JP3278461B2 - Superconducting wire manufacturing method - Google Patents
Superconducting wire manufacturing methodInfo
- Publication number
- JP3278461B2 JP3278461B2 JP21996592A JP21996592A JP3278461B2 JP 3278461 B2 JP3278461 B2 JP 3278461B2 JP 21996592 A JP21996592 A JP 21996592A JP 21996592 A JP21996592 A JP 21996592A JP 3278461 B2 JP3278461 B2 JP 3278461B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- temperature
- forming
- superconducting film
- base material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000000758 substrate Substances 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 19
- 229910045601 alloy Inorganic materials 0.000 claims description 10
- 239000000956 alloy Substances 0.000 claims description 10
- 239000002887 superconductor Substances 0.000 claims description 9
- 238000000608 laser ablation Methods 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 description 34
- 238000000137 annealing Methods 0.000 description 7
- 238000005498 polishing Methods 0.000 description 7
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000005096 rolling process Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910001026 inconel Inorganic materials 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- WAIPAZQMEIHHTJ-UHFFFAOYSA-N [Cr].[Co] Chemical compound [Cr].[Co] WAIPAZQMEIHHTJ-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 229910001651 emery Inorganic materials 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 229910000856 hastalloy Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000005097 cold rolling Methods 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000005098 hot rolling Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229910000601 superalloy Inorganic materials 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E40/00—Technologies for an efficient electrical power generation, transmission or distribution
- Y02E40/60—Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、ケーブル、マグネット
等に使用する酸化物高温超電導線の製造方法に関し、特
に、長尺基材上に酸化物高温超電導膜を形成してなる超
電導線の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an oxide high-temperature superconducting wire used for cables, magnets and the like, and more particularly to a method for manufacturing a superconducting wire formed by forming an oxide high-temperature superconducting film on a long base material. About the method.
【０００２】[0002]
【従来の技術および発明が解決しようとする課題】液体
窒素温度（７７．３Ｋ）よりも高い臨界温度（Ｔｃ）を
示すＹ系（Ｔｃ：９０Ｋ）、Ｂｉ系（Ｔｃ：１０８
Ｋ）、Ｔｌ系（Ｔｃ：１２５Ｋ）酸化物超電導材料の発
見により、そのエネルギー分野およびエレクトロニクス
分野への応用が期待されるようになった。この中で、エ
ネルギー分野への応用を目指した酸化物高温超電導体の
線材化は、この材料の発見当初から精力的に進められて
きた。2. Description of the Related Art Y type (Tc: 90K) and Bi type (Tc: 108) exhibiting a critical temperature (Tc) higher than the liquid nitrogen temperature (77.3K).
K), the discovery of Tl-based (Tc: 125K) oxide superconducting materials has led to expectations for their application in the fields of energy and electronics. Among them, the conversion of high-temperature oxide superconductors into wires for the application to the energy field has been energetically advanced since the discovery of this material.
【０００３】この線材化について、種々の方法が検討さ
れてきているが、その１つには、酸化物高温超電導体を
金属で被覆し、線材化する方法がある。この方法では、
たとえば、酸化物高温超電導体を銀シース内に充填した
ものについて、伸線および圧延等の塑性加工を施した
後、焼結処理して、線材が得られる。このプロセスで
は、塑性加工と焼結処理の組合わせにより、銀被覆内の
超電導体に高い配向性を持たせ、高い臨界電流値を実現
させるようになってきた。[0003] Various methods have been studied for making this wire, and one of them is a method of coating an oxide high-temperature superconductor with a metal to make it into a wire. in this way,
For example, a material in which an oxide high-temperature superconductor is filled in a silver sheath is subjected to plastic processing such as drawing and rolling, and then sintered to obtain a wire. In this process, a combination of plastic working and sintering has been used to give a superconductor in a silver coating a high orientation and to realize a high critical current value.
【０００４】一方、スパッタリングや蒸着法等の気相プ
ロセスにより、可撓性を有する長尺基材上に超電導膜を
形成し、超電導線材を得る方法も検討されてきている。
この方法は、特に、基材上に形成される超電導体組織を
制御することによって臨界電流密度（Ｊｃ）が飛躍的に
高められる可能性を有しており、線材のＪｃ（特に磁場
中でのＪｃ）を高める方法として期待されている。On the other hand, a method of forming a superconducting film on a flexible long base material by a vapor phase process such as sputtering or vapor deposition to obtain a superconducting wire has been studied.
This method has a possibility that the critical current density (Jc) can be significantly increased by controlling the superconductor structure formed on the base material. It is expected as a method of increasing Jc).
【０００５】この長尺基材に超電導体膜を形成する技術
に関しては、たとえば、レーザーアブレーション法によ
り、まず基礎として、単結晶基板上に１×１０6 Ａ／ｃ
ｍ2を超える高Ｊｃの酸化物高温超電導膜を形成する技
術が確立されてきた。[0005] With respect to the technique of forming a superconductor film on a long base material, for example, a laser ablation method is first used to form a base on a single crystal substrate at 1 × 10 6 A / c.
Techniques for forming a high Jc oxide high temperature superconducting film exceeding m 2 have been established.
【０００６】しかしながら、線材として実用的な基材は
多結晶材料であり、この材料上で高Ｊｃの超電導膜を形
成させるにはさらに検討を進めていく必要がある。However, a practical base material as a wire is a polycrystalline material, and further studies are needed to form a high Jc superconducting film on this material.
【０００７】本発明者らは、長尺基材上に酸化物高温超
電導膜を形成してより実用的な線材を得るために、ま
ず、より実用的な材質の基材を選択し、その基材上に高
Ｊｃの超電導膜を形成させるための技術について検討を
行なってきた。その過程において、超電導膜を形成すべ
き基材の材質について検討を行なった。In order to obtain a more practical wire rod by forming an oxide high-temperature superconducting film on a long base material, the present inventors first select a more practical base material, A technology for forming a high Jc superconducting film on a material has been studied. In that process, the material of the substrate on which the superconducting film is to be formed was examined.
【０００８】本発明の目的は、高温超電導膜の形成に適
した材質の基材を用いることによって、高Ｊｃの超電導
線を得るための技術を提供することにある。An object of the present invention is to provide a technique for obtaining a high Jc superconducting wire by using a base material made of a material suitable for forming a high-temperature superconducting film.
【０００９】[0009]
【課題を解決するための手段】本発明者らは、超電導膜
を形成するための長尺基材として、酸化物高温超電導体
を基材上に形成する環境（温度および雰囲気等）におい
て、膜形成のための表面を安定して保持できる材質のも
のを検討してきた。この検討において、超合金、特に、
ハステロイおよびインコネル等のＮｉ基合金が選択され
てきた。そして、Ｎｉ基合金からなる基材を用いる場
合、酸化物高温超電導膜の形成に先立って基材が焼鈍さ
れていることが重要であることを見出し本発明に至っ
た。Means for Solving the Problems The present inventors, as a long base material for forming a superconducting film, use an oxide high-temperature superconductor in an environment (temperature, atmosphere, etc.) in which the high temperature superconductor is formed on the base material. Materials that can stably hold the surface for formation have been studied. In this discussion, superalloys, in particular,
Ni-based alloys such as Hastelloy and Inconel have been selected. Then, when a substrate made of a Ni-based alloy is used, it has been found that it is important that the substrate is annealed prior to the formation of the oxide high-temperature superconducting film, and the present invention has been made.
【００１０】すなわち、本発明に従う超電導線の製造方
法は、基材上に酸化物高温超電導膜を形成してなる超電
導線の製造方法において、Ｎｉ基合金からなり、かつ６
００℃以上の温度を用いて焼鈍された基材上に、酸化物
高温超電導膜を形成することを特徴とする。That is, a method of manufacturing a superconducting wire according to the present invention is the method of manufacturing a superconducting wire formed by forming an oxide high-temperature superconducting film on a base material, comprising a Ni-based alloy;
An oxide high-temperature superconducting film is formed on a substrate annealed at a temperature of 00 ° C. or higher.
【００１１】本発明において基材には、上述したように
Ｎｉ基合金が用いられる。Ｎｉ基合金として好ましい材
料には、ハステロイおよびインコネル等の優れた耐熱性
および耐酸化性を有するＮｉ−Ｃｒ合金を挙げることが
できる。より具体的には、基材としてハステロイＣ（１
６．５％Ｃｒ、〜２．５％Ｃｏ、１７％Ｍｏ、５％Ｆ
ｅ、残部Ｎｉ）およびインコネル７１３Ｃ（１３％Ｃ
ｒ、〜１％Ｃｏ、４．５％Ｍｏ、６％Ａｌ、〜２．５％
Ｆｅ、残部Ｎｉ）等を用いることができる。In the present invention, a Ni-based alloy is used for the base material as described above. Preferred materials for the Ni-based alloy include Ni-Cr alloys having excellent heat resistance and oxidation resistance, such as Hastelloy and Inconel. More specifically, Hastelloy C (1
6.5% Cr, ~ 2.5% Co, 17% Mo, 5% F
e, balance Ni) and Inconel 713C (13% C
r, １1% Co, 4.5% Mo, 6% Al, ２．５2.5%
Fe, the balance Ni) and the like can be used.
【００１２】本発明において、基材は、通常、上記材料
に塑性加工等を施し、線材として適当な形状にされたも
のが用いられる。In the present invention, as the base material, one obtained by subjecting the above-mentioned material to plastic working or the like and forming the wire into an appropriate shape is usually used.
【００１３】たとえば、線材として好ましいテープ状の
基材等は、圧延加工を経て得られる。この圧延加工で
は、まず、上記材料に熱間圧延が施される。次いで、た
とえば基材の厚みが数ｍｍになると冷間圧延が施され、
最終的にたとえば厚み０．０５〜０．２ｍｍのテープ状
基材が得られる。For example, a tape-shaped base material or the like, which is preferable as a wire, can be obtained through rolling. In this rolling process, first, the material is subjected to hot rolling. Next, for example, when the thickness of the substrate becomes several mm, cold rolling is performed,
Finally, for example, a tape-shaped substrate having a thickness of 0.05 to 0.2 mm is obtained.
【００１４】本発明において、このようにして加工され
た基材は、超電導膜の形成に先立って必ず焼鈍される。
焼鈍は、６００℃以上の温度、好ましくは６００〜８０
０℃の温度を用いて行なわれる。また、このような焼鈍
は、真空中または水素中で行なうことが好ましい。In the present invention, the substrate processed in this manner is always annealed prior to forming the superconducting film.
Annealing is performed at a temperature of 600 ° C. or more, preferably 600 to 80 ° C.
This is performed using a temperature of 0 ° C. Further, such annealing is preferably performed in a vacuum or in hydrogen.
【００１５】焼鈍された基材は、通常その表面が研磨さ
れ、超電導膜の形成に適した面が調製される。研磨工程
では、通常のエメリー紙またはダイヤモンドペーパーに
よる面出しの後、研磨微粒粉を懸濁させた研磨剤を用い
て研磨仕上げを行なうことができる。研磨微粒粉として
は、Ａｌ2 Ｏ3 、ＳｉＣ、Ｃｒ2 Ｏ3 およびコロイダル
シリカ等の少なくともいずれかを用いることができる。
また、研磨剤中に、過酸化水素および硝酸等を加えたも
のを用いてメカノケミカルポリッシュを行なうこともで
きる。The surface of the annealed substrate is usually polished to prepare a surface suitable for forming a superconducting film. In the polishing step, after polishing with ordinary emery paper or diamond paper, the polishing finish can be performed using an abrasive in which fine abrasive powder is suspended. As the polishing fine powder, at least one of Al 2 O 3 , SiC, Cr 2 O 3, colloidal silica and the like can be used.
Mechanochemical polishing can also be performed using a polishing agent to which hydrogen peroxide, nitric acid, or the like has been added.
【００１６】次いで、研磨された基材の表面にＹＢａ2
Ｃｕ3 Ｏx 等のＹ系、Ｂｉ2 Ｓｒ2Ｃａ2 Ｃｕ3 Ｏx 等
のＢｉ系、ＴｌＢｉＳｒ2 Ｃａ2 Ｃｕ3 Ｏx 等のＴｌ系
等の酸化物高温超電導膜が形成される。この超電導膜を
形成するにあたり、まず基材上にイットリア安定化ジル
コニア（ＹＳＺ）またはＭｇＯ等からなる中間層を形成
することが好ましい。この中間層を介して酸化物高温超
電導膜を形成することにより、超電導膜の結晶性を高
め、高Ｊｃの膜を形成させることができる。Next, YBa 2 is applied to the surface of the polished substrate.
Cu 3 O x or the like of the Y-based, Bi 2 Sr 2 Ca 2 Cu 3 O x or the like of the Bi-based, TlBiSr 2 Ca 2 Cu 3 O x oxide high-temperature superconducting film of Tl system such as is formed. In forming this superconducting film, it is preferable to first form an intermediate layer made of yttria-stabilized zirconia (YSZ) or MgO on a substrate. By forming the oxide high-temperature superconducting film through this intermediate layer, the crystallinity of the superconducting film can be enhanced, and a film having a high Jc can be formed.
【００１７】これら中間層および超電導膜は、成膜速度
の大きなレーザーアブレーションにより形成することが
好ましいが、その他、スパッタ法およびＣＶＤ法等でも
形成させることができる。The intermediate layer and the superconducting film are preferably formed by laser ablation at a high film forming rate, but can also be formed by a sputtering method, a CVD method, or the like.
【００１８】[0018]
【作用】本発明者らの実験では、上述したように圧延加
工を行って得られた基材について、焼鈍を施さずにその
上に酸化物高温超電導膜を形成した場合、超電導膜のＪ
ｃが著しく低下（〜数１００Ａ／ｃｍ2 ）し、甚だしい
ときは液体窒素温度で超電導性を示さなくなった。In the experiments of the present inventors, when a high-temperature oxide superconducting film was formed on a substrate obtained by rolling as described above without annealing, the J
c was remarkably reduced (up to several hundreds A / cm 2 ), and when it was severe, it did not show superconductivity at liquid nitrogen temperature.
【００１９】これは、酸化物高温超電導膜を形成する際
の基板温度が６００〜７５０℃と高いため、焼鈍を施さ
なかった基材がこの高温に保持されると、基材内の粒界
が移動して、表面粗さが増大したり、特に粒界で窪みが
生じたりすることに起因すると考えられた。このような
粒界の移動により、表面組織が乱雑になった部分には、
配向性の低い膜しか形成されず、このためＪｃが顕著に
低下すると考えられた。This is because the substrate temperature at the time of forming an oxide high-temperature superconducting film is as high as 600 to 750 ° C. Therefore, if a substrate that has not been annealed is kept at this high temperature, the grain boundaries in the substrate will be formed. It was considered that the surface roughness was increased due to the movement, and a depression was formed particularly at the grain boundary. Due to the movement of the grain boundary, the part where the surface texture is disordered is
It was considered that only a film having low orientation was formed, and thus Jc was significantly reduced.
【００２０】一方、本発明者らの実験において、６００
℃以上の温度を用いて焼鈍を施した基材上に超電導膜を
形成した場合、上述したようにＪｃの著しい低減が見ら
れず、比較的高いＪｃの超電導線を得ることができた。
これは、焼鈍により、基材の歪みが除去されるととも
に、高温に対して基材の結晶組織が調整されること等に
よって、超電導膜の形成に適した基材および基材表面が
調製されたためであると考えられた。On the other hand, in our experiments, 600
When a superconducting film was formed on a substrate annealed at a temperature of not less than ° C, Jc was not significantly reduced as described above, and a superconducting wire having a relatively high Jc could be obtained.
This is because, by annealing, the strain of the base material was removed, and the crystal structure of the base material was adjusted with respect to the high temperature, and thereby, the base material and the base material surface suitable for forming the superconducting film were prepared. Was thought to be.
【００２１】[0021]
【実施例】幅１０ｍｍ、長さ１ｍのハステロイＣからな
る基材を８００℃で２時間、水素気流中において焼鈍し
たものと、このような焼鈍を全く行なわないものとをそ
れぞれ準備した。それぞれの基材について、通常のエメ
リー紙を用い、＃３００、＃６００、＃１２００の順に
研磨した後、ＣＬＥＡＬＩＴＥ−２３７５（不二見研磨
材工業株式会社製）を用いてメカノケミカルポリッシン
グを施した。EXAMPLE A substrate made of Hastelloy C having a width of 10 mm and a length of 1 m was annealed at 800 ° C. for 2 hours in a hydrogen stream, and a substrate not subjected to such annealing was prepared. Each substrate was polished in the order of # 300, # 600, and # 1200 using ordinary emery paper, and then subjected to mechanochemical polishing using CLEALITE-2375 (manufactured by Fujimi Abrasives Co., Ltd.).
【００２２】研磨した基材表面を洗浄、乾燥させた後、
この基材表面上にレーザーアブレーションに従って厚さ
約０．４μｍのＹＳＺ中間層、および厚さ約０．８〜
１．２μｍのＹＢａ2 Ｃｕ3 Ｏ7-y 超電導層を形成し
た。各層の形成条件は以下の通りである。After washing and drying the polished substrate surface,
A YSZ intermediate layer having a thickness of about 0.4 μm according to laser ablation on the substrate surface, and a thickness of about 0.8 to
A 1.2 μm YBa 2 Cu 3 O 7-y superconducting layer was formed. The conditions for forming each layer are as follows.
【００２３】（ＹＳＺ成膜条件） ターゲット：１０％Ｙ2 Ｏ3 −ＹＢａ2 Ｃｕ3 Ｏ
7-y （７５φ） 雰囲気：Ｏ2 ０．５ｍｔｏｒｒ 基板温度：６００℃ レーザーエネルギー密度：３．５Ｊ／ｃｍ2 （ＹＢａ2 Ｃｕ3 Ｏ7-y 成膜条件） ターゲット：ＹＢａ2 Ｃｕ3 Ｏ7-y （７５φ） 雰囲気：Ｏ2 ２００ｍｔｏｒｒ 基板温度：７２０℃ レーザーエネルギー密度：３Ｊ／ｃｍ2 焼鈍した基材と焼鈍しない基材とについて、それぞれ上
記条件でＹＳＺ中間層および超電導層を形成させた線材
についてＪｃを測定した。その結果、焼鈍しない基材を
用いた場合、Ｊｃは１５０Ａ／ｃｍ2 であったのに対
し、焼鈍した基材を用いた場合、Ｊｃは６２，０００Ａ
／ｃｍ2 であった。このように、基材としてＮｉ基合金
を用いる場合、超電導膜の形成に先立って行なわれる焼
鈍が、高Ｊｃの線材を得るために必要不可欠であること
がわかる。(YSZ film forming conditions) Target: 10% Y 2 O 3 -YBa 2 Cu 3 O
7-y (75φ) Atmosphere: O 2 0.5 mtorr Substrate temperature: 600 ° C. Laser energy density: 3.5 J / cm 2 (YBa 2 Cu 3 O 7-y film - forming conditions) Target: YBa 2 Cu 3 O 7- y (75φ) Atmosphere: O 2 200 mtorr Substrate temperature: 720 ° C. Laser energy density: 3 J / cm 2 Regarding the annealed base material and the unannealed base material, the wire on which the YSZ intermediate layer and the superconducting layer are formed under the above conditions, respectively. Jc was measured. As a result, when using a non-annealed substrate, Jc was 150 A / cm 2 , while when using an annealed substrate, Jc was 62,000 A.
/ Cm 2 . Thus, it can be seen that when a Ni-based alloy is used as the base material, annealing performed prior to formation of the superconducting film is indispensable to obtain a high Jc wire.
【００２４】[0024]
【発明の効果】本発明によれば、焼鈍されたＮｉ基合金
からなる基材を用いることによって、酸化物高温超電導
膜の形成に適した基材表面を調製することができ、その
結果高Ｊｃの超電導膜が得られる。このように、本発明
は、長尺基材上に酸化物高温超電導膜を形成して高Ｊｃ
の超電導線を得るための技術の１つとして重要なもので
ある。また、本発明において用いるＮｉ基合金は、焼鈍
を行なっても高い強度を保持しているので、強度の高い
超電導線を製造することができる。According to the present invention, a substrate surface suitable for forming an oxide high-temperature superconducting film can be prepared by using a substrate made of an annealed Ni-based alloy. Is obtained. As described above, the present invention forms an oxide high-temperature superconducting film on a long base material and
This is important as one of the techniques for obtaining a superconducting wire. Further, since the Ni-based alloy used in the present invention maintains high strength even after annealing, a high-strength superconducting wire can be manufactured.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 藤野 剛三 大阪市此花区島屋一丁目１番３号 住友 電気工業株式会社 大阪製作所内 (72)発明者 原 築志 東京都調布市西つつじケ丘二丁目４番１ 号 東京電力株式会社 技術研究所内 (72)発明者 石井 英雄 東京都調布市西つつじケ丘二丁目４番１ 号 東京電力株式会社 技術研究所内 (56)参考文献 欧州特許出願公開458441（ＥＰ，Ａ １) 欧州特許出願公開392659（ＥＰ，Ａ １) (58)調査した分野(Int.Cl.7，ＤＢ名) H01B 12/00 - 13/00 ──────────────────────────────────────────────────続 き Continuing from the front page (72) Inventor Gozo Fujino 1-3-1 Shimaya, Konohana-ku, Osaka-shi In the Osaka Works of Sumitomo Electric Industries, Ltd. No. 1 Tokyo Electric Power Company Technical Research Institute (72) Inventor Hideo Ishii 2-4-1 Nishi Atsujigaoka, Chofu City, Tokyo Tokyo Electric Power Company Technical Research Institute (56) Reference European Patent Application Publication 458441 (EP, A1) European Patent Application Publication No. 392659 (EP, A1) (58) Fields investigated (Int. Cl. 7 , DB name) H01B 12/00-13/00
Claims (3)
なる超電導線の製造方法において、 Ｎｉ基合金からなり、かつ６００℃以上の温度を用いて
真空中または水素中で焼鈍された基材上に、前記酸化物
高温超電導膜を形成することを特徴とする、超電導線の
製造方法。1. A method for manufacturing a superconducting wire in which an oxide high-temperature superconducting film is formed on a substrate, comprising a Ni-based alloy and a temperature of 600 ° C. or more.
A method for manufacturing a superconducting wire, comprising forming the oxide high-temperature superconducting film on a substrate annealed in a vacuum or in hydrogen .
レーション、スパッタ法またはＣＶＤ法により形成する
ことを特徴とする、請求項１に記載の超電導線の製造方
法。 2. The method according to claim 1, wherein the oxide high-temperature superconducting film is formed by laser ablation.
By sputtering, sputtering or CVD
The method for manufacturing a superconducting wire according to claim 1, wherein:
Law.
磨した前記基材の表面に前記酸化物高温超電導膜を形成
することを特徴とする、請求項１または２に記載の超電
導線の製造方法。 3. The surface of the annealed substrate is polished and ground.
Forming the oxide high-temperature superconducting film on the polished surface of the substrate
The superconductor according to claim 1, wherein
Manufacturing method of conducting wire.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21996592A JP3278461B2 (en) | 1992-08-19 | 1992-08-19 | Superconducting wire manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21996592A JP3278461B2 (en) | 1992-08-19 | 1992-08-19 | Superconducting wire manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0668726A JPH0668726A (en) | 1994-03-11 |
| JP3278461B2 true JP3278461B2 (en) | 2002-04-30 |
Family
ID=16743812
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21996592A Expired - Fee Related JP3278461B2 (en) | 1992-08-19 | 1992-08-19 | Superconducting wire manufacturing method |
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| Country | Link |
|---|---|
| JP (1) | JP3278461B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005056754A (en) * | 2003-08-06 | 2005-03-03 | Sumitomo Electric Ind Ltd | Superconductive wire and its manufacturing method |
| JP4804993B2 (en) * | 2006-04-05 | 2011-11-02 | 株式会社フジクラ | Oxide superconducting conductor |
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1992
- 1992-08-19 JP JP21996592A patent/JP3278461B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0668726A (en) | 1994-03-11 |
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