GB1391910A - Silicon diode array targets - Google Patents
Silicon diode array targetsInfo
- Publication number
- GB1391910A GB1391910A GB4572071A GB4572071A GB1391910A GB 1391910 A GB1391910 A GB 1391910A GB 4572071 A GB4572071 A GB 4572071A GB 4572071 A GB4572071 A GB 4572071A GB 1391910 A GB1391910 A GB 1391910A
- Authority
- GB
- United Kingdom
- Prior art keywords
- channels
- diodes
- silicon
- oct
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title abstract 3
- 229910052710 silicon Inorganic materials 0.000 title abstract 3
- 239000010703 silicon Substances 0.000 title abstract 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 238000009792 diffusion process Methods 0.000 abstract 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract 1
- 229910052581 Si3N4 Inorganic materials 0.000 abstract 1
- 238000003491 array Methods 0.000 abstract 1
- 229910052796 boron Inorganic materials 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 239000011651 chromium Substances 0.000 abstract 1
- 239000007772 electrode material Substances 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910052697 platinum Inorganic materials 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
- H01L21/30608—Anisotropic liquid etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Electrodes Of Semiconductors (AREA)
- Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
Abstract
1391910 Semiconductor diodes arrays; image tubes ENGLISH ELECTRIC VALVE CO Ltd 16 Oct 1972 [1 Oct 1971] 45720/71 Headings H1K and H1D Individual diodes of a silicon array constituting an image tube target are separated by intersecting channels 5 the walls of which are provided with an insulating coating 6. The silicon substrate 1 has a (110) surface, the channels 5 being aligned with (111) planes and being formed using an arisotropic etchant, preferably through a silicon nitride mask. The insulating coating 6 is preferably thermally produced silicon dioxide. The diodes may be made by diffusion of boron to form P-type regions 7 in the N-type substrate 1, the diffusion taking place before or after etching of the channels 5. All electrodes 8 are evaporated on to the diodes at an angle so that metal is deposited a short distance down the side walls of the channels 5 as well as on to the top surface. If the P-type regions 7 are omitted the electrodes 8 may be Schottky contacts. Platinum and chromium are also mentioned as electrode materials.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB4572071A GB1391910A (en) | 1971-10-01 | 1971-10-01 | Silicon diode array targets |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB4572071A GB1391910A (en) | 1971-10-01 | 1971-10-01 | Silicon diode array targets |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1391910A true GB1391910A (en) | 1975-04-23 |
Family
ID=10438301
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB4572071A Expired GB1391910A (en) | 1971-10-01 | 1971-10-01 | Silicon diode array targets |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1391910A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5150183A (en) * | 1987-07-10 | 1992-09-22 | Kernforschungszentrum Karlsruhe Gmbh | Switch matrix including optically non-linear elements |
-
1971
- 1971-10-01 GB GB4572071A patent/GB1391910A/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5150183A (en) * | 1987-07-10 | 1992-09-22 | Kernforschungszentrum Karlsruhe Gmbh | Switch matrix including optically non-linear elements |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |