CN101324752B - 可以记录反射全息的聚合物液晶感光材料制备方法 - Google Patents
可以记录反射全息的聚合物液晶感光材料制备方法 Download PDFInfo
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- CN101324752B CN101324752B CN2008100408053A CN200810040805A CN101324752B CN 101324752 B CN101324752 B CN 101324752B CN 2008100408053 A CN2008100408053 A CN 2008100408053A CN 200810040805 A CN200810040805 A CN 200810040805A CN 101324752 B CN101324752 B CN 101324752B
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- coating
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- light
- photopolymer
- reflection holography
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Images
Classifications
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3016—Polarising elements involving passive liquid crystal elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/32—Holograms used as optical elements
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
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- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
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- G—PHYSICS
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- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/024—Hologram nature or properties
- G03H1/0248—Volume holograms
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0264—Organic recording material
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0402—Recording geometries or arrangements
- G03H2001/0415—Recording geometries or arrangements for recording reflection holograms
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0402—Recording geometries or arrangements
- G03H2001/0415—Recording geometries or arrangements for recording reflection holograms
- G03H2001/0417—Recording geometries or arrangements for recording reflection holograms for recording single beam Lippmann hologram wherein the object is illuminated by reference beam passing through the recording material
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2250/00—Laminate comprising a hologram layer
- G03H2250/38—Liquid crystal
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/12—Photopolymer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Holo Graphy (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
Claims (10)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2008100408053A CN101324752B (zh) | 2008-07-21 | 2008-07-21 | 可以记录反射全息的聚合物液晶感光材料制备方法 |
PCT/CN2008/071788 WO2010009592A1 (zh) | 2008-07-21 | 2008-07-29 | 可以记录反射全息的聚合物液晶感光材料及其制备方法 |
US13/055,139 US8334082B2 (en) | 2008-07-21 | 2008-07-29 | Sensitive liquid crystalline polymeric material suitable for reflective hologram recording and the preparing method thereof |
EP08783781A EP2306243A4 (en) | 2008-07-21 | 2008-07-29 | SENSITIVE LIQUID CRYSTALLINE POLYMER MATERIAL SUITABLE FOR RECORDING REFLECTIVE HOLOGRAMS, AND METHOD OF PRODUCTION THEREOF |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2008100408053A CN101324752B (zh) | 2008-07-21 | 2008-07-21 | 可以记录反射全息的聚合物液晶感光材料制备方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101324752A CN101324752A (zh) | 2008-12-17 |
CN101324752B true CN101324752B (zh) | 2012-07-25 |
Family
ID=40188337
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2008100408053A Expired - Fee Related CN101324752B (zh) | 2008-07-21 | 2008-07-21 | 可以记录反射全息的聚合物液晶感光材料制备方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8334082B2 (zh) |
EP (1) | EP2306243A4 (zh) |
CN (1) | CN101324752B (zh) |
WO (1) | WO2010009592A1 (zh) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101034257B (zh) * | 2007-04-06 | 2010-09-08 | 上海复旦天臣新技术有限公司 | 用于全息记录的感光薄膜及其制备方法 |
CN101324752B (zh) | 2008-07-21 | 2012-07-25 | 上海天臣防伪技术股份有限公司 | 可以记录反射全息的聚合物液晶感光材料制备方法 |
TWI399399B (zh) | 2010-03-30 | 2013-06-21 | Taiwan Textile Res Inst | 網狀結構纖維素母粒之製備方法與應用 |
CN103186091A (zh) * | 2011-12-30 | 2013-07-03 | 北京理工大学 | 一种全息三维数字图像叠加的显示方法 |
CN102848667B (zh) * | 2012-08-31 | 2015-01-28 | 华中科技大学 | 一种具有多重防伪效果的防伪薄膜及其制备方法 |
EP2981591A4 (en) * | 2013-04-02 | 2016-12-21 | Empire Technology Dev Llc | LIGHT-SENSITIVE HYDROPHILIC COATING |
CN108859099A (zh) * | 2018-05-31 | 2018-11-23 | 华南师范大学 | 基于光响应液晶聚合物材料的三维动态表面及其制备方法 |
US11702597B2 (en) * | 2018-09-25 | 2023-07-18 | Merck Patent Gmbh | Azo dye |
CN111352328B (zh) * | 2018-12-21 | 2022-12-20 | 青岛海信激光显示股份有限公司 | 一种全息显示材料、全息显示系统及其全息显示方法 |
DE102019110587A1 (de) * | 2019-04-24 | 2020-10-29 | HELLA GmbH & Co. KGaA | Vorrichtung zur Herstellung eines Replik-Hologramms, Replik-Hologramm sowie Beleuchtungsvorrichtung für ein Fahrzeug |
US11733647B2 (en) * | 2019-05-08 | 2023-08-22 | Meta Platforms Technologies, Llc | Light-activated controlled radical polymerization |
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CN111171290B (zh) * | 2020-01-16 | 2023-10-20 | 中山市东石材料科技有限公司 | 一种光敏隔热材料及其制备方法与应用 |
CN114479768B (zh) * | 2021-11-18 | 2023-07-07 | 青岛科技大学 | 一种金掺杂的纤维素相变材料及其制备方法 |
CN114725619B (zh) * | 2022-04-22 | 2024-05-14 | 广东工业大学 | 一种锂电池改性隔膜及其制备方法和锂电池 |
CN118259511A (zh) * | 2022-12-20 | 2024-06-28 | 中兴通讯股份有限公司 | 全息超材料底片、全息超材料光器件的制备系统及方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005174401A (ja) * | 2003-12-09 | 2005-06-30 | Pioneer Electronic Corp | ホログラム記録媒体及び記録再生システム |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE755251A (fr) | 1969-08-25 | 1971-02-25 | Du Pont | Enregistrement holographique dans des couches photopoly- merisables |
US4942112A (en) * | 1988-01-15 | 1990-07-17 | E. I. Du Pont De Nemours And Company | Photopolymerizable compositions and elements for refractive index imaging |
BR8900132A (pt) * | 1988-01-15 | 1989-09-12 | Du Pont | Processo para a formacao de um halograma de reflexao;processo para a formacao e a intensificacao de um halograma de reflexao em um meio de registro fotopolimerizavel substancialmente solido;e projecao de um feixe do objeto com a mesma radiacao actinica coerente aproximadamente na direcao oposta a do feixe de referencia |
JP2001265199A (ja) * | 2000-03-21 | 2001-09-28 | Rikogaku Shinkokai | ホログラム記録媒体 |
BR0110937A (pt) * | 2000-05-10 | 2003-03-11 | California Inst Of Techn | Variação de contraste de fase de um material refrativo fotoinduzido |
DE10027152A1 (de) * | 2000-05-31 | 2001-12-13 | Bayer Ag | Moschpolymere zur optischen Datenspeicherung |
JP4348446B2 (ja) * | 2003-02-21 | 2009-10-21 | 国立大学法人東京工業大学 | ホログラム記録媒体 |
US20060057467A1 (en) * | 2004-09-16 | 2006-03-16 | Fuji Photo Film Co., Ltd. | Hologram recording material and hologram recording method |
JP2007045949A (ja) * | 2005-08-10 | 2007-02-22 | Nitto Denko Corp | アゾベンゼンモノマー、その重合体及びこれを用いたホログラム光記録媒体 |
JP2007131707A (ja) * | 2005-11-09 | 2007-05-31 | Nitto Denko Corp | アゾ官能基を含む共重合体 |
JP2008020538A (ja) * | 2006-07-11 | 2008-01-31 | Fuji Xerox Co Ltd | ホログラム記録材料、ホログラム記録媒体およびホログラム記録方法 |
CN101034257B (zh) * | 2007-04-06 | 2010-09-08 | 上海复旦天臣新技术有限公司 | 用于全息记录的感光薄膜及其制备方法 |
CN101324752B (zh) | 2008-07-21 | 2012-07-25 | 上海天臣防伪技术股份有限公司 | 可以记录反射全息的聚合物液晶感光材料制备方法 |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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US20110129764A1 (en) | 2011-06-02 |
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WO2010009592A1 (zh) | 2010-01-28 |
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