JP2015002253A - Substrate processing apparatus, substrate detecting method and storage medium - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of reducing a time required for a recovery operation of a wafer.SOLUTION: A substrate processing apparatus 10 includes a placing base 40 for storing a plurality of wafers W in predetermined receiving positions P-P, respectively, and a wafer transporting arm 31 for receiving the wafer W located in each of the receiving positions P-Pof the placing base 40 and transporting the wafer W to the outside of the placing base 40. The wafer transporting arm 31 is provided with a pressure meter 56 for detecting whether or not the wafer exists on the wafer transporting arm 31. A control unit 80 allows the wafer transporting arm 31 to move to one of the receiving positions P-Pof the placing base 40, determines whether the wafer W exists at one of the receiving positions P-Pon the basis of a detection signal from the pressure meter 56, and when determining that the wafer W does not exist at one of the receiving positions P-P, allows the wafer transporting arm 31 to pass through one of the receiving positions P-Pto move to the next receiving position.

Description

  The present invention relates to a substrate processing apparatus, a substrate detection method for detecting a substrate using the substrate processing apparatus, and a storage medium storing a computer program for executing the substrate detection method.

  In a series of processes for manufacturing a semiconductor device or a flat display panel, a predetermined process (for example, a cleaning process) is performed by supplying a processing fluid (for example, a chemical solution) to a substrate such as a semiconductor wafer.

  In such a substrate processing apparatus (liquid processing apparatus), a stage (stage) for temporarily placing a substrate is provided between an arm for taking out the substrate from the cassette and an arm for transporting the substrate to the processing unit. (Patent Document 1).

JP 2008-34490 A JP-A-8-274143

  By the way, in such a substrate processing apparatus, a wafer may remain in the apparatus immediately after the initialization of the apparatus, for example, when the power is turned on. For this reason, in such a substrate processing apparatus, a collecting operation for collecting the remaining wafer is required.

  For example, when a wafer left on the cradle is collected, it is conceivable to attach a substrate detection mechanism inside the cradle to confirm the presence or absence of the wafer. However, when the number of cradles increases, such as when a plurality of cradles are stacked, it is necessary to provide detection mechanisms as many as the cradles, which may lead to an increase in cost.

  In the substrate processing apparatus of Patent Document 2, a sensor that detects whether or not a wafer is present on the transfer arm is provided in the vicinity of the standby position of the transfer arm. That is, a sensor stand is provided on the transfer base, and a sensor provided at a substantially distal end portion of the sensor stand detects whether or not the transfer arm holds the wafer. However, in this case, in order to confirm the presence or absence of the wafer accommodated in the cradle, the transfer arm must be reciprocated a plurality of times by the number of slots between each slot of the cradle and the vicinity of the standby position. The time will be longer.

  The present invention has been made in view of the above points, and provides a substrate processing apparatus, a substrate detection method, and a storage medium capable of reducing the time required for a substrate recovery operation.

  According to an embodiment of the present invention, there is provided a substrate processing apparatus, wherein the substrate processing apparatus includes a pedestal that accommodates a plurality of substrates in a predetermined receiving position along the arrangement direction, and can be moved back and forth with respect to the pedestal A transfer arm that is movably provided along a direction, receives the substrate at each receiving position of the cradle, and transports the substrate to the outside of the cradle; and a control unit that controls the transport arm The transport arm is provided with a substrate detection mechanism for detecting whether or not the substrate is present on the transport arm, and the control unit controls the transport arm to control the transport arm. Based on a detection signal from the substrate detection mechanism, it is determined whether the substrate exists at one receiving position corresponding to the detection position, and the substrate does not exist at the receiving position. If it is determined that, through the receiving position along the conveying arm in the arrangement direction and moving to the next detection position.

  A substrate detection method according to an embodiment of the present invention is a substrate detection method for detecting a substrate using a substrate processing apparatus, wherein the substrate processing apparatus accommodates a plurality of substrates in a predetermined receiving position along the arrangement direction. A pedestal that is capable of moving forward and backward with respect to the pedestal and movable in the arrangement direction, and receives the substrate at each receiving position of the cradle, and moves the substrate to the outside of the cradle. A substrate detection mechanism for detecting whether or not the substrate is present on the transfer arm. The substrate detection method includes: A step of moving to a detection position; a step of determining whether the substrate is present at one receiving position corresponding to the detection position based on a detection signal from the substrate detection mechanism; If the substrate is determined not to exist, through the receiving position along the conveying arm in the array direction, characterized in that a step of moving to the next detection position.

  A storage medium according to an embodiment of the present invention is a storage medium storing a computer program for executing a substrate detection method for detecting a substrate using a substrate processing apparatus, wherein the substrate processing apparatus arranges a plurality of substrates. A pedestal that is accommodated in a predetermined receiving position along each direction, and can be moved forward and backward with respect to the pedestal and movable along the arrangement direction, and receives the substrate at each receiving position of the pedestal. And a transfer arm that transfers the substrate to the outside of the pedestal, and the transfer arm is provided with a substrate detection mechanism that detects whether or not the substrate exists on the transfer arm, The substrate detection method includes a step of moving the transfer arm to one detection position and a reception position corresponding to the detection position based on a detection signal from the substrate detection mechanism. A step of determining whether or not the substrate exists, and if it is determined that the substrate does not exist at the receiving position, the transport arm is moved along the arrangement direction to the next detection position through the receiving position. And a process.

  According to the present invention, the time required for the substrate recovery operation can be shortened.

FIG. 1 is a plan view showing an overall configuration of a substrate processing apparatus according to an embodiment of the present invention. FIG. 2 is a perspective view showing a transport mechanism and a table of the substrate processing apparatus according to the embodiment of the present invention. FIG. 3 is a schematic diagram illustrating a substrate detection method according to an embodiment of the present invention. FIG. 4 is a schematic view showing a modification of the substrate processing apparatus.

  Hereinafter, an embodiment of the present invention will be described with reference to FIGS.

  FIG. 1 is a plan view showing a schematic configuration of a substrate processing apparatus according to an embodiment of the present invention.

  As shown in FIG. 1, a substrate processing apparatus (liquid processing apparatus) 10 carries a wafer carrier C that houses a plurality of wafers W (substrates to be processed), and carries in / out the wafers W. An exit station (substrate loading / unloading section) 16 and a processing station (liquid processing section) 18 for performing a cleaning process on the wafer W are provided, and these are provided adjacent to each other.

  Among these, the loading / unloading station 16 includes a carrier mounting unit 11 that mounts a wafer carrier C that stores a plurality of wafers W in a horizontal state, a transfer unit 12 that transfers the wafer W, and a transfer that transfers the wafer W. Part 13 and housing 14 in which transport part 12 and delivery part 13 are accommodated.

  Four wafer carriers C can be placed on the carrier placing portion 11, and the placed wafer carriers C are brought into close contact with the vertical wall portion of the housing 14, and are not exposed to the atmosphere. The wafer W can be loaded into the transfer unit 12.

  The transfer unit 12 includes a first transfer mechanism 30 (hereinafter simply referred to as a transfer mechanism 30), and the transfer mechanism 30 includes a first wafer transfer arm 31 (hereinafter simply referred to as a wafer transfer arm 31) that holds the wafer W. Have). Further, the transfer mechanism 30 has a mechanism for moving the wafer transfer arm 31 back and forth (in the X direction), a mechanism for moving along the horizontal guide 17 extending in the Y direction, which is the arrangement direction of the wafer carriers C, and a vertical direction. It has a mechanism for moving and a mechanism for rotating in a horizontal plane. The wafer W is transferred between the wafer carrier C and the transfer unit 13 by the transfer mechanism 30.

  The delivery unit 13 includes a mounting table 40 having a plurality of mounting units (slots) on which the wafer W provided thereon can be mounted. Then, the wafer W is transferred. A plurality of cradle 40 may be provided. In this case, a plurality of cradle 40 may be stacked in the vertical direction. The detailed configuration of the transport mechanism 30 and the table 40 will be described later.

  The processing station 18 has a rectangular parallelepiped casing 21, and in the casing 21, a conveyance path extending along the X direction orthogonal to the Y direction that is the arrangement direction of the wafer carriers C is formed in the upper center of the casing 21. It has a transfer chamber 21a and two unit chambers 21b and 21c provided on both sides of the transfer chamber 21a. In the unit chambers 21b and 21c, a total of twelve processing units 22 are arranged horizontally along the transfer chamber 21a.

  A second transfer mechanism 60 (hereinafter simply referred to as the transfer mechanism 60) is provided inside the transfer chamber 21a. The transfer mechanism 60 includes a second wafer transfer arm 61 (hereinafter simply referred to as a wafer transfer arm 61) that holds the wafer W, and is provided in a transfer chamber 21a that moves the wafer transfer arm 61 back and forth. And a mechanism for moving in the X direction along the horizontal guide 25 (see FIG. 1), a mechanism for moving in the vertical direction, and a mechanism for rotating in the horizontal plane. With this transfer mechanism 60, the wafer W is carried into and out of each processing unit 22.

  For example, the processing unit 22 holds a wafer W on a spin chuck and supplies a processing liquid to the front surface or front and back surfaces of the wafer W while the wafer W is rotated to perform processing. It may consist of units.

  The substrate processing apparatus 10 includes a control unit (controller) 80 that controls the overall operation of the substrate processing apparatus 10. The control unit 80 controls the operation of all functional components of the substrate processing apparatus 10. The control unit 80 can be realized by, for example, a (general-purpose) computer as hardware and a program (such as an apparatus control program and a processing recipe) for operating the computer as software. The software is stored in a storage medium such as a hard disk drive that is fixedly provided in the computer, or is stored in a storage medium that is detachably set in the computer such as a CD-ROM, DVD, or flash memory. Such a storage medium is indicated by reference numeral 81.

  Next, with reference to FIG. 2, the structure of the conveyance mechanism 30 and the stand 40 is further demonstrated.

As shown in FIG. 2, the cradle 40 is provided in the housing 41 and the housing 41, and each wafer W is placed in a predetermined receiving position P _{1 to} P along the vertical direction (Z direction) that is the arrangement direction. ₁₀ have a plurality of slots (mounting portions) 42a to 42j. Among these, the housing 41 is provided to face the first opening 41 a through which the wafer transfer arm 31 of the transfer mechanism 30 moving in the front-rear direction (X direction) passes and the first opening 41 a. And a second opening 41b through which the wafer transfer arm 61 (see FIG. 1) passes.

Further, the slots 42 a to 42 j are arranged at equal intervals in the housing 41 along the vertical direction (Z direction) that is the arrangement direction of the wafers W. These slots 42 a to 42 j correspond to receiving positions P _{1 to} P ₁₀ , which are positions where the wafer transfer arm 31 receives the wafer W from the placing table 40, respectively. For example, the slot 42a located lowermost is a slot for accommodating the wafer W to the receive position P _1, the slot 42j located uppermost is a slot for accommodating the wafer W to the receive position P _10. In FIG. 2, ten slots 42a to 42j are shown, but actually, for example, 20 to 50 slots may be provided.

  On the other hand, the transport mechanism 30 is disposed on the transport base 32, the wafer transport arm 32, which is disposed on the transport base 32 and can be advanced and retracted in the front-rear direction (X direction) with respect to the transport base 32. The drive unit 33 is connected to move the conveyance base 32 in the left-right direction (Y direction), the up-down direction (Z direction), and the rotation direction (θ direction).

Among these, the wafer transfer arm 31 has a substantially U-shaped plane, and has a placement surface 31 a on which the wafer W is placed. The wafer transfer arm 31 enters the cradle 40 from the first opening 41a in a state where the wafer W is placed on the placement surface 31a, and moves to the receiving positions P _{1 to} P ₁₀ of the cradle 40 at the receiving positions P _{1 to} P _10. Is placed.

The wafer transfer arm 31 enters the cradle 40 from the first opening 41a in a state where the wafer W is not placed on the placement surface 31a, and receives each of the receiving positions P _{1 to} P _{10 of the} cradle 40. It is also possible to receive the wafer W on the substrate and transfer the received wafer W to the outside of the table 40 (for example, another table not shown). Although one wafer transfer arm 31 is shown in FIG. 2, the transfer mechanism 30 may have a plurality of (for example, two) wafer transfer arms 31 that can move independently of each other.

  The wafer transfer arm 31 is provided with a suction mechanism 50 for sucking the wafer W. The suction mechanism 50 includes a plurality of (for example, four) suction holes 51 formed on the mounting surface 31 a of the wafer transfer arm 31, and a suction passage 52 formed inside the wafer transfer arm 31 and communicating with the suction holes 51. have. Further, the suction mechanism 50 can detect the suction pressure by the suction pipe 53 connected to the suction passage 52, the valve 55 for turning on / off the vacuum suction from the vacuum pump 54, and the suction mechanism 50, and transmit this as a detection signal. A pressure gauge (suction pressure detection mechanism) 56. The suction pipe 53 is connected to a vacuum pump 54 that is a suction source.

  In this case, when the vacuum pump 54 is operated, air is sucked from the suction hole 51 through the suction pipe 53 and the suction passage 52, and thereby the wafer W can be vacuum-sucked through the wafer transfer arm 31. Thereby, it is possible to prevent the wafer W from dropping while the wafer transfer arm 31 is being transferred.

  Further, the above-described valve 55 and pressure gauge 56 are arranged in the middle of the suction pipe 53. The vacuum pump 54, the valve 55, and the pressure gauge 56 are each connected to the control unit 80, and the control unit 80 can control the valve 55.

  By the way, in the present embodiment, the suction mechanism 50 serves not only to vacuum-suck the wafer W but also to detect whether the wafer W exists on the wafer transfer arm 31.

  Specifically, when the wafer W is not placed on the wafer transfer arm 31, the vacuum pump 54 is operated and the valve 55 is opened, whereby air is sucked from the suction hole 51, and the pressure gauge 56 The value is a substantially constant suction pressure (negative pressure). On the other hand, when the wafer W is placed on the wafer transfer arm 31, when the vacuum pump 54 is activated and the valve 55 is opened, the suction hole 51 is closed, so that the value of the pressure gauge 56 Becomes a value (negative pressure) smaller than the suction pressure. Therefore, if the suction pressure (negative pressure) detected by the pressure gauge 56 is greater than a predetermined threshold, the control unit 80 determines that the wafer W is not placed on the wafer transfer arm 31, and the pressure gauge 56 If the detected suction pressure (negative pressure) is smaller than a predetermined threshold value, it can be determined that the wafer W is placed on the wafer transfer arm 31. Thus, the pressure gauge 56 according to the present embodiment also serves as a substrate detection mechanism.

  Next, the effect | action of this Embodiment which consists of such a structure is demonstrated with reference to FIG. 2 and FIG. 3 (a)-(f).

  Specifically, for example, an operation (substrate detection method) during a recovery operation for recovering the wafer W remaining in the placing table 40 immediately after the substrate processing apparatus 10 is initialized, such as when the power is turned on, will be described. In the following, the transport mechanism 30 and the suction mechanism 50 of the substrate processing apparatus 10 are driven and controlled according to a program recorded in the storage medium 81 of the control unit 80.

First, a front of the wafer transfer arm 31 stand 40 (X-direction negative side), to move in front of the receiving position P ₁ (see Figure 3 (a)). Further, when the vacuum pump 54 of the suction mechanism 50 is activated and the valve 55 is opened, air is sucked from the suction hole 51 through the suction pipe 53 and the suction passage 52. At this time, since the wafer W is not placed on the wafer transfer arm 31, the value of the pressure gauge 56 becomes a substantially constant suction pressure (negative pressure) larger than a predetermined threshold value.

Next, the wafer transfer arm 31 moves forward (moves to the plus side in the X direction) with respect to the table 40 and enters the table 40. Subsequently, the wafer transfer arm 31 moves to the receiving position P ₁ (detection position) of the table 40 (see FIG. 3B). In this case, the detection position where the wafer W is detected whether the receiving position P ₁ corresponds to the receiving position P _1.

Next, the control unit 80 determines whether the wafer W to the receive position P ₁ of the cradle 40 is present. That is, the control unit 80, the wafer W on the wafer transfer arm 31 in the receiving position P ₁ determines whether or not it is placed.

Specifically, in a state where the wafer transfer arm 31 is in the receiving position P _1, the pressure gauge (substrate detection mechanism) 56 detects the suction pressure by the suction mechanism 50, transmission to the control unit 80 so as detection signal To do. At this time, the controller 80 determines that the wafer W is not placed on the wafer transfer arm 31 if the suction pressure (detection signal) is larger than a predetermined threshold value. On the other hand, if the suction pressure (detection signal) is smaller than a predetermined threshold value, it is determined that the wafer W is placed on the wafer transfer arm 31.

In FIG. 3 (b), since the receiving position P ₁ is not the wafer W is present, the suction pressure detected by the pressure gauge 56 is greater than a predetermined threshold value. Accordingly, the control unit 80 determines that the wafer W to the receive position P ₁ of the stand 40 is not present.

Subsequently, the wafer transfer arm 31 is raised in the Z-direction positive side, passes through the receiving position P _1, the cradle 40 receives directly from the receiving position P ₁ without leaving the outer position P ₂ to the _(detection position) (See FIG. 3C). In this case, the detection position where the wafer W is detected whether the receiving position P ₂ coincides with the receiving position P _2.

Next, the control unit 80 determines whether the wafer W is present in the receiving position P _2. The method for the control unit 80 determines whether the wafer W is present in receiving position P ₂ are the same as above.

In FIG. 3 (c), the wafer W is not present in the receiving position _{P 2.} Therefore, the wafer transfer arm 31 further rises, and passes through the receive position P _2, moves from the receiving position P ₂ without leaving the stand 40 outwardly directly receive position P _{3 (detection} position) (Fig. 3 (d)). In this case, the detection position where the wafer W is detected whether the receiving position P ₃ corresponds to the receive position P _3.

Next, the control unit 80 determines whether the wafer W to the receive position P ₃ in the same manner as described above are present.

In FIG. 3 (d), the wafer W is present in the receiving position _{P 3.} In this case, the mounting surface 31a of the wafer transfer arm 31 in the receiving position P ₃ is in close contact with the rear surface of the wafer W. For this reason, all the suction holes 51 formed in the wafer transfer arm 31 are closed, and the suction pressure detected by the pressure gauge 56 becomes smaller than a predetermined threshold value. Accordingly, the control unit 80 determines that the wafer W is present in the receiving position P ₃ of the stand 40.

Then, the wafer transfer arm 31 receives the wafer W receiving position _{P 3.} That is, the wafer W is placed on the placement surface 31 a of the wafer transfer arm 31, and the wafer W is sucked by the suction hole 51. The wafer transfer arm 31 is in the state that the wafer W is mounted on the mounting surface 31a, after rising to above the drawn-out position of the receiving position P _3, stop the rise. Then, it moves backward (moves to the X direction minus side) with respect to the cradle 40 and moves outward of the cradle 40 (see FIG. 3E). Subsequently, the wafer transfer arm 31 transfers the received wafer W to a wafer carrier for storing the wafer W remaining in the substrate processing apparatus 10.

Subsequently, the wafer transfer arm 31 moves again in front of the placing table 40 (X direction minus side). Next, the wafer transfer arm 31 moves forward (moves to the X direction plus side) with respect to the placing table 40 and reaches the receiving position P ₄ (detection position) (see FIG. 3F). In this case, since it has been found that the wafer W does not exist at the receiving positions P _{1 to} P ₃ , the wafer transfer arm 31 moves directly to the receiving position P ₄ , thereby reducing the time required for the wafer W recovery operation. It can be shortened.

In this way, the control unit 80 determines whether or not the wafer W exists at each of the receiving positions P _{4 to} P ₁₀ while sequentially moving the wafer transfer arm 31 to the receiving positions P _{4 to} P ₁₀ (detection positions). to decide. When determining that the wafer W does not exist at each of the receiving positions P _{4 to} P ₉ , the control unit 80 moves the wafer transfer arm 31 directly to the next receiving position P _{5 to} P ₁₀ (detection position). The control unit 80, when the wafer W is determined to not exist in the last receiving position P _10, moved to the outside of the cradle 40 and the wafer transfer arm 31, the recovery operation of a series of wafer W is completed.

On the other hand, when it is determined that the wafer W exists at each of the receiving positions P _{4 to} P ₁₀ , the control unit 80 controls the wafer transfer arm 31 to receive the wafer W at each of the receiving positions P _{4 to} P _10. The wafer W is transferred to the outside of the placing table 40.

In the above description, when the wafer transfer arm 31 reaches the receiving positions P _{1 to} P ₁₀ (detection positions), the control unit 80 moves the wafer transfer arm 31 to the receiving positions P _{1 to} P ₁₀ (detection positions). It is temporarily stopped each time, and it is determined whether or not a wafer W exists at each of the receiving positions P _{1 to} P ₁₀ . In this case, the detection accuracy of the wafer W can be further improved. Alternatively, while continuously moving the wafer transfer arm 31 from the reception position P ₁ (detection position) to the reception position P ₁₀ (detection position), it is determined whether or not the wafer W exists at each of the reception positions P _{1 to} P _10. You may judge. In this case, the time required for the wafer W recovery operation can be shortened.

As described above, according to the present embodiment, the control unit 80 controls the wafer transfer arm 31 to place the wafer transfer arm 31 at the receiving positions P _{1 to} P ₉ (detection positions) of the pedestal 40. When the wafer W is moved and it is determined whether or not the wafer W exists at the receiving positions P _{1 to} P ₉ based on the detection signal from the pressure gauge 56, and it is determined that the wafer W does not exist at the receiving positions P _{1 to} P ₉ Then, the wafer transfer arm 31 is directly moved to the next receiving position P _{2 to} P ₁₀ (detection position). On the other hand, when it is determined that the wafer W exists at the receiving positions P _{1 to} P ₁₀ based on the detection signal from the pressure gauge 56, the control unit 80 controls the wafer transfer arm 31 to control the receiving positions P _{1 to} P. _The wafer W is received at ₁₀ and the wafer W is transferred to the outside of the placing table 40.

As a result, it can be confirmed in a short time whether or not the wafer W exists in the table 40, and the time required for the wafer W recovery operation can be shortened. On the other hand, as a comparative example, is provided to the wafer W to confirm whether or not present in the setting table 40, the wafer transfer arm 31, the cradle 40 outwardly and each receive position P ₁ to P ₁₀ Sensor When the wafer W is reciprocated a plurality of times, the time required for the wafer W recovery operation becomes long.

  Further, according to the present embodiment, since the presence / absence of the wafer W can be detected without newly attaching a detection mechanism for detecting the wafer W to the placing table 40, an increase in cost of the substrate processing apparatus 10 can be suppressed. it can.

  In the above embodiment, the case where the pressure gauge (suction pressure detection mechanism) 56 for detecting the suction pressure is used as the substrate detection mechanism has been described as an example. However, the present invention is not limited to this, and a mechanism for mechanically or optically detecting the wafer W such as a sensor may be used as the substrate detection mechanism.

  In the above embodiment, the case where the wafer transfer arm 31 of the transfer mechanism 30 detects the wafer W remaining in the placing table 40 has been described as an example. However, the present invention is not limited to this, and the wafer transfer arm 61 (see FIG. 1) replaces the wafer transfer arm 31 or together with the wafer transfer arm 31 to detect the wafer W remaining in the table 40 using the same method. You may do it.

  For example, as shown in FIG. 4, a plurality of pedestals 40 are stacked in the vertical direction, and a wafer W left in one cradle 40 is detected using a wafer transfer arm 31 of the transfer mechanism 30 and transferred. The wafer W remaining in the other table 40 may be detected using the wafer transfer arm 61 of the mechanism 60. In this case, the time required for the wafer W recovery operation can be further reduced by detecting the wafer W using the plurality of wafer transfer arms 31 and 61.

Further, in the above embodiment, the case where the detection position where the wafer transfer arm 31 detects the wafer W and the receiving positions P _{1 to} P _{10 of} the wafer W coincide with each other has been described as an example. However, the present invention is not limited to this, and the detection position for detecting the wafer W may be a position different from the receiving positions P _{1 to} P ₁₀ for the wafer W. For example, when an optical sensor is used as the substrate detection mechanism, the detection position for detecting the wafer W may be located below the receiving positions P _{1 to} P _{10 for the} wafer W.

  Furthermore, in the above embodiment, the case where the arrangement direction of the wafers W in the cradle 40 is the vertical direction (Z direction) has been described as an example. However, the present invention is not limited to this, and the arrangement direction of the wafers W may be a horizontal direction.

DESCRIPTION OF SYMBOLS 10 Substrate processing apparatus 30 Transfer mechanism 31 Wafer transfer arm 32 Transfer base 40 Placement base 41 Housing 42a-42j Slot 50 Suction mechanism 51 Suction hole 52 Suction passage 53 Suction pipe 54 Vacuum pump 55 Valve 56 Pressure gauge 60 Transfer mechanism 61 Wafer Transfer arm 80 Control unit 81 Storage medium

Claims (11)

In substrate processing equipment,
A cradle for accommodating a plurality of substrates in a predetermined receiving position along the arrangement direction;
Transport that is movable with respect to the cradle and movable along the arrangement direction, receives the substrate at each receiving position of the cradle, and transports the substrate to the outside of the cradle. Arm,
A control unit for controlling the transfer arm,
A substrate detection mechanism for detecting whether or not the substrate exists on the transfer arm is provided in the transfer arm,
The control unit controls the transport arm to move the transport arm to one detection position, and based on a detection signal from the substrate detection mechanism, the substrate is moved to one receiving position corresponding to the detection position. When the substrate is not present at the receiving position, the transfer arm is moved along the arrangement direction to the next detection position through the receiving position. Substrate processing apparatus.   When the control unit determines that the substrate is present at the one receiving position based on a detection signal from the substrate detection mechanism, the control unit controls the transfer arm to receive the substrate at the receiving position, and The substrate processing apparatus according to claim 1, wherein the substrate is transferred to the outside of the table.   The transfer arm is provided with a suction mechanism for sucking the substrate, and the substrate detection mechanism detects whether the substrate exists on the transfer arm by detecting a suction pressure by the suction mechanism. The substrate processing apparatus according to claim 1, wherein:   The substrate processing apparatus according to claim 1, wherein a plurality of the table are provided, and the plurality of tables are stacked in a vertical direction.   5. The substrate processing apparatus according to claim 1, wherein the control unit temporarily stops the transfer arm when the transfer arm reaches each detection position. 6. In a substrate detection method for detecting a substrate using a substrate processing apparatus,
The substrate processing apparatus includes:
A cradle for accommodating a plurality of substrates in a predetermined receiving position along the arrangement direction;
Transport that is movable with respect to the cradle and movable along the arrangement direction, receives the substrate at each receiving position of the cradle, and transports the substrate to the outside of the cradle. With arm,
A substrate detection mechanism for detecting whether or not the substrate exists on the transfer arm is provided in the transfer arm,
The substrate detection method includes:
Moving the transfer arm to one detection position;
Determining whether the substrate is present at one receiving position corresponding to the detection position based on a detection signal from the substrate detection mechanism;
And a step of moving the transfer arm through the receiving position along the arrangement direction to the next detecting position when it is determined that the substrate does not exist at the receiving position. Method.   When it is determined that the substrate is present at the one receiving position, the transport arm further includes a step of receiving the substrate at the receiving position and transporting the substrate to the outside of the table. The substrate detection method according to claim 6.   The transfer arm is provided with a suction mechanism for sucking the substrate, and the substrate detection mechanism detects whether the substrate exists on the transfer arm by detecting a suction pressure by the suction mechanism. The substrate detection method according to claim 6 or 7.   The substrate detection method according to claim 6, wherein a plurality of the table are provided, and the plurality of tables are stacked in a vertical direction.   10. The substrate detection method according to claim 6, wherein the transfer arm temporarily stops when reaching each detection position. 11. In a storage medium storing a computer program for executing a substrate detection method for detecting a substrate using a substrate processing apparatus,
The substrate processing apparatus includes:
A cradle for accommodating a plurality of substrates in a predetermined receiving position along the arrangement direction;
Transport that is movable with respect to the cradle and movable along the arrangement direction, receives the substrate at each receiving position of the cradle, and transports the substrate to the outside of the cradle. With arm,
A substrate detection mechanism for detecting whether or not the substrate exists on the transfer arm is provided in the transfer arm,
The substrate detection method includes:
Moving the transfer arm to one detection position;
Determining whether the substrate is present at one receiving position corresponding to the detection position based on a detection signal from the substrate detection mechanism;
And a step of moving the transfer arm to the next detection position through the receiving position along the arrangement direction when it is determined that the substrate does not exist at the receiving position. .