属層を厚く
して信頼性を高め、配線層間の電気的な接続を行ってい
る。また、多層印刷配線板の場合は、基板両面に張られ
た銅箔をそれぞれパターニングした後、そのパターニン
グ面上に絶縁シート(たとえばプリプレグ)を介して銅
箔を積層・配置し、加熱加圧により一体化した後、前述
の両面型印刷配線板のときと同様に、穴明け加工および
メッキ処理による配線層間の電気的な接続、表面銅箔に
ついてのパターニングにより多層型印刷配線板を得てい
る。なお、より配線層の多い多層型印刷配線板の場合
は、中間に介挿させる両面型印刷配線板数を増やす方式
で製造できる。2. Description of the Related Art For example, in a double-sided printed wiring board or a multi-layered printed wiring board, electrical connection between wiring layers such as double-sided conductive patterns is made as follows. For example, in the case of a double-sided printed wiring board, perforation processing (perforation processing) is performed at a predetermined position on the double-sided copper foil-clad board, and chemical plating is performed on the entire surface, including the inner wall surface of the perforated hole,
The metal layer on the inner wall surface of the hole is thickened by electroplating to improve reliability and electrically connect the wiring layers. Also, in the case of a multilayer printed wiring board, after patterning the copper foils stretched on both sides of the substrate respectively, stacking and arranging the copper foils on the patterned surfaces via an insulating sheet (eg prepreg), and applying heat and pressure. After the integration, as in the case of the double-sided printed wiring board described above, a multilayer printed wiring board is obtained by electrical connection between wiring layers by punching and plating, and patterning of the surface copper foil. In the case of a multilayer printed wiring board having more wiring layers, it can be manufactured by a method of increasing the number of double-sided printed wiring boards inserted in the middle.
【0003】前記印刷配線板の製造方法において、配線
層間の電気的な接続をメッキ方法によらず行う方法とし
て、両面銅箔張り基板の所定位置に穴明けし、この穴内
に導電性ペーストを印刷法などにより流し込み、穴内に
流し込んだ導電性ペーストの樹脂分を硬化させて、配線
層間を電気的に接続する方法も行われている。In the method of manufacturing a printed wiring board, as a method of electrically connecting wiring layers without using a plating method, a hole is made at a predetermined position on a double-sided copper foil-clad substrate, and a conductive paste is printed in the hole. There is also a method in which the resin component of the conductive paste poured into the holes is cured by a method or the like to electrically connect the wiring layers.
【0004】[0004]
【発明が解決しようとする課題】上記で説明したよう
に、配線層間の電気的な接続にメッキ法を利用する印刷
配線板の製造方法においては、基板に配線層間の電気的
な接続用の穴明け(穿穴)加工、穿設した穴内壁面を含
めたメッキ処理工程などを要し、印刷配線板の製造工程
が冗長であるとともに、工程管理も繁雑であるという欠
点がある。加えて、このメッキ法の場合は、信頼性を考
慮して肉厚化などしたとき、狭ピッチパターン間で短絡
を起し易いという問題もある。一方、配線層間の電気的
な接続用の穴に、導電性ペーストを印刷などにより埋め
込む方法の場合も、前記メッキ法の場合と同様に穴明け
工程を必要とする。しかも、穿設した穴内に、均一(一
様)に導体性ペーストを流し込み埋め込むことが難し
く、電気的な接続の信頼性に問題があった。いずれにし
ても、前記穴明け工程などを要することは、印刷配線板
のコストや歩留まりなどに反映し、低コスト化などへの
要望に対応し得ないという欠点がある。As described above, in a method of manufacturing a printed wiring board that uses a plating method for electrical connection between wiring layers, holes for electrical connection between wiring layers are formed in a substrate. It has the disadvantages that it requires a drilling (drilling) process, a plating process including the inner wall surface of the drilled hole, the manufacturing process of the printed wiring board is redundant, and the process control is complicated. In addition, in the case of this plating method, when the thickness is increased in consideration of reliability, there is a problem that a short circuit easily occurs between the narrow pitch patterns. On the other hand, the method of embedding a conductive paste in the holes for electrical connection between the wiring layers by printing or the like also requires a drilling step as in the case of the plating method. Moreover, it is difficult to evenly (uniformly) pour and embed the conductive paste into the bored holes, and there is a problem in reliability of electrical connection. In any case, the need for the perforating step is reflected in the cost and yield of the printed wiring board, and there is a drawback that it cannot meet the demand for cost reduction.
【0005】また、前記配線層間の電気的な接続構成の
場合は、印刷配線板の表裏面に、配線層間接続用の導電
体穴が設置されているため、その導電体穴の領域に配線
を形成・配置し得ないし、さらに電子部品を搭載するこ
ともできないので、配線密度の向上が制約されるととも
に、電子部品の実装密度向上も阻害されるという問題が
ある。つまり、従来の製造方法によって得られる印刷配
線板は、高密度配線や高密度実装による回路装置のコン
パクト化、ひいては電子機器類の小形化などの要望に、
十分応え得るものといえず、前記コスト面を含め、実用
的により有効な印刷配線板の製造方法が望まれている。Further, in the case of the electrical connection configuration between the wiring layers, since the conductor holes for connecting the wiring layers are provided on the front and back surfaces of the printed wiring board, the wiring is provided in the region of the conductor holes. Since it cannot be formed / arranged and an electronic component cannot be mounted, there is a problem that the improvement of the wiring density is restricted and the improvement of the mounting density of the electronic component is hindered. In other words, the printed wiring board obtained by the conventional manufacturing method is required to reduce the size of circuit devices by high-density wiring and high-density mounting, and thus the size of electronic devices.
There is a demand for a more practically effective method for producing a printed wiring board, which cannot be said to be sufficiently satisfactory, including the aforementioned cost aspect.
【0006】本発明は上記事情に対処してなされたもの
で、簡易なプロセスで、より高密度の配線および実装が
可能で、信頼性の高い印刷配線板を歩留まりよく製造し
得る方法の提供を目的とする。The present invention has been made in view of the above circumstances, and provides a method capable of manufacturing a highly reliable printed wiring board with a high yield, which enables wiring and mounting at a higher density by a simple process. To aim.
【0007】[0007]
【課題を解決するための手段】本発明に係る第1の印刷
配線板の製造方法は、所定位置に導体バンプ群を互いに
対応させて形設した支持基体の導体バンプ群形成面間
に、合成樹脂系シートを介在させ積層配置する工程と、
前記積層体を加熱して合成樹脂系シートの樹脂分のガラ
ス転移温度ないし可塑化温度で積層体を加圧し、各導体
バンプを合成樹脂系シートの厚さ方向にそれぞれ挿入さ
せて、前記互いに対応する導体バンプの先端部を塑性変
形により接続し、貫通型の導体配線部を形成する工程と
を具備して成ることを特徴とする。According to a first method of manufacturing a printed wiring board of the present invention, a conductor bump group is formed between corresponding surfaces of a supporting substrate having conductor bump groups formed at predetermined positions so as to correspond to each other. A step of stacking and placing a resin sheet,
The laminated body is heated to press the laminated body at the glass transition temperature or the plasticizing temperature of the resin component of the synthetic resin sheet, and the conductor bumps are respectively inserted in the thickness direction of the synthetic resin sheet to correspond to each other. Connecting the tip end portions of the conductor bumps by plastic deformation to form a through-type conductor wiring portion.
【0008】また、本発明に係る第2の印刷配線板の製
造方法は、少なくとも所定位置の一部においては接続用
半田層を下地層として設けられた導体バンプ群を互いに
対応させて形設した支持基体の導体バンプ群形成面間
に、合成樹脂系シートを介在させ積層配置する工程と、
前記積層体を加熱して合成樹脂系シートの樹脂分のガラ
ス転移温度ないし可塑化温度で積層体を加圧し、各導体
バンプを合成樹脂系シートの厚さ方向にそれぞれ挿入さ
せて、前記互いに対応する導体バンプの先端部を塑性変
形により接続し、貫通型の導体配線部を形成する工程と
を具備して成ることを特徴とするさらに、本発明に係る
第3の印刷配線板の製造方法は、所定位置に導体バンプ
群を互いに対応させて形設した導電性金属箔の導体バン
プ群形成面間に、合成樹脂系シートを介在させ積層配置
する工程と、前記積層体を加熱して合成樹脂系シートの
樹脂分のガラス転移温度ないし可塑化温度で積層体を加
圧し、各導体バンプを合成樹脂系シートの厚さ方向にそ
れぞれ挿入させ、前記互いに対応する導体バンプの先端
部を塑性変形により接続して、貫通型の導体配線部を形
成する工程と、前記貫通型の導体配線部を形成した積層
体の導電性金属箔に、エッチング処理を施して、前記貫
通型の導体配線部に接続する配線パターンを形成する工
程とを具備して成ることを特徴とする。Further, in the second method for manufacturing a printed wiring board according to the present invention, at least at a part of a predetermined position, the conductor bump groups provided with the connecting solder layer as the underlying layer are formed corresponding to each other. A step of laminating and placing a synthetic resin sheet between the surfaces of the support base on which the conductor bump group is formed,
The laminated body is heated to press the laminated body at the glass transition temperature or the plasticizing temperature of the resin component of the synthetic resin sheet, and the conductor bumps are respectively inserted in the thickness direction of the synthetic resin sheet to correspond to each other. And a step of forming a through-type conductor wiring portion by connecting the tip end portions of the conductor bumps by plastic deformation. Further, the third printed wiring board manufacturing method according to the present invention is , A step of laminating a synthetic resin sheet between the conductor bump group formation surfaces of a conductive metal foil formed by correspondingly forming conductor bump groups at predetermined positions, and heating the laminate to produce a synthetic resin The laminated body is pressed at the glass transition temperature or plasticization temperature of the resin component of the system sheet, each conductor bump is inserted in the thickness direction of the synthetic resin system sheet, and the tips of the corresponding conductor bumps undergo plastic deformation. Yo The step of connecting and forming a through-type conductor wiring part, and performing an etching process on the conductive metal foil of the laminate in which the through-type conductor wiring part is formed, and connecting to the through-type conductor wiring part And a step of forming a wiring pattern.
【0009】本発明において、導体バンプ群を形設した
支持基体としては、たとえば剥離性の良好な合成樹脂シ
ート類,もしくは導電性シート(箔)などが挙げられ、
この支持基体は1枚のシートであってもよいし、パター
ン化されたものでもよく、その形状はとくに限定されな
い。また、貫挿した導体配線部の利用は、露出端面を部
品の接続端子として、あるいは導電性ペーストの印刷や
選択的なメッキなどにより形成する配線パターン間の接
続などが挙げられる。さらに、支持基体を予めパターン
化しておいた場合は、導体バンプ群を一方の主面だけで
なく、両主面にそれぞれ形設したものを用い、多層的に
貫挿した導体配線部を形成する構成を採ってもよい。In the present invention, examples of the support substrate on which the conductor bump group is formed include synthetic resin sheets having good peelability, conductive sheets (foil), and the like.
This supporting substrate may be a single sheet or may be patterned, and its shape is not particularly limited. Further, the use of the inserted conductor wiring portion may be, for example, connecting the exposed end surface as a connection terminal of a component or between wiring patterns formed by printing a conductive paste or selective plating. Further, in the case where the supporting base is patterned in advance, the conductor wiring group is formed not only on one main surface but also on both main surfaces to form a conductor wiring portion which is multi-layeredly inserted. You may take a structure.
【0010】本発明において、導体バンプ(導体バンプ
群)は、たとえば銀,金,銅,半田粉などの導電性粉
末、これらの合金粉末もしくは複合(混合)金属粉末
と、たとえばポリカーボネート樹脂,ポリスルホン樹
脂,ポリエステル樹脂,フェノキシ樹脂,フェノール樹
脂,ポリイミド樹脂などのバインダー成分とを混合して
調製された導電性組成物、あるいは導電性金属などで構
成される。そして、前記バンプ群の形設は、導電性組成
物で形成する場合、たとえば比較的厚いメタルマスクを
用いた印刷法により、アスペクト比の高い導電性バンプ
を形成でき、その導電性バンプ群の高さは一般的に、 1
00〜 400μm 程度が望ましい。さらに、導電性バンプ群
の下地層として半田層を設置しておくと、対応する導電
性バンプ同士の先端部の接合で構成される貫挿型導体配
線部の露出面が、予め半田層を備えた形態を採ることに
なるので、半田コーティングなど省略できる。そして、
このような構成は、半田パッドのピッチが小さい配線板
の形成において、半田パッド間の短絡など容易に回避し
得ることから有効な手段といえる。In the present invention, the conductor bumps (group of conductor bumps) are made of, for example, conductive powder such as silver, gold, copper, solder powder, alloy powder or composite (mixed) metal powder of these, and polycarbonate resin, polysulfone resin, for example. , A conductive composition prepared by mixing with a binder component such as polyester resin, phenoxy resin, phenol resin, polyimide resin, or a conductive metal. When the bump group is formed of a conductive composition, a conductive bump having a high aspect ratio can be formed by, for example, a printing method using a relatively thick metal mask. Is generally 1
00 to 400 μm is desirable. Furthermore, if a solder layer is provided as a base layer for the conductive bump group, the exposed surface of the insertion-type conductor wiring portion formed by joining the tips of the corresponding conductive bumps is provided with the solder layer in advance. Since it takes a different form, solder coating and the like can be omitted. And
Such a configuration can be said to be an effective means because it is possible to easily avoid a short circuit between solder pads when forming a wiring board having a small pitch of solder pads.
【0011】一方、導電性金属でバンプ群を形成する手
段としては、 (a)ある程度形状もしくは寸法が一定な微
小金属魂を、粘着剤層を予め設けておいた支持基体面に
散布し、選択的に固着させるか(このときマスクを配置
して行ってもよい)、 (b)銅箔などを支持基体とした場
合は、メッキレジストを印刷・パターニングして、銅,
錫,金,銀,半田などメッキして選択的に微小な金属柱
(バンプ)群の形成、(c)支持基体面に半田レジストの
塗布・パターニングして、半田浴に浸漬して選択的に微
小な金属柱(バンプ)群の形成などが挙げられる。ここ
で、バンプに相当する微小金属魂ない微小な金属柱は、
異種金属を組合わせて成る多層構造、多層シェル構造で
もよい。たとえば銅を芯にし表面を金や銀の層で被覆し
て耐酸化性を付与したり、銅を芯にし表面を半田層被覆
して半田接合性をもたせたりしてもよい。なお、本発明
において、バンプ群を導電性組成物で形成する場合は、
メッキ法などの手段で行う場合に較べて、さらに工程な
ど簡略化し得るので、低コスト化の点で有効である。On the other hand, as means for forming a bump group with a conductive metal, (a) fine metal particles having a certain shape or size are dispersed on a surface of a supporting substrate provided with an adhesive layer in advance, and selected. Or (b) if copper foil or the like is used as the supporting substrate, the plating resist is printed and patterned to form copper,
Tin, gold, silver, solder, etc. are plated to selectively form minute metal pillars (bumps), (c) Solder resist is applied / patterned on the supporting substrate surface, and then immersed in a solder bath to selectively For example, formation of minute metal pillars (bumps) can be mentioned. Here, a small metal pillar without a small metal soul corresponding to a bump is
A multi-layer structure or a multi-layer shell structure formed by combining different metals may be used. For example, copper may be used as a core and the surface may be coated with a gold or silver layer to impart oxidation resistance, or copper may be used as a core and the surface may be coated with a solder layer so as to have solder bondability. In the present invention, when the bump group is formed of a conductive composition,
Compared with the case of using a plating method or the like, the process can be further simplified, which is effective in terms of cost reduction.
【0012】本発明において、前記導体バンプ群が貫挿
され、貫通型の導体配線部を形成する合成樹脂系シート
としては、たとえば熱可塑性樹脂フイルム(シート)が
挙げられ、またその厚さは導体バンプの高さにより決ま
る。つまり、互いに対向配置される導体バンプの先端部
が塑性変形して十分な電気的な接続を構成する必要があ
るので、前記対を成す導体バンプの高さの和より薄く選
択・設定され、一般的に50〜 800μm 程度が好ましい。
ここで、熱可塑性樹脂シートとしては、たとえばポリカ
ーボネート樹脂,ポリスルホン樹脂,熱可塑性ポリイミ
ド樹脂,4フッ化ポリエチレン樹脂,6フッ化ポリプロ
ピレン樹脂,ポリエーテルエーテルケトン樹脂などのシ
ート類が挙げられる。また、硬化前状態に保持される熱
硬化性樹脂シートとしては、エポキシ樹脂,ビスマレイ
ミドトリアジン樹脂,ポリイミド樹脂,フェノール樹
脂,ポリエステル樹脂,メラミン樹脂,あるいはブタジ
ェンゴム,ブチルゴム,天然ゴム,ネオプレンゴム,シ
リコーンゴムなどの生ゴムのシート類が挙げられる。こ
れら合成樹脂は、単独でもよいが絶縁性無機物や有機物
系の充填物を含有してもよく、さらにガラスクロスやマ
ット、有機合成繊維布やマット、あるいは紙などの補強
材と組み合わせて成るシートであってもよい。さらに、
本発明において、バンプ群を形設した支持基体などの主
面に、合成樹脂系シート主面を対接させて積層配置して
成る積層体を加熱・加圧するとき、合成樹脂系シートを
載置する基台(当て板)としては、寸法や変形の少ない
金属板もしくは耐熱性樹脂板、たとえばステンレス板,
真鍮板、ポリイミド樹脂板(シート),ポリテトラフロ
ロエチレン樹脂板(シート)などが使用される。また、
この積層一体化にあたり、被一体化積層体のと被加圧面
にたとえばゴム層などの弾性体層を介在させておくと、
合成樹脂系シートにおける導体バンプの挿入がよりスム
ースに行われ、対応する先端部の塑性変形による接続の
信頼性も向上する。In the present invention, a thermoplastic resin film (sheet), for example, may be mentioned as a synthetic resin sheet for forming the through-hole type conductor wiring portion through which the conductor bump group is inserted, and the thickness thereof is a conductor. Determined by bump height. In other words, since the tips of the conductor bumps arranged to face each other need to be plastically deformed to form a sufficient electrical connection, they are selected and set thinner than the sum of the heights of the conductor bumps forming the pair. It is preferably about 50 to 800 μm.
Here, examples of the thermoplastic resin sheet include sheets of polycarbonate resin, polysulfone resin, thermoplastic polyimide resin, tetrafluoropolyethylene resin, hexafluoropolypropylene resin, polyetheretherketone resin, and the like. Further, as the thermosetting resin sheet to be kept in the pre-curing state, epoxy resin, bismaleimide triazine resin, polyimide resin, phenol resin, polyester resin, melamine resin, or butadiene rubber, butyl rubber, natural rubber, neoprene rubber, silicone rubber Sheets of raw rubber such as. These synthetic resins may be used alone or may contain an insulating inorganic or organic filler, and are a sheet formed by combining with a reinforcing material such as glass cloth or mat, organic synthetic fiber cloth or mat, or paper. It may be. further,
In the present invention, when a laminated body formed by stacking the synthetic resin sheet main surfaces in contact with each other on the main surface of a support base having a bump group formed thereon is heated and pressed, the synthetic resin sheet is placed. As a base (abutting plate) to be used, a metal plate or a heat-resistant resin plate with a small size or deformation, such as a stainless plate,
A brass plate, a polyimide resin plate (sheet), a polytetrafluoroethylene resin plate (sheet), etc. are used. Also,
In this laminated integration, if an elastic layer such as a rubber layer is interposed between the integrated body and the surface to be pressed,
The conductor bumps are more smoothly inserted into the synthetic resin sheet, and the reliability of the connection due to the plastic deformation of the corresponding tip portion is also improved.
【0013】[0013]
【作用】本発明に係る印刷配線板の製造方法によれば、
配線層間を電気的に接続する層間の導体配線部は、いわ
ゆる積層一体化する工程での加熱・加圧により、層間絶
縁層を成す合成樹脂系シートの軟化ないし可塑状態化
と、支持基体面の導体バンプ群の圧入とによって、確実
に信頼性の高い導体バンプ間、さらには配線層間の電気
的な接続が達成される。つまり、プロセスの簡易化を図
りながら、微細な配線パターン層間などを任意な位置
(箇所)で、高精度にかつ信頼性の高い電気的な接続を
形成し得るので、配線密度の高い印刷配線板を低コスト
で製造することが可能となる。また、前記配線パターン
層間などの電気的な接続に当たり、接続穴の形設も不要
となるので、その分、高密度配線および高密度実装の可
能な印刷配線板が得られることになる。According to the method of manufacturing a printed wiring board according to the present invention,
The conductor wiring portion between the layers for electrically connecting the wiring layers is softened or plasticized in the synthetic resin sheet forming the interlayer insulating layer by heating and pressurizing in the so-called laminated integration process, and the supporting substrate surface is By press-fitting the conductor bump group, reliable electrical connection between the conductor bumps and even between the wiring layers can be reliably achieved. In other words, while simplifying the process, it is possible to form a highly accurate and reliable electrical connection at an arbitrary position (location) between fine wiring pattern layers, etc., so that a printed wiring board with a high wiring density can be formed. Can be manufactured at low cost. In addition, since it is not necessary to form a connection hole when electrically connecting the wiring pattern layers, a printed wiring board capable of high-density wiring and high-density mounting can be obtained.
【0014】[0014]
【実施例】以下図1 (a), (b), (c)、図2 (a),
(b), (c)、図3 (a), (b), (c)をそれぞれ参照して
本発明の実施例を説明する。EXAMPLES Examples 1 (a), 1 (b), 1 (c), 2 (a),
Embodiments of the present invention will be described with reference to (b), (c) and FIGS. 3 (a), (b), (c), respectively.
【0015】実施例1 図1 (a), (b), (c)は本実施例の実施態様を模式的に
示したものである。Example 1 FIGS. 1 (a), 1 (b) and 1 (c) schematically show an embodiment of this example.
【0016】先ず、厚さ50μm のポリイミド樹脂フィル
ム(商品名,カプトンフィルム,製造元:東レKK)を
支持基体シート1として、ポリマータイプの銀系の導電
性ペースト(商品名,熱硬化性導電性ペーストDW-250H-
5 ,製造元:東洋紡績KK)として、また板厚の 300μ
m のステンレス板の所定箇所に 0.3〜 0.4mm径の穴を明
けたメタルマスクを用意した。そして、前記ポリイミド
樹脂フィルム1面に、前記メタルマスクを位置決め配置
して導電性ペーストを印刷し、この印刷された導電性ペ
ーストが乾燥後、同一マスクを用い同一位置に再度印刷
する方法で3回印刷を繰り返し、高さ 200〜 350μm 程
度の山形のパンブ2を形成(形設)した。図1 (a)は、
こうして形設された導電性バンプ2の形状を側面的に示
したものである。First, a 50 μm thick polyimide resin film (trade name, Kapton film, manufacturer: Toray KK) is used as a supporting substrate sheet 1, and a polymer type silver-based conductive paste (trade name, thermosetting conductive paste) is used. DW-250H-
5 、 Manufacturer: Toyobo KK), also with a plate thickness of 300μ
A metal mask having a hole of 0.3 to 0.4 mm in diameter was prepared at a predetermined position of a stainless steel plate of m. Then, the metal mask is positioned and arranged on the surface of the polyimide resin film to print a conductive paste, and after the printed conductive paste is dried, it is printed again at the same position using the same mask three times. The printing was repeated to form (form) a chevron-shaped pumb 2 having a height of about 200 to 350 μm. Figure 1 (a) shows
The shape of the conductive bump 2 thus formed is shown in a side view.
【0017】一方、厚さ 100μm のポリエーテルイミド
樹脂フィルム(商品名,スミライトFS-1400,製造元:
住友ベークライトKK)を合成樹脂シート3として用意
し、図1 (b)に断面的に示すごとく、前記導電性パンブ
2群を形成(形設)した支持基体シート1、合成樹脂シ
ート3、同じく導電性パンブ2群を形成(形設)した支
持基体シート1を、前記導電性のバンプ2を互いに対向
させて位置決め配置し、積層体化した。その後、前記積
層体化した支持シート1面に、この支持シート1と同一
種類のポリイミド樹脂フィルムやアルミ箔などを当て板
4として積層・配置し、 120℃に保持した熱プレスの熱
板の間に配置し(図示せず)、合成樹脂シート3のガラ
ス点移転以上の温度、好ましくは熱可塑化した状態のと
き、樹脂圧として 1 MPaで加圧しそのまま冷却後取りだ
し、表裏のシート1,4を剥離したところ、図1 (c)に
断面的に示すごとく、前記対向する各導電性のバンプ2
が、合成樹脂シート3中にに圧入し、図1 (b)に側面的
に示すごとく、互いに対向する導電性バンプ2同士が、
その先端部が対接するとともに塑性変形し電気的な接続
を成して、合成樹脂シート3の厚さ方向に貫通する導体
配線部5を備えた印刷配線板が得られた。前記形成した
貫通型の導体配線部5について、テスターで各導体配線
部5を表裏面から導通テストしたところ、全数が0.01Ω
以下の抵抗であった。On the other hand, a 100 μm thick polyetherimide resin film (trade name, Sumilite FS-1400, manufacturer:
Sumitomo Bakelite KK) is prepared as a synthetic resin sheet 3, and as shown in a sectional view in FIG. 1 (b), the supporting substrate sheet 1 on which the conductive bumps 2 group is formed (formed), the synthetic resin sheet 3, and the conductive sheet The supporting substrate sheet 1 on which the groups of the sex bumps 2 are formed (formed) is positioned and arranged so that the conductive bumps 2 face each other, and laminated. After that, on the surface of the laminated support sheet 1, a polyimide resin film or aluminum foil of the same type as the support sheet 1 is laminated and arranged as a backing plate 4, and is arranged between hot plates of a hot press kept at 120 ° C. (Not shown), when the temperature is higher than the glass point transfer of the synthetic resin sheet 3, preferably in a thermoplasticized state, the resin pressure is 1 MPa and the sheet is cooled and taken out, and the front and back sheets 1 and 4 are peeled off. Then, as shown in a sectional view in FIG. 1C, the conductive bumps 2 facing each other are formed.
Is pressed into the synthetic resin sheet 3, and the conductive bumps 2 facing each other are, as shown in a side view in FIG. 1 (b),
A printed wiring board provided with a conductor wiring portion 5 that penetrates in the thickness direction of the synthetic resin sheet 3 by making its tip end contact with each other and plastically deforming to make an electrical connection was obtained. With respect to the through-type conductor wiring portions 5 formed as described above, a continuity test was conducted on each conductor wiring portion 5 from the front and back surfaces with a tester.
It was the following resistance.
【0018】実施例2 図2 (a), (b), (c)は本実施例の実施態様を模式的に
示したものである。Example 2 FIGS. 2 (a), 2 (b) and 2 (c) schematically show an embodiment of this example.
【0019】先ず、厚さ50μm のポリイミド樹脂フィル
ム(商品名,カプトンフィルム,製造元:東レKK)を
支持基体シート1として、ポリマータイプの銀系の導電
性ペースト(商品名,熱硬化性導電性ペーストDW-250H-
5 ,製造元:東洋紡績KK)として、また板厚の 200μ
m のステンレス板の所定箇所に 0.4mm径、もしくは 0.3
mm径の穴を明けた2枚のメタルマスクを用意した。そし
て、前記ポリイミド樹脂フィルム1面に、前記 0.4mm径
の穴明したメタルマスクを位置決め配置し、接続用導体
層として半田ペーストを印刷して微細な島状の半田層6
を選択的に被着・形成した。次いで、前記半田層6を被
着・形成した面に、前記 0.3mm径の穴明したメタルマス
クを位置決め配置し、導電性ペーストを印刷して、この
印刷された導電性ペーストが乾燥後、同一マスクを用い
同一位置に再度印刷する方法で3回印刷を繰り返し、前
記半田層6の上に高さ 200〜 350μm 程度の山形のパン
ブ2を形成(形設)した。図2 (a)は、こうして形設さ
れた半田層6および導電性バンプ2の形状を側面的に示
したものである。First, a polymer type silver-based conductive paste (trade name, thermosetting conductive paste) is used as a supporting substrate sheet 1 using a polyimide resin film (trade name, Kapton film, manufactured by Toray KK) having a thickness of 50 μm. DW-250H-
5 、 Manufacturer: Toyobo Co., Ltd.), and the thickness of 200μ
0.4 mm diameter or 0.3
Two metal masks with holes of mm diameter were prepared. The 0.4 mm diameter perforated metal mask is positioned and arranged on the surface of the polyimide resin film 1, and a solder paste is printed as a conductor layer for connection to form a fine island-shaped solder layer 6
Was selectively deposited and formed. Then, the perforated metal mask having a diameter of 0.3 mm is positioned and arranged on the surface on which the solder layer 6 is adhered and formed, and a conductive paste is printed, and the printed conductive paste is dried and then the same. Printing was repeated three times by a method of printing again at the same position using a mask, to form (form) a chevron-shaped hump 2 having a height of about 200 to 350 μm on the solder layer 6. FIG. 2A is a side view showing the shapes of the solder layer 6 and the conductive bump 2 thus formed.
【0020】一方、厚さ 100μm のポリエーテルイミド
樹脂フィルム(商品名,スミライトFS-1400,製造元:
住友ベークライトKK)を合成樹脂シート3として用意
し、図2 (b)に断面的に示すごとく、前記導電性パンブ
2群を形成(形設)した支持基体シート1、合成樹脂シ
ート3、同じく導電性パンブ2群を形成(形設)した支
持基体シート1を、前記導電性バンプ2を互いに対向さ
せて位置決め配置し、積層体化した。その後、前記積層
体化した支持シート1面に、この支持シート1と同一種
類のポリイミド樹脂フィルムやアルミ箔などを当て板4
として積層・配置し、 120℃に保持した熱プレスの熱板
の間に配置し(図示せず)、合成樹脂シート3のガラス
点移転以上の温度、好ましくは熱可塑化した状態のと
き、樹脂圧として 1 MPaで加圧しそのまま冷却後取りだ
し、表裏のシート1,4を剥離したところ、図2 (c)に
断面的に示すごとく、前記対向する各導電性のバンプ2
が、合成樹脂シート3中にに圧入し、互いに対向する導
電性バンプ2同士が、その先端部が対接するとともに塑
性変形し電気的な接続を成して、合成樹脂シート3の厚
さ方向に貫通する導体配線部5を備えるとともに、導体
配線部5の端面部に、半田付け可能な半田層6を備えた
印刷配線板が得られた。On the other hand, a 100 μm thick polyetherimide resin film (trade name, Sumilite FS-1400, manufacturer:
Sumitomo Bakelite KK) is prepared as a synthetic resin sheet 3, and as shown in a sectional view in FIG. 2 (b), a support substrate sheet 1 on which the conductive bumps 2 group is formed (formed), a synthetic resin sheet 3, and a conductive resin sheet The supporting substrate sheet 1 on which the groups of the conductive bumps 2 were formed (formed) was positioned and arranged with the conductive bumps 2 facing each other, and laminated. Thereafter, a polyimide resin film, aluminum foil, or the like of the same type as the supporting sheet 1 is applied to the surface of the supporting sheet 1 which has been made into a laminated body, with a backing plate 4
As a resin pressure when the synthetic resin sheet 3 has a glass point transfer temperature or higher, preferably in a thermoplasticized state. After pressurizing at 1 MPa and cooling as it was, it was taken out, and the front and back sheets 1 and 4 were peeled off. As shown in a sectional view in FIG.
However, the conductive bumps 2 press-fitted into the synthetic resin sheet 3 and the conductive bumps 2 facing each other are plastically deformed and electrically connected to each other at the tips of the conductive bumps 2 in contact with each other in the thickness direction of the synthetic resin sheet 3. A printed wiring board having the conductor wiring portion 5 penetrating therethrough and having the solderable solder layer 6 on the end surface portion of the conductor wiring portion 5 was obtained.
【0021】なお、上記において、半田層6被着形成は
印刷法によらず、選択的なメッキ法などによって行って
もよいし、さらに半田層6の被着形成は、導電性パンブ
2群に対して、全体的対応していなくともよい。また、
半田層6と導電性バンプ2との間に、たとえばメッキ法
によって銅層などを介在させておくと、半田付け作業な
どし易くなる。In the above description, the solder layer 6 may be formed by a selective plating method instead of the printing method. Further, the solder layer 6 may be formed by applying the conductive bumps 2 to the second group. On the other hand, it is not necessary to deal with it as a whole. Also,
If a copper layer or the like is interposed between the solder layer 6 and the conductive bump 2 by, for example, a plating method, soldering work or the like becomes easy.
【0022】実施例3 図3〜図6は本実施例の実施態様を模式的に示す断面図
である。本実施例は、上記実施例1の場合において、支
持基体シート1としてポリイミド樹脂フイルムの代わり
に、通常、印刷配線板の製造に使用されている厚さ35μ
m の電解銅箔1′を用いた以外は、実施例1の場合と同
様に、図3に示すごとく、積層配置して、 120℃に保持
した熱プレスの熱板の間に配置し(図示せず)、合成樹
脂シート3のガラス点移転以上の温度、好ましくは熱可
塑化した状態のとき、樹脂圧として 1 MPaで加圧しその
まま冷却後取りだし、表裏シート4を剥離したところ、
前記対向する各導電性のバンプ2が、合成樹脂シート3
中にに圧入し、図4に側面的に示すごとく、互いに対向
する導電性バンプ2同士が、その先端部が対接するとと
もに塑性変形し電気的な接続を成して、合成樹脂シート
3の厚さ方向に貫通し、両銅箔1′間を接続する導体配
線部5を有する両面銅張板を作成した。Embodiment 3 FIGS. 3 to 6 are sectional views schematically showing an embodiment of this embodiment. In this example, instead of the polyimide resin film as the supporting base sheet 1 in the case of the above example 1, a thickness of 35 μm which is usually used for manufacturing a printed wiring board is used.
As in the case of Example 1 except that the electrolytic copper foil 1'of m was used, the layers were stacked as shown in FIG. 3 and placed between hot plates of a hot press maintained at 120 ° C. (not shown). ), When the temperature is higher than the glass point transfer of the synthetic resin sheet 3, preferably in a thermoplasticized state, the resin pressure is 1 MPa and the sheet is cooled and then taken out.
The conductive bumps 2 facing each other are formed by the synthetic resin sheet 3
As shown in a side view in FIG. 4, the conductive bumps 2 facing each other press-fit into the inside thereof, and the tips of the conductive bumps 2 are in contact with each other and are plastically deformed to form an electrical connection. A double-sided copper clad plate having a conductor wiring portion 5 penetrating in the vertical direction and connecting between both copper foils 1'was produced.
【0023】前記作成した両面銅張板の両面に、通常の
エッチングレジストインク(商品名,PSR-4000 H,製造
元:太陽インキKK)をスクリーン印刷し、導体パター
ン部をマスクしてから、塩化第2銅をエッチング液とし
てエッチング処理後、レジストマスク剥離して、両面パ
ターン間が導体配線部5で電気的に接続した印刷配線板
を得た。こうして製造した両面型印刷配線板について、
通常実施されている電気チェックを行ったところ、全て
の接続に不良ないし信頼性などの問題が認められず、全
数とも7mΩ以下の抵抗値であった。A normal etching resist ink (trade name, PSR-4000 H, manufacturer: Taiyo Ink KK) was screen-printed on both sides of the double-sided copper clad plate prepared above, and the conductive pattern portion was masked, followed by chlorination. After etching with 2 copper as an etching solution, the resist mask was peeled off to obtain a printed wiring board in which the double-sided patterns were electrically connected by the conductor wiring portion 5. Regarding the double-sided printed wiring board manufactured in this way,
When the electrical check that was usually performed was performed, no problems such as defects or reliability were found in all connections, and all had a resistance value of 7 mΩ or less.
【0024】なお、上記製造工程において、図5に断面
的に示すごとく、両面にそれぞれ所要の配線パターンが
形成され、かつ所定位置で両面配線パターンが導電性バ
ンプ2にて接続された両面型印刷配線板7の両側に、合
成樹脂シート3を介して、前記両面型印刷配線板7の導
体配線部5に対応した導電性バンプ2および接続用導体
層8が設けられたポリイミド樹脂フイルム(支持基体シ
ート)1″、当て板4を位置決め・積層し、加熱・加圧
成型後、ポリイミド樹脂フイルム1″を剥離した。図6
はこのようにして製造した多層化され、かつ接続用導体
層8が合成樹脂シート3層に圧入されて表面が平坦化し
た多層印刷配線板が得られた。In the above manufacturing process, double-sided printing in which required wiring patterns are formed on both sides and the double-sided wiring patterns are connected by conductive bumps 2 at predetermined positions, as shown in a sectional view in FIG. A polyimide resin film (support substrate) having conductive bumps 2 and connecting conductor layers 8 corresponding to the conductor wiring portions 5 of the double-sided printed wiring board 7 on both sides of the wiring board 7 with a synthetic resin sheet 3 interposed therebetween. The sheet) 1 "and the backing plate 4 were positioned and laminated, and after heat and pressure molding, the polyimide resin film 1" was peeled off. Figure 6
A multi-layered printed wiring board having a multi-layered structure, in which the connecting conductor layer 8 was press-fitted into the three layers of the synthetic resin sheet and the surface was flattened was obtained.
【0025】なお、この多層印刷配線板においては、接
続用導体層8は銅などの選択的めっきや導電性ペースト
の印刷で形成し得る。そして、前記平坦面を成す接続用
導体層8の存在は、たとえば半田付けの際の半田ブリッ
ジ発生が防止され、微細なパターンなどの場合の半田付
けに有効である。In this multilayer printed wiring board, the connecting conductor layer 8 can be formed by selective plating of copper or the like or printing of a conductive paste. The presence of the connecting conductor layer 8 forming the flat surface is effective for soldering in the case of a fine pattern, for example, in which generation of a solder bridge during soldering is prevented.
【0026】エッチング処理による回路パターニング
で、さらに多層化した配線板を得ることができる。By patterning the circuit by etching, a wiring board having a further multilayer structure can be obtained.
【0027】また、これらの製造工程において、製造す
る多層配線板の外形加工部(外形加工線)に対応した位
置に、ライン状に前記導電性バンプ2、もしくは相当す
るものを形成具備させておくと、この部分での折り曲げ
などにより容易に切り離し得るので、外形加工の簡略化
を図り得る。Further, in these manufacturing steps, the conductive bumps 2 or the corresponding ones are formed in a line shape at positions corresponding to the outer shape processing portion (outer shape processing line) of the multilayer wiring board to be manufactured. Since it can be easily separated by bending or the like at this portion, the outer shape processing can be simplified.
【0028】実施例4 本実施例は、上記実施例1の場合において、支持基体シ
ート1としてポリイミド樹脂フイルムの代わりに、通
常、印刷配線板の製造に使用されている厚さ35μm の電
解銅箔1′を、また、合成樹脂系シート3としてガラス
クロスにエポキシ樹脂を含浸被着して成る厚さ 200μm
のプリプレグを用い、前記図3に示すごとく、積層配置
して、またこの積層体につき以下のような条件でプレス
加工を行い、図4に示すごとく、両銅箔1′間が貫通型
に接続された導体配線部5を有する両面銅張板を作成し
た。前記プレス加工は、積層体をセットしてから、加熱
を始め 120℃に達した時点で、 2 MPaの樹脂圧を作用さ
せ、この状態でさらに加熱し170℃に達した時点で 1時
間そのまま保持してから冷却させた後、取り出す方式で
行った。Example 4 In this example, instead of the polyimide resin film as the supporting substrate sheet 1 in the case of Example 1 above, an electrolytic copper foil having a thickness of 35 μm, which is usually used in the production of printed wiring boards, is used. 1 ', and synthetic resin sheet 3 with glass cloth impregnated with epoxy resin and having a thickness of 200 μm
Using the above prepreg, as shown in FIG. 3 above, the laminate is arranged, and the laminate is pressed under the following conditions, and as shown in FIG. A double-sided copper clad plate having the conductor wiring portion 5 thus prepared was prepared. In the pressing process, after the laminated body is set, when heating starts and 120 ° C is reached, a resin pressure of 2 MPa is applied, further heating is performed in this state, and when it reaches 170 ° C, it is held for 1 hour as it is. After cooling, it was taken out.
【0029】この両面銅張板の両面に、通常のエッチン
グレジストインク(商品名,PSR-4000 H,製造元:太陽
インキKK)をスクリーン印刷し、導体パターン部をマ
スクしてから、塩化第2銅をエッチング液としてエッチ
ング処理後、レジストマスク剥離して、両面印刷配線板
を得た。こうして製造した両面型印刷配線板について、
通常実施されている電気チェックを行ったところ、全て
の接続に不良ないし信頼性などの問題が認められなかっ
た。また、前記両面導電パターン間の接続の信頼性を評
価するため、ホットオイルテストで( 260℃のオイル中
に10秒浸漬,20℃のオイル中に20秒浸漬のサイクルを 1
サイクルとして)、 500回行っても不良発生は認められ
ず、従来の銅メッキ法による場合に比較して、導電(配
線)パターン層間の接続信頼性が格段にすぐれていた。A normal etching resist ink (trade name, PSR-4000 H, manufacturer: Taiyo Ink KK) was screen-printed on both sides of this double-sided copper clad board, and the conductor pattern portion was masked, followed by cupric chloride. After the etching treatment with the above as an etching solution, the resist mask was peeled off to obtain a double-sided printed wiring board. Regarding the double-sided printed wiring board manufactured in this way,
When the electrical check that was normally performed was performed, no problems such as defects or reliability were found in all the connections. In addition, in order to evaluate the reliability of the connection between the double-sided conductive patterns, a hot oil test (a cycle of immersion in oil at 260 ° C for 10 seconds and immersion in oil at 20 ° C for 20 seconds 1
As a cycle), no defect was observed even after 500 times, and the connection reliability between the conductive (wiring) pattern layers was remarkably excellent as compared with the case of the conventional copper plating method.
【0030】実施例5 本実施例は、支持基体シート1として、通常、印刷配線
板の製造に使用されている厚さ35μm の電解銅箔1′を
用い、この銅箔1′の粗化面側にメッキレジストを印刷
し、所定位置(箇所)に径 0.3mmの露出面群を残すパタ
ーニングを行った後、銅メッキ処理を施して、前記露出
面領域に高さ約 100μm の銅層を、さらにその上に高さ
約10μm のニッケル層を重ねて全体として約 110μm の
導体バンプ群を形成した。前記バンプ群をメッキ法で形
成した銅箔1′を用いいた以外は、実施例3の場合と同
様に、図3に示すごとく、積層配置して、またこの積層
体につき同様の条件でプレス加工を行い、図4に示すご
とく、両銅箔1′間が貫通型に接続された導体配線部5
を有する両面銅張板を作成した。Example 5 In this example, as the supporting base sheet 1, an electrolytic copper foil 1'having a thickness of 35 μm, which is usually used in the production of printed wiring boards, is used, and the roughened surface of this copper foil 1'is used. After printing a plating resist on the side and performing patterning that leaves an exposed surface group with a diameter of 0.3 mm at a predetermined position (location), copper plating is applied to form a copper layer with a height of about 100 μm on the exposed surface area. Further, a nickel layer having a height of about 10 μm was laid on it to form a conductor bump group having a total thickness of about 110 μm. As in Example 3, except that the copper foil 1'where the bump group was formed by plating was used, the bumps were stacked as shown in FIG. 3, and the laminate was pressed under the same conditions. As shown in FIG. 4, the conductor wiring part 5 in which both copper foils 1'are connected in a through type
A double-sided copper clad plate having
【0031】この両面銅張板の両面に、通常のエッチン
グレジストインク(商品名,PSR-4000 H,製造元:太陽
インキKK)をスクリーン印刷し、導体パターン部をマ
スクしてから、塩化第2銅をエッチング液としてエッチ
ング処理後、レジストマスク剥離して、両面印刷配線板
を得た。こうして製造した両面型印刷配線板について、
通常実施されている電気チェックを行ったところ、全て
の接続に不良ないし信頼性などの問題が認められなかっ
た。A normal etching resist ink (trade name, PSR-4000 H, manufacturer: Taiyo Ink KK) was screen-printed on both sides of this double-sided copper clad board, and after masking the conductor pattern portion, cupric chloride was used. After the etching treatment with the above as an etching solution, the resist mask was peeled off to obtain a double-sided printed wiring board. Regarding the double-sided printed wiring board manufactured in this way,
When the electrical check that was normally performed was performed, no problems such as defects or reliability were found in all the connections.
【0032】なお、本実施例でのバンプ群形成を、半田
レジストマスクを介しての半田ディップ法で行っても同
様な結果が得られた。さらに他の実施例における導電性
組成物によるバンプ群の形成を、前記メッキ法におこな
っても配線層間が接続された印刷配線板を得ることが可
能であった。Similar results were obtained even when the bump group formation in this embodiment was carried out by the solder dipping method using a solder resist mask. Even if the bump group was formed of the conductive composition in another example by the plating method, it was possible to obtain a printed wiring board in which wiring layers were connected.
【0033】[0033]
【発明の効果】本発明によれば、パターン層間を接続す
る導電性のバンプを形設する工程、合成樹脂系シートを
積層的に配置して熱プレスする工程、外層パターニング
する工程というプロセスの簡略化、換言すると製造工程
数を従来の製造方法に比べ格段に少ない工程に低減しな
がら、両面型印刷配線板ないし多層型印刷配線板を容易
に製造することが可能となる。特に工程の繰り返しが多
い多層型印刷配線板の製造においては、大幅な工程数の
低減となり、生産性ないし量産性の向上に効果がある。
そして、従来の多層型印刷配線板などの製造工程で、必
要不可欠であった穴明け工程、メッキ工程が不要になる
ことに伴い、製造工程で発生する不良が大幅に抑えら
れ、歩留まりが向上するばかりでなく、信頼性の高い印
刷配線板が得られることになる。また、製造される印刷
配線板は、層間接続用の穴が表面に存在しないので、配
線密度の格段な向上を図り得るし、電子部品の実装用エ
リアも、穴の位置に関係なく設定し得ることになり、実
装密度も格段に向上し、ひいては実装電子部品間の距離
を短縮できるので、回路の性能向上をも図り得る。つま
り、本発明は、印刷配線板の低コス化に寄与するだけで
なく、実装回路装置のコンパクト化や、高性能化などに
も大きく寄与するものといえる。According to the present invention, the steps of forming conductive bumps for connecting pattern layers, arranging synthetic resin sheets in a laminated manner and hot pressing, and patterning outer layers are simplified. In other words, it is possible to easily manufacture a double-sided printed wiring board or a multilayer printed wiring board while reducing the number of manufacturing steps to a significantly smaller number of steps as compared with the conventional manufacturing method. Particularly in the production of a multilayer printed wiring board in which many steps are repeated, the number of steps is significantly reduced, which is effective in improving productivity or mass productivity.
Further, in the manufacturing process of the conventional multilayer printed wiring board and the like, since the drilling process and the plating process, which are indispensable, are no longer necessary, the defects occurring in the manufacturing process are significantly suppressed, and the yield is improved. Not only that, a highly reliable printed wiring board can be obtained. Further, since the printed wiring board manufactured does not have holes for interlayer connection on the surface, the wiring density can be significantly improved, and the mounting area for electronic components can be set regardless of the positions of the holes. As a result, the packaging density can be remarkably improved, and the distance between the mounted electronic components can be shortened, so that the circuit performance can be improved. That is, it can be said that the present invention not only contributes to the reduction of the cost of the printed wiring board, but also contributes to the downsizing of the mounted circuit device and the high performance thereof.
【図1】本発明の第1の実施態様例を模式的に示すもの
で、 (a)は支持基板面に形設された導電性バンプを示す
側面図、 (b)は各素材を位置決めし積層配置した状態を
示す断面図、 (c)は熱プレスにより導電性バンプを合成
樹脂系シートに圧入した状態を示す断面図。FIG. 1 schematically shows a first embodiment of the present invention, in which (a) is a side view showing conductive bumps formed on the surface of a supporting substrate, and (b) shows positioning of respective materials. Sectional view showing a state in which they are stacked and arranged, (c) is a sectional view showing a state in which conductive bumps are press-fitted into a synthetic resin sheet by hot pressing.
【図2】本発明の第2の実施態様例を模式的に示すもの
で、 (a)は支持基板面に形設された導電性バンプを示す
側面図、 (b)は各素材を位置決めし積層配置した状態を
示す断面図、 (c)は熱プレスにより導電性バンプを合成
樹脂系シートに圧入した状態を示す断面図。2A and 2B schematically show a second embodiment of the present invention, in which FIG. 2A is a side view showing conductive bumps formed on the surface of a supporting substrate, and FIG. Sectional view showing a state in which they are stacked and arranged, (c) is a sectional view showing a state in which conductive bumps are press-fitted into a synthetic resin sheet by hot pressing.
【図3】本発明の第3の実施態様例を模式的に示すもの
で、各素材を位置決めし積層配置した状態を示す断面
図。FIG. 3 is a cross-sectional view schematically showing a third embodiment of the present invention, showing a state in which each material is positioned and stacked.
【図4】本発明の第3の実施態様例を模式的に示すもの
で、熱プレスにより導電性バンプを合成樹脂系シートに
圧入した状態を示す断面図。FIG. 4 is a sectional view schematically showing a third embodiment of the present invention, showing a state in which conductive bumps are press-fitted into a synthetic resin sheet by hot pressing.
【図5】本発明の第3の実施態様例を模式的に示すもの
で、多層型化のため各素材を位置決めし積層配置した状
態を示す断面図。FIG. 5 is a cross-sectional view schematically showing a third embodiment of the present invention, showing a state in which each material is positioned and laminated for multi-layering.
【図6】本発明の第3の実施態様例を模式的に示すもの
で、製造された多層型印刷配線板の断面構造を示す断面
図。FIG. 6 is a sectional view schematically showing a third embodiment of the present invention and showing a sectional structure of a manufactured multilayer printed wiring board.
1,1′…支持基体シート 2…導体バンプ 3…
合成樹脂系シート 4…当て板(裏面シート) 5…層間貫通型の導体配
線部 6…半田層 7…両面印刷配線板 8…接続用導体層1, 1 '... Support base sheet 2 ... Conductor bump 3 ...
Synthetic resin sheet 4 ... Patch plate (back sheet) 5 ... Interlayer penetration type conductor wiring part 6 ... Solder layer 7 ... Double-sided printed wiring board 8 ... Connection conductor layer
Claims (3)
せて形設した支持基体の導体バンプ群形成面間に、合成
樹脂系シートを介在させ積層配置する工程と、 前記積
層体を加熱して合成樹脂系シートの樹脂分のガラス転移
温度ないし可塑化温度で積層体を加圧し、各導体バンプ
を合成樹脂系シートの厚さ方向にそれぞれ挿入させて、
前記互いに対応する導体バンプの先端部を塑性変形によ
り接続し、貫通型の導体配線部を形成する工程とを具備
して成ることを特徴とする印刷配線板の製造方法。1. A step of placing a synthetic resin sheet between the conductor bump group forming surfaces of a support substrate having conductor bump groups formed at predetermined positions so as to correspond to each other, and heating the laminate. The laminated body is pressed at the glass transition temperature or plasticization temperature of the resin component of the synthetic resin sheet, and each conductor bump is inserted in the thickness direction of the synthetic resin sheet,
And a step of forming through-type conductor wiring portions by connecting the tip ends of the corresponding conductor bumps by plastic deformation.
続用導体層を下地層として設けられた導体バンプ群を互
いに対応させて形設した支持基体の導体バンプ群形成面
間に、合成樹脂系シートを介在させ積層配置する工程
と、 前記積層体を加熱して合成樹脂系シートの樹脂分のガラ
ス転移温度ないし可塑化温度で積層体を加圧し、各導体
バンプを合成樹脂系シートの厚さ方向にそれぞれ挿入さ
せて、前記互いに対応する導体バンプの先端部を塑性変
形により接続し、貫通型の導体配線部を形成する工程と
を具備して成ることを特徴とする印刷配線板の製造方
法。2. A synthetic resin sheet between at least a part of a predetermined position between conductor bump group formation surfaces of a support base in which conductor bump groups provided with a conductor layer for connection as a base layer are formed corresponding to each other. And a step of arranging them in a laminated manner, and heating the laminated body to press the laminated body at a glass transition temperature or a plasticizing temperature of the resin component of the synthetic resin sheet, and each conductor bump is formed in the thickness direction of the synthetic resin sheet. And connecting the respective tip ends of the corresponding conductor bumps by plastic deformation to form a through-type conductor wiring portion, the method for manufacturing a printed wiring board.
せて形設した導電性金属箔の導体バンプ群形成面間に、
合成樹脂系シートを介在させ積層配置する工程と、 前記積層体を加熱して合成樹脂系シートの樹脂分のガラ
ス転移温度ないし可塑化温度で積層体を加圧し、各導体
バンプを合成樹脂系シートの厚さ方向にそれぞれ挿入さ
せ、前記互いに対応する導体バンプの先端部を塑性変形
により接続して、貫通型の導体配線部を形成する工程
と、 前記貫通型の導体配線部を形成した積層体の導電性金属
箔に、エッチング処理を施して、前記貫通型の導体配線
部に接続する配線パターンを形成する工程とを具備して
成ることを特徴とする印刷配線板の製造方法。3. A conductor bump group forming surface of a conductive metal foil in which conductor bump groups are formed at predetermined positions so as to correspond to each other,
A step of laminating and placing a synthetic resin sheet, and heating the laminate to press the laminate at a glass transition temperature or a plasticizing temperature of a resin component of the synthetic resin sheet to form each conductor bump on the synthetic resin sheet. Of the conductor bumps corresponding to each other, and the tip end portions of the corresponding conductor bumps are connected by plastic deformation to form a through-type conductor wiring portion, and a laminated body on which the through-type conductor wiring portion is formed. A step of performing an etching process on the conductive metal foil to form a wiring pattern connected to the through-type conductive wiring portion.
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21975193A JP3474894B2 (en) | 1993-09-03 | 1993-09-03 | Printed wiring board and manufacturing method thereof |
US08/297,954 US5736681A (en) | 1993-09-03 | 1994-08-31 | Printed wiring board having an interconnection penetrating an insulating layer |
EP94306405A EP0647090B1 (en) | 1993-09-03 | 1994-08-31 | Printed wiring board and a method of manufacturing such printed wiring boards |
DE69419219T DE69419219T2 (en) | 1993-09-03 | 1994-08-31 | Printed circuit board and method for producing such printed circuit boards |
KR1019940022332A KR950010719A (en) | 1993-09-03 | 1994-09-03 | Manufacturing method of printed circuit board and printed circuit board |
TW083108450A TW272350B (en) | 1993-09-03 | 1994-09-13 | |
US08/902,100 US5865934A (en) | 1993-09-03 | 1997-07-29 | Method of manufacturing printed wiring boards |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21975193A JP3474894B2 (en) | 1993-09-03 | 1993-09-03 | Printed wiring board and manufacturing method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0774466A true JPH0774466A (en) | 1995-03-17 |
JP3474894B2 JP3474894B2 (en) | 2003-12-08 |
Family
ID=16740432
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21975193A Expired - Lifetime JP3474894B2 (en) | 1993-09-03 | 1993-09-03 | Printed wiring board and manufacturing method thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3474894B2 (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6729022B2 (en) | 1999-08-26 | 2004-05-04 | Sony Chemicals Corp. | Processes for manufacturing flexible wiring boards and the resulting flexible wiring boards |
JP2008091933A (en) | 1995-11-17 | 2008-04-17 | Dainippon Printing Co Ltd | Electronic component |
KR100827310B1 (en) * | 2006-10-11 | 2008-05-06 | 삼성전기주식회사 | Printed Circuit Board and the method of manufacturing thereof |
JP2009124173A (en) * | 2005-11-16 | 2009-06-04 | Samsung Electro-Mechanics Co Ltd | Printed circuit board using paste bump, and method of manufacturing the same |
US7622329B2 (en) | 2005-11-29 | 2009-11-24 | Samsung Electro-Mechanics Co., Ltd. | Method for fabricating core substrate using paste bumps |
JPWO2008114551A1 (en) * | 2007-03-22 | 2010-07-01 | 株式会社村田製作所 | Method for forming via hole by electrophotographic printing method |
WO2010140335A1 (en) * | 2009-06-01 | 2010-12-09 | 株式会社村田製作所 | Method for manufacturing a substrate |
KR101437174B1 (en) * | 2008-02-22 | 2014-09-02 | 김일선 | Film substrate formed with fine circuit thereon and manufacturing method thereof |
US10079184B2 (en) | 2015-02-17 | 2018-09-18 | Toshiba Memory Corporation | Semiconductor manufacturing apparatus and method of manufacturing semiconductor device |
-
1993
- 1993-09-03 JP JP21975193A patent/JP3474894B2/en not_active Expired - Lifetime
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008091933A (en) | 1995-11-17 | 2008-04-17 | Dainippon Printing Co Ltd | Electronic component |
US6737588B1 (en) | 1999-08-26 | 2004-05-18 | Sony Chemicals Corporation | Processes for manufacturing flexible wiring boards and the resulting flexible wiring board |
US6729022B2 (en) | 1999-08-26 | 2004-05-04 | Sony Chemicals Corp. | Processes for manufacturing flexible wiring boards and the resulting flexible wiring boards |
JP2009124173A (en) * | 2005-11-16 | 2009-06-04 | Samsung Electro-Mechanics Co Ltd | Printed circuit board using paste bump, and method of manufacturing the same |
US7859106B2 (en) | 2005-11-29 | 2010-12-28 | Samsung Electro-Mechanics Co., Ltd. | Multilayer printed circuit board using paste bumps |
US7622329B2 (en) | 2005-11-29 | 2009-11-24 | Samsung Electro-Mechanics Co., Ltd. | Method for fabricating core substrate using paste bumps |
KR100827310B1 (en) * | 2006-10-11 | 2008-05-06 | 삼성전기주식회사 | Printed Circuit Board and the method of manufacturing thereof |
JPWO2008114551A1 (en) * | 2007-03-22 | 2010-07-01 | 株式会社村田製作所 | Method for forming via hole by electrophotographic printing method |
US8012287B2 (en) | 2007-03-22 | 2011-09-06 | Murata Manufacturing Co., Ltd. | Via hole forming method using electrophotographic printing method |
KR101437174B1 (en) * | 2008-02-22 | 2014-09-02 | 김일선 | Film substrate formed with fine circuit thereon and manufacturing method thereof |
WO2010140335A1 (en) * | 2009-06-01 | 2010-12-09 | 株式会社村田製作所 | Method for manufacturing a substrate |
JP5182421B2 (en) * | 2009-06-01 | 2013-04-17 | 株式会社村田製作所 | Substrate manufacturing method |
US8794499B2 (en) | 2009-06-01 | 2014-08-05 | Murata Manufacturing Co., Ltd. | Method for manufacturing substrate |
US10079184B2 (en) | 2015-02-17 | 2018-09-18 | Toshiba Memory Corporation | Semiconductor manufacturing apparatus and method of manufacturing semiconductor device |
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