JPH07191118A - Magnetic sensor - Google Patents
Magnetic sensorInfo
- Publication number
- JPH07191118A JPH07191118A JP33260793A JP33260793A JPH07191118A JP H07191118 A JPH07191118 A JP H07191118A JP 33260793 A JP33260793 A JP 33260793A JP 33260793 A JP33260793 A JP 33260793A JP H07191118 A JPH07191118 A JP H07191118A
- Authority
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- Prior art keywords
- excitation
- ring core
- line
- signal line
- layer
- Prior art date
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Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、例えば地磁気等を測定
するのに使用される磁気センサに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic sensor used to measure, for example, geomagnetism.
【0002】[0002]
【従来の技術】この種の磁気センサとしては、従来、リ
ング本体の凹溝に帯状の磁性体フィルムを巻回してリン
グコアを構成し、そのリングコアに励振線をスパイラル
状に巻回するとともに、このリングコアに対して垂直方
向の磁界と直交する方向に信号線を巻回した構造のもの
がある。2. Description of the Related Art Conventionally, as a magnetic sensor of this type, a band-shaped magnetic film is wound around a groove of a ring body to form a ring core, and an exciting wire is wound around the ring core in a spiral shape. There is a structure in which a signal line is wound in a direction orthogonal to a magnetic field perpendicular to the ring core.
【0003】ところが、そのような構造の磁気センサに
よると、リングコアを構成する帯状の磁性体フィルム自
体の絶縁層の厚さにばらつきがあることから、巻回した
フィルムの厚さが不均一となり、これが原因となって磁
気検出特性が劣化するといった点、また、信号線を巻回
する際にリングコアとの直交性を出すのが困難で、その
巻きむらにより検出精度が低下する等の問題があった。However, according to the magnetic sensor having such a structure, the thickness of the wound film becomes non-uniform because the thickness of the insulating layer of the band-shaped magnetic film itself constituting the ring core varies. This causes the magnetic detection characteristics to deteriorate, and it is difficult to obtain orthogonality with the ring core when winding the signal line, and there are problems that the detection accuracy decreases due to the uneven winding. It was
【0004】そこで、以上の問題点を解消するため、半
導体加工技術を利用して、基板上に信号線及び励振線の
2層を積層し、この層上に絶縁層を介して平面状リング
コアを形成し、さらに、その上層に絶縁層を介して励振
線及び信号線の2層を積層して、それら上下の励振線同
士及び信号線同士を相互に接続した構造の磁気センサが
提案されている(特開平2−213781号公報)。In order to solve the above problems, semiconductor processing technology is used to stack two layers of a signal line and an excitation line on a substrate, and a planar ring core is formed on this layer with an insulating layer interposed therebetween. There is proposed a magnetic sensor having a structure in which two layers of an excitation line and a signal line are formed on top of that, and the upper and lower excitation lines and the signal line are mutually connected. (JP-A-2-213781).
【0005】[0005]
【発明が解決しようとする課題】ところで、上記した公
報の技術において、平面状リングコア(磁性膜)を形成
する下地(下層)の表面は、平面度を可能な限り高めた
平坦な面であることが望ましい。これは、リングコアを
凹凸面上に形成すると、凹凸の段差部で磁歪が生じて磁
気特性が劣化することによる。By the way, in the technique of the above-mentioned publication, the surface of the underlayer (lower layer) forming the planar ring core (magnetic film) is a flat surface having the highest possible flatness. Is desirable. This is because when the ring core is formed on the uneven surface, magnetostriction occurs at the stepped portion of the unevenness, and the magnetic characteristics are deteriorated.
【0006】そこで、この種の積層型の磁気センサにお
いて精度の向上をはかるには、リングコアの下層の信号
線及び励振線に対し平坦化処理を施すことが必要となる
が、上記した公報の技術では平坦化処理で完全な平面を
実現することは困難である。Therefore, in order to improve accuracy in this type of laminated magnetic sensor, it is necessary to perform flattening processing on the signal line and the excitation line in the lower layer of the ring core. Therefore, it is difficult to realize a perfect plane by the flattening process.
【0007】すなわち、リングコアの下層には、枕木状
に形成された信号線と励振線との2層が積層されている
ため、その各層に対してそれぞれ1回づつの計2回の平
坦化処理が必要となり、必然的にリングコアを形成する
面の凹凸が大きくなる。That is, since two layers of the signal line and the excitation line formed in the shape of sleepers are laminated in the lower layer of the ring core, a flattening process is performed twice for each of the layers. Are required, and inevitably the irregularities on the surface forming the ring core become large.
【0008】また、平坦化処理には数μmの厚さの絶縁
層の積層が必要となるが、そのオーダでの積層は、半導
体加工技術では比較的厚い薄膜の積層プロセスとなるた
め積層数が多くなり、これに応じてアライメント誤差が
大きくなるといった問題がある。さらに、積層数が多く
なると、これに伴って上下層の信号線同士や励振同士の
コンタクトが困難となりその信頼性が低下する点、ま
た、積層数が多いほどプロセスが複雑になり、コストア
ップや信頼性の低下につながる要因となる等の問題があ
る。Further, the flattening process requires stacking of insulating layers having a thickness of several μm, but the order of stacking is a relatively thick thin film stacking process in the semiconductor processing technology, and therefore the number of stacking layers is small. However, there is a problem that the alignment error increases as the number increases. Furthermore, as the number of stacked layers increases, it becomes difficult to contact the signal lines in the upper and lower layers or the excitations with each other, which lowers the reliability thereof. Further, the larger the number of stacked layers, the more complicated the process becomes and the higher the cost is. There is a problem such as a factor leading to a decrease in reliability.
【0009】本発明はそのような事情に鑑みてなされた
もので、半導体加工技術を利用して作製する積層型の磁
気センサで、平面状リングコアの下地(下層)の平坦化
処理が容易な構造の磁気センサを提供することを目的と
する。The present invention has been made in view of such circumstances, and is a laminated magnetic sensor manufactured by utilizing a semiconductor processing technique, and has a structure in which the base (lower layer) of a planar ring core can be easily planarized. An object of the present invention is to provide a magnetic sensor of.
【0010】[0010]
【課題を解決するための手段】上記の目的を達成するた
め、本発明の磁気センサは、実施例に対応する図1乃至
図3に示すように、基板に積層した絶縁層上もしくは絶
縁基板S上に、所定形状の複数の励振線1a・・1a及び
信号線1b・・1bが、所定の円周上に沿って交互に、か
つ、互いに所定の間隔を隔てて形成された第1の配線層
1と、この層上で上記円周上に相当する領域に絶縁層4
を挟んで形成された平面状リングコア2と、そのリング
コア2上に形成された絶縁層5と、この絶縁層5上に、
第1の配線層1の各線の形成パターンに対応して励振線
3a・・3a及び信号線3b・・3bが形成された第2の配
線層3を備えているとともに、第1の配線層1と第2の
配線層3との間において励振線1aと励振線3aならび
に信号線1bと信号線3bとが、それぞれ互いに接続さ
れ、全体としてリングコア2の回りに励振コイル及び信
号線コイルが形成されていることによって特徴づけられ
る。In order to achieve the above object, the magnetic sensor of the present invention is, as shown in FIGS. 1 to 3 corresponding to an embodiment, provided on an insulating layer laminated on a substrate or an insulating substrate S. First wirings on which a plurality of excitation lines 1a ... 1a and signal lines 1b ... 1b having a predetermined shape are formed alternately along a predetermined circumference and at predetermined intervals. The layer 1 and the insulating layer 4 in the region corresponding to the circumference on the layer 1
A planar ring core 2 formed by sandwiching it, an insulating layer 5 formed on the ring core 2, and an insulating layer 5 on the insulating layer 5.
The first wiring layer 1 is provided with the second wiring layer 3 in which the excitation lines 3a ... 3a and the signal lines 3b ... 3b are formed in correspondence with the respective line formation patterns of the first wiring layer 1. The excitation line 1a and the excitation line 3a, and the signal line 1b and the signal line 3b are connected to each other between the and the second wiring layer 3, and the excitation coil and the signal line coil are formed around the ring core 2 as a whole. It is characterized by
【0011】[0011]
【作用】センサ全体を3層構造(絶縁層を除く)とし
て、平面状リングコア2の下地となる励振線1aと信号
線1bとを同一レベルの層1に形成したので、これらの
励振線1aと信号線1bの形成時の平坦化処理を、伴に
同一のプロセスで行うことが可能となる。これによりリ
ングコア2の下地の平坦化処理が1回で済む。Since the entire sensor has a three-layer structure (excluding the insulating layer), the excitation line 1a and the signal line 1b, which are the base of the planar ring core 2, are formed in the layer 1 of the same level. Accordingly, the flattening process at the time of forming the signal line 1b can be performed in the same process. As a result, the flattening process of the base of the ring core 2 is required only once.
【0012】[0012]
【実施例】本発明の実施例を、以下、図面に基づいて説
明する。図1は本発明実施例の要部構造図で、(a) は縦
断面図,(b) は部分平面図である。なお、(a) は(b) の
X−X矢視断面を示している。Embodiments of the present invention will be described below with reference to the drawings. 1A and 1B are structural views of an essential part of an embodiment of the present invention, in which FIG. 1A is a longitudinal sectional view and FIG. Note that (a) shows a cross section taken along line XX of (b).
【0013】磁気センサは全体として、ガラス基板S上
に積層された第1の配線層1と、この層上に平面状リン
グコア(磁性膜)2及び第2の配線層3が、それぞれ、
絶縁層4及び5を挟んで積層された3層構造(絶縁層は
除く)となっている。The magnetic sensor as a whole has a first wiring layer 1 laminated on a glass substrate S, and a planar ring core (magnetic film) 2 and a second wiring layer 3 on this layer, respectively.
It has a three-layer structure (excluding the insulating layer) in which insulating layers 4 and 5 are sandwiched.
【0014】第1の配線層1には、図2の平面図に示す
ように、L字形状の励振線1a・・1a及び信号線1b・・
1bが、リングコア2の形成領域に相当する円周上に沿
って交互にかつ互いに所定の間隔を隔てて形成されてい
る。As shown in the plan view of FIG. 2, the first wiring layer 1 has L-shaped excitation lines 1a ... 1a and signal lines 1b.
1b are formed alternately along the circumference corresponding to the formation region of the ring core 2 and at a predetermined distance from each other.
【0015】また、第2の配線層3には、図3の平面図
に示すように、先の第1の配線層1の各線1a,1bと
はL字の向きが逆の形状の励振線3a・・3a及び信号線
3b・・3bが、それぞれ、第1の配線層1の各線1a,
1bとリングコア2を挟んでで対向する位置に形成され
ている。Further, as shown in the plan view of FIG. 3, the second wiring layer 3 has an excitation line whose L-shape is opposite to the lines 1a and 1b of the first wiring layer 1 described above. 3a and 3a and the signal lines 3b and 3b are respectively the lines 1a and 1a of the first wiring layer 1, respectively.
It is formed at a position opposed to 1b with the ring core 2 interposed therebetween.
【0016】そして、第1の配線層の励振線1a・・1a
と第2の配線層の励振線3a・・3aとは、図4(a) の模
式図に示すように、それぞれ、コンタクト部Cにおいて
互いに接続されている。また、図4(b) に示すように、
信号線1b・・1bと3b・・3bも同様に接続されてお
り、全体として、リングコア2の回りに励振コイル及び
信号線コイルが形成された構造となっている。なお、そ
の各コイルには、それぞれ、励振コイル電極(パッド)
6及び信号線(検出)コイル電極7が接続されている
(図3参照)。Then, the excitation lines 1a ... 1a of the first wiring layer
.. and 3a of the second wiring layer are connected to each other at the contact portion C, as shown in the schematic view of FIG. 4 (a). Also, as shown in FIG. 4 (b),
The signal lines 1b..1b and 3b..3b are also connected in the same manner, and as a whole, an excitation coil and a signal line coil are formed around the ring core 2. In addition, each coil has an excitation coil electrode (pad).
6 and the signal line (detection) coil electrode 7 are connected (see FIG. 3).
【0017】次に、以上の構造の磁気センサの製造手順
を、以下、図5及び図6を参照しつつ説明する。なお、
図5及び図6は、それぞれ、図2,図3のA−A及びB
−B矢視断面の形状を模式的に示す図である。Next, the manufacturing procedure of the magnetic sensor having the above structure will be described below with reference to FIGS. In addition,
5 and 6 are AA and B of FIGS. 2 and 3, respectively.
It is a figure which shows typically the shape of a B-arrow cross section.
【0018】まず、図5,図6の各図(a) に示すよう
に、ガラス基板S上にAl等の金属膜1cを例えば2μ
m程度の膜厚で成膜し、その金属膜1cをイオンミリン
グ等の手法により加工して、先の図2に示したパターン
の励振線1a・・1a及び信号線1b・・1bを得る〔各図
(b) 〕。First, as shown in each of FIGS. 5 (a) and 6 (a), a metal film 1c of Al or the like is formed on the glass substrate S by, for example, 2 μm.
A film having a thickness of about m is formed, and the metal film 1c is processed by a method such as ion milling to obtain the excitation lines 1a..1a and the signal lines 1b..1b having the pattern shown in FIG. Each figure
(b)].
【0019】この後、励振線1a及び信号線1bの凹凸
を低減するために、SiO2 等の絶縁層4aを積層し
〔各図(c) 〕、次いで平坦化処理を施す〔各図(d) 〕。
その平坦化処理は、例えば、Ni−Fe膜を薄く成膜→
フォトリソグラフィ→イオンミリングよるパターニング
→SiO2 成膜→リフトオフ等の手順で行う。なお、更
に高い平坦度が必要であれば、上記の処理後に、例えば
SiO2 等の絶縁層を積層し、次いでイオンミリングに
よるエッチバックを行うといった平坦化処理を施す。After that, in order to reduce the unevenness of the excitation line 1a and the signal line 1b, an insulating layer 4a of SiO 2 or the like is laminated [each figure (c)] and then flattened [each figure (d) )].
The flattening process includes, for example, thinly forming a Ni-Fe film.
Photolithography → patterning by ion milling → SiO 2 film formation → lift-off. If a higher degree of flatness is required, a flattening process such as laminating an insulating layer such as SiO 2 and then etching back by ion milling is performed after the above process.
【0020】以上の平坦化処理が完了した後、絶縁層4
上にパーマロイ膜を例えば4μm程度の膜厚で成膜し、
次いで、そのパーマロイ膜のパターニングを行って平面
状のリングコア2を得た後、例えばSiO2 を膜厚3μ
mで成膜して絶縁層5を形成する〔各図(e),(f) 〕。こ
の後、絶縁層5のパターニング(窓あけ)を行って、先
の図4の模式図に示したコンタクトホールHを開口する
〔各図(g) 〕。なお、信号線側のコンタクトホールは図
示しないが、その開口のパターニングは励振線側と同様
とする〔図5(g) 参照〕。After the above flattening process is completed, the insulating layer 4
A permalloy film having a film thickness of, for example, about 4 μm is formed thereon,
Next, after patterning the permalloy film to obtain a planar ring core 2, for example, SiO 2 is formed to a film thickness of 3 μm.
Then, the insulating layer 5 is formed by forming a film with m (FIGS. (e) and (f)). After that, the insulating layer 5 is patterned (opening a window) to open the contact hole H shown in the schematic view of FIG. 4 [Fig. (G)]. Although the contact hole on the signal line side is not shown, the patterning of the opening is similar to that on the excitation line side (see FIG. 5 (g)).
【0021】そして、Al等の金属膜を例えば2μm程
度の膜厚で成膜し、この金属膜をイオンミリング等の手
法により加工して、先の図3に示したパターンの励振線
3a・・3a及び信号線3b・・3bを形成することにより
〔各図(h) 〕、図1に示した3層構造の磁気センサを得
る。Then, a metal film of Al or the like is formed to have a film thickness of, for example, about 2 μm, the metal film is processed by a method such as ion milling, and the excitation lines 3a ... Of the pattern shown in FIG. By forming 3a and the signal lines 3b ... 3b [(h) in each figure], the magnetic sensor having the three-layer structure shown in FIG. 1 is obtained.
【0022】なお、励振線及び信号線を形成する材料と
してはAlの他、例えばAu,CuあるいはPt等の他
の金属であってもよい。また、基板としては石英基板等
の他の絶縁基板を採用してもよいし、あるいはSi基板
上に絶縁層を積層したものを用いてもよい。The material for forming the excitation line and the signal line may be Al, or other metal such as Au, Cu or Pt. Further, as the substrate, another insulating substrate such as a quartz substrate may be adopted, or a substrate obtained by laminating an insulating layer on a Si substrate may be used.
【0023】ここで、以上の実施例では、各励振線1
a,3a及び各信号線1b,3bを、それぞれリングコ
ア2の円中心に向かう形状としているが、これに限られ
ることなく、各励振線及び信号線はリングコア2の法線
に対して傾く形状の配線であってもよい。Here, in the above embodiment, each excitation line 1
Although the a and 3a and the signal lines 1b and 3b are shaped toward the center of the circle of the ring core 2, the excitation line and the signal line are not limited to this, and the excitation line and the signal line are inclined with respect to the normal line of the ring core 2. It may be wiring.
【0024】また、以上の実施例では、励振線1a,3
aの幅を信号線1b,3bに対して広くしているが、例
えばリングコア2に対する巻き数を多くする等の場合に
は、励振線と信号線との幅は同程度としてもよい。さら
に、励振線及び信号線の各パターンは、リングコア2の
回りにそれぞれ励振コイル及び信号線コイルを形成でき
るものであれば、その形状・パターンは特に限定はされ
ない。Further, in the above embodiments, the excitation lines 1a, 3
Although the width of a is wider than that of the signal lines 1b and 3b, for example, when the number of turns of the ring core 2 is increased, the widths of the excitation line and the signal line may be approximately the same. Further, the patterns and patterns of the excitation line and the signal line are not particularly limited as long as the excitation coil and the signal line coil can be formed around the ring core 2 respectively.
【0025】[0025]
【発明の効果】以上説明したように、本発明によれば、
センサ全体を3層構造として、平面状リングコアの下層
となる励振線及び信号線を同一レベルの層に形成したの
で、その励振線及び信号線を形成する際の平坦化処理が
1回で済み、これにより、リングコアの形成面を、従来
に対して平面度が高い平坦な面に仕上げることが可能と
なる。その結果、磁気特性が向上する。しかも、励振コ
イル及び信号線コイルの双方をリングコアの近傍に形成
することが可能となり、センサ感度及び効率等が良好と
なる。As described above, according to the present invention,
Since the entire sensor has a three-layer structure and the excitation line and the signal line, which are the lower layers of the planar ring core, are formed on the same level layer, the flattening process for forming the excitation line and the signal line is only required once. This makes it possible to finish the surface on which the ring core is formed into a flat surface having a higher degree of flatness than in the past. As a result, the magnetic characteristics are improved. Moreover, both the excitation coil and the signal line coil can be formed in the vicinity of the ring core, and the sensor sensitivity and efficiency are improved.
【0026】また、平坦化処理の際の絶縁層の積層数が
少なくて済むことから、アライメント誤差の低減化とと
もにリングコア上下の配線層の相互のコンタクトの信頼
性の向上を達成できる。さらに、3層構造の実現で、構
造が簡単となり小型化ひいては高感度化を達成すること
ができるとともに、プロセスが簡単となって歩留り及び
スループットが向上するといった利点もある。Further, since the number of insulating layers to be laminated at the time of the flattening process is small, it is possible to reduce the alignment error and improve the reliability of mutual contact between the wiring layers above and below the ring core. Furthermore, the realization of the three-layer structure has the advantages that the structure is simplified, downsizing and higher sensitivity can be achieved, and the process is simplified to improve yield and throughput.
【図1】本発明実施例の構造図で、(a) は要部断面図,
(b) は部分平面図FIG. 1 is a structural view of an embodiment of the present invention, (a) is a cross-sectional view of a main part,
(b) is a partial plan view
【図2】その実施例の第1の配線層1のパターンを示す
平面図FIG. 2 is a plan view showing a pattern of a first wiring layer 1 of the embodiment.
【図3】同じく第2の配線層3のパターンを示す平面図FIG. 3 is a plan view showing a pattern of the second wiring layer 3 in the same manner.
【図4】本発明実施例の第1と第2の配線層とのコンタ
クトを概念的に示す模式図FIG. 4 is a schematic diagram conceptually showing the contact between the first and second wiring layers of the embodiment of the present invention.
【図5】本発明実施例の製造手順を説明する図FIG. 5 is a diagram illustrating a manufacturing procedure according to an embodiment of the present invention.
【図6】同じく製造手順の説明図FIG. 6 is an explanatory diagram of the same manufacturing procedure.
S ガラス基板 1 第1の配線層 1a・・1a 励振線 1b・・1b 信号線 2 平面状リングコア(磁性膜) 3 第2の配線層 3a・・3a 励振線 3b・・3b 信号線 4,5 絶縁層 C コンタクト部 S glass substrate 1 first wiring layer 1a ·· 1a excitation line 1b ·· 1b signal line 2 planar ring core (magnetic film) 3 second wiring layer 3a ·· 3a excitation line 3b ·· 3b signal line 4, 5 Insulation layer C contact part
───────────────────────────────────────────────────── フロントページの続き (72)発明者 品田 恵 京都府京都市中京区西ノ京桑原町1番地 株式会社島津製作所三条工場内 (72)発明者 藤山 陽一 京都府京都市中京区西ノ京桑原町1番地 株式会社島津製作所三条工場内 (72)発明者 務中 達也 京都府京都市中京区西ノ京桑原町1番地 株式会社島津製作所三条工場内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Megumi Shinada 1 Nishinokyo Kuwabara-cho, Nakagyo-ku, Kyoto Prefecture Kyoto Sanjo Factory Sanjo Factory (72) Inventor Yoichi Fujiyama 1 Kinohara Kuwahara-cho Nishinokyo, Kyoto City Kyoto Prefecture Shimadzu Sanjo Factory (72) Inventor Tatsuya Kumonaka 1 Nishinokyo Kuwabaracho, Nakagyo-ku, Kyoto Prefecture Kyoto Prefecture Shimazu Corporation Sanjo Factory
Claims (1)
板上に、所定形状の複数の励振線及び信号線が、所定の
円周上に沿って交互に、かつ、互いに所定の間隔を隔て
て形成された第1の配線層と、この層上で上記円周上に
相当する領域に絶縁層を挟んで形成された平面状リング
コアと、そのリングコア上に形成された絶縁層と、この
絶縁層上に、上記第1の配線層の各線の形成パターンに
対応して励振線及び信号線が形成された第2の配線層を
備えているとともに、上記第1の配線層と第2の配線層
との間において上記励振線と励振線ならびに上記信号線
と信号線とが、それぞれ相互に接続され、全体として上
記リングコアの回りに励振コイル及び信号線コイルが形
成されてなる磁気センサ。1. A plurality of excitation lines and signal lines having a predetermined shape are alternately arranged along a predetermined circumference on an insulating layer or an insulating substrate laminated on a substrate, and at predetermined intervals. The formed first wiring layer, the planar ring core formed on this layer with the insulating layer sandwiched in a region corresponding to the circumference, the insulating layer formed on the ring core, and the insulating layer A second wiring layer on which an excitation line and a signal line are formed corresponding to each line formation pattern of the first wiring layer is provided on the upper side, and the first wiring layer and the second wiring layer are provided. A magnetic sensor in which the excitation line and the excitation line, the signal line and the signal line are connected to each other, and the excitation coil and the signal line coil are formed around the ring core as a whole.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33260793A JP2730467B2 (en) | 1993-12-27 | 1993-12-27 | Magnetic sensor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33260793A JP2730467B2 (en) | 1993-12-27 | 1993-12-27 | Magnetic sensor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH07191118A true JPH07191118A (en) | 1995-07-28 |
JP2730467B2 JP2730467B2 (en) | 1998-03-25 |
Family
ID=18256843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP33260793A Expired - Fee Related JP2730467B2 (en) | 1993-12-27 | 1993-12-27 | Magnetic sensor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2730467B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6895623B2 (en) | 2003-09-09 | 2005-05-24 | James D. Zimmerlee | Pier system and method of construction |
WO2013047637A1 (en) | 2011-09-28 | 2013-04-04 | 株式会社フジクラ | Coil wiring element and method for manufacturing coil wiring element |
EP4421510A1 (en) * | 2023-02-21 | 2024-08-28 | Shimadzu Corporation | Magnetic detection device |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2557429A1 (en) | 2010-05-12 | 2013-02-13 | Fujikura, Ltd. | Method for manufacturing flux gate sensor |
-
1993
- 1993-12-27 JP JP33260793A patent/JP2730467B2/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6895623B2 (en) | 2003-09-09 | 2005-05-24 | James D. Zimmerlee | Pier system and method of construction |
WO2013047637A1 (en) | 2011-09-28 | 2013-04-04 | 株式会社フジクラ | Coil wiring element and method for manufacturing coil wiring element |
EP4421510A1 (en) * | 2023-02-21 | 2024-08-28 | Shimadzu Corporation | Magnetic detection device |
Also Published As
Publication number | Publication date |
---|---|
JP2730467B2 (en) | 1998-03-25 |
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