CN201817405U - Low-radiation glass with the ability of being processed in different places - Google Patents
Low-radiation glass with the ability of being processed in different places Download PDFInfo
- Publication number
- CN201817405U CN201817405U CN2010205154516U CN201020515451U CN201817405U CN 201817405 U CN201817405 U CN 201817405U CN 2010205154516 U CN2010205154516 U CN 2010205154516U CN 201020515451 U CN201020515451 U CN 201020515451U CN 201817405 U CN201817405 U CN 201817405U
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- glass
- layer
- dielectric layer
- low
- protective layer
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- 239000011521 glass Substances 0.000 title abstract description 21
- 239000010410 layer Substances 0.000 claims abstract description 54
- 239000011241 protective layer Substances 0.000 claims abstract description 24
- 239000005329 float glass Substances 0.000 claims abstract description 10
- 238000000576 coating method Methods 0.000 claims abstract description 8
- 239000005344 low-emissivity glass Substances 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 11
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical group [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims description 5
- 229910001120 nichrome Inorganic materials 0.000 claims description 5
- 238000007747 plating Methods 0.000 claims description 4
- 229910004286 SiNxOy Inorganic materials 0.000 claims description 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 3
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 3
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 238000005496 tempering Methods 0.000 abstract description 3
- 239000011248 coating agent Substances 0.000 abstract description 2
- 238000007688 edging Methods 0.000 abstract description 2
- 239000011247 coating layer Substances 0.000 abstract 2
- 238000005520 cutting process Methods 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
- 238000003672 processing method Methods 0.000 abstract 1
- 238000001228 spectrum Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 15
- 238000000034 method Methods 0.000 description 8
- 238000004544 sputter deposition Methods 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
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- Surface Treatment Of Glass (AREA)
Abstract
The utility model discloses low-radiation glass with the ability of being processed in different places. The low-radiation glass comprises float glass and a coating layer, and is characterized in that the coating layer comprises a first dielectric layer, a first protective layer, a Ag layer, a second protective layer, a second dielectric layer and a third dielectric layer sequentially coated outward by taking the float glass as the base layer. Through self special film structure, the low-radiation glass changes the processing method, can conducts coating firstly and then conducts cutting, edging, tempering and other subsequent processing steps, thus simplifying the processing step and reducing production cost. Most importantly, the low-radiation glass greatly reduces the radiance of the glass surface, improves selectivity of the glass on the optical spectrum and enables the using performance thereof to be best.
Description
Technical field
The utility model relates to a kind of coated glass, but especially relates to the low emissivity glass of a kind of strange land processing.
Background technology
We know, low emissivity glass is being advocated the society now of less energy-consumption, be very welcome, it all will exceed much than transparent glass aspect reflection and the absorption sunlight, but we also know, undue high reflection and high the absorption also can be brought some side effects, the one, the too low interior lighting on daytime that influences of visible light transmissivity, the 2nd, the excessive intensification of glass may cause that thermal stresses bursts, the 3rd, reflect the too high so-called light pollution that causes, therefore, coated glass is to sun reflection of light and absorb specifically will be controlled at what degree, also to decide according to concrete environment and requirement, in addition, coated glass is to the transmitance of visible light and sun power, reflectivity, these basic parameters of specific absorption depend on coated glass the material of film and the number of plies structure of film, therefore, the selection of the material of plating on the coated glass, the qualification of the number of plies, and the quality of coating quality all directly affects the performance of coated glass.
In addition, traditional low emissivity glass is because its structural restriction, can only adopt behind the first tempering mode of plated film to produce, and makes complex manufacturing, and the cost height, and causes the performance of traditional low emissivity glass to have defective.
The utility model content
In order to overcome the deficiencies in the prior art, can effectively reduce the reflectivity of glass surface and improve glass the spectrographic low emissivity glass of strange land processing optionally but the purpose of this utility model is to provide a kind of.
The utility model is achieved through the following technical solutions:
But the low emissivity glass of a kind of strange land processing; comprise float glass and coatings; it is characterized in that coatings comprises with the float glass being outside first dielectric layer, first protective layer, Ag layer, second protective layer, second dielectric layer and the 3rd dielectric layer of plating successively of basal layer.
The first above-mentioned dielectric layer and the material of second dielectric layer are selected from Si respectively
3N
4, SiNxOy, TiO
2, ZAO, ZnSnOx, SnO
2, ZnO
2, SiO
2, Ta
2O
5, BiO
2, ZnAl
2O
5, Nb
2O
5In one or more.
The material of the 3rd above-mentioned dielectric layer is ZrO
2
The first above-mentioned protective layer, the material of second protective layer are selected from NiCr, NiCrOx, NiCrNx, CrNx, one or more among the ZAO respectively.
The beneficial effects of the utility model are: the utility model is by himself special film layer structure, make its working method that change take place, can realize first plated film change again cut, following process such as edging, tempering, simplified processing step, reduced production cost, and the most important thing is that the utility model has greatly reduced the radiant ratio of glass surface, and improved glass to the spectrographic selectivity, make its use properties reach the best.
Description of drawings
Fig. 1 is the structural representation of the utility model one embodiment.
Main Reference numeral implication is among the figure:
1, float glass 2, first dielectric layer 3, first protective layer
4, Ag layer 5, second protective layer 6, second dielectric layer
7, the 3rd dielectric layer
Embodiment
Below in conjunction with accompanying drawing, describe embodiment of the present utility model in detail:
Fig. 1 is the structural representation of the utility model one embodiment.
As shown in Figure 1: but the low emissivity glass of strange land processing; comprise float glass 1 and coatings; wherein, coatings comprises with the float glass being outside first dielectric layer 2, first protective layer 3, Ag layer 4, second protective layer 5, second dielectric layer 6 and the 3rd dielectric layer 7 of plating successively of basal layer.
Wherein, the material of first dielectric layer 2 and second dielectric layer 6 is selected from Si respectively
3N
4, SiNxOy, TiO
2, ZAO, ZnSnOx, SnO
2, ZnO
2, SiO
2, Ta
2O
5, BiO
2, ZnAl
2O
5, Nb
2O
5In one or more.
And the material of the 3rd dielectric layer 7 is ZrO
2, to improve the protection to whole rete, the material of first protective layer 3 and second protective layer 5 is selected from NiCr, NiCrOx, NiCrNx, CrNx, one or more among the ZAO respectively.
In addition; production technique of the present utility model is: at first select fresh float glass 1 for use; after reaching requirement by the cleaning machine cleaning then; be coated with first dielectric layer 2, first protective layer 3, Ag layer 4, second protective layer 5, second dielectric layer 6 and the 3rd dielectric layer 7 in order successively, after pack with PE cloth after the processing of plastic-blasting rubber powder grain.
More specifically be: first dielectric layer 2 wherein and second dielectric layer 6 form by dual rotary negative electrode, medium frequency magnetron sputtering, and wherein sputtering condition is: background vacuum pressure is 10
-6Under the mbar condition, charge into the mixed gas of Ar and reactant gases (O2 or N2), keep vacuum tightness 10
-3About mbar.
The 3rd dielectric layer 7 then forms by rotating cathode or planar cathode sputter, and wherein sputtering condition is: background vacuum pressure is 10
-6Under the mbar condition, charge into the mixed gas of Ar and reactant gases O2, keep vacuum tightness then 10
-3About mbar.
First protective layer 3 and second protective layer 5 form by the planar cathode sputter, and wherein sputtering condition is: background vacuum pressure is 10
-6Under the mbar condition, charge into the mixed gas of Ar or Ar and reactant gases (O2 or N2), keep vacuum tightness then 10
-3About mbar.
And Ag layer 4 is to form by the planar cathode sputter, and wherein sputtering condition is: background vacuum pressure is 10
-6Under the mbar condition, charge into the mixed gas of Ar or Ar and a small amount of O2, keep vacuum tightness then 10
-3About mbar.
Specific embodiment 1:
First dielectric layer 2 and second dielectric layer 6 are selected Si for use
3N
4Wherein the thicknesses of layers of first dielectric layer 2 is 43nm～45nm; and the thicknesses of layers of second dielectric layer 6 is 46nm～48nm; and first protective layer 3 and second protective layer 5 are selected NiCr for use; wherein the thicknesses of layers of first protective layer 3 is 5nm～7nm, and the thicknesses of layers of second protective layer 5 is 4nm～5nm, in addition; the thicknesses of layers of Ag layer 4 is 12nm～13nm, and the thicknesses of layers of the 3rd dielectric layer 7 is 6nm～8nm
The production stage of the foregoing description is: all Si
3N
4Rete adopts the sputter under intermediate frequency power supply of double cathode rotary target, and process gas is the mixed gas of Ar and N2, and sputtering power is 20kw～100kw, and the intermediate frequency power supply frequency is 20kHz～50kHz.;
All NiCr retes adopt planar cathode sputter under direct supply, and process gas is an Ar gas, and sputtering power is 3.5kw～20k;
The Ag rete adopts planar cathode sputter under direct supply, and process gas is Ar., and sputtering power is 5kw～15kw;
The ZrO2 rete adopts planar cathode sputter under direct supply, and process gas is the mixed gas of Ar and O2 gas, and sputtering power is 3kw～20kw
Production technique of the present utility model is simple, has reduced production cost, and has greatly reduced the radiant ratio of glass surface, and has improved glass to the spectrographic selectivity, makes its use properties reach the best.
Below disclose the utility model with preferred embodiment, so it is not in order to restriction the utility model, and all employings are equal to replaces or technical scheme that the equivalent transformation mode is obtained, all drops within the protection domain of the present utility model.
Claims (4)
1. but the low emissivity glass of strange land processing; comprise float glass and coatings; it is characterized in that coatings comprises with the float glass being outside first dielectric layer, first protective layer, Ag layer, second protective layer, second dielectric layer and the 3rd dielectric layer of plating successively of basal layer.
2. but the low emissivity glass of strange land according to claim 1 processing is characterized in that the material of described first dielectric layer and second dielectric layer is selected from Si respectively
3N
4, SiNxOy, TiO
2, ZAO, ZnSnOx, SnO
2, ZnO
2, SiO
2, Ta
2O
5, BiO
2, ZnAl
2O
5, Nb
2O
5In a kind of.
3. but the low emissivity glass of strange land according to claim 1 processing is characterized in that the material of described the 3rd dielectric layer is ZrO
2
4. but the low emissivity glass of strange land according to claim 1 processing is characterized in that the material of described first protective layer, second protective layer is selected from NiCr, NiCrOx, NiCrNx, CrNx respectively, a kind of among the ZAO.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010205154516U CN201817405U (en) | 2010-09-01 | 2010-09-01 | Low-radiation glass with the ability of being processed in different places |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010205154516U CN201817405U (en) | 2010-09-01 | 2010-09-01 | Low-radiation glass with the ability of being processed in different places |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201817405U true CN201817405U (en) | 2011-05-04 |
Family
ID=43915368
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010205154516U Expired - Lifetime CN201817405U (en) | 2010-09-01 | 2010-09-01 | Low-radiation glass with the ability of being processed in different places |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201817405U (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102501450A (en) * | 2011-11-25 | 2012-06-20 | 林嘉宏 | Light-transmission single-silver low radiation coated glass and manufacturing method for same |
| CN102950841A (en) * | 2012-11-26 | 2013-03-06 | 中山市创科科研技术服务有限公司 | Single silver low emissivity glass with high light transmittance |
| CN103771726A (en) * | 2013-12-21 | 2014-05-07 | 揭阳市宏光镀膜玻璃有限公司 | Production method of low-emissivity glass |
| CN104339784A (en) * | 2014-10-30 | 2015-02-11 | 中山市亨立达机械有限公司 | Lake blue single-silver LOW-E glass made from white glass |
| CN104647820A (en) * | 2015-03-16 | 2015-05-27 | 广东迪奥应用材料科技有限公司 | High-hardness high-dielectric constant cover plate with AR and AF functions |
| CN104891825A (en) * | 2015-05-12 | 2015-09-09 | 金堆城洛阳节能玻璃有限公司 | Scratch-resistant temperable single-silver low-radiation coated glass |
| CN106746735A (en) * | 2017-02-20 | 2017-05-31 | 揭阳市宏光镀膜玻璃有限公司 | A kind of low radiation coated glass of green keynote and preparation method thereof |
-
2010
- 2010-09-01 CN CN2010205154516U patent/CN201817405U/en not_active Expired - Lifetime
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102501450A (en) * | 2011-11-25 | 2012-06-20 | 林嘉宏 | Light-transmission single-silver low radiation coated glass and manufacturing method for same |
| CN102950841A (en) * | 2012-11-26 | 2013-03-06 | 中山市创科科研技术服务有限公司 | Single silver low emissivity glass with high light transmittance |
| CN103771726A (en) * | 2013-12-21 | 2014-05-07 | 揭阳市宏光镀膜玻璃有限公司 | Production method of low-emissivity glass |
| CN104339784A (en) * | 2014-10-30 | 2015-02-11 | 中山市亨立达机械有限公司 | Lake blue single-silver LOW-E glass made from white glass |
| CN104647820A (en) * | 2015-03-16 | 2015-05-27 | 广东迪奥应用材料科技有限公司 | High-hardness high-dielectric constant cover plate with AR and AF functions |
| CN104891825A (en) * | 2015-05-12 | 2015-09-09 | 金堆城洛阳节能玻璃有限公司 | Scratch-resistant temperable single-silver low-radiation coated glass |
| CN106746735A (en) * | 2017-02-20 | 2017-05-31 | 揭阳市宏光镀膜玻璃有限公司 | A kind of low radiation coated glass of green keynote and preparation method thereof |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: CHANGJIANG GLASS CO., LTD., TAIBO Free format text: FORMER OWNER: LIN JIAHONG Effective date: 20130216 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20130216 Address after: Zhang Pu town of Kunshan city in Jiangsu province Suzhou city 215321 Taiwan Bolu No. 1 Patentee after: Changjiang Glass Co., Ltd., Taibo Address before: Zhang Pu town, Jiangsu city of Kunshan Province Taiwan Bolu 215321 No. 1 Patentee before: Lin Jiahong |
|
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20110504 |