JP5198426B2 - Cleaning device and ozone water generator - Google Patents

Description

  The present invention relates to a cleaning device suitably used for cleaning electronic components, for example, and an ozone water generation device used for the cleaning device.

  Conventionally, as a technique in such a field, an ozone water production apparatus described in Patent Document 1 below is known. In this apparatus, ozone gas in a pressurized state generated by a discharge ozone generator is dissolved in water to be treated through a porous hollow fiber membrane made of Teflon (registered trademark) to generate ozone water. In this device, a stepless variable speed control type pump that maintains the water pressure inside the hollow fiber higher than the ozone gas pressure upstream of the hollow fiber membrane and controls the water pressure and flow rate is provided, and the ozone concentration in the treated water is reduced to ozone gas. A control mechanism that controls the concentration is provided, and the stepless variable speed control pump is controlled by providing a flow meter and pressure gauge upstream of the hollow fiber membrane and processing the output signal values from these with an arithmetic circuit. And do it. The water pressure should be higher than the ozone gas pressure. In such an ozone water production apparatus, when it is desired to increase the concentration of ozone water, a method of increasing the ozone gas pressure in contact with water can be considered in order to increase the saturated dissolved ozone concentration.

JP-A-8-196879

  However, when this ozone water is used for cleaning electronic components such as semiconductors and liquid crystals, if the ozone water concentration is increased by increasing the ozone gas pressure, the pressurized ozone water is discharged from the cleaning nozzle and released to the atmosphere. When this happens, the saturated dissolved ozone concentration decreases and the ozone in the ozone water escapes into the atmosphere. As a result, when ozone water reaches the surface of the object to be cleaned, there is a problem that the concentration is lowered and the cleaning efficiency is poor.

  In view of such a problem, an object of the present invention is to provide a cleaning device that enables efficient cleaning with ozone water, and an ozone water generation device that can be used in such a cleaning device.

  The cleaning device of the present invention includes an ozone gas concentrating unit that condenses ozone gas, an ozone gas dissolving unit that obtains ozone water by dissolving the concentrated ozone gas obtained in the ozone gas concentrating unit, and ozone water obtained in the ozone gas dissolving unit. And a cleaning unit for cleaning the object.

  In this apparatus, concentrated ozone gas is obtained by the ozone gas concentrating unit, and this concentrated ozone gas is dissolved in water by the ozone dissolving unit to obtain ozone water. Thus, by concentrating ozone gas and dissolving it in water, it is easy to obtain high-concentration ozone water even when the pressure of the ozone gas is relatively low. And since the pressure of the ozone gas when making it melt | dissolve in water is comparatively low, even when ozone water is open | released to air | atmosphere, the quantity of ozone which escapes from ozone water to air | atmosphere is restrained small. Accordingly, in the cleaning unit, for example, when ozone water is sprayed from a cleaning nozzle or the like, the concentration of ozone water reaching the surface of the object can be kept relatively high, and cleaning efficiency can be improved.

  Moreover, the ozone gas dissolving part may have a dissolved gas pressure control means for controlling the pressure of the concentrated ozone gas to be dissolved in water based on the ozone concentration of ozone water. The dissolved gas pressure control means adjusts the pressure of the concentrated ozone gas to be dissolved in water, whereby the saturated dissolved ozone concentration is changed and the concentration of the obtained ozone water is adjusted. Therefore, the dissolved gas pressure control means can stabilize the concentration of ozone water by controlling the pressure of the concentrated ozone gas while monitoring the concentration of ozone water.

  The ozone gas dissolving part may have an exhaust gas pump that reduces the pressure of the concentrated ozone gas. Depending on the concentration of the concentrated ozone gas, the pressure of the concentrated ozone gas dissolved in water may have to be lower than the atmospheric pressure in order to surely prevent the rapid decomposition of ozone and ensure safety. According to the exhaust gas pump of the ozone gas dissolving part, it is possible to cope with the pressure of the concentrated ozone gas dissolved in water lower than the atmospheric pressure, and safety in the ozone gas dissolving part can be ensured.

  Further, the cleaning device of the present invention includes a dilution gas supply unit for adding oxygen gas for dilution to the concentrated ozone gas supplied to the ozone gas dissolving unit, a flow rate of the oxygen gas to be added to the concentrated ozone gas, and a pressure of the concentrated ozone gas in the ozone gas dissolving unit. It is good also as providing the dilution gas flow volume control part controlled based on this.

  If the concentration of ozone water required for cleaning is increased, the pressure of the concentrated ozone gas should be increased accordingly. As a result, the amount of ozone that escapes from the ozone water to the atmosphere when it is released to the atmosphere. The concentration of ozone water that reaches the surface of the object decreases. However, according to the configuration of this cleaning device, the concentration of the concentrated ozone gas supplied to the ozone gas dissolving part can be adjusted by the flow rate of the oxygen gas for dilution. Therefore, when the pressure of the concentrated ozone gas in the ozone gas dissolving part is higher than a predetermined value, the concentration of ozone water required for cleaning is reduced by reducing the flow rate of the oxygen gas for dilution without further increasing the pressure of the concentrated ozone gas. Can be secured.

  Specifically, the cleaning device of the present invention may include a plurality of ozone gas dissolving units, and the ozone gas concentrating unit may supply concentrated ozone gas to the plurality of ozone gas dissolving units.

  Further, in this case, on each concentrated ozone gas supply line for supplying the concentrated ozone gas to each of the plurality of ozone gas dissolving portions, a pressure adjusting means for adjusting the pressure of the concentrated ozone gas on the ozone gas dissolving portion side, and the ozone gas dissolving portion side And a flow rate adjusting means for adjusting the flow rate of the concentrated ozone gas. When there are a plurality of ozone gas dissolving portions, each ozone gas dissolving portion can be supplied with a stable amount of ozone gas by the pressure adjusting means and the flow rate adjusting means on the concentrated ozone gas supply line.

  Further, supply pressure adjusting means for adjusting the pressure of the concentrated ozone gas supplied from the ozone gas concentrating unit may be provided upstream of the plurality of pressure adjusting means and the flow rate adjusting means. According to this configuration, the pressure of the concentrated ozone gas on the upstream side of the pressure adjusting means and the flow rate adjusting means can be stabilized at a pressure somewhat higher than that on the downstream side. Therefore, it is possible to stably supply the concentrated ozone gas having the required pressure to each of the plurality of ozone gas dissolving portions. Further, the supply pressure adjusting means can adjust so that the pressure of the concentrated ozone gas upstream of the pressure adjusting means and the flow rate adjusting means does not become excessively high.

  Further, the ozone water generating apparatus of the present invention includes an ozone gas concentrating unit that condenses ozone gas, and an ozone gas dissolving unit that obtains ozone water by dissolving the concentrated ozone gas obtained in the ozone gas concentrating unit in water. And

  In this apparatus, concentrated ozone gas is obtained by the ozone gas concentrating unit, and this concentrated ozone gas is dissolved in water by the ozone dissolving unit to obtain ozone water. Thus, by concentrating ozone gas and dissolving it in water, high-concentration ozone water can be obtained even when the pressure of the ozone gas is relatively low. And since the pressure of the ozone gas when making it melt | dissolve in water is comparatively low, even when ozone water is open | released to air | atmosphere, the quantity of ozone which escapes from ozone water to air | atmosphere is restrained small. Therefore, for example, when this ozone water is sprayed from a cleaning nozzle or the like and used for cleaning an object, the concentration of ozone water reaching the surface of the object can be kept relatively high, and the cleaning efficiency is improved. Can do.

  ADVANTAGE OF THE INVENTION According to this invention, the ozone water production | generation apparatus which can be used for the washing | cleaning apparatus which enables efficient washing | cleaning by ozone water, and such a washing | cleaning apparatus can be provided.

1 is a block diagram showing a first embodiment of an electronic component cleaning apparatus according to the present invention. It is a block diagram which shows the concentration part of the electronic component washing | cleaning apparatus in FIG. 1 in detail. It is a block diagram which shows the melt | dissolution part of the electronic component washing | cleaning apparatus in FIG. 1 in detail. It is a block diagram which shows 2nd Embodiment of the electronic component washing | cleaning apparatus which concerns on this invention. It is a block diagram which shows the melting | dissolving part and washing | cleaning part vicinity of the electronic component washing | cleaning apparatus in FIG. 4 in detail.

  Hereinafter, preferred embodiments of a cleaning apparatus and an ozone water generation apparatus according to the present invention will be described in detail with reference to the drawings.

(First embodiment)
As shown in FIG. 1, the electronic component cleaning apparatus 1 generates high-concentration ozone gas using an ozone gas generation device 73, and uses high-concentration ozone water generated from the high-concentration ozone gas as a semiconductor wafer, liquid crystal, and solar cell. It is a device that sprays and cleans the surface of electronic components such as organic EL and printed circuit boards. The ozone gas generation device 73 includes an ozonizer 10 that generates ozone gas, and a concentration unit 30 that concentrates the ozone-containing gas generated by the ozonizer 10. Furthermore, the ozone water generating device 71 of the electronic component cleaning apparatus 1 includes an ozone gas generating device 73 that generates concentrated ozone gas, and a dissolving unit 50 that generates high-concentration ozone water by dissolving the ozone gas in ultrapure water. Yes. The electronic component cleaning apparatus 1 includes the ozone water generating device 71 and a cleaning unit 70 that cleans the surface of the electronic component with the high-concentration ozone water obtained by the ozone water generating device 71.

  The electronic component cleaning apparatus 1 includes an oxygen tank 3 and a nitrogen tank 5. Oxygen is supplied to the ozonizer 10 from the oxygen tank 3 through the line L1. Further, a nitrogen gas supply line from the nitrogen tank 5 is joined to the line L1, and a small amount of nitrogen gas is mixed into the oxygen gas and introduced into the ozonizer 10. The ozonizer 10 generates ozone gas by a discharge method using oxygen gas as a raw material. The ozonizer 10 generates ozone gas having a relatively low concentration of about 10 vol% (a mixed gas of about 90 vol% oxygen gas and about 10 vol% ozone gas). Further, due to the nitrogen gas mixed in the raw material oxygen gas in a trace amount, the ozone gas generated by the ozonizer 10 (hereinafter referred to as “non-concentrated ozone gas”) contains a trace amount of nitrogen oxide (NOx) gas. The non-concentrated ozone gas delivered from the ozonizer 10 is introduced into the concentration unit 30 through the line L2.

  The concentration part 30 concentrates the non-concentrated ozone gas produced | generated by the ozonizer 10, and produces | generates ozone gas with a high concentration of about 100 vol%. As shown in FIG. 2, the concentrating unit 30 includes a NOx removing unit 32, a gas cooling unit 33, a separation tank 34, a vaporizer 35, a heat exchanging unit 36 provided in the vacuum heat insulating chamber 31, It has. The chamber 31 is evacuated by the exhaust pump 37.

  The non-concentrated ozone gas from the line L2 is introduced into the NOx removing unit 32 of the concentrating unit 30. The NOx removal unit 32 cools the introduced non-concentrated ozone gas to below the freezing point of NOx, solidifies and captures NOx, and separates and removes it from the non-concentrated ozone gas. Oxygen and ozone having a freezing point lower than that of NOx pass through the NOx removing unit 32 in a gaseous state and are introduced into the gas cooling unit 33 through the line L31. On the other hand, the NOx trapped by the NOx removal unit 32 is heated and vaporized again during the cleaning operation of the NOx removal unit 32, and is expelled to a purge gas (for example, oxygen, nitrogen or non-concentrated ozone gas) as necessary. Then, it is discharged to the exhaust gas line L20 through the line L21. In addition, switching of the flow path of the line L31 and the line L21 is performed suitably according to a driving | running state.

  In the gas cooling unit 33, the non-concentrated ozone gas after the NOx removal is cooled to below the boiling point of ozone to liquefy ozone. The liquid ozone is introduced into the separation tank 34 through the line L32 and accumulates in the lower part of the separation tank 34. On the other hand, oxygen having a boiling point lower than that of ozone passes through the gas cooling unit 33 and the line L32 in a gaseous state, and accumulates in the upper part of the separation tank 34. The gas accumulated in the upper part of the separation tank 34 is mainly oxygen, and is sent out of the separation tank 34 through the line L33.

  As described above, the NOx removing unit 32 and the gas cooling unit 33 require a low heat source for cooling the non-concentrated ozone gas. The concentrating unit 30 includes a cryopump 38 as a cryogenic low heat source. A cryohead 38a of the cryopump 38 is inserted into the chamber 31, and the cryohead 38a and the NOx removing unit 32 are connected by a heat transfer copper plate 39a. The cryohead 38a and the gas cooling unit 33 are connected by a heat transfer copper plate 39b. With this configuration, the NOx removing unit 32 and the gas cooling unit 33 can be cooled to an extremely low temperature, and the above-described NOx removal and ozone liquefaction are realized.

  One end of a U-shaped tube 41 is connected to the bottom of the separation tank 34. The other end of the U-shaped tube 41 is connected to the bottom of the vaporizer 35. The liquid ozone accumulated in the separation tank 34 is also filled in the U-shaped tube 41. The U-shaped tube 41 is for guiding the liquid ozone in the separation tank 34 to the vaporizer 35, and for sealing the oxygen gas accumulated in the upper part of the separation tank 34 and the vaporizer 35 side by the liquid ozone. is there.

  The U-shaped tube 41 is filled with a filler 41 a that develops capillary force and guides liquid ozone in the U-shaped tube 41 into the vaporizer 35. Here, the filler 41a is made of a wire mesh, is densely configured to develop capillary force, and enters the vaporizer 35 through the inlet 35a at the bottom of the vaporizer 35. . With this configuration, the liquid ozone in the U-shaped tube 41 is gradually introduced into the vaporizer 35 through the inlet 35a. The filler 41a is not limited to a wire mesh filler, and may be, for example, a densely arranged thin metal material or glass fiber, for example, a finely arranged fine silica gel or porous silica. In short, any filler that exhibits capillary force may be used.

  The vaporizer 35 is for vaporizing liquid ozone from the U-shaped tube 41, has a cylindrical body, is closed at the bottom in a narrow bowl shape, and has an inlet 35 a at the lower end. In addition, an ozone gas outlet 35b is provided at the upper end. The inlet 35 a of the vaporizer 35 is located at a height higher than the liquid ozone level in the separation tank 34. The wire mesh-like filler 41a that enters the interior through the inlet 35a is disposed so as to spread along the inner surface of the bottom of the vaporizer 35 so as to send liquid ozone into the vaporizer 35 by capillary force.

  A heater 35 c for heating is provided above the filler 41 a that has entered the vaporizer 35. The heater 35c heats and vaporizes liquid ozone provided to the bottom of the vaporizer 35. As described above, since liquid ozone from which oxygen has been separated and removed is introduced into the vaporizer 35, the ozone vaporized in the vaporizer 35 has a concentration of approximately 100 vol%. Further, oxygen from the oxygen tank 3 is introduced into the vaporizer 35 as oxygen gas for dilution through the line L12. Ozone having a concentration of approximately 100 vol% obtained by vaporizing liquid ozone is appropriately diluted by the oxygen gas for dilution from the line L12 at the upper part of the vaporizer 35, and is sent out as concentrated ozone gas through the ozone gas outlet 35b and the line L3. The concentrated ozone gas in the line L3 is introduced into the melting part 50. A part of the concentrated ozone gas is discharged to the exhaust gas line L20 through the line L25 branched from the line L3. The line L3 also joins the line L13 from the oxygen tank 3, and the concentrated ozone gas in the line L3 is appropriately diluted with the oxygen gas from the line L13 and introduced into the dissolving unit 50.

  The line L12 passes through the heat exchange unit 36 on the upstream side of the vaporizer 35. In the heat exchange part 36, heat exchange is performed between the exhaust oxygen gas discharged from the separation tank 34 through the line L33 and the oxygen gas for dilution in the line L12. Thereby, the oxygen gas for dilution is introduced into the vaporizer 35 after being cooled and adjusted in temperature by the heat exchange unit 36. Further, the exhaust oxygen gas is discharged from the heat exchanging portion 36 to the exhaust gas line L20 through the line L23.

  As shown in FIG. 1, the dissolution unit 50 includes a dissolution module that brings the concentrated ozone gas introduced from the line L3 into contact with the ultrapure water introduced from the line L11. The dissolution module refers to a device that dissolves ozone gas in water, such as a polymer film, an ejector, and a microreactor. In the melting module, concentrated ozone gas is dissolved in ultrapure water, and high-concentration ozone water is generated. The surplus concentrated ozone gas that has not been dissolved in the ultrapure water is discharged to the exhaust gas line L20 through the gas line L27. On the other hand, the ozone water is introduced into the cleaning unit 70 through the line L4.

  The cleaning unit 70 sprays ozone water introduced from the line L4 toward the surface of an electronic component such as a semiconductor wafer, a liquid crystal, a solar cell, an organic EL, or a printed board from the nozzle. By such injection of ozone water, the resist formed on the surface of the electronic component is cleaned and removed. That is, the cleaning unit 70 is used for resist removal of electronic components.

  As described above, all unnecessary gases (exhaust NOx gas in the line L21, exhausted oxygen gas in the line L23, exhausted ozone gas in the line L25, and exhausted ozone gas in the L27) generated in each part of the electronic component cleaning apparatus 1 are all Merge and pass through the exhaust gas line L20. Unnecessary gas in the line L20 passes through the catalyst decomposition device 7 and the exhaust gas cooler 8, and is discharged out of the system by the exhaust pump 9. The catalyst decomposing apparatus 7 decomposes ozone gas in the unnecessary gas into relatively harmless oxygen gas by bringing the unnecessary gas into contact with a catalyst such as activated carbon. The exhaust gas cooler 8 cools the unnecessary gas to room temperature before discharging the unnecessary gas to the atmosphere.

  Next, the melting part 50 will be described in more detail with reference to FIG.

  As shown in FIG. 3, ultrapure water is introduced into the dissolving part 50 through the line L11, and ozone gas diluted with oxygen gas is introduced through the line L3. The dissolution unit 50 includes a dissolution module 51 that introduces introduced ozone gas (hereinafter referred to as “introduced ozone gas”) and ultrapure water and brings them into contact with each other. Below, the case where the melt | dissolution module 51 of the type provided with the polymer film is employ | adopted is demonstrated as an example. This type of dissolution module 51 has a dissolution membrane having a hollow fiber membrane structure. Ultrapure water is circulated inside the dissolution membrane and introduced ozone gas is circulated outside the dissolution membrane. With this configuration, the introduced ozone gas and ultrapure water come into contact with each other through the dissolved film, and the introduced ozone gas passes through the dissolved film and dissolves in the ultrapure water, thereby generating ozone water. The ozone water generated by the melting module 51 is sent to the cleaning unit 70 through the line L4. The surplus of the introduced ozone gas that could not be dissolved in the ultrapure water is discharged from the melting module 51 through the line L27 and discharged to the line L20 as an unnecessary gas. Note that polytetrafluoroethylene or the like is preferably used as a material for such a dissolved film.

  Here, it is necessary to control the concentration of ozone water delivered from the dissolving unit 50 according to the concentration required by the cleaning unit 70. Therefore, the dissolving unit 50 has a valve (dissolved gas pressure control means) 53 that adjusts the pressure of the introduced ozone gas in the melting module 51 by adjusting the opening degree of the line L27. As the opening of the valve 53 is reduced, the pressure of the introduced ozone gas that contacts the ultrapure water in the dissolution module 51 (hereinafter referred to as “dissolution pressure”) increases. As a result, the saturated dissolved ozone concentration increases according to Henry's law, so the concentration of ozone water generated by the dissolution module 51 increases and the concentration of ozone water in the line L4 increases. Similarly, the greater the opening of the valve 53, the lower the concentration of ozone water in the line L4.

  Further, the dissolving unit 50 adjusts the opening degree of the valve 53 based on the ozone water concentration meter 52 that measures the concentration of ozone water flowing through the line L4 and the ozone water concentration measurement value obtained by the ozone water concentration meter 52. A valve control unit (dissolved gas pressure control means) 54 is provided. That is, for example, when the measured value of the ozone water concentration meter 52 is higher than the target concentration, the valve control unit 54 increases the opening of the valve 53 to lower the dissolution pressure, and the measured value of the ozone water concentration meter 52 When the concentration is lower than the target concentration, an operation of increasing the dissolution pressure by reducing the opening of the valve 53 is performed. In this way, the valve control unit 54 performs feedback control while monitoring the concentration of ozone water in the line L4, so that ozone water having a target concentration is stably supplied from the line L4.

  Further, when the target concentration of ozone water increases, the dissolution pressure needs to be increased accordingly. However, if the concentration of ozone water is increased by increasing the dissolution pressure, the saturated dissolved ozone concentration decreases when the pressurized ozone water is discharged from the cleaning nozzle of the cleaning unit 70 and released to the atmosphere, Ozone in ozone water escapes into the atmosphere. As a result, when ozone water reaches the surface of the electronic component, the concentration is lowered, resulting in a problem that the cleaning efficiency is lowered.

In view of this, the electronic component cleaning apparatus 1 is provided with control means for controlling the melting pressure so as not to exceed a predetermined specified value. Specifically, a flow rate control device (dilution gas flow rate control means) 81 for adjusting the flow rate of the dilution oxygen gas is provided on the dilution oxygen gas line L13, and a set flow rate is given to the flow rate control device 81. A dilution gas flow rate control unit (dilution gas flow rate control means) 82 is provided. As the set flow rate of the flow control device 81 is reduced, the oxygen gas for dilution that merges from the line L13 to the line L3 decreases, so the concentration of the introduced ozone gas that is introduced into the dissolution module 51 in the line L3 increases. As a result, the concentration of the introduced ozone gas that contacts the ultrapure water increases. Here, the saturated dissolved ozone concentration C of water is represented by the following formula (1).
C = m · P (1)
However,
m is a distribution coefficient; m = −0.0120 · θ + 0.533
P is the concentration of ozone gas in contact with water (mg / l)

  Therefore, the smaller the set flow rate of the flow rate control device 81, the higher the concentration of the introduced ozone gas introduced into the dissolution module 51, thereby increasing the saturated dissolved ozone concentration as understood from the equation (1), As a result, the concentration of ozone water in the line L4 increases. Similarly, the concentration of the ozone water in the line L4 decreases as the set flow rate of the flow control device 81 is increased.

  Further, a pressure gauge (dilution gas flow rate control means) 83 for measuring the dissolution pressure is provided on the line L27. The dilution gas flow rate controller 82 adjusts the set flow rate to be applied to the flow rate control device 81 based on the measurement value of the dissolution pressure obtained by the pressure gauge 83. That is, for example, when the measured value of the dissolution pressure by the pressure gauge 83 exceeds a specified value, the dilution gas flow rate control unit 82 performs an operation of reducing the set flow rate applied to the flow rate control device 81. The specified value is determined in advance as the upper limit value of the dissolution pressure that allows the cleaning unit 70 to be allowed to deteriorate the cleaning efficiency. For example, this specified value is 150 kPa. In this way, by reducing the set flow rate of the flow rate control device 81, the concentration of ozone water in the line L4 can be increased while maintaining a dissolution pressure that is relatively close to the atmospheric pressure below a specified value. Therefore, the above-mentioned problem that the cleaning efficiency is deteriorated in the cleaning unit 70 can be suppressed, and good cleaning efficiency can be obtained.

  In order to perform such control, it is necessary to presuppose that ozone gas is diluted with oxygen gas for dilution before introduction into the melting part 50. Since the electronic component cleaning apparatus 1 includes the concentrating unit 30 that condenses the ozone gas in the previous stage of the dissolving unit 50, it is also possible to send high-concentration ozone gas into the dissolving unit 50. In addition, it is possible to introduce the introduced ozone gas having a sufficient concentration into the melting portion 50 while assuming that the ozone gas is diluted with oxygen gas.

  Further, by using the introduced ozone gas having a high concentration concentrated in the concentrating unit 30, it is required for electronic component cleaning even at a dissolution pressure that is relatively close to the atmospheric pressure such as the above-mentioned specified value (for example, 150 kPa) or less. A sufficient concentration of ozone water can be secured. Therefore, the amount of ozone that escapes from the ozone water to the atmosphere after the atmospheric pressure is released can be suppressed, and the cleaning efficiency can be improved.

  Further, when handling such high-concentration ozone gas, it is necessary to lower the melting pressure in the melting section 50 in order to reliably prevent rapid decomposition of ozone. In particular, depending on the concentration of the introduced ozone gas, the dissolution pressure may have to be lower than atmospheric pressure in order to ensure safety. Therefore, the melting part 50 has an exhaust gas pump 56 provided on the downstream side of the valve 53 on the line L27. According to this exhaust gas pump 56, it is possible to cope with the melting pressure of the introduced ozone gas in the melting module 51 to be lower than the atmospheric pressure, and the safety in the melting part 50 can be ensured.

(Second Embodiment)

  Next, a second embodiment of the electronic component cleaning apparatus according to the present invention will be described with reference to FIGS. 4 and 5. The electronic component cleaning apparatus 101 shown in FIGS. 4 and 5 differs from the electronic component cleaning apparatus 1 described above particularly in that it includes two melting sections 50A and 50B and two cleaning sections 70A and 70B. The dissolving unit 50A supplies ozone water to the cleaning unit 70A, and the dissolving unit 50B supplies ozone water to the cleaning unit 70B. The line L3 for supplying the introduced ozone gas is branched into two lines L103A and 103B. The line L103A supplies the introduced ozone gas to the dissolving part 50A and the line L103B to the dissolving part 50B. Further, on the upstream side of the branch point of the lines L103A and 103B, a line L29 branches from the line L3, and this line L29 merges with the exhaust gas line L20. A part of surplus gas in the introduced ozone gas in the line L3 is discharged to the exhaust gas line L20 through the line L29.

  The two cleaning units 70A and 70B can perform electronic component cleaning under different cleaning conditions. Therefore, in order to correspond to the cleaning conditions of the cleaning units 70A and 70B, the dissolving units 50A and 50B need to supply ozone water at different flow rates and concentrations, and each dissolving unit 50A according to changes in the cleaning conditions. , 50B may change the flow rate / concentration of ozone water. Therefore, the amount of ozone gas that should be sent to the dissolving portions 50A and 50B through the branch lines L103A and 103B may also vary. However, since the amount of ozone gas generated in the concentration unit 30 cannot follow fluctuations rapidly, the concentration of ozone water generated in each of the dissolution units 50A and 50B may become unstable.

  Therefore, in order to suppress such fluctuations in the ozone concentration in the dissolving sections 50A and 50B, as shown in detail in FIG. 5, a pressure reducing valve (pressure) that stabilizes the pressure of the introduced ozone gas on the downstream side on the branch line L103A. 85A, and a flow rate control device (flow rate adjustment means) 86A that stabilizes the flow rate of the introduced ozone gas on the downstream side are provided, and a similar pressure reducing valve 85B and flow rate control device 86B are provided on the branch line L103B. Is provided. By providing such pressure reducing valves 85A and 85B and flow rate control devices 86A and 86B, it is possible to supply the introduced ozone gas at a stable pressure and amount to the respective dissolving portions 50A and 50B. In 50B, ozone water is stably generated.

  Further, a pressure adjusting device (supply pressure adjusting means) 87 is provided on the line L29, and stabilizes the pressure of the introduced ozone gas in the line L3. Therefore, the pressure of the introduced ozone gas on the upstream side of the pressure reducing valves 85A and 85B and the flow rate control devices 86A and 86B can be stabilized, and the pressure can be higher than the pressure of the introduced ozone gas on the downstream side. Therefore, the pressure reducing valves 85A and 85B operate correctly, and the introduced ozone gas having the required pressure can be stably supplied to each of the two melting portions 50A and 50B. Further, the pressure adjusting device 87 can adjust the pressure so that the pressure of the introduced ozone gas on the upstream side of the pressure reducing valves 85A and 85B and the flow rate control devices 86A and 86B does not become excessively high. The pressure adjusting device 87 includes, for example, a valve 87a whose opening degree can be adjusted, and a PIC 87b that controls the valve 87a.

  The present invention is not limited to the first and second embodiments described above. For example, the concentration unit for concentrating ozone gas is not limited to the liquefaction method as in the embodiment, and may be an adsorption method concentration unit.

  DESCRIPTION OF SYMBOLS 1,101 ... Electronic component washing apparatus, 3 ... Oxygen tank, 30 ... Concentration part (ozone gas concentration part), 50, 50A, 50B ... Dissolution part (ozone gas dissolution part), 52 ... Ozone water concentration meter, 53 ... Valve (dissolution) Gas pressure control means), 54 ... Valve control section (dissolved gas pressure control means), 56 ... Exhaust gas pump, 70, 70A, 70B ... Cleaning section, 81 ... Flow control device (dilution gas flow control means), 82 ... Dilution gas Flow control unit (dilution gas flow control means), 83 ... Pressure gauge (dilution gas flow control means), 85A, 85B ... Pressure adjustment means, 86A, 86B ... Flow adjustment means, 87 ... Supply pressure control means, L13 ... line ( Dilution gas supply section).

Claims (6)

An ozone gas concentrating section for concentrating ozone gas;
An ozone gas dissolving part for obtaining ozone water by dissolving the concentrated ozone gas obtained in the ozone gas concentrating part in water;
A cleaning unit for cleaning an object with ozone water obtained in the ozone gas dissolving unit ,
A dilution gas supply unit for adding oxygen gas for dilution to the concentrated ozone gas supplied to the ozone gas dissolving unit;
A cleaning apparatus , further comprising: a dilution gas flow rate control unit that controls a flow rate of the oxygen gas added to the concentrated ozone gas based on a pressure of the concentrated ozone gas in the ozone gas dissolving unit . The ozone gas dissolving part is
The cleaning apparatus according to claim 1, further comprising a dissolved gas pressure control unit that controls a pressure of the concentrated ozone gas to be dissolved in the water based on an ozone concentration of the ozone water. The ozone gas dissolving part is
The cleaning apparatus according to claim 2, further comprising an exhaust gas pump that reduces a pressure of the concentrated ozone gas. A plurality of ozone gas dissolving portions;
The ozone gas concentrating part is
The cleaning apparatus according to any one of claims 1 to 3 , wherein the concentrated ozone gas is supplied to a plurality of ozone gas dissolving portions. On each concentrated ozone gas supply line for supplying the concentrated ozone gas to each of the plurality of ozone gas dissolving portions,
Pressure adjusting means for adjusting the pressure of the concentrated ozone gas on the ozone gas dissolving part side;
The cleaning apparatus according to claim 4 , further comprising a flow rate adjusting unit configured to adjust a flow rate of the concentrated ozone gas on the ozone gas dissolving unit side. Upstream of the plurality of the pressure adjusting means and the flow rate adjusting device, according to claim, characterized in that the supply pressure regulating means is provided for adjusting the pressure of the concentrated ozone gas supplied from the ozone gas concentration unit 5 The cleaning apparatus according to 1.

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