JP2006330411A5 - - Google Patents
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- JP2006330411A5 JP2006330411A5 JP2005154892A JP2005154892A JP2006330411A5 JP 2006330411 A5 JP2006330411 A5 JP 2006330411A5 JP 2005154892 A JP2005154892 A JP 2005154892A JP 2005154892 A JP2005154892 A JP 2005154892A JP 2006330411 A5 JP2006330411 A5 JP 2006330411A5
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- Prior art keywords
- substrate
- slit
- liquid crystal
- alignment film
- vacuum deposition
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- 239000000758 substrate Substances 0.000 claims 52
- 238000001771 vacuum deposition Methods 0.000 claims 28
- 239000004973 liquid crystal related substance Substances 0.000 claims 27
- 238000007740 vapor deposition Methods 0.000 claims 4
- 230000001276 controlling effect Effects 0.000 claims 3
- 239000002245 particle Substances 0.000 claims 3
- 238000001704 evaporation Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- 230000001105 regulatory Effects 0.000 claims 1
Claims (16)
各基板保持機構が、該基板に対して蒸着粒子の入射状態を調整するスリット開口を有する少なくとも１つのスリット機構、及び該スリット開口に対する該基板の相対位置を調整するために該基板保持機構を移動させる可動機構からなり、
該可動機構が、少なくとも、該基板を該基板面に対して水平に回転制御する基板方位角可変機構を備え、
該基板方位角可変機構が、該基板を搭載するためのθステージであって該基板面に対して水平に回転自在なθステージ及び該θステージの駆動源からなることを特徴とする液晶配向膜用真空蒸着装置。
A vacuum deposition apparatus for a liquid crystal alignment film comprising a substrate holding mechanism for holding a deposition source and a substrate to be deposited in a vacuum chamber having an exhaust means, and forming a liquid crystal alignment film on the substrate surface,
Each substrate holding mechanism moves at least one slit mechanism having a slit opening for adjusting the incident state of vapor deposition particles with respect to the substrate, and moves the substrate holding mechanism to adjust the relative position of the substrate with respect to the slit opening . It consists of a movable mechanism to be,
The movable mechanism includes at least a substrate azimuth variable mechanism that controls rotation of the substrate horizontally with respect to the substrate surface;
A liquid crystal alignment film, wherein the substrate azimuth varying mechanism includes a θ stage for mounting the substrate, the θ stage being rotatable horizontally with respect to the substrate surface, and a driving source for the θ stage Vacuum deposition equipment.
各スリット機構について、
該スリット機構を該スリット開口に関して回転させ、該スリット開口面と該蒸着源とのなす角を調整する基板入射角可変機構を設けたことを特徴とする液晶配向膜用真空蒸着装置。
A vacuum deposition apparatus for a liquid crystal alignment film according to claim 1,
About each slit mechanism
A vacuum deposition apparatus for a liquid crystal alignment film, comprising a substrate incident angle variable mechanism that rotates the slit mechanism with respect to the slit opening and adjusts an angle formed by the slit opening surface and the deposition source.
該可動機構が、少なくとも、該スリットにより入射方向を規制された蒸着粒子を横切るように該基板を移動させる基板スライド機構からなることを特徴とする液晶配向膜用真空蒸着装置。
A vacuum deposition apparatus for a liquid crystal alignment film according to claim 1 or 2 ,
The vacuum deposition apparatus for a liquid crystal alignment film, wherein the movable mechanism comprises at least a substrate slide mechanism that moves the substrate so as to cross the deposition particles whose incident direction is regulated by the slit.
該基板入射角可変機構が、該スリット開口と該蒸着源とを結ぶ直線と該基板垂線とがなす入射角を０〜９０°の範囲から選択した任意の角度に設定することを特徴とする液晶配向膜用真空蒸着装置。
A vacuum deposition apparatus for a liquid crystal alignment film according to claim 2,
The substrate incident angle variable mechanism sets an incident angle formed by a straight line connecting the slit opening and the vapor deposition source and the substrate perpendicular to an arbitrary angle selected from a range of 0 to 90 °. Vacuum deposition equipment for alignment films.
該基板入射角可変機構が、固定軸と、直線駆動源に連結する可動軸により該基板を支持し、該直線駆動源を駆動することにより該固定軸を支点として該基板を傾斜させることを特徴とする液晶配向膜用真空蒸着装置。
A vacuum deposition apparatus for a liquid crystal alignment film according to claim 4 ,
The substrate incident angle variable mechanism supports the substrate by a fixed shaft and a movable shaft connected to a linear drive source, and drives the linear drive source to tilt the substrate with the fixed shaft as a fulcrum. A vacuum deposition apparatus for a liquid crystal alignment film.
該基板方位角可変機構が、該基板が配置される平面内で該基板の方位角を０〜３６０°の範囲から選択した任意の角度に設定することを特徴とする液晶配向膜用真空蒸着装置。
A vacuum deposition apparatus for a liquid crystal alignment film according to claim 1 ,
The substrate azimuth varying mechanism sets the azimuth of the substrate to an arbitrary angle selected from a range of 0 to 360 ° within a plane on which the substrate is disposed. .
該基板スライド機構が、可動テーブルおよび該可動テーブルの駆動源により構成され、該可動テーブルに該基板が搭載されることを特徴とする液晶配向膜用真空蒸着装置。
A vacuum deposition apparatus for a liquid crystal alignment film according to claim 3 ,
A vacuum deposition apparatus for a liquid crystal alignment film, wherein the substrate slide mechanism includes a movable table and a drive source of the movable table, and the substrate is mounted on the movable table.
該基板保持機構が、基板押さえであって該基板保持機構との間に該基板の少なくとも一部分を挟むように構成された基板押さえ、及び該基板押さえの開閉機構を備えたことを特徴とする液晶配向膜用真空蒸着装置。
A vacuum deposition apparatus for a liquid crystal alignment film according to claim 1,
The substrate holding mechanism is a substrate press, and includes a substrate press configured to sandwich at least a part of the substrate between the substrate hold mechanism and an opening / closing mechanism for the substrate press. Vacuum deposition equipment for alignment films.
各スリット機構において、所望の開口形状を有するスリットが脱着可能であることを特徴とする液晶配向膜用真空蒸着装置。
A vacuum deposition apparatus for a liquid crystal alignment film according to claim 3 ,
A vacuum deposition apparatus for a liquid crystal alignment film, wherein a slit having a desired opening shape is removable in each slit mechanism.
該スリット開口を開閉する治具シャッターを備えたことを特徴とする液晶配向膜用真空蒸着装置。
A vacuum deposition apparatus for a liquid crystal alignment film according to claim 3 ,
A vacuum deposition apparatus for a liquid crystal alignment film, comprising a jig shutter for opening and closing the slit opening.
開口領域及び遮蔽領域からなり該スリット開口面に平行に配置される１枚の冶具シャッター、及び該冶具シャッターを移動制御する移動手段を備え、
前記スリットが装着される場合には該スリットの開口形状、装着されない場合には前記スリット開口によって画定される領域をスリット領域とした場合、
該開口領域は該スリット領域よりも大きく、
該基板のスライド動作に際し、該スリット領域とスライドされる該基板とがオーバーラップしない領域を該遮蔽領域が遮蔽し、かつ、該スリット領域、スライドされる該基板及び該開口領域がオーバーラップするように該冶具シャッターが該移動手段によって移動制御されることを特徴とする液晶配向膜用真空蒸着装置。
A vacuum deposition apparatus for a liquid crystal alignment film according to claim 3 ,
One jig shutter, which is composed of an opening area and a shielding area and is arranged in parallel to the slit opening surface, and a moving means for moving and controlling the jig shutter,
When the slit is mounted, the opening shape of the slit, and when not mounted, the area defined by the slit opening is a slit region,
The open area is larger than the slit area;
In the sliding operation of the substrate, the shielding region shields a region where the slit region and the slidable substrate do not overlap, and the slit region, the slid substrate and the opening region overlap. Further, the jig shutter is controlled to move by the moving means .
該スリット開口面に平行に配置される２枚の冶具シャッター、及び該冶具シャッターを移動制御する移動手段を備え、
前記スリットが装着される場合には該スリットの開口形状、装着されない場合には前記スリット開口によって画定される領域をスリット領域とした場合、
該基板のスライド動作に際し、該スリット領域とスライドされる該基板とがオーバーラップしない領域をいずれか一方の該冶具シャッターが遮蔽し、かつ、該スリット領域、スライドされる該基板及び該２枚の冶具シャッターの隙間がオーバーラップするように該冶具シャッターが該移動手段によって移動制御されることを特徴とする液晶配向膜用真空蒸着装置。
A vacuum deposition apparatus for a liquid crystal alignment film according to claim 3 ,
Two jig shutters arranged in parallel to the slit opening surface, and a moving means for controlling movement of the jig shutter,
When the slit is mounted, the opening shape of the slit, and when not mounted, the area defined by the slit opening is a slit region,
In the sliding operation of the substrate, any one of the jig shutters shields a region where the slit region and the substrate to be slid do not overlap, and the slit region, the substrate to be slid, and the two sheets A vacuum deposition apparatus for a liquid crystal alignment film, wherein the jig shutter is controlled to move by the moving means so that the gap between the jig shutters overlaps.
該可動機構及び該基板方位角可変機構を自動制御する制御装置を設けたことを特徴とする液晶配向膜用真空蒸着装置。
A vacuum deposition apparatus for a liquid crystal alignment film according to claim 2,
A vacuum deposition apparatus for a liquid crystal alignment film, comprising a control device for automatically controlling the movable mechanism and the substrate azimuth varying mechanism.
該制御装置は、該蒸着源、該基板保持機構、該基板スライド機構、該基板入射角可変機構、および該基板方位角可変機構に接続されたことを特徴とする液晶配向膜用真空蒸着装置。
A vacuum deposition apparatus for a liquid crystal alignment film according to claim 13 ,
The control device is connected to the vapor deposition source, the substrate holding mechanism, the substrate slide mechanism, the substrate incident angle variable mechanism, and the substrate azimuth angle variable mechanism.
インライン式であることを特徴とする液晶配向膜用真空蒸着装置。
A liquid crystal alignment film vacuum deposition apparatus of claims 1 to 14, wherein,
A vacuum deposition apparatus for a liquid crystal alignment film, which is an in-line type.
各スリット機構について、該スリット機構を該スリット開口に関して回転させて該スリット開口面と該蒸着源とのなす角を制御し、
各基板保持機構について、該基板を該基板面に対して水平に回転させ該スリット開口とのなす角を制御し、該基板を該スリット開口面の上を通過するようにスライド制御することを特徴とする方法。 An evaporation source, a substrate holding mechanism for holding a substrate to be evaporated, at least one slit mechanism having a slit opening for adjusting an incident state of vapor deposition particles with respect to each substrate, and the slit mechanism And a vacuum deposition apparatus for a liquid crystal alignment film provided with a control device for operating the substrate, a method for producing an alignment film on the substrate surface,
For each slit mechanism, the angle between the slit opening surface and the evaporation source is controlled by rotating the slit mechanism with respect to the slit opening,
For each substrate holding mechanism, the substrate is rotated horizontally with respect to the substrate surface, the angle formed with the slit opening is controlled, and the substrate is slid so as to pass over the slit opening surface. And how to.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005154892A JP5028584B2 (en) | 2005-05-27 | 2005-05-27 | Vacuum deposition apparatus for liquid crystal alignment film and film forming method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005154892A JP5028584B2 (en) | 2005-05-27 | 2005-05-27 | Vacuum deposition apparatus for liquid crystal alignment film and film forming method thereof |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006330411A JP2006330411A (en) | 2006-12-07 |
| JP2006330411A5 true JP2006330411A5 (en) | 2008-06-19 |
| JP5028584B2 JP5028584B2 (en) | 2012-09-19 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005154892A Active JP5028584B2 (en) | 2005-05-27 | 2005-05-27 | Vacuum deposition apparatus for liquid crystal alignment film and film forming method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5028584B2 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5098375B2 (en) * | 2007-03-12 | 2012-12-12 | セイコーエプソン株式会社 | Manufacturing method of liquid crystal device |
| CN103014617B (en) | 2011-09-22 | 2014-05-14 | 株式会社新柯隆 | Thin film forming apparatus |
| WO2013042247A1 (en) * | 2011-09-22 | 2013-03-28 | 株式会社シンクロン | Thin film forming device |
| JPWO2013042247A1 (en) * | 2011-09-22 | 2015-03-26 | 株式会社シンクロン | Thin film forming equipment |
| KR102048051B1 (en) * | 2012-09-04 | 2019-11-25 | 삼성디스플레이 주식회사 | Mask assembly for testing deposition condition and deposition apparatus having the same |
| JP6056025B2 (en) * | 2015-11-26 | 2017-01-11 | 株式会社昭和真空 | Deposition equipment |
| JP2017190513A (en) * | 2016-04-15 | 2017-10-19 | 株式会社昭和真空 | Vapor deposition apparatus |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63313123A (en) * | 1987-06-17 | 1988-12-21 | Konica Corp | Manufacture of liquid crystal display element |
| JP2548373B2 (en) * | 1989-05-24 | 1996-10-30 | 松下電器産業株式会社 | Liquid crystal alignment film manufacturing method and manufacturing apparatus |
| JPH04131370A (en) * | 1990-09-25 | 1992-05-06 | Canon Inc | Thin film depositing device |
| JP2002365639A (en) * | 2001-04-06 | 2002-12-18 | Victor Co Of Japan Ltd | Apparatus for manufacturing alignment layer of liquid crystal display element and method for manufacturing alignment layer of liquid crystal display element |
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2005
- 2005-05-27 JP JP2005154892A patent/JP5028584B2/en active Active
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