JP5578455B2 - π-conjugated compounds and their uses, and elements and devices using them - Google Patents

Description

The present invention relates to a two-photon absorption material, and to a two-photon absorption monomolecular material or a polymer material having a high two-photon absorption cross section. The present invention also relates to various organic electronics element materials.
Applications such as three-dimensional memory materials, light limiting materials, photocuring resin curing materials for photofabrication, materials for photochemotherapy, fluorescent dye materials for two-photon fluorescence microscopes, and the compounds of the present invention include photoelectric conversion elements, thin film transistor elements, It is also useful as various element materials for organic electronics such as light emitting elements.

A two-photon absorption material is a material that can excite molecules at a wavelength in the non-resonant region, and a material in which an actual excited state exists at an energy level approximately twice that of the photon used for excitation at this time. It is.
By the way, the two-photon absorption phenomenon is a kind of third-order nonlinear optical effect, in which a molecule absorbs two photons simultaneously and transitions from a ground state to an excited state. Since Luc Bredas et al. Elucidated the relationship between molecular structure and mechanism in 1998 (see Non-Patent Document 1: Science, 281, 1653 (1998)), research on materials with two-photon absorption ability has been progressing in recent years. It became so.
However, since the transition efficiency of such two-photon simultaneous absorption is extremely low compared to single-photon absorption and requires extremely high power density photons, it is almost neglected in the usual laser light intensity, and peak light intensity It has been confirmed that an ultra-short pulse laser of about femtosecond such as a mode-locked laser having a high (light intensity at the maximum emission wavelength) is used.

  The transition efficiency of two-photon absorption is proportional to the square of the applied photoelectric field (the two-photon absorption square characteristic). For this reason, when a laser is irradiated, two-photon absorption occurs only at a position where the electric field strength is high at the center of the laser spot, and no two-photon absorption occurs at a portion where the electric field strength is weak at the peripheral portion. In the three-dimensional space, two-photon absorption occurs only in a region where the electric field strength at the focal point where the laser light is collected by the lens is large, and no two-photon absorption occurs in the region outside the focal point because the electric field strength is weak. Compared to the linear absorption of one photon where excitation occurs at all positions in proportion to the intensity of the applied photoelectric field, the two-photon absorption is excited only at a pinpoint inside the space due to this square characteristic. Therefore, the spatial resolution is significantly improved.

  Utilizing this characteristic, research on a three-dimensional memory for recording bit data by causing a spectral change, a refractive index change or a polarization change by two-photon absorption at a predetermined position of a recording medium is underway. Since two-photon absorption occurs in proportion to the square of the intensity of light, a memory using two-photon absorption can reduce the spot size compared to a memory using one-photon absorption, and super-resolution recording. Is possible. In addition, from the characteristics of high spatial resolution derived from this square characteristic, development for applications such as a light limiting material, a cured material of a photo-curing resin for stereolithography, and a fluorescent dye material for a two-photon fluorescence microscope is being promoted.

  Furthermore, in the case of inducing two-photon absorption, it is possible to use a short-pulse laser in the near-infrared region that has a longer wavelength than the wavelength region in which the linear absorption band of the compound exists and does not have absorption. Since the near-infrared light of the so-called transparent region, which does not have a linear absorption band of the compound, is used, the excitation light can reach the inside of the sample without being absorbed or scattered, and because of the square characteristic of the two-photon absorption, Since pinpoints can be excited with high spatial resolution, two-photon absorption and two-photon emission are also expected in photochemotherapy applications such as two-photon contrast and two-photon photodynamic therapy (PDT) in biological tissues. In addition, research on upconversion lasing has been reported from the viewpoint of a wavelength conversion device because photons with higher energy than the energy of incident photons can be extracted by using two-photon absorption and two-photon emission.

Many inorganic materials have been found so far as two-photon absorption materials. However, inorganic materials are very difficult to put into practical use because so-called molecular design for optimizing desired two-photon absorption characteristics and various physical properties necessary for device manufacture is difficult. On the other hand, organic compounds can be optimized not only for the desired two-photon absorption by molecular design, but also for other physical properties, making it highly practical and a promising two-photon absorption material. It attracts attention.
As conventional organic two-photon absorption materials, pigment compounds such as rhodamine and coumarin, compounds such as dithienothiophene derivatives and oligophenylene vinylene derivatives are known. However, the two-photon absorption cross section showing the two-photon absorption capacity per molecule is small, and particularly when the femtosecond pulse laser is used, the two-photon absorption cross section is 200 (GM: × 10 ⁻⁵⁰ cm ⁴ · s · molecule). Most of those less than ⁻¹ · photon ⁻¹ ) have not yet been put into practical use.

<Application to two-dimensional multilayer optical memory using two-photon absorption material>
Recently, networks such as the Internet and high-definition TV are rapidly spreading. In addition, HDTV (High Definition Television) will soon be broadcast, and there is an increasing demand for a large-capacity recording medium for recording image information of 50 GB or more, preferably 100 GB or more at low cost and simple for consumer use. Furthermore, for business use such as computer backup use and broadcast backup use, an optical recording medium capable of recording large-capacity information of about 1 TB or more at high speed and at low cost is required. Under such circumstances, the conventional two-dimensional optical recording medium such as DVD ± R is about 25 GB at most even if the recording / reproducing wavelength is shortened due to the physical principle, and is sufficiently large enough to meet future demands. It cannot be said that capacity can be expected.

  Under such circumstances, a three-dimensional optical recording medium has attracted attention as an ultimate high-density, high-capacity recording medium. Three-dimensional optical recording media can be recorded in dozens or hundreds of layers in the three-dimensional (film thickness) direction, resulting in tens or hundreds of times the ultra-high density and ultra-high capacity recording of conventional two-dimensional recording media. That is what we are trying to achieve. In order to provide a three-dimensional optical recording medium, it is necessary to be able to access and write at an arbitrary place in the three-dimensional (film thickness) direction. As a means for this, a method using a two-photon absorption material and holography (interference) There is a method of using. In a three-dimensional optical recording medium using a two-photon absorbing material, so-called bit recording is possible over tens or hundreds of times based on the physical principle described above, and higher density recording is possible. It can be said to be the ultimate high-density, high-capacity optical recording medium.

Utilizing the two-photon absorption phenomenon enables various applications characterized by extremely high spatial resolution, but the two-photon absorption compounds currently available have low two-photon absorption capability, so excitation that induces two-photon absorption As a light source, an expensive very high-power laser is required. Therefore, in order to realize a practical application using two-photon absorption using a small and inexpensive laser, it is essential to develop a high-efficiency two-photon absorption material.
When the two-photon absorption material is used as a solid, it has been used by dispersing in a polymer. However, there has been a problem that the quality changes due to the occurrence of coating film defects due to crystallization of the two-photon absorption material or segregation due to migration during long-term storage.

  Various functional elements such as a photoelectric conversion element, a thin film transistor element, and a light emitting element have been proposed by utilizing the light emission characteristics and charge transport characteristics of organic materials. By using an organic material for these elements, the greatest advantages of the organic material such as light weight, low cost, low manufacturing cost, and flexibility are expected. Among these functional elements, various materials of low molecular weight and high molecular weight have been reported so far as photoelectric conversion elements, particularly solar cells and hole transport materials for electrophotographic photoreceptors. In the latter case, high speed printing and durability are required. Various materials of low molecular weight and high molecular weight have been reported as materials for light emitting elements. In low molecular weight systems, it has been reported that high efficiency is achieved by employing various laminated structures, and that durability is improved by well controlling the doping method. However, in the case of low molecular aggregates, it has been reported that the film state changes over time for a long time, and has an essential problem regarding the stability of the film. On the other hand, in the case of polymer materials, until now, vigorous studies have been made mainly on PPV (poly-p-phenylenevinylene) series and poly-thiophene. However, it is difficult to increase the purity of these material systems, and the intrinsically low fluorescence quantum yield is cited as a problem, and the current situation is that a high-performance light-emitting device has not been obtained. . However, in view of the inherently stable glass state of polymer materials, it is possible to construct excellent light-emitting elements if high fluorescence quantum efficiency can be imparted, and further improvements have been made in this field. ing. For example, a polymer material containing an arylamine unit as a repeating unit can be given as an example (see, for example, Patent Documents 1 to 5 and Non-Patent Document 1).

  On the other hand, various materials of low molecular weight and high molecular weight have been reported for organic thin film transistor elements. For example, pentacene, phthalocyanine, fullerene, anthradithiophene, thiophene oligomer, bisdithienothiophene, etc. for low molecular weight materials, and polymer materials containing polythiophene, polythienylene vinylene, and arylamine units as repeating units are also considered. (See Patent Document 6).

  In the polymer materials shown in the prior art, the mobility, which is a characteristic value of organic electronics materials, has been remarkably improved. However, considering the application to organic electronics materials, especially organic FET devices, higher mobility materials are desired. It is rare. In addition, it can be manufactured inexpensively, has sufficient flexibility and strength, is lightweight, and can take up the largest area as an element using an organic material. Must have good solubility. In general, a π-conjugated polymer characterized by a structure in which conjugation is extended often has a rigid structure, which causes a decrease in solubility. Even in the above-described prior art, there are many polymer materials having difficulty in solubility, and various molecular designs have been carried out to avoid this.

  As a three-dimensional optical recording medium using a two-photon absorption material, a method of reading with fluorescence using a fluorescent substance for recording / reproduction is disclosed in JP-T-2001-524245 (Patent Document 7) and JP-A-2000-512061. (Patent Document 8) and the like, and a method of reading by absorption or fluorescence using a photochromic compound is disclosed in JP-T-2001-522119 (Patent Document 9), JP-T-2001-508221 (Patent Document 10) and the like. None of the proposed two-photon absorption materials have been proposed, and the two-photon absorption compounds presented abstractly use two-photon absorption compounds with extremely low two-photon absorption efficiency. .

Further, since the photochromic compounds used in these patent documents are reversible materials, there are problems in non-destructive reading, long-term storage stability of recording, S / N ratio of reproduction, and the like, a method that is practical as an optical recording medium I can't say that. In particular, in terms of non-destructive readout, long-term storage stability of recording, etc., it is preferable to reproduce by changing the reflectance (refractive index or absorptivity) or emission intensity using an irreversible material. There was no example that specifically disclosed the absorbent material.
JP-A-6-28672 (Patent Document 11) and JP-A-6-118306 (Patent Document 12) disclose a recording apparatus, a reproducing apparatus, a reading method, and the like that perform three-dimensional recording by refractive index modulation. However, there is no description of a method using a two-photon absorption three-dimensional optical recording material.

  As described above, the reaction is caused by using the excitation energy obtained by non-resonant two-photon absorption, and as a result, the emission intensity when light is irradiated at the laser focus (recording) part and the non-focus (non-recording) part cannot be rewritten. If it can be modulated by this method, it is possible to cause emission intensity modulation at an extremely high spatial resolution at an arbitrary place in the three-dimensional space, and it can be applied to a three-dimensional optical recording medium that is considered to be the ultimate high-density recording medium. Become. Furthermore, since non-destructive readout is possible and the material is an irreversible material, it can be expected to have good storage stability and is practical.

  However, the currently available two-photon absorption compounds have a low two-photon absorption capability, so that a very high-power laser is required as a light source and a long recording time is required. Especially for use in three-dimensional optical recording media, construction of a two-photon absorption three-dimensional optical recording material that can perform recording with two-photon absorption with high sensitivity to achieve a fast transfer rate. Is essential. For that purpose, the difference between the two-photon absorption compound that can absorb two-photons with high efficiency and generate an excited state, and the two-photon absorption optical recording material using a two-photon absorption compound excited state in some way. Although a material containing a recording component that can efficiently form a thin film is effective, such a material has hardly been disclosed so far, and it has been desired to construct such a material.

  An object of the present invention is to have at least a two-photon absorption compound having a large two-photon absorption cross-sectional area, perform recording in a manner that cannot be rewritten using two-photon absorption of the two-photon absorption compound, and then irradiate the recording material with light. Thus, it is an object to provide a two-photon absorption optical recording material and a recording medium capable of recording / reproducing, which are reproduced by detecting differences in light emission, reflection intensity and the like.

That is, the present invention aims at the following.
(1) To provide an organic material that efficiently absorbs two-photons, that is, an organic material having a large two-photon absorption cross section, that realizes a change in spectrum, refractive index, or polarization state with high sensitivity.
(2) To provide an organic material having a stable quality with a large two-photon absorption cross-section in which coating film defects (crystallization, migration) do not occur even during long-term storage.
(3) To provide a material for a photoelectric conversion element that has excellent coating properties, has a two-photon absorption ability, has high hole transportability, and is excellent in durability. To provide a π-conjugated compound useful as a material for a light-emitting element having excellent light emission characteristics and excellent durability and as a material for an active layer of a thin film transistor.

As a result of intensive studies, the present inventors have found that the above problems can be solved by a polymer containing a monomer having a specific structure and a constitutional unit having a specific structure, and have reached the present invention.
That is, the said subject is solved by the following this invention (1)-(14).
(1) “Two-photon absorption material (arylene vinylene compound) characterized by being represented by the following general formula (I):

（式中、Ａｒ_３は置換または未置換の芳香族炭化水素あるいは芳香族複素環の２価基を表わし、Ａｒ_１、Ａｒ_２は置換または未置換の芳香族炭化水素基を表わし、それぞれ同一でも異なっていてもよい。Ａｒ_４、Ａｒ_５はそれぞれ独立に置換または未置換の芳香族炭化水素基である。Ｘは−Ｏ−、−Ｓ−、−ＳＯ−、−ＳＯ_２−、−ＣＯ−、Ｃ１〜Ｃ１２の単結合または分岐状、環状のアルキレン基、置換または未置換のアリレン基を表わす。Ｒ_１、Ｒ_２、Ｒ_３およびＲ_４は水素原子、置換または未置換のアルキル基またはアルコキシ基から選択される基を表わす。Ｙは水素原子または置換または未置換のフェニル基を表わす。）」、
（２）「下記一般式（II）で表わされることを特徴とする二光子吸収材料（アリレンビニレン化合物）：

(In the formula, Ar ₃ represents a substituted or unsubstituted aromatic hydrocarbon or a divalent group of an aromatic heterocyclic ring, Ar ₁ and Ar ₂ each represent a substituted or unsubstituted aromatic hydrocarbon group, Ar ₄ and Ar ₅ are each independently a substituted or unsubstituted aromatic hydrocarbon group, X is —O—, —S—, —SO—, —SO ₂ —, —CO—. , C1-C12 single bond or branched, cyclic alkylene group, substituted or unsubstituted arylene group, wherein R ₁ , R ₂ , R ₃ and R ₄ are a hydrogen atom, substituted or unsubstituted alkyl group or alkoxy; And Y represents a hydrogen atom or a substituted or unsubstituted phenyl group.
(2) “Two-photon absorption material (arylene vinylene compound) characterized by being represented by the following general formula (II):

（式中、Ａｒ_６は置換または未置換の芳香族炭化水素あるいは芳香族複素環の２価基を表わし、Ａｒ_７、Ａｒ_８はそれぞれ独立に置換または未置換の芳香族炭化水素基である。Ｒ_５は水素原子、アルキル基または置換または未置換のフェニル基を表わす。Ｙは水素原子または置換または未置換のフェニル基を表わす。）」、
（３）「下記一般式（III）で表わされることを特徴とする二光子吸収材料（アリレンビニレン化合物）：

(In the formula, Ar ₆ represents a substituted or unsubstituted aromatic hydrocarbon or an aromatic heterocyclic divalent group, and Ar ₇ and Ar ₈ are each independently a substituted or unsubstituted aromatic hydrocarbon group. R ₅ represents a hydrogen atom, an alkyl group or a substituted or unsubstituted phenyl group, and Y represents a hydrogen atom or a substituted or unsubstituted phenyl group.
(3) “A two-photon absorption material (arylene vinylene compound), which is represented by the following general formula (III):

（式中、Ａｒ_９は、下記式（ａ）または下記式（ｂ）で表わされる２価基、フェニレン、フルオレニレン、アントリレン、ビフェニレン、またはチオフェニレンを表わし、これらはアルキル基またはアルコキシ基で置換されていてもよい。Ａｒ_１０、Ａｒ_１１はフェニル基を表わし、それぞれ独立にアルキル基またはアルコキシ基で置換されていてもよい。Ｒ_６およびＲ_７は水素原子またはアルキル基を表わし、Ｒ_８およびＲ_９は水素原子、ハロゲン原子、アルキル基、アルコキシ基を表わす。Ｙは水素原子、フェニル基を表わし、該フェニル基は、アルキル基またはアルコキシ基で置換されていてもよい。）」、
（４）「下記一般式（IＶ）で表わされる繰り返し構成単位を有することを特徴とする二光子吸収材料（ポリアリレンビニレン化合物）：

(Wherein, Ar ₉ is a divalent group represented by the following formula (a) or the following formula (b), phenylene, fluorenyl Ren, Antori Ren represents biphenylene or thiophene vinylene, and these alkyl group or alkoxy Ar ₁₀ and Ar ₁₁ each independently represent a phenyl group, each of which may be independently substituted with an alkyl group or an alkoxy group, R ₆ and R ₇ each represent a hydrogen atom or an alkyl group, R ₈ and R ₉ are a hydrogen atom, a halogen atom, an alkyl group, .Y representing an alkoxy group is a hydrogen atom, a phenyl group and Table Wa, the phenyl group may be substituted with an alkyl group or an alkoxy group. ) ",
(4) “Two-photon absorption material (polyarylene vinylene compound) having a repeating structural unit represented by the following general formula (IV):

（式中、Ａｒ_３は置換または未置換の芳香族炭化水素あるいは芳香族複素環の２価基を表わし、Ａｒ_１、Ａｒ_２は置換または未置換の芳香族炭化水素基を表わし、それぞれ同一でも異なっていてもよい。Ｘは−Ｏ−、−Ｓ−、−ＳＯ−、−ＳＯ_２−、−ＣＯ−、Ｃ１〜Ｃ１２の単結合または分岐状、環状のアルキレン基、置換または未置換のアリレン基を表わす。Ｒ_１、Ｒ_２、Ｒ_３およびＲ_４は水素原子、置換または未置換のアルキル基またはアルコキシ基から選択される基を表わす。Ｙは水素原子または置換または未置換のフェニル基を表わす。）」、
（５）「下記一般式（Ｖ）で表わされる繰り返し構成単位を有することを特徴とする二光子吸収材料（ポリアリレンビニレン化合物）：

(In the formula, Ar ₃ represents a substituted or unsubstituted aromatic hydrocarbon or a divalent group of an aromatic heterocyclic ring, Ar ₁ and Ar ₂ each represent a substituted or unsubstituted aromatic hydrocarbon group, X is —O—, —S—, —SO—, —SO ₂ —, —CO—, C1-C12 single bond or branched, cyclic alkylene group, substituted or unsubstituted arylene. R ₁ , R ₂ , R ₃ and R ₄ represent a group selected from a hydrogen atom, a substituted or unsubstituted alkyl group or an alkoxy group, and Y represents a hydrogen atom or a substituted or unsubstituted phenyl group. Represents)),
(5) “Two-photon absorption material (polyarylene vinylene compound) having a repeating structural unit represented by the following general formula (V):

（式中、Ａｒ_６は置換または未置換の芳香族炭化水素あるいは芳香族複素環の２価基を表わす。Ｒ_５は水素原子、アルキル基または置換または未置換のフェニル基を表わす。Ｙは水素原子または置換または未置換のフェニル基を表わす。）」、
（６）「下記一般式（ＶI）で表わされる繰り返し構成単位を有することを特徴とする二光子吸収材料（ポリアリレンビニレン化合物）：

(In the formula, Ar ₆ represents a substituted or unsubstituted aromatic hydrocarbon or a divalent group of an aromatic heterocyclic ring. R ₅ represents a hydrogen atom, an alkyl group or a substituted or unsubstituted phenyl group. Y represents hydrogen. Represents an atom or a substituted or unsubstituted phenyl group.
(6) “Two-photon absorption material (polyarylene vinylene compound) having a repeating structural unit represented by the following general formula (VI):

（式中、Ａｒ_９は、下記式（ａ）または下記式（ｂ）で表わされる２価基、フェニレン、フルオレニレン、アントリレン、ビフェニレン、またはチオフェニレンを表わし、これらはアルキル基またはアルコキシ基で置換されていてもよい。Ｒ _６およびＲ_７は水素原子またはアルキル基を表わし、Ｒ_８およびＲ_９は水素原子、ハロゲン原子、アルキル基、アルコキシ基を表わす。Ｙは水素原子、フェニル基を表わし、該フェニル基は、アルキル基またはアルコキシ基で置換されていてもよい。）」、
（７）「前記第（１）項乃至第（６）項のいずれかに記載の二光子吸収材料を含む入射光に対して深さ方向に記録再生可能な三次元メモリ材料」、
（８）「前記第（１）項乃至第（６）項のいずれかに記載の二光子吸収材料を含むことを特徴とする光制限材料」、
（９）「前記第（１）項乃至第（６）項のいずれかに記載の二光子吸収材料を含むことを特徴とする光硬化樹脂の硬化材料」、
（１０）「前記第（１）項乃至第（６）項のいずれかに記載の二光子吸収材料を含むことを特徴とする二光子蛍光顕微鏡用蛍光色素材料」、
（１１）「前記第（１）項乃至第（６）項のいずれかに記載の二光子吸収材料を記録層中の少なくとも１種含む入射光に対して深さ方向に記録再生可能三次元記録媒体」、
（１２）「前記第（１）項乃至第（６）項のいずれかに記載の二光子吸収材料の少なくとも１種を含むことを特徴とする光制限素子」、
（１３）「前記第（１）項乃至第（６）項のいずれかに記載の二光子吸収材料の少なくとも１種を含むことを特徴とする光硬化システム」、
（１４）「前記第（１）項乃至第（６）項のいずれかに記載の二光子吸収材料の少なくとも１種を含むことを特徴とする二光子蛍光顕微鏡装置」。

(In the formula, Ar ₉ represents a divalent group represented by the following formula (a) or the following formula (b), phenylene, fluorenylene, anthrylene, biphenylene, or thiophenylene, which are substituted with an alkyl group or an alkoxy group. R ₆ and R ₇ each represent a hydrogen atom or an alkyl group, R ₈ and R ₉ each represent a hydrogen atom, a halogen atom, an alkyl group, or an alkoxy group, Y represents a hydrogen atom or a phenyl group, The phenyl group may be substituted with an alkyl group or an alkoxy group.
(7) “Three-dimensional memory material capable of recording / reproducing in the depth direction with respect to incident light including the two-photon absorbing material according to any one of (1) to (6)”,
(8) “Optical limiting material comprising the two-photon absorption material according to any one of the items (1) to (6)”,
(9) “Curing material of photo-curing resin characterized by including the two-photon absorption material according to any one of (1) to (6)”,
(10) “Fluorescent dye material for two-photon fluorescence microscope, comprising the two-photon absorption material according to any one of (1) to (6)”,
(11) “Three-dimensional recording capable of recording and reproducing in the depth direction with respect to incident light including at least one kind of the two-photon absorbing material according to any one of (1) to (6) in a recording layer Medium ",
(12) "Optical limiting element comprising at least one of the two-photon absorption materials according to any one of (1) to (6)",
(13) "A photocuring system comprising at least one of the two-photon absorption materials according to any one of (1) to (6)",
(14) "the paragraph (1), second (6) two-photon fluorescence microscope apparatus characterized in that it comprises at least one two-photon absorption materials according to any one of Items".

  The above items (1) to (3) show the basic structures of the two-photon absorption material and the organic electronics element material of the present invention, and the items (4) to (6) represent the two-photon absorption of the present invention. The material and the polymer structure of the organic electronics element material are shown, and the items (7) to (10) show examples of suitable industrial application materials. In addition, the items (11) to (14) are application examples of devices, apparatuses and systems containing the compound of the present invention.

  According to the present invention, a two-photon absorption compound with high photon absorption transition efficiency can be realized, and practical use using a small and inexpensive laser (three-dimensional memory material, light limiting material, photocuring resin curable material for photofabrication, photochemistry, etc. Therapeutic materials, fluorescent dye materials for two-photon fluorescence microscopes, etc.) can be realized. In addition, by using a two-photon absorption polymer in which sites having two-photon absorption ability are connected, coating film defects do not occur even during long-term storage, and stable quality can be obtained. Furthermore, it has become possible to provide materials for photoelectric conversion elements and light-emitting elements that have excellent coating properties and excellent durability. In addition, a promising compound can be provided as a material for an active layer of a thin film transistor.

(A) is a schematic diagram of a recording / reproducing system of a three-dimensional multilayer optical memory, and (b) is a schematic sectional view of a recording medium. It is a figure which shows an example of the optical limiting element which carries out the optical switching of the signal light of the wavelength which can carry out one-photon excitation by carrying out the two-photon excitation of the two-photon absorption material of this invention with the control light of the wavelength which can carry out two-photon excitation. It is the schematic of the apparatus of the two-photon stereolithography. It is the schematic which shows the basic composition of a two-photon excitation laser scanning microscope. It is the schematic of the measurement system used for the evaluation method of a two-photon absorption cross section. It is a figure which shows the infrared absorption spectrum (NaCl cast film | membrane) of (pi) conjugated polymer (1) obtained by the synthesis example 1. FIG. It is a figure which shows the infrared absorption spectrum (NaCl cast film | membrane) of (pi) conjugated polymer (2) obtained by the synthesis example 2. FIG. It is a figure which shows the infrared absorption spectrum (NaCl cast film | membrane) of (pi) conjugated polymer (3) obtained by the synthesis example 3. FIG. It is the schematic which shows the condition which carries out 2 light beam interference exposure of the pulsed laser beam to a photosensitive polymer film using an interference exposure apparatus, and the induced structure formed. It is a figure which shows the structure of a scanning optical microscope.

  The two-photon absorption optical recording material of the present invention can be applied directly on the substrate by using a spin coater, roll coater or bar coater, or can be cast as a film and laminated on the substrate by a usual method. Thus, a two-photon absorption optical recording material can be obtained.

Here, “substrate” means any natural or synthetic support, preferably one that can exist in the form of a flexible or rigid film, sheet or plate.
Preferred examples of the substrate include polyethylene terephthalate, resin-primed polyethylene terephthalate, polyethylene terephthalate subjected to flame or electrostatic discharge treatment, cellulose acetate, polycarbonate, polymethyl methacrylate, polyester, polyvinyl alcohol, and glass. The substrate may be provided with a guide groove for tracking and address information in advance.
The solvent used can be removed by evaporation during drying. Heating or reduced pressure may be used for evaporation removal.

Furthermore, a protective layer (intermediate layer) for blocking oxygen and preventing interlayer crosstalk may be formed on the two-photon absorption optical recording material. The protective layer (intermediate layer) is made of a plastic film or plate such as polypropylene, polyethylene, polyolefins such as polypropylene, polyvinyl chloride, polyvinylidene chloride, polyvinyl alcohol, polyethylene terephthalate or cellophane film. Alternatively, the layers may be laminated together or the polymer solution may be applied. Further, a glass plate may be bonded. Further, an adhesive or a liquid substance may be present between the protective layer and the photosensitive film and / or between the base material and the photosensitive film in order to improve airtightness. Further, the protective layer (intermediate layer) between the photosensitive films may be provided with tracking guide grooves and address information in advance.
By focusing on an arbitrary layer of the above-described three-dimensional multilayer optical recording medium and performing recording and reproduction, it functions as the three-dimensional recording medium of the present invention. Further, even if the layers are not separated by a protective layer (intermediate layer), three-dimensional recording in the depth direction is possible from the two-photon absorption dye characteristics.

  Hereinafter, preferred embodiments (specific examples) of the three-dimensional multilayer optical memory will be described. However, the present invention is not limited to these embodiments, and any structure capable of three-dimensional recording (recording in a plane and a film thickness direction) can be used. Any other structure may be used.

A schematic diagram of a recording / reproducing system of a three-dimensional multilayer optical memory is shown in FIG. 1A, and a schematic sectional view of a recording medium is shown in FIG.
In the recording medium (b) in the figure, a recording layer using the two-photon absorption compound of the present invention on a flat support (substrate 1) and an intermediate layer (protective layer) for preventing crosstalk are alternately (see FIG. 1 shows only about 5 layers), about 50 layers (or more) are stacked, and each layer is formed by spin coating. The recording layer preferably has a thickness of 0.01 to 0.5 μm, and the intermediate layer preferably has a thickness of 0.1 to 5 μm. Large-capacity optical recording can be realized. Further, a substrate (2) (protective layer) similar to the substrate (1) or a reflective layer made of a high reflectance material is formed by a data reproduction method (transmission / or reflection type).
A single beam is used at the time of recording, and in this case, ultrashort pulse light of femtosecond order can be used. At the time of reproduction, it is also possible to use light having a wavelength different from that of the beam used for data recording or light of the same wavelength with low output. Recording and reproduction can be performed in either bit units or depth direction units, and parallel recording / reproduction using a surface light source, a two-dimensional detector, or the like is effective in increasing the transfer rate.
Although not shown, even a bulk-shaped recording layer having no intermediate layer can be recorded / reproduced as a so-called hologram type page data in the depth direction, whereby the recording / reproduction transfer rate can be increased.
As a form of the three-dimensional multilayer optical memory similarly formed according to the present invention, although not shown, a card-like, tape-like, drum-like laminated medium or the like can be mentioned.

<Application to optical limiting element using two-photon absorption material>
In optical communication and optical information processing, optical control such as modulation and switching is required to carry signals such as information with light. For this type of light control, an electro-light control method using an electric signal has been conventionally employed. However, the electro-optical control method has limitations such as a band limitation due to a CR time constant as in an electric circuit, a processing speed being limited due to a response speed of the element itself and a speed mismatch between an electric signal and an optical signal. In order to make full use of the broadband and high speed, which are the advantages of light, light-light control technology for controlling an optical signal with an optical signal becomes very important. An optical element manufactured by processing the two-photon absorption material of the present invention in response to this requirement utilizes an optical change such as transmittance, refractive index, absorption coefficient, etc. caused by irradiating light, and an electronic circuit. By modulating the intensity and frequency of light without using technology, it can be applied to optical switches in optical communication, optical exchange, optical computers, optical interconnections, and the like.

  The optical limiting element of the present invention that utilizes the change in optical characteristics due to two-photon absorption provides an optically limiting element that is formed from a normal semiconductor material and an element that has a much higher response speed than those based on one-photon excitation. be able to. Further, because of the high sensitivity, it is possible to provide an optical limiting element excellent in signal characteristics with a high S / N ratio.

  FIG. 2 is an example of an optical limiting element that optically switches signal light having a wavelength that can be excited by one photon by exciting the two-photon absorbing material of the present invention with control light having a wavelength that can be excited by two photons. . Although the form of the two-photon absorption material sandwiched between the protective layers is shown, this configuration does not limit the present invention.

JP-A-8-320422 is cited as a known document of the light limiting element in the present invention. According to this, a photorefractive material whose refractive index changes with light irradiation is irradiated with light of a wavelength whose refractive index changes to induce self-focusing (SONET; Self-Organized Light Net Work), and the refractive index distribution. It is disclosed to form an optical waveguide that forms
That is, a single thin film of a material having a high two-photon absorption ability of the present invention, or a solid material dispersed in a photocurable resin or a resin that can be variously shaped is arranged as an optical element, and has a single wavelength ( It is possible to design an optical waveguide using a refractive index change distribution depending on the wavelength by being excited to the excited state by the light of λ1) and further excited to the other state by the light of another wavelength (λ2) from that state. . Many of the two-photon absorption materials have fluorescence, and a fluorescent substance is arranged at one of the emission ends of the optical device or in the vicinity thereof, and excitation light (λ1) is emitted from the other, and excitation light and fluorescence ( A refractive index profile can also be formed by λ2). In this case, since the fluorescence is usually weaker than the excitation light, it is desirable to increase the sensitivity at the fluorescence wavelength. Examples of the fluorescent substance include those obtained by dispersing a fluorescent dye in a photocurable substance or various resins.

<Application to stereolithography materials>
A schematic diagram of a two-photon stereolithography apparatus is shown in FIG. 3 and described below.
After passing the light from the near-infrared pulse laser light source (1) through the mirror scanner (5), it is focused into the photo-curable resin (9) using a lens, and the laser spot is scanned to induce two-photon absorption. This is a two-photon micro stereolithography method in which the resin is cured only in the vicinity of the focal point to form an arbitrary three-dimensional structure.

  The pulsed laser beam is condensed by a lens, and a region with high photon density is formed in the vicinity of the focal point. At this time, since the total number of photons passing through each cross section of the beam is constant, when the beam is scanned two-dimensionally within the focal plane, the total light intensity in each cross section is constant. However, since the probability of occurrence of two-photon absorption is proportional to the square of the light intensity, a region where the generation of two-photon absorption is high is formed only near the condensing point where the light intensity is high. Thus, by condensing the pulsed laser light with the lens and inducing two-photon absorption, it is possible to limit the light absorption near the condensing point and to cure the resin in a pinpoint manner. Since the condensing point can be freely moved in the photocurable resin liquid by the Z stage (6) and the galvanometer mirror, a desired three-dimensional workpiece can be freely formed in the photocurable resin liquid. .

The features of the two-photon stereolithography include the following items.
(1) Processing resolution exceeding the diffraction limit: Processing resolution exceeding the diffraction limit of light can be realized by the non-linearity of the two-photon absorption with respect to the light intensity.
(2) Ultra-high speed modeling: When two-photon absorption is used, the photo-curing resin does not cure in principle in a region other than the focal point. For this reason, the light intensity to be irradiated can be increased, and the beam scanning speed can be increased. For this reason, modeling speed can be improved about 10 times.
(3) Three-dimensional processing: The photocurable resin is transparent to near-infrared light that induces two-photon absorption. Therefore, even when the focused light is condensed deeply into the resin, internal curing is possible. In the conventional method, when the beam is condensed deeply, the light intensity at the condensing point is reduced by light absorption, and the internal curing becomes difficult. In the present invention, these problems can be solved reliably. .
(4) High yield: In the conventional method, there is a problem that the modeled object is damaged or deformed due to the viscosity or surface tension of the resin. However, in this method, the problem is solved because the modeling is performed inside the resin.
(5) Application to mass production: By using ultra-high-speed modeling, it is possible to manufacture a large number of parts or movable mechanisms continuously in a short time.

  The photocurable resin for two-photon stereolithography is a resin having a characteristic of causing a two-photon polymerization reaction when irradiated with light and changing from a liquid to a solid. The main components are a resin component consisting of an oligomer and a reactive diluent and a photopolymerization initiator (including a photosensitizing material as required). An oligomer is a polymer having a degree of polymerization of about 2 to 20, and has a large number of reactive groups at its ends. Further, a reactive diluent is added to adjust the viscosity, curability and the like. When irradiated with light, the polymerization initiator or photosensitizing material absorbs this two-photon, and a reactive species is generated directly from the polymerization initiator or through the photosensitizing material, to the reactive group of the oligomer or reactive diluent. React and initiate polymerization. Thereafter, a chain polymerization reaction takes place between them to form a three-dimensional cross-link, and in a short time, a solid resin having a three-dimensional network structure is formed.

  Photocurable resins are used in fields such as photocurable inks, photoadhesives, and layered three-dimensional modeling, and resins having various characteristics have been developed. In particular, in the layered three-dimensional modeling, (1) good reactivity, (2) small deposition shrinkage during curing, (3) excellent mechanical properties after curing, etc. are important. . These characteristics are equally important in this method. Therefore, resins developed for layered three-dimensional modeling that have two-photon absorption characteristics are also used as photocurable resins for two-photon photofabrication in this method. it can. As specific examples, acrylate-based and epoxy-based photocurable resins are often used, and urethane acrylate-based photocurable resins are particularly preferable.

  JP-A-2005-134873 can be cited as a publicly known document relating to optical modeling in the present invention. According to this, as shown in FIG. 9, the pulsed laser light (4a, 4b) in the wavelength region that exhibits the photosensitive function is applied to the surface of the photosensitive polymer film (3) without interfering with the mask. By doing so, the bell-shaped convex structure formed through the surface relief rating structure is formed without rotating the position of the polymer film (3) or rotating in the direction of interference exposure. It is important that the pulsed laser beam is a pulsed laser beam in a wavelength region that allows the photosensitive polymer film to exhibit a photosensitive function. Therefore, the wavelength region of the pulsed laser light can be appropriately selected according to the type of the photosensitive polymer or the type of group or site that exhibits the photosensitive function in the photosensitive polymer. In particular, even if the wavelength of the pulsed laser light emitted from the light source is not in a wavelength region that causes the photosensitive polymer film to exhibit a photosensitive function, by utilizing a multiphoton absorption process upon irradiation with the pulsed laser light, The photosensitive polymer film can exhibit a photosensitive function. Specifically, when the pulsed laser light emitted from the light source is condensed and irradiated with the condensed pulsed laser light, multiphoton absorption (for example, two-photon absorption, three-photon absorption, four-photon absorption, Photosensitive polymer film even if the wavelength of the pulsed laser light emitted from the light source is not in a wavelength region that causes the photosensitive polymer film to perform a photosensitive function. Is substantially irradiated with a pulsed laser beam in a wavelength region that causes the photosensitive polymer film to exhibit a photosensitive function. As described above, the pulsed laser beam for the interference exposure may be substantially a pulsed laser beam in a wavelength region that causes the photosensitive polymer film to exhibit the photosensitive function, and the wavelength is appropriately selected depending on the irradiation conditions. can do. For example, the high-efficiency two-photon absorbing material of the present invention is used as a photosensitizing material, dispersed in an ultraviolet curable resin, etc., and a photosensitive solid, and only the focal spot is cured using the two-photon absorption ability of the photosensitive solid. It is possible to obtain an ultra-precise three-dimensional structure using

  The two-photon absorption material of the present invention can be used as a two-photon absorption polymerization initiator or a two-photon absorption photosensitizer. Compared to conventional two-photon absorption materials (two-photon absorption polymerization initiators or two-photon absorption photosensitizers), the two-photon absorption sensitivity is high, so high-speed modeling is possible, and the laser light source is small and inexpensive as an excitation light source. Can be used for practical applications that can be mass-produced.

<Application to two-photon fluorescence microscope using two-photon absorption material>
A two (multi) photon excitation laser scanning microscope collects and scans a near-infrared pulse laser on the sample surface, and detects fluorescence generated by excitation by absorption of two (multi) photons there. It is a microscope to obtain
A schematic diagram of the basic configuration of the two-photon excitation laser scanning microscope is shown in FIG.
Laser light source (1) that emits sub-picosecond monochromatic coherent light pulses in the near-infrared region, light beam conversion optical system (2) that changes the light beam from the laser light source to a desired size, and light beam conversion optical system A scanning optical system (3) for condensing and scanning the light beam on the image plane of the objective lens, an objective lens system (4) for projecting the collected converted light beam onto the sample surface (5), and a photodetector ( 7).

The pulse laser beam (1) passes through the dichroic mirror (6), is condensed by the light beam conversion optical system and the objective lens system, and is focused on the sample surface. It produces fluorescence induced by photon absorption. The sample surface is scanned with a laser beam, the fluorescence intensity at each location is detected by a light detection device such as a light detector (7), and plotted on a computer based on the obtained position information. A fluorescent image is obtained. As the scanning mechanism, for example, a laser beam may be scanned using a movable mirror such as a galvanometer mirror, or a sample including a two-photon absorption material placed on a stage may be moved.
With such a configuration, it is possible to obtain high resolution in the optical axis direction by utilizing the nonlinear effect of two-photon absorption itself. In addition, if a confocal pinhole plate is used, higher resolution (both in-plane and in the optical axis direction) can be obtained.

  Fluorescent dyes for two-photon fluorescence microscopy are used by staining or dispersing specimens, and can be used not only for industrial applications but also for three-dimensional imaging microimaging of biological cells, etc. Compounds with absorption cross sections are desired

  Japanese Patent Laid-Open No. 9-230246 is cited as a known document of the photon fluorescence microscope in the present invention. For example, as shown in FIG. 10, a scanning fluorescence microscope has a substrate (on which a laser irradiation optical system that emits collimated light (1) enlarged to a desired size and a plurality of condensing elements (2) are formed. 3), the light-condensing element (2) is disposed so that the light condensing position coincides with the image position of the objective lens system (7), and the light-condensing element (2) is formed on the substrate. A beam splitter (4) that transmits a long wavelength and reflects a short wavelength is arranged between (3) and the objective lens system (7), and generates fluorescence by multiphoton absorption on the sample surface (11). It is a feature. With such a configuration, it is possible to obtain high resolution in the optical axis direction by utilizing the nonlinear effect of multiphoton absorption itself. In addition, if the confocal pinhole plate (5) is used, higher resolution (both in the plane and in the optical axis direction) can be obtained. Such a two-photon optical element uses, as the optical element, a solid material dispersed in a material having a high two-photon absorption ability, a thin film, or a photocurable resin of the present invention, just like the above-described light control element. Is possible.

  The two-photon absorption material of the present invention can be used as a two-photon absorption fluorescent material for a two-photon excitation laser scanning microscope. Compared to conventional two-photon absorption fluorescent materials, it has a large two-photon absorption cross-sectional area, so that it exhibits high two-photon absorption characteristics at a low concentration. Therefore, according to the present invention, not only a highly sensitive two-photon absorption material can be obtained, but there is no need to increase the intensity of light applied to the material, and deterioration and destruction of the material can be suppressed. The adverse effect on the properties of other components can also be reduced.

The two-photon absorption material of the present invention can be applied to various devices by itself or in a thin film mixed with various resins, or in bulk.
For example, in an optical disc, the thin film is in contact with a substrate, and the substrate material is polyethylene terephthalate, polycarbonate, polymethyl methacrylate, polyester, polyvinyl alcohol, glass or the like. In the case of stacking, the surface of the thin film is in contact with the intermediate layer (partition layer). Specific examples of the intermediate layer include polyolefins such as polypropylene and polyethylene, polyvinyl chloride, polyvinylidene chloride, polyvinyl alcohol, plastic films such as polyethylene terephthalate or cellophane film, and various photo-curing resins.
Next, even when applied to various optical devices and optical modeling devices, they are mixed with various resins or mixed with a photocurable resin.
Accordingly, the use requirement of the two-photon absorption material of the present invention is that the material is mixed with various resins or glass, or the interface of the two-photon absorption material layer is in contact with various resins or glass.
In other words, the two-photon absorption material of the present invention is in contact with various resins or glass at the micro level or the macro level.

The method for producing the polymer compound of the present invention will be described below.
The production method of the π-conjugated polymer of the present invention includes, for example, Wittig-Horner reaction using aldehyde and phosphonate, Wittig reaction using aldehyde and phosphonium salt, Heck reaction using vinyl substituent and halide, amine and halide. The used Ullmann reaction etc. can be used and can be produced by a known method. In particular, the Wittig-Horner reaction and the Wittig reaction are effective because of the simplicity of the reaction operation.
As an example, a method for producing a polymer in the present invention using a Wittig-Horner reaction will be described. The polymer in the present invention generally comprises a solution in which the phosphonic acid ester compound and the aldehyde compound are present stoichiometrically equal to each other as shown in the following reaction formula (1), and a base more than twice the molar amount thereof. By mixing, the polymerization reaction can proceed. Further, by adding a plurality of types of phosphonic acid ester compounds or aldehyde compounds into the reaction system, a random copolymer can be obtained and various characteristics can be adjusted.

The base used in the above reaction is not particularly limited as long as a phosphonate carbanion is formed, and examples thereof include metal alkoxides, metal hydrides, and organic lithium compounds, such as potassium t-butoxide, sodium t-butoxide, lithium t. -Butoxide, potassium 2-methyl-2-butoxide, sodium 2-methyl-2-butoxide, sodium methoxide, sodium ethoxide, potassium ethoxide, potassium methoxide, sodium hydride, potassium hydride, methyllithium, ethyllithium Propyl lithium, n-butyl lithium, s-butyl lithium, t-butyl lithium, phenyl lithium, lithium naphthylide, lithium amide, lithium diisopropylamide and the like.
The amount of the base used in the reaction is usually only the same amount as the polymerization active point of the phosphonate ester compound, but an excessive amount can be used.

  The above-mentioned base may be added to the reaction system in a solid state or a suspension solution. However, in order to improve the homogeneity of the resulting polymer, it is particularly preferable to add it as a homogeneous solution. As the solvent for dissolving the base, a solvent that forms a stable solution with the base to be used must be selected, but as other factors, those having a high solubility of the base are preferable, and the high molecular weight product produced in the reaction system is also preferred. Those that do not impair the solubility in the reaction solvent are good. Further, the solvent in which the high molecular weight product to be formed dissolves well is good. Depending on the characteristics of the base used and the high molecular weight to be produced, generally known alcohols and ethers are used. It can be arbitrarily selected from a system, an amine system, a hydrocarbon solvent and the like.

  Examples of a combination of a base and a solvent for uniformly dissolving the base include, for example, a methanol solution of sodium methoxide, an ethanol solution of sodium ethoxide, a 2-propanol solution of potassium t-butoxide, and 2-methyl-2-methyl ester of potassium t-butoxide. Propanol solution, tetrahydrofuran solution of potassium t-butoxide, dioxane solution of potassium t-butoxide, hexane solution of n-butyllithium, ether solution of methyllithium, tetrahydrofuran solution of lithium t-butoxide, cyclohexane solution of lithium diisopropylamide, potassium bis There are various combinations of solutions including a toluene solution of trimethylsilylamide and the like, and some solutions are easily available as commercial products. From the viewpoint of mild reaction conditions and ease of handling, a metal alkoxide-based solution is preferably used, such as solubility of the polymer to be produced, ease of handling, efficiency of the reaction, solubility of the polymer to be produced, etc. From the viewpoint, an ether system of metal t-butoxide is more preferably used, and a tetrahydrofuran solution of potassium t-butoxide is more preferably used.

  In the above polymerization reaction, a base solution may be added to the solution of the phosphonate ester compound and the aldehyde compound, a solution of the phosphonate ester compound and the aldehyde compound may be added to the base solution, and may be added to the reaction system at the same time. There is no restriction on the order of addition.

  The polymerization time in the above polymerization reaction may be appropriately set according to the reactivity of the monomers used or the molecular weight of the desired polymer, but is preferably 0.2 hours to 30 hours.

  The reaction temperature in the above polymerization reaction does not need to be controlled, and the polymerization reaction proceeds well at room temperature. However, it is possible to heat or cool to a milder condition in order to increase the reaction efficiency.

  In addition, a molecular weight regulator or a sealing agent for sealing the end of the polymer as a terminal modifying group can be added during or after the reaction to adjust the molecular weight in the above polymerization operation. It can also be added at the start. Therefore, the substituent based on the terminator may be bonded to the terminal of the π-conjugated polymer in the present invention.

  The preferred molecular weight of the polymer of the present invention is 1,000 to 1,000,000, more preferably 2000 to 500,000 in terms of polystyrene-reduced number average molecular weight. When the molecular weight is too small, the film forming property such as the generation of cracks is deteriorated and the practicality becomes poor. On the other hand, when the molecular weight is too large, the solubility in a general organic solvent is deteriorated, the viscosity of the solution becomes high and the coating becomes difficult, which also causes a problem in practical use.

  Also, a small amount of a branching agent can be added during the polymerization in order to improve the mechanical properties. The branching agent used is a compound having three or more polymerization reaction active groups (which may be the same or different). These branching agents may be used alone or in combination.

  The π-conjugated polymer obtained as described above is used after removing impurities such as the base, unreacted monomer, terminal terminator used in the polymerization, and inorganic salts generated during the polymerization. For these purification operations, conventionally known methods such as reprecipitation, column chromatography, adsorption, extraction, Soxhlet extraction, ultrafiltration, dialysis and the like can be used.

  The polymer of the present invention obtained by the above-described production method is a known film-forming method such as spin coating method, casting method, dipping method, ink jet method, doctor blade method, screen printing method, etc. A good thin film excellent in durability and the like can be produced, and can be suitably used as a material for various functional elements utilizing a photoelectric conversion element, a thin film transistor element, a light emitting element, and two-photon absorption characteristics.

  In addition, the monomer compound in the present invention can be obtained by the following three-step reaction according to the above-described polymer synthesis method. In the reaction formulas (2) to (4) below, Ar ′ and Ar ″ each independently represent a substituted or unsubstituted aromatic hydrocarbon group.

Next, the structural units (I) to (VI) of the polymer of the present invention will be described in more detail.
Ar ₃ , Ar ₆ and Ar ₉ in the general formulas (I) to (VI) are substituted or unsubstituted monocyclic groups and polycyclic groups (fused polycyclic groups and non-fused polycyclic groups) aromatic hydrocarbon groups. Or it is an aromatic heterocyclic group, and the following can be mentioned as an aromatic hydrocarbon group. Examples thereof include a phenyl group, a naphthyl group, a pyrenyl group, a fluorenyl group, an azulenyl group, an anthryl group, a triphenylenyl group, a chrycenyl group, a biphenyl group, and a terphenyl group. Examples of the aromatic heterocyclic group include thiophene, benzothiophene, dithienylbenzene, furan, benzofuran, carbazole and the like. Moreover, said aromatic hydrocarbon group and aromatic heterocyclic group may have the substituent shown below.

(1) Halogen atom, trifluoromethyl group, cyano group, nitro group.
(2) An unsubstituted or substituted alkyl group or alkoxy group having 1 to 25 carbon atoms.
(3) Aryloxy group. (An aryloxy group having a phenyl group or a naphthyl group as the aryl group is exemplified. This is an unsubstituted or substituted alkyl group having 1 to 25 carbon atoms, an unsubstituted or substituted alkoxy group having 1 to 25 carbon atoms, or A halogen atom may be contained as a substituent, specifically, a phenoxy group, 1-naphthyloxy group, 2-naphthyloxy group, 4-methylphenoxy group, 4-methoxyphenoxy group, 4-chlorophenoxy group, And 6-methyl-2-naphthyloxy group.
(4) An alkylthio group or an arylthio group. (Specific examples of the alkylthio group or arylthio group include a methylthio group, an ethylthio group, a phenylthio group, and a p-methylphenylthio group.)
(5) An alkyl-substituted amino group. (Specifically, diethylamino group, N-methyl-N-phenylamino group, N, N-diphenylamino group, N, N-di (p-tolyl) amino group, dibenzylamino group, piperidino group, morpholino group And a urolidyl group.)
(6) Acyl group. (Specific examples of the acyl group include an acetyl group, a propionyl group, a butyryl group, a malonyl group, and a benzoyl group.)
R ₁ , R ₂ , R ₃ and R ₄ in the general formulas (I) and (IV) represent a group selected from a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, an alkoxy group or an alkylthio group. Specific examples thereof are the same as those defined above.

  The π-conjugated polymers (I) to (VI) of the present invention can have a substituent on the aromatic ring as described above, but an alkyl group, an alkoxy group, an alkylthio group, etc. from the viewpoint of improving solubility in an organic solvent. Is more preferable. If the number of carbons of these substituents increases, the solubility will be further improved, but on the other hand, the properties such as two-photon absorption properties and charge transport properties will decrease, so the desired properties are within the range where the solubility is not impaired. It is preferable to select a substituent that yields Examples of suitable substituents in that case include an alkyl group having 1 to 25 carbon atoms, an alkoxy group, and an alkylthio group. More preferable examples include an alkyl group having 2 to 18 carbon atoms, an alkoxy group, and an alkylthio group. A plurality of the same substituents may be introduced, or a plurality of different substituents may be introduced. In addition, these alkyl groups, alkoxy groups and alkylthio groups are further halogen atoms, cyano groups, phenyl groups, hydroxyl groups, carboxyl groups, linear, branched or cyclic alkyl groups or alkoxy groups having 1 to 12 carbon atoms, alkoxythio groups, alkylthio groups. A phenyl group substituted with a group may be contained.

  Specific examples of the alkyl group include methyl group, ethyl group, n-propyl group, i-propyl group, t-butyl group, s-butyl group, n-butyl group, i-butyl group, pentyl group, hexyl group, Heptyl, octyl, nonyl, decyl, 3,7-dimethyloctyl, 2-ethylhexyl, trifluoromethyl, 2-cyanoethyl, benzyl, 4-chlorobenzyl, 4-methylbenzyl, A cyclopentyl group, a cyclohexyl group, etc. can be mentioned as an example, As an alkoxy group and an alkylthio group, what made the alkoxy group and the alkylthio group by inserting an oxygen atom or a sulfur atom in the bond position of the said alkyl group is mentioned as an example. .

An example of the phosphonic acid ester compound (reaction precursor) that is the basis of the moiety represented by Ar ₃ , Ar ₆ , Ar ₉ of the present invention is shown below.

また以下に反応前駆体例としてジアルデヒド化合物の一例を示す。

Moreover, an example of a dialdehyde compound is shown below as an example of a reaction precursor.

In addition to the above, the dialdehyde compound which is a precursor for obtaining the general formulas (I) and (IV) used in the present invention is disclosed in Japanese Patent Application Laid-Open No. 2000-63337, “aldehyde compound” previously proposed by the present inventors. And its manufacturing method ”.
The contents are listed below for reference only.
That is, in the publication, “the following formula (2)

（式中、Ａｒ³、Ａｒ⁶は置換もしくは無置換のアリール基を表わし、それぞれ同一でも異なっていてもよい。Ｒ¹、Ｒ²、Ｒ³、Ｒ⁴は水素原子、置換もしくは無置換のアルキル基、置換もしくは無置換のアルコキシ基を表わし、それぞれ同一でも異なっていてもよい。Ｘは−Ｏ−、−Ｓ−、−ＳＯ−、−ＳＯ₂−、−ＣＯ−、−ＣＨ₂ＣＨ₂−、Ｃ₄〜Ｃ₁₂の直鎖状または分岐状、環状のアルキレン基、置換もしくは無置換のアリレン基を表わす。）で表わされるアルデヒド化合物。」、および、「下記式（３）

(In the formula, Ar ³ and Ar ⁶ each represent a substituted or unsubstituted aryl group, which may be the same or different. R ¹ , R ² , R ³ and R ⁴ are a hydrogen atom, a substituted or unsubstituted alkyl group, respectively. Represents a group, a substituted or unsubstituted alkoxy group, which may be the same or different, and X is —O—, —S—, —SO—, —SO ₂ —, —CO—, —CH ₂ CH ₂ —; , A C _{4 to} C ₁₂ linear or branched, cyclic alkylene group, a substituted or unsubstituted arylene group. And "the following formula (3)"

（式中、Ｒ¹、Ｒ²、Ｒ³、Ｒ⁴、Ｒ⁵、Ｒ⁶は水素原子、置換もしくは無置換のアルキル基、置換もしくは無置換のアルコキシル基を表わし、それぞれ同一でも異なっていてもよい。Ｘは−Ｏ−、−Ｓ−、−ＳＯ−、−ＳＯ₂−、−ＣＯ−、−ＣＨ₂ＣＨ₂−、Ｃ₄〜Ｃ₁₂の直鎖状または分岐状、環状のアルキレン基、置換もしくは無置換のアリレン基を表わす。）で表わされるアルデヒド化合物。」が開示され、「これらアルデヒド化合物は、下記式（５）

(Wherein R ¹ , R ² , R ³ , R ⁴ , R ⁵ , R ⁶ represent a hydrogen atom, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted alkoxyl group, which may be the same or different. X is —O—, —S—, —SO—, —SO ₂ —, —CO—, —CH ₂ CH ₂ —, a C _{4 to} C ₁₂ linear or branched, cyclic alkylene group, Represents a substituted or unsubstituted arylene group). "These aldehyde compounds are represented by the following formula (5)

（式中、Ａｒ³、Ａｒ⁶、Ｒ¹、Ｒ²、Ｒ³、Ｒ⁴、Ｘは前記の定義と同一）で表わされるジアミン化合物をホルミル化することにより製造すること」、「下記式（６）

(Wherein Ar ³ , Ar ⁶ , R ¹ , R ² , R ³ , R ⁴ , and X are as defined above) are produced by formylation ”,“ the following formula ( 6)

「＜例１＞窒素気流下、Ｎ，Ｎ−ジメチルホルムアミド（ＤＭＦ）１００ｍｌにオキシ塩化リン７７．２８ｇ（５０４．０ｍｍｏｌ）を氷冷下３〜６℃で２０分かけて滴下し、ヴィルスマイヤー試薬を生成させた。これに下記式（７）

“<Example 1> Under nitrogen flow, 77.28 g (504.0 mmol) of phosphorus oxychloride was added dropwise to 100 ml of N, N-dimethylformamide (DMF) at 3-6 ° C. over 20 minutes under ice cooling, and the Vilsmeier reagent was added. The following formula (7)

で表わされるジアミン化合物５４．６７ｇ（１０５．０ｍｍｏｌ）をＤＭＦ３００ｍｌを用いて溶液とし、６℃で３０分かけて滴下した。撹拌しながら３０分かけて室温に戻し、更に８６℃で３時間撹拌した。次に反応液を室温まで放冷した後、氷水２０００ｍｌに注ぎ、２０％水酸化ナトリウム水溶液を加えアルカリ性として、室温で２時間撹拌を行なった。こうして生成した黄色沈殿物を酢酸エチルを用いて抽出し、さらに抽出した有機層を水洗し、無水硫酸マグネシウムで乾燥を行った。この酢酸エチル溶液を減圧下留去して黄黒色油状物を得た。これをシリカゲルカラムクロマト処理（溶離液；トルエン／酢酸エチル＝２０／１ｖｏｌ）を行ない、下記のジアルデヒド化合物の黄色結晶４７．１６ｇ（収率７７．９％）を得た。融点は１５５．５−１５７．５℃、元素分析値はＣ₃₈Ｈ₂₈Ｎ₂Ｏ₂Ｓとして、Ｃ％（実測値；７９．１４、計算値；７９．３１）、Ｈ％（実測値；４．８９、計算値；４．９６）、Ｎ％（実測値；４．８６、計算値；４．７４）。

A diamine compound represented by the formula (54.67 g, 105.0 mmol) was made into a solution using 300 ml of DMF and added dropwise at 6 ° C. over 30 minutes. The mixture was returned to room temperature over 30 minutes with stirring, and further stirred at 86 ° C. for 3 hours. Next, the reaction solution was allowed to cool to room temperature, poured into 2000 ml of ice water, made alkaline by adding a 20% aqueous sodium hydroxide solution, and stirred at room temperature for 2 hours. The yellow precipitate thus formed was extracted with ethyl acetate, and the extracted organic layer was washed with water and dried over anhydrous magnesium sulfate. The ethyl acetate solution was distilled off under reduced pressure to obtain a yellow black oily substance. This was subjected to silica gel column chromatography (eluent: toluene / ethyl acetate = 20/1 vol) to obtain 47.16 g (yield 77.9%) of yellow crystals of the following dialdehyde compound. The melting point was 155.5-157.5 ° C., and the elemental analysis values were C ₃₈ H ₂₈ N ₂ O ₂ S, C% (actual value; 79.14, calculated value; 79.31), H% (actual value; 4.89, calculated value; 4.96), N% (actual value; 4.86, calculated value; 4.74).

」。
「＜例２〜３＞例１において上記式（７）で表わされるジアミン化合物の代わりに下記表に示す原料を用いるほかは、例１と同様に操作して目的のアルデヒド化合物を得た。

"
<Examples 2-3> The target aldehyde compound was obtained in the same manner as in Example 1 except that the raw materials shown in the following table were used in place of the diamine compound represented by the above formula (7) in Example 1.

」。
本発明においては、このようなアルデヒド化合物を出発原料として用いることができる。

"
In the present invention, such an aldehyde compound can be used as a starting material.

  The solubility of the compound of the present invention in a solvent is improved by the presence of an alkyl group or an alkoxy group. Improving the solubility of these materials increases the manufacturing tolerance of the wet film-forming process when manufacturing various elements and devices utilizing two-photon characteristics, photoelectric conversion elements, thin film transistor elements, light emitting elements, etc. Is important. For example, the choice of coating solvent is expanded, the temperature range during solution preparation is expanded, the temperature and pressure range during solvent drying is expanded, and high-quality thin films with high purity and high uniformity due to their high processability. Is obtained.

  Here, the above-mentioned compound No. Nos. 25, 26, 27 and 28 are special dialdehyde compounds, so Specific synthesis examples for 25 dialdehyde compounds are shown below.

<Dialdehyde Compound No. 25 synthesis examples>
1.58 g of 2,7-diphenylamino-9,9-dimethylxanthene was dissolved in 40 ml of dehydrated N, N-dimethylformamide, and 1.78 g of phosphorus oxychloride was gradually added dropwise at room temperature under a nitrogen stream. After heating and stirring at 78 to 88 ° C. for 11 hours, the mixture was allowed to cool to room temperature, the contents were poured into ice water, and 20% sodium hydroxide aqueous solution was added to make it alkaline. After extraction with ethyl acetate, the organic layer was washed with water and dried, and then the solvent was distilled off under reduced pressure. This was purified by silica gel column chromatography (eluent: toluene / ethyl acetate = 9/1) to obtain 1.20 g of a dialdehyde represented by the following formula of yellow glass.
Elemental analysis value (%) Actual measurement value (calculated value)
C82.16 (81.98), H6.00 (5.37), N4.30 (4.66)
In the infrared absorption spectrum (KBr tablet method), absorption based on carbonyl stretching vibration was observed at 1691 cm ⁻¹ .

EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples. However, the present invention is not limited by these examples unless it exceeds the gist.
<Synthesis Example 1>
Precursor Example No. No. 14 (described in Example 1 of JP-A-2000-63337) 2.15 g, precursor example No. 2. Dissolve 2.10 g of diphosphonate represented by 5 and 17.8 mg of benzaldehyde (molecular weight modifier) in 100 ml of dehydrated tetrahydrofuran, and add 11.2 ml of a 1.0 mol dm ^-3 tetrahydrofuran solution of potassium t-butoxide in a nitrogen stream to 17-20. The solution was gradually added dropwise at ° C. After the dropwise addition, the mixture was stirred at room temperature for 3 hours, and then 85 mg of diethyl benzylphosphonate was added, stirred for 1 hour, and neutralized with acetic acid. The contents were dropped into water to obtain a crude polymer. This was purified by reprecipitation twice with tetrahydrofuran / ion-exchanged water and then with tetrahydrofuran / methanol, dissolved in methylene chloride, and repeatedly washed with ion-exchanged water until the conductivity of the washing liquid was equivalent to that of ion-exchanged water. It was. After washing, it was dropped into methanol to obtain 2.80 g of a π-conjugated polymer (1) represented by the following formula of yellow.

元素分析値（％）実測値（計算値）
Ｃ８１．７６（８２．１６）、Ｈ６．７１（６．７９）、Ｎ２．９０（３．３６）
赤外吸収スペクトル（ＮａＣｌキャスト膜）を図６に示した。
ＧＰＣにより測定したポリスチレン換算の数平均分子量は７１８０、重量平均分子量は２４９００であった。

Elemental analysis value (%) Actual measurement value (calculated value)
C81.76 (82.16), H6.71 (6.79), N2.90 (3.36)
The infrared absorption spectrum (NaCl cast film) is shown in FIG.
The number average molecular weight in terms of polystyrene measured by GPC was 7180, and the weight average molecular weight was 24900.

<Synthesis Example 2>
In the reaction vessel, precursor example No. No. 21 dialdehyde 1 g and precursor example No. The diphosphonate 2.247g shown by 5 was put, nitrogen substitution was carried out, and 90 ml of tetrahydrofuran was added. To this solution, 14 ml of a 1.0 mol dm ^-3 tetrahydrofuran solution of potassium t-butoxide was added dropwise and stirred at room temperature for 3 hours. After adding 0.09 g of diethyl benzylphosphonate and stirring for 2 hours, 0.084 g of benzaldehyde was added, and the mixture was further stirred for 2 hours. A small amount of acetic acid was added to terminate the reaction, and the reaction solution was added dropwise to water. The precipitated polymer was purified by reprecipitation using tetrahydrofuran and methanol, and then a 1: 1 mixed solution of tetrahydrofuran and methanol and acetone, then dissolved in methylene chloride, and the conductivity of the washing solution was deionized with deionized water. Washing was repeated until it was equivalent to the replacement water. After washing, the solution was dropped into methanol to obtain 0.9 g of a yellow π-conjugated polymer (2) represented by the following formula.

元素分析値（計算値）；Ｃ：８２．５８％（８２．８０％）、Ｈ：８．３３％（８．１４％）、Ｎ：２．７９％（２．７６％）。
ＧＰＣにより測定したポリスチレン換算の数平均分子量は１５０００、重量平均分子量は２９６００であった。
赤外吸収スペクトル（ＮａＣｌキャスト膜）を図７に示した。

Elemental analysis value (calculated value); C: 82.58% (82.80%), H: 8.33% (8.14%), N: 2.79% (2.76%).
The number average molecular weight in terms of polystyrene measured by GPC was 15000, and the weight average molecular weight was 29600.
The infrared absorption spectrum (NaCl cast film) is shown in FIG.

<Synthesis Example 3>
Precursor Example No. No. 25 and 1.00 g of dialdehyde and precursor example No. 0.94 g of the phosphonic acid ester represented by 5 was dissolved in 50 ml of dehydrated tetrahydrofuran, and 5.1 ml of a 1.0 mol dm ^-3 tetrahydrofuran solution of potassium t-butoxide was gradually added dropwise at 17 to 20 ° C under a nitrogen stream. After dropwise addition, the mixture was stirred at room temperature for 4 hours, a small amount of benzaldehyde was added, and the mixture was stirred at room temperature for 40 minutes. Then, a small amount of diethyl benzylphosphonate was added and stirred for 40 minutes, and then neutralized with acetic acid. The contents were dropped into water to obtain a crude polymer. This was purified by reprecipitation twice with tetrahydrofuran / ion-exchanged water and then with tetrahydrofuran / methanol, dissolved in methylene chloride, and repeatedly washed with ion-exchanged water until the conductivity of the washing solution was equivalent to that of ion-exchanged water. It was. After washing, the solution was dropped into methanol to obtain 0.88 g of a π-conjugated polymer (3) represented by the following yellow formula.

元素分析値（％）実測値（計算値）
Ｃ８３．６５（８４．０６）、Ｈ７．０８（７．０７）、Ｎ３．２１（３．２７）
赤外吸収スペクトル（ＮａＣｌキャスト膜）を図８に示したが、９６３ｃｍ−１にトランスオレフィの面外変角振動にもとづく吸収が認められた。
ＧＰＣにより測定したポリスチレン換算の数平均分子量は４６９１９、重量平均分子量は１６４７９５であった。

Elemental analysis value (%) Actual measurement value (calculated value)
C83.65 (84.06), H7.08 (7.07), N3.21 (3.27)
The infrared absorption spectrum (NaCl cast film) is shown in FIG. 8, and absorption based on the out-of-plane bending vibration of trans-olefin was observed at 963 cm −1.
The number average molecular weight in terms of polystyrene measured by GPC was 46919, and the weight average molecular weight was 164695.

  The following compounds (4) to (19) were obtained from the same method as in the above synthesis example and the above reaction formula (2), reaction formula (3), and reaction formula (4).

上記化合物の（１）〜（１０）はポリマーであり、（１１）〜（１９）はモノマーである。

Of the above compounds, (1) to (10) are polymers, and (11) to (19) are monomers.

<Examples 1-5>
Using the monomers shown in the above compound examples (11), (12), (13), (16), and (17), a tetrahydrofuran solution was prepared so that each concentration was 0.01 (mol / l). The two-photon absorption cross section was measured by the following two-photon absorption cross-section evaluation method. In addition, the said Examples 1-4 are reference examples.

<Examples 6 to 10>
In the polymers shown in the above compound examples (1), (2), (3), (6), (9), the repeating unit is converted to molecular weight, and a tetrahydrofuran solution having a concentration of 0.01 (mol / l) is obtained. The two-photon absorption cross section was prepared and measured by the following two-photon absorption cross-section evaluation method. The above Examples 6, 7, and 9 are reference examples.

<Comparative Example 1>
Using the compound shown by the following compound (20), a tetrahydrofuran solution was prepared so that the concentration was 0.01 (mol / l), and the two-photon absorption was evaluated by the following two-photon absorption cross-section evaluation method. The cross-sectional area was measured.

[Evaluation method of two-photon absorption cross section]
A schematic diagram of the measurement system is shown in FIG.
Measurement light source: femtosecond titanium sapphire laser wavelength: 800 nm
Pulse width: 100 fs
Repeat: 80MHz
Optical power: 800mW
Measuring method: Z-scan method Light source wavelength: 800 nm
Cuvette inner diameter: 10mm
Measurement optical power: about 500mW
Repetition frequency: 80 MHz
Condenser lens: f = 75 mm
Condensing diameter: 40-50 μm
A quartz cell filled with the sample solution was placed in the collected optical path portion, and Z-scan measurement was performed by moving the position along the optical path.
The transmittance was measured, and the nonlinear absorption coefficient was determined from the result by the theoretical formula (i).
T = [ln (1 + I ₀ L ₀ β)] / I ₀ L ₀ β (... (I)
(In the above formula, T represents transmittance (%), I ₀ represents excitation light density [GW / cm ² ], L ₀ represents sample cell length [cm], and β represents nonlinear absorption coefficient [cm / GW].)
From this nonlinear absorption coefficient, the two-photon absorption cross section δ was determined by the following equation (ii). (The unit of δ is 1GM = 1 × 10 ⁻⁵⁰ cm ⁴ · s · molecule ⁻¹ · photon ⁻¹ .)
δ = 1000 × hνβ / NACβ (ii)
(In the above formula, h is Planck's constant [J · s], ν is the frequency [s ⁻¹ ] of incident laser light, NA is the Avogadro number, and C is the solution concentration [mol / L].)
The results are shown in Table 5.

  From the table, the two-photon absorption material of the present invention is known in the art because it has a characteristic improvement effect of one digit or more as compared with the two-photon absorption cross-sectional area of a compound that expresses the conventionally known two-photon absorption ability. Various applications with inexpensive lasers that do not use a high-power laser of about 1/10 of the substance, that is, applications such as three-dimensional memory, light limiting elements, stereolithography materials, and dye materials for two-photon fluorescence microscopes can be expected. It became clear that it was a material.

(About Figure 3)
DESCRIPTION OF SYMBOLS 1 Light source 3 Shutter 4 ND filter 5 Mirror scanner 6 Z stage 7 Lens 8 Computer 9 Photocurable resin liquid 10 Stereolithography (about FIG. 4)
DESCRIPTION OF SYMBOLS 1 Laser light source 2 Light beam conversion optical system 3 Scanning optical system 4 Objective lens system 5 Sample surface 6 Dichroic mirror 7 Photodetector (about FIG. 9)
3 Photosensitive polymer film 4a Pulse laser beam 4b reflected by mirror 2m Pulse laser beam reflected by mirror 2n 5 Induced structure portion θ Incident angle of pulse laser beam (4a, 4b) (about FIG. 10)
1 Collimated light (laser light)
2 Condensing element 3 Condensing element plate 4 Beam splitter 5 Pinhole plate 6 Weak positive power optical system (field lens)
7 Objective Lens System 8 Imaging Lens 9 Objective Lens 10 Pupil 11 Specimen Surface 12 Projection Optical System 13 Detection System

US Pat. No. 5,777,070 Japanese Patent Laid-Open No. 10-310635 JP-A-8-157575 Japanese translation of PCT publication No. 2002-515078 WO97 / 09394 JP 2005-240001 A JP-T-2001-524245 Special table 2000-512061 gazette Special table 2001-522119 gazette Special table 2001-508221 gazette JP-A-6-28672 JP-A-6-118306

Synth. Met., 84, 269 (1997)

Claims (10)

A two-photon absorption material represented by the following general formula (III):

(Wherein, Ar ₉ is a divalent group represented by the following formula (a) or the following formula (b), phenylene, fluorenyl Ren, Antori Ren represents biphenylene or thiophene vinylene, and these alkyl group or alkoxy Ar ₁₀ and Ar ₁₁ each independently represent a phenyl group, each of which may be independently substituted with an alkyl group or an alkoxy group, R ₆ and R ₇ each represent a hydrogen atom or an alkyl group, R ₈ and R ₉ are a hydrogen atom, a halogen atom, an alkyl group, .Y representing an alkoxy group is a hydrogen atom, a phenyl group and Table Wa, the phenyl group may be substituted with an alkyl group or an alkoxy group.

A two-photon absorption material having a repeating structural unit represented by the following general formula (VI).

(In the formula, Ar ₉ represents a divalent group represented by the following formula (a) or the following formula (b), phenylene, fluorenylene, anthrylene, biphenylene, or thiophenylene, which are substituted with an alkyl group or an alkoxy group. R ₆ and R ₇ each represent a hydrogen atom or an alkyl group, R ₈ and R ₉ each represent a hydrogen atom, a halogen atom, an alkyl group, or an alkoxy group, Y represents a hydrogen atom or a phenyl group, The phenyl group may be substituted with an alkyl group or an alkoxy group.

A three-dimensional memory material capable of recording and reproducing in the depth direction with respect to incident light including the two-photon absorption material according to claim 1. A light limiting material comprising the two-photon absorption material according to claim 1. A curable material for a photo-curing resin, comprising the two-photon absorption material according to claim 1. A fluorescent dye material for a two-photon fluorescence microscope, comprising the two-photon absorption material according to claim 1. A three-dimensional recording medium capable of recording and reproducing in the depth direction with respect to incident light containing at least one kind of the two-photon absorbing material according to claim 1 or 2 in the recording layer. An optical limiting element comprising at least one of the two-photon absorption materials according to claim 1. A photocuring system comprising at least one of the two-photon absorption materials according to claim 1. A two-photon fluorescence microscope apparatus comprising at least one of the two-photon absorption materials according to claim 1.

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