EP0873565B1 - Kondensor-monochromator-anordnung für röntgenstrahlung - Google Patents
Kondensor-monochromator-anordnung für röntgenstrahlung Download PDFInfo
- Publication number
- EP0873565B1 EP0873565B1 EP97906992A EP97906992A EP0873565B1 EP 0873565 B1 EP0873565 B1 EP 0873565B1 EP 97906992 A EP97906992 A EP 97906992A EP 97906992 A EP97906992 A EP 97906992A EP 0873565 B1 EP0873565 B1 EP 0873565B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- condenser
- axis
- zone plate
- ray
- arrangement according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 65
- 230000005540 biological transmission Effects 0.000 claims description 53
- 238000005286 illumination Methods 0.000 claims description 11
- 238000003384 imaging method Methods 0.000 claims description 7
- 230000003595 spectral effect Effects 0.000 claims description 6
- 239000013078 crystal Substances 0.000 claims description 5
- 238000002224 dissection Methods 0.000 claims 1
- 230000005855 radiation Effects 0.000 description 28
- 238000011144 upstream manufacturing Methods 0.000 description 11
- 238000003963 x-ray microscopy Methods 0.000 description 8
- 230000008901 benefit Effects 0.000 description 6
- 238000000609 electron-beam lithography Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 210000001747 pupil Anatomy 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 3
- 230000004075 alteration Effects 0.000 description 2
- 230000001427 coherent effect Effects 0.000 description 2
- 238000001446 dark-field microscopy Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000000386 microscopy Methods 0.000 description 2
- 238000009304 pastoral farming Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000000339 bright-field microscopy Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 238000001093 holography Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 238000000399 optical microscopy Methods 0.000 description 1
- 238000002135 phase contrast microscopy Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- 230000014616 translation Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K7/00—Gamma- or X-ray microscopes
Definitions
- the invention relates to a condenser monochromator arrangement for X-rays according to the characteristics in the preamble of Claim 1.
- Microzone plates are rotationally symmetrical transmission circle grids with outwards decreasing lattice constants, typically have up to 0.1 mm Diameter and a few hundred zones.
- the numerical aperture of a Zone plate is generally determined by the diffraction angle, below the vertical and thus the finest zones Bend X-rays.
- the achievable spatial resolution of a Zone plate is determined by its numerical aperture.
- the numeric Aperture of the used X-ray lenses could in the last few years be significantly increased so that their resolution improved. This trend towards higher resolution will continue.
- the zone plates are called Use X-ray lenses, a hollow cone-shaped object lighting needed. Otherwise, the image would also be at its center Radiation from the 0th and 1st diffraction order of the Overlay the condenser zone plate. This is because the overwhelming majority Proportion of radiation that is parallel or almost parallel to the optical axis the object falls, this and the following micro zone plate (the diffractive x-ray lens) penetrates undiffracted and turns out to be general diffuse underground in a straight line, i.e. in the center of the image field.
- the numerical aperture of the illuminating condenser of a transmitted light microscope always approximately should be adapted to the numerical aperture of the microscope objective, order from incoherently radiating light sources also an incoherent Object lighting and thus an almost linear relationship between Obtain object intensity and image intensity.
- the aperture of the condenser is lower than that of the microscope objective a partially coherent mapping and the linear transformation between Object intensity and image intensity go for the important, the resolution of the Microscope determining high spatial frequencies lost.
- Zone plate Because the focal length is one Zone plate is reciprocal to the wavelength used, such acts Condenser zone plate together with a small so-called Monochromator pinhole located in the object plane around the object at the same time as a linear monochromator (Optics Communication 12, Pp. 160-163, 1974, "Soft X-Ray Imaging Zone Plates with Large Zone Numbers for Microscopic and Spectroscopic Applications ", Niemann, Rudolph, Schmahl). Only a narrow spectral range of the incident polychromatic radiation from an electron storage ring is transferred into the Pinhole focused and used to illuminate the object.
- the relationship only applies if the image of the source - the so-called "critical lighting" - is not larger than the diameter d of the pinhole.
- R is at least as large as the zone number n of the microzone plate of the X-ray microscope, the chromatic aberration of the microzone plate is negligible and it only insignificantly deteriorates the quality of the X-ray image.
- a condenser zone plate is used which is not too small in diameter D , so that the permitted diameter d of the monochromator pinhole is larger than the image of the source.
- Condenser zone plates are usually used in the first Diffraction order used, in which all realized so far Condenser zone plates have their highest diffraction efficiency. It is also for another reason explained below difficult to adapt the numerical aperture of the Condenser zone plate to that of the micro zone plate without new ones To achieve difficulties.
- the lighting condenser zone plate on the outside the same fine Zones have themselves like the micro zone plate serving as an objective
- the brightest built microzone plates now have zone widths of only 19 nm (corresponding to 38 nm period of the zone structures). So far, zone plates with such fine zone structures can only be used Methods of electron beam lithography, in which the zones are in succession generated, manufactured.
- a condenser monochromator arrangement is used for phase contrast X-ray microscopy an advantage that everything possible from the jet pipe provided X-ray light in an annular hollow cone aperture large aperture angle to the object.
- Zone plates are in the range of only 10% to 20% - and also are then there are a total of three zone plates in the microscope, because of the wavelength dependency of their focal lengths much more difficult exactly can be adjusted to each other as two zone plates. It can also the adjustment of the apertures also in the last two cases disadvantageously only by adjusting the smallest zone widths of the condenser zone plate to that of the micro zone plate.
- the invention is based on the knowledge that an incoherent image recording is obtained if an object to be imaged is illuminated successively from different directions during the exposure time of an image.
- a condenser-monochromator arrangement is used, which consists of an off-axis zone plate, a plane mirror, a monochromator pinhole on the optical axis and a mechanical holder for the off-axis zone plate and the plane mirror.
- the holder can be rotated around the optical axis of the microscope. This rotation creates lighting from different directions.
- the condenser-monochromator arrangement requires only a small amount Beam cross section of the incident X-rays only one diffractive optical element and this contains coarser and therefore one overall fewer number of diffractive structures than in previously used optical elements. Which especially compared to the fine structures the microzone plate of the lens very coarse structures of the diffractive Elements of the condenser-monochromator arrangement can be used with the help of electron beam lithography in significantly shorter times.
- the lighting aperture of the condenser monochromator arrangement can be set variably without another diffractive optical element is needed. The usable area of the image field is enlarged, because the lighting only from a very "thin-walled Hollow cone jacket "exists.
- 1 shows a condenser monochromator consisting of an off-axis Transmission zone plate and a subordinate plane mirror.
- FIG. 2 shows a condenser monochromator consisting of an off-axis Transmission zone plate, one upstream and one subordinate plan table.
- FIG. 3 shows a condenser monochromator consisting of an off-axis Transmission zone plate and two upstream plane mirrors.
- FIG. 4 shows a condenser monochromator consisting of an off-axis Transmission zone plate and an upstream plane mirror.
- FIG. 5 shows a condenser monochromator consisting of a Condenser zone plate and two upstream plane mirrors.
- FIG. 6 shows a condenser monochromator consisting of an off-axis Reflection zone plate and a subordinate plane mirror.
- FIG. 7a shows a condenser monochromator consisting of a Reflection plan grating and a subordinate focusing mirror.
- FIG. 7b shows a condenser monochromator consisting of a Transmission plan grid and a subordinate focusing Mirror.
- FIG. 8 shows a condenser monochromator consisting of an off-axis Reflection zone plate and an upstream plane mirror.
- FIG. 9 shows a condenser monochromator consisting of an off-axis Reflection zone plate, an upstream and a downstream Plane mirror.
- FIG. 10 shows a condenser monochromator consisting of an off-axis Reflection zone plate and two upstream plane mirrors.
- FIG. 11 shows a condenser monochromator consisting of an off-axis Transmission zone plate and two downstream plane mirrors.
- Fig. 12. shows a condenser monochromator consisting of an off-axis Transmission zone plate and three downstream plane mirrors.
- Fig. 13 shows a condenser monochromator that has an off-axis Transmission zone plate made of two segments different Focus and two pairs of plane mirrors.
- Fig. 14 shows a condenser monochromator that has an off-axis Transmission zone plate made of two segments different Focus and two pairs of plane mirrors.
- FIG. 15 shows a condenser monochromator consisting of a Focuser with ring focus and a downstream concave mirror.
- Fig. 16 shows a condenser monochromator consisting of a Focuser with ring focus and two downstream concave mirrors.
- the incident X-ray radiation 1 hits on a diffractive and at the same time imaging optical element 7 and is focused by this and bent in the direction of a plane mirror 2.
- the plane mirror 2 stands a few cm before the focal point of the X-ray radiation and reflects this into the monochromator pinhole 11 on the object 4, which is on the optical axis 6 of the X-ray microscope 5 is located.
- the plane mirror 2 is grazing Incidence with a few degrees of incidence so that total reflection occurs (Matter has a refractive index for soft X-rays, which is is less than one) and a high reflectivity is achieved.
- To the Surface quality of the plane mirror 2 must with respect to the Angle tangent error is not a particularly high requirement (an angular tangent error of better than 10 arc seconds sufficient), since the plane mirror 2 is only a few cm in front of the illuminating object 4 is located.
- the plane mirror 2 advantageously only needs to be a few cm long.
- the two described optical form Elements 2,7 with the monochromator aperture 11 a condenser-monochromator arrangement.
- the optical elements 2,7 are rotatable around the optical axis 6 of the X-ray microscope 5 is mounted. You can do this they are attached in a mechanical holder, not shown here.
- the holder has a coincident with the optical axis 6 Axis of rotation about which they are together with the optical elements 2.7 can turn.
- the optical axis 6 of the X-ray microscope 5 is in Direction of propagation of the incident X-rays 1 aligned. The entire structure is due to the high absorption of the used soft x-rays in a vacuum chamber.
- the diffractive and imaging optical element 7 can be an off-axis zone plate.
- An off-axis zone plate is understood here to mean a zone plate which consists only of a small, asymmetrical zone region which is asymmetrical and far from the center of the zone plate. For this reason, the structures within this zone area are generally not rotationally symmetrical.
- the zone area is so large that it can capture an X-ray beam with a cross-sectional area of a few mm 2. It can be used in transmission as an off-axis transmission zone plate 7 according to FIG. 1, or in reflection as an off-axis reflection zone plate 3 according to FIG. 6 . Since an off-axis zone plate laterally deflects the X-rays, the plane mirror 2 is absolutely necessary in order to reflect the X-rays back onto the optical axis 6.
- the mechanical bracket with the optical elements 7.2 (Fig.1) exactly one turn around optical axis 6 rotated, this describes obliquely on the object 4th incident light cone 8 a hollow cone, which is the effective Aperture of the lighting determined.
- the opening angle 10 this Hollow cone can be the reflection angle 9 of the plane mirror 2nd can be set.
- the distance of the plane mirror 2 from the optical axis 6 and the position of the off-axis transmission zone plate 7 (or the off-axis reflection zone plate 3 in FIG. 6) along the Optical axis 6 can be readjusted so that the focus is exactly back on the optical axis 6 lies in the object 4.
- the location of the axis of rotation of the Bracket must remain stable except for a few, what with Spindle ball bearings or play-free ball guides can be achieved.
- the off-axis zone plate 7, 3 only has to generate an image of the X-ray source of a suitable size in the object plane and spectrally split the X-ray radiation. Since undulators have very small source sizes - they are significantly smaller than the source sizes in the deflection magnets used to date - a small scale of reduction and thus an off-axis zone plate 7.3 with typically at least twice the focal length than that of the condenser zone plates mentioned in the introduction can be used be used be used to illuminate the object in so-called "critical lighting".
- An off-axis Transmission zone plate 7 for an X-ray radiation with 2.4 nm Wavelength has e.g. Germanium zones 50 nm wide and 300 nm high - what is currently technologically producible.
- an off-axis transmission zone plate 7 In contrast to an off-axis transmission zone plate 7, the self-supporting with fine support structures or on a very thin one Support film is produced, an off-axis reflection zone plate 3 on a stable, solid substrate. Because of the extremely weird In the case of X-rays, this substrate is thermally resilient and coolable.
- both the off-axis Transmission zone plate 7 as well as the off-axis reflection zone plate 3 can be arranged in different ways, which is exemplified in the 2, 3 and 9-14 is shown.
- the incident one X-ray radiation 1 first with a plane mirror 2 from it Original direction deflected towards an off-axis zone plate 7.3.
- a second plane mirror 2 the diffracted and converging radiation towards the optical Axis 6 mirrored, the aperture through this second plane mirror 2 the lighting can be adjusted.
- an off-axis Transmission zone plate 7 and, according to FIG. 9, an off-axis Reflection zone plate 3 used.
- the arrangement of both plane mirrors 2 and the off-axis zone plate 7.3 is used during the exposure time X-ray image rotated one revolution around the optical axis 6.
- Illuminating cone 8 incident obliquely on the object describes one Hollow cone that determines the effective aperture of the lighting.
- the desired aperture adjustment is done with the second in Beam path arranged behind the off-axis zone plate 7.3 Plane mirror 2 by appropriately setting the reflection angle 9.
- the incident X-ray radiation 1 first with a plane mirror 2 from it directed in the original direction and meets a second plane mirror 2. From there it reaches an off-axis according to FIG Transmission zone plate 7 or, according to FIG. 10, on an off-axis Reflection zone plate 3.
- the off-axis zone plate 7.3 focuses that X-ray light in the object 4.
- the described arrangement of the two Flat mirror 2 and the off-axis zone plate 7.3 is not using a shown mechanical holder during the exposure time of the X-ray microscope 5 rotated one revolution around the optical axis 6.
- the illumination cone 8, which falls obliquely onto the object 4 describes a hollow cone that determines the effective aperture of the lighting.
- the desired aperture adjustment is done with the second one in the beam path shortly before the off-axis zone plate 7,3 arranged plane mirror 2 by the reflection angle 9 is set appropriately.
- FIG 5 an embodiment is shown in which as a diffractive Element an annular described in the introduction Condenser zone plate 14 is used.
- two plane mirrors 2 which during the Exposure time of an X-ray microscopic image using a rotatable mechanical holder once around the optical axis 6 be rotated so that the deflected beam covers the entire annular condenser zone plate 14 sweeps once.
- the Condenser zone plate 14 therefore does not need to be rotated.
- the Illuminating cone 8 incident obliquely on the object 4 describes one Hollow cone that determines the effective aperture of the lighting.
- FIG. 6 shows a condenser monochromator arrangement in which the incident X-rays 1 on an off-axis reflection zone plate 3 hits, which bends the X-rays 1 in reflection and at the same time focused.
- the plane mirror 2 directs the diffracted X-rays onto the Object 4.
- FIG Element used a reflection plan grating 15a with variable line density becomes.
- the line density of the reflection plan grating 15a varies such that the X-ray radiation after diffraction at the reflection plan grating 15a is the same Beam divergence has as before the reflection plan grating 15a.
- This Technology is well known and is already being used.
- the focusing mirror 16 focuses the X-ray radiation on the object 4, the rotation being a Aperture of the illuminating hollow cone is formed.
- reflection plan grating 15a Use suitable short-wave X-rays - a crystal under Use Bragg reflection.
- the Fig.7b differs from Fig.7a only in that as a diffractive optical element a transmission plan grating 15b instead of Reflection plan grating 15a is used.
- the transmission plan grid 15b diffracts the incident X-rays 1 in transmission and retains them their parallelism even after diffraction. Only the focusing one Mirror 16, which together with the transmission plan grid around the optical axis 6 rotates, the X-ray radiation focuses on the object 4.
- the off-axis Reflection zone plate 3 focuses the X-ray back at an angle to object 4 on the optical axis 6.
- the off-axis reflection zone plate 3 and the upstream plane mirror 2 are during the Exposure time of the X-ray microscope 5 one revolution optical axis 6 rotated.
- the one that falls obliquely onto the object Illumination cone 8 describes a hollow cone, which is the effective one Aperture of the lighting determined. However, with this arrangement no more flexible aperture adjustment possible.
- Fig. 11 the e.g. Plane mirror 2 shown in FIG. 1 by two successive individual plane mirror 2 replaced. Both steer Flat mirror 2 the X-rays in the same direction. But it is also possible that the two plane mirrors 2 the X-rays distract in the opposite direction.
- An arrangement with two successive plane mirrors 2 rotating about the optical axis 6 (as they are also shown in Fig. 3 and Fig. 10) in any case, that the image of the x-ray source despite rotating off-axis Transmission zone plate 7 and the rotating plane mirror 2 are not is rotated. This has the advantages discussed below Applications with elliptical radiation sources and it can Accuracy requirements for the game of the axis of rotation of the mirror and Reduce the zone plate bracket.
- Fig.12. is a condenser monochromator consisting of an off-axis Transmission zone plate 7 and three downstream plane mirrors 17, 18, 19 shown. In this arrangement only the two need each other downstream plane mirror 17.18 around the optical axis 6 of X-ray microscope 5 to rotate. The off-axis transmission zone plate 7 and the plane mirror 19 can remain fixed in space. This arrangement has the advantage that the off-axis transmission zone plate 7 generated image of the x-ray source because of the double Reflection on the rotating mirrors 17, 18 is not rotated. If an electron beam undulator is used as the X-ray source, it generally has a strongly elliptical source area from which the off-axis transmission zone plate 7 generates an image.
- the Dispersion direction of the off-axis transmission zone plate 7 can now do so be placed so that it falls in the direction of the small axis of the ellipse.
- the only slightly curved zones of the off-axis run here Transmission zone plate 7 essentially "parallel" to the large one Ellipse axis of the picture. Because the image of the x-ray source due to double reflection on the two rotating, Downstream mirrors 17, 18 does not rotate, therefore, in this way a relatively homogeneously illuminated "band" the width of the large one Diameter of the image ellipse are generated, its intensity in Dispersion direction varies only slowly.
- this arrangement is relatively insensitive to Tilting and translations of the axis of rotation of the mirror arrangement, since two rotating plane mirrors 2 are used.
- Fig.13 is a condenser monochromator arrangement with a off-axis transmission zone plate 7, which in two off-axis Transmission zone plate segments 20a, 20b is divided, and with two Pairs downstream and each distracting Flat mirror 2 shown.
- the off-axis transmission zone plate segments 20a, 20b are identical in structure, but rotated 180 ° against each other, see above that the two associated foci face each other, symmetrical to optical axis 6. With one pair of plane mirrors each, the rays reflected back on the optical axis 6, so that the two Overlay focal points in object 4.
- This type of lighting is strict mirror-symmetrical and leads to different imaging properties than that "Single sideband imaging" with one-sided and extreme bright field oblique lighting.
- This type of lighting further enlargement of the illumination angle in the object plane Dark field microscopy are operated. Then they are always complementary diffracted rays present in the image plane, which are with each other can interfere. This is a necessary requirement if the Limit resolution should be achieved in the dark field.
- Fig. 14 is a condenser monochromator arrangement with an off-axis Transmission zone plate 7 and with two pairs each rectified distracting plane mirrors 2 shown.
- the off-axis Transmission zone plate 7 is like that according to FIG. 13 of two segments 20a, 20b composed, which have the same focal length but with - based on the optical axis 6 - opposite focal points. However, due to the radiation-deflecting plane mirror 2, they overlap the otherwise separate focal points in a focal point in object 4.
- the the principle of operation is the same as that shown in Fig. 13 described.
- FIG. 15 it is also possible to specify equivalent systems for quasi-monochromatic object illumination with incoherent image recording that do not require the entire system to rotate about the optical axis 6 during the exposure time of an image.
- a condenser monochromator which generates an illumination wave with a high numerical aperture.
- a special diffractive element with a mirror can be used.
- the diffractive element is a so-called focuser 13 with a ring focus, which instead of a focal point generates a sharply focused ring concentric to the optical axis 6.
- Such focusers 13 can be produced in the same way as off-axis zone plates 7, 3 with the aid of electron beam lithography.
- Another advantage of the focuser 13 is that it is well suited for highly collimated radiation. All the radiation from the central beam diffracts and focuses the focuser 13 into a ring of larger diameter, which is concentric about the optical axis 6 (Fig. 15).
- the following mirror system consists of one or two concave mirror 12 connected in series. It is arranged at a suitable distance behind the focuser 13 and in front of the ring focus. As a result, a point-like focus on the optical axis 6 is obtained instead of a ring focus. If a small pinhole 11 is placed around this "focal point", the arrangement of the focuser 13, the hollow cone mirror 12 and the pinhole 11 acts as a monochromator.
- Fig. 16 shows a condenser monochromator arrangement with a focuser 13 with ring focus and two downstream hollow cone mirrors 12.
- the advantage of a system with two hollow cone mirrors 12 is that in such a system the so-called "kink surface" of the radiation deflection is almost perpendicular to the optical axis 6 lies (the kinked surface is the surface on which the reflected rays extended in the beam direction and the reflected rays elongated to the rear intersect).
- the aberrations that occur when the system is tilted - that is, for example, in the case of incorrect adjustment - are lower than in systems whose kink surface is almost parallel to the optical axis 6.
- the latter is the case when using a system with only one concave cone mirror 12, for which the reflecting surface and the kinked surface have to match and which has to be adjusted much more precisely.
- the apertures of all can be closed Available microzone plates for brightfield, phase contrast and Dark field microscopy can be adjusted.
- the aperture of one Ring pupil is created by rotating an oblique illumination through 360 ° obtained, the angle of the oblique lighting for example over a Plane mirror 2 can be set over a wide range.
- the Flat mirror 2 is very small, typically a few cm long and therefore inexpensive.
- the wavelength can be very wide Areas are changed.
- the condenser-monochromator arrangement contains an off-axis zone plate 7.3 with zone widths that are significantly larger and are therefore easier and faster to manufacture than those available standing microzone plates, which are used as X-ray lenses.
- the wavelength can be changed over a wide range.
- a ring pupil can also be generated by a focuser 13 be, then a concave mirror 12 for focusing the Radiation on the optical axis 6 is used.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- X-Ray Techniques (AREA)
Description
- die eine ringförmige Beleuchtungspupille besitzt,
- mit der eine hohe numerische Apertur erzeugt werden kann, die den hohen Aperturen eines modernen Röntgenobjektivs mit Mikrozonenplatten zur Erzeugung einer hohen Auflösung entsprechend angepaßt ist und
- mit der auch ein einfallendes enges Strahlenbündel mit nur wenigen Millimetern Durchmesser vollständig genutzt werden kann.
- 1
- einfallende Röntgenstrahlung
- 2
- Planspiegel
- 3
- off-axis Reflexionszonenplatte
- 4
- Objekt
- 5
- Röntgen mikroskop
- 6
- optische Achse des Röntgenmikroskops
- 7
- off-axis Transmissionszonenplatte
- 8
- schräg einfallender Beleuchtungskegel
- 9
- Reflexionswinkel
- 10
- halber Öffnungswinkel der Hohlkegelbeleuchtung
- 11
- Monochromatorlochblende in der Objektebene
- 12
- Hohlkegelspiegel
- 13
- Fokussator mit Ringfokus
- 14
- ringförmige Kondensorzonenplatte
- 15a
- Reflexionsplangitter
- 15b
- Transmissionsplangitter
- 16
- fokussierender Spiegel
- 17
- Planspiegel
- 18
- Planspiegel
- 19
- Planspiegel
- 20a
- off-axis Zonenplattensegment
- 20b
- off-axis Zonenplattensegment
Claims (10)
- Kondensor-Monochromator-Anordnung für Röntgenstrahlung zur quasimonochromatischen, hohlkegelförmigen Beleuchtung und inkohärenten Bildaufzeichnung eines Objekts (4) in einem abbildenden Röntgenmikroskop (5) mit beugenden und reflektierenden optischen Elementen (2,3,7,12,13,14, 15a, 15b, 16, 17, 18, 19, 20a, 20b) und mit einer auf der optischen Achse (6) des Röntgenmikroskops (5) angeordneten Monochromatorlochblende (11), in deren Ebene das Objekt (4) auf der optischen Achse (6) angeordnet ist, dadurch gekennzeichnet, daß ein beugendes optisches Element (3,7,13,14,15a,15b,20a,20b), das die spektrale Zerlegung der Röntgenstrahlung bewirkt, und mindestens ein reflektierendes optisches Element (2,12,16,17,18,19) vorgesehen sind, wobei durch das reflektierende Element (2,12,16,17,18,19) in Kombination mit dem beugenden Element (3,7,13,14,15a, 15b,20a,20b) der Öffnungswinkel (10) des erzeugten Beleuchtungskegels (8) und die Lage des Brennpunktes des Beleuchtungskegels (8) auf der optischen Achse (6) am Ort des Objekts (4) bestimmt sind.
- Kondensor-Monochromator-Anordnung nach Anspruch 1, dadurch gekennzeichnet, daß das beugende Element (3,7,15a,15b,20a,20b) und ein oder mehrere reflektierende Elemente (2,18,19) drehbar um die optische Achse (6) des Röntgenmikroskops (5) gelagert sind.
- Kondensor-Monochromator-Anordnung nach Anspruch 2, dadurch gekennzeichnet, daß das beugende Element (3,7,15a,15b,20a,20b) als off-axis Zonenplatten (3,7) in Reflexion oder Transmission, oder als Plangitter (15a,15b) in Reflexion oder Transmission, oder als Kristall in Braggreflexion ausgebildet ist.
- Kondensor-Monochromator-Anordnung nach Anspruch 1, dadurch gekennzeichnet, daß zwei reflektierende Elemente (2,17,18) drehbar um die optische Achse (6) des Röntgenmikroskops (5) gelagert sind.
- Kondensor-Monochromator-Anordnung nach Anspruch 4, dadurch gekennzeichnet, daß eine off-axis Zonenplatte (3,7) im Strahlengang raumfest angeordnet ist.
- Kondensor-Monochromator-Anordnung nach Anspruch 4, dadurch gekennzeichnet, daß eine ringförmige Kondensorzonenplatte (14) im Strahlengang raumfest angeordnet ist.
- Kondensor-Monochromator-Anordnung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß die reflektierenden Elemente Planspiegel (2,17,18,19) oder fokussierende Spiegel (16) sind.
- Kondensor-Monochromator-Anordnung nach Anspruch 7, dadurch gekennzeichnet, daß der fokussierende Spiegel (16) ein gekrümmter Kristall ist, der in Rowlandanordnung benutzt wird.
- Kondensor-Monochromator-Anordnung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß die beugenden und reflektierenden optischen Elemente (2,3,7,12,13,14,15a,15b,16,17, 18,19,20a,20b) zur variablen Einstellung des Öffnungswinkels (10) verschiebbar und kippbar sind.
- Kondensor-Monochromator-Anordnung nach Anspruch 1, dadurch gekennzeichnet, daß das beugende optische Element ein Fokussator (13) mit einem Ringfokus ist, dem mindestens ein Hohlkegelspiegel (12) als reflektierendes optisches Element im Strahlengang nachgeordnet ist.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19600701 | 1996-01-10 | ||
DE19600701 | 1996-01-10 | ||
DE19633047 | 1996-08-18 | ||
DE19633047 | 1996-08-18 | ||
PCT/DE1997/000033 WO1997025722A2 (de) | 1996-01-10 | 1997-01-10 | Kondensor-monochromator-anordnung für röntgenstrahlung |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0873565A2 EP0873565A2 (de) | 1998-10-28 |
EP0873565B1 true EP0873565B1 (de) | 1999-10-20 |
Family
ID=26021979
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP97906992A Expired - Lifetime EP0873565B1 (de) | 1996-01-10 | 1997-01-10 | Kondensor-monochromator-anordnung für röntgenstrahlung |
Country Status (5)
Country | Link |
---|---|
US (1) | US6128364A (de) |
EP (1) | EP0873565B1 (de) |
JP (1) | JP3069131B2 (de) |
DE (2) | DE59700582D1 (de) |
WO (1) | WO1997025722A2 (de) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5326428A (en) | 1993-09-03 | 1994-07-05 | Micron Semiconductor, Inc. | Method for testing semiconductor circuitry for operability and method of forming apparatus for testing semiconductor circuitry for operability |
US6327335B1 (en) * | 1999-04-13 | 2001-12-04 | Vanderbilt University | Apparatus and method for three-dimensional imaging using a stationary monochromatic x-ray beam |
US6259764B1 (en) * | 1999-07-16 | 2001-07-10 | Agere Systems Guardian Corp. | Zone plates for X-rays |
EP1200879B1 (de) * | 1999-07-30 | 2007-06-20 | Carl Zeiss SMT AG | Steuerung der Beleuchtungsverteilung in der Austrittspupille eines EUV-Beleuchtungssystems |
DE19954520A1 (de) * | 1999-11-12 | 2001-05-17 | Helmut Fischer Gmbh & Co | Vorrichtung zur Führung von Röntgenstrahlen |
US20050122509A1 (en) * | 2002-07-18 | 2005-06-09 | Leica Microsystems Semiconductor Gmbh | Apparatus for wafer inspection |
DE10242431A1 (de) * | 2002-09-11 | 2004-03-25 | Lutz Dr. Kipp | Element zur Fokussierung von elektromagnetischen Strahlen oder Strahlen von Elementarteilchen |
US7268945B2 (en) * | 2002-10-10 | 2007-09-11 | Xradia, Inc. | Short wavelength metrology imaging system |
US7170969B1 (en) * | 2003-11-07 | 2007-01-30 | Xradia, Inc. | X-ray microscope capillary condenser system |
US7486984B2 (en) * | 2004-05-19 | 2009-02-03 | Mxisystems, Inc. | System and method for monochromatic x-ray beam therapy |
DE102005056404B4 (de) * | 2005-11-23 | 2013-04-25 | Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh | Röntgenmikroskop mit Kondensor-Monochromator-Anordnung hoher spektraler Auflösung |
GB2457836B (en) * | 2006-09-11 | 2010-07-07 | Medway Nhs Trust | Radiation device or signal |
JP5611223B2 (ja) | 2008-12-01 | 2014-10-22 | ザ ユニバーシティ オブ ノース カロライナ アット チャペル ヒルThe University Of North Carolina At Chapel Hill | 多色分布を持つx線ビームからのマルチビームイメージングを用いる対象の画像の検出システム及び方法 |
DE112010001478B4 (de) * | 2009-07-01 | 2016-05-04 | Rigaku Corp. | Verwendung einer Röntgenvorrichtung |
US8294989B2 (en) * | 2009-07-30 | 2012-10-23 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Apparatus and method for creating a photonic densely-accumulated ray-point |
US10620118B2 (en) * | 2012-02-27 | 2020-04-14 | Steris Instrument Management Services, Inc. | Systems and methods for identifying optical materials |
DE102012013530B3 (de) * | 2012-07-05 | 2013-08-29 | Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh | Vorrichtung zur Messung resonanter inelastischer Röntgenstreuung einer Probe |
US10541102B2 (en) * | 2016-09-14 | 2020-01-21 | The Boeing Company | X-ray back scattering for inspection of part |
DE102017105275B4 (de) | 2017-03-13 | 2019-02-14 | Focus Gmbh | Vorrichtung und Verfahren zur Generierung monochromatischer Strahlung einer Strahlungsquelle mit Linienspektrum |
DE102020001448B3 (de) | 2020-03-03 | 2021-04-22 | Friedrich Grimm | Hybridprisma als Bauelement für optische Systeme |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5199057A (en) * | 1989-08-09 | 1993-03-30 | Nikon Corporation | Image formation-type soft X-ray microscopic apparatus |
US5204887A (en) * | 1990-06-01 | 1993-04-20 | Canon Kabushiki Kaisha | X-ray microscope |
DE4027285A1 (de) * | 1990-08-29 | 1992-03-05 | Zeiss Carl Fa | Roentgenmikroskop |
JPH04353800A (ja) * | 1991-05-31 | 1992-12-08 | Olympus Optical Co Ltd | 軟x線顕微鏡 |
US5177774A (en) * | 1991-08-23 | 1993-01-05 | Trustees Of Princeton University | Reflection soft X-ray microscope and method |
US5361292A (en) * | 1993-05-11 | 1994-11-01 | The United States Of America As Represented By The Department Of Energy | Condenser for illuminating a ring field |
JP3167095B2 (ja) * | 1995-07-04 | 2001-05-14 | キヤノン株式会社 | 照明装置とこれを有する露光装置や顕微鏡装置、ならびにデバイス生産方法 |
US6023496A (en) * | 1997-04-30 | 2000-02-08 | Shimadzu Corporation | X-ray fluorescence analyzing apparatus |
US6028911A (en) * | 1998-08-03 | 2000-02-22 | Rigaku Industrial Corporation | X-ray analyzing apparatus with enhanced radiation intensity |
-
1997
- 1997-01-10 EP EP97906992A patent/EP0873565B1/de not_active Expired - Lifetime
- 1997-01-10 DE DE59700582T patent/DE59700582D1/de not_active Expired - Fee Related
- 1997-01-10 JP JP9524748A patent/JP3069131B2/ja not_active Expired - Fee Related
- 1997-01-10 DE DE19700615A patent/DE19700615A1/de not_active Withdrawn
- 1997-01-10 US US09/101,468 patent/US6128364A/en not_active Expired - Fee Related
- 1997-01-10 WO PCT/DE1997/000033 patent/WO1997025722A2/de active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
EP0873565A2 (de) | 1998-10-28 |
DE19700615A1 (de) | 1997-07-17 |
JPH11508692A (ja) | 1999-07-27 |
US6128364A (en) | 2000-10-03 |
WO1997025722A3 (de) | 1997-09-04 |
WO1997025722A2 (de) | 1997-07-17 |
DE59700582D1 (de) | 1999-11-25 |
JP3069131B2 (ja) | 2000-07-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0873565B1 (de) | Kondensor-monochromator-anordnung für röntgenstrahlung | |
EP1225481B1 (de) | Kollektor für Beleuchtungssysteme | |
DE69418248T2 (de) | Optisches Laser-Abtastsystem mit Axikon | |
DE69122018T2 (de) | Röntgenstrahllithographie mit ringförmigem Bildfeld | |
DE69121972T2 (de) | Röntgenstrahlenmikroskop | |
EP0873566B1 (de) | Röntgenmikroskop mit zonenplatten | |
DE4432811A1 (de) | Phasenkontrast-Röntgenmikroskop | |
DE102013204443A1 (de) | Optische Baugruppe zur Lichtleitwerterhöhung | |
DE102011113521A1 (de) | Mikrolithographische Projektionsbelichtungsanlage | |
EP3479162A1 (de) | Anordnung zur erzeugung eines bessel-strahls | |
DE102007023411A1 (de) | Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik | |
DE112011102900B4 (de) | Abbildungssystem | |
DE102011076658A1 (de) | Beleuchtungsoptik für die EUV-Projektionslithographie | |
DE102017217867A1 (de) | EUV-Facettenspiegel für eine EUV-Projektionsbelichtungsanlage | |
WO2019134773A1 (de) | Pupillenfacettenspiegel, beleuchtungsoptik und optisches system für eine projektionsbelichtungsanlage | |
EP1471539B1 (de) | Abbildungssystem für ein, auf extrem ultravioletter (EUV) Strahlung basierendem Mikroskop | |
WO2003083579A1 (de) | Kollektoreinheit mit einem reflektiven element für beleuchtungssysteme mit einer wellenlänge kleiner als 193 nm | |
DE102005056404B4 (de) | Röntgenmikroskop mit Kondensor-Monochromator-Anordnung hoher spektraler Auflösung | |
DE102009047316A1 (de) | Optische reflektierende Komponente zum Einsatz in einer Beleuchtungsoptik für eine Projektionsbelichtungsanlage der EUV-Mikrolithographie | |
WO2003081712A2 (de) | Gitterelement zum filtern von wellenlängen ≤ 100nm | |
DE10229816A1 (de) | Vorrichtung zur Erzeugung einer konvergenten Lichtwellenfront und System zur interferometrischen Linsenflächenvermessung | |
DE69430582T2 (de) | Vorrichtung zur erzeugung eines bildes von einem objekt unter der verwendung eines stromes von neutralen oder geladenen teilchen und einer linse zum konvertierten des stromes von neutralen oder geladenen teilchen | |
DE102012013530B3 (de) | Vorrichtung zur Messung resonanter inelastischer Röntgenstreuung einer Probe | |
DE102023206503A1 (de) | Abbildende Optik | |
WO2009030390A1 (de) | Vorrichtung und verfahren für die xuv-mikroskopie |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 19980403 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): CH DE DK FR GB IT LI SE |
|
GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
17Q | First examination report despatched |
Effective date: 19990311 |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): CH DE DK FR GB IT LI SE |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Free format text: THE PATENT HAS BEEN ANNULLED BY A DECISION OF A NATIONAL AUTHORITY Effective date: 19991020 Ref country code: IT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRE;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED.SCRIBED TIME-LIMIT Effective date: 19991020 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: EP |
|
GBT | Gb: translation of ep patent filed (gb section 77(6)(a)/1977) |
Effective date: 19991021 |
|
REF | Corresponds to: |
Ref document number: 59700582 Country of ref document: DE Date of ref document: 19991125 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20000120 |
|
ET | Fr: translation filed | ||
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
RAP2 | Party data changed (patent owner data changed or rights of a patent transferred) |
Owner name: LEICA MICROSYSTEMS LITHOGRAPHY GMBH |
|
RIN2 | Information on inventor provided after grant (corrected) |
Free format text: NIEMANN, BASTIAN, DR. |
|
26N | No opposition filed | ||
REG | Reference to a national code |
Ref country code: GB Ref legal event code: IF02 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20060112 Year of fee payment: 10 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20060113 Year of fee payment: 10 Ref country code: CH Payment date: 20060113 Year of fee payment: 10 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20070131 Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20070131 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20070801 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20070110 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST Effective date: 20070930 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20070110 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20070131 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20060120 Year of fee payment: 10 |