JP2019084058A - Polishing pad - Google Patents

Abstract

To provide a polishing pad that is deformable with a smaller force.SOLUTION: A polishing pad includes a substrate made of non-woven fabric. The substrate has a flat-plate shape extending in a first direction perpendicular to a thickness direction and in a second direction perpendicular to both the thickness direction and the first direction. The substrate is divided into a plurality of blocks arranged in the second direction and extending in the first direction. A boundary portion extending in the first direction is formed between each pair of the blocks, and a plurality of slits are formed in the boundary portion. The slits are formed through the substrate in the thickness direction and extend in the first direction. The slits in the boundary portion are spaced in the first direction. A pair of the blocks that are next to each other in the second direction are connected to each other by a connection portion formed between the slits.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a polishing pad.

  DESCRIPTION OF RELATED ART Conventionally, the polishing pad provided with the base material comprised with a nonwoven fabric is known. For example, the polishing pad of Patent Document 1 is used to polish an object to remove dirt attached to the object.

JP, 2011-189189, A

  Here, when the operator performs cleaning using the polishing pad, the polishing pad may be bent in accordance with the shape of the object. The operator polishes the object while keeping the polishing pad bent. In such a polishing pad, when an operator bends the polishing pad, it is necessary to apply a force to the polishing pad to bend. Therefore, from the viewpoint of ease of operation, it has been required to reduce the force required to bend the polishing pad.

  A polishing pad according to an aspect of the present invention is a polishing pad comprising a base material composed of a non-woven fabric, wherein the base material is orthogonal to a first direction orthogonal to the thickness direction and to the thickness direction and the first direction. And the base material is divided into a plurality of blocks extending in the first direction and arranged in the second direction, and between the pair of blocks And a boundary portion extending in the first direction is formed, and the boundary portion includes a plurality of slits penetrating the base material in the thickness direction and extending in the first direction, and the plurality of slits is formed at the boundary portion. A pair of blocks which are disposed apart from each other in the first direction and are adjacent to each other in the second direction are connected to each other at a connection portion formed between the slits.

  According to the present invention, it is possible to provide a polishing pad capable of reducing the force required to bend.

FIG. 1 is a perspective view of a polishing pad according to an embodiment. FIG. 2A is a view of the polishing pad as viewed from the X-axis direction, and FIG. 2B is a view as viewed from the X-axis direction when the polishing pad is bent. FIG. 3 is a view showing a state of the slit when the polishing pad is bent as viewed from the thickness direction. FIG. 4 is a diagram showing a model for determining the dimension in the Y-axis direction of one block. FIG. 5A is a view of the polishing pad according to the comparative example as viewed from the thickness direction, and FIG. 5B is a view of the polishing pad according to the comparative example as viewed from the X-axis direction. c) is a view seen from the X-axis direction when the polishing pad according to the comparative example is bent. 6 (a) and 6 (b) are views of a polishing pad according to a modification as viewed from the thickness direction.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the following description, the same or corresponding elements are denoted by the same reference numerals and redundant description will be omitted.

  A polishing pad 1 according to an embodiment of the present invention will be described with reference to FIG. FIG. 1 is a perspective view of a polishing pad. As shown in FIG. 1, the polishing pad 1 includes a substrate 2. In the present embodiment, a direction orthogonal to the thickness direction of the substrate 2 is taken as an X-axis direction (first direction), and a direction orthogonal to the thickness direction and the X-axis is taken as a Y-axis direction (second direction). . The base 2 has a flat plate shape that extends in the X-axis direction and the Y-axis direction. The base material 2 has main surfaces 2c and 2d opposed in the thickness direction. In FIG. 1, the base material 2 has a long side in the X-axis direction and a short side in the Y-axis direction. However, the shape of the base material 2 is not particularly limited, and the ratio of the sides in the X-axis direction and the sides in the Y-axis direction may be appropriately changed. The size of the polishing pad 1 may be such that an operator can carry out work while holding it with a palm. For example, the thickness may be 20 to 40 mm, and the dimensions in the X axis direction and the Y axis direction may be 100 to 150 mm.

  First, the case where a type using a water-soluble binder is adopted as the substrate 2 will be exemplified. The base 2 is made of non-woven fabric. The non-woven fabric is provided with an abrasive coating for retaining abrasive particles. Nonwoven webs suitable for use in abrasive cleaning articles include, but are not limited to, air laid, carded, stitch bonded, spunbonded, wet laid, meltblown structures. Fibers suitable for use in abrasive cleaning articles include natural and synthetic fibers, and mixtures thereof. Polyester (eg, polyethylene terephthalate), nylon (eg, hexamethylene adipamide, polycaprolactam), polypropylene, acrylic (formed from a polymer of acrylonitrile), rayon, cellulose acetate, polyvinylidene chloride-vinyl chloride copolymer, vinyl chloride Synthetic fibers such as fibers composed of acrylonitrile copolymer etc. are preferred. Suitable natural fibers include cotton, wool, jute and hemp fibers. The fibers used can be virgin fibers or scrap fibers regenerated, for example, from the cutting of articles of clothing, the production of carpets, the production of fibers, or the processing of textile fibers. The fibrous material can be a composite fiber, such as a uniform fiber or a bicomponent fiber (e.g., co-spun sheath-core fiber). It is also within the scope of the present invention to provide articles comprising different fibers in different parts of the web (e.g. the first web part, the second web part and the intermediate web part). The fibers of the web are preferably drawn and crimped, but can also be continuous filaments formed by an extrusion process, as well as continuous fibers.

  The abrasive coating holds and fixes the abrasive particles to the substrate 2. The abrasive coating contains a water soluble binder. The water soluble binder is solidified to hold and fix the abrasive particles to the nonwoven fabric of the substrate 2 until exposed to the solvent at the time of use of the polishing pad 1. The solvent is used at the time of cleaning and starts dissolving the water-soluble binder and causes the abrasive particles to peel off the polishing pad 1. The water soluble binder can be an oligomer or a polymer, including copolymers and blends thereof. Non-limiting examples of polymers and copolymers suitable for use as water soluble binders are polyethylene glycol, polyvinyl pyrrolidone, polyvinyl pyrrolidone / vinyl acetate copolymer, polyvinyl alcohol, carboxymethyl cellulose, hydroxypropyl cellulose starch, polyethylene oxide , Polyacrylamide, polyacrylic acid, cellulose ether polymer, polyethyl oxazoline, ester of polyethylene oxide, copolymer of ester of polyethylene oxide with polypropylene oxide, urethane of polyethylene oxide, and copolymer of urethane of polyethylene oxide with polypropylene oxide Be

  The water soluble binder can be a surfactant. In addition, the water soluble binder may comprise a combination of various water soluble binders, one of which may be a surfactant. Also, the water soluble binder can comprise a combination of various surfactants.

  Surfactants useful in the present invention are surfactants that are readily soluble in water. In addition, surfactants provide excellent lathering, cleaning, and oiling properties in normal household cleaning applications and remove stains, greases, oils, dirt, grime and deposits from surfaces to be cleaned. To help.

  Surfactants used in the abrasive cleaning articles of the present invention include one or more anionic, cationic, nonionic, amphoteric surfactants, as well as combinations of such surfactants. Surfactants are desired to be gentle and non-toxic to the skin of the user. In blends of one or more anionic, cationic, nonionic, and / or amphoteric surfactants, it is desirable that higher concentrations of anionic surfactants be desirable for improved foaming and detergency. Within the scope of the invention.

  The abrasive particles are releasably fixed to the nonwoven fabric of the substrate 2 by a water soluble binder. The abrasive particles used in the manufacture of the article according to the invention include all known abrasives, as well as combinations and agglomerates of such materials. Soft abrasives include, but are not limited to, inorganic materials such as flint, silica, pumice, and calcium carbonate, and organic polymer materials such as polyester, polyvinyl chloride, methacrylate, methyl methacrylate, polycarbonate, and polystyrene, and the above materials And any combination of Hard abrasives include, but are not limited to, aluminum oxide, aluminum oxides such as heat treated aluminum oxide and white aluminum oxide, and silicon carbide, alumina zirconia, diamond, ceria, cubic boron nitride, garnet, and combinations of the above. Be

  In addition to the water soluble binder and abrasive particles, the abrasive coating also contains colorants, perfumes, aromatic oils, preservatives, wetting agents, antifoaming agents, coupling agents, suspending agents, pigments, and antimicrobial additives It can. These additional ingredients are well known in the art.

  Next, the case where the thing of the type which used the thermosetting adhesive as a binder as a base material 2 is employ | adopted is illustrated. Preferred nonwovens are polyamides (for example nylon 6 and nylon 6, 6 composed of polycaprolactam and polyhexamethyl adipamide), polyolefins (for example polypropylene and polyethylene), polyesters (for example polyethylene terephthalate) and polycarbonates. It consists of such thermoplastic organic fiber. Nonwovens composed of nylon and polyester fibers are commonly used.

  The thickness of the fibers is generally about 19 to 250 μm in diameter. The thickness of the non-woven fabric is generally about 2 to 50 mm. The arranged fibers are connected to one another by intersections, contact points by friction, adhesion and the like. The bonding of the fibers may be performed by melting the fibers themselves, or may be performed separately using an adhesive.

  The adhesive is used to bond the non-woven fibers to each other or the non-woven fibers and the abrasive particles. The adhesive for bonding the fibers of the non-woven fabric may be different from or the same as the adhesive for bonding the fibers of the non-woven fabric and the abrasive particles. When the same adhesive is used, bonding of non-woven fibers to each other and bonding of non-woven fibers and abrasive particles may be simultaneously performed in the production process.

  The first adhesive for bonding the fibers of the non-woven fabric is, for example, an aqueous suspension of an epoxy, melamine, phenol, isocyanate and isocyanurate resin and an organic solvent solution as an example of a thermosetting adhesive, or an SBR, SBS, SIS, etc. Rubber-based polymer solutions or suspensions can also be used. These are applied to fibers by a dip coating method, a roll coating method, a spray coating method or the like and cured to form a non-woven fabric.

  The method for producing the substrate 2 is not particularly limited. For example, after a plurality of sheets of fibers are laminated to form a laminate, the laminate may be solidified with an adhesive to form the base 2. Alternatively, the base material 2 may be obtained by extruding and collecting fibers, and then solidifying and demolding.

  The substrate 2 is divided into a plurality of blocks 3 extending in the X-axis direction and arranged in the Y-axis direction. The block 3 is a region where there is no slit 6 extending in the X-axis direction described later between one end 2a and the other end 2b in the X-axis direction of the base material 2. The block 3 extends in a strip shape between the end 2 a and the end 2 b in the base material 2. When the base material 2 is bent, the block 3 mainly comes in contact with the object and becomes an area for polishing the surface of the object. The blocks 3 are partitioned at a predetermined pitch in the Y-axis direction. The setting method of the pitch of the block 3 will be described later.

  A boundary 4 extending in the X-axis direction is formed between the pair of blocks 3. The boundary portion 4 is formed with a plurality of slits 6 penetrating the base 2 in the thickness direction and extending in the X-axis direction. The slits 6 extend from the main surface 2c in the thickness direction and extend to the main surface 2d. The slit 6 is formed by preparing a tool in which a plurality of plate-like blade portions are erected on the base member, pressing the base material 2 against the tool to penetrate the base material 2 with the blade portion. In the boundary portion 4, the plurality of slits 6 are disposed apart from each other in the X-axis direction. The position where the slit 6 and the slit 6 are separated functions as a connecting portion 7 which connects the blocks 3 with each other. Therefore, the pair of blocks 3 adjacent to each other in the Y-axis direction are connected to each other at the connection portion 7 formed between the slits 6.

  In FIG. 1, imaginary lines are attached to some of the boundaries 4. The boundary 4 has a straight line extending straight in the X-axis direction. In the boundary portion 4, the plurality of slits 6 and the plurality of connection portions 7 are alternately arranged. That is, the “boundary portion” overlaps the slit 6 when viewed from the thickness direction, and corresponds to the virtual line when the virtual line extended to the end portions 2 a and 2 b is set. Thus, the boundary 4 is a virtual line that virtually divides one block 3 from another block 3. The “slit” is a cut formed in the substrate 2. When the substrate 2 is in the steady state (the state shown in FIG. 1), the edges 6a and 6b (see FIGS. 2 and 3) of the slits in the major surface 2c are in contact or close to each other. When a force is applied to expand each block 3 in the Y-axis direction, the edges 6a and 6b of the slits 6 on the main surface 2c spread apart from each other. The “connection portion” corresponds to a portion on the virtual line of the boundary portion 4 in which the slit 6 is not formed. The connection portion 7 is a portion fixed so that adjacent blocks 3 do not separate from each other without spreading the opening like the slit 6 when a force is applied to expand each block 3 in the Y-axis direction.

  When the slits 6 are partially provided to the base material 2 as described above, as shown in FIGS. 2 and 3, when the operator bends the base material 2 in the Y-axis direction, the base material 2 is formed. Bends in the open state at the position of the slit 6. In the slit 6, the base material 2 opens so that the edge parts 6a and 6a located in the outer peripheral side with respect to bending may mutually estrange. On the other hand, when the base material 2 is bent in the X-axis direction, the base material 2 is bent without opening at the position of the slit 6. Therefore, the worker can easily bend the substrate 2 in the Y-axis direction as compared to bending the substrate 2 in the X-axis direction. For example, the flexural strength of the substrate 2 in the Y-axis direction may be 10 to 80% or 15 to 50% of the flexural strength of the substrate 2 in the X-axis direction. In addition, bending strength is JIS L-1096 bending resilience A method, JAPAN TAPPI NO. A value obtained by measurement with a Gurley stiffness tester using a measurement method in accordance with No. 40 is used. When the polishing pad 1 is bent, a spring back force (repulsive force) is generated on the polishing pad 1 itself. Such a repulsive force causes the polishing pad 1 to return to a substantially flat state after the force is reduced. Further, due to such a repulsive force, at the time of operation, an action of sticking (adhering) the polishing pad 1 to the palm side of the worker occurs.

  In the present embodiment, the connection portion 7 of the boundary portion 4 formed on one side in the Y-axis direction with respect to the block 3 differs from the connection portion 7 of the boundary portion 4 formed on the other side in the X-axis direction. It is placed in position. The “different positions” may be different from each other as long as the central positions in the Y-axis direction in the connecting portion 7 are different from each other, and parts in the Y-axis direction may overlap each other. The slits 6 of the boundary portion 4 formed on one side in the Y-axis direction with respect to the block 3 and the slits 6 of the boundary portion 4 formed on the other side are arranged at different positions in the X-axis direction. That is, in the border portions 4 adjacent to each other, the slits 6 in one border portion and the slits 6 in the other border portion have a staggered positional relationship. Thus, a structure in which the plurality of slits 6 are arranged in a staggered manner may be referred to as a skip slit. In the present embodiment, the slits 6 and the boundary 4 are arranged at the same position in the boundary 4 adjacent to each other. That is, the pair of boundary portions 4 forms one set to form a staggered arrangement pattern of the slits 6.

  The dimensions of the block 3, the slit 6, and the connecting portion 7 configured as described above are not particularly limited, but may be set as follows, for example. The dimension in the Y-axis direction of the block 3 may be 2 to 40 mm, and may be 2 to 20 mm. The dimension in the X-axis direction of the slit 6 may be 5 to 50 mm, and may be 10 to 30 mm. The dimension in the X-axis direction of the connection part 7 may be 5 to 50 mm, and may be 10 to 30 mm.

  Here, an example of a method of setting the dimension of the block 3 in the Y-axis direction will be illustrated. For example, when polishing an object 30 having a circular cross-sectional shape as shown in FIG. 4 with the polishing pad 1, it is desirable that the polishing pad 1 contact the object 30 at at least eight locations in the circumferential direction. In the model shown in FIG. 4, when the base material 2 of the polishing pad 1 is bent so as to cover the object 30, it is assumed that each block 3 becomes substantially straight and bends at the position of each boundary 4 . In this case, the substrate 2 contacts the object 30 at a predetermined point of the block 3. In FIG. 4, the octagon described by the alternate long and short dash line on the outer periphery of the object 30 indicates the polished surface of the substrate 2. Therefore, when the diameter of the object 30 is 50 mm, the dimension when dividing the outer periphery of the object 30 into eight equal parts is 19.6 mm. Therefore, it is preferable that the dimension in the Y-axis direction of the block 3 per one is about 20 mm or less.

  Next, the operation and effects of the polishing pad 1 according to the present embodiment will be described.

  The polishing pad 1 is a polishing pad 1 provided with a base material 2 composed of a non-woven fabric, and the base material 2 has an X axis direction orthogonal to the thickness direction, and a Y axis direction orthogonal to the thickness direction and the X axis direction. The base material 2 is divided into a plurality of blocks 3 extending in the X-axis direction and arranged in the Y-axis direction, and between the pair of blocks 3 in the X-axis direction. A plurality of slits 6 penetrating the base material 2 in the thickness direction and extending in the X-axis direction are formed in the boundary portion 4, and in the boundary portion 4, the plurality of slits 6 are X A pair of blocks 3 arranged in the axial direction so as to be separated from each other and adjacent to each other in the Y-axis direction are connected to each other at a connecting portion 7 formed between the slits 6.

  For example, the polishing pad 100 according to the comparative example as shown in FIG. 5 does not have a slit as in the present embodiment. In this case, when the operator tries to bend the polishing pad 100, a resistance against bending of the substrate 2 acts. For this reason, it is necessary for the operator to apply force to bend the polishing pad 100. On the other hand, in the polishing pad 1 according to the present embodiment, the slit 6 extending in the X-axis direction is formed in the boundary portion 4 of the block 3 of the base material 2. The base material 2 is opened so as to easily spread at the position of the slit 6 when a bending force is applied in the Y-axis direction. Therefore, when the operator tries to bend the polishing pad 1, the base 2 can be easily bent by the slit 6 expanding. Further, even in the case where such a slit 6 is formed, since the connecting portion 7 for connecting the blocks 3 is formed in the boundary portion 4, it is possible to prevent the blocks 3 from being separated. By the above, the force required when bending the polishing pad 1 can be reduced.

  The connection portion 7 of the boundary portion 4 formed on one side in the Y-axis direction with respect to the block 3 and the connection portion 7 of the boundary portion 4 formed on the other side are arranged at different positions in the X-axis direction. You may For example, as shown in FIG. 6A described later, when the connection portions 7 adjacent to each other in the Y-axis direction are formed at the same position in the X-axis direction, the connection portion 7 is continuous at this point. The resistance to bending when bending the material 2 is increased. On the other hand, when the connection portions 7 adjacent to each other in the Y-axis direction are arranged at different positions in the X-axis direction, the connection portions 7 can be dispersedly arranged, so that an increase in resistance to bending can be suppressed.

  The bending strength of the base 2 in the Y-axis direction may be 10 to 80% of the bending strength of the base 2 in the X-axis direction. In this case, the worker can easily bend the polishing pad 1 to perform work.

  The dimension of the block 3 in the Y-axis direction may be 2 to 40 mm, the dimension of the slit 6 in the X-axis direction may be 5 to 50 mm, and the dimension of the connection portion 7 in the X-axis direction may be 5 to 50 mm . In this case, the operator can easily bend the polishing pad 1. In addition, the strength of the polishing pad can be sufficiently secured.

  The polishing pad 1 is a polishing pad 1 provided with a base material 2 composed of a non-woven fabric, and the base material 2 has an X axis direction orthogonal to the thickness direction, and a Y axis direction orthogonal to the thickness direction and the X axis direction. , And a slit 6 extending in the thickness direction from one of the main surfaces 2c in the thickness direction and extending in the X-axis direction on the main surface 2c is formed in the substrate 2 in the Y-axis direction. There are a plurality of slits 60 formed in.

  In the polishing pad 1, a slit 6 extending in the thickness direction from one of the main surfaces 2 c in the thickness direction and extending in the X-axis direction on the main surface 2 c is formed in the base material 2. The base material 2 is opened so as to easily spread at the position of the slit 6 when a bending force is applied in the Y-axis direction. Further, a plurality of slits 60 are formed in the Y-axis direction. Thereby, the slits 6 are opened at a plurality of places in the Y-axis direction. Therefore, it becomes possible to bend the whole substrate 2 easily. By the above, the force required when bending the polishing pad 1 can be reduced.

  The present invention is not limited to the embodiments described above, and may be modified as appropriate.

  The arrangement structure of the slits 6 is not limited to the above embodiment. For example, in the polishing pad 1 shown in FIG. 6A, the connection portion 7 of the boundary portion 4 formed on one side in the Y-axis direction with respect to the block 3 and the connection portion of the boundary portion 4 formed on the other side 7 are arranged at the same position in the X-axis direction. Thus, the slits 6 do not necessarily have to be in a staggered arrangement. Further, in the embodiment shown in FIG. 1, the two boundaries 4 form one set to form the zigzag arrangement pattern of the slits 6. Instead of this, as shown in FIG. 6B, a plurality of boundary portions 4 may be combined into one set to form a staggered arrangement pattern of the slits 6. Alternatively, the arrangement pattern of the slits 6 may not be particularly regular.

  Moreover, in the above-mentioned embodiment, the slit 6 penetrated the base material 2. Instead of this, a configuration in which the slit 6 does not penetrate the base material 2 may be adopted. For example, the slit 6 may extend in the thickness direction from the main surface 2c of the base material 2 and extend to a predetermined position inside the base material 2 without extending to the main surface 2d.

  Moreover, in the above-mentioned embodiment, the slit extended only in the X-axis direction was formed. In addition to this, a slit extending in the Y-axis direction may be additionally formed. In this case, the polishing pad is easily bent in the X-axis direction.

  Moreover, in the above-mentioned embodiment, the rectangular-plate-shaped member was illustrated as a base material of a polishing pad. However, the shape of the substrate is not particularly limited, and the slit structure may be applied to any type of substrate. For example, the slit structure may be applied to flap brushes, unitized wheels, unitized pads, bevels, wheels, etc.

  DESCRIPTION OF SYMBOLS 1 ... Polishing pad, 2 ... Base material, 3 ... Block, 4 ... Boundary part, 6 ... Slit, 7 ... Connection part.

Claims (5)

A polishing pad comprising a substrate composed of non-woven fabric, comprising:
The base material has a flat plate shape extending in a first direction orthogonal to the thickness direction, and a second direction orthogonal to the thickness direction and the first direction,
The substrate is divided into a plurality of blocks extending in the first direction and arranged in the second direction,
A boundary portion extending in the first direction is formed between the pair of blocks,
The boundary portion is formed with a plurality of slits extending through the base in the thickness direction and extending in the first direction.
At the boundary, the plurality of slits are spaced apart from each other in the first direction,
A polishing pad, wherein the pair of blocks adjacent in the second direction are connected to each other at a connection portion formed between the slits.   The connection portion of the boundary portion formed on one side in the second direction with respect to the block and the connection portion of the boundary portion formed on the other side are different in the first direction. The polishing pad of claim 1 disposed in a position.   The polishing pad according to claim 1, wherein a bending strength of the substrate in the second direction is 10 to 80% of a bending strength of the substrate in the first direction. The dimension in the second direction of the block is 2 to 40 mm,
The dimension of the slit in the first direction is 5 to 50 mm,
The polishing pad according to any one of claims 1 to 3, wherein a dimension of the connection portion in the first direction is 5 to 50 mm. A polishing pad comprising a substrate composed of non-woven fabric, comprising:
The base material has a flat plate shape extending in a first direction orthogonal to the thickness direction, and a second direction orthogonal to the thickness direction and the first direction,
In the base material, slits extending in the thickness direction from one main surface in the thickness direction and extending in the first direction are formed on the main surface, and a plurality of the slits are formed in the second direction. Formed, polishing pad.

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