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FR2416500B1 - Methode de production d'images materielles - Google Patents

Methode de production d'images materielles

Info

Publication number
FR2416500B1
FR2416500B1 FR7901901A FR7901901A FR2416500B1 FR 2416500 B1 FR2416500 B1 FR 2416500B1 FR 7901901 A FR7901901 A FR 7901901A FR 7901901 A FR7901901 A FR 7901901A FR 2416500 B1 FR2416500 B1 FR 2416500B1
Authority
FR
France
Prior art keywords
producing material
material images
images
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7901901A
Other languages
English (en)
Other versions
FR2416500A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of FR2416500A1 publication Critical patent/FR2416500A1/fr
Application granted granted Critical
Publication of FR2416500B1 publication Critical patent/FR2416500B1/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/14Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
    • H05K3/143Masks therefor
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Printed Wiring (AREA)
FR7901901A 1978-02-01 1979-01-25 Methode de production d'images materielles Expired FR2416500B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP926378A JPS54103552A (en) 1978-02-01 1978-02-01 Pattern formation method

Publications (2)

Publication Number Publication Date
FR2416500A1 FR2416500A1 (fr) 1979-08-31
FR2416500B1 true FR2416500B1 (fr) 1986-12-26

Family

ID=11715536

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7901901A Expired FR2416500B1 (fr) 1978-02-01 1979-01-25 Methode de production d'images materielles

Country Status (7)

Country Link
US (1) US4273812A (fr)
JP (1) JPS54103552A (fr)
CA (1) CA1111144A (fr)
DE (1) DE2903872C2 (fr)
FR (1) FR2416500B1 (fr)
GB (1) GB2015036B (fr)
NL (1) NL7900828A (fr)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4418473A (en) * 1982-03-26 1983-12-06 International Business Machines Corp. Method of making edge protected ferrite core
US4451344A (en) * 1982-03-26 1984-05-29 International Business Machines Corp. Method of making edge protected ferrite core
US4511599A (en) * 1983-03-01 1985-04-16 Sigmatron Associates Mask for vacuum depositing back metal electrodes on EL panel
US4536419A (en) * 1983-03-10 1985-08-20 Hitachi, Ltd. Method for forming tapered films
US4574093A (en) * 1983-12-30 1986-03-04 At&T Bell Laboratories Deposition technique
US4776868A (en) * 1985-09-09 1988-10-11 Corning Glass Works Lenses and lens arrays
US4715940A (en) * 1985-10-23 1987-12-29 Gte Products Corporation Mask for patterning electrode structures in thin film EL devices
US4746548A (en) * 1985-10-23 1988-05-24 Gte Products Corporation Method for registration of shadow masked thin-film patterns
US4915057A (en) * 1985-10-23 1990-04-10 Gte Products Corporation Apparatus and method for registration of shadow masked thin-film patterns
US4615781A (en) * 1985-10-23 1986-10-07 Gte Products Corporation Mask assembly having mask stress relieving feature
US5003870A (en) * 1989-08-21 1991-04-02 Hughes Aircraft Company Antistretch screen printing arrangement
US5389397A (en) * 1989-08-29 1995-02-14 North American Philips Corporation Method for controlling the thickness distribution of a deposited layer
US5643629A (en) * 1991-05-20 1997-07-01 Sauerland; Franz L. Method for adjusting center frequency and bandwidth of monolithic filters by plating through a single-aperture mask on a single side of the filters electrode pattern to plate selected areas of the pattern
US6469439B2 (en) * 1999-06-15 2002-10-22 Toray Industries, Inc. Process for producing an organic electroluminescent device
US6712943B2 (en) * 2001-11-06 2004-03-30 The Boc Group, Inc. Methods for angle limiting deposition mask
DE602006008850D1 (de) * 2005-03-30 2009-10-15 Brother Ind Ltd Abscheidungsmaske
US8815013B2 (en) * 2006-07-19 2014-08-26 Intermolecular, Inc. Method and system for isolated and discretized process sequence integration
US11035033B2 (en) * 2017-10-24 2021-06-15 Emagin Corporation Direct-deposition system including standoffs for controlling substrate-mask separation

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2676114A (en) * 1951-06-08 1954-04-20 Libbey Owens Ford Glass Co Method of producing graded coatings
DE1446197A1 (de) * 1959-04-27 1969-05-29 Licentia Gmbh Blende zur Begrenzung von unter vermindertem Druck zu bedampfenden Flaechen
NL276676A (fr) * 1961-04-13
US3193408A (en) * 1961-08-22 1965-07-06 David P Triller Method for producing integrated circuitry components
NL294779A (fr) * 1962-07-20
DE1272680B (de) * 1963-09-16 1968-07-11 Halbleiterwerk Frankfurt Oder Vorrichtung zum Vakuumaufdampfen von Schichten auf eine grosse Anzahl von mit Masken abgedeckten Unterlagen
US3326718A (en) * 1963-12-30 1967-06-20 Hughes Aircraft Co Method for making an electrical capacitor
DE1521536A1 (de) * 1965-12-21 1969-09-11 Telefunken Patent Verfahren zum Herstellen mehrerer,uebereinander liegender Schichten
US3510349A (en) * 1966-11-15 1970-05-05 Us Air Force Vacuum deposited interconnection matrix
CH489620A (de) * 1967-10-02 1970-04-30 Stanniolfabrik Burgdorf Ag Vorrichtung zur Erzielung scharf begrenzter nicht metallisierter Streifen beim Aufdampfen im Hochvakuum auf eine um eine Kühlwalze laufende Trägerbahn in einer kontinuierlich arbeitenden Bedampfungsanlage
US3799792A (en) * 1971-12-14 1974-03-26 Texas Instruments Inc Vapor deposition method
DE2412398A1 (de) * 1973-03-22 1974-10-17 Roparco Ltd Drehkolbenmotor oder drehkolbenkompressor
US4049857A (en) * 1976-07-28 1977-09-20 International Business Machines Corporation Deposition mask and methods of making same

Also Published As

Publication number Publication date
JPS5625790B2 (fr) 1981-06-15
NL7900828A (nl) 1979-08-03
GB2015036B (en) 1982-06-09
GB2015036A (en) 1979-09-05
DE2903872A1 (de) 1979-08-02
CA1111144A (fr) 1981-10-20
FR2416500A1 (fr) 1979-08-31
DE2903872C2 (de) 1983-09-29
JPS54103552A (en) 1979-08-15
US4273812A (en) 1981-06-16

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Legal Events

Date Code Title Description
ST Notification of lapse