JP2014141597A - Triazine ring containing polymer and composition for film formation containing the same - Google Patents
Triazine ring containing polymer and composition for film formation containing the same Download PDFInfo
- Publication number
- JP2014141597A JP2014141597A JP2013011441A JP2013011441A JP2014141597A JP 2014141597 A JP2014141597 A JP 2014141597A JP 2013011441 A JP2013011441 A JP 2013011441A JP 2013011441 A JP2013011441 A JP 2013011441A JP 2014141597 A JP2014141597 A JP 2014141597A
- Authority
- JP
- Japan
- Prior art keywords
- group
- triazine ring
- compound
- film
- hyperbranched polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 title claims abstract description 57
- 229920000642 polymer Polymers 0.000 title claims abstract description 54
- 239000000203 mixture Substances 0.000 title claims abstract description 31
- 230000015572 biosynthetic process Effects 0.000 title claims abstract description 29
- 229920000587 hyperbranched polymer Polymers 0.000 claims abstract description 52
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 13
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 11
- 125000002723 alicyclic group Chemical group 0.000 claims abstract description 9
- 125000003118 aryl group Chemical group 0.000 claims abstract description 9
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 8
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 6
- 125000003710 aryl alkyl group Chemical group 0.000 claims abstract description 5
- -1 diamine compound Chemical class 0.000 claims description 150
- 150000001875 compounds Chemical class 0.000 claims description 50
- 238000003786 synthesis reaction Methods 0.000 claims description 22
- 239000003431 cross linking reagent Substances 0.000 claims description 15
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 15
- 230000003287 optical effect Effects 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- 239000012948 isocyanate Substances 0.000 claims description 5
- 239000002994 raw material Substances 0.000 claims description 5
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 4
- 239000012528 membrane Substances 0.000 claims description 3
- 229920005989 resin Polymers 0.000 abstract description 12
- 239000011347 resin Substances 0.000 abstract description 12
- 238000010438 heat treatment Methods 0.000 abstract description 9
- 238000004383 yellowing Methods 0.000 abstract description 2
- 230000014759 maintenance of location Effects 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 37
- 239000010408 film Substances 0.000 description 37
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 30
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 26
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 24
- 239000002904 solvent Substances 0.000 description 24
- 238000000034 method Methods 0.000 description 22
- 239000000243 solution Substances 0.000 description 19
- 239000000126 substance Substances 0.000 description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 150000004820 halides Chemical class 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 13
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 12
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 12
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- 239000000463 material Substances 0.000 description 12
- 229910052757 nitrogen Inorganic materials 0.000 description 12
- 229920000647 polyepoxide Polymers 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 11
- 229920001187 thermosetting polymer Polymers 0.000 description 11
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 description 10
- 238000004132 cross linking Methods 0.000 description 10
- 150000004985 diamines Chemical class 0.000 description 10
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 9
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 8
- 239000004793 Polystyrene Substances 0.000 description 8
- XMSVKICKONKVNM-UHFFFAOYSA-N bicyclo[2.2.1]heptane-3,4-diamine Chemical compound C1CC2(N)C(N)CC1C2 XMSVKICKONKVNM-UHFFFAOYSA-N 0.000 description 8
- 239000003822 epoxy resin Substances 0.000 description 8
- 238000005227 gel permeation chromatography Methods 0.000 description 8
- 239000010409 thin film Substances 0.000 description 8
- 238000000411 transmission spectrum Methods 0.000 description 8
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 229920002223 polystyrene Polymers 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 230000004580 weight loss Effects 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000005401 electroluminescence Methods 0.000 description 6
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 5
- MGNCLNQXLYJVJD-UHFFFAOYSA-N cyanuric chloride Chemical compound ClC1=NC(Cl)=NC(Cl)=N1 MGNCLNQXLYJVJD-UHFFFAOYSA-N 0.000 description 5
- 239000000706 filtrate Substances 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- 229920001223 polyethylene glycol Polymers 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 239000002244 precipitate Substances 0.000 description 5
- 125000001424 substituent group Chemical group 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- MXZROAOUCUVNHX-UHFFFAOYSA-N 2-Aminopropanol Chemical compound CCC(N)O MXZROAOUCUVNHX-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- 229920000877 Melamine resin Polymers 0.000 description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 4
- 239000002202 Polyethylene glycol Substances 0.000 description 4
- 238000007259 addition reaction Methods 0.000 description 4
- 125000003277 amino group Chemical group 0.000 description 4
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 239000013065 commercial product Substances 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 125000003566 oxetanyl group Chemical group 0.000 description 4
- 229920001568 phenolic resin Polymers 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 238000000391 spectroscopic ellipsometry Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- MSXVEPNJUHWQHW-UHFFFAOYSA-N 2-methylbutan-2-ol Chemical compound CCC(C)(C)O MSXVEPNJUHWQHW-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical class C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 3
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- XPFVYQJUAUNWIW-UHFFFAOYSA-N furfuryl alcohol Chemical compound OCC1=CC=CO1 XPFVYQJUAUNWIW-UHFFFAOYSA-N 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000007870 radical polymerization initiator Substances 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 2
- BBMCTIGTTCKYKF-UHFFFAOYSA-N 1-heptanol Chemical compound CCCCCCCO BBMCTIGTTCKYKF-UHFFFAOYSA-N 0.000 description 2
- PAMIQIKDUOTOBW-UHFFFAOYSA-N 1-methylpiperidine Chemical compound CN1CCCCC1 PAMIQIKDUOTOBW-UHFFFAOYSA-N 0.000 description 2
- KUMMBDBTERQYCG-UHFFFAOYSA-N 2,6-bis(hydroxymethyl)-4-methylphenol Chemical compound CC1=CC(CO)=C(O)C(CO)=C1 KUMMBDBTERQYCG-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- PFNHSEQQEPMLNI-UHFFFAOYSA-N 2-methyl-1-pentanol Chemical compound CCCC(C)CO PFNHSEQQEPMLNI-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- SYBYTAAJFKOIEJ-UHFFFAOYSA-N 3-Methylbutan-2-one Chemical compound CC(C)C(C)=O SYBYTAAJFKOIEJ-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 2
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- 239000004640 Melamine resin Substances 0.000 description 2
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 229920001214 Polysorbate 60 Polymers 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 239000004147 Sorbitan trioleate Substances 0.000 description 2
- PRXRUNOAOLTIEF-ADSICKODSA-N Sorbitan trioleate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OC[C@@H](OC(=O)CCCCCCC\C=C/CCCCCCCC)[C@H]1OC[C@H](O)[C@H]1OC(=O)CCCCCCC\C=C/CCCCCCCC PRXRUNOAOLTIEF-ADSICKODSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical class C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 2
- 229920001807 Urea-formaldehyde Polymers 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 125000004018 acid anhydride group Chemical group 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 2
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 2
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 239000002981 blocking agent Substances 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- XJHCXCQVJFPJIK-UHFFFAOYSA-M caesium fluoride Chemical compound [F-].[Cs+] XJHCXCQVJFPJIK-UHFFFAOYSA-M 0.000 description 2
- 239000004202 carbamide Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- VEZUQRBDRNJBJY-UHFFFAOYSA-N cyclohexanone oxime Chemical compound ON=C1CCCCC1 VEZUQRBDRNJBJY-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 2
- 239000005038 ethylene vinyl acetate Substances 0.000 description 2
- 229920006244 ethylene-ethyl acrylate Polymers 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
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- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
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- 229920005749 polyurethane resin Polymers 0.000 description 1
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- 235000011056 potassium acetate Nutrition 0.000 description 1
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- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
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- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
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- 239000013558 reference substance Substances 0.000 description 1
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- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
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Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
本発明は、トリアジン環含有重合体およびそれを含む膜形成用組成物に関し、さらに詳述すると、トリアジン環含有ハイパーブランチポリマーおよびそれを含む膜形成用組成物に関する。 The present invention relates to a triazine ring-containing polymer and a film-forming composition containing the same, and more particularly to a triazine ring-containing hyperbranched polymer and a film-forming composition containing the same.
これまで高分子化合物を高機能化する試みが種々行われてきている。例えば、高分子化合物を高屈折率化する方法として、芳香族環、ハロゲン原子、硫黄原子を導入することがなされている。中でも、硫黄原子を導入したエピスルフィド高分子化合物およびチオウレタン高分子化合物は、眼鏡用高屈折率レンズとして実用化されている。 Various attempts have been made to improve the functionality of polymer compounds. For example, as a method for increasing the refractive index of a polymer compound, an aromatic ring, a halogen atom, or a sulfur atom is introduced. Among these, episulfide polymer compounds and thiourethane polymer compounds into which sulfur atoms are introduced have been put to practical use as high-refractive-index lenses for spectacles.
また、高分子化合物のさらなる高屈折率化を達成し得る最も有力な方法として、無機の金属酸化物を用いる方法が知られている。 In addition, a method using an inorganic metal oxide is known as the most effective method capable of achieving a higher refractive index of a polymer compound.
例えば、シロキサンポリマーと、ジルコニアまたはチタニアなどを分散させた微粒子分散材料とを混合してなるハイブリッド材料を用いて屈折率を高める手法(特許文献1)が報告されている。 For example, a technique (Patent Document 1) has been reported in which a refractive index is increased by using a hybrid material obtained by mixing a siloxane polymer and a fine particle dispersed material in which zirconia or titania is dispersed.
さらに、シロキサンポリマーの一部に高屈折率な縮合環状骨格を導入する手法(特許文献2)なども報告されている。 Furthermore, a method of introducing a condensed cyclic skeleton having a high refractive index into a part of the siloxane polymer (Patent Document 2) has also been reported.
また、高分子化合物に耐熱性を付与するための試みも数多くなされており、具体的には、芳香族環を導入することで、高分子化合物の耐熱性を向上し得ることがよく知られている。例えば、置換アリーレン繰り返し単位を主鎖に有するポリアリーレンコポリマーが報告され(特許文献3)、この高分子化合物は主として耐熱性プラスチックへの応用が期待されている。 There have also been many attempts to impart heat resistance to polymer compounds. Specifically, it is well known that the heat resistance of polymer compounds can be improved by introducing an aromatic ring. Yes. For example, a polyarylene copolymer having a substituted arylene repeating unit in the main chain has been reported (Patent Document 3), and this polymer compound is expected to be applied mainly to heat-resistant plastics.
一方、メラミン樹脂は、トリアジン系の樹脂としてよく知られているが、黒鉛などの耐熱性材料に比べて遥かに分解温度が低い。 On the other hand, melamine resin is well known as a triazine resin, but its decomposition temperature is much lower than that of heat-resistant materials such as graphite.
これまで炭素および窒素からなる耐熱性有機材料としては、芳香族ポリイミドや芳香族ポリアミドが主として用いられているが、これらの材料は直鎖構造を有しているため耐熱温度はそれほど高くない。 Up to now, aromatic polyimides and aromatic polyamides have been mainly used as heat-resistant organic materials composed of carbon and nitrogen. However, these materials have a linear structure, so that the heat-resistant temperature is not so high.
また、耐熱性を有する含窒素高分子材料としてトリアジン系縮合材料も報告されている(特許文献4)。 A triazine-based condensation material has also been reported as a nitrogen-containing polymer material having heat resistance (Patent Document 4).
ところで、近年、液晶ディスプレイ、有機エレクトロルミネッセンス(EL)ディスプレイ、光半導体(LED)素子、固体撮像素子、有機薄膜太陽電池、色素増感太陽電池、および有機薄膜トランジスタ(TFT)等の電子デバイスを開発する際に、高機能な高分子材料が要求されるようになってきた。 Recently, electronic devices such as liquid crystal displays, organic electroluminescence (EL) displays, optical semiconductor (LED) elements, solid-state imaging elements, organic thin film solar cells, dye-sensitized solar cells, and organic thin film transistors (TFTs) have been developed. At the same time, high-performance polymer materials have been required.
求められる具体的な特性としては、1)耐熱性、2)透明性、3)高屈折率、4)耐光性、5)高溶解性、6)低体積収縮率がある。特に光学材料においては、光による劣化が問題となるため、耐光性の向上が求められている。耐光性を高めるために紫外線吸収剤などの添加や安定ラジカルを有する官能基の導入による劣化防止などが検討されているが、高分子化合物そのものが高い耐光性を有している例は少ない。 Specific characteristics required include 1) heat resistance, 2) transparency, 3) high refractive index, 4) light resistance, 5) high solubility, and 6) low volume shrinkage. In particular, optical materials are required to be improved in light resistance because deterioration due to light becomes a problem. In order to enhance light resistance, the prevention of deterioration by addition of an ultraviolet absorber or the introduction of a functional group having a stable radical has been studied, but there are few examples in which the polymer compound itself has high light resistance.
本発明者らは、トリアジン環および脂環構造を有する繰り返し単位を含むハイパーブランチポリマーが、ポリマー単独で高耐熱性、高透明性、高屈折率、高溶解性、低体積収縮率を達成できるのみならず、耐光性にも優れており、電子デバイスや光学部材を作製する際の膜形成用組成物として用い得ることを既に見出している(特許文献5)。 The inventors of the present invention can only achieve high heat resistance, high transparency, high refractive index, high solubility, and low volume shrinkage by using a hyperbranched polymer containing a repeating unit having a triazine ring and an alicyclic structure. In addition, it has also been found that it is excellent in light resistance and can be used as a film-forming composition for producing an electronic device or an optical member (Patent Document 5).
しかしながら、上記発明ではクラック限界のため1000nm以下の薄膜しか得ることができず、また透明樹脂としての重要な要素である耐熱性(耐熱透明性:加熱後、黄変等がなく優れた透明性を維持していること。)に関して何ら議論がなされていない。そこで本発明では1000nm以上の厚膜の作製が可能であり、耐熱性(耐熱透明性)に優れたトリアジン環含有重合体、およびこれを含む膜形成用組成物を提供することを目的とする。 However, in the above invention, only a thin film having a thickness of 1000 nm or less can be obtained due to a crack limit, and heat resistance (heat resistant transparency: no transparency after heating, excellent transparency) There is no debate over what is being maintained.) Accordingly, an object of the present invention is to provide a triazine ring-containing polymer that is capable of producing a thick film having a thickness of 1000 nm or more and is excellent in heat resistance (heat-resistant transparency), and a film-forming composition containing the same.
本発明者らは、上記目的を達成するために、耐光性に優れた脂環構造を有する上記ハイパーブランチポリマーについて、さらなる検討を重ねた結果、ハロゲン化シアヌルと脂環構造を含むジアミンとを反応させて得られた末端アミンを有するハイパーブランチポリマーを、種々の架橋剤と組み合わせて製膜することで、高透明性および高耐光性かつ耐熱性を兼ね備えた膜形成用組成物を見出し、本発明を完成した。 In order to achieve the above object, the present inventors have conducted further studies on the hyperbranched polymer having an alicyclic structure excellent in light resistance, and as a result, reacted with cyanuric halide and a diamine having an alicyclic structure. By forming a hyperbranched polymer having a terminal amine obtained in combination with various crosslinking agents, a film-forming composition having high transparency, high light resistance and heat resistance was found, and the present invention Was completed.
すなわち、本発明は、
1. 下記式(1)で表される繰り返し単位構造を含むことを特徴とするトリアジン環含有重合体、
That is, the present invention
1. A triazine ring-containing polymer comprising a repeating unit structure represented by the following formula (1):
(式中、R、R’、R”およびR”’は、互いに独立して、水素原子、アルキル基、アルコキシ基、アリール基、またはアラルキル基を表し、A1およびA2は、互いに異なる、3〜20の脂環構造を有するアルキレン基を表す。)
2.前記A1およびA2が、互いに異なる、式(2)〜(16)で示される群から選ばれる少なくとも1種である1のトリアジン環含有重合体、
(Wherein R, R ′, R ″ and R ″ ′ each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group or an aralkyl group, and A 1 and A 2 are different from each other; Represents an alkylene group having an alicyclic structure of 3 to 20.)
2. 1 triazine ring-containing polymer which is at least one selected from the group represented by formulas (2) to (16), wherein A 1 and A 2 are different from each other;
(式中、R1およびR2は、互いに独立して、炭素数1〜5の分岐構造を有していてもよいアルキレン基を表す。)
3. 前記A1およびA2の組み合わせが、前記式(2)〜(7)および(8)〜(16)で示される群から選ばれる2種である2のトリアジン環含有重合体、
4. 前記A1およびA2の組み合わせが、前記式(5)および(8)〜(16)で示される群から選ばれる2種である2のトリアジン環含有重合体、
5. 前記A1およびA2の組み合わせが、前記式(5)および(16)で示される群から選ばれる2種である2のトリアジン環含有重合体、
6.前記R1およびR2が、共にメチレン基である2〜5のいずれかのトリアジン環含有ハイパーブランチポリマー、
7. 前記繰り返し単位構造が、式(17)を含む1のトリアジン環含有重合体、
(In the formula, R 1 and R 2 each independently represent an alkylene group which may have a branched structure having 1 to 5 carbon atoms.)
3. 2 triazine ring-containing polymers, wherein the combination of A 1 and A 2 is two kinds selected from the group represented by the formulas (2) to (7) and (8) to (16),
4). 2 triazine ring-containing polymers, wherein the combination of A 1 and A 2 is two kinds selected from the group represented by the formulas (5) and (8) to (16),
5. 2 triazine ring-containing polymers, wherein the combination of A 1 and A 2 is two kinds selected from the group represented by the formulas (5) and (16),
6). Any one of the triazine ring-containing hyperbranched polymers according to any one of 2 to 5, wherein R 1 and R 2 are both methylene groups;
7). One triazine ring-containing polymer, wherein the repeating unit structure comprises formula (17);
8. 前記式(1)で表される繰り返し単位構造を含み、少なくとも1つのトリアジン環末端を有し、このトリアジン環末端が、当該ポリマー合成原料であるジアミン化合物とは異なる、少なくとも2つの活性水素基を有する化合物でキャップされていることを特徴とする1〜7のいずれかのトリアジン環含有ハイパーブランチポリマー、
9. 前記活性水素基を有する化合物が、ジアミン化合物、およびアミノアルコール化合物から選ばれる少なくとも1種である8のトリアジン環含有ハイパーブランチポリマー、
10. 前記活性水素基を有する化合物が、アミノアルコール化合物である9のトリアジン環含有ハイパーブランチポリマー、
11. 1〜10のいずれかのトリアジン環含有ハイパーブランチポリマーを含む膜形成用組成物、
12. 架橋剤を含む11の膜形成用組成物、
13. 前記架橋剤が、ブロック化イソシアネート基を含有する化合物および多官能イソシアネート化合物から選ばれる少なくとも1種である12の膜形成用組成物、
14. 1〜10のいずれかのトリアジン環含有ハイパーブランチポリマーを含む膜、
15. 11〜13のいずれかの膜形成用組成物から得られる膜、
16. 基材と、この基材上に形成された14または15の膜とを備える光学部材
を提供する。
8). It has a repeating unit structure represented by the formula (1), has at least one triazine ring terminal, and this triazine ring terminal has at least two active hydrogen groups different from the diamine compound that is the raw material for polymer synthesis. A triazine ring-containing hyperbranched polymer according to any one of 1 to 7, which is capped with a compound having
9. 8 triazine ring-containing hyperbranched polymers, wherein the compound having an active hydrogen group is at least one selected from a diamine compound and an amino alcohol compound;
10. 9 triazine ring-containing hyperbranched polymer, wherein the compound having an active hydrogen group is an amino alcohol compound;
11. A film-forming composition comprising any one of the triazine ring-containing hyperbranched polymers of 1 to 10,
12 11 film-forming compositions containing a crosslinking agent;
13. 12 film-forming compositions, wherein the crosslinking agent is at least one selected from a compound containing a blocked isocyanate group and a polyfunctional isocyanate compound;
14 A film comprising any one of the triazine ring-containing hyperbranched polymers of 1 to 10,
15. A film obtained from the film-forming composition of any one of 11 to 13,
16. An optical member comprising a base material and 14 or 15 films formed on the base material is provided.
本発明によれば、高透明性および高耐光性と耐熱性を兼ね備えた膜形成用組成物を提供することができる。 ADVANTAGE OF THE INVENTION According to this invention, the composition for film formation which has high transparency, high light resistance, and heat resistance can be provided.
本発明のトリアジン環含有ハイパーブランチポリマーを含む膜は、液晶ディスプレイ、有機エレクトロルミネッセンス(EL)ディスプレイ、光半導体(LED)素子、固体撮像素子、有機薄膜太陽電池、色素増感太陽電池、有機薄膜トランジスタ(TFT)などの電子デバイスを作製する際の一部材として好適に利用できる。また、高屈折率が求められているレンズ用部材として好適に利用できる。 The film containing the triazine ring-containing hyperbranched polymer of the present invention includes a liquid crystal display, an organic electroluminescence (EL) display, an optical semiconductor (LED) element, a solid-state imaging device, an organic thin film solar cell, a dye-sensitized solar cell, an organic thin film transistor ( It can be suitably used as a member for producing an electronic device such as a TFT. Moreover, it can utilize suitably as a member for lenses by which high refractive index is calculated | required.
特に、耐熱性(耐熱透明性)の厚膜を形成し得ることから光学材料分野への応用が期待できる。 In particular, since a thick film having heat resistance (heat resistance transparency) can be formed, application in the field of optical materials can be expected.
以下、本発明についてさらに詳しく説明する。 Hereinafter, the present invention will be described in more detail.
本発明に係るトリアジン環含有ハイパーブランチポリマーは、ハロゲン化シアヌルと、脂環構造を有するジアミン化合物とを反応させて得られ、少なくとも1つのジアミン化合物に由来する末端アミノ基を有し、下記式(1)で表される繰り返し単位構造を含むものである。 The triazine ring-containing hyperbranched polymer according to the present invention is obtained by reacting cyanuric halide with a diamine compound having an alicyclic structure, has a terminal amino group derived from at least one diamine compound, and has the following formula ( The repeating unit structure represented by 1) is included.
上記式中、R、R’、R”およびR”’は、互いに独立して、水素原子、アルキル基、アルコキシ基、アリール基、またはアラルキル基を表し、A1およびA2は、互いに異なる、3〜20の脂環構造を有するアルキレン基を表す。 In the above formula, R, R ′, R ″ and R ″ ′ each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group, and A 1 and A 2 are different from each other. An alkylene group having 3 to 20 alicyclic structures is represented.
本発明において、アルキル基の炭素数としては特に限定されるものではないが、1〜20が好ましく、ポリマーの耐熱性をより高めることを考慮すると、炭素数1〜10がより好ましく、1〜3がより一層好ましい。また、その構造は、鎖状、分岐状、環状のいずれでもよい。 In the present invention, the number of carbon atoms of the alkyl group is not particularly limited, but is preferably 1 to 20, and more preferably 1 to 10 carbon atoms in view of further improving the heat resistance of the polymer. Is even more preferable. Further, the structure may be any of a chain, a branch, and a ring.
アルキル基の具体例としては、メチル基、エチル基、n−プロピル基、イソプロピル基、シクロプロピル基、n−ブチル基、イソブチル基、s−ブチル基、t−ブチル基、シクロブチル基、1−メチル−シクロプロピル基、2−メチル−シクロプロピル基、n−ペンチル基、1−メチル−n−ブチル基、2−メチル−n−ブチル基、3−メチル−n−ブチル基、1,1−ジメチル−n−プロピル基、1,2−ジメチル−n−プロピル基、2,2−ジメチル−n−プロピル基、1−エチル−n−プロピル基、シクロペンチル基、1−メチル−シクロブチル基、2−メチル−シクロブチル基、3−メチル−シクロブチル基、1,2−ジメチル−シクロプロピル基、2,3−ジメチル−シクロプロピル基、1−エチル−シクロプロピル基、2−エチル−シクロプロピル基、n−ヘキシル基、1−メチル−n−ペンチル基、2−メチル−n−ペンチル基、3−メチル−n−ペンチル基、4−メチル−n−ペンチル基、1,1−ジメチル−n−ブチル基、1,2−ジメチル−n−ブチル基、1,3−ジメチル−n−ブチル基、2,2−ジメチル−n−ブチル基、2,3−ジメチル−n−ブチル基、3,3−ジメチル−n−ブチル基、1−エチル−n−ブチル基、2−エチル−n−ブチル基、1,1,2−トリメチル−n−プロピル基、1,2,2−トリメチル−n−プロピル基、1−エチル−1−メチル−n−プロピル基、1−エチル−2−メチル−n−プロピル基、シクロヘキシル基、1−メチル−シクロペンチル基、2−メチル−シクロペンチル基、3−メチル−シクロペンチル基、1−エチル−シクロブチル基、2−エチル−シクロブチル基、3−エチル−シクロブチル基、1,2−ジメチル−シクロブチル基、1,3−ジメチル−シクロブチル基、2,2−ジメチル−シクロブチル基、2,3−ジメチル−シクロブチル基、2,4−ジメチル−シクロブチル基、3,3−ジメチル−シクロブチル基、1−n−プロピル−シクロプロピル基、2−n−プロピル−シクロプロピル基、1−イソプロピル−シクロプロピル基、2−イソプロピル−シクロプロピル基、1,2,2−トリメチル−シクロプロピル基、1,2,3−トリメチル−シクロプロピル基、2,2,3−トリメチル−シクロプロピル基、1−エチル−2−メチル−シクロプロピル基、2−エチル−1−メチル−シクロプロピル基、2−エチル−2−メチル−シクロプロピル基、2−エチル−3−メチル−シクロプロピル基等が挙げられる。 Specific examples of the alkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, cyclopropyl group, n-butyl group, isobutyl group, s-butyl group, t-butyl group, cyclobutyl group, and 1-methyl. -Cyclopropyl group, 2-methyl-cyclopropyl group, n-pentyl group, 1-methyl-n-butyl group, 2-methyl-n-butyl group, 3-methyl-n-butyl group, 1,1-dimethyl -N-propyl group, 1,2-dimethyl-n-propyl group, 2,2-dimethyl-n-propyl group, 1-ethyl-n-propyl group, cyclopentyl group, 1-methyl-cyclobutyl group, 2-methyl -Cyclobutyl group, 3-methyl-cyclobutyl group, 1,2-dimethyl-cyclopropyl group, 2,3-dimethyl-cyclopropyl group, 1-ethyl-cyclopropyl group, 2-ethyl -Cyclopropyl group, n-hexyl group, 1-methyl-n-pentyl group, 2-methyl-n-pentyl group, 3-methyl-n-pentyl group, 4-methyl-n-pentyl group, 1,1- Dimethyl-n-butyl group, 1,2-dimethyl-n-butyl group, 1,3-dimethyl-n-butyl group, 2,2-dimethyl-n-butyl group, 2,3-dimethyl-n-butyl group 3,3-dimethyl-n-butyl group, 1-ethyl-n-butyl group, 2-ethyl-n-butyl group, 1,1,2-trimethyl-n-propyl group, 1,2,2-trimethyl -N-propyl group, 1-ethyl-1-methyl-n-propyl group, 1-ethyl-2-methyl-n-propyl group, cyclohexyl group, 1-methyl-cyclopentyl group, 2-methyl-cyclopentyl group, 3 -Methyl-cyclopentyl group, 1- Til-cyclobutyl group, 2-ethyl-cyclobutyl group, 3-ethyl-cyclobutyl group, 1,2-dimethyl-cyclobutyl group, 1,3-dimethyl-cyclobutyl group, 2,2-dimethyl-cyclobutyl group, 2,3- Dimethyl-cyclobutyl group, 2,4-dimethyl-cyclobutyl group, 3,3-dimethyl-cyclobutyl group, 1-n-propyl-cyclopropyl group, 2-n-propyl-cyclopropyl group, 1-isopropyl-cyclopropyl group 2-isopropyl-cyclopropyl group, 1,2,2-trimethyl-cyclopropyl group, 1,2,3-trimethyl-cyclopropyl group, 2,2,3-trimethyl-cyclopropyl group, 1-ethyl-2 -Methyl-cyclopropyl group, 2-ethyl-1-methyl-cyclopropyl group, 2-ethyl-2-methyl-cyclo A propyl group, 2-ethyl-3-methyl-cyclopropyl group, etc. are mentioned.
アルコキシ基の炭素数としては特に限定されるものではないが、1〜20が好ましく、ポリマーの耐熱性をより高めることを考慮すると、炭素数1〜10がより好ましく、1〜3がより一層好ましい。また、そのアルキル部分の構造は、鎖状、分岐状、環状のいずれでもよい。 Although it does not specifically limit as carbon number of an alkoxy group, 1-20 are preferable, when it considers raising the heat resistance of a polymer more, C1-C10 is more preferable, and 1-3 are still more preferable. . Further, the structure of the alkyl moiety may be any of a chain, a branch, and a ring.
アルコキシ基の具体例としては、メトキシ基、エトキシ基、n−プロポキシ基、イソプロポキシ基、n−ブトキシ基、イソブトキシ基、s−ブトキシ基、t−ブトキシ基、n−ペントキシ基、1−メチル−n−ブトキシ基、2−メチル−n−ブトキシ基、3−メチル−n−ブトキシ基、1,1−ジメチル−n−プロポキシ基、1,2−ジメチル−n−プロポキシ基、2,2−ジメチル−n−プロポキシ基、1−エチル−n−プロポキシ基、n−ヘキシルオキシ基、1−メチル−n−ペンチルオキシ基、2−メチル−n−ペンチルオキシ基、3−メチル−n−ペンチルオキシ基、4−メチル−n−ペンチルオキシ基、1,1−ジメチル−n−ブトキシ基、1,2−ジメチル−n−ブトキシ基、1,3−ジメチル−n−ブトキシ基、2,2−ジメチル−n−ブトキシ基、2,3−ジメチル−n−ブトキシ基、3,3−ジメチル−n−ブトキシ基、1−エチル−n−ブトキシ基、2−エチル−n−ブトキシ基、1,1,2−トリメチル−n−プロポキシ基、1,2,2−トリメチル−n−プロポキシ基、1−エチル−1−メチル−n−プロポキシ基、1−エチル−2−メチル−n−プロポキシ基等が挙げられる。 Specific examples of the alkoxy group include methoxy group, ethoxy group, n-propoxy group, isopropoxy group, n-butoxy group, isobutoxy group, s-butoxy group, t-butoxy group, n-pentoxy group, 1-methyl- n-butoxy group, 2-methyl-n-butoxy group, 3-methyl-n-butoxy group, 1,1-dimethyl-n-propoxy group, 1,2-dimethyl-n-propoxy group, 2,2-dimethyl -N-propoxy group, 1-ethyl-n-propoxy group, n-hexyloxy group, 1-methyl-n-pentyloxy group, 2-methyl-n-pentyloxy group, 3-methyl-n-pentyloxy group 4-methyl-n-pentyloxy group, 1,1-dimethyl-n-butoxy group, 1,2-dimethyl-n-butoxy group, 1,3-dimethyl-n-butoxy group, 2,2-dimethyl Ru-n-butoxy group, 2,3-dimethyl-n-butoxy group, 3,3-dimethyl-n-butoxy group, 1-ethyl-n-butoxy group, 2-ethyl-n-butoxy group, 1,1 , 2-trimethyl-n-propoxy group, 1,2,2-trimethyl-n-propoxy group, 1-ethyl-1-methyl-n-propoxy group, 1-ethyl-2-methyl-n-propoxy group, etc. Can be mentioned.
アリール基の炭素数としては特に限定されるものではないが、6〜40が好ましく、ポリマーの耐熱性をより高めることを考慮すると、炭素数6〜16がより好ましく、6〜13がより一層好ましい。 Although it does not specifically limit as carbon number of an aryl group, 6-40 are preferable, and when it considers raising the heat resistance of a polymer more, 6-16 are more preferable, and 6-13 are still more preferable. .
アリール基の具体例としては、フェニル基、o−クロルフェニル基、m−クロルフェニル基、p−クロルフェニル基、o−フルオロフェニル基、p−フルオロフェニル基、o−メトキシフェニル基、p−メトキシフェニル基、p−ニトロフェニル基、p−シアノフェニル基、α−ナフチル基、β−ナフチル基、o−ビフェニリル基、m−ビフェニリル基、p−ビフェニリル基、1−アントリル基、2−アントリル基、9−アントリル基、1−フェナントリル基、2−フェナントリル基、3−フェナントリル基、4−フェナントリル基、9−フェナントリル基等が挙げられる。 Specific examples of the aryl group include a phenyl group, an o-chlorophenyl group, an m-chlorophenyl group, a p-chlorophenyl group, an o-fluorophenyl group, a p-fluorophenyl group, an o-methoxyphenyl group, and a p-methoxy group. Phenyl group, p-nitrophenyl group, p-cyanophenyl group, α-naphthyl group, β-naphthyl group, o-biphenylyl group, m-biphenylyl group, p-biphenylyl group, 1-anthryl group, 2-anthryl group, Examples include 9-anthryl group, 1-phenanthryl group, 2-phenanthryl group, 3-phenanthryl group, 4-phenanthryl group, 9-phenanthryl group and the like.
アラルキル基の炭素数としては特に限定されるものではないが、炭素数7〜20が好ましく、そのアルキル部分は、直鎖、分岐、環状のいずれでもよい。 Although it does not specifically limit as carbon number of an aralkyl group, C7-C20 is preferable and the linear, branched, and cyclic | annular form may be sufficient as the alkyl part.
その具体例としては、ベンジル基、p−メチルフェニルメチル基、m−メチルフェニルメチル基、o−エチルフェニルメチル基、m−エチルフェニルメチル基、p−エチルフェニルメチル基、2−プロピルフェニルメチル基、4−イソプロピルフェニルメチル基、4−イソブチルフェニルメチル基、α−ナフチルメチル基等が挙げられる。 Specific examples thereof include benzyl group, p-methylphenylmethyl group, m-methylphenylmethyl group, o-ethylphenylmethyl group, m-ethylphenylmethyl group, p-ethylphenylmethyl group, 2-propylphenylmethyl group. 4-isopropylphenylmethyl group, 4-isobutylphenylmethyl group, α-naphthylmethyl group and the like.
脂環ジアミンとしては、3〜20の脂環構造を有するアルキレン基であれば特に限定されるものではなく、例えば、下記式(2)〜(16)で示される基などが挙げられる。
得られるポリマーの耐熱性(耐熱透明性)をより高めることを考慮すると、特に、前記A1およびA2の組み合わせが、前記式(2)〜(7)および(8)〜(16)で示される群から選ばれる2種であるトリアジン環含有重合体が好ましく、前記A1およびA2の組み合わせが、前記式(5)および(8)〜(16)で示される群から選ばれる2種であるトリアジン環含有重合体がより好ましく、前記A1およびA2の組み合わせが、前記式(5)および(16)で示される群から選ばれる2種であるトリアジン環含有重合体が特に好ましい。
また、前記R1およびR2が、共にメチレン基であるトリアジン環含有ハイパーブランチポリマーが好適である。
The alicyclic diamine is not particularly limited as long as it is an alkylene group having 3 to 20 alicyclic structures, and examples thereof include groups represented by the following formulas (2) to (16).
In consideration of further improving the heat resistance (heat-resistant transparency) of the resulting polymer, the combination of A 1 and A 2 is particularly shown by the formulas (2) to (7) and (8) to (16). The triazine ring-containing polymer which is two types selected from the group described above is preferable, and the combination of the A 1 and A 2 is two types selected from the group represented by the formulas (5) and (8) to (16). A certain triazine ring-containing polymer is more preferable, and a triazine ring-containing polymer in which the combination of A 1 and A 2 is two kinds selected from the group represented by the formulas (5) and (16) is particularly preferable.
Further, a triazine ring-containing hyperbranched polymer in which R 1 and R 2 are both methylene groups is preferable.
具体例を挙げると、前記繰り返し単位構造が、式(17)を含む1のトリアジン環含有重合体が好ましい。 When a specific example is given, the triazine ring containing polymer of 1 in which the said repeating unit structure contains Formula (17) is preferable.
上記R1およびR2は、互いに独立して、炭素数1〜5の分岐構造を有していてもよいアルキレン基を表す。 R 1 and R 2 independently represent an alkylene group that may have a branched structure having 1 to 5 carbon atoms.
このようなアルキレン基としては、メチレン、エチレン、プロピレン、トリメチレン、テトラメチレン、ペンタメチレン基等が挙げられるが、得られるポリマーの屈折率をより高めるということを考慮すると、炭素数1〜3のアルキレン基が好ましく、炭素数1〜2のアルキレン基、具体的には、メチレン、エチレン基がより好ましく、メチレン基が最適である。 Examples of such an alkylene group include methylene, ethylene, propylene, trimethylene, tetramethylene, and pentamethylene groups. In consideration of further increasing the refractive index of the resulting polymer, alkylene having 1 to 3 carbon atoms. Groups are preferred, alkylene groups having 1 to 2 carbon atoms, specifically, methylene and ethylene groups are more preferred, and methylene groups are most preferred.
本発明のハイパーブランチポリマーの重量平均分子量は、特に限定されるものではないが、400〜500,000が好ましく、400〜100,000がより好ましく、より耐熱性を向上させるとともに、収縮率を低くするという点から、600以上が好ましく、より溶解性を高め、得られた溶液の粘度を低下させるという点から、50,000以下が好ましく、30,000以下がより好ましく、10,000以下がさらに好ましい。 The weight average molecular weight of the hyperbranched polymer of the present invention is not particularly limited, but is preferably 400 to 500,000, more preferably 400 to 100,000, further improving heat resistance and lowering the shrinkage rate. Is preferably 600 or more, more preferably 50,000 or less, more preferably 30,000 or less, and even more preferably 10,000 or less from the viewpoint of further increasing the solubility and lowering the viscosity of the resulting solution. preferable.
なお、本発明における重量平均分子量は、ゲルパーミエーションクロマトグラフィー(以下、GPCという)分析による標準ポリスチレン換算で得られる平均分子量である。 In addition, the weight average molecular weight in this invention is an average molecular weight obtained by standard polystyrene conversion by gel permeation chromatography (henceforth GPC) analysis.
本発明において、ハイパーブランチポリマーの末端トリアジン環をキャップするために用いられる、少なくとも2つの活性水素基を有する化合物としては、トリアジン環上のハロゲン原子と反応し得るものでれば、特に限定されるものではないが、アミノ基、水酸基、およびチオール基から選ばれる活性水素基を2つ以上有する化合物が好ましい。 In the present invention, the compound having at least two active hydrogen groups used for capping the terminal triazine ring of the hyperbranched polymer is particularly limited as long as it can react with a halogen atom on the triazine ring. Although not intended, a compound having two or more active hydrogen groups selected from an amino group, a hydroxyl group, and a thiol group is preferable.
特に、アミノ基を2個有するジアミン化合物、および1つのアミノ基と1つの水酸基を有するアミノアルコール化合物から選ばれる少なくとも1種が好ましく、アミノアルコール化合物がより好ましく、アルカノールアミンがより一層好ましい。 In particular, at least one selected from a diamine compound having two amino groups and an amino alcohol compound having one amino group and one hydroxyl group is preferred, an amino alcohol compound is more preferred, and an alkanolamine is even more preferred.
このような化合物の具体例としては、エチレンジアミン、1,3−プロパンジアミン等のジアミン化合物;エチレングリコール、プロピレングリコール等のジオール化合物;1,2−エタンジチオール、1,3−プロパンジチオール等のジチオール化合物;メタノールアミン、エタノールアミン、プロパノールアミン、1−アミノ−2−プロパノール、1−アミノ−2−ブタノール、1−アミノ−3−ブタノール、4−アミノ−1−ブタノール等のアルカノールアミンなどが挙げられる。 Specific examples of such compounds include diamine compounds such as ethylenediamine and 1,3-propanediamine; diol compounds such as ethylene glycol and propylene glycol; dithiol compounds such as 1,2-ethanedithiol and 1,3-propanedithiol. Alkanolamines such as methanolamine, ethanolamine, propanolamine, 1-amino-2-propanol, 1-amino-2-butanol, 1-amino-3-butanol and 4-amino-1-butanol;
本発明のトリアジン環含有重合体の製造法について一例を挙げて説明する。 An example is given and demonstrated about the manufacturing method of the triazine ring containing polymer of this invention.
本発明の共重合型のトリアジン環含有重合体は、ハロゲン化シアヌルと、少なくとも2種類のジアミン化合物とを反応させて得ることができ、例えば、下記スキーム1に示されるように、少なくとも1つのトリアジン環末端がアミノプロパノールでキャップされた高分岐重合体(ハイパーブランチポリマー)(21)の場合は、ハロゲン化シアヌル(18)、式(19)および式(20)で示されるジアミン、1−アミノ−2−プロパノールを適当な有機溶媒中で反応させて得ることができる。 The copolymer type triazine ring-containing polymer of the present invention can be obtained by reacting cyanuric halide with at least two kinds of diamine compounds. For example, as shown in the following scheme 1, at least one triazine In the case of a hyperbranched polymer (hyperbranched polymer) (21) whose ring end is capped with aminopropanol, cyanuric halide (18), diamine represented by formula (19) and formula (20), 1-amino- It can be obtained by reacting 2-propanol in a suitable organic solvent.
また、下記スキーム2に示されるように、同じく高分岐重合体(ハイパーブランチポリマー)(21)は、ハロゲン化シアヌル(18)、式(19)および式(20)で示されるジアミンを適当な有機溶媒中で等量用いて反応させて得られる化合物(22)および化合物(23)と、1−アミノ−2−プロパノールとから合成することもできる。 Further, as shown in Scheme 2 below, similarly, a hyperbranched polymer (hyperbranched polymer) (21) is prepared by using cyanuric halide (18), diamines represented by formula (19) and formula (20) as appropriate organic compounds. It can also synthesize | combine from the compound (22) and compound (23) obtained by making it react by using equivalent amount in a solvent, and 1-amino-2-propanol.
トリアジン環末端をアミノプロパノールでキャップしない場合は、アミノプロパノールを反応させなければよい。 When the end of the triazine ring is not capped with aminopropanol, aminopropanol may not be reacted.
(式中、Xは、互いに独立してハロゲン原子を表す。) (In formula, X represents a halogen atom mutually independently.)
(式中、Xは、互いに独立してハロゲン原子を表す。)
上記スキーム1の方法において、各原料の仕込み量としては、トリアジン環末端を有する高分岐重合体(ハイパーブランチポリマー)を得るために、ハロゲン化シアヌル(17)に対して、式(19)と式(20)で示されるジアミンの総量が1.5当量未満の量で用いることが好ましく、0.1当量以上1.4当量未満がより好ましい。
(In formula, X represents a halogen atom mutually independently.)
In the method of Scheme 1 above, the amount of each raw material charged is, in order to obtain a hyperbranched polymer (hyperbranched polymer) having a triazine ring terminal, with respect to cyanuric halide (17), The total amount of diamine represented by (20) is preferably used in an amount of less than 1.5 equivalents, more preferably 0.1 equivalents or more and less than 1.4 equivalents.
また、スキーム1,2の反応において、アミノプロパノールの使用量は、ハロゲン化シアヌル(18)と、式(19)および式(20)で示されるジアミンの使用割合に応じて変動するものであるため一概に規定することはできないが、ハロゲン化シアヌル1当量に対して、0.1〜10当量程度が好ましく、1〜5当量程度がより好ましい。 In the reactions of Schemes 1 and 2, the amount of aminopropanol used varies depending on the cyanuric halide (18) and the proportion of diamines represented by formula (19) and formula (20). Although it cannot be generally defined, it is preferably about 0.1 to 10 equivalents and more preferably about 1 to 5 equivalents per 1 equivalent of cyanuric halide.
上記有機溶媒としては、この種の反応において通常用いられる種々の溶媒を用いることができ、例えば、テトラヒドロフラン、ジオキサン、ジメチルスルホキシド;N,N−ジメチルホルムアミド、N−メチル−2−ピロリドン、テトラメチル尿素、ヘキサメチルホスホルアミド、N,N−ジメチルアセトアミド、N−メチル−2−ピペリドン、N,N−ジメチルエチレン尿素、N,N,N’,N’−テトラメチルマロン酸アミド、N−メチルカプロラクタム、N−アセチルピロリジン、N,N−ジエチルアセトアミド、N−エチル−2−ピロリドン、N,N−ジメチルプロピオン酸アミド、N,N−ジメチルイソブチルアミド、N−メチルホルムアミド、N,N’−ジメチルプロピレン尿素等のアミド系溶媒、およびそれらの混合溶媒が挙げられる。 As said organic solvent, the various solvent normally used in this kind of reaction can be used, for example, tetrahydrofuran, dioxane, dimethylsulfoxide; N, N-dimethylformamide, N-methyl-2-pyrrolidone, tetramethylurea , Hexamethylphosphoramide, N, N-dimethylacetamide, N-methyl-2-piperidone, N, N-dimethylethyleneurea, N, N, N ′, N′-tetramethylmalonic acid amide, N-methylcaprolactam N-acetylpyrrolidine, N, N-diethylacetamide, N-ethyl-2-pyrrolidone, N, N-dimethylpropionic acid amide, N, N-dimethylisobutyramide, N-methylformamide, N, N′-dimethylpropylene Amide solvents such as urea and mixed solvents thereof It is.
中でもN,N−ジメチルホルムアミド、ジメチルスルホキシド、N−メチル−2−ピロリドン、N,N−ジメチルアセトアミド、およびそれらの混合系が好ましく、特に、N,N−ジメチルアセトアミド、N−メチル−2−ピロリドンが好適である。 Among these, N, N-dimethylformamide, dimethyl sulfoxide, N-methyl-2-pyrrolidone, N, N-dimethylacetamide, and a mixed system thereof are preferable, and N, N-dimethylacetamide, N-methyl-2-pyrrolidone are particularly preferable. Is preferred.
スキーム1の反応、およびスキーム2の第2段階の反応において、反応温度は、用いる溶媒の融点から溶媒の沸点までの範囲で適宜設定すればよいが、特に、−50〜150℃程度が好ましく、−20〜100℃がより好ましい。 In the reaction of Scheme 1 and the second stage reaction of Scheme 2, the reaction temperature may be appropriately set in the range from the melting point of the solvent to be used to the boiling point of the solvent, and is particularly preferably about −50 to 150 ° C. -20-100 degreeC is more preferable.
スキーム2の第1段階の方法において、反応温度は、用いる溶媒の融点から溶媒の沸点までの範囲で適宜設定すればよいが、特に、−50〜50℃程度が好ましく、−20〜50℃程度がより好ましい。 In the first step method of Scheme 2, the reaction temperature may be appropriately set in the range from the melting point of the solvent to be used to the boiling point of the solvent, and is particularly preferably about −50 to 50 ° C., and preferably about −20 to 50 ° C. Is more preferable.
上記各反応において、各成分の配合順序は任意であるが、スキーム1の反応においては、ハロゲン化シアヌル(18)、または式(19)および式(20)で示されるジアミン、および有機溶媒を含む溶液を0℃以下に冷却し、この温度で、当該溶液中に、式(19)および式(20)で示されるジアミン、またはハロゲン化シアヌル(18)を加えた後、上記温度範囲で加熱してポリマー化した後、1−アミノ−2−プロパノールをさらに加えて反応させる方法が最適である。 In each of the above reactions, the order of blending the components is arbitrary, but the reaction of Scheme 1 includes cyanuric halide (18), a diamine represented by formula (19) and formula (20), and an organic solvent. The solution is cooled to 0 ° C. or lower, and at this temperature, the diamine represented by formula (19) and formula (20) or cyanuric halide (18) is added to the solution, and then heated in the above temperature range. After the polymerization, the method of adding 1-amino-2-propanol and reacting it is optimal.
また、スキーム2の反応において、予め溶媒に溶かしておく成分および後から加える成分はどちらでもよいが、ハロゲン化シアヌル(18)の冷却溶液中に、式(19)および式(20)で示されるジアミンを添加する手法が好ましい。この手法によって得られた、中間体(22)および化合物(23)を含む溶液を上記温度範囲で加熱してポリマー化した後、1−アミノ−2−プロパノールを上記温度範囲で加えて反応させる方法が最適である。 In the reaction of Scheme 2, either a component previously dissolved in a solvent or a component added later may be either, but in the cooled solution of cyanuric halide (18), it is represented by formula (19) and formula (20). A method of adding diamine is preferred. A method in which a solution containing the intermediate (22) and the compound (23) obtained by this method is polymerized by heating in the above temperature range, and then reacted by adding 1-amino-2-propanol in the above temperature range. Is the best.
なお、後から加える成分は、ニートで加えても、上述したような有機溶媒に溶かした溶液で加えてもよいが、操作の容易さや反応のコントロールのし易さなどを考慮すると、後者の手法が好適である。 The components added later may be added neat or in a solution dissolved in an organic solvent as described above, but the latter method is considered in consideration of ease of operation and ease of reaction control. Is preferred.
また、添加は、滴下等によって徐々に加えても、全量一括して加えてもよい。 The addition may be gradually added by dropping or the like, or may be added all at once.
上記スキーム1の反応およびスキーム2の第2段階の反応では、通常用いられる種々の塩基を、重合時または重合後に添加してもよい。 In the reaction of Scheme 1 and the second stage reaction of Scheme 2, various commonly used bases may be added during or after polymerization.
この塩基の具体例としては、炭酸カリウム、水酸化カリウム、炭酸ナトリウム、水酸化ナトリウム、炭酸水素ナトリウム、ナトリウムエトキシド、酢酸ナトリウム、炭酸リチウム、水酸化リチウム、酸化リチウム、酢酸カリウム、酸化マグネシウム、酸化カルシウム、水酸化バリウム、リン酸三リチウム、リン酸三ナトリウム、リン酸三カリウム、フッ化セシウム、酸化アルミニウム、アンモニア、トリメチルアミン、トリエチルアミン、ジイソプロピルアミン、ジイソプロピルエチルアミン、N−メチルピペリジン、2,2,6,6−テトラメチル−N−メチルピペリジン、ピリジン、4−ジメチルアミノピリジン、N−メチルモルホリン等が挙げられる。 Specific examples of this base include potassium carbonate, potassium hydroxide, sodium carbonate, sodium hydroxide, sodium hydrogen carbonate, sodium ethoxide, sodium acetate, lithium carbonate, lithium hydroxide, lithium oxide, potassium acetate, magnesium oxide, oxidized Calcium, barium hydroxide, trilithium phosphate, trisodium phosphate, tripotassium phosphate, cesium fluoride, aluminum oxide, ammonia, trimethylamine, triethylamine, diisopropylamine, diisopropylethylamine, N-methylpiperidine, 2,2,6 , 6-tetramethyl-N-methylpiperidine, pyridine, 4-dimethylaminopyridine, N-methylmorpholine and the like.
塩基の添加量は、ハロゲン化シアヌル(17)1当量に対して1〜100当量が好ましく、1〜10当量がより好ましい。なお、これらの塩基は水溶液にして用いてもよい。 The amount of the base added is preferably 1 to 100 equivalents and more preferably 1 to 10 equivalents with respect to 1 equivalent of the cyanuric halide (17). These bases may be used as an aqueous solution.
得られる重合体には、原料成分が残存していないことが好ましいが、本発明の効果を損なわなければ一部の原料が残存していてもよい。 Although it is preferable that the raw material component does not remain in the obtained polymer, a part of the raw material may remain as long as the effect of the present invention is not impaired.
いずれのスキームの方法においても、反応終了後、生成物は再沈法等によって容易に精製できる。 In any of the scheme methods, after completion of the reaction, the product can be easily purified by a reprecipitation method or the like.
本発明の膜形成用組成物は、上述したハイパーブランチポリマー含むものであり、例えば、当該ハイパーブランチポリマーを各種の溶剤に溶かした組成物として好適に使用できる。 The film-forming composition of the present invention contains the hyperbranched polymer described above, and can be suitably used, for example, as a composition in which the hyperbranched polymer is dissolved in various solvents.
重合体を溶解するのに用いる溶剤は、重合時に用いた溶媒と同じものでも別のものでもよい。この溶剤は、重合体との相溶性を損なわなければ特に限定されず、1種でも複数種でも任意に選択して用いることができる。 The solvent used for dissolving the polymer may be the same as or different from the solvent used during the polymerization. The solvent is not particularly limited as long as the compatibility with the polymer is not impaired, and one kind or a plurality of kinds can be arbitrarily selected and used.
このような溶剤の具体例としては、トルエン、p−キシレン、o−キシレン、m−キシレン、エチルベンゼン、スチレン、エチレングリコールジメチルエーテル、プロピレングリコールモノメチルエーテル、エチレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノイソプロピルエーテル、エチレングリコールメチルエーテルアセテート、プロピレングリコールモノメチルエーテルアセテート、エチレングリコールエチルエーテルアセテート、ジエチレングリコールジメチルエーテル、プロピレングリコールモノブチルエーテル、エチレングリコ−ルモノブチルエーテル、ジエチレングリコールジエチルエーテル、ジプロピレングリコールモノメチルエーテル、ジエチレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、ジエチレングリコールモノエチルエーテル、トリエチレングリコールジメチルエーテル、ジエチレングリコールモノエチルエーテルアセテート、γ−ブチロラクトン、アセトン、メチルエチルケトン、メチルイソプロピルケトン、ジエチルケトン、メチルイソブチルケトン、メチルノーマルブチルケトン、シクロヘキサノン、酢酸エチル、酢酸イソプロピルケトン、酢酸ノーマルプロピル、酢酸イソブチル、酢酸ノーマルブチル、乳酸エチル、メタノール、エタノール、ノーマルプロパノール、イソプロパノール、ノーマルブタノール、イソブタノール、tert−ブタノール、1−ペンタノール、2−メチル−2−ブタノール、2−メチル−1−ブタノール、1−ヘキサノール、シクロヘキサノール、2−メチル−1−ペンタノール、1−ヘプタノール、1−オクタノール、2−エチルヘキサノール、1−メトキシ−2−ブタノール、ジアセトンアルコール、アリルアルコール、エチレングリコール、プロピレングリコール、ヘキシレングリコール、トリメチレングリコール、フルフリルアルコール、テトラヒドロフルフリルアルコール、ベンジルアルコール、ジエチレングリコール、1,3−ブタンジオール、1,4−ブタンジオール、2,3−ブタンジオール、イソプロピルエーテル、テトラヒドロフラン、1,4−ジオキサン、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N−メチルピロリドン、1,3−ジメチル−2−イミダゾリジノン、ジメチルスルホキシド、N−シクロヘキシル−2−ピロリジノン等が挙げられるが、ポリマーの溶解性および保存安定性の観点から、より好ましくは、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノブチルエーテル、シクロヘキサノン等が挙げられる。 Specific examples of such solvents include toluene, p-xylene, o-xylene, m-xylene, ethylbenzene, styrene, ethylene glycol dimethyl ether, propylene glycol monomethyl ether, ethylene glycol monomethyl ether, propylene glycol monoethyl ether, ethylene glycol. Monoethyl ether, ethylene glycol monoisopropyl ether, ethylene glycol methyl ether acetate, propylene glycol monomethyl ether acetate, ethylene glycol ethyl ether acetate, diethylene glycol dimethyl ether, propylene glycol monobutyl ether, ethylene glycol monobutyl ether, diethylene glycol diethyl ether, dipropylene glycol mono Me Ether, diethylene glycol monomethyl ether, dipropylene glycol monoethyl ether, diethylene glycol monoethyl ether, triethylene glycol dimethyl ether, diethylene glycol monoethyl ether acetate, γ-butyrolactone, acetone, methyl ethyl ketone, methyl isopropyl ketone, diethyl ketone, methyl isobutyl ketone, methyl normal Butyl ketone, cyclohexanone, ethyl acetate, isopropyl ketone, normal propyl acetate, isobutyl acetate, normal butyl acetate, ethyl lactate, methanol, ethanol, normal propanol, isopropanol, normal butanol, isobutanol, tert-butanol, 1-pentanol, 2-methyl-2-butanol, 2-me Til-1-butanol, 1-hexanol, cyclohexanol, 2-methyl-1-pentanol, 1-heptanol, 1-octanol, 2-ethylhexanol, 1-methoxy-2-butanol, diacetone alcohol, allyl alcohol, Ethylene glycol, propylene glycol, hexylene glycol, trimethylene glycol, furfuryl alcohol, tetrahydrofurfuryl alcohol, benzyl alcohol, diethylene glycol, 1,3-butanediol, 1,4-butanediol, 2,3-butanediol, isopropyl Ether, tetrahydrofuran, 1,4-dioxane, N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, 1,3-dimethyl-2-imidazolidinone, dimethyl ether Rulsulfoxide, N-cyclohexyl-2-pyrrolidinone, and the like. From the viewpoint of polymer solubility and storage stability, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monomethyl ether acetate, propylene are more preferable. Examples include glycol monobutyl ether and cyclohexanone.
この際、膜形成組成物中の固形分濃度は、保存安定性に影響を与えない範囲であれば特に限定されず、目的とする膜の厚みに応じて適宜設定すればよい。具体的には、溶解性および保存安定性の観点から、固形分濃度0.1〜50質量%が好ましく、より厚膜を形成することを考慮すると、1〜30質量%が好適である。 At this time, the solid content concentration in the film-forming composition is not particularly limited as long as it does not affect the storage stability, and may be appropriately set according to the target film thickness. Specifically, from the viewpoint of solubility and storage stability, the solid content concentration is preferably 0.1 to 50% by mass, and 1 to 30% by mass is preferable in consideration of forming a thicker film.
本発明の膜形成用組成物には、本発明の効果を損なわない限りにおいて、その他の成分、例えば、レベリング剤、界面活性剤、架橋剤等が含まれていてもよい。特に、当該組成物から得られる薄膜の硬度を高める等の目的で架橋剤が含まれていることが好ましい。 The film-forming composition of the present invention may contain other components such as a leveling agent, a surfactant, and a crosslinking agent as long as the effects of the present invention are not impaired. In particular, it is preferable that a crosslinking agent is included for the purpose of increasing the hardness of the thin film obtained from the composition.
界面活性剤としては、例えば、ポリオキシエチレンラウリルエーテル、ポリオキシエチレンステアリルエーテル、ポリオキシエチレンセチルエーテル、ポリオキシエチレンオレイルエーテル等のポリオキシエチレンアルキルエーテル類;ポリオキシエチレンオクチルフェノールエーテル、ポリオキシエチレンノニルフェノールエーテル等のポリオキシエチレンアルキルアリルエーテル類;ポリオキシエチレン・ポリオキシプロピレンブロックコポリマー類;ソルビタンモノラウレート、ソルビタンモノパルミテート、ソルビタンモノステアレート、ソルビタンモノオレエート、ソルビタントリオレエート、ソルビタントリステアレート等のソルビタン脂肪酸エステル類;ポリオキシエチレンソルビタンモノラウレート、ポリオキシエチレンソルビタンモノパルミテート、ポリオキシエチレンソルビタンモノステアレート、ポリオキシエチレンソルビタントリオレエート、ポリオキシエチレンソルビタントリステアレート等のポリオキシエチレンソルビタン脂肪酸エステル類等のノニオン系界面活性剤、商品名エフトップEF301、EF303、EF352(三菱マテリアル電子化成(株)製(旧(株)ジェムコ製)、商品名メガファックF171、F173、R−08、R−30(DIC(株)製)、フロラードFC430、FC431(住友スリーエム(株)製)、商品名アサヒガードAG710,サーフロンS−382、SC101、SC102、SC103、SC104、SC105、SC106(旭硝子(株)製)等のフッ素系界面活性剤、オルガノシロキサンポリマーKP341(信越化学工業(株)製)、BYK−302、BYK−307、BYK−322、BYK−323、BYK−330、BYK−333、BYK−370、BYK−375、BYK−378(ビックケミー・ジャパン(株)製)等が挙げられる。 Examples of the surfactant include polyoxyethylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene cetyl ether, polyoxyethylene oleyl ether; polyoxyethylene octylphenol ether, polyoxyethylene nonylphenol Polyoxyethylene alkyl allyl ethers such as ethers; polyoxyethylene / polyoxypropylene block copolymers; sorbitan monolaurate, sorbitan monopalmitate, sorbitan monostearate, sorbitan monooleate, sorbitan trioleate, sorbitan tristearate Sorbitan fatty acid esters such as polyoxyethylene sorbitan monolaurate, polyoxyethyleneso Nonionic surfactants such as polyoxyethylene sorbitan fatty acid esters such as bitane monopalmitate, polyoxyethylene sorbitan monostearate, polyoxyethylene sorbitan trioleate, polyoxyethylene sorbitan tristearate, trade name EFTOP EF301, EF303, EF352 (Mitsubishi Materials Electronic Chemicals Co., Ltd. (formerly Gemco Co., Ltd.), trade names MegaFuck F171, F173, R-08, R-30 (DIC Co., Ltd.), Florard FC430, FC431 (Sumitomo) Fluorosurfactants such as 3M Co., Ltd., trade names Asahi Guard AG710, Surflon S-382, SC101, SC102, SC103, SC104, SC105, SC106 (Asahi Glass Co., Ltd.), and organosiloxane polymers P341 (manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-302, BYK-307, BYK-322, BYK-323, BYK-330, BYK-333, BYK-370, BYK-375, BYK-378 (BIC Chemie Japan) Etc.).
これらの界面活性剤は、単独で使用しても、2種以上組み合わせて使用してもよい。界面活性剤の使用量は、重合体100質量部に対して0.0001〜5質量部が好ましく、0.001〜1質量部がより好ましく、0.01〜0.5質量部がより一層好ましい。 These surfactants may be used alone or in combination of two or more. The amount of the surfactant used is preferably 0.0001 to 5 parts by mass, more preferably 0.001 to 1 part by mass, and still more preferably 0.01 to 0.5 parts by mass with respect to 100 parts by mass of the polymer. .
架橋剤としては、本発明のハイパーブランチポリマーと反応し得る置換基を有する化合物であれば特に限定されるものではない。 The crosslinking agent is not particularly limited as long as it is a compound having a substituent capable of reacting with the hyperbranched polymer of the present invention.
そのような化合物としては、メチロール基、メトキシメチル基などの架橋形成置換基を有するメラミン系化合物、置換尿素系化合物、エポキシ基またはオキセタン基などの架橋形成置換基を含有する化合物、イソシアナート基を有する化合物、ブロック化イソシアナート基を含有する化合物、酸無水物を有する化合物、(メタ)アクリル基を有する化合物、フェノプラスト化合物等が挙げられるが、耐熱性や保存安定性の観点からエポキシ基、ブロックイソシアネート基、(メタ)アクリル基を含有する化合物が好ましい。 Examples of such compounds include melamine compounds having a crosslinkable substituent such as a methylol group and a methoxymethyl group, substituted urea compounds, compounds containing a crosslinkable substituent such as an epoxy group or an oxetane group, and isocyanate groups. A compound having a blocked isocyanate group, a compound having an acid anhydride, a compound having a (meth) acryl group, a phenoplast compound, etc., from the viewpoint of heat resistance and storage stability, an epoxy group, A compound containing a blocked isocyanate group or a (meth) acryl group is preferred.
また、ブロックイソシアネート基は、尿素結合で架橋し、カルボニル基を有するため屈折率が低下しないという点や、低温硬化性および厚膜形成という点から、好適である。 Further, the blocked isocyanate group is preferable from the viewpoint that the refractive index does not decrease because it is crosslinked by a urea bond and has a carbonyl group, and low temperature curability and thick film formation.
なお、これらの化合物は、ポリマーの末端処理に用いる場合は少なくとも1個の架橋形成置換基を有していればよく、ポリマー同士の架橋処理に用いる場合は少なくとも2個の架橋形成置換基を有する必要がある。 These compounds only need to have at least one cross-linking substituent when used for polymer terminal treatment, and have at least two cross-linking substituents when used for cross-linking treatment between polymers. There is a need.
エポキシ化合物としては、エポキシ基を一分子中2個以上有し、熱硬化時の高温に曝されると、エポキシが開環し、本発明のハイパーブランチポリマーとの間で付加反応により架橋反応が進行するものである。 As an epoxy compound, it has two or more epoxy groups in one molecule, and when exposed to a high temperature during thermosetting, the epoxy is ring-opened, and a crosslinking reaction is caused by an addition reaction with the hyperbranched polymer of the present invention. It is a progression.
架橋剤の具体例としては、トリス(2,3−エポキシプロピル)イソシアヌレート、1,4−ブタンジオールジグリシジルエーテル、1,2−エポキシ−4−(エポキシエチル)シクロヘキサン、グリセロールトリグリシジルエーテル、ジエチレングリコールジグリシジルエーテル、2,6−ジグリシジルフェニルグリシジルエーテル、1,1,3−トリス[p−(2,3−エポキシプロポキシ)フェニル]プロパン、1,2−シクロヘキサンジカルボン酸ジグリシジルエステル、4,4’−メチレンビス(N,N−ジグリシジルアニリン)、3,4−エポキシシクロヘキシルメチル−3,4−エポキシシクロヘキサンカルボキシレート、トリメチロールエタントリグリシジルエーテル、ビスフェノール−A−ジグリシジルエーテル、ペンタエリスリトールポリグリシジルエーテル等が挙げられる。 Specific examples of the crosslinking agent include tris (2,3-epoxypropyl) isocyanurate, 1,4-butanediol diglycidyl ether, 1,2-epoxy-4- (epoxyethyl) cyclohexane, glycerol triglycidyl ether, diethylene glycol Diglycidyl ether, 2,6-diglycidylphenyl glycidyl ether, 1,1,3-tris [p- (2,3-epoxypropoxy) phenyl] propane, 1,2-cyclohexanedicarboxylic acid diglycidyl ester, 4,4 '-Methylenebis (N, N-diglycidylaniline), 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, trimethylolethane triglycidyl ether, bisphenol-A-diglycidyl ether, penta Risuri Toll polyglycidyl ether, and the like.
また、市販品として、少なくとも2個のエポキシ基を有するエポキシ樹脂である、YH−434、YH434L(東都化成(株)製)、シクロヘキセンオキサイド構造を有するエポキシ樹脂である、エポリードGT−401、同GT−403、同GT−301、同GT−302、セロキサイド2021、セロキサイド3000(ダイセル化学工業(株)製)、ビスフェノールA型エポキシ樹脂である、エピコート(現、jER)1001、同1002、同1003、同1004、同1007、同1009、同1010、同828(以上、ジャパンエポキシレジン(株)製)、ビスフェノールF型エポキシ樹脂である、エピコート(現、jER)807(ジャパンエポキシレジン(株)製)、フェノールノボラック型エポキシ樹脂である、エピコート(現、jER)152、同154(以上、ジャパンエポキシレジン(株)製)、EPPN201、同202(以上、日本化薬(株)製)、クレゾールノボラック型エポキシ樹脂である、EOCN−102、EOCN−103S、EOCN−104S、EOCN−1020、EOCN−1025、EOCN−1027(以上、日本化薬(株)製)、エピコート(現、jER)180S75(ジャパンエポキシレジン(株)製)、脂環式エポキシ樹脂である、デナコールEX−252(ナガセケムテックス(株)製)、CY175、CY177、CY179(以上、CIBA−GEIGYA.G製)、アラルダイトCY−182、同CY−192、同CY−184(以上、CIBA−GEIGY A.G製)、エピクロン200、同400(以上、DIC(株)製)、エピコート(現、jER)871、同872(以上、ジャパンエポキシレジン(株)製)、ED−5661、ED−5662(以上、セラニーズコーティング(株)製)、脂肪族ポリグリシジルエーテルである、デナコールEX−611、同EX−612、同EX−614、同EX−622、同EX−411、同EX−512、同EX−522、同EX−421、同EX−313、同EX−314、同EX−321(ナガセケムテックス(株)製)等を用いることもできる。 In addition, as commercially available products, epoxy resins having at least two epoxy groups, YH-434, YH434L (manufactured by Tohto Kasei Co., Ltd.), epoxy resins having a cyclohexene oxide structure, Epolide GT-401 and GT -403, GT-301, GT-302, Celoxide 2021, Celoxide 3000 (manufactured by Daicel Chemical Industries, Ltd.), bisphenol A type epoxy resin, Epicoat (currently jER) 1001, 1002, 1003, 1004, 1007, 1009, 1010, 828 (Japan Epoxy Resin Co., Ltd.), Bisphenol F type epoxy resin, Epicoat (currently jER) 807 (Japan Epoxy Resin Co., Ltd.) , Phenol novolac type epoxy resin, epi EOCN-102, which is a cresol novolac type epoxy resin. EOCN-103S, EOCN-104S, EOCN-1020, EOCN-1025, EOCN-1027 (manufactured by Nippon Kayaku Co., Ltd.), Epicort (currently jER) 180S75 (manufactured by Japan Epoxy Resin Co., Ltd.) Cyclic epoxy resin, Denacol EX-252 (manufactured by Nagase ChemteX Corporation), CY175, CY177, CY179 (above, manufactured by CIBA-GEIGYA.G), Araldite CY-182, CY-192, CY- 184 (above, CIBA-GEIGY AG), Epicron 200, 400 (below) DIC Co., Ltd.), Epicort (currently jER) 871, 872 (above, Japan Epoxy Resin Co., Ltd.), ED-5661, ED-5862 (above, Celanese Coating Co., Ltd.), fat Group polyglycidyl ether, Denacol EX-611, EX-612, EX-614, EX-622, EX-411, EX-512, EX-522, EX-421, EX- 313, EX-314, EX-321 (manufactured by Nagase ChemteX Corporation), and the like can also be used.
酸無水物化合物としては、2分子のカルボン酸を脱水縮合させたカルボン酸無水物であり、熱硬化の際の高温に曝されると、無水物環が開環し、本発明のハイパーブランチポリマーとの間で付加反応により架橋反応が進行するものである。 The acid anhydride compound is a carboxylic acid anhydride obtained by dehydrating and condensing two molecules of carboxylic acid. When exposed to a high temperature during thermosetting, the anhydride ring is opened and the hyperbranched polymer of the present invention is used. The cross-linking reaction proceeds with an addition reaction.
また、酸無水物化合物の具体例としては、無水フタル酸、テトラヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、無水ナジック酸、無水メチルナジック酸、無水マレイン酸、無水コハク酸、オクチル無水コハク酸、ドデセニル無水コハク酸等の分子内に1個の酸無水物基を有するもの;1,2,3,4−シクロブタンテトラカルボン酸二無水物、ピロメリット酸無水物、3,4−ジカルボキシ−1,2,3,4−テトラヒドロ−1−ナフタレンコハク酸二無水物、ビシクロ[3.3.0]オクタン−2,4,6,8−テトラカルボン酸二無水物、5−(2,5−ジオキソテトラヒドロ−3−フラニル)−3−メチル−3−シクロヘキセン−1,2−ジカルボン酸無水物、1,2,3,4−ブタンテトラカルボン酸二無水物、3,3’,4,4’−ベンゾフェノンテトラカルボン酸二無水物、3,3’,4,4’−ビフェニルテトラカルボン酸二無水物、2,2−ビス(3,4−ジカルボキシフェニル)ヘキサフルオロプロパン二無水物、1,3−ジメチル−1,2,3,4−シクロブタンテトラカルボン酸二無水物等の分子内に2個の酸無水物基を有するもの等が挙げられる。 Specific examples of the acid anhydride compound include phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, nadic anhydride, methyl nadic anhydride, maleic anhydride. Acid, succinic anhydride, octyl succinic anhydride, dodecenyl succinic anhydride and the like having one acid anhydride group in the molecule; 1,2,3,4-cyclobutanetetracarboxylic dianhydride, pyromellitic acid Anhydride, 3,4-dicarboxy-1,2,3,4-tetrahydro-1-naphthalene succinic dianhydride, bicyclo [3.3.0] octane-2,4,6,8-tetracarboxylic acid Dianhydride, 5- (2,5-dioxotetrahydro-3-furanyl) -3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride 1,2,3,4-butanetetracarboxylic dianhydride, 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride, 1,3-dimethyl-1,2,3,4-cyclobutanetetracarboxylic dianhydride And those having one acid anhydride group.
(メタ)アクリル化合物としては、(メタ)アクリル基を一分子中2個以上有し、そして熱硬化時の高温に曝されると、本発明のハイパーブランチポリマーとの間で付加反応により架橋反応が進行するものである。 The (meth) acrylic compound has two or more (meth) acrylic groups in one molecule, and when exposed to a high temperature during thermosetting, it undergoes a crosslinking reaction with the hyperbranched polymer of the present invention by an addition reaction. Is something that progresses.
(メタ)アクリル基を有する化合物としては、例えば、エチレングリコールジアクリレート、エチレングリコールジメタクリレート、ポリエチレングリコールジアクリレート、ポリエチレングリコールジメタクリレート、エトキシ化ビスフェノールAジアクリレート、エトキシ化ビスフェノールAジメタクリレート、エトキシ化トリメチロールプロパントリアクリレート、エトキシ化トリメチロールプロパントリメタクリレート、エトキシ化グリセリントリアクリレート、エトキシ化グリセリントリメタクリレート、エトキシ化ペンタエリスリトールテトラアクリレート、エトキシ化ペンタエリスリトールテトラメタクリレート、エトキシ化ジペンタエリスリトールヘキサアクリレート、ポリグリセリンモノエチレンオキサイドポリアクリレート、ポリグリセリンポリエチレングリコールポリアクリレート、ジペンタエリスリトールヘキサアクリレート、ジペンタエリスリトールヘキサメタクリレート、ネオペンチルグリコールジアクリレート、ネオペンチルグリコールジメタクリレート、ペンタエリスリトールトリアクリレート、ペンタエリスリトールトリメタクリレート、トリメチロールプロパントリアクリレート、トリメチロールプロパントリメタクリレート、トリシクロデカンジメタノールジアクリレート、トリシクロデカンジメタノールジメタクリレート、1,6−ヘキサンジオールジアクリレート、1,6−ヘキサンジオールジメタクリレート等が挙げられる。 Examples of the compound having a (meth) acryl group include ethylene glycol diacrylate, ethylene glycol dimethacrylate, polyethylene glycol diacrylate, polyethylene glycol dimethacrylate, ethoxylated bisphenol A diacrylate, ethoxylated bisphenol A dimethacrylate, and ethoxylated tri Methylolpropane triacrylate, ethoxylated trimethylolpropane trimethacrylate, ethoxylated glycerin triacrylate, ethoxylated glycerin trimethacrylate, ethoxylated pentaerythritol tetraacrylate, ethoxylated pentaerythritol tetramethacrylate, ethoxylated dipentaerythritol hexaacrylate, polyglycerol mono Ethylene oxide polyacrylate Polyglycerin polyethylene glycol polyacrylate, dipentaerythritol hexaacrylate, dipentaerythritol hexamethacrylate, neopentyl glycol diacrylate, neopentyl glycol dimethacrylate, pentaerythritol triacrylate, pentaerythritol trimethacrylate, trimethylolpropane triacrylate, tri Examples include methylolpropane trimethacrylate, tricyclodecane dimethanol diacrylate, tricyclodecane dimethanol dimethacrylate, 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, and the like.
上記(メタ)アクリル基を有する化合物は、市販品として入手が可能であり、その具体例としては、NKエステルA−200、A−400、A−600、A−1000、A−TMPT、UA−53H、1G、2G、3G、4G、9G、14G、23G、ABE−300、A−BPE−4、A−BPE−6、A−BPE−10、A−BPE−20、A−BPE−30、BPE−80N、BPE−100N、BPE−200、BPE−500、BPE−900、BPE−1300N、A−GLY−3E、A−GLY−9E、A−GLY−20E、A−TMPT−3EO、A−TMPT−9EO、ATM−4E、ATM−35E(以上、新中村化学工業(株)製)、KAYARAD(登録商標)DPEA−12、同PEG400DA、同THE−330、同RP−1040(以上、日本化薬(株)製)、M−210、M−350(以上、東亞合成(株)製)、KAYARAD(登録商標)DPHA、同NPGDA、同PET30(以上、日本化薬(株)製)、NKエステル A−DPH、同A−TMPT、同A−DCP、同A−HD−N、同TMPT、同DCP、同NPG、同HD−N(以上、新中村化学工業(株)製)等が挙げられる。 The compound having the (meth) acrylic group is available as a commercial product, and specific examples thereof include NK ester A-200, A-400, A-600, A-1000, A-TMPT, UA-. 53H, 1G, 2G, 3G, 4G, 9G, 14G, 23G, ABE-300, A-BPE-4, A-BPE-6, A-BPE-10, A-BPE-20, A-BPE-30, BPE-80N, BPE-100N, BPE-200, BPE-500, BPE-900, BPE-1300N, A-GLY-3E, A-GLY-9E, A-GLY-20E, A-TMPT-3EO, A- TMPT-9EO, ATM-4E, ATM-35E (manufactured by Shin-Nakamura Chemical Co., Ltd.), KAYARAD (registered trademark) DPEA-12, PEG400DA, THE-3 0, RP-1040 (above, manufactured by Nippon Kayaku Co., Ltd.), M-210, M-350 (above, manufactured by Toagosei Co., Ltd.), KAYARAD (registered trademark) DPHA, NPGDA, PET30 (above , Nippon Kayaku Co., Ltd.), NK ester A-DPH, A-TMPT, A-DCP, A-HD-N, TMPT, DCP, NPG, HD-N (above, new) Nakamura Chemical Co., Ltd.).
ブロック化イソシアネート基を含有する化合物としては、イソシアネート基(−NCO)が適当な保護基によりブロックされたブロック化イソシアネート基を一分子中2個以上有し、熱硬化時の高温に曝されると、保護基(ブロック部分)が熱解離して外れ、生じたイソシアネート基が本発明のハイパーブランチポリマーとの間で架橋反応を起こすものであり、例えば、下記式で示される基を一分子中2個以上(なお、これらの基は同一のものでも、また各々異なっているものでもよい)有する化合物が挙げられる。 As a compound containing a blocked isocyanate group, when the isocyanate group (—NCO) has two or more blocked isocyanate groups blocked by an appropriate protective group in one molecule, and is exposed to a high temperature during thermosetting , The protecting group (block part) is dissociated by thermal dissociation, and the resulting isocyanate group causes a crosslinking reaction with the hyperbranched polymer of the present invention. Examples thereof include compounds having at least one group (these groups may be the same or different from each other).
(式中、Rbはブロック部の有機基を表す。)
このような化合物は、例えば、一分子中2個以上のイソシアネート基を有する化合物に対して適当なブロック剤を反応させて得ることができる。
(In formula, Rb represents the organic group of a block part.)
Such a compound can be obtained, for example, by reacting an appropriate blocking agent with a compound having two or more isocyanate groups in one molecule.
一分子中2個以上のイソシアネート基を有する化合物としては、例えば、イソホロンジイソシアネート、1,6−ヘキサメチレンジイソシアネート、メチレンビス(4−シクロヘキシルイソシアネート)、トリメチルヘキサメチレンジイソシアネートのポリイソシアネートや、これらの二量体、三量体、および、これらとジオール類、トリオール類、ジアミン類、またはトリアミン類との反応物などが挙げられる。 Examples of the compound having two or more isocyanate groups in one molecule include, for example, isophorone diisocyanate, 1,6-hexamethylene diisocyanate, methylene bis (4-cyclohexyl isocyanate), polyisocyanate of trimethylhexamethylene diisocyanate, and dimers thereof. , Trimers, and reaction products of these with diols, triols, diamines, or triamines.
ブロック剤としては、例えば、メタノール、エタノール、イソプロパノール、n−ブタノール、2−エトキシヘキサノール、2−N,N−ジメチルアミノエタノール、2−エトキシエタノール、シクロヘキサノール等のアルコール類;フェノール、o−ニトロフェノール、p−クロロフェノール、o−、m−またはp−クレゾール等のフェノール類;ε−カプロラクタム等のラクタム類、アセトンオキシム、メチルエチルケトンオキシム、メチルイソブチルケトンオキシム、シクロヘキサノンオキシム、アセトフェノンオキシム、ベンゾフェノンオキシム等のオキシム類;ピラゾール、3,5−ジメチルピラゾール、3−メチルピラゾール等のピラゾール類;ドデカンチオール、ベンゼンチオール等のチオール類などが挙げられる。 Examples of the blocking agent include alcohols such as methanol, ethanol, isopropanol, n-butanol, 2-ethoxyhexanol, 2-N, N-dimethylaminoethanol, 2-ethoxyethanol, and cyclohexanol; phenol and o-nitrophenol. , P-chlorophenol, phenols such as o-, m- or p-cresol; lactams such as ε-caprolactam, oximes such as acetone oxime, methyl ethyl ketone oxime, methyl isobutyl ketone oxime, cyclohexanone oxime, acetophenone oxime, benzophenone oxime And pyrazoles such as pyrazole, 3,5-dimethylpyrazole and 3-methylpyrazole; thiols such as dodecanethiol and benzenethiol.
ブロック化イソシアネート基を含有する化合物は、市販品としても入手が可能であり、その具体例としては、B−830、B−815N、B−842N、B−870N、B−874N、B−882N、B−7005、B−7030、B−7075、B−5010(以上、三井化学(株)製)、デュラネート(登録商標)17B−60PX、同TPA−B80E、同MF−B60X、同MF−K60X、同E402−B80T(以上、旭化成ケミカルズ(株)製)、カレンズ(登録商標)MOI−BM、同MOI−BP(以上、昭和電工(株)製)等が挙げられる。 The compound containing a blocked isocyanate group is also available as a commercial product. Specific examples thereof include B-830, B-815N, B-842N, B-870N, B-874N, B-882N, B-7005, B-7030, B-7075, B-5010 (Mitsui Chemicals, Inc.), Duranate (registered trademark) 17B-60PX, TPA-B80E, MF-B60X, MF-K60X, E402-B80T (above, manufactured by Asahi Kasei Chemicals Corporation), Karenz (registered trademark) MOI-BM, MOI-BP (above, Showa Denko Co., Ltd.) and the like.
イソシアナート基を有する化合物としては、上述した一分子中2個以上のイソシアネート基を有する化合物が挙げられるが、特にイソシアヌレート型の多官能イソシアネート化合物が好適である。このような化合物も、市販品として入手が可能であり、例えば、デュラネート(登録商標)24A−100、22A−75P、21S−75E、TPA−100、TKA−100、MFA−75B、MHG−80B、TLA−100、TSE−100、TSA−100、TSS−100、TSE−100、P301−75E、E402−80B、E405−70B、AE700−100、D101、D201、A201H等が挙げられる。 Examples of the compound having an isocyanate group include the above-described compounds having two or more isocyanate groups in one molecule, but isocyanurate type polyfunctional isocyanate compounds are particularly suitable. Such a compound is also available as a commercial product. For example, Duranate (registered trademark) 24A-100, 22A-75P, 21S-75E, TPA-100, TKA-100, MFA-75B, MHG-80B, TLA-100, TSE-100, TSA-100, TSS-100, TSE-100, P301-75E, E402-80B, E405-70B, AE700-100, D101, D201, A201H, etc. are mentioned.
アミノプラスト化合物としては、メトキシメチレン基を一分子中2個以上有し、そして熱硬化時の高温に曝されると、本発明のハイパーブランチポリマーとの間で脱メタノール縮合反応により架橋反応が進行するものである。 The aminoplast compound has two or more methoxymethylene groups in one molecule, and when exposed to a high temperature during thermosetting, a crosslinking reaction proceeds with the hyperbranched polymer of the present invention by a demethanol condensation reaction. To do.
メラミン系化合物としては、例えば、ヘキサメトキシメチルメラミン CYMEL(登録商標)303、テトラブトキシメチルグリコールウリル 同1170、テトラメトキシメチルベンゾグアナミン 同1123(以上、日本サイテックインダストリーズ(株)製)等のサイメルシリーズ、メチル化メラミン樹脂であるニカラック(登録商標)MW−30HM、同MW−390、同MW−100LM、同MX−750LM、メチル化尿素樹脂である同MX−270、同MX−280、同MX−290(以上、(株)三和ケミカル製)等のニカラックシリーズ等が挙げられる。 Examples of the melamine-based compound include Cymel series such as hexamethoxymethylmelamine CYMEL (registered trademark) 303, tetrabutoxymethylglycoluril 1170, tetramethoxymethylbenzoguanamine 1123 (above, manufactured by Nihon Cytec Industries, Ltd.), Nicalac (registered trademark) MW-30HM, MW-390, MW-100LM, MX-750LM, which are methylated melamine resins, MX-270, MX-280, MX-290, which are methylated urea resins. (Nicarak series, etc., manufactured by Sanwa Chemical Co., Ltd.).
オキセタン化合物としては、オキセタニル基を一分子中2個以上有し、そして熱硬化時の高温に曝されると、本発明のハイパーブランチポリマーとの間で付加反応により架橋反応が進行するものである。 The oxetane compound has two or more oxetanyl groups in one molecule, and when exposed to a high temperature during thermosetting, a crosslinking reaction proceeds with the hyperbranched polymer of the present invention by an addition reaction. .
オキセタン基を有する化合物としては、例えば、オキセタン基を含有するOXT−221、OX−SQ−H、OX−SC(以上、東亜合成(株)製)等が挙げられる。 Examples of the compound having an oxetane group include OXT-221, OX-SQ-H, and OX-SC (manufactured by Toagosei Co., Ltd.) containing an oxetane group.
フェノプラスト化合物としては、ヒドロキシメチレン基を一分子中2個以上有し、そして熱硬化時の高温に曝されると、本発明のハイパーブランチポリマーとの間で脱水縮合反応により架橋反応が進行するものである。 The phenoplast compound has two or more hydroxymethylene groups in one molecule, and when exposed to a high temperature during thermosetting, a crosslinking reaction proceeds with the hyperbranched polymer of the present invention by a dehydration condensation reaction. Is.
フェノプラスト化合物としては、例えば、2,6−ジヒドロキシメチル−4−メチルフェノール、2,4−ジヒドロキシメチル−6−メチルフェノール、ビス(2−ヒドロキシ−3−ヒドロキシメチル−5−メチルフェニル)メタン、ビス(4−ヒドロキシ−3−ヒドロキシメチル−5−メチルフェニル)メタン、2,2−ビス(4−ヒドロキシ−3,5−ジヒドロキシメチルフェニル)プロパン、ビス(3−ホルミル−4−ヒドロキシフェニル)メタン、ビス(4−ヒドロキシ−2,5−ジメチルフェニル)ホルミルメタン、α,α−ビス(4−ヒドロキシ−2,5−ジメチルフェニル)−4−ホルミルトルエン等が挙げられる。 Examples of the phenoplast compound include 2,6-dihydroxymethyl-4-methylphenol, 2,4-dihydroxymethyl-6-methylphenol, bis (2-hydroxy-3-hydroxymethyl-5-methylphenyl) methane, Bis (4-hydroxy-3-hydroxymethyl-5-methylphenyl) methane, 2,2-bis (4-hydroxy-3,5-dihydroxymethylphenyl) propane, bis (3-formyl-4-hydroxyphenyl) methane Bis (4-hydroxy-2,5-dimethylphenyl) formylmethane, α, α-bis (4-hydroxy-2,5-dimethylphenyl) -4-formyltoluene and the like.
フェノプラスト化合物は、市販品としても入手が可能であり、その具体例としては、26DMPC、46DMOC、DM−BIPC−F、DM−BIOC−F、TM−BIP−A、BISA−F、BI25X−DF、BI25X−TPA(以上、旭有機材工業(株)製)等が挙げられる。 The phenoplast compound can also be obtained as a commercial product. Specific examples thereof include 26DMPC, 46DMOC, DM-BIPC-F, DM-BIOC-F, TM-BIP-A, BISA-F, and BI25X-DF. , BI25X-TPA (manufactured by Asahi Organic Materials Co., Ltd.) and the like.
これらの架橋剤は単独で使用しても、2種以上組み合わせて使用してもよい。架橋剤の使用量は、ハイパーブランチポリマー100質量部に対して、1〜100質量部が好ましいが、溶剤耐性を考慮すると、その下限は、好ましくは10質量部、より好ましくは20質量部であり、さらには、屈折率をコントロールすることを考慮すると、その上限は好ましくは50質量部、より好ましくは30質量部である。 These crosslinking agents may be used alone or in combination of two or more. The amount of the crosslinking agent used is preferably 1 to 100 parts by mass with respect to 100 parts by mass of the hyperbranched polymer, but considering the solvent resistance, the lower limit is preferably 10 parts by mass, more preferably 20 parts by mass. Furthermore, in consideration of controlling the refractive index, the upper limit is preferably 50 parts by mass, more preferably 30 parts by mass.
架橋剤を用いることで、架橋剤とハイパーブランチポリマーが有する反応性の活性水素基とが反応し、膜密度の向上、耐熱性の向上、熱緩和能力の向上などの効果を発現できる。 By using the cross-linking agent, the cross-linking agent reacts with the reactive active hydrogen group of the hyperbranched polymer, and effects such as improvement in film density, improvement in heat resistance, and improvement in thermal relaxation ability can be exhibited.
本発明の膜形成用組成物は、基材に塗布し、その後、必要に応じて加熱することで所望の膜を形成することができる。
The film-forming composition of the present invention can be applied to a substrate and then heated as necessary to form a desired film.
組成物の塗布方法は任意であり、例えば、スピンコート法、ディップ法、フローコート法、インクジェット法、スプレー法、バーコート法、グラビアコート法、スリットコート法、ロールコート法、転写印刷法、刷毛塗り、ブレードコート法、エアーナイフコート法等の方法を採用できる。 The coating method of the composition is arbitrary, for example, spin coating method, dip method, flow coating method, ink jet method, spray method, bar coating method, gravure coating method, slit coating method, roll coating method, transfer printing method, brush Methods such as coating, blade coating, and air knife coating can be employed.
また、基材としては、シリコン、インジウム錫酸化物(ITO)が成膜されたガラス、インジウム亜鉛酸化物(IZO)が成膜されたガラス、ポリエチレンテレフタレート(PET)、プラスチック、ガラス、石英、セラミックス等からなる基材を挙げることができ、可撓性を有するフレキシブル基材を用いることもできる。 As the base material, silicon, glass with indium tin oxide (ITO) formed, glass with indium zinc oxide (IZO) formed, polyethylene terephthalate (PET), plastic, glass, quartz, ceramics The base material which consists of etc. can be mentioned, The flexible base material which has flexibility can also be used.
焼成温度は、溶媒を蒸発させる目的では特に限定されないが、例えば40〜400℃で行うことができる。これらの場合、より高い均一製膜性を発現させたり、基材上で反応を進行させたりする目的で2段階以上の温度変化をつけてもよい。 Although a calcination temperature is not specifically limited for the purpose of evaporating a solvent, For example, it can carry out at 40-400 degreeC. In these cases, the temperature may be changed in two or more steps for the purpose of expressing a higher uniform film forming property or allowing the reaction to proceed on the substrate.
焼成方法としては、特に限定されるものではなく、例えば、ホットプレートやオーブンを用いて、大気、窒素等の不活性ガス、真空中等の適切な雰囲気下で蒸発させればよい。 The baking method is not particularly limited, and for example, it may be evaporated using a hot plate or an oven in an appropriate atmosphere such as air, an inert gas such as nitrogen, or in a vacuum.
焼成温度および焼成時間は、目的とする電子デバイスのプロセス工程に適合した条件を選択すればよく、得られる膜の物性値が電子デバイスの要求特性に適合するような焼成条件を選択すればよい。 The firing temperature and firing time may be selected in accordance with the process steps of the target electronic device, and the firing conditions may be selected so that the physical properties of the obtained film meet the required characteristics of the electronic device.
このようにして得られた本発明の組成物からなる膜の厚みは、特に限定されるものではないが、本発明においては、厚膜形成が可能であることもその特徴の1つであり、1000nm以上とすることが可能であり、5μm以上とすることも可能である。 The thickness of the film made of the composition of the present invention thus obtained is not particularly limited, but in the present invention, it is one of the features that a thick film can be formed, It can be 1000 nm or more, and can also be 5 μm or more.
本発明の膜は、高耐熱性、高透明性、高屈折率、高耐光性、高溶解性、低体積収縮率および高耐光性を達成できるため、液晶ディスプレイ、有機エレクトロルミネッセンス(EL)ディスプレイ、光半導体(LED)素子、固体撮像素子、有機薄膜太陽電池、色素増感太陽電池、有機薄膜トランジスタ(TFT)などの電子デバイスを作製する際の一部材や、光学部材として好適に利用できる。 Since the film of the present invention can achieve high heat resistance, high transparency, high refractive index, high light resistance, high solubility, low volume shrinkage, and high light resistance, a liquid crystal display, an organic electroluminescence (EL) display, It can be suitably used as one member or an optical member for producing an electronic device such as an optical semiconductor (LED) element, a solid-state imaging element, an organic thin film solar cell, a dye-sensitized solar cell, or an organic thin film transistor (TFT).
なお、本発明の組成物には、必要に応じてその他の樹脂(熱可塑性樹脂または熱硬化性樹脂)を配合してもよい。 In addition, you may mix | blend other resin (thermoplastic resin or thermosetting resin) with the composition of this invention as needed.
樹脂の具体例としては、特に限定されるものではない。熱可塑性樹脂としては、例えば、PE(ポリエチレン)、PP(ポリプロピレン)、EVA(エチレン−酢酸ビニル共重合体)、EEA(エチレン−アクリル酸エチル共重合体)等のポリオレフィン系樹脂;環状オレフィン樹脂;PS(ポリスチレン)、HIPS(ハイインパクトポリスチレン)、AS(アクリロニトリル−スチレン共重合体)、ABS(アクリロニトリル−ブタジエン−スチレン共重合体)、MS(メタクリル酸メチル−スチレン共重合体)等のポリスチレン系樹脂;ポリカーボネート樹脂;塩化ビニル樹脂;ポリアミド樹脂;ポリイミド樹脂;PMMA(ポリメチルメタクリレート)等の(メタ)アクリル樹脂;PET(ポリエチレンテレフタレート)、ポリブチレンテレフタレート、ポリエチレンナフタレート、ポリブチレンナフタレート、PLA(ポリ乳酸)、ポリ−3−ヒドロキシ酪酸、ポリカプロラクトン、ポリブチレンサクシネート、ポリエチレンサクシネート/アジペート等のポリエステル樹脂;ポリフェニレンエーテル樹脂;変性ポリフェニレンエーテル樹脂;ポリアセタール樹脂;ポリスルホン樹脂;ポリフェニレンサルファイド樹脂;ポリビニルアルコール樹脂;ポリグルコール酸;変性でんぷん;酢酸セルロース、三酢酸セルロース;キチン、キトサン;リグニンなどが挙げられ、熱硬化性樹脂としては、例えば、フェノール樹脂、尿素樹脂、メラミン樹脂、不飽和ポリエステル樹脂、ポリウレタン樹脂、エポキシ樹脂などが挙げられる。 Specific examples of the resin are not particularly limited. Examples of the thermoplastic resin include polyolefin resins such as PE (polyethylene), PP (polypropylene), EVA (ethylene-vinyl acetate copolymer), EEA (ethylene-ethyl acrylate copolymer); cyclic olefin resin; Polystyrene resins such as PS (polystyrene), HIPS (high impact polystyrene), AS (acrylonitrile-styrene copolymer), ABS (acrylonitrile-butadiene-styrene copolymer), MS (methyl methacrylate-styrene copolymer) Polycarbonate resin; polyamide resin; polyimide resin; (meth) acrylic resin such as PMMA (polymethyl methacrylate); PET (polyethylene terephthalate), polybutylene terephthalate, polyethylene naphthalate, poly Polyester resins such as tylene naphthalate, PLA (polylactic acid), poly-3-hydroxybutyric acid, polycaprolactone, polybutylene succinate, polyethylene succinate / adipate; polyphenylene ether resin; modified polyphenylene ether resin; polyacetal resin; Polyphenylene sulfide resin; polyvinyl alcohol resin; polyglycolic acid; modified starch; cellulose acetate, cellulose triacetate; chitin, chitosan; lignin and the like. Examples of thermosetting resins include phenol resin, urea resin, melamine resin, Examples include unsaturated polyester resins, polyurethane resins, and epoxy resins.
これらの樹脂は、単独で用いても、2種以上組み合わせて用いてもよく、その使用量は、上記ハイパーブランチポリマー100質量部に対して、1〜10,000質量部が好ましく、より好ましくは1〜1,000質量部である。 These resins may be used alone or in combination of two or more, and the amount used is preferably 1 to 10,000 parts by mass, more preferably 100 parts by mass of the hyperbranched polymer. 1 to 1,000 parts by mass.
例えば、(メタ)アクリル樹脂との組成物は、(メタ)アクリレート化合物を組成物に配合し、(メタ)アクリレート化合物を重合させて得ることができる。 For example, a composition with a (meth) acrylic resin can be obtained by blending a (meth) acrylate compound into the composition and polymerizing the (meth) acrylate compound.
(メタ)アクリレート化合物の例としては、メチル(メタ)アクリレート、エチル(メタ)アクリレート、エチレングリコールジ(メタ)アクリレート、テトラエチレングリコールジ(メタ)アクリレート、ポリエチレングリコールジ(メタ)アクリレート、プロピレングリコールジ(メタ)アクリレート、ポリプロピレングリコールジ(メタ)アクリレート、1,4−ブタンジオールジ(メタ)アクリレート、1,6−ヘキサンジオールジ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、トリメチロールプロパントリオキシエチル(メタ)アクリレート、トリシクロデカンジメタノールジ(メタ)アクリレート、トリシクロデカニルジ(メタ)アクリレート、トリメチロールプロパントリオキシプロピル(メタ)アクリレート、トリス−2−ヒドロキシエチルイソシアヌレートトリ(メタ)アクリレート、トリス−2−ヒドロキシエチルイソシアヌレートジ(メタ)アクリレート、1,9−ノナンジオールジ(メタ)アクリレート、ペンタエリスリトールジ(メタ)アクリレート、グリセリンメタクリレートアクリレート、ペンタエリスリトールトリ(メタ)アクリレート、トリメチロールプロパントリメタクリレート、(メタ)アクリル酸アリル、(メタ)アクリル酸ビニル、エポキシ(メタ)アクリレート、ポリエステル(メタ)アクリレート、ウレタン(メタ)アクリレート等が挙げられる。 Examples of (meth) acrylate compounds include methyl (meth) acrylate, ethyl (meth) acrylate, ethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, propylene glycol di (Meth) acrylate, polypropylene glycol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate, trimethylolpropane tri Oxyethyl (meth) acrylate, tricyclodecane dimethanol di (meth) acrylate, tricyclodecanyl di (meth) acrylate, trimethylolpropane trioxypropyl (meth) Acrylate, tris-2-hydroxyethyl isocyanurate tri (meth) acrylate, tris-2-hydroxyethyl isocyanurate di (meth) acrylate, 1,9-nonanediol di (meth) acrylate, pentaerythritol di (meth) acrylate, Glycerin methacrylate acrylate, pentaerythritol tri (meth) acrylate, trimethylolpropane trimethacrylate, allyl (meth) acrylate, vinyl (meth) acrylate, epoxy (meth) acrylate, polyester (meth) acrylate, urethane (meth) acrylate, etc. Is mentioned.
これらの(メタ)アクリレート化合物の重合は、光ラジカル重合開始剤や熱ラジカル重合開始剤の存在下、光照射または加熱して行うことができる。 Polymerization of these (meth) acrylate compounds can be carried out by light irradiation or heating in the presence of a photo radical polymerization initiator or a heat radical polymerization initiator.
光ラジカル重合開始剤としては、例えば、アセトフェノン類、ベンゾフェノン類、ミヒラーのベンゾイルベンゾエート、アミロキシムエステル、テトラメチルチウラムモノサルファイドおよびチオキサントン類等が挙げられる。 Examples of the photo radical polymerization initiator include acetophenones, benzophenones, Michler's benzoylbenzoate, amyloxime ester, tetramethylthiuram monosulfide, and thioxanthones.
特に、光開裂型の光ラジカル重合開始剤が好ましい。光開裂型の光ラジカル重合開始剤については、最新UV硬化技術(159頁、発行人:高薄一弘、発行所:(株)技術情報協会、1991年発行)に記載されている。 In particular, photocleavable photoradical polymerization initiators are preferred. The photocleavable photoradical polymerization initiator is described in the latest UV curing technology (p. 159, publisher: Kazuhiro Takahisa, publisher: Technical Information Association, Inc., published in 1991).
市販の光ラジカル重合開始剤としては、例えば、BASF社製 商品名:イルガキュア 184、369、651、500、819、907、784、2959、商品名:CGI1700、CGI1750、CGI1850、CG24−61、商品名:ダロキュア 1116、1173、商品名:ルシリン TPO、UCB社製 商品名:ユベクリル P36、フラテツリ・ランベルティ社製 商品名:エザキュアー KIP150、KIP65LT、KIP100F、KT37、KT55、KTO46、KIP75/B等が挙げられる。 Commercially available radical photopolymerization initiators include, for example, BASF Corporation trade names: Irgacure 184, 369, 651, 500, 819, 907, 784, 2959, trade names: CGI 1700, CGI 1750, CGI 1850, CG 24-61, trade names : Darocur 1116, 1173, trade name: Lucyrin TPO, manufactured by UCB trade name: Ubekrill P36, manufactured by Fratteri Lamberti trade name: Ezacure KIP150, KIP65LT, KIP100F, KT37, KT55, KTO46, KIP75 / B, etc. .
光ラジカル重合開始剤は、(メタ)アクリレート化合物100質量部に対して、0.1〜15質部の範囲で使用することが好ましく、より好ましくは1〜10質量部の範囲である。 The radical photopolymerization initiator is preferably used in the range of 0.1 to 15 parts by mass, more preferably in the range of 1 to 10 parts by mass with respect to 100 parts by mass of the (meth) acrylate compound.
重合に用いる溶剤は、上記膜形成用組成物で例示した溶剤と同様のものが挙げられる。 Examples of the solvent used for the polymerization include the same solvents as those exemplified above for the film-forming composition.
以下、実施例を挙げて、本発明をより具体的に説明するが、本発明は下記の実施例に限定されるものではない。なお、実施例で用いた各測定装置は以下のとおりである。
[1H−NMR]
装置:JEOL−ECX300(300MHz)
測定溶媒:DMSO−d6
基準物質:テトラメチルシラン(TMS)(δ0.0ppm)
[GPC]
装置:東ソー(株)製 HLC−8320 GPC
カラム:東ソー(株) SuperAW5000+SUPER AW4000
カラム温度:40℃
溶媒:10mMLiCl添加N-メチルピロリドン
検出器:UV(254nm)
検量線:標準ポリスチレン
[紫外線可視分光光度計]
装置:(株)日本分光社製 V−670
[エリプソメーター]
装置:ジェー・エー・ウーラム・ジャパン製 多入射角分光エリプソメーターVASE
[示差熱天秤(TG−DTA)]
装置:(株)リガク製 TG−8120
昇温速度:15℃/分
測定温度:25℃−500℃
[耐光性試験]
装置:Q‐LabCorporation製 Q−Sun Xe−1
照度:0.55W/cm2 (@340nm)
ブラックパネル温度:80℃
[耐熱性試験]
装置:東京理化器械株式会社製 VOS−201SD
温度:150℃
雰囲気:空気
[1]トリアジン環含有ハイパーブランチポリマーの合成1
[合成例1]
EXAMPLES Hereinafter, although an Example is given and this invention is demonstrated more concretely, this invention is not limited to the following Example. In addition, each measuring apparatus used in the Example is as follows.
[ 1 H-NMR]
Equipment: JEOL-ECX300 (300 MHz)
Measuring solvent: DMSO-d 6
Reference substance: Tetramethylsilane (TMS) (δ0.0ppm)
[GPC]
Equipment: HLC-8320 GPC manufactured by Tosoh Corporation
Column: Tosoh Corporation Super AW5000 + SUPER AW4000
Column temperature: 40 ° C
Solvent: 10 mM LiCl added N-methylpyrrolidone Detector: UV (254 nm)
Calibration curve: Standard polystyrene [UV-visible spectrophotometer]
Apparatus: V-670 manufactured by JASCO Corporation
[Ellipsometer]
Apparatus: Multi-angle-of-incidence spectroscopic ellipsometer VASE manufactured by JA Woollam Japan
[Differential thermal balance (TG-DTA)]
Device: TG-8120, manufactured by Rigaku Corporation
Temperature increase rate: 15 ° C / min Measurement temperature: 25 ° C-500 ° C
[Light resistance test]
Device: Q-Sun Xe-1 manufactured by Q-Lab Corporation
Illuminance: 0.55 W / cm 2 (@ 340 nm)
Black panel temperature: 80 ° C
[Heat resistance test]
Equipment: VOS-201SD manufactured by Tokyo Rika Kikai Co., Ltd.
Temperature: 150 ° C
Atmosphere: Air [1] Synthesis of hyperbranched polymer containing triazine ring 1
[Synthesis Example 1]
300mL四口フラスコに、N,N−ジメチルアセトアミド(DMAc)41.8gを入れ、窒素下、−20℃に冷却した。これに2,4,6−トリクロロ−1,3,5−トリアジン(TCTA)10.0g[0.054mol、エボニック・デグサ社製]を溶解させた。これにイソホロンジアミン(IDA)6.00g[0.035mol、東京化成工業(株)製]をDMAc5.0gに溶解したものを加えた後、ノルボルナンジアミン(NBDA)5.44g[0.035mol、三井化学ファイン(株)製]をDMAc5.0gに溶解させたものを加えた。この反応液を100℃に加熱して1時間反応を行った後、DL−1−アミノ−2−プロパノール(MIPA)12.2g[0.163mol、東京化成工業(株)製]をDMAc12.2gに溶解させたものを加えて、100℃にてさらに1時間反応を行った。反応系を室温に戻し、イオン交換水514gに加えて再沈殿を行った。沈殿物をろ過し、ろ過物をTHF38.7gに再溶解し、イオン交換水514gに加えて再度、再沈殿を行った。得られた固形物を減圧乾燥し、目的のハイパーブランチポリマー(以下、TNI−Aと略す)10.9gを得た。TNI−AのGPCによるポリスチレン換算で測定される重量平均分子量Mwは4,900、多分散度Mw/Mnは1.93であった。得られたTID−A 5mgを白金パンに加え、TG−DTAにより昇温速度10℃/minで測定を行ったところ、5%重量減少は311℃であった。得られたTNI−Aを10wt%となるように、1−メトキシ−2−プロパノール(PGME)に溶解させたところ、均一に溶解した。
[2]トリアジン環含有ハイパーブランチポリマーの合成2
[合成例2]
300mL四口フラスコに、N,N−ジメチルアセトアミド(DMAc)41.8gを入れ、窒素下、−20℃に冷却した。これに2,4,6−トリクロロ−1,3,5−トリアジン 10.0g[0.054mol、エボニック・デグサ社製]を溶解させた。これにイソホロンジアミン3.60g[0.021mol、エボニック・デグサ社製]をDMAc5.0gに溶解したものを加えた後、ノルボルナンジアミン7.61g[0.049mol、三井化学ファイン(株)製]をDMAc5.0gに溶解させたものを加えた。この反応液を100℃に加熱して1時間反応を行った後、DL−1−アミノ−2−プロパノール12.2g[0.163mol、三井化学ファイン(株)製]をDMAc12.2gに溶解させたものを加えて、100℃にてさらに1時間反応を行った。反応系を室温に戻し、イオン交換水514gに加えて再沈殿を行った。沈殿物をろ過し、ろ過物をTHF38.7gに再溶解し、28%アンモニア水8.13gを含むイオン交換水514gに加えて再度、再沈殿を行った。得られた固形物を減圧乾燥し、目的のハイパーブランチポリマー9.38gを得た。TNI−AのGPCによるポリスチレン換算で測定される重量平均分子量Mwは6,700、多分散度Mw/Mnは2.56であった。得られたポリマー5mgを白金パンに加え、TG−DTAにより昇温速度10℃/minで測定を行ったところ、5%重量減少は301℃であった。得られたTNI−Aを10wt%となるようPGMEに溶解させたところ、均一に溶解した。
[3]トリアジン環含有ハイパーブランチポリマーの合成3
[比較合成例1]
300mL四口フラスコに、N,N−ジメチルアセトアミド(DMAc)41.8gを入れ、窒素下、−20℃に冷却した。これに2,4,6−トリクロロ−1,3,5−トリアジン 10.0g[0.054mol、エボニック・デグサ社製]を溶解させた。これにノルボルナンジアミン10.88g[0.070mol、三井化学ファイン(株)製]をDMAc10.0gに溶解させたものを加えた。この反応液を100℃に加熱して1時間反応を行った後、DL−1−アミノ−2−プロパノール12.2g[0.163mol、東京化成工業(株)製]をDMAc12.2gに溶解させたものを加えて、100℃にてさらに1時間反応を行った。反応系を室温に戻し、イオン交換水514gに加えて再沈殿を行った。沈殿物をろ過し、ろ過物をTHF38.7gに再溶解し、イオン交換水514gに加えて再度、再沈殿を行った。得られた固形物を120℃で8時間減圧乾燥し、目的のハイパーブランチポリマー10.04gを得た。しかしながら、すべての溶媒に不溶であったため、分子量等の測定は行えなかった。得られたポリマー5mgを白金パンに加え、TG−DTAにより昇温速度10℃/minで測定を行ったところ、5%重量減少は334℃であった。
[4]トリアジン環含有ハイパーブランチポリマーの合成4
[合成例3]
300mL四口フラスコに、N,N−ジメチルアセトアミド(DMAc)41.8gを入れ、窒素下、−20℃に冷却した。これに2,4,6−トリクロロ−1,3,5−トリアジン 10.0g[0.054mol、エボニック・デグサ社製]を溶解させた。これにイソホロンジアミン2.40g[0.014mol、エボニック・デグサ社製]をDMAc5.0gに溶解したものを加えた後、ノルボルナンジアミン8.70g[0.056mol、三井化学ファイン(株)製]をDMAc5.0gに溶解させたものを加えた。この反応液を100℃に加熱して1時間反応を行った後、DL−1−アミノ−2−プロパノール12.2g[0.163mol、三井化学ファイン(株)製]をDMAc12.2gに溶解させたものを加えて、100℃にてさらに1時間反応を行った。反応系を室温に戻し、イオン交換水514gに加えて再沈殿を行った。沈殿物をろ過し、ろ過物をTHF38.7gに再溶解し、イオン交換水514gに加えて再度、再沈殿を行った。得られた固形物を減圧乾燥し、目的のハイパーブランチポリマー9.45gを得た。GPCによるポリスチレン換算で測定される重量平均分子量Mwは7,600、多分散度Mw/Mnは2.56であった。得られたポリマー5mgを白金パンに加え、TG−DTAにより昇温速度10℃/minで測定を行ったところ、5%重量減少は302℃であった。尚、本合成例で得られたポリマーをPGMEに溶解させると散乱を生じた。
[5]トリアジン環含有ハイパーブランチポリマーの合成5
[比較合成例2]
300mL四口フラスコに、N,N−ジメチルアセトアミド(DMAc)80.4gを入れ、窒素下、−20℃に冷却した。これに2,4,6−トリクロロ−1,3,5−トリアジン 10.0g[0.054mol、エボニック・デグサ社製]を溶解させた。これに、ノルボルナンジアミン25.1g[0.163mol、三井化学ファイン(株)製]をDMAc43.3gに溶解させたものを加えた。この反応液を100℃に加熱して1時間反応を行った後、DL−1−アミノ−2−プロパノール16.3g[0.217mol、三井化学ファイン(株)製]を加えて、100℃にてさらに1時間反応を行った。反応系を室温に戻し、イオン交換水742gに加えて再沈殿を行った。沈殿物をろ過し、ろ過物をPGME94.6gに再溶解し、イオン交換水850gに加えて再度、再沈殿を行った。得られた固形物を減圧乾燥し、目的のハイパーブランチポリマー14.2gを得た。GPCによるポリスチレン換算で測定される重量平均分子量Mwは7,700、多分散度Mw/Mnは2.63であった。得られたポリマー5mgを白金パンに加え、TG−DTAにより昇温速度10℃/minで測定を行ったところ、5%重量減少は386℃であった。尚、本合成例で得られたポリマーを10wt%となるように、PGMEに溶解させたところ、均一に溶解した。
A 300 mL four-necked flask was charged with 41.8 g of N, N-dimethylacetamide (DMAc) and cooled to −20 ° C. under nitrogen. To this, 10.0 g of 2,4,6-trichloro-1,3,5-triazine (TCTA) [0.054 mol, manufactured by Evonik Degussa] was dissolved. A solution prepared by dissolving 6.00 g of isophorone diamine (IDA) [0.035 mol, manufactured by Tokyo Chemical Industry Co., Ltd.] in 5.0 g of DMAc was added thereto, and then 5.44 g of norbornane diamine (NBDA) [0.035 mol, Mitsui]. Chemical Fine Co., Ltd.] dissolved in DMAc 5.0 g was added. After the reaction solution was heated to 100 ° C. and reacted for 1 hour, 12.1 g of DL-1-amino-2-propanol (MIPA) [0.163 mol, manufactured by Tokyo Chemical Industry Co., Ltd.] was added to 12.2 g of DMAc. What was melt | dissolved in was added, and reaction was further performed at 100 degreeC for 1 hour. The reaction system was returned to room temperature and reprecipitated by adding to 514 g of ion-exchanged water. The precipitate was filtered, the filtrate was redissolved in 38.7 g of THF, added to 514 g of ion-exchanged water, and reprecipitated again. The obtained solid was dried under reduced pressure to obtain 10.9 g of a target hyperbranched polymer (hereinafter abbreviated as TNI-A). The weight average molecular weight Mw measured by GPC of TNI-A in terms of polystyrene was 4,900, and the polydispersity Mw / Mn was 1.93. When 5 mg of the obtained TID-A was added to a platinum pan and measured with TG-DTA at a heating rate of 10 ° C./min, the 5% weight loss was 311 ° C. When the obtained TNI-A was dissolved in 1-methoxy-2-propanol (PGME) so as to be 10 wt%, it was uniformly dissolved.
[2] Synthesis of triazine ring-containing hyperbranched polymer 2
[Synthesis Example 2]
A 300 mL four-necked flask was charged with 41.8 g of N, N-dimethylacetamide (DMAc) and cooled to −20 ° C. under nitrogen. To this, 10.0 g of 2,4,6-trichloro-1,3,5-triazine [0.054 mol, manufactured by Evonik Degussa] was dissolved. To this was added isophoronediamine 3.60 g [0.021 mol, manufactured by Evonik Degussa] dissolved in DMAc 5.0 g, and then norbornanediamine 7.61 g [0.049 mol, manufactured by Mitsui Chemicals Fine Co., Ltd.] What was dissolved in 5.0 g of DMAc was added. After the reaction solution was heated to 100 ° C. and reacted for 1 hour, 12.1 g of DL-1-amino-2-propanol [0.163 mol, manufactured by Mitsui Chemicals Fine Co., Ltd.] was dissolved in 12.2 g of DMAc. Was added and the reaction was further carried out at 100 ° C. for 1 hour. The reaction system was returned to room temperature and reprecipitated by adding to 514 g of ion-exchanged water. The precipitate was filtered, the filtrate was redissolved in 38.7 g of THF, added to 514 g of ion-exchanged water containing 8.13 g of 28% ammonia water, and reprecipitated again. The obtained solid was dried under reduced pressure to obtain 9.38 g of the desired hyperbranched polymer. The weight average molecular weight Mw measured by GPC of TNI-A in terms of polystyrene was 6,700, and the polydispersity Mw / Mn was 2.56. When 5 mg of the obtained polymer was added to a platinum pan and measured with TG-DTA at a heating rate of 10 ° C./min, the 5% weight loss was 301 ° C. When the obtained TNI-A was dissolved in PGME so that it might become 10 wt%, it melt | dissolved uniformly.
[3] Synthesis of triazine ring-containing hyperbranched polymer 3
[Comparative Synthesis Example 1]
A 300 mL four-necked flask was charged with 41.8 g of N, N-dimethylacetamide (DMAc) and cooled to −20 ° C. under nitrogen. To this, 10.0 g of 2,4,6-trichloro-1,3,5-triazine [0.054 mol, manufactured by Evonik Degussa] was dissolved. A solution prepared by dissolving 10.88 g of norbornanediamine [0.070 mol, manufactured by Mitsui Chemicals Fine Co., Ltd.] in 10.0 g of DMAc was added thereto. After the reaction solution was heated to 100 ° C. and reacted for 1 hour, 12.1 g of DL-1-amino-2-propanol [0.163 mol, manufactured by Tokyo Chemical Industry Co., Ltd.] was dissolved in 12.2 g of DMAc. Was added and the reaction was further carried out at 100 ° C. for 1 hour. The reaction system was returned to room temperature and reprecipitated by adding to 514 g of ion-exchanged water. The precipitate was filtered, the filtrate was redissolved in 38.7 g of THF, added to 514 g of ion-exchanged water, and reprecipitated again. The obtained solid was dried under reduced pressure at 120 ° C. for 8 hours to obtain 10.04 g of the desired hyperbranched polymer. However, since it was insoluble in all solvents, the molecular weight and the like could not be measured. When 5 mg of the obtained polymer was added to a platinum pan and measured with TG-DTA at a heating rate of 10 ° C./min, the 5% weight loss was 334 ° C.
[4] Synthesis of triazine ring-containing hyperbranched polymer 4
[Synthesis Example 3]
A 300 mL four-necked flask was charged with 41.8 g of N, N-dimethylacetamide (DMAc) and cooled to −20 ° C. under nitrogen. To this, 10.0 g of 2,4,6-trichloro-1,3,5-triazine [0.054 mol, manufactured by Evonik Degussa] was dissolved. To this was added 2.40 g of isophoronediamine [0.014 mol, manufactured by Evonik Degussa] dissolved in 5.0 g of DMAc, and then 8.70 g of norbornanediamine [0.056 mol, manufactured by Mitsui Chemicals Fine Co., Ltd.] What was dissolved in 5.0 g of DMAc was added. After the reaction solution was heated to 100 ° C. and reacted for 1 hour, 12.1 g of DL-1-amino-2-propanol [0.163 mol, manufactured by Mitsui Chemicals Fine Co., Ltd.] was dissolved in 12.2 g of DMAc. Was added and the reaction was further carried out at 100 ° C. for 1 hour. The reaction system was returned to room temperature and reprecipitated by adding to 514 g of ion-exchanged water. The precipitate was filtered, the filtrate was redissolved in 38.7 g of THF, added to 514 g of ion-exchanged water, and reprecipitated again. The obtained solid was dried under reduced pressure to obtain 9.45 g of the desired hyperbranched polymer. The weight average molecular weight Mw measured in terms of polystyrene by GPC was 7,600, and the polydispersity Mw / Mn was 2.56. When 5 mg of the obtained polymer was added to a platinum pan and measured with TG-DTA at a heating rate of 10 ° C./min, the 5% weight loss was 302 ° C. When the polymer obtained in this synthesis example was dissolved in PGME, scattering occurred.
[5] Synthesis of triazine ring-containing hyperbranched polymer 5
[Comparative Synthesis Example 2]
A 300 mL four-necked flask was charged with 80.4 g of N, N-dimethylacetamide (DMAc) and cooled to −20 ° C. under nitrogen. To this, 10.0 g of 2,4,6-trichloro-1,3,5-triazine [0.054 mol, manufactured by Evonik Degussa] was dissolved. To this was added norbornanediamine 25.1 g [0.163 mol, manufactured by Mitsui Chemicals Fine Co., Ltd.] dissolved in DMAc 43.3 g. After the reaction solution was heated to 100 ° C. and reacted for 1 hour, 16.3 g of DL-1-amino-2-propanol [0.217 mol, manufactured by Mitsui Chemicals Fine Co., Ltd.] was added, and the temperature was increased to 100 ° C. The reaction was further continued for 1 hour. The reaction system was returned to room temperature and added to 742 g of ion exchanged water for reprecipitation. The precipitate was filtered, the filtrate was redissolved in 94.6 g of PGME, added to 850 g of ion-exchanged water, and reprecipitated again. The obtained solid was dried under reduced pressure to obtain 14.2 g of the desired hyperbranched polymer. The weight average molecular weight Mw measured in terms of polystyrene by GPC was 7,700, and the polydispersity Mw / Mn was 2.63. When 5 mg of the obtained polymer was added to a platinum pan and measured with TG-DTA at a heating rate of 10 ° C./min, the 5% weight loss was 386 ° C. In addition, when the polymer obtained in this synthesis example was dissolved in PGME so as to be 10 wt%, it was uniformly dissolved.
溶解性:PGME(10wt%)に対する溶解性
表1から明らかなように、トリアジン環を含むハイパーブランチポリマーの合成において、ジアミンモノマーとしてNBDA単独では、5%重量減少温度は高くなるもののPGMEには溶解せず(比較合成例1)、またIDAの仕込み比が少ない場合でもPGMEに対する溶解性が低下することが分かった(比較合成例2)。一方、比較合成例3はNBDA単独でもPGMEに溶解し、5%重量減少温度はきわめて高いが、後述するように耐熱黄変性が悪いことがわかった。
[実施例1](TNI−A単独膜)
合成例1で得られたTNI−A 0.5gを1−メトキシ−2−プロパノール2.83gに溶解し、無色透明溶液を得た。得られた溶液を5cmx5cmのガラス基板上にスピンコーターを用いて200rpmで5秒、800rpmで30秒間スピンコートし、100℃で5分、150℃で30分焼成して溶媒を除去し、被膜を得た。得られた被膜の屈折率及び膜厚を分光エリプソメトリーにより測定したところ、550nmにおける屈折率は1.597、膜厚は1530nmであった。この被膜の全光透過率は99.1%、ヘイズ値は0.15であった。
Solubility: Solubility in PGME (10 wt%) As is clear from Table 1, in the synthesis of a hyperbranched polymer containing a triazine ring, NBDA alone as a diamine monomer increases the 5% weight loss temperature but dissolves in PGME. (Comparative Synthesis Example 1), and it was found that the solubility in PGME was lowered even when the charging ratio of IDA was small (Comparative Synthesis Example 2). On the other hand, Comparative Synthesis Example 3 was dissolved in PGME even with NBDA alone, and the 5% weight loss temperature was extremely high, but it was found that heat yellowing was poor as described later.
[Example 1] (TNI-A single membrane)
0.5 g of TNI-A obtained in Synthesis Example 1 was dissolved in 2.83 g of 1-methoxy-2-propanol to obtain a colorless transparent solution. The obtained solution was spin-coated on a 5 cm × 5 cm glass substrate using a spin coater at 200 rpm for 5 seconds and 800 rpm for 30 seconds, baked at 100 ° C. for 5 minutes and 150 ° C. for 30 minutes to remove the solvent, Obtained. When the refractive index and film thickness of the obtained film were measured by spectroscopic ellipsometry, the refractive index at 550 nm was 1.597 and the film thickness was 1530 nm. This film had a total light transmittance of 99.1% and a haze value of 0.15.
[実施例2](TNI−A硬化性組成物)
合成例1で得られたTNI−A0.5gを1−メトキシ−2−プロパノール2.73gに溶解し、これに架橋剤としてブロックイソシアネート、デュラネートSBN−70D0.050g[旭化成ケミカルズ社製]を加えて無色透明の熱硬化性ワニスを得た。得られた溶液を5cmx5cmのガラス基板上にスピンコーターを用いて200rpmで5秒、800rpmで30秒間スピンコートし、100℃で5分、150℃で30分焼成して溶媒を除去し、被膜を得た。得られた被膜の屈折率及び膜厚を分光エリプソメトリーにより測定したところ、550nmにおける屈折率は1.584、膜厚は1800nmであった。この被膜の全光透過率は99.6%、ヘイズ値は0.05であった。
[Example 2] (TNI-A curable composition)
0.5 g of TNI-A obtained in Synthesis Example 1 was dissolved in 2.73 g of 1-methoxy-2-propanol, and blocked isocyanate and 0.050 g of Duranate SBN-70D [Asahi Kasei Chemicals Co., Ltd.] were added as a cross-linking agent. A colorless and transparent thermosetting varnish was obtained. The obtained solution was spin-coated on a 5 cm × 5 cm glass substrate using a spin coater at 200 rpm for 5 seconds and 800 rpm for 30 seconds, baked at 100 ° C. for 5 minutes and 150 ° C. for 30 minutes to remove the solvent, Obtained. When the refractive index and film thickness of the obtained film were measured by spectroscopic ellipsometry, the refractive index at 550 nm was 1.584 and the film thickness was 1800 nm. This film had a total light transmittance of 99.6% and a haze value of 0.05.
[実施例3] (耐光性試験)
実施例2で得られた硬化膜について、耐光性試験前後(0.88W/m2、300時間)の300nm〜800nmにおける透過スペクトルを図1、図2に示す。可視光領域においては優れた透明性を保持していることが分かる。
[実施例4] (耐熱性試験)
実施例2で得られた硬化膜について、耐熱性試験後(150℃、100時間)の300nm〜800nmにおける透過スペクトルを図3に示す(耐熱性試験前のスペクトルは図1と同一)。可視光領域においては優れた透明性を保持していることが分かる。
[Example 3] (Light resistance test)
About the cured film obtained in Example 2, the transmission spectrum in 300 nm-800 nm before and behind a light resistance test (0.88 W / m < 2 >, 300 hours) is shown in FIG. 1, FIG. It can be seen that excellent transparency is maintained in the visible light region.
[Example 4] (Heat resistance test)
About the cured film obtained in Example 2, the transmission spectrum in 300 nm-800 nm after a heat resistance test (150 degreeC, 100 hours) is shown in FIG. 3 (The spectrum before a heat resistance test is the same as FIG. 1). It can be seen that excellent transparency is maintained in the visible light region.
[比較例1]
比較合成例2で得られたTNI−A 0.5gを1−メトキシ−2−プロパノール2.83gに溶解し、無色透明溶液を得た。得られた溶液を5cmx5cmのガラス基板上にスピンコーターを用いて200rpmで5秒、800rpmで30秒間スピンコートし、100℃で5分、150℃で30分焼成して溶媒を除去し、被膜を得た。得られた被膜の屈折率及び膜厚を分光エリプソメトリーにより測定したところ、550nmにおける屈折率は1.609、膜厚は1930nmであった。この被膜の全光透過率は99.6%、ヘイズ値は0.12であった。
[Comparative Example 1]
0.5 g of TNI-A obtained in Comparative Synthesis Example 2 was dissolved in 2.83 g of 1-methoxy-2-propanol to obtain a colorless transparent solution. The obtained solution was spin-coated on a 5 cm × 5 cm glass substrate using a spin coater at 200 rpm for 5 seconds and 800 rpm for 30 seconds, baked at 100 ° C. for 5 minutes and 150 ° C. for 30 minutes to remove the solvent, Obtained. When the refractive index and film thickness of the obtained film were measured by spectroscopic ellipsometry, the refractive index at 550 nm was 1.609 and the film thickness was 1930 nm. This film had a total light transmittance of 99.6% and a haze value of 0.12.
[比較例2]
比較合成例2で得られたTNI−A0.5gを1−メトキシ−2−プロパノール2.73gに溶解し、これに架橋剤としてブロックイソシアネート、タケネートB−882N 0.050g[三井化学社製]を加えて無色透明の熱硬化性ワニスを得た。得られた溶液を5cmx5cmのガラス基板上にスピンコーターを用いて200rpmで5秒、800rpmで30秒間スピンコートし、100℃で5分、150℃で30分焼成して溶媒を除去し、被膜を得た。得られた被膜の屈折率及び膜厚を分光エリプソメトリーにより測定したところ、550nmにおける屈折率は1.598、膜厚は2320nmであった。この被膜の全光透過率は99.1%、ヘイズ値は0.05であった。
[比較例3]
比較例2で得られた硬化膜について、耐熱性試験前後(150℃、100時間)の300nm〜800nmにおける透過スペクトルを図4、5に示す。実施例4の図3と比較して図5は紫外及び可視光領域において、透過率が大きく減少していることが分かる。
[Comparative Example 2]
0.5 g of TNI-A obtained in Comparative Synthesis Example 2 was dissolved in 2.73 g of 1-methoxy-2-propanol, and 0.050 g of blocked isocyanate, Takenate B-882N [manufactured by Mitsui Chemicals] was used as a crosslinking agent. In addition, a colorless and transparent thermosetting varnish was obtained. The obtained solution was spin-coated on a 5 cm × 5 cm glass substrate using a spin coater at 200 rpm for 5 seconds and 800 rpm for 30 seconds, baked at 100 ° C. for 5 minutes and 150 ° C. for 30 minutes to remove the solvent, Obtained. When the refractive index and film thickness of the obtained film were measured by spectroscopic ellipsometry, the refractive index at 550 nm was 1.598 and the film thickness was 2320 nm. This film had a total light transmittance of 99.1% and a haze value of 0.05.
[Comparative Example 3]
About the cured film obtained in Comparative Example 2, transmission spectra at 300 nm to 800 nm before and after the heat resistance test (150 ° C., 100 hours) are shown in FIGS. Compared with FIG. 3 of Example 4, FIG. 5 shows that the transmittance is greatly reduced in the ultraviolet and visible light regions.
Claims (16)
(式中、R、R’、R”およびR”’は、互いに独立して、水素原子、アルキル基、アルコキシ基、アリール基、またはアラルキル基を表し、A1およびA2は、互いに異なる、3〜20の脂環構造を有するアルキレン基を表す。) The triazine ring containing polymer characterized by including the repeating unit structure represented by following formula (1).
(Wherein R, R ′, R ″ and R ″ ′ each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group or an aralkyl group, and A 1 and A 2 are different from each other; Represents an alkylene group having an alicyclic structure of 3 to 20.)
(式中、R1およびR2は、互いに独立して、炭素数1〜5の分岐構造を有していてもよいアルキレン基を表す。) The triazine ring-containing polymer according to claim 1, wherein A 1 and A 2 are at least one selected from the group represented by formulas (2) to (16), which are different from each other.
(In the formula, R 1 and R 2 each independently represent an alkylene group which may have a branched structure having 1 to 5 carbon atoms.)
An optical member comprising a substrate and the film according to claim 14 or 15 formed on the substrate.
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