Nothing Special   »   [go: up one dir, main page]

JPH06260741A - Manufacture of metal base circuit board - Google Patents

Manufacture of metal base circuit board

Info

Publication number
JPH06260741A
JPH06260741A JP4699893A JP4699893A JPH06260741A JP H06260741 A JPH06260741 A JP H06260741A JP 4699893 A JP4699893 A JP 4699893A JP 4699893 A JP4699893 A JP 4699893A JP H06260741 A JPH06260741 A JP H06260741A
Authority
JP
Japan
Prior art keywords
copper circuit
nickel
plated
metal base
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4699893A
Other languages
Japanese (ja)
Inventor
Chiharu Watanabe
千春 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Priority to JP4699893A priority Critical patent/JPH06260741A/en
Publication of JPH06260741A publication Critical patent/JPH06260741A/en
Pending legal-status Critical Current

Links

Landscapes

  • Insulated Metal Substrates For Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To obtain a metal base circuit board high in wire bonding reliability by a method wherein the surface of a copper circuit is controlled in average roughness as prescribed, smoothed, and then plated with nickel. CONSTITUTION:A copper circuit 3 is formed on a metal base board 1, and only a masked part of the circuit 3 to be plated with nickel is etched with a mixed solution of sulfuric acid 0.005 to 0.03 (g/cc) in concentration and hydrogen peroxide 0.04 to 0.2 (g/cc) in concentration to make the surface 7 of the copper circuit 3 equal to 1.0mum or below in roughness (Rz; JIS). Then, the copper circuit 3 is partially or totally plated with nickel 4 as thick as 0.1 to 50mum through an electroplating or an electroless plating method. An aluminum wire 6 is bonded to the nickel-plated surface of the copper circuit 3 through an ultrasonic bonding method.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は電気機器、通信機、自動
車等の電子部品に用いられる金属ベース回路基板の製造
方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a metal base circuit board used for electronic parts such as electric equipment, communication devices, automobiles and the like.

【0002】[0002]

【従来の技術】近年、電子部品を搭載する回路基板とし
て金属ベース回路基板が大量に使用されている。これら
の金属ベース回路基板はアルミニウムなどのベース金属
基板の上に絶縁層を形成し、その上に銅/アルミの接合
箔や、銅箔にニッケルメッキを施した回路を有するもの
などがある。そのうち、銅箔の表面にニッケルメッキを
施したものは製造上の管理が容易である上に耐酸化性が
良好なので、多種の用途に使用されている。
2. Description of the Related Art In recent years, a large amount of metal base circuit boards have been used as circuit boards for mounting electronic components. These metal base circuit boards include those having an insulating layer formed on a base metal board made of aluminum or the like, and having a copper / aluminum bonding foil thereon, or a circuit having a copper foil plated with nickel. Among them, a copper foil whose surface is nickel-plated is used for various purposes because it is easy to control in manufacturing and has good oxidation resistance.

【0003】従来、表面にニッケルメッキを施した銅回
路を有する金属ベース回路基板を製造する際には、ニッ
ケルメッキを施す前に銅回路表面を単に、羽布等により
物理研磨するか、もしくはアルカリ溶液により脱脂処理
を行っていたにすぎなかった。
Conventionally, when manufacturing a metal base circuit board having a copper circuit whose surface is nickel-plated, the surface of the copper circuit is simply physically polished with a cloth or the like before applying the nickel plating. It was only degreasing with the solution.

【0004】そのため、銅回路の上に施したニッケルメ
ッキの表面粗さは、下地である銅箔の表面粗さの影響を
受けて、通常1.5μm程度以上と粗く、超音波Alワイヤ
ーをボンディングする際のボンディング信頼性が低いと
いう問題があった。
Therefore, the surface roughness of the nickel plating applied on the copper circuit is affected by the surface roughness of the underlying copper foil, and is usually as large as about 1.5 μm or more, and ultrasonic Al wires are bonded. There was a problem in that the bonding reliability was low.

【0005】[0005]

【発明が解決しようとする課題】本発明はかかる問題点
に鑑みてなされたものであって、銅回路上にニッケルメ
ッキが施される金属ベース回路基板において、メッキ前
の銅回路表面を硫酸と過酸化水素の混合溶液でエッチン
グすることにより、表面粗さを調整し、ワイヤーボンデ
ィング信頼性を改善できることを見いだし本発明を完成
するに至った。
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and in a metal base circuit board having a copper circuit plated with nickel, the surface of the copper circuit before plating is treated with sulfuric acid. The inventors have found that the surface roughness can be adjusted and the wire bonding reliability can be improved by etching with a mixed solution of hydrogen peroxide, and the present invention has been completed.

【0006】[0006]

【課題を解決するための手段】本発明の特徴は、金属ベ
ース絶縁基板上に形成された銅回路の表面を硫酸と過酸
化水素の混合溶液を用いてエッチングすることによっ
て、該銅回路の表面の平均粗さ(Rz )を1.0μm以下
にした後、該銅回路の表面をニッケルメッキして金属ベ
ース回路基板を製造する方法である。
The feature of the present invention is that the surface of a copper circuit formed on a metal-based insulating substrate is etched by using a mixed solution of sulfuric acid and hydrogen peroxide, thereby forming a surface of the copper circuit. The average roughness (R z ) of the above is set to 1.0 μm or less, and then the surface of the copper circuit is nickel-plated to produce a metal-based circuit board.

【0007】以下、本発明についてさらに詳細に説明す
る。本発明に用いられる金属ベース絶縁基板は、0.3
〜5.0mm厚のアルミニウム、アルミニウム合金、
銅、鉄、ステンレス、インバー等の金属板上に、30〜
500μm厚のガラスエポキシ樹脂、無機フィラーを充
填したエポキシ樹脂などの絶縁材料が張り合わせられた
ものである。そして、0.031〜1.0mmの銅箔が
張り合わせられた後、これをエッチングして所望の銅回
路が形成される。
The present invention will be described in more detail below. The metal base insulating substrate used in the present invention is 0.3
~ 5.0 mm thick aluminum, aluminum alloy,
30 ~ on a metal plate such as copper, iron, stainless steel, invar
An insulating material such as a glass epoxy resin having a thickness of 500 μm or an epoxy resin filled with an inorganic filler is laminated. Then, after 0.031 to 1.0 mm of copper foil is laminated, the copper foil is etched to form a desired copper circuit.

【0008】このように形成された金属ベース基板上の
銅回路のうち、Niメッキする部分のみをマスクしたも
のを、混合溶液中の硫酸濃度が0.001〜0.1(g/cc
)、過酸化水素濃度が0.01 〜0.4(g/cc )の混合
溶液、好ましくは硫酸濃度が0.005〜0.03 (g/cc
)、過酸化水素濃度が0.04 〜0.2(g/cc )の混合
溶液によりエッチングして、銅表面の粗さ(Rz;JI
S法)を1.0μm以下と平滑にする。
Of the copper circuit on the metal base substrate thus formed, only the portion to be plated with Ni was masked, and the sulfuric acid concentration in the mixed solution was 0.001 to 0.1 (g / cc).
), A mixed solution having a hydrogen peroxide concentration of 0.01 to 0.4 (g / cc), preferably a sulfuric acid concentration of 0.005 to 0.03 (g / cc).
), And a hydrogen peroxide concentration of 0.04 to 0.2 (g / cc) was used for etching to obtain a copper surface roughness (Rz; JI
S method) to be 1.0 μm or less and smooth.

【0009】エッチングの方法は、浸せき法またはスプ
レー法いずれでもかまわない。エッチングの液の温度は
室温〜60℃がよく処理時間は3〜20分が適してい
る。液の温度が40〜60℃であれば短時間で製造でき
るので効率がよい。次いで銅回路の一部、もしくは全面
にわたり0.1〜50μmの厚さの電解もしくは無電解
ニッケルメッキを施す。
The etching method may be either a dipping method or a spray method. The temperature of the etching liquid is preferably room temperature to 60 ° C., and the treatment time is suitably 3 to 20 minutes. If the temperature of the liquid is 40 to 60 ° C., it can be produced in a short period of time, which is efficient. Next, electrolytic or electroless nickel plating having a thickness of 0.1 to 50 μm is applied to a part or the entire surface of the copper circuit.

【0010】このように形成された銅回路のニッケルメ
ッキ表面へ超音波接合によりアルミニウム線のボンディ
ングを行う。このアルミニウム線の太さは、25から5
00μmφが一般に用いられ、半導体チップとの接続あ
るいは、他のニッケルメッキ表面との接続が行われる。
An aluminum wire is bonded to the nickel-plated surface of the copper circuit thus formed by ultrasonic bonding. The thickness of this aluminum wire is 25 to 5
00 μmφ is generally used for connection with a semiconductor chip or other nickel-plated surface.

【0011】[0011]

【作用および実施例】本発明においては銅回路表面の粗
さを調整して平滑化することにより、銅回路上に施され
るニッケルメッキ表面も平滑化することが可能となり、
そのため、アルミニウム線とニッケルメッキ表面の超音
波による結合が容易に行えるようになる。したがって、
超音波ワイヤーボンディングにおける結合信頼性をあげ
ることができるようになった。
FUNCTION AND EXAMPLE In the present invention, by adjusting the roughness of the copper circuit surface and smoothing it, it becomes possible to smooth the nickel-plated surface applied on the copper circuit.
Therefore, the aluminum wire and the nickel-plated surface can be easily bonded by ultrasonic waves. Therefore,
It has become possible to improve the bonding reliability in ultrasonic wire bonding.

【0012】次に、本発明の一例の実施例の金属ベース
回路基板の構造を図1〜図3に基づき説明する。
Next, the structure of the metal base circuit board according to the embodiment of the present invention will be described with reference to FIGS.

【0013】〔実施例1〕金属ベース板1に3.0mm
厚のアルミニウム板を用い、これに80μmの絶縁層2
を介して105μmの銅箔を積層し、エッチングにより
銅回路を形成した。これを、温度55℃の硫酸0.01
(g/cc )、過酸化水素0.08 (g/cc )の混合溶液に
8分間浸せきすることにより、処理前の平均表面粗さ
(Rz )が4.0μmの銅回路の表面を0.6μmφ(Rz
)の平均表面粗さ7まで平滑化した。表面粗さは、株
式会社小坂研究所製「サーフコーダ−せ−30D」を用
い、送り速度0.1 mm /秒で測定しJIS;Rz法で表
した。この後この銅回路の全面に無電解メッキにより4
μm厚のニッケルメッキ4を施した。そしてこのニッケ
ルメッキの表面に、超音波工業株式会社製「USW−2
0ZD60S−C」ボンディングマシンを用いて荷重3
00g、出力1.8W、出力時間0.4秒の条件で、300
μmφのアルミニウム線6を1000本ワイヤーボンデ
ィングした。その結果、結合不良は0本であった。
[Example 1] 3.0 mm on the metal base plate 1
A thick aluminum plate is used, on which an insulating layer 2 of 80 μm is formed.
A copper circuit having a thickness of 105 μm was laminated on the copper foil by etching, and a copper circuit was formed by etching. Add this to 0.01% sulfuric acid at a temperature of 55 ° C.
(G / cc) and 0.08 (g / cc) hydrogen peroxide were soaked in a mixed solution for 8 minutes, so that the surface of the copper circuit having an average surface roughness (Rz) before treatment of 4.0 μm was 0.02. 6 μmφ (Rz
The average surface roughness of 7) was smoothed. The surface roughness was measured by "Surfcoder-SE-30D" manufactured by Kosaka Laboratory Ltd. at a feed rate of 0.1 mm / sec and expressed by JIS; Rz method. After this, the entire surface of this copper circuit is electroless plated to 4
A nickel plating 4 having a thickness of μm was applied. And on the surface of this nickel plating, "USW-2" manufactured by Ultrasonic Industrial Co., Ltd.
0ZD60S-C ”bonding machine is used to load 3
300g under the condition of 00g, output 1.8W, output time 0.4 seconds
1000 μmφ aluminum wires 6 were wire-bonded. As a result, the number of defective bonds was zero.

【0014】〔実施例2〕金属ベース板に1.0mm厚
の銅板を用い、これに150μmの絶縁層を介して35
μmの銅箔を積層しエッチングによりパターンを形成し
た。これに、硫酸0.02 (g/cc )、過酸化水素0.14
(g/cc )を含む30℃の混合溶液に4分間浸せきする
ことにより、処理前の平均表面粗さ(Rz )が2.0μ
mの銅箔の表面を0.8μm(Rz )まで平滑化した。
そしてこの回路パターンの一部に無電解メッキにより3
μm厚のニッケルメッキを施した。そしてこのニッケル
メッキの表面に実施例1と同じ条件で300μmφのア
ルミニウム線を1000本ワイヤーボンディングした。
その結果、結合不良は0本であった。
Example 2 A copper plate having a thickness of 1.0 mm was used as a metal base plate, and a copper plate having a thickness of 150 μm was placed on the copper plate.
A pattern was formed by laminating a copper foil of μm and etching. Sulfuric acid 0.02 (g / cc), hydrogen peroxide 0.14
By immersing in a mixed solution containing (g / cc) at 30 ° C. for 4 minutes, the average surface roughness (Rz) before treatment was 2.0 μm.
The surface of the copper foil of m was smoothed to 0.8 μm (Rz).
Then, part of this circuit pattern is electroless plated to 3
A μm thick nickel plating was applied. Then, 1000 aluminum wires having a diameter of 300 μm were wire-bonded to the surface of the nickel plating under the same conditions as in Example 1.
As a result, the number of defective bonds was zero.

【0015】〔比較例1〕金属ベース板に3.0mm厚
のアルミニウム板を用い、これに80μmの絶縁層を介
して105μmの銅箔を積層しエッチングによりパター
ンを形成した。この時、銅回路の平均表面粗さ(Rz )
は2.0μmであり、直接この銅回路の全面に4μm厚
さの無電解ニッケルメッキを施した。そしてこのニッケ
ルメッキの表面に実施例1と同じ条件で300μmφの
アルミニウム線を1000本ワイヤーボンディングし
た。その結果、結合不良は8本であった。
[Comparative Example 1] A 3.0 mm thick aluminum plate was used as a metal base plate, a 105 μm copper foil was laminated on this with an 80 μm insulating layer interposed therebetween, and a pattern was formed by etching. At this time, the average surface roughness (Rz) of the copper circuit
Is 2.0 μm, and 4 μm thick electroless nickel plating was directly applied to the entire surface of the copper circuit. Then, 1000 aluminum wires having a diameter of 300 μm were wire-bonded to the surface of the nickel plating under the same conditions as in Example 1. As a result, the number of defective bonds was eight.

【0016】[0016]

【発明の効果】本発明によれば、銅回路表面の平均粗さ
を調整して平滑化することにより、銅回路上に施された
ニッケルメッキの表面も平滑化することが可能となり、
アルミニウム線とニッケルメッキ面の超音波ワイヤーボ
ンディングが容易に行なうことができ、高いワイヤーボ
ンディング信頼性を得ることができるようになった。
According to the present invention, by adjusting the average roughness of the surface of the copper circuit and smoothing it, it becomes possible to smooth the surface of the nickel plating applied on the copper circuit.
Ultrasonic wire bonding between an aluminum wire and a nickel-plated surface can be easily performed, and high wire bonding reliability can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の製造工程の一部を示す。銅回路を形成
した段階の金属ベース回路基板の断面図である。
FIG. 1 shows a part of the manufacturing process of the present invention. It is sectional drawing of the metal base circuit board of the step which formed the copper circuit.

【図2】本発明の製造工程の一部を示す。銅回路上にニ
ッケルメッキを施した金属ベース回路基板の断面図であ
る。
FIG. 2 shows a part of the manufacturing process of the present invention. It is sectional drawing of the metal base circuit board which carried out the nickel plating on the copper circuit.

【図3】超音波アルミワイヤーボンディングを施した金
属ベース回路基板の断面図である。
FIG. 3 is a cross-sectional view of a metal base circuit board subjected to ultrasonic aluminum wire bonding.

【符号の説明】[Explanation of symbols]

1 :金属ベース基板 2 :絶縁層 3 :銅回路 4 :ニッケルメッキ部 5 :半導体 6 :アルミニウム線 7 :平均粗さを調整された銅回路表面 1: Metal base substrate 2: Insulation layer 3: Copper circuit 4: Nickel plated part 5: Semiconductor 6: Aluminum wire 7: Copper circuit surface with adjusted average roughness

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 金属ベース絶縁基板上に形成された銅回
路の表面を硫酸と過酸化水素の混合溶液を用いてエッチ
ングすることによって、該銅回路の表面の平均粗さ(R
z )を1.0μm以下にした後、該銅回路の表面をニッケ
ルメッキすることを特徴とする金属ベース回路基板の製
造方法。
1. The average roughness (R) of the surface of the copper circuit is formed by etching the surface of the copper circuit formed on the metal base insulating substrate with a mixed solution of sulfuric acid and hydrogen peroxide.
z ) is 1.0 μm or less, and then the surface of the copper circuit is nickel-plated.
JP4699893A 1993-03-08 1993-03-08 Manufacture of metal base circuit board Pending JPH06260741A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4699893A JPH06260741A (en) 1993-03-08 1993-03-08 Manufacture of metal base circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4699893A JPH06260741A (en) 1993-03-08 1993-03-08 Manufacture of metal base circuit board

Publications (1)

Publication Number Publication Date
JPH06260741A true JPH06260741A (en) 1994-09-16

Family

ID=12762866

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4699893A Pending JPH06260741A (en) 1993-03-08 1993-03-08 Manufacture of metal base circuit board

Country Status (1)

Country Link
JP (1) JPH06260741A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005317880A (en) * 2004-04-30 2005-11-10 Nikko Metal Manufacturing Co Ltd Metallic material for printed-wiring board
AT500807A1 (en) * 2004-01-23 2006-03-15 Austria Tech & System Tech METHOD FOR MANUFACTURING A PCB LAYER ELEMENT AND PCB LAYERING ELEMENT
JP2006249573A (en) * 2005-07-14 2006-09-21 Hitachi Chem Co Ltd Surface treatment method for copper, and copper
JP2009239295A (en) * 2002-03-05 2009-10-15 Hitachi Chem Co Ltd Printed wiring board, and method of manufacturing the same

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009239295A (en) * 2002-03-05 2009-10-15 Hitachi Chem Co Ltd Printed wiring board, and method of manufacturing the same
AT500807A1 (en) * 2004-01-23 2006-03-15 Austria Tech & System Tech METHOD FOR MANUFACTURING A PCB LAYER ELEMENT AND PCB LAYERING ELEMENT
AT500807B1 (en) * 2004-01-23 2006-11-15 Austria Tech & System Tech METHOD FOR MANUFACTURING A PCB LAYER ELEMENT AND PCB LAYERING ELEMENT
US7552525B2 (en) 2004-01-23 2009-06-30 AT & Saustria Technologie & Systemtechnik Aktiengesellschaft Method for the production of a circuit board element
US8039755B2 (en) 2004-01-23 2011-10-18 At & S Austria Technologie & Systemtechnik Aktiengesellschaft Method for manufacturing a printed circuit board element as well as a printed circuit board element
JP2005317880A (en) * 2004-04-30 2005-11-10 Nikko Metal Manufacturing Co Ltd Metallic material for printed-wiring board
JP2006249573A (en) * 2005-07-14 2006-09-21 Hitachi Chem Co Ltd Surface treatment method for copper, and copper

Similar Documents

Publication Publication Date Title
US6766576B2 (en) Method for producing a double-sided wiring board
WO2003043393A1 (en) Circuit board and its manufacturing method
JPH098438A (en) Wire bonding terminal, manufacture thereof and manufacture of semiconductor mounting substrate using that wire bonding terminal
US4767049A (en) Special surfaces for wire bonding
JP3502781B2 (en) Lead frame for semiconductor package and lead frame plating method
KR20020040597A (en) Laminated structure for electronic equipment and method of electroless gold plating
CA1204518A (en) Microwave circuit boards and method of manufacture thereof
JPH06260741A (en) Manufacture of metal base circuit board
JP4391671B2 (en) Electronic component mounting substrate and manufacturing method thereof
JP2007158017A (en) Wiring board and its manufacturing method
JP3349166B2 (en) Circuit board
JP2801732B2 (en) Cladding material for substrate wiring and method of manufacturing the same
JPH02276249A (en) Manufacture of semiconductor circuit bump
JP2002111187A (en) Wiring board
JP4511011B2 (en) Wiring board manufacturing method
JPH08274123A (en) Method for manufacturing conductor for hybrid integrated circuit substrate
JPS61250036A (en) Bonding of copper and resin
JP2002076634A (en) Wiring board and electronic component module using it
JPH05129775A (en) Manufacture of printed wiring board
JPH07297524A (en) Ic card printed wiring board
JPS58180084A (en) Method of producing conductive foil-lined laminated board
JPH10326960A (en) Production of printed wiring board
JP2021072369A (en) Semiconductor package and method for manufacturing the same
JP2002111180A (en) Wiring board
JPH0529741A (en) Substrate for hybrid integrated circuit