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JP6345957B2 - Metal-ceramic circuit board and manufacturing method thereof - Google Patents

Metal-ceramic circuit board and manufacturing method thereof Download PDF

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JP6345957B2
JP6345957B2 JP2014059648A JP2014059648A JP6345957B2 JP 6345957 B2 JP6345957 B2 JP 6345957B2 JP 2014059648 A JP2014059648 A JP 2014059648A JP 2014059648 A JP2014059648 A JP 2014059648A JP 6345957 B2 JP6345957 B2 JP 6345957B2
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circuit board
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JP2015185639A (en
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悟 井手口
悟 井手口
小山内 英世
英世 小山内
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Dowa Metaltech Co Ltd
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Description

本発明は、セラミックス基板に金属回路板が接合した金属−セラミックス回路基板およびその製造方法に関し、特に、パワーモジュールなどに使用される金属−セラミックス回路基板およびその製造方法に関する。   The present invention relates to a metal-ceramic circuit board in which a metal circuit board is bonded to a ceramic substrate and a manufacturing method thereof, and more particularly to a metal-ceramic circuit board used for a power module and the like and a manufacturing method thereof.

従来、パワーモジュールなどに使用される金属−セラミックス回路基板の製造方法として、金属溶湯をセラミックス基板上に流し込んだ後に冷却して固化させることによりセラミックス基板に金属板を接合し、その後、スクリーン印刷などにより所望の回路パターン形状のエッチングレジストを印刷し、エッチング処理を行って回路パターンを形成した後、エッチングレジストを剥離することにより、所望の回路パターンの金属回路板を有する金属−セラミックス回路基板を製造する方法が知られている(例えば、特許文献1参照)。   Conventionally, as a method of manufacturing a metal-ceramic circuit board used for a power module or the like, a metal plate is joined to a ceramic substrate by pouring a molten metal onto the ceramic substrate and then cooling and solidifying, and then screen printing, etc. A metal-ceramic circuit board having a metal circuit board having a desired circuit pattern is manufactured by printing an etching resist having a desired circuit pattern shape, forming a circuit pattern by performing an etching process, and then removing the etching resist. There is a known method (see, for example, Patent Document 1).

しかし、パワーモジュールなどに使用する金属−セラミックス回路基板では、金属回路板の厚さが数100μm以上もあり、通常の紙やガラスエポキシなどを絶縁材として使用するプリント回路基板の金属回路板の厚さの数十倍の厚さであるため、特許文献1に開示された方法では、エッチング処理により形成されるスカートの長さやサイドエッチング量が大きくなるという問題がある。特に、金属回路板の厚さが0.4mm以上で隣接する回路パターンの互いに対向する側面間の距離よりも大きくなると、金属板の厚さ方向と金属板の側面のエッチングレートの相違などにより、回路パターンのトップ(半導体などのチップが搭載される上面)とボトム(セラミックス基板と接触する底面)の寸法差が大きくなり、所望の寸法の回路パターンを得ることができなくなる。また、金属回路板が厚くなるほどエッチング処理時間が長くなり、工数が増えてコストが増大するとともに、エッチングレジストの耐性にも注意しなければならなくなる。   However, in the metal-ceramic circuit board used for power modules and the like, the thickness of the metal circuit board is several hundred μm or more, and the thickness of the metal circuit board of the printed circuit board using normal paper or glass epoxy as an insulating material. Since the thickness is several tens of times the thickness, the method disclosed in Patent Document 1 has a problem that the length of the skirt formed by the etching process and the amount of side etching increase. In particular, when the thickness of the metal circuit board is 0.4 mm or more and is larger than the distance between the side surfaces facing each other of the adjacent circuit pattern, due to the difference in etching rate between the thickness direction of the metal plate and the side surface of the metal plate, etc. The dimensional difference between the top (top surface on which a chip such as a semiconductor is mounted) and the bottom (bottom surface in contact with the ceramic substrate) of the circuit pattern becomes large, and a circuit pattern having a desired dimension cannot be obtained. Further, the thicker the metal circuit board is, the longer the etching process time is, the more man-hours are required, the cost is increased, and the resistance of the etching resist must be taken into consideration.

このような従来の問題を解消するため、金属溶湯をセラミックス基板に接触させた後に冷却して固化させることによってセラミックス基板に接合する回路用金属板の形状を予め回路パターンに類似した形状にすることにより、回路用金属板をエッチング処理して所望の回路パターンの金属回路板を形成する際のエッチング処理時間を短縮することができるとともに、回路用金属板が厚い場合でもファインパターンを形成することができる、金属−セラミックス回路基板の製造方法が提案されている(例えば、特許文献2参照)   In order to solve such a conventional problem, the shape of the metal plate for the circuit joined to the ceramic substrate is made to be similar to the circuit pattern in advance by bringing the molten metal into contact with the ceramic substrate and then cooling and solidifying it. The etching processing time for forming the metal circuit board having a desired circuit pattern by etching the circuit metal board can be reduced, and a fine pattern can be formed even when the circuit metal plate is thick. A metal-ceramic circuit board manufacturing method that can be used has been proposed (see, for example, Patent Document 2).

特開2002−76551号公報(段落番号0030、0048)JP 2002-76551 A (paragraph numbers 0030 and 0048) 特開2005−93965号公報(段落番号0006−0007)Japanese Patent Laying-Open No. 2005-93965 (paragraph numbers 0006-0007)

近年、金属回路板の厚さを1mm以上とさらに厚くしたり、エッチング処理により形成されるスカートの長さをさらに短くして面積を小さくした金属−セラミックス回路基板が望まれている。   In recent years, there has been a demand for metal-ceramic circuit boards in which the thickness of the metal circuit board is further increased to 1 mm or more, or the area of the skirt formed by the etching process is further shortened to reduce the area.

しかし、特許文献2の方法では、セラミックス基板に接合した回路用金属板の上面の回路パターンに略対応する所定の部分にエッチングレジストを印刷してエッチング液によりエッチング処理を行っており、金属回路板の厚さが1mm以上と厚くなると、エッチング処理の際にエッチング液に接触する金属回路板の側面の面積が大きくなり、回路パターンのトップとボトムの寸法差が大きくなって所望の寸法精度の回路パターンを得ることができなくなる。   However, in the method of Patent Document 2, an etching resist is printed on a predetermined portion substantially corresponding to the circuit pattern on the upper surface of the circuit metal plate bonded to the ceramic substrate, and the etching process is performed with the etching solution. When the thickness of the circuit board becomes thicker than 1 mm, the area of the side surface of the metal circuit board that comes into contact with the etching solution during the etching process increases, and the dimensional difference between the top and the bottom of the circuit pattern increases and the circuit with the desired dimensional accuracy. The pattern cannot be obtained.

したがって、本発明は、このような従来の問題点に鑑み、金属回路板が厚くても回路パターンのトップとボトムの寸法差が小さく、所望の寸法精度の回路パターンの金属回路板がセラミックス基板に接合した金属−セラミックス回路基板およびその製造方法を提供することを目的とする。   Therefore, in view of such a conventional problem, the present invention has a small dimensional difference between the top and bottom of the circuit pattern even if the metal circuit board is thick, and the metal circuit board having a circuit pattern with a desired dimensional accuracy is applied to the ceramic substrate. It is an object of the present invention to provide a bonded metal-ceramic circuit board and a method for manufacturing the same.

本発明者らは、上記課題を解決するために鋭意研究した結果、回路パターンに類似した形状になり且つ回路パターンに略対応する部分以外の厚さが回路パターンに略対応する部分の厚さより薄くなるように形成した金属板をセラミックス基板に接合し、金属板の略全面にレジストを塗布した後、金属板の回路パターンに略対応する部分以外の部分の表面に塗布されたレジストの少なくとも一部を除去し、エッチング処理により金属板の回路パターンに略対応する部分以外の部分を除去することにより、金属回路板が厚くても回路パターンのトップとボトムの寸法差が小さく、所望の寸法精度の回路パターンの金属回路板がセラミックス基板に接合した金属−セラミックス回路基板を製造することができることを見出し、本発明を完成するに至った。   As a result of intensive studies to solve the above problems, the present inventors have a shape similar to a circuit pattern, and a thickness other than a portion substantially corresponding to the circuit pattern is thinner than a thickness of a portion substantially corresponding to the circuit pattern. After joining the formed metal plate to the ceramic substrate and applying the resist to substantially the entire surface of the metal plate, at least a part of the resist applied to the surface of the portion other than the portion substantially corresponding to the circuit pattern of the metal plate By removing the part other than the part that substantially corresponds to the circuit pattern of the metal plate by etching, the dimensional difference between the top and bottom of the circuit pattern is small even if the metal circuit board is thick, and the desired dimensional accuracy is achieved. It has been found that a metal-ceramic circuit board in which a metal circuit board having a circuit pattern is bonded to a ceramic board can be manufactured, and the present invention has been completed. It was.

すなわち、本発明による金属−セラミックス回路基板の製造方法は、回路パターンに類似した形状になり且つ回路パターンに略対応する部分以外の厚さが回路パターンに略対応する部分の厚さより薄くなるように形成した金属板をセラミックス基板に接合し、金属板の略全面にレジストを塗布した後、金属板の回路パターンに略対応する部分以外の部分の表面に塗布されたレジストの少なくとも一部を除去し、エッチング処理により金属板の回路パターンに略対応する部分以外の部分を除去することを特徴とする。   That is, the metal-ceramic circuit board manufacturing method according to the present invention has a shape similar to a circuit pattern, and the thickness other than the portion substantially corresponding to the circuit pattern is thinner than the thickness of the portion substantially corresponding to the circuit pattern. After joining the formed metal plate to the ceramic substrate and applying a resist to almost the entire surface of the metal plate, at least part of the resist applied to the surface of the portion other than the portion substantially corresponding to the circuit pattern of the metal plate is removed. Etching treatment is used to remove portions other than portions substantially corresponding to the circuit pattern of the metal plate.

この金属−セラミックス回路基板の製造方法において、金属板とセラミックス基板との接合を、金属溶湯をセラミックス基板の一方の面に接触させた後に冷却して固化させて金属板を形成することにより行うのが好ましい。また、金属板とセラミックス基板との接合を、セラミックス基板と略等しい形状および大きさのセラミックス基板収容部とこのセラミックス基板収容部に隣接する金属板形成部が内部に形成された鋳型を使用して、この鋳型のセラミックス基板収容部にセラミックス基板を収容し、このセラミックス基板の一方の面に接触するように金属溶湯を金属板形成部内に注湯した後に冷却して固化させて金属板を形成することにより行うのが好ましい。この場合、金属板形成部が、金属回路板の回路パターンに類似し且つ回路パターンに略対応する部分以外の深さを回路パターンに略対応する部分の深さよりも浅くした形状を有するのが好ましい。また、金属溶湯をセラミックス基板の一方の面に接触させる際に、金属溶湯をセラミックス基板の他方の面に接触させ、冷却して固化させることにより金属部材を形成してセラミックス基板の他方の面に接合してもよい。また、金属溶湯がアルミニウムまたはアルミニウム合金の溶湯であるのが好ましい   In this metal-ceramic circuit board manufacturing method, the metal plate and the ceramic substrate are joined by bringing the molten metal into contact with one surface of the ceramic substrate and then cooling and solidifying to form the metal plate. Is preferred. In addition, the metal plate and the ceramic substrate are joined using a mold in which a ceramic substrate housing portion having a shape and size substantially equal to the ceramic substrate and a metal plate forming portion adjacent to the ceramic substrate housing portion is formed. The ceramic substrate is accommodated in the ceramic substrate accommodating portion of the mold, and the molten metal is poured into the metal plate forming portion so as to contact one surface of the ceramic substrate, and then cooled and solidified to form the metal plate. Is preferably performed. In this case, it is preferable that the metal plate forming portion has a shape similar to the circuit pattern of the metal circuit board and having a depth other than a portion substantially corresponding to the circuit pattern shallower than a depth of the portion substantially corresponding to the circuit pattern. . Further, when the molten metal is brought into contact with one surface of the ceramic substrate, the molten metal is brought into contact with the other surface of the ceramic substrate and cooled to solidify to form a metal member on the other surface of the ceramic substrate. You may join. The molten metal is preferably a molten aluminum or aluminum alloy.

また、上記の金属−セラミックス回路基板の製造方法において、エッチング処理前のレジストの除去をレーザー加工により行うのが好ましい。また、エッチング処理により金属板の回路パターンに略対応する部分以外の部分を除去する際に、金属板の回路パターンに対応する部分のレジストで覆われていない部分に湾曲して抉れた凹部を形成するのが好ましい。また、金属板の回路パターンに略対応する部分の厚さが0.4mm以上であるのが好ましい。   In the method for producing a metal-ceramic circuit board, it is preferable to remove the resist before the etching process by laser processing. In addition, when removing a portion other than a portion substantially corresponding to the circuit pattern of the metal plate by etching processing, a concave portion curved and curled into a portion not covered with the resist of the portion corresponding to the circuit pattern of the metal plate Preferably formed. Moreover, it is preferable that the thickness of the part substantially corresponding to the circuit pattern of a metal plate is 0.4 mm or more.

また、本発明による金属−セラミックス回路基板は、セラミックス基板の一方の面に金属回路板が接合し、この金属回路板の隣接する回路パターンの互いに対向する側面の下側部分に、回路パターンの側面の長手方向に延び且つ回路パターンの側面の内側に湾曲するように抉れた凹部が形成されていることを特徴とする。   In the metal-ceramic circuit board according to the present invention, a metal circuit board is bonded to one side of the ceramic board, and the side surface of the circuit pattern is formed on the lower side portion of the side face of the adjacent circuit pattern of the metal circuit board. A concave portion is formed that extends in the longitudinal direction of the circuit pattern and is curved to bend inside the side surface of the circuit pattern.

この金属−セラミックス回路基板において、回路パターンの厚さが0.4mm以上であるのが好ましく、凹部の上端から回路パターンの上面までの高さが0.1mm以上であるのが好ましい。また、凹部の高さが0.25mm以上であるのが好ましく、凹部の深さが0.05mm以上であるのが好ましい。また、隣接する回路パターンのトップ間の距離とそのボトム間の距離との差が0.5mm未満であるのが好ましく、隣接する回路パターンのボトム間の距離に対する回路パターンの厚さの比が0.3以上であるのが好ましい。   In this metal-ceramic circuit board, the thickness of the circuit pattern is preferably 0.4 mm or more, and the height from the upper end of the recess to the upper surface of the circuit pattern is preferably 0.1 mm or more. Moreover, it is preferable that the height of a recessed part is 0.25 mm or more, and it is preferable that the depth of a recessed part is 0.05 mm or more. The difference between the distance between the tops of the adjacent circuit patterns and the distance between the bottoms thereof is preferably less than 0.5 mm, and the ratio of the thickness of the circuit pattern to the distance between the bottoms of the adjacent circuit patterns is 0. .3 or more is preferable.

本発明によれば、金属回路板が厚くても回路パターンのトップとボトムの寸法差が小さく、所望の寸法精度の回路パターンの金属回路板がセラミックス基板に接合した金属−セラミックス回路基板を製造することができる。   According to the present invention, even when the metal circuit board is thick, a metal-ceramic circuit board in which the dimensional difference between the top and bottom of the circuit pattern is small and the metal circuit board having a circuit pattern with a desired dimensional accuracy is bonded to the ceramic substrate is manufactured. be able to.

また、金属溶湯をセラミックス基板の一方の面に接触させた後に冷却して固化させることにより金属板を形成してセラミックス基板の一方の面に接合し、この金属板の表面にレジストを塗布してエッチング処理により所望の回路パターンの金属回路板を形成して金属−セラミックス回路基板を製造する場合には、金属回路板が厚い場合でもファインパターンを形成することができるとともに、エッチング処理時間を大幅に短縮することができる。   In addition, after bringing the molten metal into contact with one surface of the ceramic substrate and cooling and solidifying it, a metal plate is formed and bonded to one surface of the ceramic substrate, and a resist is applied to the surface of the metal plate. When a metal-ceramic circuit board is manufactured by forming a metal circuit board having a desired circuit pattern by etching, a fine pattern can be formed even when the metal circuit board is thick, and the etching processing time is greatly increased. It can be shortened.

本発明による金属−セラミックス回路基板の製造方法の実施の形態に使用する鋳型の下側鋳型部材を示す平面図である。It is a top view which shows the lower mold member of the casting_mold | template used for embodiment of the manufacturing method of the metal-ceramics circuit board by this invention. 図1AのIB−IB線断面図である。It is IB-IB sectional view taken on the line of FIG. 1A. 図1Bの一部拡大図である。It is a partially expanded view of FIG. 1B. 本発明による金属−セラミックス回路基板の製造方法の実施の形態により得られた金属−セラミックス接合基板を示す断面図である。It is sectional drawing which shows the metal-ceramics bonding board | substrate obtained by embodiment of the manufacturing method of the metal-ceramics circuit board by this invention. 本発明による金属−セラミックス回路基板の製造方法の実施の形態の製造工程を示す断面図であり、図2の金属−セラミックス接合基板の隣接する回路パターンの互いに対向する側面間の部分を拡大して、セラミックス基板の一方の面に回路用金属板を接合し、他方の面に金属ベース板を接合する工程を説明する図である。It is sectional drawing which shows the manufacturing process of embodiment of the manufacturing method of the metal-ceramics circuit board by this invention, and expands the part between the mutually opposing side surfaces of the adjacent circuit pattern of the metal-ceramics bonding board | substrate of FIG. FIG. 5 is a diagram illustrating a process of joining a circuit metal plate to one surface of a ceramic substrate and joining a metal base plate to the other surface. 本発明による金属−セラミックス回路基板の製造方法の実施の形態の製造工程を示す断面図であり、図2の金属−セラミックス接合基板の隣接する回路パターンの互いに対向する側面間の部分を拡大して、回路用金属板の略全面にエッチングレジストを形成する工程を説明する図である。It is sectional drawing which shows the manufacturing process of embodiment of the manufacturing method of the metal-ceramics circuit board by this invention, and expands the part between the mutually opposing side surfaces of the adjacent circuit pattern of the metal-ceramics bonding board | substrate of FIG. FIG. 5 is a diagram illustrating a process of forming an etching resist on substantially the entire surface of a circuit metal plate. 本発明による金属−セラミックス回路基板の製造方法の実施の形態の製造工程を示す断面図であり、図2の金属−セラミックス接合基板の隣接する回路パターンの互いに対向する側面間の部分を拡大して、エッチングレジストの一部を除去する工程を説明する図である。It is sectional drawing which shows the manufacturing process of embodiment of the manufacturing method of the metal-ceramics circuit board by this invention, and expands the part between the mutually opposing side surfaces of the adjacent circuit pattern of the metal-ceramics bonding board | substrate of FIG. FIG. 5 is a diagram illustrating a process of removing a part of an etching resist. 本発明による金属−セラミックス回路基板の製造方法の実施の形態の製造工程を示す断面図であり、図2の金属−セラミックス接合基板の隣接する回路パターンの互いに対向する側面間の部分を拡大して、エッチング処理により回路用金属板の不要部分を除去して金属回路板形成する工程を説明する図である。It is sectional drawing which shows the manufacturing process of embodiment of the manufacturing method of the metal-ceramics circuit board by this invention, and expands the part between the mutually opposing side surfaces of the adjacent circuit pattern of the metal-ceramics bonding board | substrate of FIG. FIG. 5 is a diagram illustrating a process of forming a metal circuit board by removing unnecessary portions of the circuit metal board by etching treatment. 本発明による金属−セラミックス回路基板の製造方法の実施の形態の製造工程を示す断面図であり、図2の金属−セラミックス接合基板の隣接する回路パターンの互いに対向する側面間の部分を拡大して、エッチングレジストを剥離する工程を説明する図である。It is sectional drawing which shows the manufacturing process of embodiment of the manufacturing method of the metal-ceramics circuit board by this invention, and expands the part between the mutually opposing side surfaces of the adjacent circuit pattern of the metal-ceramics bonding board | substrate of FIG. It is a figure explaining the process of peeling an etching resist. 本発明による金属−セラミックス回路基板の製造方法の実施の形態の製造工程の変形例を示す断面図であり、図2の金属−セラミックス接合基板の隣接する回路パターンの互いに対向する側面間の部分を拡大して、エッチングレジストの一部を除去する工程を説明する図である。FIG. 6 is a cross-sectional view showing a modification of the manufacturing process of the embodiment of the method for manufacturing a metal-ceramic circuit board according to the present invention, and shows a portion between adjacent side surfaces of adjacent circuit patterns of the metal-ceramic bonding board of FIG. It is a figure explaining the process of expanding and removing a part of etching resist. 本発明による金属−セラミックス回路基板の製造方法の実施の形態の製造工程の変形例を示す断面図であり、図2の金属−セラミックス接合基板の隣接する回路パターンの互いに対向する側面間の部分を拡大して、エッチング処理により回路用金属板の不要部分を除去して金属回路板形成する工程を説明する図である。FIG. 6 is a cross-sectional view showing a modification of the manufacturing process of the embodiment of the method for manufacturing a metal-ceramic circuit board according to the present invention, and shows a portion between adjacent side surfaces of adjacent circuit patterns of the metal-ceramic bonding board of FIG. It is a figure which expands and demonstrates the process of removing the unnecessary part of the metal plate for circuits by an etching process, and forming a metal circuit board. 本発明による金属−セラミックス回路基板の製造方法の実施の形態の製造工程の変形例を示す断面図であり、図2の金属−セラミックス接合基板の隣接する回路パターンの互いに対向する側面間の部分を拡大して、エッチングレジストを剥離する工程を説明する図である。FIG. 6 is a cross-sectional view showing a modification of the manufacturing process of the embodiment of the method for manufacturing a metal-ceramic circuit board according to the present invention, and shows a portion between adjacent side surfaces of adjacent circuit patterns of the metal-ceramic bonding board of FIG. It is a figure explaining the process of expanding and peeling an etching resist. 本発明による金属−セラミックス回路基板の製造方法の実施の形態の製造工程の他の変形例を示す断面図であり、図2の金属−セラミックス接合基板の隣接する回路パターンの互いに対向する側面間の部分を拡大して、エッチングレジストの一部を除去する工程を説明する図である。FIG. 7 is a cross-sectional view showing another modified example of the manufacturing process of the embodiment of the method for manufacturing a metal-ceramic circuit board according to the present invention, between adjacent side surfaces of adjacent circuit patterns of the metal-ceramic bonding board of FIG. It is a figure explaining the process of expanding a part and removing a part of etching resist. 本発明による金属−セラミックス回路基板の実施の形態を説明する図である。It is a figure explaining embodiment of the metal-ceramics circuit board by this invention.

以下、添付図面を参照して、本発明による金属−セラミックス回路基板の製造方法の実施の形態について説明する。   Embodiments of a method for producing a metal-ceramic circuit board according to the present invention will be described below with reference to the accompanying drawings.

まず、鋳型内にセラミックス基板を設置し、金属溶湯を流し込んで冷却して固化させることにより、セラミックス基板の一方の面金属ベース板が接合するとともに、他方の面に回路用金属板が接合した金属−セラミックス接合基板を製造する。   First, a ceramic substrate is placed in a mold, and molten metal is poured into it and cooled and solidified, so that one surface metal base plate of the ceramic substrate is bonded and the other surface is bonded to the circuit metal plate. -Manufacture ceramic bonded substrates.

この金属−セラミックス接合基板の製造に使用する鋳型の下側鋳型部材の例を図1A〜図1Cに示す。図1Aおよび図1Bに示すように、下側鋳型部材100は、平面形状が略矩形の底面部100aと、この底面部100aの周縁部から垂直方向上方に向かって延びる側壁部100bとからなる。この下側鋳型部材100の底面部100aの上面には、階段状の側壁を有する1つまたは複数(図1Aおよび図1Bでは2つを示す)凹部100cが形成されている。これらの凹部100cの各々は、金属回路板の回路パターンに類似した平面形状で且つ金属回路板の厚さと略等しい深さの1つまたは複数(図1Aおよび図1Bでは1つを示す)の回路用金属板形成部100dと、この回路用金属板形成部100dの上部に隣接して形成され、セラミックス基板と略等しい形状および大きさの1つまたは複数(図1Aおよび図1Bでは1つを示す)のセラミックス基板収容部100eとからなる。回路用金属板形成部100dは、図1Cに示すように、隣接する回路パターンの互いに対向する側面間の部分の深さが金属回路板の回路パターンに略対応する部分の深さよりdだけ浅くなっている。この下側鋳型部材100の上部に平面形状が略矩形の(図示しない)上側鋳型を被せることによって内部に画定される空間のうち、下側鋳型部材100の凹部100cを除いた部分は、金属ベース板形成部100fである。なお、上側鋳型には、金属溶湯を鋳型内に注湯するための(図示しない)注湯口が形成されている。また、下側鋳型部材100には、金属ベース板形成部100fと回路用金属板形成部100dとの間に延びる(図示しない)溶湯流路が形成され、セラミックス基板収容部100e内にセラミックス基板を収容したときにも金属ベース板形成部100fと回路用金属板形成部100dとの間が連通するようになっている。   Examples of a lower mold member of a mold used for manufacturing the metal-ceramic bonding substrate are shown in FIGS. 1A to 1C. As shown in FIGS. 1A and 1B, the lower mold member 100 includes a bottom surface portion 100a having a substantially rectangular planar shape, and a side wall portion 100b extending vertically upward from the peripheral edge portion of the bottom surface portion 100a. On the upper surface of the bottom surface portion 100a of the lower mold member 100, one or a plurality of recesses 100c (two are shown in FIGS. 1A and 1B) having stepped side walls are formed. Each of the recesses 100c has one or a plurality of circuits (one is shown in FIGS. 1A and 1B) having a planar shape similar to the circuit pattern of the metal circuit board and a depth substantially equal to the thickness of the metal circuit board. Metal plate forming portion 100d and one or a plurality of ones having a shape and size substantially the same as the ceramic substrate formed adjacent to the circuit metal plate forming portion 100d (one is shown in FIGS. 1A and 1B) ) Ceramic substrate housing portion 100e. In the circuit metal plate forming portion 100d, as shown in FIG. 1C, the depth of the portion between the side surfaces facing each other in the adjacent circuit pattern is shallower by d than the depth of the portion that substantially corresponds to the circuit pattern of the metal circuit plate. ing. Of the space defined inside by covering the upper mold of the lower mold member 100 with an upper mold (not shown) having a substantially rectangular plane shape, the portion excluding the recess 100c of the lower mold member 100 is a metal base. It is the plate forming part 100f. The upper mold is formed with a pouring port (not shown) for pouring the molten metal into the mold. Further, the lower mold member 100 is formed with a molten metal passage (not shown) extending between the metal base plate forming portion 100f and the circuit metal plate forming portion 100d, and the ceramic substrate is placed in the ceramic substrate housing portion 100e. The metal base plate forming portion 100f and the circuit metal plate forming portion 100d communicate with each other even when they are housed.

この鋳型の下側鋳型部材100のセラミックス基板収容部100e内にセラミックス基板を収容した後、金属ベース板形成部100f内に(アルミニウムまたはアルミニウム合金などの)金属溶湯を注湯し、(図示しない)溶湯流路を介して回路用金属板形成部100dまで金属溶湯を充填し、その後、冷却して金属溶湯を固化させること(所謂溶湯接合法)により、図2および図3Aに示すようなセラミックス基板10の一方の面に金属ベース板14が直接接合するとともに、他方の面に回路パターンに類似した形状であり且つ回路パターンに略対応する部分以外の部分の厚さが回路パターンに略対応する部分の厚さよりも薄い回路用金属板12が直接接合した一体の金属−セラミックス接合基板が得られる。   After the ceramic substrate is accommodated in the ceramic substrate accommodating portion 100e of the lower mold member 100 of this mold, a molten metal (such as aluminum or aluminum alloy) is poured into the metal base plate forming portion 100f (not shown). A ceramic substrate as shown in FIG. 2 and FIG. 3A is obtained by filling the molten metal up to the circuit metal plate forming portion 100d through the molten metal flow path and then cooling to solidify the molten metal (so-called molten metal bonding method). The metal base plate 14 is directly joined to one surface of the portion 10 and the other surface has a shape similar to the circuit pattern and the thickness of the portion other than the portion substantially corresponding to the circuit pattern substantially corresponds to the circuit pattern. As a result, an integrated metal / ceramic bonding substrate in which the metal plate for circuit 12 thinner than the thickness is directly bonded is obtained.

次に、図3Bに示すように、スプレーコート、ディップ、電着レジストコーティングなどにより、回路用金属板12の全面(回路用金属板12の上面および側面の全面、すなわち、回路用金属板12の回路パターンに略対応する部分の上面および側面と隣接する回路パターンの互いに対向する側面間の部分(溝部)の底面の全面)を覆うようにエッチングレジスト16を塗布する。   Next, as shown in FIG. 3B, the entire surface of the circuit metal plate 12 (the entire upper surface and side surfaces of the circuit metal plate 12, that is, the circuit metal plate 12 is formed by spray coating, dip coating, electrodeposition resist coating, or the like. An etching resist 16 is applied so as to cover the upper surface and the side surface of the portion substantially corresponding to the circuit pattern and the entire surface of the portion between the side surfaces facing each other (groove portion) of the adjacent circuit pattern.

次に、図3Cに示すように、隣接する回路パターンの互いに対向する側面間の部分(溝部)の底面を覆うエッチングレジスト16の部分のみをレーザー照射(レーザー加工)により除去した後に、図3Dに示すように、塩化第二鉄溶液などのエッチング液によってエッチング処理を行って回路用金属板12の不要部分を除去することにより、所望の回路パターンの金属回路板12を形成する。このエッチング処理の際に(好ましくはオーバーエッチングにすることにより)、隣接する回路パターンの互いに対向する側面の下側部分に、回路パターンの側面の長手方向に沿って延び且つ回路パターンの側面の内側に湾曲するように抉れた凹部(抉れ部)12aが形成される。   Next, as shown in FIG. 3C, after removing only the portion of the etching resist 16 that covers the bottom surface of the portion (groove portion) between the side surfaces facing each other of the adjacent circuit pattern by laser irradiation (laser processing), FIG. As shown, the metal circuit board 12 having a desired circuit pattern is formed by performing an etching process using an etchant such as a ferric chloride solution to remove unnecessary portions of the circuit metal board 12. During this etching process (preferably by over-etching), it extends along the longitudinal direction of the side surface of the circuit pattern to the lower part of the side surface of the adjacent circuit pattern that faces each other, and inside the side surface of the circuit pattern A concave portion (bent portion) 12a that is curved so as to be curved is formed.

次に、エッチングレジスト16を剥離することにより、図3Eに示すように、所望の回路パターンの金属回路板12を有する金属−セラミックス回路基板が得られる。なお、必要に応じて、金属回路板12の表面にNiめっきなどを施してもよい。   Next, the etching resist 16 is peeled off to obtain a metal-ceramic circuit board having the metal circuit board 12 having a desired circuit pattern as shown in FIG. 3E. If necessary, the surface of the metal circuit board 12 may be subjected to Ni plating or the like.

また、図4Aに示すように、隣接する回路パターンの互いに対向する側面間の部分の底面の幅より少し狭い部分を覆うエッチングレジスト16の部分をレーザー照射により除去してもよい。この場合、図4Bおよび図4Cに示すように、エッチング処理により図3Dに示す抉れ部12aより小さい抉れ部12aを形成することができる。   Further, as shown in FIG. 4A, a portion of the etching resist 16 that covers a portion slightly narrower than the width of the bottom surface of the portion between the adjacent side surfaces of the adjacent circuit pattern may be removed by laser irradiation. In this case, as shown in FIG. 4B and FIG. 4C, the bend 12a smaller than the bend 12a shown in FIG. 3D can be formed by etching.

また、図5に示すように、隣接する回路パターンの互いに対向する側面間の部分の底面の他、回路パターンの互いに対向する側面の下側部分を覆うエッチングレジスト16の部分をレーザー照射により除去してもよい。   In addition, as shown in FIG. 5, the portion of the etching resist 16 covering the lower portion of the circuit patterns opposite to each other in addition to the bottom of the portion between the adjacent sides of the adjacent circuit pattern is removed by laser irradiation. May be.

本発明による金属−セラミックス回路基板の実施の形態では、図6に示すように、セラミックス基板10の一方の面に金属回路板12が接合し、この金属回路板12の隣接する回路パターンの互いに対向する側面の下側部分に、回路パターンの側面の長手方向に延び且つ回路パターンの側面の内側に湾曲するように抉れた凹部(抉れ部)12aが形成されている。   In the embodiment of the metal-ceramic circuit board according to the present invention, as shown in FIG. 6, a metal circuit board 12 is bonded to one surface of the ceramic board 10 and adjacent circuit patterns of the metal circuit board 12 face each other. A concave portion (bent portion) 12a that extends in the longitudinal direction of the side surface of the circuit pattern and is curved to the inside of the side surface of the circuit pattern is formed in the lower portion of the side surface.

この金属−セラミックス回路基板の金属回路板12の厚さをT、抉れ部12aの高さをh、抉れ部12aの上端から金属回路板12の上面までの高さをh、回路パターンのボトム間の距離(絶縁距離)をD、隣接する回路パターンのトップ間の距離をD、抉れ部12aの深さをdとすると、回路パターンの厚さTは、好ましくは0.4mm以上、さらに好ましくは0.6mm以上、最も好ましくは1mm以上であり、抉れ部12aの高さhは、好ましくは0.25mm以上、抉れ部12aの上端から回路パターンの上面までの高さhは、好ましくは0.1mm以上、さらに好ましくは0.2mm以上、最も好ましくは0.3mm以上であり、抉れ部12aの深さdは、好ましくは0.05mm以上、隣接する回路パターンのトップ間の距離Dとそのボトム間の距離Dとの差|D−D|は、好ましくは0.5mm未満、さらに好ましくは0.3mm未満であり、隣接する回路パターンのボトム間の距離Dに対する回路パターンの厚さTの比T/Dは、好ましくは0.3以上、さらに好ましくは0.8以上、さらに好ましくは1以上、最も好ましくは2以上である。 The metal - the thickness T of the ceramic circuit board of the metal circuit plate 12, hollowed portion the height h 1 of the 12a, gouged portion 12a h 2 height to the upper surface of the metal circuit plate 12 from the upper end of circuit When the distance (insulation distance) between the bottoms of the patterns is D B , the distance between the tops of adjacent circuit patterns is D T , and the depth of the bent portion 12 a is d 1 , the thickness T of the circuit pattern is preferably 0.4 mm or more, more preferably 0.6 mm or more, and most preferably 1 mm or more. The height h 1 of the bent portion 12a is preferably 0.25 mm or more, and the upper surface of the circuit pattern from the upper end of the bent portion 12a. The height h 2 is preferably 0.1 mm or more, more preferably 0.2 mm or more, most preferably 0.3 mm or more, and the depth d 1 of the kinked portion 12a is preferably 0.05 mm or more. Adjacent circuit path And the difference between the distance D B between bottom distance D T between top over emissions | D T -D B | is preferably less than 0.5 mm, more preferably less than 0.3 mm, the adjacent circuit patterns the ratio T / D B of the thickness T of the circuit pattern with respect to the distance D B between bottom, is preferably 0.3 or more, more preferably 0.8 or more, more preferably 1 or more, most preferably 2 or more .

金属−セラミックス回路基板を使用してパワーモジュールを作製する場合、金属−セラミックス回路基板のセラミックス基板の一方の面に接合した金属回路板に半導体チップや電子部品を搭載した後、絶縁樹脂によりモールド封止している。このようなパワーモジュールを振動が大きい(車載などの)環境や高熱環境で使用した際に、金属−セラミックス回路基板からモールド樹脂が剥がれて故障することを防止するため、従来では、セラミックス基板の他方の面に接合した金属ベース板の表面や側面に凹部や凸部を形成して、金属−セラミックス回路基板とモールド樹脂の密着性を向上させている。しかし、このような金属ベース板の表面や側面の凹部や凸部は、金属ベース板のないベースレスのモジュール構造には適用することができず、また、別工程で形成する必要があり、コスト高となる。一方、本発明による金属−セラミックス回路基板の実施の形態は、金属回路板12の側面に形成された抉れ部12aにより、モールド樹脂との密着性を向上させることができるので、金属ベース板のないベースレスのモジュール構造にも適用することができ、また、抉れ部12aを別工程で形成する必要がなく、低コストで作製することができる。   When manufacturing a power module using a metal-ceramic circuit board, a semiconductor circuit or electronic component is mounted on a metal circuit board bonded to one surface of the ceramic substrate of the metal-ceramic circuit board, and then molded and sealed with an insulating resin. It has stopped. In order to prevent the mold resin from being peeled off from the metal-ceramic circuit board when the power module is used in an environment with high vibration (such as in-vehicle) or a high heat environment, A concave portion or a convex portion is formed on the surface or side surface of the metal base plate bonded to the surface of the metal base plate to improve the adhesion between the metal-ceramic circuit board and the mold resin. However, the concave and convex portions on the surface and side surfaces of the metal base plate cannot be applied to a baseless module structure without the metal base plate, and must be formed in a separate process. Become high. On the other hand, the metal-ceramic circuit board according to the embodiment of the present invention can improve the adhesion with the mold resin by the bend portion 12a formed on the side surface of the metal circuit board 12. It can be applied to a non-baseless module structure, and it is not necessary to form the bent portion 12a in a separate process, and can be manufactured at low cost.

以下、本発明による金属−セラミックス回路基板およびその製造方法の実施例について詳細に説明する。   Examples of the metal-ceramic circuit board and the manufacturing method thereof according to the present invention will be described in detail below.

[実施例1]
下側鋳型部材の底面に、回路パターンに略対応する部分の厚さが0.8mmであり、隣接する回路パターンの互いに対向する側面間の部分の厚さが0.3mmであり且つそれらの間隔(隣接する回路パターンの互いに対向する側面間の部分(溝部)の底面の幅)が2mmである回路用金属板と略等しい形状および大きさの凹部である回路用金属板形成部が形成され、この回路用金属板形成部の上部に隣接して、71mm×70mm×0.6mmの大きさのセラミックス基板と略等しい形状および大きさの凹部であるセラミックス基板収容部が形成され、このセラミックス基板収容部の上部に隣接して、金属ベース板形成部が形成され、金属ベース板形成部と回路用金属板形成部との間に延びる溶湯流路が形成された(図1A〜図1Cに示す鋳型100と同様の形状の)カーボン製の鋳型を用意した。
[Example 1]
On the bottom surface of the lower mold member, the thickness of the portion substantially corresponding to the circuit pattern is 0.8 mm, the thickness of the portion between the adjacent side surfaces of the adjacent circuit pattern is 0.3 mm, and the distance between them (Circuit metal plate forming portion which is a concave portion having a shape and size substantially equal to a circuit metal plate whose width between the side surfaces (grooves) between adjacent side surfaces of adjacent circuit patterns is 2 mm, Adjacent to the upper part of the circuit metal plate forming portion, a ceramic substrate housing portion is formed which is a recess having a shape and size substantially equal to a ceramic substrate having a size of 71 mm × 70 mm × 0.6 mm. A metal base plate forming portion is formed adjacent to the upper portion of the portion, and a molten metal flow path extending between the metal base plate forming portion and the circuit metal plate forming portion is formed (the mold shown in FIGS. 1A to 1C). A carbon mold (with the same shape as 100) was prepared.

この鋳型の下側鋳型部材のセラミックス基板収容部内に71mm×70mm×0.6mmの大きさの窒化アルミニウム基板を収容し、上側鋳型を被せて密閉した後、溶湯口から金属ベース板形成部内にアルミニウム溶湯を注湯し、溶湯流路を介して回路用金属板形成部まで金属溶湯を充填し、その後、冷却して金属溶湯を固化させることにより、図2および図3Aに示すように、セラミックス基板10の一方の面に金属ベース板14が直接接合するとともに、他方の面に回路パターンに類似した形状の回路用金属板12が直接接合した一体の金属−セラミックス接合基板を得た。   An aluminum nitride substrate having a size of 71 mm × 70 mm × 0.6 mm is accommodated in the ceramic substrate accommodating portion of the lower mold member of this mold, and the upper mold is covered and sealed, and then aluminum is introduced into the metal base plate forming portion from the molten metal opening. As shown in FIG. 2 and FIG. 3A, the molten metal is poured, filled with the molten metal to the circuit metal plate forming portion through the molten metal flow path, and then cooled to solidify the molten metal. As a result, the metal base plate 14 was directly bonded to one surface of the circuit board 10, and an integrated metal / ceramic bonding substrate having the circuit metal plate 12 having a shape similar to the circuit pattern directly bonded to the other surface was obtained.

次に、図3Bに示すように、回路用金属板12の全面(回路用金属板12の回路パターンに略対応する部分の上面および側面と隣接する回路パターンの互いに対向する側面間の部分(溝部)の底面の全面)を覆うようにスプレーコートによりエッチングレジスト16を塗布した。   Next, as shown in FIG. 3B, the entire surface of the circuit metal plate 12 (the upper surface and the side surface of the circuit metal plate 12 substantially corresponding to the circuit pattern, and the portion between the adjacent side surfaces of the circuit pattern (groove portion). The etching resist 16 was applied by spray coating so as to cover the entire bottom surface of ().

次に、図4Aに示すように、隣接する回路パターンの互いに対向する側面間の部分(溝部)の底面の幅(2mm)より少し狭い部分(底面の中央の幅1.6mmの部分)を覆うエッチングレジスト16の部分のみをレーザー加工により除去した後に、図4Bに示すように、塩化第二鉄溶液によってオーバーエッチングになるようにエッチング処理を行って回路用金属板12の不要部分を除去することにより、所望の回路パターンの金属回路板12を形成するとともに、隣接する回路パターンの互いに対向する側面の下側部分に、回路パターンの側面の長手方向に沿って延び且つ回路パターンの側面の内側に湾曲するように抉れた凹部(抉れ部)12aを形成した。   Next, as shown in FIG. 4A, a portion (a portion having a width of 1.6 mm at the center of the bottom surface) that is slightly narrower than the width (2 mm) of the bottom surface of the portion (groove portion) between the adjacent side surfaces of adjacent circuit patterns is covered. After removing only the portion of the etching resist 16 by laser processing, as shown in FIG. 4B, an unnecessary portion of the circuit metal plate 12 is removed by performing an etching process so as to be over-etched with a ferric chloride solution. To form a metal circuit board 12 having a desired circuit pattern, and extend along the longitudinal direction of the side surface of the circuit pattern to the lower portion of the side surface of the adjacent circuit pattern facing each other and inside the side surface of the circuit pattern. A concave portion (bent portion) 12a that was curved so as to be curved was formed.

次に、エッチングレジスト16を剥離して、図4Cに示すように、所望の回路パターンの金属回路板12を有する金属−セラミックス回路基板を得た。   Next, the etching resist 16 was peeled off to obtain a metal-ceramic circuit board having a metal circuit board 12 having a desired circuit pattern as shown in FIG. 4C.

このようにして得られた金属−セラミックス回路基板の金属回路板12は、金属回路板12の厚さTが0.8mm、抉れ部12aの高さhが0.4mm、抉れ部12aの上端から金属回路板12の上面までの高さhが0.4mm、隣接する回路パターンのボトム間の距離(絶縁距離)Dが2.2mm、そのトップ間の距離Dが2.2mm、抉れ部12aの深さdが0.08mmであり、|D−D|=0、T/D=0.36であった。 The metal circuit board 12 of the metal-ceramic circuit board thus obtained has a thickness T of the metal circuit board 12 of 0.8 mm, a height h 1 of the bent part 12a of 0.4 mm, and a bent part 12a. the upper end of the to the upper surface of the metal circuit plate 12 height h 2 is 0.4mm, the distance between the bottom of the adjacent circuit patterns (insulation distance) D B is 2.2 mm, the distance D T between the top 2. 2 mm, the depth d 1 of the bent portion 12a was 0.08 mm, | D T −D B | = 0, T / D B = 0.36.

[実施例2]
オーバーエッチングにならないように適度にエッチング処理を行った以外は、実施例1と同様の方法により、金属−セラミックス回路基板を得た。
[Example 2]
A metal-ceramic circuit board was obtained in the same manner as in Example 1 except that an appropriate etching treatment was performed so as not to cause over-etching.

本実施例で得られた金属−セラミックス回路基板の金属回路板12は、金属回路板12の厚さTが0.8mm、抉れ部12aの高さhが0.3mm、抉れ部12aの上端から金属回路板12の上面までの高さhが0.5mm、隣接する回路パターンのボトム間の距離(絶縁距離)Dが2mm、そのトップ間の距離Dが2.2mm、抉れ部12aの深さdが0.06mmであり、|D−D|=0.2、T/D=0.40であった。 Metal obtained in this embodiment - the metal circuit board 12 of the ceramic circuit board, the thickness T is 0.8mm metal circuit board 12, the gouged portion 12a of a height h 1 is 0.3 mm, gouged portion 12a the upper end of the to the upper surface of the metal circuit plate 12 height h 2 is 0.5mm, the distance between the bottom of the adjacent circuit patterns (insulation distance) D B is 2 mm, the distance D T between the top 2.2 mm, the depth d 1 of the gouged portion 12a is 0.06mm, | D T -D B | = 0.2, was T / D B = 0.40.

[実施例3]
回路パターンに略対応する部分の厚さが0.4mmであり、隣接する回路パターンの互いに対向する側面間の部分の厚さが0.2mmであり且つそれらの間隔(隣接する回路パターンの互いに対向する側面間の部分(溝部)の底面の幅)が0.3mmである回路用金属板と略等しい形状および大きさの凹部である回路用金属板形成部が底面に形成された下側鋳型部材を使用し、隣接する回路パターンの互いに対向する側面間の部分(溝部)の底面の幅(0.3mm)より狭い部分(底面の中央の幅0.1mmの部分)を覆うエッチングレジスト16の部分のみをレーザー加工により除去した以外は、実施例1と同様の方法により、金属−セラミックス回路基板を得た。
[Example 3]
The thickness of the portion substantially corresponding to the circuit pattern is 0.4 mm, the thickness of the portion between the adjacent side surfaces of the adjacent circuit patterns is 0.2 mm, and the distance between them (the adjacent circuit patterns are opposed to each other) A lower mold member in which a circuit metal plate forming portion, which is a recess having a shape and size substantially equal to a circuit metal plate having a width between the side surfaces (grooves) of 0.3 mm, is formed on the bottom surface. The portion of the etching resist 16 that covers a portion (a portion having a width of 0.1 mm at the center of the bottom surface) narrower than the width (0.3 mm) of the bottom surface of the portion (groove portion) between the opposite side surfaces of the adjacent circuit pattern A metal-ceramic circuit board was obtained in the same manner as in Example 1 except that only this was removed by laser processing.

本実施例で得られた金属−セラミックス回路基板の金属回路板12は、金属回路板12の厚さTが0.4mm、抉れ部12aの高さhが0.3mm、抉れ部12aの上端から金属回路板12の上面までの高さhが0.1mm、隣接する回路パターンのボトム間の距離(絶縁距離)Dが0.5mm、そのトップ間の距離Dが0.5mm、抉れ部12aの深さdが0.07mmであり、|D−D|=0、T/D=0.80であった。 Metal obtained in this embodiment - the metal circuit board 12 of the ceramic circuit board, the thickness T is 0.4mm metal circuit board 12, the gouged portion 12a of a height h 1 is 0.3 mm, gouged portion 12a the upper end of the to the upper surface of the metal circuit plate 12 height h 2 is 0.1mm, the distance between the bottom of the adjacent circuit patterns (insulation distance) D B is 0.5 mm, the distance D T between the top 0. 5 mm, the depth d 1 of the bent portion 12a was 0.07 mm, | D T −D B | = 0, and T / D B = 0.80.

[実施例4]
回路パターンに略対応する部分の厚さが0.4mmであり、隣接する回路パターンの互いに対向する側面間の部分の厚さが0.3mmであり且つそれらの間隔(隣接する回路パターンの互いに対向する側面間の部分(溝部)の底面の幅)が0.3mmである回路用金属板と略等しい形状および大きさの凹部である回路用金属板形成部が底面に形成された下側鋳型部材を使用し、隣接する回路パターンの互いに対向する側面間の部分(溝部)の底面の幅(0.3mm)より狭い部分(底面の中央の幅0.1mmの部分)を覆うエッチングレジスト16の部分のみをレーザー加工により除去した以外は、実施例2と同様の方法により、金属−セラミックス回路基板を得た。
[Example 4]
The thickness of the portion substantially corresponding to the circuit pattern is 0.4 mm, the thickness of the portion between the side surfaces of the adjacent circuit patterns facing each other is 0.3 mm, and the distance between them (the adjacent circuit patterns facing each other) A lower mold member in which a circuit metal plate forming portion, which is a recess having a shape and size substantially equal to a circuit metal plate having a width between the side surfaces (grooves) of 0.3 mm, is formed on the bottom surface. The portion of the etching resist 16 that covers a portion (a portion having a width of 0.1 mm at the center of the bottom surface) narrower than the width (0.3 mm) of the bottom surface of the portion (groove portion) between the opposite side surfaces of the adjacent circuit pattern A metal-ceramic circuit board was obtained by the same method as in Example 2 except that only this was removed by laser processing.

本実施例で得られた金属−セラミックス回路基板の金属回路板12は、金属回路板12の厚さTが0.4mm、抉れ部12aの高さhが0.3mm、抉れ部12aの上端から金属回路板12の上面までの高さhが0.1mm、隣接する回路パターンのボトム間の距離(絶縁距離)Dが0.3mm、そのトップ間の距離Dが0.3mm、抉れ部12aの深さdが0.06mmであり、|D−D|=0、T/D=1.33であった。 Metal obtained in this embodiment - the metal circuit board 12 of the ceramic circuit board, the thickness T is 0.4mm metal circuit board 12, the gouged portion 12a of a height h 1 is 0.3 mm, gouged portion 12a the upper end of the to the upper surface of the metal circuit plate 12 height h 2 is 0.1mm, the distance between the bottom of the adjacent circuit patterns (insulation distance) D B is 0.3 mm, the distance D T between the top 0. 3 mm, the depth d 1 of the bent portion 12a was 0.06 mm, | D T −D B | = 0, and T / D B = 1.33.

[実施例5]
回路パターンに略対応する部分の厚さが1.1mmであり、隣接する回路パターンの互いに対向する側面間の部分の厚さが0.8mmであり且つそれらの間隔(隣接する回路パターンの互いに対向する側面間の部分(溝部)の底面の幅)が0.4mmである回路用金属板と略等しい形状および大きさの凹部である回路用金属板形成部が底面に形成された下側鋳型部材を使用し、隣接する回路パターンの互いに対向する側面間の部分(溝部)の底面の幅(0.4mm)より狭い部分(底面の中央の幅0.1mmの部分)を覆うエッチングレジスト16の部分のみをレーザー加工により除去した以外は、実施例1と同様の方法により、金属−セラミックス回路基板を得た。
[Example 5]
The thickness of the portion substantially corresponding to the circuit pattern is 1.1 mm, the thickness of the portion between the side surfaces of the adjacent circuit patterns facing each other is 0.8 mm, and the distance between them (the adjacent circuit patterns facing each other) Lower mold member in which a circuit metal plate forming portion, which is a concave portion having a shape and size substantially equal to a circuit metal plate having a width between bottom surfaces (grooves) of 0.4 mm, is formed on the bottom surface. A portion of the etching resist 16 that covers a portion (a portion having a width of 0.1 mm at the center of the bottom surface) that is narrower than the width (0.4 mm) of the bottom surface of the portion (groove portion) between the opposing side surfaces of the adjacent circuit pattern A metal-ceramic circuit board was obtained in the same manner as in Example 1 except that only this was removed by laser processing.

本実施例で得られた金属−セラミックス回路基板の金属回路板12は、金属回路板12の厚さTが1.1mm、抉れ部12aの高さhが1mm、抉れ部12aの上端から金属回路板12の上面までの高さhが0.1mm、隣接する回路パターンのボトム間の距離(絶縁距離)Dが0.6mm、そのトップ間の距離Dが0.6mm、抉れ部12aの深さdが0.34mmであり、|D−D|=0、T/D=1.83であった。 Metal obtained in this example - the metal circuit board 12 of the ceramic circuit board, the thickness T is 1.1mm metal circuit board 12, the height h 1 of the gouged portion 12a is 1 mm, the upper end of the hollowed portion 12a the height h 2 is 0.1mm to the upper surface of the metal circuit board 12 from the distance between the bottom of the adjacent circuit patterns (insulation distance) D B is 0.6 mm, the distance D T between the top 0.6 mm, the depth d 1 of the gouged portion 12a is 0.34mm, | D T -D B | = 0, was T / D B = 1.83.

[実施例6]
回路パターンに略対応する部分の厚さが2.1mmであり、隣接する回路パターンの互いに対向する側面間の部分の厚さが0.4mmであり且つそれらの間隔(隣接する回路パターンの互いに対向する側面間の部分(溝部)の底面の幅)が2mmである回路用金属板と略等しい形状および大きさの凹部である回路用金属板形成部が底面に形成された下側鋳型部材を使用し、隣接する回路パターンの互いに対向する側面間の部分(溝部)の底面の幅(2mm)より狭い部分(底面の中央の幅1.5mmの部分)を覆うエッチングレジスト16の部分のみをレーザー加工により除去した以外は、実施例1と同様の方法により、金属−セラミックス回路基板を得た。
[Example 6]
The thickness of the portion substantially corresponding to the circuit pattern is 2.1 mm, the thickness of the portion between the side surfaces of the adjacent circuit patterns facing each other is 0.4 mm, and the distance between them (the adjacent circuit patterns facing each other) Uses a lower mold member in which a circuit metal plate forming portion, which is a recess having a shape and size approximately equal to a circuit metal plate having a width between the side surfaces (grooves) of 2 mm, is formed on the bottom surface. Then, only the portion of the etching resist 16 that covers a portion (a portion having a width of 1.5 mm at the center of the bottom surface) narrower than the width (2 mm) of the bottom surface of the portion (groove portion) between the opposite side surfaces of the adjacent circuit pattern is laser processed. A metal-ceramic circuit board was obtained in the same manner as in Example 1 except that the metal-ceramic circuit board was removed.

本実施例で得られた金属−セラミックス回路基板の金属回路板12は、金属回路板12の厚さTが2.1mm、抉れ部12aの高さhが0.95mm、抉れ部12aの上端から金属回路板12の上面までの高さhが1.15mm、隣接する回路パターンのボトム間の距離(絶縁距離)Dが2.1mm、そのトップ間の距離Dが3mm、抉れ部12aの深さdが0.3mmであり、|D−D|=0.9、T/D=1.00であった。 The metal circuit board 12 of the metal-ceramic circuit board obtained in this example has a thickness T of the metal circuit board 12 of 2.1 mm, a height h 1 of the bent part 12a of 0.95 mm, and a bent part 12a. from the top to the upper surface of the metal circuit plate 12 of height h 2 is 1.15 mm, the distance between the bottom of the adjacent circuit patterns (insulation distance) D B is 2.1 mm, the distance D T between the top 3 mm, the depth d 1 of the gouged portion 12a is 0.3mm, | D T -D B | = 0.9, was T / D B = 1.00.

[実施例7]
回路パターンに略対応する部分の厚さが2.1mmであり、隣接する回路パターンの互いに対向する側面間の部分の厚さが0.4mmであり且つそれらの間隔(隣接する回路パターンの互いに対向する側面間の部分(溝部)の底面の幅)が2mmである回路用金属板と略等しい形状および大きさの凹部である回路用金属板形成部が底面に形成された下側鋳型部材を使用し、隣接する回路パターンの互いに対向する側面間の部分(溝部)の底面の幅(2mm)より狭い部分(底面の中央の幅1.5mmの部分)を覆うエッチングレジスト16の部分のみをレーザー加工により除去した以外は、実施例2と同様の方法により、金属−セラミックス回路基板を得た。
[Example 7]
The thickness of the portion substantially corresponding to the circuit pattern is 2.1 mm, the thickness of the portion between the side surfaces of the adjacent circuit patterns facing each other is 0.4 mm, and the distance between them (the adjacent circuit patterns facing each other) Uses a lower mold member in which a circuit metal plate forming portion, which is a recess having a shape and size approximately equal to a circuit metal plate having a width between the side surfaces (grooves) of 2 mm, is formed on the bottom surface. Then, only the portion of the etching resist 16 that covers a portion (a portion having a width of 1.5 mm at the center of the bottom surface) narrower than the width (2 mm) of the bottom surface of the portion (groove portion) between the opposite side surfaces of the adjacent circuit pattern is laser processed. A metal-ceramic circuit board was obtained in the same manner as in Example 2 except that the removal was carried out in the same manner as in Example 2.

本実施例で得られた金属−セラミックス回路基板の金属回路板12は、金属回路板12の厚さTが2.1mm、抉れ部12aの高さhが0.65mm、抉れ部12aの上端から金属回路板12の上面までの高さhが1.45mm、隣接する回路パターンのボトム間の距離(絶縁距離)Dが2.1mm、そのトップ間の距離Dが2.8mm、抉れ部12aの深さdが0.16mmであり、|D−D|=0.7、T/D=1.00であった。 The metal circuit board 12 of the metal-ceramic circuit board obtained in this example has a thickness T of the metal circuit board 12 of 2.1 mm, a height h 1 of the bent part 12a of 0.65 mm, and a bent part 12a. the upper end of the to the upper surface of the metal circuit plate 12 height h 2 is 1.45mm, the distance between the bottom of the adjacent circuit patterns (insulation distance) D B is 2.1 mm, the distance D T between the top 2. The depth d 1 of the bent portion 12a was 8 mm, 0.16 mm, | D T −D B | = 0.7, and T / D B = 1.00.

10 セラミックス基板
12 回路用金属板(金属回路板)
12a 抉れ部
14 金属ベース板
16 エッチングレジスト
100 下側鋳型部材
100a 底面部
100b 側壁部
100c 凹部
100d 回路用金属板形成部
100e セラミックス基板収容部
100f 金属ベース板形成部
10 Ceramic substrate 12 Metal plate for circuit (metal circuit plate)
12a Bending portion 14 Metal base plate 16 Etching resist 100 Lower mold member 100a Bottom surface portion 100b Side wall portion 100c Recessed portion 100d Circuit metal plate forming portion 100e Ceramic substrate housing portion 100f Metal base plate forming portion

Claims (9)

回路パターンに類似した形状になり且つ回路パターンに略対応する部分以外の厚さが回路パターンに略対応する部分の厚さより薄くなるように形成した金属板をセラミックス基板に接合し、金属板の回路パターンに略対応する部分の上面および側面の全面と隣接する回路パターンの互いに対向する側面間の部分の底面の全面にレジストを塗布した後、金属板の回路パターンに略対応する部分の側面と隣接する回路パターンの互いに対向する側面間の部分の底面に塗布されたレジストの少なくとも一部を除去し、エッチング処理により金属板の回路パターンに略対応する部分の側面と隣接する回路パターンの互いに対向する側面間の部分の底面の少なくとも一部を除去することを特徴とする、金属−セラミックス回路基板の製造方法。 A metal plate having a shape similar to a circuit pattern and having a thickness other than a portion substantially corresponding to the circuit pattern thinner than a thickness of a portion substantially corresponding to the circuit pattern is bonded to the ceramic substrate, and the circuit of the metal plate after substantially coated with resist on the bottom of the entire surface of a portion between side surfaces facing each other over the entire surface of the adjacent circuit patterns of upper and side surfaces of the portions corresponding to the pattern, and the side parts fraction substantially corresponding to the circuit pattern of the metal plate At least a portion is removed opposing parts resist applied to the bottom surface of between sides of adjacent circuit patterns by etching the circuit pattern and an adjacent substantially corresponding parts of the side surface to the circuit pattern of the metal plate A method for producing a metal-ceramic circuit board, wherein at least a part of a bottom surface of a portion between side surfaces facing each other is removed. 前記金属板と前記セラミックス基板との接合を、金属溶湯を前記セラミックス基板の一方の面に接触させた後に冷却して固化させて前記金属板を形成することにより行うことを特徴とする、請求項1に記載の金属−セラミックス回路基板の製造方法。 The metal plate and the ceramic substrate are joined by forming a metal plate by bringing a molten metal into contact with one surface of the ceramic substrate and then cooling and solidifying the metal plate. 2. A method for producing a metal-ceramic circuit board according to 1. 前記金属板と前記セラミックス基板との接合を、前記セラミックス基板と略等しい形状および大きさのセラミックス基板収容部とこのセラミックス基板収容部に隣接する金属板形成部が内部に形成された鋳型を使用して、この鋳型のセラミックス基板収容部に前記セラミックス基板を収容し、このセラミックス基板の一方の面に接触するように金属溶湯を金属板形成部内に注湯した後に冷却して固化させて前記金属板を形成することにより行うことを特徴とする、請求項1に記載の金属−セラミックス回路基板の製造方法。 The metal plate and the ceramic substrate are joined using a mold in which a ceramic substrate housing portion having a shape and size substantially equal to the ceramic substrate and a metal plate forming portion adjacent to the ceramic substrate housing portion are formed. Then, the ceramic substrate is accommodated in the ceramic substrate accommodating portion of the mold, and a molten metal is poured into the metal plate forming portion so as to be in contact with one surface of the ceramic substrate, and then cooled and solidified. The metal-ceramic circuit board manufacturing method according to claim 1, wherein the metal-ceramic circuit board is formed. 前記金属板形成部が、前記金属板の回路パターンに類似し且つ回路パターンに略対応する部分以外の深さを回路パターンに略対応する部分の深さよりも浅くした形状を有することを特徴とする、請求項3に記載の金属−セラミックス回路基板の製造方法。 The metal plate forming portion has a shape similar to the circuit pattern of the metal plate and having a depth other than a portion substantially corresponding to the circuit pattern shallower than a depth of a portion substantially corresponding to the circuit pattern. A method for producing a metal-ceramic circuit board according to claim 3. 前記金属溶湯を前記セラミックス基板の一方の面に接触させる際に、前記金属溶湯を前記セラミックス基板の他方の面に接触させ、冷却して固化させることにより金属部材を形成して前記セラミックス基板の他方の面に接合することを特徴とする、請求項2乃至4のいずれかに記載の金属−セラミックス回路基板の製造方法。 When the molten metal is brought into contact with one surface of the ceramic substrate, the molten metal is brought into contact with the other surface of the ceramic substrate, and is cooled and solidified to form a metal member to form the other surface of the ceramic substrate. The method for producing a metal-ceramic circuit board according to claim 2, wherein the metal-ceramic circuit board is bonded to the surface. 前記金属溶湯がアルミニウムまたはアルミニウム合金の溶湯であることを特徴とする、請求項2乃至5のいずれかに記載の金属−セラミックス回路基板の製造方法。 6. The method for producing a metal-ceramic circuit board according to claim 2, wherein the molten metal is a molten aluminum or aluminum alloy. 前記エッチング処理前の前記レジストの除去をレーザー加工により行うことを特徴とする、請求項1乃至6のいずれかに記載の金属−セラミックス回路基板の製造方法。 The method for producing a metal-ceramic circuit board according to any one of claims 1 to 6, wherein the resist is removed by laser processing before the etching process. 前記エッチング処理により前記金属板の回路パターンに略対応する部分の側面と隣接する回路パターンの互いに対向する側面間の部分の底面の少なくとも一部を除去する際に、前記金属板の回路パターンに対応する部分のレジストで覆われていない部分に湾曲して抉れた凹部を形成することを特徴とする、請求項1乃至7のいずれかに記載の金属−セラミックス回路基板の製造方法。 In removing at least a portion of the bottom surface portion between the side surfaces facing each other of the circuit pattern adjacent substantially corresponding parts of the side surface to the circuit pattern of the metal plate by the etching process, the circuit pattern of the metal plate The method for producing a metal-ceramic circuit board according to any one of claims 1 to 7, wherein a concave portion that is bent and bent is formed in a portion that is not covered with a resist in a corresponding portion. 前記金属板の回路パターンに略対応する部分の厚さが0.4mm以上であることを特徴とする、請求項1乃至8のいずれかに記載の金属−セラミックス回路基板の製造方法。 9. The method for manufacturing a metal-ceramic circuit board according to claim 1, wherein a thickness of a portion substantially corresponding to the circuit pattern of the metal plate is 0.4 mm or more.
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