JPH05132484A - Pyrazoloquinoline and pyrazolonaphthylidene derivative - Google Patents
Pyrazoloquinoline and pyrazolonaphthylidene derivativeInfo
- Publication number
- JPH05132484A JPH05132484A JP4106477A JP10647792A JPH05132484A JP H05132484 A JPH05132484 A JP H05132484A JP 4106477 A JP4106477 A JP 4106477A JP 10647792 A JP10647792 A JP 10647792A JP H05132484 A JPH05132484 A JP H05132484A
- Authority
- JP
- Japan
- Prior art keywords
- lower alkyl
- alkyl group
- group
- compound
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- UXYHZIYEDDINQH-UHFFFAOYSA-N C1=CNC2=C3C=NN=C3C=CC2=C1 Chemical class C1=CNC2=C3C=NN=C3C=CC2=C1 UXYHZIYEDDINQH-UHFFFAOYSA-N 0.000 title claims description 7
- -1 pyrazolonaphthylidene Chemical class 0.000 title description 53
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 101
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 29
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 20
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 16
- 125000003342 alkenyl group Chemical group 0.000 claims description 15
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 13
- 125000005843 halogen group Chemical group 0.000 claims description 12
- 125000003545 alkoxy group Chemical group 0.000 claims description 10
- 125000001424 substituent group Chemical group 0.000 claims description 9
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 7
- VMPCBEQFWHYVIV-UHFFFAOYSA-N C1=CC=N[C]2N[C]3C=NN=C3C=C21 Chemical class C1=CC=N[C]2N[C]3C=NN=C3C=C21 VMPCBEQFWHYVIV-UHFFFAOYSA-N 0.000 claims description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 6
- 125000002252 acyl group Chemical group 0.000 claims description 5
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims description 4
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 2
- 125000003226 pyrazolyl group Chemical group 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 abstract description 101
- 239000003795 chemical substances by application Substances 0.000 abstract description 16
- 230000002140 halogenating effect Effects 0.000 abstract description 4
- 230000003110 anti-inflammatory effect Effects 0.000 abstract description 3
- DJONJRJDCMPMNA-UHFFFAOYSA-N 3-amino-1,5-dimethylpyrazolo[4,3-c]quinolin-4-one Chemical compound C12=CC=CC=C2N(C)C(=O)C2=C1N(C)N=C2N DJONJRJDCMPMNA-UHFFFAOYSA-N 0.000 abstract description 2
- 230000000202 analgesic effect Effects 0.000 abstract description 2
- 239000000730 antalgic agent Substances 0.000 abstract description 2
- 230000001754 anti-pyretic effect Effects 0.000 abstract description 2
- 238000006482 condensation reaction Methods 0.000 abstract description 2
- OJGMBLNIHDZDGS-UHFFFAOYSA-N N-Ethylaniline Chemical compound CCNC1=CC=CC=C1 OJGMBLNIHDZDGS-UHFFFAOYSA-N 0.000 abstract 2
- 229910052736 halogen Inorganic materials 0.000 abstract 2
- 150000002367 halogens Chemical class 0.000 abstract 2
- 230000004957 immunoregulator effect Effects 0.000 abstract 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 abstract 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical group C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 abstract 1
- 239000002260 anti-inflammatory agent Substances 0.000 abstract 1
- 229940121363 anti-inflammatory agent Drugs 0.000 abstract 1
- 125000001589 carboacyl group Chemical group 0.000 abstract 1
- 230000000694 effects Effects 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 56
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 39
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 34
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 24
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 21
- 239000002904 solvent Substances 0.000 description 20
- 239000013078 crystal Substances 0.000 description 17
- 239000000203 mixture Substances 0.000 description 16
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 239000000126 substance Substances 0.000 description 13
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 238000001914 filtration Methods 0.000 description 12
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 12
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- 239000012442 inert solvent Substances 0.000 description 10
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 10
- 239000007858 starting material Substances 0.000 description 9
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 8
- 238000009835 boiling Methods 0.000 description 7
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 7
- 239000011541 reaction mixture Substances 0.000 description 7
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 6
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 6
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 239000002585 base Substances 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 235000019253 formic acid Nutrition 0.000 description 6
- 238000010898 silica gel chromatography Methods 0.000 description 6
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 5
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 229910000027 potassium carbonate Inorganic materials 0.000 description 5
- 239000012312 sodium hydride Substances 0.000 description 5
- 229910000104 sodium hydride Inorganic materials 0.000 description 5
- PMZDQRJGMBOQBF-UHFFFAOYSA-N 1H-quinolin-4-one Natural products C1=CC=C2C(O)=CC=NC2=C1 PMZDQRJGMBOQBF-UHFFFAOYSA-N 0.000 description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- WGLUMOCWFMKWIL-UHFFFAOYSA-N dichloromethane;methanol Chemical compound OC.ClCCl WGLUMOCWFMKWIL-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000012044 organic layer Substances 0.000 description 4
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 4
- VSGPVHSTVTXREH-UHFFFAOYSA-N quinolin-4-one Chemical compound C1=CC=C[C]2C(=O)C=CN=C21 VSGPVHSTVTXREH-UHFFFAOYSA-N 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000002168 alkylating agent Substances 0.000 description 3
- 229940100198 alkylating agent Drugs 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000003480 eluent Substances 0.000 description 3
- 150000002429 hydrazines Chemical class 0.000 description 3
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 3
- 229910000029 sodium carbonate Inorganic materials 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 2
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 description 2
- 239000012346 acetyl chloride Substances 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 238000005804 alkylation reaction Methods 0.000 description 2
- MLIREBYILWEBDM-UHFFFAOYSA-N cyanoacetic acid Chemical compound OC(=O)CC#N MLIREBYILWEBDM-UHFFFAOYSA-N 0.000 description 2
- WBKFWQBXFREOFH-UHFFFAOYSA-N dichloromethane;ethyl acetate Chemical compound ClCCl.CCOC(C)=O WBKFWQBXFREOFH-UHFFFAOYSA-N 0.000 description 2
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 238000005658 halogenation reaction Methods 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 239000005457 ice water Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 2
- 235000017557 sodium bicarbonate Nutrition 0.000 description 2
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 2
- SEPPVOUBHWNCAW-FNORWQNLSA-N (E)-4-oxonon-2-enal Chemical compound CCCCCC(=O)\C=C\C=O SEPPVOUBHWNCAW-FNORWQNLSA-N 0.000 description 1
- WORJRXHJTUTINR-UHFFFAOYSA-N 1,4-dioxane;hydron;chloride Chemical compound Cl.C1COCCO1 WORJRXHJTUTINR-UHFFFAOYSA-N 0.000 description 1
- PWILGOCWIQYCSK-UHFFFAOYSA-N 1,5-dihydropyrazolo[4,3-c]quinolin-4-one Chemical compound C1=CC=C2C3=NNC=C3C(=O)NC2=C1 PWILGOCWIQYCSK-UHFFFAOYSA-N 0.000 description 1
- MPPPKRYCTPRNTB-UHFFFAOYSA-N 1-bromobutane Chemical compound CCCCBr MPPPKRYCTPRNTB-UHFFFAOYSA-N 0.000 description 1
- CYNYIHKIEHGYOZ-UHFFFAOYSA-N 1-bromopropane Chemical compound CCCBr CYNYIHKIEHGYOZ-UHFFFAOYSA-N 0.000 description 1
- 125000004066 1-hydroxyethyl group Chemical group [H]OC([H])([*])C([H])([H])[H] 0.000 description 1
- 125000004343 1-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- MEKOFIRRDATTAG-UHFFFAOYSA-N 2,2,5,8-tetramethyl-3,4-dihydrochromen-6-ol Chemical compound C1CC(C)(C)OC2=C1C(C)=C(O)C=C2C MEKOFIRRDATTAG-UHFFFAOYSA-N 0.000 description 1
- YQTCQNIPQMJNTI-UHFFFAOYSA-N 2,2-dimethylpropan-1-one Chemical group CC(C)(C)[C]=O YQTCQNIPQMJNTI-UHFFFAOYSA-N 0.000 description 1
- 125000000143 2-carboxyethyl group Chemical group [H]OC(=O)C([H])([H])C([H])([H])* 0.000 description 1
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 1
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 1
- GBHCABUWWQUMAJ-UHFFFAOYSA-N 2-hydrazinoethanol Chemical compound NNCCO GBHCABUWWQUMAJ-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- 125000004204 2-methoxyphenyl group Chemical group [H]C1=C([H])C(*)=C(OC([H])([H])[H])C([H])=C1[H] 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- POYSUXIHCXBJPN-UHFFFAOYSA-N 3-Methyl-quinolin-2-ol Chemical compound C1=CC=C2NC(=O)C(C)=CC2=C1 POYSUXIHCXBJPN-UHFFFAOYSA-N 0.000 description 1
- XABSOZDBDKQEOD-UHFFFAOYSA-N 3-amino-1,5-dihydropyrazolo[4,3-c]quinolin-4-one Chemical compound NC1=NNC2=C1C(NC=1C=CC=CC2=1)=O XABSOZDBDKQEOD-UHFFFAOYSA-N 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- VIHRIIARIFUQLC-UHFFFAOYSA-N 3-hydrazinylpropanenitrile Chemical compound NNCCC#N VIHRIIARIFUQLC-UHFFFAOYSA-N 0.000 description 1
- QOXOZONBQWIKDA-UHFFFAOYSA-N 3-hydroxypropyl Chemical group [CH2]CCO QOXOZONBQWIKDA-UHFFFAOYSA-N 0.000 description 1
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001255 4-fluorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1F 0.000 description 1
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- LLBZPESJRQGYMB-UHFFFAOYSA-N 4-one Natural products O1C(C(=O)CC)CC(C)C11C2(C)CCC(C3(C)C(C(C)(CO)C(OC4C(C(O)C(O)C(COC5C(C(O)C(O)CO5)OC5C(C(OC6C(C(O)C(O)C(CO)O6)O)C(O)C(CO)O5)OC5C(C(O)C(O)C(C)O5)O)O4)O)CC3)CC3)=C3C2(C)CC1 LLBZPESJRQGYMB-UHFFFAOYSA-N 0.000 description 1
- PQDGWTNPSZPUMC-UHFFFAOYSA-N 7-hydrazinylheptanenitrile Chemical compound NNCCCCCCC#N PQDGWTNPSZPUMC-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 208000008035 Back Pain Diseases 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 1
- 208000008930 Low Back Pain Diseases 0.000 description 1
- 239000012359 Methanesulfonyl chloride Substances 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- 201000004681 Psoriasis Diseases 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 230000010933 acylation Effects 0.000 description 1
- 238000005917 acylation reaction Methods 0.000 description 1
- 238000005377 adsorption chromatography Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 230000029936 alkylation Effects 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000002221 antipyretic Substances 0.000 description 1
- 229940125716 antipyretic agent Drugs 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000005997 bromomethyl group Chemical group 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- KMGBZBJJOKUPIA-UHFFFAOYSA-N butyl iodide Chemical compound CCCCI KMGBZBJJOKUPIA-UHFFFAOYSA-N 0.000 description 1
- 125000004744 butyloxycarbonyl group Chemical group 0.000 description 1
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229920005556 chlorobutyl Polymers 0.000 description 1
- WORJEOGGNQDSOE-UHFFFAOYSA-N chloroform;methanol Chemical compound OC.ClC(Cl)Cl WORJEOGGNQDSOE-UHFFFAOYSA-N 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000004216 fluoromethyl group Chemical group [H]C([H])(F)* 0.000 description 1
- 238000006170 formylation reaction Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000000268 heptanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 125000003104 hexanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003707 hexyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000005935 hexyloxycarbonyl group Chemical group 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 230000002519 immonomodulatory effect Effects 0.000 description 1
- 239000002955 immunomodulating agent Substances 0.000 description 1
- 230000002584 immunomodulator Effects 0.000 description 1
- 229940121354 immunomodulator Drugs 0.000 description 1
- HVTICUPFWKNHNG-UHFFFAOYSA-N iodoethane Chemical compound CCI HVTICUPFWKNHNG-UHFFFAOYSA-N 0.000 description 1
- VYFOAVADNIHPTR-UHFFFAOYSA-N isatoic anhydride Chemical compound NC1=CC=CC=C1CO VYFOAVADNIHPTR-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- QARBMVPHQWIHKH-UHFFFAOYSA-N methanesulfonyl chloride Chemical compound CS(Cl)(=O)=O QARBMVPHQWIHKH-UHFFFAOYSA-N 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- DYXKUMACGJLDGE-UHFFFAOYSA-N methyl 4-[[3-[3-benzoyl-8-(trifluoromethyl)quinolin-4-yl]phenoxy]methyl]benzoate Chemical compound C1=CC(C(=O)OC)=CC=C1COC1=CC=CC(C=2C3=CC=CC(=C3N=CC=2C(=O)C=2C=CC=CC=2)C(F)(F)F)=C1 DYXKUMACGJLDGE-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- WFJRIDQGVSJLLH-UHFFFAOYSA-N methyl n-aminocarbamate Chemical compound COC(=O)NN WFJRIDQGVSJLLH-UHFFFAOYSA-N 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- HDZGCSFEDULWCS-UHFFFAOYSA-N monomethylhydrazine Chemical compound CNN HDZGCSFEDULWCS-UHFFFAOYSA-N 0.000 description 1
- 239000012452 mother liquor Substances 0.000 description 1
- PVWOIHVRPOBWPI-UHFFFAOYSA-N n-propyl iodide Chemical compound CCCI PVWOIHVRPOBWPI-UHFFFAOYSA-N 0.000 description 1
- 201000008383 nephritis Diseases 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000001148 pentyloxycarbonyl group Chemical group 0.000 description 1
- VLCMRTMCMQJSKM-UHFFFAOYSA-N phenyl-[4-phenyl-8-(trifluoromethyl)quinolin-3-yl]methanone Chemical compound C=1C=CC=CC=1C(=O)C1=CN=C2C(C(F)(F)F)=CC=CC2=C1C1=CC=CC=C1 VLCMRTMCMQJSKM-UHFFFAOYSA-N 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 125000001325 propanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004742 propyloxycarbonyl group Chemical group 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 206010039073 rheumatoid arthritis Diseases 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 238000005694 sulfonylation reaction Methods 0.000 description 1
- 201000000596 systemic lupus erythematosus Diseases 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 125000003774 valeryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は新規なピラゾロキノリン
及びピラゾロナフチリジン誘導体に関する。FIELD OF THE INVENTION The present invention relates to novel pyrazoloquinoline and pyrazolonaphthyridine derivatives.
【0002】[0002]
【従来の技術】本発明のピラゾロキノリン及びピラゾロ
ナフチリジン誘導体は文献未載の新規化合物である。BACKGROUND OF THE INVENTION The pyrazoloquinoline and pyrazolonaphthyridine derivatives of the present invention are novel compounds which have not been published in the literature.
【0003】[0003]
【発明が解決しようとする課題】本発明は後記するよう
に医薬品として有用な化合物を提供することを目的とす
る。DISCLOSURE OF THE INVENTION An object of the present invention is to provide a compound useful as a medicine as described below.
【0004】[0004]
【課題を解決するための手段】上記目的は下記一般式
(1)で表わされるピラゾロキノリン及びピラゾロナフ
チリジン誘導体により達成される。The above object is achieved by a pyrazoloquinoline and a pyrazolonaphthyridine derivative represented by the following general formula (1).
【0005】[0005]
【化2】 [Chemical 2]
【0006】〔式中R1 は水素原子、低級アルキル基、
低級アルケニル基、カルボキシ低級アルキル基、低級ア
ルコキシカルボニル低級アルキル基、ハロゲン置換低級
アルキル基、フェニル低級アルキル基又は置換基として
ハロゲン原子及び低級アルコキシ基から選ばれる基を有
することのあるフェニル基を示し、R2 は水素原子、低
級アルキル基、フェニル基、ヒドロキシ低級アルキル
基、シアノ低級アルキル基、カルボキシ低級アルキル
基、低級アルコキシカルボニル低級アルキル基、ハロゲ
ン置換低級アルキル基又は低級アルコキシカルボニル基
を示し、R3 は水素原子又はハロゲン原子を示し、R4
及びR5 は同一又は異なって水素原子、低級アルカノイ
ル基、低級アルキルスルホニル基、低級アルキル基、低
級アルケニル基、ホルミル基又はカルボキシ低級アルキ
ル基を示す。また、上記R2 とR4 は互いに結合して基
−CH2 −CH2 −CO−又は基−CH=CH−を形成
してもよい。Yは−CH=基又は窒素原子を示し、破線
はピラゾール環に二重結合が2個存在することを示
す。〕上記一般式(1)に示される各基としては、具体
的には次のものをそれぞれ例示できる。[Wherein R 1 is a hydrogen atom, a lower alkyl group,
A lower alkenyl group, a carboxy lower alkyl group, a lower alkoxycarbonyl lower alkyl group, a halogen-substituted lower alkyl group, a phenyl lower alkyl group or a phenyl group which may have a group selected from a halogen atom and a lower alkoxy group as a substituent, R 2 represents a hydrogen atom, a lower alkyl group, a phenyl group, a hydroxy lower alkyl group, a cyano lower alkyl group, a carboxy lower alkyl group, a lower alkoxycarbonyl lower alkyl group, a halogen-substituted lower alkyl group or a lower alkoxycarbonyl group, and R 3 Represents a hydrogen atom or a halogen atom, and R 4
And R 5 are the same or different and each represents a hydrogen atom, a lower alkanoyl group, a lower alkylsulfonyl group, a lower alkyl group, a lower alkenyl group, a formyl group or a carboxy lower alkyl group. Further, R 2 and R 4 may be bonded to each other to form a group —CH 2 —CH 2 —CO— or a group —CH═CH—. Y represents a -CH = group or a nitrogen atom, and the broken line indicates that there are two double bonds in the pyrazole ring. Specific examples of the groups represented by the general formula (1) include the following.
【0007】即ち、低級アルキル基としては、例えばメ
チル、エチル、プロピル、イソプロピル、ブチル、イソ
ブチル、tert−ブチル、ペンチル、ヘキシル基等の直鎖
又は分枝鎖状低級アルキル基を例示できる。That is, examples of the lower alkyl group include linear or branched lower alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, pentyl and hexyl groups.
【0008】フェニル低級アルキル基としては、例えば
ベンジル、2−フェニルエチル、1−フェニルエチル、
3−フェニルプロピル、4−フェニルブチル、5−フェ
ニルペンチル、6−フェニルヘキシル基等を例示でき
る。Examples of the phenyl lower alkyl group include benzyl, 2-phenylethyl, 1-phenylethyl,
Examples thereof include 3-phenylpropyl, 4-phenylbutyl, 5-phenylpentyl and 6-phenylhexyl groups.
【0009】低級アルコキシル基としては、例えばメト
キシ、エトキシ、プロポキシ、ブトキシ、ペンチルオキ
シ、ヘキシルオキシ基等を例示できる。Examples of the lower alkoxyl group include methoxy, ethoxy, propoxy, butoxy, pentyloxy and hexyloxy groups.
【0010】ヒドロキシ低級アルキル基としては、例え
ばヒドロキシメチル、2−ヒドロキシエチル、1−ヒド
ロキシエチル、3−ヒドロキシプロピル、4−ヒドロキ
シブチル、5−ヒドロキシペンチル、6−ヒドロキシヘ
キシル基等を例示できる。Examples of hydroxy lower alkyl groups include hydroxymethyl, 2-hydroxyethyl, 1-hydroxyethyl, 3-hydroxypropyl, 4-hydroxybutyl, 5-hydroxypentyl and 6-hydroxyhexyl groups.
【0011】シアノ低級アルキル基としては、例えばシ
アノメチル、2−シアノエチル、1−シアノエチル、3
−シアノプロピル、4−シアノブチル、5−シアノペン
チル、6−シアノヘキシル基等を例示できる。Examples of the cyano lower alkyl group include cyanomethyl, 2-cyanoethyl, 1-cyanoethyl, 3
Examples thereof include -cyanopropyl, 4-cyanobutyl, 5-cyanopentyl and 6-cyanohexyl groups.
【0012】低級アルコキシカルボニル基としては、例
えばメトキシカルボニル、エトキシカルボニル、プロポ
キシカルボニル、ブトキシカルボニル、ペンチルオキシ
カルボニル、ヘキシルオキシカルボニル基等を例示でき
る。Examples of the lower alkoxycarbonyl group include methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, butoxycarbonyl, pentyloxycarbonyl, hexyloxycarbonyl groups and the like.
【0013】低級アルカノイル基としては、例えばアセ
チル、プロパノイル、ブタノイル、ペンタノイル、ピバ
ロイル、ヘキサノイル、ヘプタノイル基等を例示でき
る。Examples of the lower alkanoyl group include acetyl, propanoyl, butanoyl, pentanoyl, pivaloyl, hexanoyl and heptanoyl groups.
【0014】低級アルキルスルホニル基としては、例え
ばメタンスルホニル、エタンスルホニル、プロパンスル
ホニル、ブタンスルホニル、ヘキサンスルホニル基等を
例示できる。Examples of the lower alkylsulfonyl group include methanesulfonyl, ethanesulfonyl, propanesulfonyl, butanesulfonyl and hexanesulfonyl groups.
【0015】置換基としてハロゲン原子及び低級アルコ
キシル基から選ばれる基を有することのあるフェニル基
としては、フェニル基の他に、例えば4−フルオロフェ
ニル、4−メトキシフェニル、4−クロロフェニル、3
−クロロフェニル、4−エトキシフェニル、2−メトキ
シフェニル基等を例示できる。The phenyl group which may have a group selected from a halogen atom and a lower alkoxyl group as a substituent includes, for example, 4-fluorophenyl, 4-methoxyphenyl, 4-chlorophenyl, 3 in addition to the phenyl group.
Examples thereof include -chlorophenyl, 4-ethoxyphenyl and 2-methoxyphenyl groups.
【0016】低級アルケニル基としては、例えばビニ
ル、アリル、イソプロペニル、3−ブテン−1−イル、
4−ペンテン−1−イル、5−ヘキセン−1−イル基等
を例示できる。Examples of the lower alkenyl group include vinyl, allyl, isopropenyl, 3-buten-1-yl,
Examples include 4-penten-1-yl and 5-hexen-1-yl groups.
【0017】カルボキシ低級アルキル基としては、例え
ばカルボキシメチル、2−カルボキシエチル、3−カル
ボキシプロピル、4−カルボキシブチル、5−カルボキ
シペンチル、6−カルボキシヘキシル基等を例示でき
る。Examples of the carboxy lower alkyl group include carboxymethyl, 2-carboxyethyl, 3-carboxypropyl, 4-carboxybutyl, 5-carboxypentyl and 6-carboxyhexyl groups.
【0018】低級アルコキシカルボニル低級アルキル基
としては、例えばメトキシカルボニルメチル、エトキシ
カルボニルメチル、2−エトキシカルボニルエチル、3
−エトキシカルボニルプロピル、4−エトキシカルボニ
ルブチル、5−エトキシカルボニルペンチル、6−エト
キシカルボニルヘキシル、2−ブトキシカルボニルエチ
ル、ヘキシルオキシカルボニルメチル基等を例示でき
る。As the lower alkoxycarbonyl lower alkyl group, for example, methoxycarbonylmethyl, ethoxycarbonylmethyl, 2-ethoxycarbonylethyl, 3
Examples thereof include -ethoxycarbonylpropyl, 4-ethoxycarbonylbutyl, 5-ethoxycarbonylpentyl, 6-ethoxycarbonylhexyl, 2-butoxycarbonylethyl and hexyloxycarbonylmethyl groups.
【0019】ハロゲン置換低級アルキル基としては、例
えばクロロメチル、ブロモメチル、ヨードメチル、フル
オロメチル、2−クロロエチル、3−クロロプロピル、
4−クロロブチル、5−クロロペンチル、6−クロロブ
チル、トルフルオロメチル、2,2,2−トリフルオロ
エチル、3,3,3−トリフルオロプロピル基等を例示
できる。Examples of the halogen-substituted lower alkyl group include chloromethyl, bromomethyl, iodomethyl, fluoromethyl, 2-chloroethyl, 3-chloropropyl,
4-chlorobutyl, 5-chloropentyl, 6-chlorobutyl, trifluoromethyl, 2,2,2-trifluoroethyl, 3,3,3-trifluoropropyl group and the like can be exemplified.
【0020】本発明のピラゾロキノリン及びピラゾロナ
フチリジン誘導体は、各種方法により製造することがで
きる。その具体例を下記反応工程式にそれぞれ示す。The pyrazoloquinoline and pyrazolonaphthyridine derivatives of the present invention can be produced by various methods. Specific examples thereof are shown in the following reaction process formulas.
【0021】〔反応工程式1〕[Reaction Process Formula 1]
【0022】[0022]
【化3】 [Chemical 3]
【0023】〔式中R3 及びYは前記に同じ。R1aは水
素原子、低級アルキル基、低級アルケニル基、低級アル
コキシカルボニル低級アルキル基、ハロゲン置換低級ア
ルキル基、フェニル低級アルキル基又は置換基としてハ
ロゲン原子及び低級アルコキシ基から選ばれる基を有す
ることのあるフェニル基を、R2aは水素原子、低級アル
キル基、フェニル基、ヒドロキシ低級アルキル基、シア
ノ低級アルキル基、低級アルコキシカルボニル低級アル
キル基、ハロゲン置換低級アルキル基又は低級アルコキ
シカルボニル基を、R6 は低級アルキル基を、またXは
ハロゲン原子をそれぞれ示す。〕反応工程式1における
化合物(2)と化合物(3)との反応は、イサト酸無水
物又はその誘導体(2)と活性メチレン化合物であるシ
アノ酢酸低級アルキルエステル(3)との脱アルコール
縮合反応であり、文献記載の方法に従い実施できる(G.
M.Coppola et al.,J.HeterocyclicChem.,16.1605(1979)
参照)。尚、この反応では、N,N−ジメチルホルム
アミドやN,N−ジメチルアセトアミドを溶媒として用
いるのが好ましい。[Wherein R 3 and Y are the same as defined above]. R 1a may have a hydrogen atom, a lower alkyl group, a lower alkenyl group, a lower alkoxycarbonyl lower alkyl group, a halogen-substituted lower alkyl group, a phenyl lower alkyl group, or a substituent selected from a halogen atom and a lower alkoxy group. A phenyl group, R 2a is a hydrogen atom, a lower alkyl group, a phenyl group, a hydroxy lower alkyl group, a cyano lower alkyl group, a lower alkoxycarbonyl lower alkyl group, a halogen-substituted lower alkyl group or a lower alkoxycarbonyl group, and R 6 is a lower group. An alkyl group and X represents a halogen atom. The reaction between the compound (2) and the compound (3) in the reaction process formula 1 is carried out by dealcoholization condensation reaction of isatoic anhydride or its derivative (2) with an active methylene compound, a cyanoacetic acid lower alkyl ester (3). It can be carried out according to the method described in the literature (G.
M. Coppola et al., J. Heterocyclic Chem., 16 .1605 (1979)
reference). In this reaction, it is preferable to use N, N-dimethylformamide or N, N-dimethylacetamide as a solvent.
【0024】上記反応で得られる化合物(4)のハロゲ
ン化反応は、通常の方法に従い実施できる。例えば、該
ハロゲン化反応は、オキシ塩化リン等のハロゲン化剤及
びジエチルアニリン、ジメチルアニリン等の脱酸剤を用
いて実施できる。上記ハロゲン化剤は、溶媒をも兼ねる
ので通常過剰量、好ましくは化合物(4)に対して5〜
20倍当量程度用いるのがよい。また、脱酸剤の使用量
は、化合物(4)に対して1〜20倍当量程度用いるの
がよい。反応は一般に60℃程度〜溶媒(オキシ塩化リ
ン)の沸点の温度条件下に10分〜2時間程度で完結す
る。かくして目的化合物(5)を収得できる。The halogenation reaction of the compound (4) obtained by the above reaction can be carried out by a usual method. For example, the halogenation reaction can be carried out using a halogenating agent such as phosphorus oxychloride and a deoxidizing agent such as diethylaniline or dimethylaniline. The above-mentioned halogenating agent also serves as a solvent, and thus is usually in an excess amount, preferably 5 to 5 relative to the compound (4).
It is preferable to use about 20 times equivalent. Further, the deoxidizing agent is preferably used in an amount of 1 to 20 times equivalent to that of the compound (4). The reaction is generally completed in about 10 minutes to 2 hours under the temperature conditions of about 60 ° C. to the boiling point of the solvent (phosphorus oxychloride). Thus, the target compound (5) can be obtained.
【0025】上記化合物(5)とヒドラジン誘導体
(6)との環化反応は、例えばメタノール、エタノー
ル、プロパノール、N,N−ジメチルホルムアミド、
N,N−ジメチルアセトアミド等の適当な不活性溶媒中
で実施され、反応系内にはさらにトリエチルアミン、ピ
リジン、炭酸水素ナトリウム、炭酸カリウム等の脱酸剤
を化合物(5)に対して約1〜5倍モル量程度存在させ
ることもできる。化合物(5)に対する化合物(6)の
使用割合は約1〜5当量程度とするのがよい。上記反応
は、一般に20〜100℃程度の温度条件下で1〜72
時間程度を要して行なわれる。かくして目的化合物(1
a)を収得できる。The cyclization reaction of the above compound (5) with the hydrazine derivative (6) is carried out, for example, with methanol, ethanol, propanol, N, N-dimethylformamide,
It is carried out in a suitable inert solvent such as N, N-dimethylacetamide, and a deoxidizing agent such as triethylamine, pyridine, sodium hydrogencarbonate, potassium carbonate or the like is added to the reaction system in an amount of about 1 to about 1 to the compound (5). It may be present in a molar amount of about 5 times. The ratio of the compound (6) used to the compound (5) is preferably about 1 to 5 equivalents. Generally, the above reaction is carried out at 1 to 72 under a temperature condition of about 20 to 100 ° C.
It takes about time. Thus, the target compound (1
a) can be obtained.
【0026】〔反応工程式2〕[Reaction Process Formula 2]
【0027】[0027]
【化4】 [Chemical 4]
【0028】〔式中R3 及びYは前記に同じ。R1bは低
級アルキル基、低級アルケニル基、低級アルコキシカル
ボニル低級アルキル基、ハロゲン置換低級アルキル基、
フェニル低級アルキル基又は置換基としてハロゲン原子
及び低級アルコキシ基から選ばれる基を有することのあ
るフェニル基を、R2aは低級アルキル基をそれぞれ示
す。〕反応工程式2における化合物(1b)のアルキル
化反応は、適当な溶媒、アルキル化剤及び脱酸剤を用い
て実施できる。上記溶媒としては例えばN,N−ジメチ
ルホルムアミド、ジメチルスルホキシド、N,N−ジメ
チルアセトアミド、ピリジン、ジオキサン等を、上記ア
ルキル化剤としては例えばヨウ化メチル、ヨウ化エチ
ル、臭化プロピル、ヨウ化プロピル、臭化ブチル等を、
上記脱酸剤としては例えばトリエチルアミン、ピリジ
ン、炭酸水素ナトリウム、炭酸ナトリウム、炭酸カリウ
ム等をそれぞれ使用できる。上記アルキル化剤の使用量
は、通常化合物(1b)に対して1〜10倍当量程度と
され、また脱酸剤の使用量は、通常化合物(1b)に対
して1〜10倍当量程度とするのがよい。上記反応の温
度条件としては約20〜80℃を採用でき、反応は一般
に1〜60時間程度で終了し、これにより所望の化合物
(1c)を収得できる。[Wherein R 3 and Y are the same as defined above]. R 1b is a lower alkyl group, a lower alkenyl group, a lower alkoxycarbonyl lower alkyl group, a halogen-substituted lower alkyl group,
A phenyl lower alkyl group or a phenyl group which may have a group selected from a halogen atom and a lower alkoxy group as a substituent, and R 2a represents a lower alkyl group. The alkylation reaction of compound (1b) in reaction scheme 2 can be carried out using a suitable solvent, an alkylating agent and a deoxidizing agent. Examples of the solvent include N, N-dimethylformamide, dimethylsulfoxide, N, N-dimethylacetamide, pyridine and dioxane, and examples of the alkylating agent include methyl iodide, ethyl iodide, propyl bromide and propyl iodide. , Butyl bromide, etc.
As the deoxidizing agent, for example, triethylamine, pyridine, sodium hydrogen carbonate, sodium carbonate, potassium carbonate and the like can be used. The amount of the alkylating agent used is usually about 1 to 10 times equivalent to the compound (1b), and the amount of deoxidizing agent is usually about 1 to 10 times equivalent to the compound (1b). Good to do. The temperature condition for the above reaction may be about 20 to 80 ° C., and the reaction is generally completed in about 1 to 60 hours, whereby the desired compound (1c) can be obtained.
【0029】〔反応工程式3〕[Reaction Process Formula 3]
【0030】[0030]
【化5】 [Chemical 5]
【0031】〔式中R3 及びYは前記に同じ。R2cは水
素原子、低級アルキル基、フェニル基又はハロゲン置換
低級アルキル基を示す。〕反応工程式3に示す反応は、
例えば酢酸等の適当な溶媒中で47%HBrを用いて8
0〜120℃程度の温度条件下に約2〜70時間程度を
要して実施され、該反応により所望の化合物(1e)を
収得できる。[Wherein R 3 and Y are the same as defined above. R 2c represents a hydrogen atom, a lower alkyl group, a phenyl group or a halogen-substituted lower alkyl group. ] The reaction shown in Reaction Process Formula 3 is
8% with 47% HBr in a suitable solvent such as acetic acid
It is carried out under a temperature condition of about 0 to 120 ° C. for about 2 to 70 hours, and the desired compound (1e) can be obtained by the reaction.
【0032】〔反応工程式4〕[Reaction Process Formula 4]
【0033】[0033]
【化6】 [Chemical 6]
【0034】〔式中R1b、R3 及びYは前記に同じ。R
2dは低級アルキル基、フェニル基、シアノ低級アルキル
基、低級アルコキシカルボニル低級アルキル基、ハロゲ
ン置換低級アルキル基又は低級アルコキシカルボニル基
を示し、R4aは低級アルカノイル基又は低級アルキルス
ルホニル基を示す。〕反応工程式4における化合物(1
f)のアルカノイル化反応及びスルホニル化反応は、
N,N−ジメチルホルムアミド、N,N−ジメチルアセ
トアミド、ピリジン等の適当な溶媒中で、アルカノイル
化剤として酸無水物、酸ハロゲン化物等を、スルホニル
化剤として低級アルキルスルホン酸ハロゲン化物等を、
それぞれ用いて実施できる。上記アルカノイル化剤の使
用量は通常1〜10倍当量程度、上記スルホニル化剤の
使用量は通常1〜10倍当量程度とするのがよく、反応
は20〜100℃程度の温度条件下で約1〜10時間を
要して行なわれる。かくして目的化合物(1g)を収得
できる。[Wherein R 1b , R 3 and Y are the same as defined above]. R
2d represents a lower alkyl group, a phenyl group, a cyano lower alkyl group, a lower alkoxycarbonyl lower alkyl group, a halogen-substituted lower alkyl group or a lower alkoxycarbonyl group, and R 4a represents a lower alkanoyl group or a lower alkylsulfonyl group. ] The compound (1
The alkanoylation reaction and sulfonylation reaction of f) are
In a suitable solvent such as N, N-dimethylformamide, N, N-dimethylacetamide, pyridine, etc., an acid anhydride, an acid halide or the like as an alkanoylating agent, a lower alkyl sulfonic acid halide or the like as a sulfonylating agent,
It can be carried out using each. The amount of the alkanoylating agent used is usually about 1 to 10 times equivalent, the amount of the sulfonylating agent is usually about 1 to 10 times equivalent, and the reaction is carried out at a temperature condition of about 20 to 100 ° C. It takes 1 to 10 hours. Thus, the target compound (1 g) can be obtained.
【0035】〔反応工程式5〕[Reaction Process Formula 5]
【0036】[0036]
【化7】 [Chemical 7]
【0037】〔式中R2b、R3 、X及びYは前記に同
じ。R1cは低級アルキル基、低級アルケニル基、低級ア
ルコキシカルボニル低級アルキル基、ハロゲン置換低級
アルキル基又はフェニル低級アルキル基を示す。〕反応
工程式5に示す化合物(1h)と化合物(7)との反応
は、不活性溶媒中、塩基の存在下に行なわれる。上記不
活性溶媒としては、例えばN,N−ジメチルホルムアミ
ド、ジメチルスルホキシド、テトラヒドロフラン等を、
塩基としては、例えば水素化ナトリウム、ナトリウムエ
トキシド、炭酸カリウム、炭酸ナトリウム等をそれぞれ
使用できる。之等塩基の使用量は、通常1〜5当量、好
ましくは1〜2当量とするのがよく、また化合物(7)
の使用量は、化合物(1h)に対して 倍〜 倍モ
ル量程度の範囲とするのがよい。反応は、0℃〜溶媒の
沸点の温度条件で1〜48時間程度を要して実施され、
かくして化合物(1i)を得ることができる。[Wherein R 2b , R 3 , X and Y are the same as defined above. R 1c represents a lower alkyl group, a lower alkenyl group, a lower alkoxycarbonyl lower alkyl group, a halogen-substituted lower alkyl group or a phenyl lower alkyl group. The reaction of the compound (1h) shown in the reaction scheme 5 with the compound (7) is carried out in the presence of a base in an inert solvent. Examples of the above-mentioned inert solvent include N, N-dimethylformamide, dimethylsulfoxide, tetrahydrofuran, and the like.
As the base, for example, sodium hydride, sodium ethoxide, potassium carbonate, sodium carbonate or the like can be used. The amount of homo-base used is usually 1 to 5 equivalents, preferably 1 to 2 equivalents, and compound (7)
It is preferable that the amount of the compound used is in the range of about 1 to 2 times the molar amount of the compound (1h). The reaction is carried out at a temperature condition of 0 ° C. to the boiling point of the solvent for about 1 to 48 hours,
Thus, the compound (1i) can be obtained.
【0038】〔反応工程式6〕[Reaction Process Formula 6]
【0039】[0039]
【化8】 [Chemical 8]
【0040】〔式中R1b、R2d、R3 及びYは前記に同
じ。〕反応工程式6に示すように、化合物(1f)はこ
れをホルミル化することにより化合物(1j)に変換で
きる。該ホルミル化反応は、化合物(1f)とギ酸を2
0〜100℃程度の温度で1〜24時間程度反応させる
ことにより行なわれる。尚、該反応ではギ酸が溶媒をも
兼ねるので、特に他の溶媒を必要としない。[In the formula, R 1b , R 2d , R 3 and Y are the same as defined above. As shown in the reaction scheme 6, the compound (1f) can be converted to the compound (1j) by formylating it. In the formylation reaction, the compound (1f) and formic acid are converted into 2
The reaction is carried out at a temperature of about 0 to 100 ° C. for about 1 to 24 hours. In the reaction, formic acid also serves as a solvent, so that another solvent is not particularly required.
【0041】〔反応工程式7〕[Reaction Process Formula 7]
【0042】[0042]
【化9】 [Chemical 9]
【0043】〔式中R3 、X及びYは前記に同じ。R1d
は低級アルキル基、低級アルケニル基、ハロゲン置換低
級アルキル基又は置換基としてハロゲン原子及び低級ア
ルコキシ基から選ばれる基を有することのあるフェニル
基を示し、Rは低級アルキル基を示すか又は2個のR同
士互いに結合して低級アルキレン基を示す。〕反応工程
式7によれば、化合物(1k)をアセタール誘導体
(8)と反応させた後、酸処理することにより化合物
(1l)を収得できる。該反応は、不活性溶媒中、脱酸
剤の存在下に実施される。不活性溶媒及び脱酸剤として
は、反応工程式2のアルキル化で用いられるものと同様
のものを使用でき、また反応条件等も前記範囲より適宜
選択できる。得られる粗生成物は、メタノール、エタノ
ール、プロパノール、テトラヒドロフラン、ジオキサン
等の不活性溶媒中、希塩酸、希硫酸等と20℃〜溶媒の
沸点温度で0.5〜5時間程度処理することにより、化
合物(1l)に変換できる。[Wherein R 3 , X and Y are the same as defined above]. R 1d
Represents a lower alkyl group, a lower alkenyl group, a halogen-substituted lower alkyl group or a phenyl group which may have a group selected from a halogen atom and a lower alkoxy group as a substituent, and R represents a lower alkyl group or two R's are bonded to each other to represent a lower alkylene group. According to the reaction scheme 7, the compound (1k) can be obtained by reacting the compound (1k) with the acetal derivative (8) and then treating with an acid. The reaction is carried out in the presence of a deoxidizing agent in an inert solvent. As the inert solvent and the deoxidizing agent, the same ones as those used in the alkylation of the reaction process formula 2 can be used, and the reaction conditions and the like can be appropriately selected from the above range. The obtained crude product is treated with dilute hydrochloric acid, dilute sulfuric acid or the like in an inert solvent such as methanol, ethanol, propanol, tetrahydrofuran or dioxane at 20 ° C. to the boiling point of the solvent for about 0.5 to 5 hours to give a compound. It can be converted to (1l).
【0044】〔反応工程式8〕[Reaction Process Equation 8]
【0045】[0045]
【化10】 [Chemical 10]
【0046】〔式中R1d、R3 及びYは前記に同じ。〕
反応工程式8に示す化合物(1m)の化合物(1n)へ
の変換反応は、メタノール、エタノール、酢酸等の不活
性溶媒中、濃塩酸、濃硫酸等の酸の存在下、50℃〜溶
媒の沸点の温度で1〜6時間程度処理して実施され得
る。[Wherein R 1d , R 3 and Y are the same as defined above]. ]
The conversion reaction of the compound (1m) shown in the reaction process formula 8 to the compound (1n) is carried out in an inert solvent such as methanol, ethanol, acetic acid or the like in the presence of an acid such as concentrated hydrochloric acid or concentrated sulfuric acid at 50 ° C to the solvent. The treatment may be carried out at the boiling temperature for about 1 to 6 hours.
【0047】〔反応工程式9〕[Reaction Process Formula 9]
【0048】[0048]
【化11】 [Chemical 11]
【0049】〔式中R1b、R2d、R3 、X及びYは前記
に同じ。R4bは低級アルカノイル基を、R5aは低級アル
キル基、低級アルケニル基又は低級アルコキシカルボニ
ル低級アルキル基をそれぞれ示す。〕反応工程式9に示
す化合物(1p)と化合物(9)との反応は、不活性溶
媒中、塩基の存在下に行なわれる。不活性溶媒として
は、例えばN,N−ジメチルホルムアミド、ジメチルス
ルホキシド、テトラヒドロフラン等を、塩基としては、
例えば水素化ナトリウム、ナトリウムエトキシド、炭酸
カリウム、炭酸ナトリウム等を例示できる。之等塩基の
使用量は通常1〜5当量、好ましくは1〜2当量とする
のがよく、反応は0℃〜溶媒の沸点の温度条件で1〜4
8時間を要して実施され、かくして化合物(1q)を収
得できる。[Wherein R 1b , R 2d , R 3 , X and Y are the same as defined above. R 4b represents a lower alkanoyl group, and R 5a represents a lower alkyl group, a lower alkenyl group or a lower alkoxycarbonyl lower alkyl group. The reaction of the compound (1p) shown in the reaction process formula 9 with the compound (9) is carried out in the presence of a base in an inert solvent. Examples of the inert solvent include N, N-dimethylformamide, dimethylsulfoxide, tetrahydrofuran and the like, and examples of the base include:
Examples thereof include sodium hydride, sodium ethoxide, potassium carbonate, sodium carbonate and the like. The amount of the homo-base used is usually 1 to 5 equivalents, preferably 1 to 2 equivalents, and the reaction is 1 to 4 under the temperature condition of 0 ° C. to the boiling point of the solvent.
It is carried out in 8 hours, and thus compound (1q) can be obtained.
【0050】〔反応工程式10〕[Reaction Process Formula 10]
【0051】[0051]
【化12】 [Chemical 12]
【0052】〔式中R1b、R3 、R4b、R5a及びYは前
記に同じ。R2eは低級アルキル基、フェニル基、シアノ
低級アルキル基、低級アルコキシカルボニル低級アルキ
ル基又はハロゲン置換低級アルキル基を、R1eは低級ア
ルキル基、低級アルケニル基、カルボキシ低級アルキル
基、ハロゲン置換低級アルキル基、フェニル低級アルキ
ル基又は置換基としてハロゲン原子及び低級アルコキシ
基から選ばれる基を有することのあるフェニル基を、R
2fは、低級アルキル基、フェニル基、カルボキシ低級ア
ルキル基又はハロゲン置換低級アルキル基を、R5bは低
級アルキル基、低級アルケニル基又はカルボキシ低級ア
ルキル基をそれぞれ示す。〕反応工程式10における化
合物(1r)の加水分解反応は、メタノール、エタノー
ル、プロパノール等のアルコール系溶媒中或は水中で、
希塩酸、希硫酸等の酸を用いて行なわれる。反応は20
℃〜溶媒の沸点の温度条件で10分〜6時間程度を要し
て実施される。[In the formula, R 1b , R 3 , R 4b , R 5a and Y are the same as defined above. R 2e is a lower alkyl group, a phenyl group, a cyano lower alkyl group, a lower alkoxycarbonyl lower alkyl group or a halogen-substituted lower alkyl group, and R 1e is a lower alkyl group, a lower alkenyl group, a carboxy lower alkyl group, a halogen-substituted lower alkyl group. A phenyl lower alkyl group or a phenyl group which may have a group selected from a halogen atom and a lower alkoxy group as a substituent,
2f represents a lower alkyl group, a phenyl group, a carboxy lower alkyl group or a halogen-substituted lower alkyl group, and R 5b represents a lower alkyl group, a lower alkenyl group or a carboxy lower alkyl group. The hydrolysis reaction of the compound (1r) in the reaction process formula 10 is carried out in an alcohol solvent such as methanol, ethanol, propanol or in water.
It is performed using an acid such as dilute hydrochloric acid or dilute sulfuric acid. 20 reactions
It takes about 10 minutes to 6 hours under the temperature condition of ℃ to the boiling point of the solvent.
【0053】〔反応工程式11〕[Reaction Process Formula 11]
【0054】[0054]
【化13】 [Chemical 13]
【0055】〔式中R3 及びYは前記に同じ。R1gは水
素原子、低級アルキル基、低級アルケニル基、低級アル
コキシカルボニル低級アルキル基、ハロゲン置換低級ア
ルキル基、フェニル低級アルキル基又は置換基としてハ
ロゲン原子及び低級アルコキシ基から選ばれる基を有す
ることのあるフェニル基を、R2gは水素原子、低級アル
キル基、フェニル基、ヒドロキシ低級アルキル基、シア
ノ低級アルキル基、低級アルコキシカルボニル低級アル
キル基又はハロゲン置換低級アルキル基を示す。但し上
記R1gとR2gの少なくとも一方は低級アルコキシカルボ
ニル低級アルキル基であるものとする。R4c及びR5cは
同一又は異なって水素原子、低級アルキル基又は低級ア
ルケニル基を、R1hは水素原子、低級アルキル基、低級
アルケニル基、カルボキシ低級アルキル基、ハロゲン置
換低級アルキル基、フェニル低級アルキル基又は置換基
としてハロゲン原子及び低級アルコキシ基から選ばれる
基を有することのあるフェニル基を、R2hは水素原子、
低級アルキル基、フェニル基、ヒドロキシ低級アルキル
基、カルボキシ低級アルキル基又はハロゲン置換低級ア
ルキル基をそれぞれ示す。但し上記R1hとR2hの少なく
とも一方はカルボキシ低級アルキル基であるものとす
る。〕反応工程式11における化合物(1t)の加水分
解反応は、酸性条件下及びアルカリ性条件下のいずれで
も行ない得る。酸性条件で反応を行なわせる場合、該反
応は前記反応工程式10に示した方法と同様にして実施
できる。アルカリ性条件で反応を行なわせる場合、該反
応は例えばメタノール、エタノール、プロパノール、水
等の溶媒中、アルカリとして水酸化ナトリウム水溶液、
水酸化カリウム水溶液等を用いて、20℃〜溶媒の沸点
の温度条件で30分〜24時間程度を要して実施され
る。[Wherein R 3 and Y are the same as defined above]. R 1g may have a hydrogen atom, a lower alkyl group, a lower alkenyl group, a lower alkoxycarbonyl lower alkyl group, a halogen-substituted lower alkyl group, a phenyl lower alkyl group, or a substituent selected from a halogen atom and a lower alkoxy group. A phenyl group, R 2g represents a hydrogen atom, a lower alkyl group, a phenyl group, a hydroxy lower alkyl group, a cyano lower alkyl group, a lower alkoxycarbonyl lower alkyl group or a halogen-substituted lower alkyl group. However, at least one of R 1g and R 2g is a lower alkoxycarbonyl lower alkyl group. R 4c and R 5c are the same or different and each is a hydrogen atom, a lower alkyl group or a lower alkenyl group, and R 1h is a hydrogen atom, a lower alkyl group, a lower alkenyl group, a carboxy lower alkyl group, a halogen-substituted lower alkyl group, a phenyl lower alkyl group. A phenyl group which may have a group selected from a halogen atom and a lower alkoxy group as a group or a substituent, R 2h is a hydrogen atom,
A lower alkyl group, a phenyl group, a hydroxy lower alkyl group, a carboxy lower alkyl group or a halogen-substituted lower alkyl group is shown respectively. However, at least one of R 1h and R 2h is a carboxy lower alkyl group. The hydrolysis reaction of the compound (1t) in Reaction Scheme 11 can be carried out under either acidic conditions or alkaline conditions. When the reaction is carried out under acidic conditions, the reaction can be carried out in the same manner as in the method shown in the reaction scheme 10. When the reaction is carried out under alkaline conditions, the reaction is carried out, for example, in a solvent such as methanol, ethanol, propanol or water, as an alkali, an aqueous solution of sodium hydroxide,
It is carried out using a potassium hydroxide aqueous solution or the like at a temperature condition of 20 ° C. to the boiling point of the solvent for about 30 minutes to 24 hours.
【0056】〔反応工程式12〕[Reaction Process Formula 12]
【0057】[0057]
【化14】 [Chemical 14]
【0058】〔式中R1b、22d、R3 及びYは前記に同
じ。R4d及びR5dは同一又は異なって低級アルキル基を
示す。〕反応工程式12に示す化合物(1v)とアルデ
ヒド(10)との反応は、ギ酸中、70〜150℃の温
度条件で0.5〜20時間程度を要して実施される。本
反応においては、アルデヒド(10)やギ酸が溶媒を兼
ねるので、特に他の不活性溶媒を必要としない。[Wherein R 1b , 2 2d , R 3 and Y are the same as defined above]. R 4d and R 5d are the same or different and each represents a lower alkyl group. The reaction of the compound (1v) shown in the reaction process formula 12 with the aldehyde (10) is carried out in formic acid at a temperature condition of 70 to 150 ° C. for about 0.5 to 20 hours. In this reaction, since the aldehyde (10) and formic acid also serve as a solvent, another inert solvent is not particularly required.
【0059】上記の各反応工程式に示した各工程におけ
る目的化合物は、通常の分離手段、例えば吸着クロマト
グラフィー、プレパラティブ薄膜クロマトグラフィー、
再結晶、溶媒抽出等の各種方法により容易に単離するこ
とができる。The target compound in each step shown in each of the above reaction schemes can be isolated by a conventional separation means such as adsorption chromatography, preparative thin film chromatography,
It can be easily isolated by various methods such as recrystallization and solvent extraction.
【0060】[0060]
【発明の効果】前記一般式(1)で表わされる本発明の
ピラゾロキノリン及びピラゾロナフチリジン誘導体は、
優れた抗炎症作用、免疫調節作用、鎮痛作用、解熱作用
等を有しており、免疫調節剤、消炎・鎮痛・解熱剤とし
て、慢性関節リウマチ、腎炎、乾癬、全身性エリテマト
ーデス、腰痛症等の治療及び予防に有用である。The pyrazoloquinoline and pyrazolonaphthyridine derivatives of the present invention represented by the above general formula (1) are
It has excellent anti-inflammatory, immunomodulatory, analgesic and antipyretic effects, and is used as an immunomodulator, anti-inflammatory / analgesic / antipyretic agent for the treatment of rheumatoid arthritis, nephritis, psoriasis, systemic lupus erythematosus, lumbago, etc. It is also useful for prevention.
【0061】[0061]
【実施例】以下に実施例を示し、本発明の特徴とすると
ころをより一層明瞭にする。EXAMPLES Examples will be shown below to further clarify the characteristics of the present invention.
【0062】[0062]
【実施例1】3−アミノ−1,5−ジメチル−1H,5
H−ピラゾロ〔4,3−c〕キノリン−4−オンの製造 3−シアノ−1,2−ジヒドロ−4−ヒドロキシ−1−
メチル−2−オキソキノリン20g(0.1M)にジエ
チルアニリン30mlを加え、さらにオキシ塩化リン1
20mlを加え、90℃で30分間攪拌した。次いで、
過剰のオキシ塩化リンを減圧下に留去した後、残渣を氷
水に移し、析出した結晶を濾取し、水洗し、さらにエタ
ノールで洗浄した後、乾燥して19gの4−クロロ−3
−シアノ−1,2−ジヒドロ−1−メチル−2−オキソ
キノリンを得た。Example 1 3-Amino-1,5-dimethyl-1H, 5
Preparation of H-pyrazolo [4,3-c] quinolin-4-one 3-Cyano-1,2-dihydro-4-hydroxy-1-
To 20 g (0.1M) of methyl-2-oxoquinoline, 30 ml of diethylaniline was added, and phosphorus oxychloride 1 was added.
20 ml was added and stirred at 90 ° C. for 30 minutes. Then
After distilling off excess phosphorus oxychloride under reduced pressure, the residue was transferred to ice water, and the precipitated crystals were collected by filtration, washed with water, further washed with ethanol, and dried to give 19 g of 4-chloro-3.
-Cyano-1,2-dihydro-1-methyl-2-oxoquinoline was obtained.
【0063】次いで、この化合物7.6gをメタノール
50mlに懸濁し、これにメチルヒドラジン5.5ml
を加え、室温で1時間攪拌し、さらに30分間還流し、
室温まで冷却した後、生成した結晶を濾取して、塩化メ
チレン−メタノール混合溶媒で再結晶すると、3−アミ
ノ−1,5−ジメチル−1H,5H−ピラゾロ〔4,3
−c〕キノリン−4−オン6.94gを得た。この化合
物を第1表に示す。Then, 7.6 g of this compound was suspended in 50 ml of methanol, and 5.5 ml of methylhydrazine was added thereto.
Was added, and the mixture was stirred at room temperature for 1 hour and refluxed for 30 minutes,
After cooling to room temperature, the formed crystals were collected by filtration and recrystallized from a mixed solvent of methylene chloride-methanol to give 3-amino-1,5-dimethyl-1H, 5H-pyrazolo [4,3
There was obtained 6.94 g of -c] quinolin-4-one. This compound is shown in Table 1.
【0064】[0064]
【実施例2〜18】適当な出発物質を用いて実施例1と
同様にして、本発明の各化合物を得た。これらの化合物
を第1表に示す。Examples 2 to 18 Each compound of the present invention was obtained in the same manner as in Example 1 using appropriate starting materials. These compounds are shown in Table 1.
【0065】[0065]
【実施例19】カルバジン酸メチルを用いて、メタノー
ル中3日間還流し、水を加えて得られた結晶をシリカゲ
ルクロマトグラフィー(AcOEt:CH2Cl2 =
1:1)で精製することにより本発明の化合物を得た。
この化合物を第1表に示す。Example 19 Methyl carbazate was refluxed in methanol for 3 days, and water was added to the obtained crystals to obtain silica gel chromatography (AcOEt: CH 2 Cl 2 =).
The compound of the present invention was obtained by purification with 1: 1).
This compound is shown in Table 1.
【0066】[0066]
【実施例20〜24】2−シアノエチルヒドラジン、6
−シアノヘキシルヒドラジン又はヒドラジンエタノール
を用い、実施例1と同様の操作を行ない、反応生成物を
結晶化させて精製して、1位置換若しくは2位置換ピラ
ゾロキノリン誘導体を得た。これらの化合物を第1表示
す。尚、上記結晶化にあたっては、溶媒として、実施例
20ではエタノールを、実施例22ではクロロホルム
を、実施例23及び実施例24ではエタノールをそれぞ
れ用いた。また、実施例21ではクロロホルムで抽出さ
せた後のクロロホルム可溶分を塩化メチレンで結晶化さ
せることにより精製を行なった。Examples 20-24 2-Cyanoethylhydrazine, 6
Using cyanohexylhydrazine or hydrazineethanol, the same operation as in Example 1 was performed, and the reaction product was crystallized and purified to obtain a 1-substituted or 2-substituted pyrazoloquinoline derivative. These compounds are labeled first. In the crystallization, ethanol was used in Example 20, chloroform was used in Example 22, and ethanol was used in Examples 23 and 24 as the solvent. Further, in Example 21, purification was performed by crystallizing the chloroform-soluble component after extraction with chloroform with methylene chloride.
【0067】[0067]
【実施例25】3−アセチルアミノ−1,5−ジメチル
−1H,5H−ピラゾロ〔4,3−c〕キノリン−4−
オンの製造 3−アミノ−1,5−ジメチル−1H,5H−ピラゾロ
〔4,3−c〕キノリン−4−オン1.4gを90℃で
ピリジン30mlに溶解させ、70℃でアセチルクロラ
イド0.87mlを滴下し、10分間攪拌した。その
後、ピリジンを減圧下に留去し、残渣に水を加え、塩化
メチレンで抽出した。Example 25 3-Acetylamino-1,5-dimethyl-1H, 5H-pyrazolo [4,3-c] quinoline-4-
Production of O-one 1.4 g of 3-amino-1,5-dimethyl-1H, 5H-pyrazolo [4,3-c] quinolin-4-one was dissolved in 30 ml of pyridine at 90 ° C., and acetyl chloride of 0.1. 87 ml was added dropwise and stirred for 10 minutes. Then, pyridine was distilled off under reduced pressure, water was added to the residue, and the mixture was extracted with methylene chloride.
【0068】次いで、有機層を無水硫酸マグネシウムで
乾燥後、濃縮し、シリカゲルクロマトグラフィー(CH
2 Cl2 :MeOH=30:1→20:1)で精製し
て、3−アセチルアミノ−1,5−ジメチル−1H,5
H−ピラゾロ〔4,3−c〕キノリン−4−オン1.0
3gを得た。この化合物を第1表に示す。Then, the organic layer was dried over anhydrous magnesium sulfate, concentrated, and subjected to silica gel chromatography (CH
2 Cl 2: MeOH = 30: 1 → 20: 1) to afford 3-acetylamino-1,5-dimethyl-1H, 5
H-pyrazolo [4,3-c] quinolin-4-one 1.0
3 g was obtained. This compound is shown in Table 1.
【0069】[0069]
【実施例26】4,5−ジヒドロ−1,5−ジメチル−
3−メタンスルホニルアミノ−4−オキソピラゾロ
〔4,5−c〕キノリンの製造 実施例25においてアセチルクロライドにかえて、メタ
ンスルホニルクロライド0.95mlを用い、70℃で
30分間攪拌した後、ピリジンを留去し、水を加えて析
出した結晶を濾取し、さらに塩化メチレン−メタノール
混合溶液にて還流洗浄し、冷却後に得られた結晶を濾取
して、0.99gの1,5−ジメチル−3−メタンスル
ホニルアミノ−1H,5H−オキソピラゾロ〔4,3−
c〕キノリン−4−オンを得た。この化合物を第1表に
示す。Example 26 4,5-Dihydro-1,5-dimethyl-
Production of 3-methanesulfonylamino-4-oxopyrazolo [4,5-c] quinoline In Example 25, acetyl chloride was replaced with 0.95 ml of methanesulfonyl chloride, and the mixture was stirred at 70 ° C for 30 minutes, and then pyridine was distilled off. After removal, water was added and the precipitated crystals were collected by filtration, further washed with a methylene chloride-methanol mixed solution under reflux, and the crystals obtained after cooling were collected by filtration to give 0.99 g of 1,5-dimethyl-. 3-Methanesulfonylamino-1H, 5H-oxopyrazolo [4,3-
c] Quinolin-4-one was obtained. This compound is shown in Table 1.
【0070】[0070]
【実施例27】3−アミノ−2,5−ジメチル−2H,
5H−ピラゾロ〔4,3−c〕キノリン−4−オンの製
造 3−アミノ−5−メチル−1H,5H−ピラゾロ〔4,
3−c〕キノリン−4−オン1.2g、炭酸カリウム
1.3g及びヨウ化メチル1.25mlをN,N−ジメ
チルアセトアミド30mlに懸濁させ、40℃で4時間
攪拌した。 次いで、反応混合物を水に移して塩化メチ
レンで抽出し、有機層を水洗した後、無水硫酸マグネシ
ウムで乾燥し、溶媒を留去後、シリカゲルクロマトグラ
フィー(CH2 Cl2 :MeOH=10:1)で精製
し、得られた結晶を酢酸エチルで洗浄し、母液にn−ヘ
キサンを加え、析出した結晶を濾取し、110mgの3
−アミノ−2,5−ジメチル−2H,5H−ピラゾロ
〔4,3−c〕キノリン−4−オンを得た。この化合物
を第1表に示す。Example 27 3-Amino-2,5-dimethyl-2H,
Preparation of 5H-pyrazolo [4,3-c] quinolin-4-one 3-amino-5-methyl-1H, 5H-pyrazolo [4,4
3-c] Quinolin-4-one (1.2 g), potassium carbonate (1.3 g) and methyl iodide (1.25 ml) were suspended in N, N-dimethylacetamide (30 ml), and the mixture was stirred at 40 ° C for 4 hr. Then, the reaction mixture was transferred to water and extracted with methylene chloride, the organic layer was washed with water, dried over anhydrous magnesium sulfate, and the solvent was distilled off, followed by silica gel chromatography (CH 2 Cl 2 : MeOH = 10: 1). The resulting crystals were washed with ethyl acetate, n-hexane was added to the mother liquor, and the precipitated crystals were collected by filtration to obtain 110 mg of 3
-Amino-2,5-dimethyl-2H, 5H-pyrazolo [4,3-c] quinolin-4-one was obtained. This compound is shown in Table 1.
【0071】[0071]
【実施例28】3−アミノ−1H,5H−ピラゾロ
〔4,3−c〕キノリン−4−オンの製造 3−アミノ−5−ベンジル−1H,5H−ピラゾロ
〔4,3−c〕キノリン−4−オン1.0gを47%臭
化水素酸30mlと酢酸5mlに懸濁して、100℃で
6時間攪拌した。冷却後、NaOH水溶液でアルカリ性
にして、酢酸エチルで水溶液を洗浄し、その後水溶液を
クエン酸水溶液でpH4にして、析出した結晶を濾取
し、乾燥させて、390mgの3−アミノ−1H,5H
−ピラゾロ〔4,3−c〕キノリン−4−オンを得た。
この化合物を第1表に示す。Example 28 Preparation of 3-amino-1H, 5H-pyrazolo [4,3-c] quinolin-4-one 3-amino-5-benzyl-1H, 5H-pyrazolo [4,3-c] quinoline- 1.0 g of 4-one was suspended in 30 ml of 47% hydrobromic acid and 5 ml of acetic acid and stirred at 100 ° C. for 6 hours. After cooling, it was made alkaline with aqueous NaOH and washed with ethyl acetate, after which the aqueous solution was adjusted to pH 4 with aqueous citric acid, the precipitated crystals were filtered off and dried, 390 mg of 3-amino-1H, 5H.
-Pyrazolo [4,3-c] quinolin-4-one was obtained.
This compound is shown in Table 1.
【0072】[0072]
【実施例29】適当な出発物質を用いて実施例28と同
様にして、本発明の化合物を得た。この化合物を第1表
に示す。Example 29 The compound of the present invention was obtained in the same manner as in Example 28 using appropriate starting materials. This compound is shown in Table 1.
【0073】[0073]
【実施例30〜43】適当な出発物質を用いて実施例1
と同様にして、本発明の各化合物を得た。之等の化合物
を第1表に示す。Examples 30-43 Example 1 with appropriate starting materials
Each compound of the present invention was obtained in the same manner as. The compounds are shown in Table 1.
【0074】[0074]
【実施例44〜48】適当な出発原料を用いて実施例2
5と同様にして、本発明の各化合物を得た。之等の化合
物を第1表に示す。Examples 44-48 Example 2 using appropriate starting materials
In the same manner as in 5, each compound of the present invention was obtained. The compounds are shown in Table 1.
【0075】[0075]
【実施例49】3−アミノ−5−n−ブチル−1−メチ
ル−1H,5H−ピラゾロ〔4,3−c〕キノリン−4
−オンの製造 60%水素化ナトリウム0.5gのDMF(50ml)
懸濁液を氷冷し、これに実施例29で得られた化合物
2.4gを加えて10分間攪拌し、続いてヨウ化n−ブ
チル1.8mlを注入して室温で2時間攪拌した。。反
応混合物に水を加え、生じた結晶を濾取し、これを酢酸
エチル−ジクロロメタンに溶かし無水硫酸マグネシウム
で乾燥して濃縮した。残渣を酢酸エチル−ジクロロメタ
ンで再結晶して目的化合物1.1gを得た。このものの
融点及び 1H−NMRスペクトルは、実施例33で得ら
れた化合物のそれと同一であった。Example 49 3-Amino-5-n-butyl-1-methyl-1H, 5H-pyrazolo [4,3-c] quinoline-4
-Production of ON 60% sodium hydride 0.5 g DMF (50 ml)
The suspension was ice-cooled, 2.4 g of the compound obtained in Example 29 was added thereto, and the mixture was stirred for 10 minutes, subsequently 1.8 ml of n-butyl iodide was added, and the mixture was stirred at room temperature for 2 hours. . Water was added to the reaction mixture, and the generated crystals were collected by filtration, dissolved in ethyl acetate-dichloromethane, dried over anhydrous magnesium sulfate and concentrated. The residue was recrystallized from ethyl acetate-dichloromethane to obtain 1.1 g of the target compound. The melting point and 1 H-NMR spectrum of this product were the same as those of the compound obtained in Example 33.
【0076】[0076]
【実施例50〜53】適当な出発物質を用いて実施例4
9と同様にして、本発明の各化合物を得た。之等の化合
物を第1表に示す。Examples 50-53 Example 4 Using the Appropriate Starting Materials
In the same manner as in 9, each compound of the present invention was obtained. The compounds are shown in Table 1.
【0077】[0077]
【実施例54】3−(N−アセチル−N−メチルアミ
ノ)−1,5−ジメチル−1H,5H−ピラゾロ〔4,
3−c〕キノリン−4−オンの製造 60%水素化ナトリウム470mgのDMF(40m
l)懸濁液を氷冷し、これに実施例25で得られた化合
物2.7gを加えて10分間攪拌し、続いてヨウ化メチ
ル1.7gを注入して室温で1.5時間攪拌した。。反
応混合物に水を加え、生じた結晶を濾取し、これをジク
ロロメタン−メタノールで再結晶して目的化合物2.5
gを得た。この化合物を第1表に示す。Example 54 3- (N-acetyl-N-methylamino) -1,5-dimethyl-1H, 5H-pyrazolo [4,4
Preparation of 3-c] quinolin-4-one 60% sodium hydride 470 mg DMF (40 m
l) The suspension was ice-cooled, 2.7 g of the compound obtained in Example 25 was added thereto, and the mixture was stirred for 10 minutes, subsequently 1.7 g of methyl iodide was added, and the mixture was stirred at room temperature for 1.5 hours. did. . Water was added to the reaction mixture, the generated crystals were collected by filtration, and recrystallized from dichloromethane-methanol to give the desired compound 2.5.
g was obtained. This compound is shown in Table 1.
【0078】[0078]
【実施例55〜59】適当な出発原料を用いて実施例5
4と同様にして、本発明の各化合物を得た。之等の化合
物を第1表に示す。Examples 55-59 Example 5 using appropriate starting materials
In the same manner as in 4, each compound of the present invention was obtained. The compounds are shown in Table 1.
【0079】[0079]
【実施例60】1,5−ジメチル−3−(N−メチルア
ミノ)−1H,5H−ピラゾロ〔4,3−c〕キノリン
−4−オンの製造 実施例54で得られた化合物2gをメタノール50ml
に溶かし、塩酸25mlを加えて100℃で1.5時間
加熱した。反応液を濃縮し、1N水酸化ナトリウム水溶
液を加えてpHを8とし、ジクロロメタンで抽出した。
ジクロロメタン層を集め、無水硫酸マグネシウムで乾燥
して濃縮した。得られた粗結晶をジエチルエーテルで洗
浄して目的化合物1.5gを得た。この化合物を第1表
に示す。Example 60 Preparation of 1,5-dimethyl-3- (N-methylamino) -1H, 5H-pyrazolo [4,3-c] quinolin-4-one 2 g of the compound obtained in Example 54 was added to methanol. 50 ml
25 ml of hydrochloric acid was added, and the mixture was heated at 100 ° C. for 1.5 hours. The reaction mixture was concentrated, 1N aqueous sodium hydroxide solution was added to adjust the pH to 8, and the mixture was extracted with dichloromethane.
The dichloromethane layers were collected, dried over anhydrous magnesium sulfate and concentrated. The obtained crude crystals were washed with diethyl ether to obtain 1.5 g of the target compound. This compound is shown in Table 1.
【0080】[0080]
【実施例61〜65】適当な出発物質を用いて実施例6
0と同様にして、本発明の各化合物を得た。之等の化合
物を第1表に示す。Examples 61-65 Example 6 with appropriate starting materials
In the same manner as in 0, each compound of the present invention was obtained. The compounds are shown in Table 1.
【0081】[0081]
【実施例66】5−エチル−1−メチル−3−(N−メ
チルアミノ)−1H,5H−ピラゾロ〔4,3−c〕キ
ノリン−4−オン製造 実施例44で得られた化合物を原料として用い、実施例
54と同様にして、3−(N−アセチル−N−メチルア
ミノ)−5−エチル−1−メチル−1H,5H−ピラゾ
ロ〔4,3−c〕キノリン−4−オンを得た。この化合
物を第1表に示す。Example 66 Preparation of 5-ethyl-1-methyl-3- (N-methylamino) -1H, 5H-pyrazolo [4,3-c] quinolin-4-one The compound obtained in Example 44 was used as a starting material. And 3- (N-acetyl-N-methylamino) -5-ethyl-1-methyl-1H, 5H-pyrazolo [4,3-c] quinolin-4-one in the same manner as in Example 54. Obtained. This compound is shown in Table 1.
【0082】[0082]
【実施例67〜69】適当な出発原料を用いて実施例6
6と同様にして、本発明の各化合物を得た。之等の化合
物を第1表に示す。Examples 67-69 Example 6 using appropriate starting materials
In the same manner as in 6, each compound of the present invention was obtained. The compounds are shown in Table 1.
【0083】[0083]
【実施例70】3−アミノ−5−カルボキシメチル−1
−メチル−1H,5H−ピラゾロ〔4,3−c〕キノリ
ン−4−オン製造 実施例53で得られた化合物1.5gをエタノール10
mlに溶かし、これに2N水酸化ナトリウム水溶液50
mlを加えて、70℃で1時間攪拌した。放冷後、氷水
中に注ぎ込み、塩酸を滴下して中和し、更にクエン酸水
溶液を加えた。析出した結晶を濾取し、エタノール及び
ジエチルエーテルで順次洗浄して目的化合物1.43g
を得た。この化合物を第1表に示す。Example 70 3-Amino-5-carboxymethyl-1
-Methyl-1H, 5H-pyrazolo [4,3-c] quinolin-4-one Preparation 1.5 g of the compound obtained in Example 53 was added to ethanol 10
Dissolve in 50 ml of 2N aqueous sodium hydroxide solution.
ml was added and the mixture was stirred at 70 ° C. for 1 hour. After allowing to cool, the mixture was poured into ice water, hydrochloric acid was added dropwise to neutralize, and an aqueous citric acid solution was added. The precipitated crystals are collected by filtration, washed successively with ethanol and diethyl ether to give the desired compound (1.43 g)
Got This compound is shown in Table 1.
【0084】[0084]
【実施例71】実施例31で得られた化合物を用いて、
実施例70と同様にして、本発明の化合物を得た。この
化合物を第1表に示す。Example 71 Using the compound obtained in Example 31,
The compound of the present invention was obtained in the same manner as in Example 70. This compound is shown in Table 1.
【0085】[0085]
【実施例72】1,5−ジメチル−3−(N−ホルミル
アミノ)−1H,5H−ピラゾロ〔4,3−c〕キノリ
ン−4−オンの製造 実施例1で得られた化合物2gをギ酸50mlに溶解
し、20時間加熱還流した。反応終了後、減圧濃縮し、
残渣にジエチルエーテルを加え、生じた結晶を濾取し、
ジクロロメタン−メタノール(1:1)で洗浄して、目
的化合物2gを得た。この化合物を第1表に示す。Example 72 Preparation of 1,5-dimethyl-3- (N-formylamino) -1H, 5H-pyrazolo [4,3-c] quinolin-4-one 2 g of the compound obtained in Example 1 was converted into formic acid. It was dissolved in 50 ml and heated under reflux for 20 hours. After completion of the reaction, concentrated under reduced pressure,
Diethyl ether was added to the residue, and the resulting crystals were collected by filtration,
It was washed with dichloromethane-methanol (1: 1) to obtain 2 g of the target compound. This compound is shown in Table 1.
【0086】[0086]
【実施例73】11−メチル−パーヒドロ−1H−ピリ
ミジン〔2′,1′:5,1〕ピラゾロ〔4,3−c〕
キノリン−2,12(11H)−ジオンの製造 実施例22で用いられた化合物170mgを酢酸3ml
に溶解し、これに濃塩酸0.5mlを加え、110℃で
3時間加熱した。反応混合液を水中に注ぎ込み、生じた
粗結晶を濾取した。一方、濾液をジクロロメタンで抽出
し、無水硫酸ナトリウムで乾燥して濃縮し、得られた残
渣と前記の粗結晶とを合わせて、シリカゲルカラムクロ
マトグラフィー(溶出液…クロロホルム:メタノール=
20:1)で生成して、目的化合物50mgを得た。こ
の化合物を第1表に示す。Example 73 11-Methyl-perhydro-1H-pyrimidine [2 ', 1': 5,1] pyrazolo [4,3-c]
Production of Quinoline-2,12 (11H) -dione 170 mg of the compound used in Example 22 was added to 3 ml of acetic acid.
Was dissolved in, and 0.5 ml of concentrated hydrochloric acid was added, and the mixture was heated at 110 ° C. for 3 hours. The reaction mixture was poured into water and the resulting crude crystals were collected by filtration. On the other hand, the filtrate was extracted with dichloromethane, dried over anhydrous sodium sulfate and concentrated, and the obtained residue and the crude crystals were combined and subjected to silica gel column chromatography (eluent: chloroform: methanol =
20: 1) to give 50 mg of the desired compound. This compound is shown in Table 1.
【0087】[0087]
【実施例74】10−メチル−1H−イミダゾ〔2′,
1′:5,1〕ピラゾロ〔4,3−c〕キノリン−11
(10H)−オンの製造 60%水素化ナトリウム2.05gのDMF(100m
l)懸濁液を氷冷し、これに実施例5で得られた化合物
10gを加えて10分間攪拌し、続いてプロモアセトア
ルデヒドジエチルアセタール8.4mlを加えて60℃
で5時間攪拌した。反応混合物を水中に注ぎ込み、酢酸
エチルで抽出し、有機層を無水硫酸マグネシウムで乾燥
後、濃縮した。残渣にエタノール10ml及び4Nの塩
酸−ジオキサン50mlを加え、90℃で1時間加熱し
た。反応後、析出した沈殿を濾取し、これを水に溶かし
て不溶物を濾別し、濾液にアンモニア水を加えてアルカ
リ性としてた。生じた粗結晶を濾取してシリカゲルカラ
ムクロマトグラフィー(溶出液…クロロホルム:メタノ
ール=30:1→20:1)で精製し、更にクロロホル
ム−メタノールで再結晶して、目的化合物1.7gを得
た。この化合物を第1表に示す。Example 74 10-methyl-1H-imidazo [2 ′,
1 ′: 5,1] pyrazolo [4,3-c] quinoline-11
Preparation of (10H) -one 60% sodium hydride 2.05 g DMF (100 m
l) The suspension was ice-cooled, 10 g of the compound obtained in Example 5 was added thereto, and the mixture was stirred for 10 minutes, subsequently, 8.4 ml of promoacetaldehyde diethyl acetal was added, and the mixture was heated at 60 ° C.
And stirred for 5 hours. The reaction mixture was poured into water, extracted with ethyl acetate, the organic layer was dried over anhydrous magnesium sulfate, and concentrated. 10 ml of ethanol and 50 ml of 4N hydrochloric acid-dioxane were added to the residue, and the mixture was heated at 90 ° C. for 1 hour. After the reaction, the deposited precipitate was collected by filtration, dissolved in water and the insoluble matter was filtered off, and aqueous ammonia was added to the filtrate to make it alkaline. The resulting crude crystals were collected by filtration, purified by silica gel column chromatography (eluent: chloroform: methanol = 30: 1 → 20: 1), and recrystallized from chloroform-methanol to obtain 1.7 g of the target compound. It was This compound is shown in Table 1.
【0088】[0088]
【実施例75】1,5−ジメチル−3−(N,N−ジメ
チルアミノ)−1H,5H−ピラゾロ〔4,3−c〕キ
ノリン−4−オンの製造 実施例60で得られた化合物1g、ギ酸1.1ml及び
37%ホルムアルデヒド3.5gを混合し、100℃で
1時間加熱した。反応混合液に水を加え、ジクロロメタ
ンで抽出し、有機層を無水硫酸マグネシウムで乾燥して
濃縮した。残渣をジエチルエーテルより再結晶し、得ら
れた結晶を更にシリカゲルカラムクロマトグラフィー
(溶出液…クロロホルム:メタノール=50:1)で精
製して、目的化合物190mgを得た。この化合物を第
1表に示す。Example 75 Preparation of 1,5-dimethyl-3- (N, N-dimethylamino) -1H, 5H-pyrazolo [4,3-c] quinolin-4-one 1 g of the compound obtained in Example 60 , 1.1 ml of formic acid and 3.5 g of 37% formaldehyde were mixed and heated at 100 ° C. for 1 hour. Water was added to the reaction mixture, extraction was performed with dichloromethane, the organic layer was dried over anhydrous magnesium sulfate and concentrated. The residue was recrystallized from diethyl ether, and the obtained crystals were further purified by silica gel column chromatography (eluent: chloroform: methanol = 50: 1) to obtain 190 mg of the target compound. This compound is shown in Table 1.
【0089】上記各実施例で得られた本発明化合物の構
造と共に物性(融点及び1 H−NMR分析結果)を下記
第1表に示す。尚表中t−Buはtert−ブチル基を示
す。The structures (melting points and 1 H-NMR analysis results) of the compounds of the present invention obtained in each of the above Examples are shown in Table 1 below. In the table, t-Bu represents a tert-butyl group.
【0090】[0090]
【表1】 [Table 1]
【0091】[0091]
【表2】 [Table 2]
【0092】[0092]
【表3】 [Table 3]
【0093】[0093]
【表4】 [Table 4]
【0094】[0094]
【表5】 [Table 5]
【0095】[0095]
【表6】 [Table 6]
【0096】[0096]
【表7】 [Table 7]
【0097】[0097]
【表8】 [Table 8]
【0098】[0098]
【表9】 [Table 9]
【0099】[0099]
【表10】 [Table 10]
【0100】[0100]
【表11】 [Table 11]
【0101】[0101]
【表12】 [Table 12]
【0102】[0102]
【表13】 [Table 13]
【0103】[0103]
【表14】 [Table 14]
【0104】[0104]
【表15】 [Table 15]
【0105】[0105]
【表16】 [Table 16]
【0106】[0106]
【表17】 [Table 17]
【0107】[0107]
【表18】 [Table 18]
【0108】[0108]
【表19】 [Table 19]
【0109】[0109]
【表20】 [Table 20]
【0110】[0110]
【表21】 [Table 21]
【0111】[0111]
【表22】 [Table 22]
【0112】[0112]
【表23】 [Table 23]
【0113】[0113]
【表24】 [Table 24]
【0114】[0114]
【表25】 [Table 25]
フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 A61K 31/47 ABE 7252−4C ABG ACV (72)発明者 桑原 登志子 徳島県板野郡松茂町中喜来字中瀬中ノ越14 −21 (72)発明者 杉本 幸雄 徳島県鳴門市大津町吉永79番地の1 (72)発明者 上迫 卓司 徳島県板野郡松茂町広島字南川向51番地の 6Continuation of the front page (51) Int.Cl. 5 Identification number Reference number within the agency FI Technical indication location A61K 31/47 ABE 7252-4C ABG ACV (72) Inventor Toshiko Kuwahara Nakakira Nakashira, Nakashirai, Matsushige-cho, Itano-gun, Tokushima Prefecture Nogoshi 14-21 (72) Inventor Yukio Sugimoto 79-1 Yoshinaga, Otsu-cho, Naruto City, Tokushima Prefecture (72) Inventor Takuji Kamisako 6 51-51 Minamikawa, Minamikawa, Matsushige-cho, Itano-gun, Tokushima Prefecture
Claims (1)
ル基、カルボキシ低級アルキル基、低級アルコキシカル
ボニル低級アルキル基、ハロゲン置換低級アルキル基、
フェニル低級アルキル基又は置換基としてハロゲン原子
及び低級アルコキシ基から選ばれる基を有することのあ
るフェニル基を示し、R2 は水素原子、低級アルキル
基、フェニル基、ヒドロキシ低級アルキル基、シアノ低
級アルキル基、カルボキシ低級アルキル基、低級アルコ
キシカルボニル低級アルキル基、ハロゲン置換低級アル
キル基又は低級アルコキシカルボニル基を示し、R3 は
水素原子又はハロゲン原子を示し、R4及びR5 は同一
又は異なって水素原子、低級アルカノイル基、低級アル
キルスルホニル基、低級アルキル基、低級アルケニル
基、ホルミル基又はカルボキシ低級アルキル基を示す。
また、上記R2 とR4は互いに結合して基−CH2 −C
H2 −CO−又は基−CH=CH−を形成してもよい。
Yは−CH=基又は窒素原子を示し、破線はピラゾール
環に二重結合が2個存在することを示す。〕で表わされ
るピラゾロキノリン及びピラゾロナフチリジン誘導体。1. A general formula: [Wherein R 1 is a hydrogen atom, a lower alkyl group, a lower alkenyl group, a carboxy lower alkyl group, a lower alkoxycarbonyl lower alkyl group, a halogen-substituted lower alkyl group,
A phenyl lower alkyl group or a phenyl group which may have a group selected from a halogen atom and a lower alkoxy group as a substituent, R 2 is a hydrogen atom, a lower alkyl group, a phenyl group, a hydroxy lower alkyl group, a cyano lower alkyl group , A carboxy lower alkyl group, a lower alkoxycarbonyl lower alkyl group, a halogen-substituted lower alkyl group or a lower alkoxycarbonyl group, R 3 represents a hydrogen atom or a halogen atom, and R 4 and R 5 are the same or different and are hydrogen atoms, A lower alkanoyl group, a lower alkylsulfonyl group, a lower alkyl group, a lower alkenyl group, a formyl group or a carboxy lower alkyl group is shown.
R 2 and R 4 are bonded to each other to form a group —CH 2 —C.
H 2 -CO- or a group -CH = CH- may be formed.
Y represents a -CH = group or a nitrogen atom, and the broken line indicates that there are two double bonds in the pyrazole ring. ] The pyrazoloquinoline and the pyrazolonaphthyridine derivative represented by these.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4106477A JPH05132484A (en) | 1991-04-26 | 1992-04-24 | Pyrazoloquinoline and pyrazolonaphthylidene derivative |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9743991 | 1991-04-26 | ||
JP3-97439 | 1991-04-26 | ||
JP4106477A JPH05132484A (en) | 1991-04-26 | 1992-04-24 | Pyrazoloquinoline and pyrazolonaphthylidene derivative |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05132484A true JPH05132484A (en) | 1993-05-28 |
Family
ID=26438613
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4106477A Pending JPH05132484A (en) | 1991-04-26 | 1992-04-24 | Pyrazoloquinoline and pyrazolonaphthylidene derivative |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05132484A (en) |
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WO2005080392A1 (en) * | 2004-02-19 | 2005-09-01 | Takeda Pharmaceutical Company Limited | Pyrazoloquinolone derivative and use thereof |
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JP5666755B1 (en) * | 2013-04-05 | 2015-02-12 | エーザイ・アール・アンド・ディー・マネジメント株式会社 | Salts and crystals of pyrazoloquinoline derivatives |
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-
1992
- 1992-04-24 JP JP4106477A patent/JPH05132484A/en active Pending
Cited By (17)
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WO2004041819A1 (en) | 2002-11-06 | 2004-05-21 | Grelan Pharmaceutical Co., Ltd. | Pyrazolonaphthyridine derivative |
WO2005080392A1 (en) * | 2004-02-19 | 2005-09-01 | Takeda Pharmaceutical Company Limited | Pyrazoloquinolone derivative and use thereof |
US7842701B2 (en) | 2004-02-19 | 2010-11-30 | Takeda Pharmaceutical Company Limited | Pyrazoloquinolone derivative and use thereof |
WO2007032466A1 (en) | 2005-09-15 | 2007-03-22 | Aska Pharmaceutical Co., Ltd. | Heterocyclic compound, and production process and use thereof |
US8193356B2 (en) | 2005-09-15 | 2012-06-05 | Aska Pharmaceutical Co., Ltd. | Heterocycle compound, and production process and application thereof |
EA023493B1 (en) * | 2010-09-07 | 2016-06-30 | Астеллас Фарма Инк. | Pyrazoloquinoline compound |
WO2012033144A1 (en) | 2010-09-07 | 2012-03-15 | アステラス製薬株式会社 | Pyrazoloquinoline compound |
CN103097383A (en) * | 2010-09-07 | 2013-05-08 | 安斯泰来制药株式会社 | Pyrazoloquinoline compound |
US8822448B2 (en) | 2010-09-07 | 2014-09-02 | Astellas Pharma Inc. | Pyrazoloquinoline compound |
JP5888237B2 (en) * | 2010-09-07 | 2016-03-16 | アステラス製薬株式会社 | Pyrazoloquinoline compounds |
JP5666755B1 (en) * | 2013-04-05 | 2015-02-12 | エーザイ・アール・アンド・ディー・マネジメント株式会社 | Salts and crystals of pyrazoloquinoline derivatives |
US9550776B2 (en) | 2013-04-05 | 2017-01-24 | Eisai R&D Management Co., Ltd. | Pyridinylpyrazoloquinoline compounds |
US9573947B2 (en) | 2013-04-05 | 2017-02-21 | Eisai R&D Management Co., Ltd. | Salt of pyrazoloquinoline derivative, and crystal thereof |
US11147803B2 (en) | 2017-06-01 | 2021-10-19 | Eisai R&D Management Co., Ltd. | Dementia therapeutic agent combining pyrazoloquinoline derivative and memantine |
US11311530B2 (en) | 2017-06-01 | 2022-04-26 | Eisai R&D Management Co., Ltd. | Lewy body disease therapeutic agent containing pyrazoloquinoline derivative |
US11484502B2 (en) | 2017-06-01 | 2022-11-01 | Eisai R&D Management Co., Ltd. | Pharmaceutical composition comprising PDE9 inhibitor |
US11833146B2 (en) | 2017-06-01 | 2023-12-05 | Eisai R&D Management Co., Ltd. | Dementia therapeutic agent combining pyrazoloquinoline derivative and donepezil |
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