JP2007169583A - Resin composition for filter and specified wave length absorption filter using the same - Google Patents
Resin composition for filter and specified wave length absorption filter using the same Download PDFInfo
- Publication number
- JP2007169583A JP2007169583A JP2006103540A JP2006103540A JP2007169583A JP 2007169583 A JP2007169583 A JP 2007169583A JP 2006103540 A JP2006103540 A JP 2006103540A JP 2006103540 A JP2006103540 A JP 2006103540A JP 2007169583 A JP2007169583 A JP 2007169583A
- Authority
- JP
- Japan
- Prior art keywords
- meth
- weight
- filter
- monomer component
- methacrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 238000010521 absorption reaction Methods 0.000 title claims abstract description 51
- 239000011342 resin composition Substances 0.000 title claims abstract description 47
- 230000009477 glass transition Effects 0.000 claims abstract description 18
- 239000000178 monomer Substances 0.000 claims description 117
- 239000004925 Acrylic resin Substances 0.000 claims description 66
- 229920000178 Acrylic resin Polymers 0.000 claims description 66
- 239000006096 absorbing agent Substances 0.000 claims description 51
- -1 N-substituted maleimide Chemical class 0.000 claims description 49
- 239000000203 mixture Substances 0.000 claims description 42
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 35
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims description 29
- 150000001875 compounds Chemical class 0.000 claims description 26
- 150000002148 esters Chemical class 0.000 claims description 23
- 229920003067 (meth)acrylic acid ester copolymer Polymers 0.000 claims description 22
- 125000004432 carbon atom Chemical group C* 0.000 claims description 20
- 125000002723 alicyclic group Chemical group 0.000 claims description 17
- 238000002834 transmittance Methods 0.000 claims description 14
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 claims description 13
- LJZJMIZQMNDARW-UHFFFAOYSA-N decan-3-yl 2-methylprop-2-enoate Chemical compound CCCCCCCC(CC)OC(=O)C(C)=C LJZJMIZQMNDARW-UHFFFAOYSA-N 0.000 claims description 10
- 229920006255 plastic film Polymers 0.000 claims description 10
- 239000002985 plastic film Substances 0.000 claims description 10
- 125000001153 fluoro group Chemical group F* 0.000 claims description 7
- 230000000379 polymerizing effect Effects 0.000 claims description 7
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 claims description 6
- SKKHNUKNMQLBTJ-QIIDTADFSA-N [(1s,4r)-3-bicyclo[2.2.1]heptanyl] 2-methylprop-2-enoate Chemical compound C1C[C@H]2C(OC(=O)C(=C)C)C[C@@H]1C2 SKKHNUKNMQLBTJ-QIIDTADFSA-N 0.000 claims description 6
- IAXXETNIOYFMLW-COPLHBTASA-N [(1s,3s,4s)-4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl] 2-methylprop-2-enoate Chemical compound C1C[C@]2(C)[C@@H](OC(=O)C(=C)C)C[C@H]1C2(C)C IAXXETNIOYFMLW-COPLHBTASA-N 0.000 claims description 5
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical group CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 claims description 5
- 229940119545 isobornyl methacrylate Drugs 0.000 claims description 5
- JNPCNDJVEUEFBO-UHFFFAOYSA-N 1-butylpyrrole-2,5-dione Chemical compound CCCCN1C(=O)C=CC1=O JNPCNDJVEUEFBO-UHFFFAOYSA-N 0.000 claims description 4
- SJLLJZNSZJHXQN-UHFFFAOYSA-N 1-dodecylpyrrole-2,5-dione Chemical compound CCCCCCCCCCCCN1C(=O)C=CC1=O SJLLJZNSZJHXQN-UHFFFAOYSA-N 0.000 claims description 4
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 claims description 4
- DABFKTHTXOELJF-UHFFFAOYSA-N 1-propylpyrrole-2,5-dione Chemical compound CCCN1C(=O)C=CC1=O DABFKTHTXOELJF-UHFFFAOYSA-N 0.000 claims description 4
- GHAZCVNUKKZTLG-UHFFFAOYSA-N N-ethyl-succinimide Natural products CCN1C(=O)CCC1=O GHAZCVNUKKZTLG-UHFFFAOYSA-N 0.000 claims description 4
- HDFGOPSGAURCEO-UHFFFAOYSA-N N-ethylmaleimide Chemical compound CCN1C(=O)C=CC1=O HDFGOPSGAURCEO-UHFFFAOYSA-N 0.000 claims description 4
- SEEYREPSKCQBBF-UHFFFAOYSA-N n-methylmaleimide Chemical group CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- GJFDBYRHAZJJBP-UHFFFAOYSA-N 3-tert-butylpyrrole-2,5-dione Chemical compound CC(C)(C)C1=CC(=O)NC1=O GJFDBYRHAZJJBP-UHFFFAOYSA-N 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 239000011347 resin Substances 0.000 abstract description 31
- 229920005989 resin Polymers 0.000 abstract description 31
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract description 13
- 239000010410 layer Substances 0.000 description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- 238000000034 method Methods 0.000 description 16
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
- 239000002245 particle Substances 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 9
- 229920006395 saturated elastomer Polymers 0.000 description 8
- 230000007423 decrease Effects 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 150000002430 hydrocarbons Chemical group 0.000 description 6
- 125000005395 methacrylic acid group Chemical group 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000000375 suspending agent Substances 0.000 description 6
- 239000000725 suspension Substances 0.000 description 6
- 229920003169 water-soluble polymer Polymers 0.000 description 6
- 229920002799 BoPET Polymers 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 239000002966 varnish Substances 0.000 description 5
- UJTRCPVECIHPBG-UHFFFAOYSA-N 3-cyclohexylpyrrole-2,5-dione Chemical compound O=C1NC(=O)C(C2CCCCC2)=C1 UJTRCPVECIHPBG-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 125000003710 aryl alkyl group Chemical group 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 238000010557 suspension polymerization reaction Methods 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 3
- BAPJBEWLBFYGME-UHFFFAOYSA-N acrylic acid methyl ester Natural products COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 125000006165 cyclic alkyl group Chemical group 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229920001519 homopolymer Polymers 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000003505 polymerization initiator Substances 0.000 description 3
- 125000000547 substituted alkyl group Chemical group 0.000 description 3
- IAXXETNIOYFMLW-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) 2-methylprop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C(=C)C)CC1C2(C)C IAXXETNIOYFMLW-UHFFFAOYSA-N 0.000 description 2
- VYPRXWXGLLURNB-UHFFFAOYSA-N (5-methyl-2-propan-2-ylcyclohexyl) 2-methylprop-2-enoate Chemical compound CC(C)C1CCC(C)CC1OC(=O)C(C)=C VYPRXWXGLLURNB-UHFFFAOYSA-N 0.000 description 2
- MZVABYGYVXBZDP-UHFFFAOYSA-N 1-adamantyl 2-methylprop-2-enoate Chemical compound C1C(C2)CC3CC2CC1(OC(=O)C(=C)C)C3 MZVABYGYVXBZDP-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- CWTMXRBURASPSI-UHFFFAOYSA-N cyclodecyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCCCCCC1 CWTMXRBURASPSI-UHFFFAOYSA-N 0.000 description 2
- WRAABIJFUKKEJQ-UHFFFAOYSA-N cyclopentyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCC1 WRAABIJFUKKEJQ-UHFFFAOYSA-N 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002609 medium Substances 0.000 description 2
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- KZCOBXFFBQJQHH-UHFFFAOYSA-N octane-1-thiol Chemical compound CCCCCCCCS KZCOBXFFBQJQHH-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000008363 phosphate buffer Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000011112 polyethylene naphthalate Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000193 polymethacrylate Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- LEAHFJQFYSDGGP-UHFFFAOYSA-K trisodium;dihydrogen phosphate;hydrogen phosphate Chemical compound [Na+].[Na+].[Na+].OP(O)([O-])=O.OP([O-])([O-])=O LEAHFJQFYSDGGP-UHFFFAOYSA-K 0.000 description 2
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 2
- APAUNQLFVGBQQW-UHFFFAOYSA-N (1,2,2-trimethylcyclohexyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1(C)CCCCC1(C)C APAUNQLFVGBQQW-UHFFFAOYSA-N 0.000 description 1
- LBHPSYROQDMVBS-UHFFFAOYSA-N (1-methylcyclohexyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1(C)CCCCC1 LBHPSYROQDMVBS-UHFFFAOYSA-N 0.000 description 1
- URWUDHFIOMIXCX-UHFFFAOYSA-N (2,2-dimethyl-1-adamantyl) 2-methylprop-2-enoate Chemical compound C1C(C2)CC3CC2C(C)(C)C1(OC(=O)C(=C)C)C3 URWUDHFIOMIXCX-UHFFFAOYSA-N 0.000 description 1
- TZWBLWVGCBFFHY-UHFFFAOYSA-N (2,2-dimethyl-1-adamantyl) prop-2-enoate Chemical compound C1C(C2)CC3CC1C(C)(C)C2(OC(=O)C=C)C3 TZWBLWVGCBFFHY-UHFFFAOYSA-N 0.000 description 1
- FVQMJJQUGGVLEP-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOOC(C)(C)C FVQMJJQUGGVLEP-UHFFFAOYSA-N 0.000 description 1
- IUFNOTXKUYSLPO-UHFFFAOYSA-N (3-cyano-4-bicyclo[2.2.1]heptanyl) 2-methylprop-2-enoate Chemical compound C1CC2CC(C#N)C1(OC(=O)C(=C)C)C2 IUFNOTXKUYSLPO-UHFFFAOYSA-N 0.000 description 1
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- XJBRSZAYOKVFRH-UHFFFAOYSA-N (5-methyl-2-propan-2-ylcyclohexyl) prop-2-enoate Chemical compound CC(C)C1CCC(C)CC1OC(=O)C=C XJBRSZAYOKVFRH-UHFFFAOYSA-N 0.000 description 1
- OXXJEEWPKQNYJK-UHFFFAOYSA-N 1-(2,4,6-trimethylphenyl)pyrrole-2,5-dione Chemical compound CC1=CC(C)=CC(C)=C1N1C(=O)C=CC1=O OXXJEEWPKQNYJK-UHFFFAOYSA-N 0.000 description 1
- KPQOXMCRYWDRSB-UHFFFAOYSA-N 1-(2-chlorophenyl)pyrrole-2,5-dione Chemical compound ClC1=CC=CC=C1N1C(=O)C=CC1=O KPQOXMCRYWDRSB-UHFFFAOYSA-N 0.000 description 1
- GZNWHPFWQMQXII-UHFFFAOYSA-N 1-(2-ethylphenyl)pyrrole-2,5-dione Chemical compound CCC1=CC=CC=C1N1C(=O)C=CC1=O GZNWHPFWQMQXII-UHFFFAOYSA-N 0.000 description 1
- LJDGDRYFCIHDPX-UHFFFAOYSA-N 1-(2-methoxyphenyl)pyrrole-2,5-dione Chemical compound COC1=CC=CC=C1N1C(=O)C=CC1=O LJDGDRYFCIHDPX-UHFFFAOYSA-N 0.000 description 1
- QYOJZFBQEAZNEW-UHFFFAOYSA-N 1-(2-methylphenyl)pyrrole-2,5-dione Chemical compound CC1=CC=CC=C1N1C(=O)C=CC1=O QYOJZFBQEAZNEW-UHFFFAOYSA-N 0.000 description 1
- MDBNEJWCBWGPAH-UHFFFAOYSA-N 1-(4-benzylphenyl)pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=CC=C1 MDBNEJWCBWGPAH-UHFFFAOYSA-N 0.000 description 1
- FECSFBYOMHWJQG-UHFFFAOYSA-N 1-(4-bromophenyl)pyrrole-2,5-dione Chemical compound C1=CC(Br)=CC=C1N1C(=O)C=CC1=O FECSFBYOMHWJQG-UHFFFAOYSA-N 0.000 description 1
- FPZQYYXSOJSITC-UHFFFAOYSA-N 1-(4-chlorophenyl)pyrrole-2,5-dione Chemical compound C1=CC(Cl)=CC=C1N1C(=O)C=CC1=O FPZQYYXSOJSITC-UHFFFAOYSA-N 0.000 description 1
- PHPRWKJDGHSJMI-UHFFFAOYSA-N 1-adamantyl prop-2-enoate Chemical compound C1C(C2)CC3CC2CC1(OC(=O)C=C)C3 PHPRWKJDGHSJMI-UHFFFAOYSA-N 0.000 description 1
- MKRBAPNEJMFMHU-UHFFFAOYSA-N 1-benzylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1CC1=CC=CC=C1 MKRBAPNEJMFMHU-UHFFFAOYSA-N 0.000 description 1
- SRXJYTZCORKVNA-UHFFFAOYSA-N 1-bromoethenylbenzene Chemical compound BrC(=C)C1=CC=CC=C1 SRXJYTZCORKVNA-UHFFFAOYSA-N 0.000 description 1
- XHAFIUUYXQFJEW-UHFFFAOYSA-N 1-chloroethenylbenzene Chemical compound ClC(=C)C1=CC=CC=C1 XHAFIUUYXQFJEW-UHFFFAOYSA-N 0.000 description 1
- DAEXAGHVEUWODX-UHFFFAOYSA-N 1-fluoroethenylbenzene Chemical compound FC(=C)C1=CC=CC=C1 DAEXAGHVEUWODX-UHFFFAOYSA-N 0.000 description 1
- CCHRVFZBKRIKIX-UHFFFAOYSA-N 1-nitro-3-(3-nitrophenyl)benzene Chemical compound [O-][N+](=O)C1=CC=CC(C=2C=C(C=CC=2)[N+]([O-])=O)=C1 CCHRVFZBKRIKIX-UHFFFAOYSA-N 0.000 description 1
- YEKDUBMGZZTUDY-UHFFFAOYSA-N 1-tert-butylpyrrole-2,5-dione Chemical compound CC(C)(C)N1C(=O)C=CC1=O YEKDUBMGZZTUDY-UHFFFAOYSA-N 0.000 description 1
- QTKPMCIBUROOGY-UHFFFAOYSA-N 2,2,2-trifluoroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(F)(F)F QTKPMCIBUROOGY-UHFFFAOYSA-N 0.000 description 1
- BMFMTNROJASFBW-UHFFFAOYSA-N 2-(furan-2-ylmethylsulfinyl)acetic acid Chemical compound OC(=O)CS(=O)CC1=CC=CO1 BMFMTNROJASFBW-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- DJKKWVGWYCKUFC-UHFFFAOYSA-N 2-butoxyethyl 2-methylprop-2-enoate Chemical compound CCCCOCCOC(=O)C(C)=C DJKKWVGWYCKUFC-UHFFFAOYSA-N 0.000 description 1
- PTJDGKYFJYEAOK-UHFFFAOYSA-N 2-butoxyethyl prop-2-enoate Chemical compound CCCCOCCOC(=O)C=C PTJDGKYFJYEAOK-UHFFFAOYSA-N 0.000 description 1
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- KBKNKFIRGXQLDB-UHFFFAOYSA-N 2-fluoroethenylbenzene Chemical compound FC=CC1=CC=CC=C1 KBKNKFIRGXQLDB-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- CTHJQRHPNQEPAB-UHFFFAOYSA-N 2-methoxyethenylbenzene Chemical compound COC=CC1=CC=CC=C1 CTHJQRHPNQEPAB-UHFFFAOYSA-N 0.000 description 1
- KQWBJUXAIXBZTC-UHFFFAOYSA-J 2-methylprop-2-enoate;tin(4+) Chemical compound [Sn+4].CC(=C)C([O-])=O.CC(=C)C([O-])=O.CC(=C)C([O-])=O.CC(=C)C([O-])=O KQWBJUXAIXBZTC-UHFFFAOYSA-J 0.000 description 1
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- RWHRFHQRVDUPIK-UHFFFAOYSA-N 50867-57-7 Chemical class CC(=C)C(O)=O.CC(=C)C(O)=O RWHRFHQRVDUPIK-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical class SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical class N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- IQYMRQZTDOLQHC-ZQTLJVIJSA-N [(1R,4S)-2-bicyclo[2.2.1]heptanyl] prop-2-enoate Chemical compound C1C[C@H]2C(OC(=O)C=C)C[C@@H]1C2 IQYMRQZTDOLQHC-ZQTLJVIJSA-N 0.000 description 1
- PSGCQDPCAWOCSH-OPQQBVKSSA-N [(1s,3r,4s)-4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl] prop-2-enoate Chemical compound C1C[C@]2(C)[C@H](OC(=O)C=C)C[C@H]1C2(C)C PSGCQDPCAWOCSH-OPQQBVKSSA-N 0.000 description 1
- YMOONIIMQBGTDU-VOTSOKGWSA-N [(e)-2-bromoethenyl]benzene Chemical compound Br\C=C\C1=CC=CC=C1 YMOONIIMQBGTDU-VOTSOKGWSA-N 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000003282 alkyl amino group Chemical group 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium peroxydisulfate Substances [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 1
- VAZSKTXWXKYQJF-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)OOS([O-])=O VAZSKTXWXKYQJF-UHFFFAOYSA-N 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000005110 aryl thio group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- SQHOHKQMTHROSF-UHFFFAOYSA-N but-1-en-2-ylbenzene Chemical compound CCC(=C)C1=CC=CC=C1 SQHOHKQMTHROSF-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- 229910000389 calcium phosphate Inorganic materials 0.000 description 1
- 235000011010 calcium phosphates Nutrition 0.000 description 1
- OAKHANKSRIPFCE-UHFFFAOYSA-L calcium;2-methylprop-2-enoate Chemical compound [Ca+2].CC(=C)C([O-])=O.CC(=C)C([O-])=O OAKHANKSRIPFCE-UHFFFAOYSA-L 0.000 description 1
- TXTCTCUXLQYGLA-UHFFFAOYSA-L calcium;prop-2-enoate Chemical compound [Ca+2].[O-]C(=O)C=C.[O-]C(=O)C=C TXTCTCUXLQYGLA-UHFFFAOYSA-L 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- BTQLDZMOTPTCGG-UHFFFAOYSA-N cyclopentyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCC1 BTQLDZMOTPTCGG-UHFFFAOYSA-N 0.000 description 1
- NHAQFLFLZGBOBG-UHFFFAOYSA-N decan-3-yl prop-2-enoate Chemical compound CCCCCCCC(CC)OC(=O)C=C NHAQFLFLZGBOBG-UHFFFAOYSA-N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- XZTWHWHGBBCSMX-UHFFFAOYSA-J dimagnesium;phosphonato phosphate Chemical compound [Mg+2].[Mg+2].[O-]P([O-])(=O)OP([O-])([O-])=O XZTWHWHGBBCSMX-UHFFFAOYSA-J 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- CIKJANOSDPPCAU-UHFFFAOYSA-N ditert-butyl cyclohexane-1,4-dicarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1CCC(C(=O)OOC(C)(C)C)CC1 CIKJANOSDPPCAU-UHFFFAOYSA-N 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 235000019000 fluorine Nutrition 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- LNCPIMCVTKXXOY-UHFFFAOYSA-N hexyl 2-methylprop-2-enoate Chemical compound CCCCCCOC(=O)C(C)=C LNCPIMCVTKXXOY-UHFFFAOYSA-N 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- BSLBENVVENBYIW-UHFFFAOYSA-L lead(2+);prop-2-enoate Chemical compound [Pb+2].[O-]C(=O)C=C.[O-]C(=O)C=C BSLBENVVENBYIW-UHFFFAOYSA-L 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- QRWZCJXEAOZAAW-UHFFFAOYSA-N n,n,2-trimethylprop-2-enamide Chemical compound CN(C)C(=O)C(C)=C QRWZCJXEAOZAAW-UHFFFAOYSA-N 0.000 description 1
- JMCVCHBBHPFWBF-UHFFFAOYSA-N n,n-diethyl-2-methylprop-2-enamide Chemical compound CCN(CC)C(=O)C(C)=C JMCVCHBBHPFWBF-UHFFFAOYSA-N 0.000 description 1
- OVHHHVAVHBHXAK-UHFFFAOYSA-N n,n-diethylprop-2-enamide Chemical compound CCN(CC)C(=O)C=C OVHHHVAVHBHXAK-UHFFFAOYSA-N 0.000 description 1
- OSFCMRGOZNQUSW-UHFFFAOYSA-N n-[4-[2-(6,7-dimethoxy-3,4-dihydro-1h-isoquinolin-2-yl)ethyl]phenyl]-5-methoxy-9-oxo-10h-acridine-4-carboxamide Chemical compound N1C2=C(OC)C=CC=C2C(=O)C2=C1C(C(=O)NC1=CC=C(C=C1)CCN1CCC=3C=C(C(=CC=3C1)OC)OC)=CC=C2 OSFCMRGOZNQUSW-UHFFFAOYSA-N 0.000 description 1
- HVYCQBKSRWZZGX-UHFFFAOYSA-N naphthalen-1-yl 2-methylprop-2-enoate Chemical compound C1=CC=C2C(OC(=O)C(=C)C)=CC=CC2=C1 HVYCQBKSRWZZGX-UHFFFAOYSA-N 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- FSAJWMJJORKPKS-UHFFFAOYSA-N octadecyl prop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C=C FSAJWMJJORKPKS-UHFFFAOYSA-N 0.000 description 1
- NZIDBRBFGPQCRY-UHFFFAOYSA-N octyl 2-methylprop-2-enoate Chemical compound CCCCCCCCOC(=O)C(C)=C NZIDBRBFGPQCRY-UHFFFAOYSA-N 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- GSWAOPJLTADLTN-UHFFFAOYSA-N oxidanimine Chemical compound [O-][NH3+] GSWAOPJLTADLTN-UHFFFAOYSA-N 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- GYDSPAVLTMAXHT-UHFFFAOYSA-N pentyl 2-methylprop-2-enoate Chemical compound CCCCCOC(=O)C(C)=C GYDSPAVLTMAXHT-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- LLLCSBYSPJHDJX-UHFFFAOYSA-M potassium;2-methylprop-2-enoate Chemical compound [K+].CC(=C)C([O-])=O LLLCSBYSPJHDJX-UHFFFAOYSA-M 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- FZYCEURIEDTWNS-UHFFFAOYSA-N prop-1-en-2-ylbenzene Chemical compound CC(=C)C1=CC=CC=C1.CC(=C)C1=CC=CC=C1 FZYCEURIEDTWNS-UHFFFAOYSA-N 0.000 description 1
- XDJFUWIQZPRDDG-UHFFFAOYSA-J prop-2-enoate;tin(4+) Chemical compound [Sn+4].[O-]C(=O)C=C.[O-]C(=O)C=C.[O-]C(=O)C=C.[O-]C(=O)C=C XDJFUWIQZPRDDG-UHFFFAOYSA-J 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical class [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 1
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Optical Filters (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
本発明は、フィルター用樹脂組成物、並びにこれを用いた特定波長吸収フィルター、赤外線吸収フィルム及び電磁波遮蔽フィルムに関する。 The present invention relates to a filter resin composition, and a specific wavelength absorption filter, an infrared absorption film and an electromagnetic wave shielding film using the same.
従来、カラー画像の表示装置として、陰極管、蛍光表示管、電界放射、プラズマパネル、液晶、エレクトロルミネッセンス等による各種画像表示装置が開発されている。これらは、赤、緑、青の３原色の光の組み合わせを利用し画像表示をする形式をとっている。その際、上記３原色以外の光を、いわゆるバンドパスフィルターを用いて吸収し、鮮明なカラー画像を得、かつ、画像の色バランスを補正することがある。該バンドパスフィルターとしては、プラズマディスプレイパネル（ＰＤＰ）や蛍光表示管に使用するプラズマディスプレイ用フィルターが開示されている（例えば、特許文献１〜３参照）。これらのプラズマディスプレイ用フィルターにおいては色素が用いられている。 Conventionally, various types of image display devices using cathode tubes, fluorescent display tubes, field emission, plasma panels, liquid crystals, electroluminescence, and the like have been developed as color image display devices. These take the form of displaying an image using a combination of light of the three primary colors of red, green and blue. At that time, light other than the three primary colors may be absorbed using a so-called bandpass filter to obtain a clear color image and correct the color balance of the image. As the band-pass filter, a plasma display filter used for a plasma display panel (PDP) or a fluorescent display tube is disclosed (for example, see Patent Documents 1 to 3). In these plasma display filters, a dye is used.
また、従来は、上記のようなプラズマディスプレイパネル用フィルターの作成にあたっては、バインダー樹脂として、ポリエステル樹脂やポリカーボネート樹脂等を用いて色素を含む樹脂層を作成することが知られていた（例えば、特許文献４参照）。しかしながら、得られる樹脂層に複屈折が存在するため、フィルターをディスプレイ前面に配置した際に、画像が二重に映る、均一で高精細な画像が得られないなど、必要とされる性能に十分に応えるフィルターは得られていない。 Further, conventionally, it has been known that a resin layer containing a pigment is produced using a polyester resin, a polycarbonate resin, or the like as a binder resin when producing a filter for a plasma display panel as described above (for example, patents). Reference 4). However, birefringence exists in the resulting resin layer, so when the filter is placed on the front of the display, the image appears double, and a uniform and high-definition image cannot be obtained. There is no filter that meets this requirement.
一方、バインダー樹脂としてポリメタクリル酸メチルを用いてプラズマディスプレイパネル用フィルターを作成したところ、成膜条件により樹脂層の複屈折をある程度小さくできる。しかしながら、延伸等応力がかかった場合、複屈折がさらに発生するため、均一で高精細な画像が得られず、必要とされる性能に十分に応えるフィルターは得られていない。 On the other hand, when a plasma display panel filter is prepared using polymethyl methacrylate as the binder resin, the birefringence of the resin layer can be reduced to some extent depending on the film forming conditions. However, when stress such as stretching is applied, birefringence further occurs, so that a uniform and high-definition image cannot be obtained, and a filter that sufficiently meets the required performance has not been obtained.
そこで、バインダー樹脂の複屈折を小さくすることを目的とする方法として、（１）光弾性係数が正の重合体が得られる単量体と、光弾性係数が負の重合体が得られる単量体とを必須原材料として、光弾性係数が−１×１０−１３ｃｍ２／ｄｙｎｅ以上、＋１×１０−１３ｃｍ２／ｄｙｎｅ以下となるように共重合させる方法（例えば、特許文献５参照）、（２）メタクリル酸メチル、炭素数が３〜８のアルキル基を有するメタクリル酸アルキル及びスチレンを共重合する方法（例えば、特許文献６，７参照）、（３）メタクリル酸メチル、メタクリル酸トリシクロ［５．２．１．０２，６］デカ−８−イル及びスチレンを共重合する方法（例えば、特許文献８参照）、（４）正の複屈折を有するホモポリマーを形成し得るモノマー（トリフルオロエチルメタクリレート、ベンジルメタクリレート等）と、負の複屈折を有するホモポリマーを形成し得るモノマー（メタクリル酸メチル等）を共重合させる方法（例えば、特許文献９参照）、（５）ホモポリマーとしたときの光弾性係数の符号がポリメタクリル酸メチルと反対となる不飽和二重結合を有する化合物と、メタクリル酸メチルを共重合する方法（例えば、特許文献１０参照）などが提案されている。しかし、これら従来の方法は、それなりに成果を上げているが、未だ不十分な面も少なくない。 Therefore, as a method for reducing the birefringence of the binder resin, (1) a monomer capable of obtaining a polymer having a positive photoelastic coefficient and a single monomer capable of obtaining a polymer having a negative photoelastic coefficient. Body as an essential raw material, and a photoelastic coefficient is copolymerized so that the photoelastic coefficient is −1 × 10 −13 cm 2 / dyne or more and + 1 × 10 −13 cm 2 / dyne or less (see, for example, Patent Document 5), (2) A method of copolymerizing methyl methacrylate, an alkyl methacrylate having an alkyl group having 3 to 8 carbon atoms and styrene (see, for example, Patent Documents 6 and 7), (3) Methyl methacrylate, tricyclomethacrylate [ 5.2.1.0 2, 6] dec-8-yl and a method of copolymerizing styrene (e.g., see Patent Document 8), (4) a monomer capable of forming a homopolymer with positive birefringence ( A method of copolymerizing a monomer (such as methyl methacrylate) capable of forming a homopolymer having negative birefringence (for example, see Patent Document 9), and (5) a homopolymer A method of copolymerizing methyl methacrylate with a compound having an unsaturated double bond whose photoelastic coefficient is opposite to that of polymethyl methacrylate has been proposed (for example, see Patent Document 10). However, although these conventional methods have produced results as they are, there are still many aspects that are still insufficient.
また、ＰＤＰの画面表面は、プラズマ放電に伴う放熱により常に６０℃前後の高温に曝されている。このため、長期に亘って耐熱性に優れたプラズマディスプレイパネル用フィルターの開発が望まれていたが、十分な性能のフィルターは実現されていない。 Further, the screen surface of the PDP is always exposed to a high temperature of about 60 ° C. due to heat radiation accompanying plasma discharge. For this reason, development of a filter for a plasma display panel excellent in heat resistance for a long period of time has been desired, but a filter with sufficient performance has not been realized.
本発明は、各種ディスプレイから放出される特定波長を吸収し、均一で高精細な画像が得られ、経時的にも安定なフィルターを形成し得るフィルター用樹脂組成物を提供することを目的とする。また、本発明は、前記フィルター用樹脂組成物を用いた特定波長吸収フィルター、近赤外線（ＮＩＲ）吸収フィルム、及びプラズマディスプレイパネル用電磁波遮蔽（ＥＭＩシールド）フィルムを提供することを目的とする。 An object of the present invention is to provide a resin composition for a filter that absorbs a specific wavelength emitted from various displays, obtains a uniform and high-definition image, and can form a stable filter over time. . Another object of the present invention is to provide a specific wavelength absorption filter, a near infrared (NIR) absorption film, and an electromagnetic wave shielding (EMI shield) film for a plasma display panel using the resin composition for a filter.
本発明者等は、種々検討を重ね、プラズマディスプレイパネル用フィルターの作成において、色素層、すなわち、特定波長吸収層を形成させるために用いられるバインダー樹脂として、樹脂の配向複屈折の絶対値を低減し、ガラス転移点の高い特定の（メタ）アクリル系樹脂を使用することにより、上記目的が達成されることを見出した。 The present inventors have made various studies and reduced the absolute value of orientation birefringence of the resin as a binder resin used to form a dye layer, that is, a specific wavelength absorption layer in the creation of a filter for a plasma display panel. And it discovered that the said objective was achieved by using specific (meth) acrylic-type resin with a high glass transition point.
すなわち、本発明は、ディスプレイ用フィルターに用いられる樹脂組成物であって、（ａ）（メタ）アクリル系樹脂、及び（ｂ）特定波長吸収剤を含み、（ａ）（メタ）アクリル系樹脂の配向複屈折の絶対値が１×１０−６未満、かつ、ガラス転移温度が１００℃以上であることを特徴とするフィルター用樹脂組成物に関する。（ｂ）特定波長吸収剤は、（ａ）（メタ）アクリル系樹脂１００重量部に対し、０．１〜１０重量部含まれることが好ましい。
本発明のフィルター用樹脂組成物は、好ましくは、（ａ）（メタ）アクリル系樹脂が、単量体の総量に対して、単量体成分（Ａ）：エステル部分に炭素数５〜２２の脂環式炭化水素基を有する（メタ）アクリル酸エステル５〜４０重量％、単量体成分（Ｂ）：メタクリル酸メチル５０〜８０重量％、単量体成分（Ｃ）：Ｎ−置換マレイミド５〜４０重量％、単量体成分（Ｄ）：メタクリル酸ベンジル０〜３０重量％、及び単量体成分（Ｆ）：これらと共重合可能な単量体０〜１０重量％を含む単量体混合物を重合して得られる（メタ）アクリル酸エステル共重合体を含む。本発明のフィルター用樹脂組成物は、さらに好ましくは、（ａ）（メタ）アクリル系樹脂が、単量体の総量に対して、単量体成分（Ａ）：エステル部分に炭素数５〜２２の脂環式炭化水素基を有する（メタ）アクリル酸エステル５〜４０重量％、単量体成分（Ｂ）：メタクリル酸メチル５０〜８０重量％、単量体成分（Ｃ）：Ｎ−置換マレイミド５〜１０重量％、単量体成分（Ｄ）：メタクリル酸ベンジル５〜２５重量％、及び単量体成分（Ｆ）：これらと共重合可能な単量体０〜１０重量％を含む単量体混合物を重合して得られる（メタ）アクリル酸エステル共重合体を含む。
また、本発明のフィルター用樹脂組成物は、好ましくは、（ａ）（メタ）アクリル系樹脂が、単量体の総量に対して、単量体成分（Ａ）：エステル部分に炭素数５〜２２の脂環式炭化水素基を有する（メタ）アクリル酸エステル５〜４０重量％、単量体成分（Ｂ）：メタクリル酸メチル４０〜８０重量％、単量体成分（Ｃ）：Ｎ−置換マレイミド５〜４０重量％、単量体成分（Ｅ）：エステル部分に複数のフッ素原子により置換された炭素数２〜９の直鎖式炭化水素基を有する（メタ）アクリル酸エステル０〜５０重量％、及び単量体成分（Ｆ）：これらと共重合可能な単量体０〜１０重量％を含む単量体混合物を重合して得られる（メタ）アクリル酸エステル共重合体を含む。
上記の単量体成分（Ａ）：エステル部分に炭素数５〜２２の脂環式炭化水素基を有する（メタ）アクリル酸エステルは、メタクリル酸シクロヘキシル、メタクリル酸イソボルニル、メタクリル酸ノルボルニル、メタクリル酸ノルボルニルメチル、メタクリル酸トリシクロ［５．２．１．０２，６］デカ−８−イル、及びメタクリル酸トリシクロ［５．２．１．０２，６］デカ−４−メチルからなる群から選ばれる少なくとも１種の化合物であることが好ましい。
また、上記の単量体成分（Ｃ）：Ｎ−置換マレイミドは、Ｎ−メチルマレイミド、Ｎ−エチルマレイミド、Ｎ−プロピルマレイミド、Ｎ−ｉ−プロピルマレイミド、Ｎ−ブチルマレイミド、Ｎ−ｉ−ブチルマレイミド、Ｎ−ｔ−ブチルマレイミド、Ｎ−シクロヘキシルマレイミド、Ｎ−ラウリルマレイミド、及びＮ−フェニルマレイミドからなる群から選ばれる少なくとも１種の化合物であることが好ましい。
また、好ましくは、上記の（ｂ）特定波長吸収剤は有機系特定波長吸収剤を含み、さらに好ましくは、有機系特定波長吸収剤は有機系近赤外線吸収剤を含む。有機系近赤外線吸収剤としては、アミニウム化合物、ジイモニウム化合物、及びニッケルジチオール化合物から成る群から選ばれる少なくとも１種の化合物を用いることができる。
また、本発明は、プラスチックフィルム、及び上記のフィルター用樹脂組成物を用いて形成された層を有する特定波長吸収フィルターに関する。プラスチックフィルムの可視光透過率は、６０％以上であることが好ましい。
また、本発明は、特に、プラスチックフィルム、及び上記のフィルター用樹脂組成物を用いて形成された層を有する近赤外線吸収フィルムに関し、さらに、上記のフィルター用樹脂組成物、上記の特定波長吸収フィルター、又は、上記の近赤外線吸収フィルムを用いたプラズマディスプレイ用電磁波遮蔽フィルムに関する。
That is, this invention is a resin composition used for the filter for displays, Comprising: (a) (meth) acrylic-type resin and (b) specific wavelength absorber, (a) (meth) acrylic-type resin The present invention relates to a filter resin composition characterized by having an absolute value of orientation birefringence of less than 1 × 10 −6 and a glass transition temperature of 100 ° C. or higher. (B) It is preferable that 0.1-10 weight part of specific wavelength absorbers are contained with respect to 100 weight part of (a) (meth) acrylic-type resin.
In the filter resin composition of the present invention, preferably, (a) the (meth) acrylic resin has 5 to 22 carbon atoms in the monomer component (A): ester portion relative to the total amount of monomers. (Meth) acrylic acid ester having an alicyclic hydrocarbon group 5 to 40% by weight, monomer component (B): methyl methacrylate 50 to 80% by weight, monomer component (C): N-substituted maleimide 5 ˜40 wt%, monomer component (D): benzyl methacrylate 0-30 wt%, and monomer component (F): monomer containing 0-10 wt% monomer copolymerizable with these A (meth) acrylic acid ester copolymer obtained by polymerizing the mixture is included. More preferably, in the resin composition for a filter of the present invention, the (a) (meth) acrylic resin has 5 to 22 carbon atoms in the monomer component (A): ester portion with respect to the total amount of monomers. (Meth) acrylic acid ester having an alicyclic hydrocarbon group of 5 to 40% by weight, monomer component (B): methyl methacrylate 50 to 80% by weight, monomer component (C): N-substituted maleimide 5 to 10% by weight, monomer component (D): benzyl methacrylate 5 to 25% by weight, and monomer component (F): a monomer containing 0 to 10% by weight of monomers copolymerizable therewith (Meth) acrylic acid ester copolymer obtained by polymerizing a body mixture.
In the filter resin composition of the present invention, preferably, (a) the (meth) acrylic resin has 5 to 5 carbon atoms in the monomer component (A): ester part relative to the total amount of monomers. (Meth) acrylic acid ester having 22 alicyclic hydrocarbon groups 5 to 40% by weight, monomer component (B): methyl methacrylate 40 to 80% by weight, monomer component (C): N-substituted Maleimide 5 to 40% by weight, monomer component (E): (meth) acrylic acid ester having a straight chain hydrocarbon group of 2 to 9 carbon atoms substituted with a plurality of fluorine atoms in the ester moiety 0 to 50% % And monomer component (F): a (meth) acrylic acid ester copolymer obtained by polymerizing a monomer mixture containing 0 to 10% by weight of monomers copolymerizable therewith.
Monomer component (A): (meth) acrylic acid ester having an alicyclic hydrocarbon group having 5 to 22 carbon atoms in the ester portion is cyclohexyl methacrylate, isobornyl methacrylate, norbornyl methacrylate, nor methacrylate. Borunirumechiru, methacrylic acid tricyclo [5.2.1.0 2, 6] dec-8-yl, and from the group consisting of methacrylic acid tricyclo [5.2.1.0 2, 6] deca-4-methyl It is preferable that it is at least one compound selected.
The monomer component (C): N-substituted maleimide is N-methylmaleimide, N-ethylmaleimide, N-propylmaleimide, Ni-propylmaleimide, N-butylmaleimide, Ni-butyl. It is preferably at least one compound selected from the group consisting of maleimide, Nt-butylmaleimide, N-cyclohexylmaleimide, N-laurylmaleimide, and N-phenylmaleimide.
Preferably, the (b) specific wavelength absorber includes an organic specific wavelength absorber, and more preferably, the organic specific wavelength absorber includes an organic near-infrared absorber. As the organic near infrared absorber, at least one compound selected from the group consisting of an aminium compound, a diimonium compound, and a nickel dithiol compound can be used.
Moreover, this invention relates to the specific wavelength absorption filter which has a layer formed using the plastic film and said resin composition for filters. The visible light transmittance of the plastic film is preferably 60% or more.
The present invention also relates to a near-infrared absorbing film having a layer formed using a plastic film and the filter resin composition, and more particularly to the filter resin composition and the specific wavelength absorption filter. Alternatively, the present invention relates to an electromagnetic wave shielding film for a plasma display using the near infrared absorbing film.
本発明によれば、各種ディスプレイから放出される特定波長を吸収し、均一で高精細な画像を得ることができ、経時的にも安定なフィルターを形成し得るフィルター用樹脂組成物が提供される。また、前記フィルター用樹脂組成物を用いた特定波長吸収フィルター、近赤外線（ＮＩＲ）吸収フィルム、及びプラズマディスプレイパネル用電磁波遮蔽（ＥＭＩシールド）フィルムは、各種ディスプレイから放出される特定波長を効率的に吸収し、均一で高精細な画像が得ることができ、経時的にも安定なディスプレイ用フィルターである。 ADVANTAGE OF THE INVENTION According to this invention, the resin composition for filters which can absorb the specific wavelength discharge | released from various displays, can obtain a uniform and high-definition image, and can form a stable filter also with time is provided. . In addition, the specific wavelength absorption filter, the near infrared (NIR) absorption film, and the electromagnetic wave shielding (EMI shield) film for the plasma display panel using the filter resin composition efficiently reduce the specific wavelength emitted from various displays. It is a display filter that absorbs and can obtain uniform and high-definition images and is stable over time.
以下、本発明を詳細に説明する。
本発明のフィルター用樹脂組成物は、ディスプレイ用フィルターに用いられる樹脂組成物であって、（ａ）（メタ）アクリル系樹脂、及び（ｂ）特定波長吸収剤を含み、（ａ）（メタ）アクリル系樹脂の配向複屈折の絶対値が１×１０−６未満、かつ、ガラス転移温度が１００℃以上であることを特徴とする。
Hereinafter, the present invention will be described in detail.
The filter resin composition of the present invention is a resin composition used for a display filter, and includes (a) (meth) acrylic resin, and (b) a specific wavelength absorber, and (a) (meth). The absolute value of orientation birefringence of the acrylic resin is less than 1 × 10 −6 and the glass transition temperature is 100 ° C. or more.
本発明における（ａ）（メタ）アクリル系樹脂は、配向複屈折の絶対値が１×１０−６未満である。好ましくは０．１×１０−６未満である。配向複屈折の絶対値が１×１０−６以上であると、均一な透過光が得られないため、均一で高精細な画像が得られなくなる。 The (a) (meth) acrylic resin in the present invention has an absolute value of orientation birefringence of less than 1 × 10 −6 . Preferably it is less than 0.1 × 10 −6 . If the absolute value of the orientation birefringence is 1 × 10 −6 or more, uniform transmitted light cannot be obtained, so that a uniform and high-definition image cannot be obtained.
本発明における（ａ）（メタ）アクリル系樹脂は、ガラス転移点（Ｔｇ）が１００℃以上である。ガラス転移点は、好ましくは１００℃以上２００℃以下、より好ましくは１０５℃以上１５０℃以下である。ガラス転移点が１００℃未満であると、フィルターが熱により劣化し、耐久性に劣る。 The glass transition point (Tg) of the (a) (meth) acrylic resin in the present invention is 100 ° C. or higher. The glass transition point is preferably 100 ° C. or higher and 200 ° C. or lower, more preferably 105 ° C. or higher and 150 ° C. or lower. When the glass transition point is less than 100 ° C., the filter is deteriorated by heat and inferior in durability.
本発明においては、（ａ）（メタ）アクリル系樹脂として、（メタ）アクリル酸エステル共重合体を用いることができる。（メタ）アクリル酸エステル共重合体を得るために、配向複屈折の絶対値が１×１０−６未満、かつ、ガラス転移温度が１００℃以上となる比率でモノマーを重合させる。 In the present invention, a (meth) acrylic acid ester copolymer can be used as the (a) (meth) acrylic resin. In order to obtain a (meth) acrylic acid ester copolymer, monomers are polymerized at a ratio such that the absolute value of orientation birefringence is less than 1 × 10 −6 and the glass transition temperature is 100 ° C. or higher.
（メタ）アクリル酸エステル共重合体の配向複屈折の絶対値を１×１０−６未満とするためのモノマー配合比は、各配合比のモノマーを懸濁重合することにより得られた共重合体から、厚さ５０μｍのフィルムを作製し、フィルムを一方向に２倍に延伸した（延伸温度：９０℃）際の複屈折の絶対値が１×１０−６未満となる場合の配合比である。 The monomer blending ratio for making the absolute value of orientation birefringence of the (meth) acrylic acid ester copolymer less than 1 × 10 −6 is a copolymer obtained by suspension polymerization of monomers of each blending ratio. From this, it is a compounding ratio in the case where a film having a thickness of 50 μm is prepared and the absolute value of birefringence when the film is stretched twice in one direction (stretching temperature: 90 ° C.) is less than 1 × 10 −6 .
複屈折の絶対値を１×１０−６未満とするために、負の固有配向複屈折を持つモノマーと、正の固有配向複屈折を持つモノマーを組み合わせて用いることが好ましい。例えば、メタクリル酸メチル、エステル部分に炭素数５〜２２の脂環式炭化水素基を有するメタクリル酸エステルまたはアクリル酸エステルは、負の固有配向複屈折を持ち、Ｎ−置換マレイミド、メタクリル酸ベンジル、エステル部分に複数のフッ素原子により置換された炭素数２〜９の直鎖式炭化水素基を有するメタクリル酸エステルまたはアクリル酸エステルは正の固有配向複屈折を持つ。 In order to make the absolute value of birefringence less than 1 × 10 −6 , it is preferable to use a combination of a monomer having negative intrinsic orientation birefringence and a monomer having positive intrinsic orientation birefringence. For example, methyl methacrylate, methacrylate ester or acrylate ester having an alicyclic hydrocarbon group having 5 to 22 carbon atoms in the ester moiety has negative intrinsic orientation birefringence, and N-substituted maleimide, benzyl methacrylate, A methacrylic acid ester or an acrylate ester having a linear hydrocarbon group having 2 to 9 carbon atoms substituted with a plurality of fluorine atoms in the ester moiety has positive intrinsic orientation birefringence.
また、本発明における（ａ）（メタ）アクリル系樹脂は、飽和吸水率が１．７％以下であることが好ましく、１．５％以下であることがより好ましい。飽和吸水率が１．７％を超えると、特定波長吸収剤、特に有機系特定波長吸収剤が劣化し、特定波長吸収効果が薄れるために、フィルターの経時安定性に劣る傾向がある。 The (a) (meth) acrylic resin in the present invention preferably has a saturated water absorption of 1.7% or less, more preferably 1.5% or less. When the saturated water absorption rate exceeds 1.7%, the specific wavelength absorber, particularly the organic specific wavelength absorber is deteriorated, and the specific wavelength absorption effect is diminished, so that the stability with time of the filter tends to be inferior.
本発明のフィルター用樹脂組成物は、上記の特定の（ａ）（メタ）アクリル系樹脂以外の（メタ）アクリル系樹脂を含んでいても良い。この場合、（ａ）（メタ）アクリル系樹脂を好ましくは８０重量％以上、さらに好ましくは９０重量％以上、特に好ましくは９５重量％以上含有するものである。 The filter resin composition of the present invention may contain a (meth) acrylic resin other than the specific (a) (meth) acrylic resin. In this case, the (a) (meth) acrylic resin is preferably contained in an amount of 80% by weight or more, more preferably 90% by weight or more, and particularly preferably 95% by weight or more.
本発明のフィルター用樹脂組成物は、ガラス転移点（Ｔｇ）が高い（ａ）（メタ）アクリル系樹脂を主体として用いることによって、長期に亘って紫外線による劣化にも、熱による劣化にも安定であるディスプレイパネル用フィルターを提供することができる。 The resin composition for a filter of the present invention is stable against deterioration due to ultraviolet rays or heat over a long period of time by using (a) (meth) acrylic resin having a high glass transition point (Tg) as a main component. A display panel filter can be provided.
本発明の（ａ）（メタ）アクリル系樹脂としては、上記特性を満たすものであれば、いずれのものを用いることもできるが、好ましくは、（Ａ）：エステル部分に炭素数５〜２２の脂環式炭化水素基を有する（メタ）アクリル酸エステル、（Ｂ）：メタクリル酸メチル、（Ｃ）：Ｎ−置換マレイミド、（Ｄ）：メタクリル酸ベンジル、（Ｅ）：エステル部分に複数のフッ素原子により置換された炭素数２〜９の直鎖式炭化水素基を有する（メタ）アクリル酸エステル、及び（Ｆ）：これらと共重合可能な単量体から選択される２種以上を重合することにより得られる（メタ）アクリル酸エステル共重合体である。 As the (a) (meth) acrylic resin of the present invention, any resin can be used as long as it satisfies the above characteristics. Preferably, (A): the ester moiety has 5 to 22 carbon atoms. (Meth) acrylic acid ester having an alicyclic hydrocarbon group, (B): methyl methacrylate, (C): N-substituted maleimide, (D): benzyl methacrylate, (E): multiple fluorines in the ester moiety (Meth) acrylic acid ester having a C2-C9 linear hydrocarbon group substituted by an atom, and (F): polymerizing two or more selected from monomers copolymerizable therewith (Meth) acrylic acid ester copolymer.
本発明に用いる単量体成分（Ａ）：エステル部分に炭素数５〜２２の脂環式炭化水素基を有する（メタ）アクリル酸エステルとしては、アクリル酸エステル、メタクリル酸エステル、またはこれらの混合物いずれを用いてもよく、例えば、アクリル酸シクロペンチル、アクリル酸シクロヘキシル、アクリル酸メチルシクロヘキシル、アクリル酸トリメチルシクロヘキシル、アクリル酸ノルボルニル、アクリル酸ノルボルニルメチル、アクリル酸シアノノルボルニル、アクリル酸フェニルノルボルニル、アクリル酸イソボルニル、アクリル酸ボルニル、アクリル酸メンチル、アクリル酸フェンチル、アクリル酸アダマンチル、アクリル酸ジメチルアダマンチル、アクリル酸トリシクロ［５．２．１．０２，６］デカ−８−イル、アクリル酸トリシクロ［５．２．１．０２，６］デカ−４−メチル、アクリル酸シクロデシル、メタクリル酸シクロペンチル、メタクリル酸シクロヘキシル、メタクリル酸メチルシクロヘキシル、メタクリル酸トリメチルシクロヘキシル、メタクリル酸ノルボルニル、メタクリル酸ノルボルニルメチル、メタクリル酸シアノノルボルニル、メタクリル酸フェニルノルボルニル、メタクリル酸イソボルニル、メタクリル酸ボルニル、メタクリル酸メンチル、メタクリル酸フェンチル、メタクリル酸アダマンチル、メタクリル酸ジメチルアダマンチル、メタクリル酸トリシクロ［５．２．１．０２，６］デカ−８−イル、メタクリル酸トリシクロ［５．２．１．０２，６］デカ−４−メチル、メタクリル酸シクロデシル等が挙げられる。この内、低吸湿性の点で、メタクリル酸シクロペンチル、メタクリル酸シクロヘキシル、メタクリル酸メチルシクロヘキシル、メタクリル酸トリメチルシクロヘキシル、メタクリル酸ノルボルニル、メタクリル酸ノルボルニルメチル、メタクリル酸イソボルニル、メタクリル酸ボルニル、メタクリル酸メンチル、メタクリル酸フェンチル、メタクリル酸アダマンチル、メタクリル酸ジメチルアダマンチル、メタクリル酸トリシクロ［５．２．１．０２，６］デカ−８−イル、メタクリル酸トリシクロ［５．２．１．０２，６］デカ−４−メチル、メタクリル酸シクロデシル等が好ましい。さらに、耐熱性、低吸湿性の点で特に好ましいものとしては、メタクリル酸シクロヘキシル、メタクリル酸イソボルニル、メタクリル酸ノルボルニル、メタクリル酸ノルボルニルメチル、メタクリル酸トリシクロ［５．２．１．０２，６］デカ−８−イル又はメタクリル酸トリシクロ［５．２．１．０２，６］デカ−４−メチルが挙げられる。また、これらは１種又は２種以上で使用してもよい。 Monomer component (A) used in the present invention: As the (meth) acrylic acid ester having an alicyclic hydrocarbon group having 5 to 22 carbon atoms in the ester moiety, an acrylic acid ester, a methacrylic acid ester, or a mixture thereof Any of these may be used, for example, cyclopentyl acrylate, cyclohexyl acrylate, methyl cyclohexyl acrylate, trimethyl cyclohexyl acrylate, norbornyl acrylate, norbornyl methyl acrylate, cyano norbornyl acrylate, phenyl norborn acrylate Nyl, isobornyl acrylate, bornyl acrylate, menthyl acrylate, fentyl acrylate, adamantyl acrylate, dimethyladamantyl acrylate, tricyclo [5.2.1.0 2,6 ] dec-8-yl acrylate, acrylic acid G Cyclo [5.2.1.0 2, 6] deca-4-methyl, acrylate cyclodecyl, cyclopentyl methacrylate, cyclohexyl methacrylate, methylcyclohexyl methacrylate trimethyl cyclohexyl, norbornyl methacrylate, norbornyl methacrylate Methyl, cyanonorbornyl methacrylate, phenyl norbornyl methacrylate, isobornyl methacrylate, bornyl methacrylate, menthyl methacrylate, fentyl methacrylate, adamantyl methacrylate, dimethyladamantyl methacrylate, tricyclomethacrylate [5.2.1 .0 2,6] dec-8-yl methacrylate tricyclo [5.2.1.0 2,6] deca-4-methyl, and cyclodecyl methacrylate. Among these, in terms of low hygroscopicity, cyclopentyl methacrylate, cyclohexyl methacrylate, methyl cyclohexyl methacrylate, trimethyl cyclohexyl methacrylate, norbornyl methacrylate, norbornyl methyl methacrylate, isobornyl methacrylate, bornyl methacrylate, menthyl methacrylate Fentyl methacrylate, adamantyl methacrylate, dimethyl adamantyl methacrylate, tricyclo [5.2.1.0 2,6 ] deca-8-yl methacrylate, tricyclo [5.2.1.0 2,6 ] methacrylate Deca-4-methyl, cyclodecyl methacrylate and the like are preferable. Further, particularly preferable in terms of heat resistance and low hygroscopicity, cyclohexyl methacrylate, isobornyl methacrylate, norbornyl methacrylate, norbornyl methyl methacrylate, tricyclomethacrylate [5.2.1.0 2,6 ] Deca-8-yl or tricyclo [5.2.1.0 2,6 ] deca-4-methyl methacrylate. Moreover, you may use these by 1 type (s) or 2 or more types.
また、本発明に用いる単量体成分（Ｃ）：Ｎ−置換マレイミドとしては、例えば、Ｎ−メチルマレイミド、Ｎ−エチルマレイミド、Ｎ−プロピルマレイミド、Ｎ−ｉ−プロピルマレイミド、Ｎ−ブチルマレイミド、Ｎ−ｉ−ブチルマレイミド、Ｎ−ｔ−ブチルマレイミド、Ｎ−ラウリルマレイミド、Ｎ−シクロヘキシルマレイミド、Ｎ−ベンジルマレイミド、Ｎ−フェニルマレイミド、Ｎ−（２−クロロフェニル）マレイミド、Ｎ−（４−クロロフェニル）マレイミド、Ｎ−（４−ブロモフェニル）マレイミド、Ｎ−（２−メチルフェニル）マレイミド、Ｎ−（２−エチルフェニル）マレイミド、Ｎ−（２−メトキシフェニル）マレイミド、Ｎ−（２，４，６−トリメチルフェニル）マレイミド、Ｎ−（４−ベンジルフェニル）マレイミド、Ｎ−（２，４，６−トリブロモフェニル）マレイミド等が挙げられる。非複屈折性、耐熱性の点で好ましいものとしては、Ｎ−メチルマレイミド、Ｎ−エチルマレイミド、Ｎ−プロピルマレイミド、Ｎ−ｉ−プロピルマレイミド、Ｎ−ブチルマレイミド、Ｎ−ｉ−ブチルマレイミド、Ｎ−ｔ−ブチルマレイミド、Ｎ−シクロヘキシルマレイミド、Ｎ−ラウリルマレイミド又はＮ−フェニルマレイミドが挙げられる。また、これらは１種又は２種以上で使用してもよい。 Examples of the monomer component (C): N-substituted maleimide used in the present invention include N-methylmaleimide, N-ethylmaleimide, N-propylmaleimide, Ni-propylmaleimide, N-butylmaleimide, Ni-butyl maleimide, Nt-butyl maleimide, N-lauryl maleimide, N-cyclohexyl maleimide, N-benzyl maleimide, N-phenyl maleimide, N- (2-chlorophenyl) maleimide, N- (4-chlorophenyl) Maleimide, N- (4-bromophenyl) maleimide, N- (2-methylphenyl) maleimide, N- (2-ethylphenyl) maleimide, N- (2-methoxyphenyl) maleimide, N- (2,4,6 -Trimethylphenyl) maleimide, N- (4-benzylphenyl) maleimide, - (2,4,6-bromophenyl) maleimide and the like. Preferred in terms of non-birefringence and heat resistance are N-methylmaleimide, N-ethylmaleimide, N-propylmaleimide, Ni-propylmaleimide, N-butylmaleimide, Ni-butylmaleimide, N -T-Butylmaleimide, N-cyclohexylmaleimide, N-laurylmaleimide or N-phenylmaleimide. Moreover, you may use these by 1 type (s) or 2 or more types.
また、本発明に用いる単量体成分（Ｅ）：エステル部分に複数のフッ素原子により置換された炭素数２〜９の直鎖式炭化水素基を有する（メタ）アクリル酸エステルとしては、アクリル酸エステル、メタクリル酸エステル、またはこれらの混合物いずれを用いてもよく、例えば、アクリル酸−２，２，２−トリフルオロエチル、アクリル酸−２，２，３，３−テトラフルオロエチル、アクリル酸−１Ｈ，１Ｈ，５Ｈ−オクタフルオロペンチル、アクリル酸−１Ｈ，１Ｈ，２Ｈ，２Ｈ−へプタデカフルオロデシル、メタクリル酸−２，２，２−トリフルオロエチル、メタクリル酸−２，２，３，３−テトラフルオロエチル、メタクリル酸−１Ｈ，１Ｈ，５Ｈ−オクタフルオロペンチル、メタクリル酸−１Ｈ，１Ｈ，２Ｈ，２Ｈ−へプタデカフルオロデシルが挙げられる。非複屈折性、耐熱性の点で好ましいものとしては、メタクリル酸−２，２，２−トリフルオロエチル、メタクリル酸−２，２，３，３−テトラフルオロエチル、又はメタクリル酸−１Ｈ，１Ｈ，５Ｈ−オクタフルオロペンチルが挙げられる。また、これらは１種又は２種以上で使用してもよい。 In addition, monomer component (E) used in the present invention: (meth) acrylic acid ester having a linear hydrocarbon group having 2 to 9 carbon atoms substituted with a plurality of fluorine atoms in the ester moiety is acrylic acid. Any of esters, methacrylic acid esters, or mixtures thereof may be used, for example, acrylic acid-2,2,2-trifluoroethyl, acrylic acid-2,2,3,3-tetrafluoroethyl, acrylic acid- 1H, 1H, 5H-octafluoropentyl, acrylic acid-1H, 1H, 2H, 2H-heptadecafluorodecyl, methacrylate-2,2,2-trifluoroethyl, methacrylate-2,2,3,3 -Tetrafluoroethyl, methacrylic acid-1H, 1H, 5H-octafluoropentyl, methacrylic acid-1H, 1H, 2H, 2H-heptadecaful Rodeshiru and the like. Preferred from the viewpoint of non-birefringence and heat resistance, methacrylic acid-2,2,2-trifluoroethyl, methacrylic acid-2,2,3,3-tetrafluoroethyl, or methacrylic acid-1H, 1H , 5H-octafluoropentyl. Moreover, you may use these by 1 type (s) or 2 or more types.
また、本発明に用いる共重合可能な単量体（Ｆ）：前記した他の共重合可能な単量体は、基本的に重合体の透明性、非複屈折性、耐熱性及び低吸湿性を損なわないものであれば、特に限定されず、具体例としては、アクリル酸メチル、アクリル酸エチル、アクリル酸プロピル、アクリル酸ｎ−ブチル、アクリル酸ｉ−ブチル、アクリル酸ｔ−ブチル、アクリル酸ペンチル、アクリル酸ｎ−ヘキシル、アクリル酸２−エチルヘキシル、アクリル酸ｎ−オクチル、アクリル酸ドデシル、アクリル酸オクタデシル、アクリル酸ブトキシエチル、アクリル酸フェニル、アクリル酸ベンジル、アクリル酸ナフチル、アクリル酸グリシジル、アクリル酸２−ヒドロキシエチル等のアクリル酸エステル類、メタクリル酸メチル、メタクリル酸エチル、メタクリル酸プロピル、メタクリル酸ｎ−ブチル、メタクリル酸ｉ−ブチル、メタクリル酸ｔ−ブチル、メタクリル酸ペンチル、メタクリル酸ｎ−ヘキシル、メタクリル酸２−エチルヘキシル、メタクリル酸ｎ−オクチル、メタクリル酸ドデシル、メタクリル酸オクタデシル、メタクリル酸ブトキシエチル、メタクリル酸フェニル、メタクリル酸ベンジル、メタクリル酸ナフチル、メタクリル酸グリシジル、メタクリル酸２−ヒドロキシエチル等のメタクリル酸エステル類、α−メチルスチレン、α−エチルスチレン、α−フルオロスチレン、α−クロルスチレン、α−ブロモスチレン、フルオロスチレン、クロロスチレン、ブロモスチレン、メチルスチレン、メトキシスチレン等の芳香族ビニル化合物、アクリルアミド、メタクリルアミド、Ｎ，Ｎ−ジメチルアクリルアミド、Ｎ，Ｎ−ジエチルアクリルアミド、Ｎ，Ｎ−ジメチルメタクリルアミド、Ｎ，Ｎ−ジエチルメタクリルアミド等の（メタ）アクリルアミド類、アクリル酸カルシウム、アクリル酸バリウム、アクリル酸鉛、アクリル酸すず、アクリル酸亜鉛、メタクリル酸カルシウム、メタクリル酸バリウム、メタクリル酸鉛、メタクリル酸すず、メタクリル酸亜鉛等の（メタ）アクリル酸金属塩、アクリル酸、メタクリル酸等の不飽和脂肪酸、アクリロニトリル、メタクリロニトリル等のシアン化ビニル化合物が挙げられる。また、これらは１種又は２種以上で使用してもよい。 Further, the copolymerizable monomer (F) used in the present invention: The other copolymerizable monomers described above are basically the transparency, non-birefringence, heat resistance and low hygroscopicity of the polymer. Are not particularly limited, and specific examples include methyl acrylate, ethyl acrylate, propyl acrylate, n-butyl acrylate, i-butyl acrylate, t-butyl acrylate, and acrylic acid. Pentyl, n-hexyl acrylate, 2-ethylhexyl acrylate, n-octyl acrylate, dodecyl acrylate, octadecyl acrylate, butoxyethyl acrylate, phenyl acrylate, benzyl acrylate, naphthyl acrylate, glycidyl acrylate, acrylic Acrylic acid esters such as 2-hydroxyethyl acid, methyl methacrylate, ethyl methacrylate, methacrylate Propyl sulfate, n-butyl methacrylate, i-butyl methacrylate, t-butyl methacrylate, pentyl methacrylate, n-hexyl methacrylate, 2-ethylhexyl methacrylate, n-octyl methacrylate, dodecyl methacrylate, methacrylic acid Methacrylic acid esters such as octadecyl, butoxyethyl methacrylate, phenyl methacrylate, benzyl methacrylate, naphthyl methacrylate, glycidyl methacrylate, 2-hydroxyethyl methacrylate, α-methylstyrene, α-ethylstyrene, α-fluorostyrene , Α-chlorostyrene, α-bromostyrene, fluorostyrene, chlorostyrene, bromostyrene, methylstyrene, methoxystyrene, and other aromatic vinyl compounds, acrylamide, methacrylamide, N, N- (Meth) acrylamides such as methylacrylamide, N, N-diethylacrylamide, N, N-dimethylmethacrylamide, N, N-diethylmethacrylamide, calcium acrylate, barium acrylate, lead acrylate, tin acrylate, acrylic (Meth) acrylic acid metal salts such as zinc acid, calcium methacrylate, barium methacrylate, lead methacrylate, tin methacrylate, zinc methacrylate, unsaturated fatty acids such as acrylic acid and methacrylic acid, acrylonitrile, methacrylonitrile, etc. A vinyl cyanide compound is mentioned. Moreover, you may use these by 1 type (s) or 2 or more types.
本発明において、（ａ）（メタ）アクリル系樹脂として、単量体成分（Ａ）：エステル部分に炭素数５〜２２の脂環式炭化水素基を有する（メタ）アクリル酸エステル５〜４０重量％、単量体成分（Ｂ）：メタクリル酸メチル５０〜８０重量％、単量体成分（Ｃ）：Ｎ−置換マレイミド５〜４０重量％、単量体成分（Ｄ）：メタクリル酸ベンジル０〜３０重量％、及び単量体成分（Ｆ）：これらと共重合可能な単量体０〜１０重量％を含む単量体混合物を共重合して得られる共重合体（（メタ）アクリル酸エステル共重合体（Ｉ））が用いられることが好ましい。 In the present invention, as (a) (meth) acrylic resin, monomer component (A): (meth) acrylic acid ester having an alicyclic hydrocarbon group having 5 to 22 carbon atoms in the ester portion is 5 to 40 weights. %, Monomer component (B): methyl methacrylate 50-80 wt%, monomer component (C): N-substituted maleimide 5-40 wt%, monomer component (D): benzyl methacrylate 0-0 30% by weight and monomer component (F): a copolymer ((meth) acrylic acid ester obtained by copolymerizing a monomer mixture containing 0 to 10% by weight of monomers copolymerizable therewith Copolymer (I)) is preferably used.
（メタ）アクリル酸エステル共重合体（Ｉ）に用いる単量体成分（Ａ）：エステル部分に炭素数５〜２２の脂環式炭化水素基を有する（メタ）アクリル酸エステルの含有量は、単量体の総量に対して、５〜４０重量％が好ましく、１０〜４０重量％であることが吸湿性の点でより好ましい。脂環式（メタ）アクリル酸エステルの含有量が５重量％未満であると、複屈折が大きく、吸湿性が高くなる傾向にあり、４０重量％を超えると、機械的強度が低下する問題が生じる傾向にある。 Monomer component (A) used for (meth) acrylic acid ester copolymer (I): The content of (meth) acrylic acid ester having an alicyclic hydrocarbon group having 5 to 22 carbon atoms in the ester portion is 5-40 weight% is preferable with respect to the total amount of a monomer, and it is more preferable that it is 10-40 weight% from a hygroscopic point. If the content of the alicyclic (meth) acrylic acid ester is less than 5% by weight, the birefringence tends to be large and the hygroscopicity tends to be high, and if it exceeds 40% by weight, the mechanical strength decreases. Tend to occur.
また、（メタ）アクリル酸エステル共重合体（Ｉ）に用いる単量体成分（Ｂ）：メタクリル酸メチルの含有量は、単量体の総量に対して、５０〜８０重量％が好ましく、６０〜７５重量％であることがより好ましい。メタクリル酸メチルの含有量が５０重量％未満では、機械的強度が低下する傾向にあり、８０重量％を超えると、非複屈折性、耐熱性及び低吸湿性に問題が生じる傾向にある。 Further, the content of the monomer component (B): methyl methacrylate used in the (meth) acrylic acid ester copolymer (I) is preferably 50 to 80% by weight based on the total amount of monomers, More preferably, it is -75 weight%. If the content of methyl methacrylate is less than 50% by weight, the mechanical strength tends to decrease, and if it exceeds 80% by weight, problems tend to occur in non-birefringence, heat resistance and low hygroscopicity.
さらに、（メタ）アクリル酸エステル共重合体（Ｉ）に用いる単量体成分（Ｃ）：Ｎ−置換マレイミドの含有量は、単量体の総量に対して、５〜４０重量％が好ましく、５〜１０重量％であることが非複屈折性及び耐熱性の点でより好ましい。Ｎ−置換マレイミドの含有量が５重量％未満では、複屈折が大きく、ガラス転移温度が低くなる傾向にあり、４０重量％を超えると、反応性が低下し、残存モノマーが多くなる傾向にあり、複屈折も大きくなる。 Furthermore, the content of the monomer component (C): N-substituted maleimide used in the (meth) acrylic acid ester copolymer (I) is preferably 5 to 40% by weight based on the total amount of monomers, 5 to 10% by weight is more preferable in terms of non-birefringence and heat resistance. If the content of N-substituted maleimide is less than 5% by weight, the birefringence tends to be large and the glass transition temperature tends to be low, and if it exceeds 40% by weight, the reactivity tends to decrease and the residual monomer tends to increase. Also, the birefringence increases.
また、（メタ）アクリル酸エステル共重合体（Ｉ）に用いる単量体成分（Ｄ）：メタクリル酸ベンジルの含有量は、単量体の総量に対して、０〜３０重量％が好ましく、耐熱性、非複屈折性の点で５〜２５重量％であることがより好ましい。メタクリル酸ベンジルの含有量が３０重量％を超えると、ガラス転移温度が低くなる傾向にある。 The content of the monomer component (D): benzyl methacrylate used in the (meth) acrylic acid ester copolymer (I) is preferably 0 to 30% by weight with respect to the total amount of monomers, It is more preferably 5 to 25% by weight in view of the property and non-birefringence. When the content of benzyl methacrylate exceeds 30% by weight, the glass transition temperature tends to be low.
また、（メタ）アクリル酸エステル共重合体（Ｉ）に用いる単量体成分（Ｆ）：これらと共重合可能な単量体の含有量は、単量体の総量に対して、０〜１０重量％が好ましく、０〜５重量％であることがより好ましい。単量体成分（Ｆ）の含有量が１０重量％を超えると、耐熱性が低下し、非複屈折性が劣ることになる。 Moreover, monomer component (F) used for (meth) acrylic acid ester copolymer (I): Content of the monomer copolymerizable with these is 0-10 with respect to the total amount of monomers. % By weight is preferable, and 0 to 5% by weight is more preferable. When content of a monomer component (F) exceeds 10 weight%, heat resistance will fall and non-birefringence will be inferior.
また、（メタ）アクリル酸エステル共重合体（Ｉ）の他に、本発明において、（ａ）（メタ）アクリル系樹脂として、単量体成分（Ａ）：エステル部分に炭素数５〜２２の脂環式炭化水素基を有する（メタ）アクリル酸エステル５〜４０重量％、単量体成分（Ｂ）：メタクリル酸メチル４０〜８０重量％、単量体成分（Ｃ）：Ｎ−置換マレイミド５〜４０重量％、単量体成分（Ｅ）：エステル部分に複数のフッ素原子により置換された炭素数２〜９の直鎖式炭化水素基を有する（メタ）アクリル酸エステル０〜５０重量％、及び単量体成分（Ｆ）：これらと共重合可能な単量体０〜１０重量％を含む単量体混合物を共重合して得られる共重合体（（メタ）アクリル酸エステル共重合体（ＩＩ））が用いられることが好ましい。 In addition to the (meth) acrylic acid ester copolymer (I), in the present invention, as the (a) (meth) acrylic resin, the monomer component (A): an ester moiety having 5 to 22 carbon atoms. (Meth) acrylic acid ester having an alicyclic hydrocarbon group 5 to 40% by weight, monomer component (B): methyl methacrylate 40 to 80% by weight, monomer component (C): N-substituted maleimide 5 ~ 40 wt%, monomer component (E): (meth) acrylic acid ester having a C2-C9 linear hydrocarbon group substituted by a plurality of fluorine atoms in the ester moiety, 0 to 50 wt%, And monomer component (F): a copolymer obtained by copolymerizing a monomer mixture containing 0 to 10% by weight of a monomer copolymerizable therewith ((meth) acrylic acid ester copolymer ( II)) is preferably used.
（メタ）アクリル酸エステル共重合体（ＩＩ）に用いる単量体成分（Ａ）：エステル部分に炭素数５〜２２の脂環式炭化水素基を有する（メタ）アクリル酸エステルの含有量は、単量体の総量に対して、５〜４０重量％が好ましく、１０〜４０重量％であることが吸湿性の点でより好ましい。脂環式（メタ）アクリル酸エステルの含有量が５重量％未満であると、複屈折が大きく、吸湿性が高くなる傾向にあり、４０重量％を超えると、機械的強度が低下する問題が生じる。 Monomer component (A) used for (meth) acrylic acid ester copolymer (II): The content of (meth) acrylic acid ester having an alicyclic hydrocarbon group having 5 to 22 carbon atoms in the ester portion is 5-40 weight% is preferable with respect to the total amount of a monomer, and it is more preferable that it is 10-40 weight% from a hygroscopic point. If the content of the alicyclic (meth) acrylic acid ester is less than 5% by weight, the birefringence tends to be large and the hygroscopicity tends to be high, and if it exceeds 40% by weight, the mechanical strength decreases. Arise.
また、（メタ）アクリル酸エステル共重合体（ＩＩ）に用いる単量体成分（Ｂ）：メタクリル酸メチルの含有量は、単量体の総量に対して、４０〜８０重量％が好ましく、６０〜７５重量％であることがより好ましい。メタクリル酸メチルの含有量が４０重量％未満では、機械的強度が低下し、８０重量％を超えると、非複屈折性、耐熱性及び低吸湿性に問題が生じる。 Further, the content of the monomer component (B): methyl methacrylate used in the (meth) acrylic acid ester copolymer (II) is preferably 40 to 80% by weight based on the total amount of monomers, 60 More preferably, it is -75 weight%. When the content of methyl methacrylate is less than 40% by weight, the mechanical strength is lowered, and when it exceeds 80% by weight, problems arise in non-birefringence, heat resistance and low hygroscopicity.
さらに、（メタ）アクリル酸エステル共重合体（ＩＩ）に用いる単量体成分（Ｃ）：Ｎ−置換マレイミドの含有量は、単量体の総量に対して、５〜４０重量％が好ましく、１０〜３０重量％であることが非複屈折性及び耐熱性の点でより好ましい。Ｎ−置換マレイミドの含有量が５重量％未満では、複屈折が大きく、ガラス転移温度が低くなる傾向にあり、４０重量％を超えると、反応性が低下し、残存モノマーが多くなる傾向にあり、複屈折も大きくなる。 Furthermore, the content of the monomer component (C): N-substituted maleimide used in the (meth) acrylic acid ester copolymer (II) is preferably 5 to 40% by weight based on the total amount of monomers, It is more preferably 10 to 30% by weight in terms of non-birefringence and heat resistance. If the content of N-substituted maleimide is less than 5% by weight, the birefringence tends to be large and the glass transition temperature tends to be low, and if it exceeds 40% by weight, the reactivity tends to decrease and the residual monomer tends to increase. Also, the birefringence increases.
また、（メタ）アクリル酸エステル共重合体（ＩＩ）に用いる単量体成分（Ｅ）：エステル部分に複数のフッ素原子により置換された炭素数２〜９の直鎖式炭化水素基を有する（メタ）アクリル酸エステルの含有量は、単量体の総量に対して、０〜５０重量％が好ましく、耐熱性、非複屈折性の点で５〜４０重量％であることがより好ましい。フッ素置換（メタ）アクリル酸エステルの含有量が５０重量％を超えると、ガラス転移温度が低くなる傾向にある。 Moreover, monomer component (E) used for (meth) acrylic acid ester copolymer (II): It has a C2-C9 linear hydrocarbon group substituted by the some fluorine atom in the ester part ( The content of the (meth) acrylic acid ester is preferably 0 to 50% by weight with respect to the total amount of monomers, and more preferably 5 to 40% by weight in terms of heat resistance and non-birefringence. When the content of the fluorine-substituted (meth) acrylic acid ester exceeds 50% by weight, the glass transition temperature tends to be low.
また、（メタ）アクリル酸エステル共重合体（ＩＩ）に用いる単量体成分（Ｆ）：これらと共重合可能な単量体の含有量は、単量体の総量に対して、０〜１０重量％が好ましく、０〜５重量％であることがより好ましい。単量体成分（Ｆ）の含有量が１０重量％を超えると、耐熱性が低下し、非複屈折性が劣ることになる。 Moreover, monomer component (F) used for (meth) acrylic acid ester copolymer (II): Content of the monomer copolymerizable with these is 0-10 with respect to the total amount of monomers. % By weight is preferable, and 0 to 5% by weight is more preferable. When content of a monomer component (F) exceeds 10 weight%, heat resistance will fall and non-birefringence will be inferior.
本発明の（ａ）（メタ）アクリル系樹脂を製造するための重合方法としては塊状重合、懸濁重合、乳化重合、溶液重合等の既存の方法を適用できる。 As the polymerization method for producing the (a) (meth) acrylic resin of the present invention, existing methods such as bulk polymerization, suspension polymerization, emulsion polymerization and solution polymerization can be applied.
本発明の重合を行う際には、重合開始剤を用いることができる。重合開始剤としては、過酸化ベンゾイル、過酸化ラウロイル、ジ−ｔ−ブチルパーオキシヘキサヒドロテレフタレート、ｔ−ブチルパーオキシ−２−エチルヘキサノエート、１，１−ｔ−ブチルパーオキシ−３，３，５−トリメチルシクロヘキサン等の有機過酸化物、アゾビスイソブチロニトリル、アゾビス−４−メトキシ−２，４−ジメチルバレロニトリル、アゾビスシクロヘキサノン−１−カルボニトリル、アゾジベンゾイル等のアゾ化合物、過硫酸カリウム、過硫酸アンモニウム等の水溶性触媒及び過酸化物あるいは過硫酸塩と還元剤の組み合わせによるレドックス触媒等、通常のラジカル重合に使用できるものはいずれも使用することができる。重合開始剤は、単量体の総量に対して０．０１〜１０重量％の範囲で使用されることが好ましい。 In carrying out the polymerization of the present invention, a polymerization initiator can be used. As the polymerization initiator, benzoyl peroxide, lauroyl peroxide, di-t-butylperoxyhexahydroterephthalate, t-butylperoxy-2-ethylhexanoate, 1,1-t-butylperoxy-3, Organic peroxides such as 3,5-trimethylcyclohexane, azo compounds such as azobisisobutyronitrile, azobis-4-methoxy-2,4-dimethylvaleronitrile, azobiscyclohexanone-1-carbonitrile, azodibenzoyl Any of water-soluble catalysts such as potassium persulfate and ammonium persulfate and redox catalysts based on a combination of peroxide or persulfate and a reducing agent can be used. The polymerization initiator is preferably used in the range of 0.01 to 10% by weight based on the total amount of monomers.
さらに、分子量調整剤として、メルカプタン系化合物、チオグリコール、四塩化炭素、α−メチルスチレンダイマー等を必要に応じて添加することができる。熱重合による場合、重合温度は、０〜２００℃の間で適宜選択することが好ましく、５０〜１２０℃がより好ましい。 Furthermore, mercaptan compounds, thioglycol, carbon tetrachloride, α-methylstyrene dimer, etc. can be added as necessary as molecular weight modifiers. In the case of thermal polymerization, the polymerization temperature is preferably appropriately selected between 0-200 ° C, more preferably 50-120 ° C.
懸濁重合による場合は、水性媒体中で行われ、懸濁剤及び必要に応じて懸濁助剤を添加して行う。懸濁剤としては、ポリビニルアルコール、メチルセルロース、ポリアクリルアミド、ポリ（メタ）アクリル酸塩等の水溶性高分子、リン酸カルシウム、ピロリン酸マグネシウム等の難溶性無機物質等があり、水溶性高分子は、単量体の総量に対して０．０３〜１重量％使用するのが好ましく、難溶性無機物質は、単量体の総量に対して０．０５〜０．５重量％使用するのが好ましい。 In the case of suspension polymerization, it is carried out in an aqueous medium, and a suspension agent and, if necessary, a suspension aid are added. Suspending agents include water-soluble polymers such as polyvinyl alcohol, methylcellulose, polyacrylamide, and poly (meth) acrylate, and poorly soluble inorganic substances such as calcium phosphate and magnesium pyrophosphate. It is preferable to use 0.03 to 1% by weight based on the total amount of the monomer, and it is preferable to use 0.05 to 0.5% by weight of the sparingly soluble inorganic substance based on the total amount of the monomer.
懸濁助剤としては、ドデシルベンゼンスルホン酸ナトリウム等の陰イオン界面活性剤があり、懸濁剤として難溶性無機物質を使用する場合には、懸濁助剤を使用するのが好ましい。懸濁助剤は、単量体の総量に対して０．００１〜０．０２重量％使用するのが好ましい。 As the suspension aid, there are anionic surfactants such as sodium dodecylbenzenesulfonate, and when a poorly soluble inorganic substance is used as the suspension agent, it is preferable to use a suspension aid. The suspension aid is preferably used in an amount of 0.001 to 0.02% by weight based on the total amount of monomers.
本発明における（ａ）（メタ）アクリル系樹脂は、その分子量について特に制限はないが、重量平均分子量（ポリスチレン換算）が１０，０００〜１，０００，０００の範囲のものが好ましく、耐熱性、成形性の点で、５０，０００〜３００，０００の範囲のものが特に好ましい。重量平均分子量は、ゲルパーミエーションクロマトグラフィーで測定し、標準ポリスチレン換算した値である。 The (a) (meth) acrylic resin in the present invention is not particularly limited in terms of its molecular weight, but preferably has a weight average molecular weight (in terms of polystyrene) in the range of 10,000 to 1,000,000, The thing of the range of 50,000-300,000 is especially preferable at the point of a moldability. The weight average molecular weight is a value measured by gel permeation chromatography and converted to standard polystyrene.
本発明のフィルター用樹脂組成物は、（ａ）（メタ）アクリル系樹脂、及び（ｂ）特定波長吸収剤を含み、（ａ）（メタ）アクリル系樹脂１００重量部に対し、（ｂ）特定波長吸収剤を０．１〜１０重量部含むことが好ましい。（ｂ）特定波長吸収剤としては、有機系特定波長吸収剤又は無機系特定波長吸収剤を用いることが可能であり、両者を併用して用いることもできる。 The resin composition for a filter of the present invention includes (a) a (meth) acrylic resin and (b) a specific wavelength absorber, and (b) specific to (a) 100 parts by weight of the (meth) acrylic resin. It is preferable that 0.1-10 weight part of wavelength absorbers are included. (B) As the specific wavelength absorber, an organic specific wavelength absorber or an inorganic specific wavelength absorber can be used, and both can be used in combination.
本発明においては、有機系特定波長吸収剤を用いることが好ましく、有機系特定波長吸収剤としては、例えば、可視光線吸収剤、近赤外線吸収剤、紫外線吸収剤などが挙げられる。特にプラズマディスプレイパネルに用いる場合、有機系特定波長吸収剤として有機系近赤外線吸収剤を用いることが好ましい。有機系近赤外線吸収剤としては、８００〜１２００ｎｍ波長領域に極大吸収波長を持つ化合物が好ましい。有機系赤外線吸収剤として、例えば、アミニウム化合物、ジイモニウム化合物、ニッケルジチオール化合物、フタロシアニン化合物等を用いることができる。本発明においては、アミニウム化合物、ジイモニウム化合物（例えば、ＩＲＧ−０２２，ＩＲＧ−０４０：日本化薬株式会社製商品名）、あるいはニッケルジチオール化合物（例えば、ＳＩＲ−１２８、ＳＩＲ−１３０、ＳＩＲ−１３２、ＳＩＲ−１５９、ＳＩＲ−１５２、ＳＩＲ−１６２：三井化学株式会社製商品名）などの近赤外線吸収性化合物を用いることが好ましい。これらの近赤外線吸収性化合物のうち、最も効果的に近赤外線を吸収する効果があるのは、ジイモニウム化合物である。 In the present invention, an organic specific wavelength absorber is preferably used, and examples of the organic specific wavelength absorber include a visible light absorber, a near infrared absorber, and an ultraviolet absorber. In particular, when used in a plasma display panel, it is preferable to use an organic near-infrared absorber as the organic specific wavelength absorber. As the organic near-infrared absorber, a compound having a maximum absorption wavelength in the 800 to 1200 nm wavelength region is preferable. As the organic infrared absorber, for example, an aminium compound, a diimonium compound, a nickel dithiol compound, a phthalocyanine compound, or the like can be used. In the present invention, an aminium compound, a diimonium compound (for example, IRG-022, IRG-040: trade name manufactured by Nippon Kayaku Co., Ltd.), or a nickel dithiol compound (for example, SIR-128, SIR-130, SIR-132, It is preferable to use a near-infrared absorbing compound such as SIR-159, SIR-152, SIR-162 (trade name, manufactured by Mitsui Chemicals, Inc.). Of these near-infrared absorbing compounds, the diimonium compound is most effective in absorbing near-infrared rays.
アミニウム化合物としては、下記式（１）で表される化合物が好ましい。
ジイモニウム化合物としては、下記式（２）で表される化合物が好ましい。
ニッケルジチオール化合物としては、下記式（３）で表される化合物が好ましい。
可視光線吸収剤としては、５６０〜６２０ｎｍの波長領域に極大吸収波長を持つ化合物が好ましい。可視光線吸収剤として、例えば、シアニン化合物、キナクリドン化合物、ポルフィリン化合物、スクアリリウム化合物などが挙げられる。 As the visible light absorber, a compound having a maximum absorption wavelength in a wavelength region of 560 to 620 nm is preferable. Examples of visible light absorbers include cyanine compounds, quinacridone compounds, porphyrin compounds, squarylium compounds, and the like.
無機系特定波長吸収剤としては、例えば、可視光線吸収剤、近赤外線吸収剤、紫外線吸収剤などが挙げられる。特にプラズマディスプレイパネルに用いる場合、無機系近赤外線吸収剤を用いることが好ましく、無機系近赤外線吸収剤として、例えば、金属酸化物粒子を用いることができる。金属酸化物の粒子を用いる場合、一次粒子の粒径が近赤外線の波長より長すぎると遮蔽効率は向上するが、粒子表面で乱反射が起き、ヘイズが増大するため透明性が低下する。一方、粒径が近赤外線の波長に比べて短すぎると遮蔽効果が低下する。好ましい粒径は０．０１〜５μｍであり、０．１〜３μｍがさらに好ましい。金属酸化物としては、酸化スズ、酸化インジウム、酸化マグネシウム、酸化チタン、酸化クロム、酸化ジルコニウム、酸化ニッケル、酸化アルミニウム、酸化亜鉛、酸化鉄、酸化アンモン、酸化鉛、酸化ビスマス、酸化ランタン等が挙げられる。 Examples of the inorganic specific wavelength absorber include a visible light absorber, a near infrared absorber, and an ultraviolet absorber. In particular, when used in a plasma display panel, it is preferable to use an inorganic near-infrared absorber, and for example, metal oxide particles can be used as the inorganic near-infrared absorber. When metal oxide particles are used, if the particle size of the primary particles is too longer than the near-infrared wavelength, the shielding efficiency is improved, but irregular reflection occurs on the particle surface and haze increases, resulting in a decrease in transparency. On the other hand, if the particle size is too short compared to the wavelength of near infrared rays, the shielding effect decreases. The preferred particle size is 0.01-5 μm, more preferably 0.1-3 μm. Examples of metal oxides include tin oxide, indium oxide, magnesium oxide, titanium oxide, chromium oxide, zirconium oxide, nickel oxide, aluminum oxide, zinc oxide, iron oxide, ammonium oxide, lead oxide, bismuth oxide, and lanthanum oxide. It is done.
（ｂ）特定波長吸収剤は、上記（ａ）（メタ）アクリル系樹脂中に均一に分散される。その最適量は、（ａ）（メタ）アクリル系樹脂１００重量部に対して（ｂ）特定波長吸収剤が０．１〜１０重量部である。より好ましくは０．２〜５重量部、さらに好ましくは０．２５〜３重量部である。０．１重量部未満では特定波長吸収効果が不足し、１０重量部を超えると樹脂との十分な混和状態（ミシビリティ）の達成が困難となる。 (B) The specific wavelength absorber is uniformly dispersed in the (a) (meth) acrylic resin. The optimum amount is 0.1 to 10 parts by weight of (b) the specific wavelength absorber with respect to 100 parts by weight of (a) (meth) acrylic resin. More preferably, it is 0.2-5 weight part, More preferably, it is 0.25-3 weight part. If the amount is less than 0.1 part by weight, the specific wavelength absorption effect is insufficient. If the amount exceeds 10 parts by weight, it is difficult to achieve a sufficient mixed state (missibility) with the resin.
本発明で使用する樹脂組成物には、必要に応じてさらに、希釈剤、可塑剤、酸化防止剤、充填剤、粘着付与剤、架橋剤などの添加剤を配合しても良い。 You may mix | blend additives, such as a diluent, a plasticizer, antioxidant, a filler, a tackifier, and a crosslinking agent, with the resin composition used by this invention further as needed.
本発明のフィルター用樹脂組成物は、各種ディスプレイから放出される特定波長、特に特定波長吸収剤として、近赤外線吸収剤を用いた場合には、プラズマディスプレイから放出される熱線、すなわち近赤外線領域（ＮＩＲ）の波長を効率的に吸収し、赤、青、緑の３原色発光に影響を及ぼさないフィルターを得ることができる。また、本発明のフィルター用樹脂組成物は、配向複屈折が小さく、ガラス転移点（Ｔｇ）が高く、さらには、透明性に優れる（メタ）アクリル系樹脂を主体として用いた組成物である。配向複屈折の小さな樹脂は、樹脂をフィルム状に形成した場合に複屈折の発生を抑えることができるために、フィルム状フィルターの形成に好ましく用いることができる。本発明のフィルター用樹脂組成物を用いることにより、耐熱性、耐光性等の耐久性が良好で、熱劣化の程度が極めて少なく、均一で高精細な画像が得られ、経時的にも安定なフィルターを得ることができる。特に、特定波長吸収剤として有機系特定波長吸収剤を使用した場合、有機系特定波長吸収剤の劣化を抑えることが可能である。さらに、本発明のフィルター用樹脂組成物を用いることにより、特定波長吸収フィルター、特にＮＩＲ吸収フィルムを安価に供給することができる。 When the near-infrared absorber is used as a specific wavelength emitted from various displays, particularly as the specific wavelength absorber, the filter resin composition of the present invention is a heat ray emitted from a plasma display, that is, a near-infrared region ( NIR) can be efficiently absorbed, and a filter that does not affect the emission of the three primary colors of red, blue, and green can be obtained. The resin composition for a filter of the present invention is a composition mainly composed of a (meth) acrylic resin having a small orientation birefringence, a high glass transition point (Tg), and excellent transparency. A resin having a small orientation birefringence can be preferably used for forming a film-like filter because the occurrence of birefringence can be suppressed when the resin is formed into a film. By using the filter resin composition of the present invention, the durability such as heat resistance and light resistance is good, the degree of thermal deterioration is extremely small, a uniform and high-definition image is obtained, and stable over time. A filter can be obtained. In particular, when an organic specific wavelength absorber is used as the specific wavelength absorber, it is possible to suppress deterioration of the organic specific wavelength absorber. Furthermore, by using the filter resin composition of the present invention, a specific wavelength absorption filter, particularly an NIR absorption film, can be supplied at low cost.
次に、本発明のフィルター用組成物を用いた特定波長吸収フィルターを製造する方法について説明する。例えば、（ａ）（メタ）アクリル系樹脂中に、上記の（ｂ）特定波長吸収剤を含有させた組成物は、アセトン、メチルエチルケトン（ＭＥＫ）あるいはアセトニトリルなどから選ばれた１種類以上の溶媒に希釈後、プラスチックフィルムの片面に塗布され、その後乾燥することにより樹脂組成物層（特定波長吸収層）が形成される。あるいは（ｂ）特定波長吸収剤を先にこれらの溶媒に希釈後、（ａ）（メタ）アクリル系樹脂と混合することもできる。この際、これらの組成物のｐＨは４．０〜８．０の範囲にあることが好ましく、ｐＨ値がこの範囲を逸脱すると、特定波長吸収フィルターの経時安定性が低下することがある。また樹脂組成物層に残存する溶媒の量は１０％以下であることが好ましく、さらに５％以下にすると、特定波長吸収性の経時安定性が増す。 Next, a method for producing a specific wavelength absorption filter using the filter composition of the present invention will be described. For example, (a) a composition containing (b) a specific wavelength absorber in a (meth) acrylic resin contains one or more solvents selected from acetone, methyl ethyl ketone (MEK), acetonitrile, and the like. After dilution, it is applied to one side of a plastic film and then dried to form a resin composition layer (specific wavelength absorption layer). Alternatively, (b) the specific wavelength absorber may be first diluted in these solvents and then mixed with (a) (meth) acrylic resin. Under the present circumstances, it is preferable that pH of these compositions exists in the range of 4.0-8.0, and when a pH value deviates from this range, the temporal stability of a specific wavelength absorption filter may fall. The amount of the solvent remaining in the resin composition layer is preferably 10% or less, and further 5% or less increases the stability over time of the specific wavelength absorptivity.
樹脂組成物層の乾燥後の厚さは、好ましくは３〜１００μｍであり、より好ましくは５〜５０μｍである。３μｍ以下であると、樹脂組成物層が薄すぎるために特定波長を十分に吸収することができなく、１００μｍより厚いと可視光領域の透過率が低下してしまう。 The thickness after drying of a resin composition layer becomes like this. Preferably it is 3-100 micrometers, More preferably, it is 5-50 micrometers. When the thickness is 3 μm or less, the resin composition layer is too thin to sufficiently absorb the specific wavelength, and when it is thicker than 100 μm, the transmittance in the visible light region is lowered.
特定波長吸収フィルターは、本発明のフィルター用組成物を用いた樹脂組成物層（特定波長吸収層）の他に、さらに他の任意の層を有していてもよい。任意の層として、例えば、特定波長吸収フィルターを近赤外線吸収フィルム又はプラズマディスプレイ用電磁波遮蔽フィルムなどとして用いる際に、他のフィルム又はディスプレイに接着するための粘着剤層が挙げられる。また、本発明のフィルター用組成物を用いた樹脂組成物層を２層以上有することも可能である。 The specific wavelength absorption filter may further include any other layer in addition to the resin composition layer (specific wavelength absorption layer) using the filter composition of the present invention. As an arbitrary layer, when using a specific wavelength absorption filter as a near-infrared absorption film or an electromagnetic wave shielding film for plasma displays, for example, a pressure-sensitive adhesive layer for adhering to other films or displays can be mentioned. It is also possible to have two or more resin composition layers using the filter composition of the present invention.
プラスチックフィルムとしては６０％以上の可視光透過率を有するフィルムを用いることが好ましい。より好ましくは７０％以上、更に好ましくは８０％以上である。プラスチックフィルムとして具体的にポリエチレンテレフタレート（ＰＥＴ）フィルム、ポリエチレンナフタレート（ＰＥＮ）フィルム、ポリエステルフィルム、ポリスルホンフィルム、ポリエーテルスルホンフィルム、ポリエーテルエーテルケトンフィルム、ポリエーテルフィルム、アクリル樹脂フィルム、エポキシ樹脂フィルム、ノルボルネン系高分子フィルムおよびこれらをブレンドした樹脂フィルム等が選択でき、特に、ＰＥＴフィルム、ＰＥＮフィルムを使用することが好ましく、より好ましくはＰＥＴフィルムを使用すると良い。プラスチックフィルムの厚さは１０〜１００μｍであることが好ましい。 As the plastic film, a film having a visible light transmittance of 60% or more is preferably used. More preferably, it is 70% or more, and further preferably 80% or more. Specific examples of plastic film include polyethylene terephthalate (PET) film, polyethylene naphthalate (PEN) film, polyester film, polysulfone film, polyethersulfone film, polyetheretherketone film, polyether film, acrylic resin film, epoxy resin film, A norbornene-based polymer film and a resin film blended with these can be selected. In particular, a PET film or a PEN film is preferably used, and a PET film is more preferably used. The thickness of the plastic film is preferably 10 to 100 μm.
このようにして得られたフィルム状の特定波長吸収フィルターは、配向複屈折が小さく、ガラス転移点（Ｔｇ）が高く、さらには、透明性に優れる（メタ）アクリル系樹脂を主体として用いることによって、高精細な画像を得ることができ、また、長期に亘って紫外線による劣化にも、熱による劣化にも安定であるという優れた特性を有する。特に、特定波長吸収剤として近赤外線吸収剤を用いた場合には、プラズマディスプレイパネル用のＮＩＲ吸収フィルムとして好適に用いられる。また、さらにＮＩＲ吸収フィルムと電磁波シールド層などを積層することによりＥＭＩシールドフィルムとして用いることも可能である。 The film-like specific wavelength absorption filter thus obtained has a small orientation birefringence, a high glass transition point (Tg), and further by using a (meth) acrylic resin having excellent transparency as a main component. High-definition images can be obtained, and it has excellent characteristics that it is stable against deterioration due to ultraviolet rays and heat over a long period of time. In particular, when a near-infrared absorber is used as the specific wavelength absorber, it is suitably used as an NIR absorption film for a plasma display panel. Further, it can be used as an EMI shield film by further laminating an NIR absorption film and an electromagnetic wave shield layer.
本発明のフィルター用樹脂組成物を用いたフィルターは、プラズマディスプレイパネル用フィルター、ＣＲＴ用フィルター、蛍光表示管用フィルター、電界放射型ディスプレイ用フィルター等の蛍光体発光型ディスプレイパネル用フィルターを始め、液晶、エレクトロルミネッセンス等による各種画像表示装置のバンドパスフィルターとして用いることができる。 Filters using the filter resin composition of the present invention include plasma display panel filters, CRT filters, fluorescent display tube filters, field emission display filters and other phosphor-emitting display panel filters, liquid crystals, It can be used as a bandpass filter for various image display devices using electroluminescence or the like.
以下、実施例により本発明を具体的に説明するが、本発明の範囲を制限されるものではない。 EXAMPLES Hereinafter, the present invention will be specifically described with reference to examples, but the scope of the present invention is not limited.
また、以下の実施例で懸濁剤として用いる水溶性重合体（Ａ）（ポリメタクリル酸塩）は、下記の方法で合成した。 Moreover, the water-soluble polymer (A) (polymethacrylate) used as a suspending agent in the following examples was synthesized by the following method.
水溶性重合体（Ａ）の合成
メタクリル酸メチル５ｇ、メタクリル酸２−ヒドロキシエチル１２ｇ、メタクリル酸カリウム２３ｇ及び脱イオン水３６０ｇを内容積５００ｍｌのセパラブルフラスコに入れ、３０分間Ｎ２ガスを吹き込んで系内の空気を除去した後、水浴で加熱して撹拌しながら系内温度を６５℃に昇温し、過硫酸カリウム０．０６ｇを添加した。同温度で５時間重合を行い、続けて９０℃に昇温して２時間撹拌を続けてゼリー状の水溶性重合体（Ａ）を得た。
Synthesis of water-soluble polymer (A) 5 g of methyl methacrylate, 12 g of 2-hydroxyethyl methacrylate, 23 g of potassium methacrylate and 360 g of deionized water were placed in a separable flask having an internal volume of 500 ml, and N 2 gas was blown in for 30 minutes. After the air in the system was removed, the temperature in the system was raised to 65 ° C. while stirring in a water bath, and 0.06 g of potassium persulfate was added. Polymerization was carried out at the same temperature for 5 hours, followed by heating to 90 ° C. and stirring for 2 hours to obtain a jelly-like water-soluble polymer (A).
実施例Ｉ−１
メタクリル酸トリシクロ［５．２．１．０２，６］デカ−８−イル３２０ｇ、メタクリル酸メチル１２８０ｇ、Ｎ−シクロヘキシルマレイミド１００ｇ、メタクリル酸ベンジル３２０ｇ、過酸化ラウロイル８ｇ、ｎ−オクチルメルカプタン４ｇを溶解して単量体混合液とした。
Example I-1
Dissolves 320 g of tricyclo [5.2.1.0 2,6 ] dec-8-yl methacrylate, methyl 1280 g, N-cyclohexylmaleimide 100 g, benzyl methacrylate 320 g, lauroyl peroxide 8 g, n-octyl mercaptan 4 g To obtain a monomer mixture.
撹拌機及びコンデンサを備えた５リットルのセパラブルフラスコに、懸濁剤として前記のゼリー状の水溶性重合体（Ａ）を０．１ｇ、脱イオン水２５００ｇを加え、次いで、リン酸水素二ナトリウム−リン酸二水素ナトリウム緩衝液１００ｇを加えて撹拌し、ｐＨを７．２に調整して懸濁媒体とした。ここに撹拌しながら上記単量体混合液を加え、撹拌回転数２４０ｒｐｍ、窒素雰囲気下で６０℃で３時間、次いで９８℃で２時間重合させ、樹脂粒子を得た（重合率は、重量法で９９％であった）。この樹脂粒子を水洗、脱水、乾燥し、（メタ）アクリル樹脂（（メタ）アクリル樹脂Ｉ−１、Ｍｗ＝１２５，０００）を得た。得られた（メタ）アクリル樹脂Ｉ−１に下記の割合で近赤外線吸収剤と溶媒を混合溶解し、樹脂ワニスＩ−１を得た。
＜樹脂ワニスＩ−１の組成＞
（メタ）アクリル樹脂Ｉ−１：１００重量部
ＳＩＲ−１５９（近赤外線吸収剤：三井化学株式会社製商品名）：０．５重量部
ＭＥＫ：２３０重量部
アセトン：１０重量部
To a 5 liter separable flask equipped with a stirrer and a condenser, 0.1 g of the jelly-form water-soluble polymer (A) and 2500 g of deionized water are added as a suspending agent, and then disodium hydrogen phosphate -Sodium dihydrogen phosphate buffer 100g was added and stirred, pH was adjusted to 7.2, and it was set as the suspension medium. The above monomer mixture was added while stirring, and the mixture was polymerized in a nitrogen atmosphere at 60 ° C. for 3 hours and then at 98 ° C. for 2 hours to obtain resin particles. 99%). The resin particles were washed with water, dehydrated, and dried to obtain a (meth) acrylic resin ((meth) acrylic resin 1-1, Mw = 15,000). A near-infrared absorbent and a solvent were mixed and dissolved in the obtained (meth) acrylic resin I-1 at the following ratio to obtain a resin varnish I-1.
<Composition of resin varnish I-1>
(Meth) acrylic resin I-1: 100 parts by weight SIR-159 (near infrared absorber: trade name, manufactured by Mitsui Chemicals): 0.5 parts by weight MEK: 230 parts by weight Acetone: 10 parts by weight
このようにして得られた樹脂ワニスＩ−１を、ＰＥＴフィルム（東洋紡株式会社製、商品名Ａ−４１００、フィルム厚５０μｍ）上に、乾燥後の塗布厚が１５μｍになるように塗布し、ＮＩＲ吸収フィルムを作製した。なお、ＰＥＴフィルムの可視光透過率は９１％であった。可視光透過率（％）は、日本分光製Ｖ−５７０を用いて、２５℃にて測定した。測定波長は４００〜８００ｎｍの範囲にて測定した。 The resin varnish I-1 thus obtained was applied on a PET film (trade name A-4100, manufactured by Toyobo Co., Ltd., film thickness 50 μm) so that the coating thickness after drying was 15 μm, and NIR An absorption film was prepared. The visible light transmittance of the PET film was 91%. Visible light transmittance (%) was measured at 25 ° C. using V-570 manufactured by JASCO Corporation. The measurement wavelength was measured in the range of 400 to 800 nm.
実施例Ｉ−２
実施例Ｉ−１と同様の合成手順にて、（メタ）アクリル酸エステル組成を、メタクリル酸トリシクロ［５．２．１．０２，６］デカ−８−イル２４０ｇ、メタクリル酸メチル１３２０ｇ、Ｎ−シクロヘキシルマレイミド２００ｇ、メタクリル酸ベンジル２４０ｇの組成に変更し、（メタ）アクリル樹脂Ｉ−２（Ｍｗ＝１４０，０００）を得た。得られた（メタ）アクリル樹脂Ｉ−２を（メタ）アクリル樹脂Ｉ−１の代わりに用いた以外は実施例Ｉ−１と同様の操作を行った。
Example I-2
In the same synthesis procedure as in Example I-1, the (meth) acrylic ester composition was changed to 240 g of tricyclo [5.2.1.0 2,6 ] dec-8-yl methacrylate, 1320 g of methyl methacrylate, N -The composition was changed to 200 g of cyclohexylmaleimide and 240 g of benzyl methacrylate to obtain (meth) acrylic resin I-2 (Mw = 140,000). The same operation as in Example I-1 was performed except that the obtained (meth) acrylic resin I-2 was used instead of the (meth) acrylic resin I-1.
実施例Ｉ−３
実施例Ｉ−１と同様の合成手順にて、（メタ）アクリル酸エステル組成を、メタクリル酸トリシクロ［５．２．１．０２，６］デカ−８−イル１００ｇ、メタクリル酸メチル１５００ｇ、Ｎ−シクロヘキシルマレイミド４００ｇの組成に変更し、（メタ）アクリル樹脂Ｉ−３（Ｍｗ＝１７２，０００）を得た。得られた（メタ）アクリル樹脂Ｉ−３を（メタ）アクリル樹脂Ｉ−１の代わりに用いた以外は実施例Ｉ−１と同様の操作を行った。
Example I-3
In the same synthesis procedure as in Example I-1, the (meth) acrylic acid ester composition was changed to 100 g of tricyclo [5.2.1.0 2,6 ] dec-8-yl methacrylate, 1500 g of methyl methacrylate, N -The composition was changed to 400 g of cyclohexylmaleimide to obtain (meth) acrylic resin I-3 (Mw = 172,000). The same operation as in Example I-1 was performed except that the obtained (meth) acrylic resin I-3 was used instead of the (meth) acrylic resin I-1.
比較例Ｉ−１
実施例Ｉ−１と同様の合成手順にて、（メタ）アクリル酸エステル組成を、メタクリル酸メチル２０００ｇの組成に変更し、（メタ）アクリル樹脂Ｉ−４（Ｍｗ＝８５，０００）を得た。得られた（メタ）アクリル樹脂Ｉ−４を（メタ）アクリル樹脂Ｉ−１の代わりに用いた以外は実施例Ｉ−１と同様の操作を行った。
Comparative Example I-1
In the same synthesis procedure as in Example I-1, the (meth) acrylic acid ester composition was changed to a composition of 2000 g of methyl methacrylate to obtain (meth) acrylic resin I-4 (Mw = 85,000). . The same operation as in Example I-1 was performed except that the obtained (meth) acrylic resin I-4 was used instead of the (meth) acrylic resin I-1.
比較例Ｉ−２
実施例Ｉ−１と同様の合成手順にて、（メタ）アクリル酸エステル組成を、メタクリル酸トリシクロ［５．２．１．０２，６］デカ−８−イル６００ｇ、メタクリル酸メチル１４００ｇの組成に変更し、（メタ）アクリル樹脂Ｉ−５（Ｍｗ＝９０，０００）を得た。得られた（メタ）アクリル樹脂Ｉ−５を（メタ）アクリル樹脂Ｉ−１の代わりに用いた以外は実施例Ｉ−１と同様の操作を行った。
Comparative Example I-2
In the same synthesis procedure as in Example I-1, the (meth) acrylic acid ester composition was composed of 600 g of tricyclo [5.2.1.0 2,6 ] dec-8-yl methacrylate and 1400 g of methyl methacrylate. To obtain (meth) acrylic resin I-5 (Mw = 90,000). The same operation as in Example I-1 was performed except that the obtained (meth) acrylic resin I-5 was used instead of the (meth) acrylic resin I-1.
比較例Ｉ−３
実施例Ｉ−１と同様の合成手順にて、（メタ）アクリル酸エステル組成を、メタクリル酸メチル１６４０ｇ、メタクリル酸ベンジル３６０ｇの組成に変更し、（メタ）アクリル樹脂Ｉ−６（Ｍｗ＝１１４，０００）を得た。得られた（メタ）アクリル樹脂Ｉ−６を（メタ）アクリル樹脂Ｉ−１の代わりに用いた以外は実施例Ｉ−１と同様の操作を行った。
Comparative Example I-3
In the same synthesis procedure as in Example I-1, the (meth) acrylic acid ester composition was changed to a composition of methyl methacrylate 1640 g and benzyl methacrylate 360 g, and (meth) acrylic resin I-6 (Mw = 114, 000). The same operation as in Example I-1 was performed except that the obtained (meth) acrylic resin I-6 was used instead of the (meth) acrylic resin I-1.
以上のようにして作製した（メタ）アクリル樹脂のモノマ組成（重量％）、配向複屈折、飽和吸水率、及びＴｇ（℃）、並びにＮＩＲ吸収フィルムのＮＩＲ吸収性、経時安定性、及びコントラスト性について評価した結果を表１及び２にまとめて示す。測定方法を以下に記載する。 Monomer composition (% by weight), orientation birefringence, saturated water absorption, and Tg (° C.) of the (meth) acrylic resin produced as described above, and NIR absorption, stability with time, and contrast of the NIR absorption film Tables 1 and 2 summarize the results of the evaluation. The measurement method is described below.
（１）配向複屈折
懸濁重合により得られた樹脂粒子１ｇをテトラヒドロフラン６ｇに溶解させ、ガラス基板状に塗布し、ナイフコーターを用いて表面を均一化した。このフィルムを乾燥した後にガラス基板から剥がし、約５０μｍ厚のフィルム（１０×３０（ｍｍ））を作成した。次に、このフィルムを２倍に延伸し（延伸温度：９０℃、長軸方向に延伸）、配向複屈折を測定した。
(1) Oriented birefringence 1 g of resin particles obtained by suspension polymerization were dissolved in 6 g of tetrahydrofuran, applied to a glass substrate, and the surface was made uniform using a knife coater. The film was dried and then peeled off from the glass substrate to prepare a film (10 × 30 (mm)) having a thickness of about 50 μm. Next, this film was stretched twice (stretching temperature: 90 ° C., stretching in the major axis direction), and orientation birefringence was measured.
（２）飽和吸水率
２０×１５×５（ｍｍ）の試験片を乾燥させ、その重量を測定した後、７０℃の水中に放置し、飽和吸水させた後、重量を測定し、次式により飽和吸水率を算出した。
飽和吸水率（％）＝［（飽和吸水後の重量−吸水前の重量）／吸水前の重量］×１００
(2) Saturated water absorption 20 × 15 × 5 (mm) test piece was dried and weighed, then left in 70 ° C. water to absorb saturated water, weighed, and the following formula The saturated water absorption was calculated.
Saturated water absorption (%) = [(weight after saturated water absorption−weight before water absorption) / weight before water absorption] × 100
（３）ガラス転移温度（Ｔｇ）
示差走査熱量計（パーキンエルマー製ＤＳＣ７）にて、得られた樹脂粒子のガラス転移温度（Ｔｇ）を測定した。
(3) Glass transition temperature (Tg)
The glass transition temperature (Tg) of the obtained resin particles was measured with a differential scanning calorimeter (DSC7 manufactured by PerkinElmer).
（４）ＮＩＲ吸収特性
初期透過率：得られたＮＩＲ吸収フィルムの透過率を、分光光度計（日本分光株式会社製Ｖ−５７０）を用いて測定した。波長８５０〜１１００ｎｍ領域の単純平均透過率を初期透過率とした。
処理後透過率：得られたＮＩＲ吸収フィルムを８５℃８５％ＲＨ中に４８時間暴露した後の透過率を、分光光度計（日本分光株式会社製Ｖ−５７０）を用いて測定した。波長８５０〜１１００ｎｍ領域の単純平均透過率を処理後透過率とした。
経時安定性：得られたＮＩＲ吸収フィルムを６５℃９０％ＲＨ中に１０００時間暴露前後の色彩の変化を肉眼で確認し、その変化の程度を大〜小の相対評価で表した。
(4) NIR absorption characteristics Initial transmittance: The transmittance of the obtained NIR absorption film was measured using a spectrophotometer (V-570 manufactured by JASCO Corporation). The simple average transmittance in the wavelength range of 850 to 1100 nm was defined as the initial transmittance.
Transmittance after treatment: The transmittance after the obtained NIR absorbing film was exposed to 85 ° C. and 85% RH for 48 hours was measured using a spectrophotometer (V-570 manufactured by JASCO Corporation). The simple average transmittance in the wavelength range of 850 to 1100 nm was taken as the post-treatment transmittance.
Stability over time: The resulting NIR absorption film was visually examined for changes in color before and after exposure for 1000 hours in 65 ° C. and 90% RH, and the degree of the change was represented by a large to small relative evaluation.
（５）コントラスト性
得られたＮＩＲ吸収フィルムをプラズマディスプレイの前面に貼りあわせ、画面全体のコントラスト、均一性を目視判断した。
(5) Contrast property The obtained NIR absorption film was bonded to the front surface of the plasma display, and the contrast and uniformity of the entire screen were visually determined.
実施例ＩＩ−１
メタクリル酸トリシクロ［５．２．１．０２，６］デカ−８−イル１００ｇ、メタクリル酸メチル１２６０ｇ、Ｎ−シクロヘキシルマレイミド２００ｇ、メタクリル酸−２，２，２−トリフルオロエチル４４０ｇ、過酸化ラウロイル８ｇ、ｎ−オクチルメルカプタン４ｇを溶解して単量体混合液とした。
Example II-1
100 g of tricyclo [5.2.1.0 2,6 ] dec-8-yl methacrylate, 1260 g of methyl methacrylate, 200 g of N-cyclohexylmaleimide, 440 g of 2,2,2-trifluoroethyl methacrylate, lauroyl peroxide 8 g and 4 g of n-octyl mercaptan were dissolved to prepare a monomer mixed solution.
撹拌機及びコンデンサを備えた５リットルのセパラブルフラスコに、懸濁剤として前記のゼリー状の水溶性重合体（Ａ）を０．１ｇ、脱イオン水２５００ｇを加え、次いで、リン酸水素二ナトリウム−リン酸二水素ナトリウム緩衝液１００ｇを加えて撹拌し、ｐＨを７．２に調整して懸濁媒体とした。ここに撹拌しながら上記単量体混合液を加え、撹拌回転数２４０ｒｐｍ、窒素雰囲気下で６０℃で３時間、次いで９８℃で２時間重合させ、樹脂粒子を得た（重合率は、重量法で９９％であった）。この樹脂粒子を水洗、脱水、乾燥し、（メタ）アクリル樹脂（（メタ）アクリル樹脂ＩＩ−１、Ｍｗ＝１８５，０００）を得た。得られた（メタ）アクリル樹脂ＩＩ−１に下記の割合で近赤外線吸収剤と溶媒を混合溶解し、樹脂ワニスＩＩ−１を得た。
＜樹脂ワニスＩＩ−１の組成＞
アクリル樹脂ＩＩ−１：１００重量部
ＳＩＲ−１５９（近赤外線吸収剤：三井化学株式会社製商品名）：０．５重量部
ＭＥＫ：２３０重量部
アセトン：１０重量部
To a 5 liter separable flask equipped with a stirrer and a condenser, 0.1 g of the jelly-form water-soluble polymer (A) and 2500 g of deionized water are added as a suspending agent, and then disodium hydrogen phosphate -Sodium dihydrogen phosphate buffer 100g was added and stirred, pH was adjusted to 7.2, and it was set as the suspension medium. The above monomer mixture was added while stirring, and the mixture was polymerized in a nitrogen atmosphere at 60 ° C. for 3 hours and then at 98 ° C. for 2 hours to obtain resin particles. 99%). The resin particles were washed with water, dehydrated, and dried to obtain a (meth) acrylic resin ((meth) acrylic resin II-1, Mw = 185,000). A near-infrared absorber and a solvent were mixed and dissolved in the obtained (meth) acrylic resin II-1 at the following ratio to obtain a resin varnish II-1.
<Composition of Resin Varnish II-1>
Acrylic resin II-1: 100 parts by weight SIR-159 (near infrared absorber: trade name, manufactured by Mitsui Chemicals): 0.5 parts by weight MEK: 230 parts by weight Acetone: 10 parts by weight
このようにして得られた樹脂ワニスＩＩ−１を、ＰＥＴフィルム（東洋紡株式会社製、商品名Ａ−４１００、フィルム厚５０μｍ）上に、乾燥後の塗布厚が１５μｍになるように塗布し、ＮＩＲ吸収フィルムを作製した。 The resin varnish II-1 thus obtained was applied on a PET film (trade name A-4100, manufactured by Toyobo Co., Ltd., film thickness 50 μm) so that the coating thickness after drying was 15 μm, and NIR An absorption film was prepared.
実施例ＩＩ−２
実施例ＩＩ−１と同様の合成手順にて、（メタ）アクリル酸エステル組成を、メタクリル酸トリシクロ［５．２．１．０２，６］デカ−８−イル２００ｇ、メタクリル酸メチル１０００ｇ、Ｎ−シクロヘキシルマレイミド１００ｇ、メタクリル酸−２，２，２−トリフルオロエチル７００ｇの組成に変更し、（メタ）アクリル樹脂ＩＩ−２（Ｍｗ＝１５１，０００）を得た。得られた（メタ）アクリル樹脂ＩＩ−２を（メタ）アクリル樹脂ＩＩ−１の代わりに用いた以外は実施例ＩＩ−１と同様の操作を行った。
Example II-2
In the same synthesis procedure as in Example II-1, the (meth) acrylic acid ester composition was changed to 200 g of tricyclo [5.2.1.0 2,6 ] dec-8-yl methacrylate, 1000 g of methyl methacrylate, N -The composition was changed to 100 g of cyclohexylmaleimide and 700 g of methacrylic acid-2,2,2-trifluoroethyl to obtain (meth) acrylic resin II-2 (Mw = 151,000). The same operation as in Example II-1 was performed except that the obtained (meth) acrylic resin II-2 was used instead of the (meth) acrylic resin II-1.
実施例ＩＩ−３
実施例ＩＩ−１と同様の合成手順にて、（メタ）アクリル酸エステル組成を、メタクリル酸トリシクロ［５．２．１．０２，６］デカ−８−イル１００ｇ、メタクリル酸メチル１４００ｇ、Ｎ−シクロヘキシルマレイミド２００ｇ、メタクリル酸−２，２，３，３−テトラフルオロエチル３００ｇの組成に変更し、（メタ）アクリル樹脂ＩＩ−３（Ｍｗ＝１６７，０００）を得た。得られた（メタ）アクリル樹脂ＩＩ−３を（メタ）アクリル樹脂ＩＩ−１の代わりに用いた以外は実施例ＩＩ−１と同様の操作を行った。
Example II-3
In the same synthesis procedure as in Example II-1, the (meth) acrylic acid ester composition was changed to 100 g of tricyclo [5.2.1.0 2,6 ] dec-8-yl methacrylate, 1400 g of methyl methacrylate, N -The composition was changed to 200 g of cyclohexylmaleimide and 300 g of 2,2,3,3-tetrafluoroethyl methacrylate to obtain (meth) acrylic resin II-3 (Mw = 167,000). The same operation as in Example II-1 was performed except that the obtained (meth) acrylic resin II-3 was used instead of the (meth) acrylic resin II-1.
比較例ＩＩ−１
実施例ＩＩ−１と同様の合成手順にて、（メタ）アクリル酸エステル組成を、メタクリル酸メチル１０００ｇ、メタクリル酸−２，２，２−トリフルオロエチル１０００ｇの組成に変更し、（メタ）アクリル樹脂ＩＩ−４（Ｍｗ＝１０８，０００）を得た。得られた（メタ）アクリル樹脂ＩＩ−４を（メタ）アクリル樹脂ＩＩ−１の代わりに用いた以外は実施例ＩＩ−１と同様の操作を行った。
Comparative Example II-1
In the same synthesis procedure as in Example II-1, the (meth) acrylic acid ester composition was changed to a composition of 1000 g of methyl methacrylate and 1000 g of methacrylate-2,2,2-trifluoroethyl, and (meth) acrylic. Resin II-4 (Mw = 108,000) was obtained. The same operation as in Example II-1 was performed except that the obtained (meth) acrylic resin II-4 was used instead of the (meth) acrylic resin II-1.
以上のようにして作製した（メタ）アクリル樹脂のモノマ組成（重量％）、配向複屈折、及びＴｇ（℃）、並びにＮＩＲ吸収フィルムのＮＩＲ吸収性、経時安定性、及びコントラスト性について評価した結果を表３及び４にまとめて示す。測定方法は上記のとおりである。 Results of evaluating the monomer composition (% by weight), orientation birefringence, and Tg (° C.) of the (meth) acrylic resin produced as described above, and the NIR absorption, stability over time, and contrast of the NIR absorption film Are summarized in Tables 3 and 4. The measuring method is as described above.
以上の実施例の結果からも理解されるように、本発明のフィルター用樹脂組成物は、特定波長吸収特性、経時安定性、及びコントラスト性に優れる。
As can be understood from the results of the above examples, the filter resin composition of the present invention is excellent in specific wavelength absorption characteristics, stability over time, and contrast.
Claims (14)
単量体成分（Ａ）：エステル部分に炭素数５〜２２の脂環式炭化水素基を有する（メタ）アクリル酸エステル５〜４０重量％、
単量体成分（Ｂ）：メタクリル酸メチル５０〜８０重量％、
単量体成分（Ｃ）：Ｎ−置換マレイミド５〜４０重量％、
単量体成分（Ｄ）：メタクリル酸ベンジル０〜３０重量％、及び
単量体成分（Ｆ）：これらと共重合可能な単量体０〜１０重量％
を含む単量体混合物を重合して得られる（メタ）アクリル酸エステル共重合体を含む請求項１〜３いずれかに記載のフィルター用樹脂組成物。 (A) The (meth) acrylic resin is based on the total amount of monomers.
Monomer component (A): 5 to 40% by weight of (meth) acrylic acid ester having an alicyclic hydrocarbon group having 5 to 22 carbon atoms in the ester portion,
Monomer component (B): 50-80% by weight of methyl methacrylate,
Monomer component (C): 5 to 40% by weight of N-substituted maleimide,
Monomer component (D): 0 to 30% by weight of benzyl methacrylate, and monomer component (F): 0 to 10% by weight of monomer copolymerizable therewith
The resin composition for a filter according to any one of claims 1 to 3, further comprising a (meth) acrylic acid ester copolymer obtained by polymerizing a monomer mixture containing.
単量体成分（Ａ）：エステル部分に炭素数５〜２２の脂環式炭化水素基を有する（メタ）アクリル酸エステル５〜４０重量％、
単量体成分（Ｂ）：メタクリル酸メチル５０〜８０重量％、
単量体成分（Ｃ）：Ｎ−置換マレイミド５〜１０重量％、
単量体成分（Ｄ）：メタクリル酸ベンジル５〜２５重量％、及び
単量体成分（Ｆ）：これらと共重合可能な単量体０〜１０重量％
を含む単量体混合物を重合して得られる（メタ）アクリル酸エステル共重合体を含む請求項１〜４いずれかに記載のフィルター用樹脂組成物。 (A) The (meth) acrylic resin is based on the total amount of monomers.
Monomer component (A): 5 to 40% by weight of (meth) acrylic acid ester having an alicyclic hydrocarbon group having 5 to 22 carbon atoms in the ester portion,
Monomer component (B): 50-80% by weight of methyl methacrylate,
Monomer component (C): N-substituted maleimide 5 to 10% by weight,
Monomer component (D): 5 to 25% by weight of benzyl methacrylate, and monomer component (F): 0 to 10% by weight of monomer copolymerizable therewith
The resin composition for a filter according to any one of claims 1 to 4, comprising a (meth) acrylic acid ester copolymer obtained by polymerizing a monomer mixture containing.
単量体成分（Ａ）：エステル部分に炭素数５〜２２の脂環式炭化水素基を有する（メタ）アクリル酸エステル５〜４０重量％、
単量体成分（Ｂ）：メタクリル酸メチル４０〜８０重量％、
単量体成分（Ｃ）：Ｎ−置換マレイミド５〜４０重量％、
単量体成分（Ｅ）：エステル部分に複数のフッ素原子により置換された炭素数２〜９の直鎖式炭化水素基を有する（メタ）アクリル酸エステル０〜５０重量％、及び
単量体成分（Ｆ）：これらと共重合可能な単量体０〜１０重量％
を含む単量体混合物を重合して得られる（メタ）アクリル酸エステル共重合体を含む請求項１〜３いずれかに記載のフィルター用樹脂組成物。 (A) The (meth) acrylic resin is based on the total amount of monomers.
Monomer component (A): 5 to 40% by weight of (meth) acrylic acid ester having an alicyclic hydrocarbon group having 5 to 22 carbon atoms in the ester portion,
Monomer component (B): methyl methacrylate 40 to 80% by weight,
Monomer component (C): 5 to 40% by weight of N-substituted maleimide,
Monomer component (E): (meth) acrylic acid ester having 0 to 50% by weight of a linear hydrocarbon group having 2 to 9 carbon atoms substituted by a plurality of fluorine atoms in the ester portion, and monomer component (F): 0 to 10% by weight of monomers copolymerizable with these
The resin composition for a filter according to any one of claims 1 to 3, further comprising a (meth) acrylic acid ester copolymer obtained by polymerizing a monomer mixture containing.
The electromagnetic wave shielding film for plasma displays using the resin composition for filters in any one of Claims 1-10, the specific wavelength absorption filter of Claim 11 or 12, or the near-infrared absorption film of Claim 13.
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2011511101A (en) * | 2008-01-08 | 2011-04-07 | エルジー・ケム・リミテッド | Transparent resin composition |
| US8293841B2 (en) | 2008-01-08 | 2012-10-23 | Lg Chem, Ltd. | Optical film and information technology apparatus comprising the same |
| US8344083B2 (en) | 2008-04-30 | 2013-01-01 | Lg Chem, Ltd. | Resin composition and optical films formed by using the same |
| US8613986B2 (en) | 2008-04-30 | 2013-12-24 | Lg Chem, Ltd. | Optical film and information technology apparatus comprising the same |
| WO2017047230A1 (en) * | 2015-09-14 | 2017-03-23 | 富士フイルム株式会社 | Near-infrared absorbing composition, near-infrared blocking filter, method for producing near-infrared blocking filter, solid-state imaging element, camera module and image display device |
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- 2006-04-04 JP JP2006103540A patent/JP2007169583A/en active Pending
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2011511101A (en) * | 2008-01-08 | 2011-04-07 | エルジー・ケム・リミテッド | Transparent resin composition |
| US8293841B2 (en) | 2008-01-08 | 2012-10-23 | Lg Chem, Ltd. | Optical film and information technology apparatus comprising the same |
| US8512825B2 (en) | 2008-01-08 | 2013-08-20 | Lg Chem, Ltd. | Optical film and information technology apparatus comprising the same |
| US8513358B2 (en) | 2008-01-08 | 2013-08-20 | Lg Chem, Ltd. | Composition of (Meth)acrylate resin and hydroxy group-containing aromatic resin |
| US9168694B2 (en) | 2008-01-08 | 2015-10-27 | Lg Chem, Ltd. | Transparent resin composition |
| US8344083B2 (en) | 2008-04-30 | 2013-01-01 | Lg Chem, Ltd. | Resin composition and optical films formed by using the same |
| US8613986B2 (en) | 2008-04-30 | 2013-12-24 | Lg Chem, Ltd. | Optical film and information technology apparatus comprising the same |
| WO2017047230A1 (en) * | 2015-09-14 | 2017-03-23 | 富士フイルム株式会社 | Near-infrared absorbing composition, near-infrared blocking filter, method for producing near-infrared blocking filter, solid-state imaging element, camera module and image display device |
| JPWO2017047230A1 (en) * | 2015-09-14 | 2018-08-16 | 富士フイルム株式会社 | Near-infrared absorbing composition, near-infrared cut filter, method for producing near-infrared cut filter, solid-state imaging device, camera module, and image display device |
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