CN101034257B - 用于全息记录的感光薄膜及其制备方法 - Google Patents
用于全息记录的感光薄膜及其制备方法 Download PDFInfo
- Publication number
- CN101034257B CN101034257B CN2007100392417A CN200710039241A CN101034257B CN 101034257 B CN101034257 B CN 101034257B CN 2007100392417 A CN2007100392417 A CN 2007100392417A CN 200710039241 A CN200710039241 A CN 200710039241A CN 101034257 B CN101034257 B CN 101034257B
- Authority
- CN
- China
- Prior art keywords
- coating
- photosensitive
- film
- photopolymer
- basement membrane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004519 manufacturing process Methods 0.000 title abstract description 4
- 239000011248 coating agent Substances 0.000 claims abstract description 61
- 238000000576 coating method Methods 0.000 claims abstract description 61
- 239000000463 material Substances 0.000 claims abstract description 41
- 238000001093 holography Methods 0.000 claims abstract description 22
- 239000000178 monomer Substances 0.000 claims abstract description 22
- 238000000034 method Methods 0.000 claims abstract description 21
- 238000002360 preparation method Methods 0.000 claims abstract description 13
- 229920000642 polymer Polymers 0.000 claims abstract description 11
- 239000010408 film Substances 0.000 claims description 35
- 210000002469 basement membrane Anatomy 0.000 claims description 30
- 229920006254 polymer film Polymers 0.000 claims description 22
- 239000003795 chemical substances by application Substances 0.000 claims description 21
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 15
- 239000010409 thin film Substances 0.000 claims description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 12
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 10
- 239000003504 photosensitizing agent Substances 0.000 claims description 10
- 239000007787 solid Substances 0.000 claims description 9
- 229920002301 cellulose acetate Polymers 0.000 claims description 7
- 239000002904 solvent Substances 0.000 claims description 7
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 6
- 229920001577 copolymer Polymers 0.000 claims description 6
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 claims description 6
- 150000002148 esters Chemical class 0.000 claims description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 6
- 239000002736 nonionic surfactant Substances 0.000 claims description 6
- 239000006097 ultraviolet radiation absorber Substances 0.000 claims description 6
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims description 5
- 230000001143 conditioned effect Effects 0.000 claims description 5
- -1 multipolymer Polymers 0.000 claims description 5
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical class C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 claims description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 4
- 239000011127 biaxially oriented polypropylene Substances 0.000 claims description 4
- 229920006378 biaxially oriented polypropylene Polymers 0.000 claims description 4
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 4
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 claims description 4
- 230000000977 initiatory effect Effects 0.000 claims description 4
- KSCKTBJJRVPGKM-UHFFFAOYSA-N octan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCCCCCC[O-].CCCCCCCC[O-].CCCCCCCC[O-].CCCCCCCC[O-] KSCKTBJJRVPGKM-UHFFFAOYSA-N 0.000 claims description 4
- DXGLGDHPHMLXJC-UHFFFAOYSA-N oxybenzone Chemical group OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 DXGLGDHPHMLXJC-UHFFFAOYSA-N 0.000 claims description 4
- 229920000151 polyglycol Polymers 0.000 claims description 4
- 239000010695 polyglycol Substances 0.000 claims description 4
- 238000003756 stirring Methods 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 3
- 229940106691 bisphenol a Drugs 0.000 claims description 3
- 125000004386 diacrylate group Chemical group 0.000 claims description 3
- 150000002576 ketones Chemical class 0.000 claims description 3
- 229920001427 mPEG Polymers 0.000 claims description 3
- OTRIMLCPYJAPPD-UHFFFAOYSA-N methanol prop-2-enoic acid Chemical compound OC.OC.OC(=O)C=C.OC(=O)C=C OTRIMLCPYJAPPD-UHFFFAOYSA-N 0.000 claims description 3
- 239000012046 mixed solvent Substances 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 239000004094 surface-active agent Substances 0.000 claims description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 claims description 2
- DRITYCRTIHBMEO-UHFFFAOYSA-N C1(=CC=CC=C1)CCC1=C(C=CC=C1)O.CC1(C(=O)O)CC(C(=O)O)=CC=C1 Chemical compound C1(=CC=CC=C1)CCC1=C(C=CC=C1)O.CC1(C(=O)O)CC(C(=O)O)=CC=C1 DRITYCRTIHBMEO-UHFFFAOYSA-N 0.000 claims description 2
- 239000004793 Polystyrene Substances 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 150000007942 carboxylates Chemical class 0.000 claims description 2
- 239000002131 composite material Substances 0.000 claims description 2
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 claims description 2
- 125000003983 fluorenyl group Chemical class C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims description 2
- 239000004811 fluoropolymer Substances 0.000 claims description 2
- 229920002313 fluoropolymer Polymers 0.000 claims description 2
- 150000002475 indoles Chemical class 0.000 claims description 2
- 229910052740 iodine Inorganic materials 0.000 claims description 2
- 239000011630 iodine Substances 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 2
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 2
- 229920002223 polystyrene Polymers 0.000 claims description 2
- 230000001681 protective effect Effects 0.000 claims description 2
- FLFWJIBUZQARMD-UHFFFAOYSA-N 2-mercapto-1,3-benzoxazole Chemical group C1=CC=C2OC(S)=NC2=C1 FLFWJIBUZQARMD-UHFFFAOYSA-N 0.000 claims 1
- 238000007046 ethoxylation reaction Methods 0.000 claims 1
- 229920006027 ternary co-polymer Polymers 0.000 claims 1
- 230000035945 sensitivity Effects 0.000 abstract description 5
- 230000015572 biosynthetic process Effects 0.000 abstract description 4
- 239000012528 membrane Substances 0.000 abstract description 4
- 238000003860 storage Methods 0.000 abstract description 4
- 230000001427 coherent effect Effects 0.000 abstract description 3
- 238000010526 radical polymerization reaction Methods 0.000 abstract description 2
- 230000009977 dual effect Effects 0.000 abstract 1
- 230000007613 environmental effect Effects 0.000 abstract 1
- 229920002799 BoPET Polymers 0.000 description 10
- 238000005516 engineering process Methods 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 238000001035 drying Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- 150000003254 radicals Chemical class 0.000 description 4
- 108010010803 Gelatin Proteins 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 3
- 229920000159 gelatin Polymers 0.000 description 3
- 239000008273 gelatin Substances 0.000 description 3
- 235000019322 gelatine Nutrition 0.000 description 3
- 235000011852 gelatine desserts Nutrition 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- 210000004379 membrane Anatomy 0.000 description 3
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 3
- 238000007774 anilox coating Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 229920001897 terpolymer Polymers 0.000 description 2
- 125000002769 thiazolinyl group Chemical group 0.000 description 2
- WVRHNZGZWMKMNE-UHFFFAOYSA-N 2-hydroxy-1-[2-(2-methylpropyl)phenyl]-2-phenylethanone Chemical compound CC(C)CC1=CC=CC=C1C(=O)C(O)C1=CC=CC=C1 WVRHNZGZWMKMNE-UHFFFAOYSA-N 0.000 description 1
- 241000195493 Cryptophyta Species 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 206010034960 Photophobia Diseases 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- KYKQHSMYWLWROM-UHFFFAOYSA-N ac1l4yjn Chemical compound [Hg].[Hg] KYKQHSMYWLWROM-UHFFFAOYSA-N 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- 150000003851 azoles Chemical class 0.000 description 1
- 125000005605 benzo group Chemical group 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- XHVYCNBSAALTIH-UHFFFAOYSA-N butyl prop-2-enoate;ethenyl acetate;prop-2-enoic acid Chemical compound OC(=O)C=C.CC(=O)OC=C.CCCCOC(=O)C=C XHVYCNBSAALTIH-UHFFFAOYSA-N 0.000 description 1
- BPOZNMOEPOHHSC-UHFFFAOYSA-N butyl prop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCCCOC(=O)C=C BPOZNMOEPOHHSC-UHFFFAOYSA-N 0.000 description 1
- JBTHDAVBDKKSRW-UHFFFAOYSA-N chembl1552233 Chemical compound CC1=CC(C)=CC=C1N=NC1=C(O)C=CC2=CC=CC=C12 JBTHDAVBDKKSRW-UHFFFAOYSA-N 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 208000013469 light sensitivity Diseases 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000007342 radical addition reaction Methods 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/0252—Laminate comprising a hologram layer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0264—Organic recording material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0402—Recording geometries or arrangements
- G03H2001/0415—Recording geometries or arrangements for recording reflection holograms
- G03H2001/0417—Recording geometries or arrangements for recording reflection holograms for recording single beam Lippmann hologram wherein the object is illuminated by reference beam passing through the recording material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/26—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique
- G03H2001/2605—Arrangement of the sub-holograms, e.g. partial overlapping
- G03H2001/261—Arrangement of the sub-holograms, e.g. partial overlapping in optical contact
- G03H2001/2615—Arrangement of the sub-holograms, e.g. partial overlapping in optical contact in physical contact, i.e. layered holograms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2250/00—Laminate comprising a hologram layer
- G03H2250/39—Protective layer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/12—Photopolymer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Holo Graphy (AREA)
Abstract
Description
Claims (17)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2007100392417A CN101034257B (zh) | 2007-04-06 | 2007-04-06 | 用于全息记录的感光薄膜及其制备方法 |
PCT/CN2008/070530 WO2008122226A1 (fr) | 2007-04-06 | 2008-03-19 | Membrane sensible pour réfléchir un enregistrement d'hologramme et son procédé de préparation |
US12/594,870 US20100167180A1 (en) | 2007-04-06 | 2008-03-19 | Photosensitive Film for Holographic Recording and Production Method Thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2007100392417A CN101034257B (zh) | 2007-04-06 | 2007-04-06 | 用于全息记录的感光薄膜及其制备方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101034257A CN101034257A (zh) | 2007-09-12 |
CN101034257B true CN101034257B (zh) | 2010-09-08 |
Family
ID=38730856
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2007100392417A Active CN101034257B (zh) | 2007-04-06 | 2007-04-06 | 用于全息记录的感光薄膜及其制备方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20100167180A1 (zh) |
CN (1) | CN101034257B (zh) |
WO (1) | WO2008122226A1 (zh) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101034257B (zh) * | 2007-04-06 | 2010-09-08 | 上海复旦天臣新技术有限公司 | 用于全息记录的感光薄膜及其制备方法 |
CN101324752B (zh) * | 2008-07-21 | 2012-07-25 | 上海天臣防伪技术股份有限公司 | 可以记录反射全息的聚合物液晶感光材料制备方法 |
JP5603023B2 (ja) * | 2009-04-28 | 2014-10-08 | 株式会社ダイセル | 透過型体積ホログラム記録媒体、及びその製造法 |
TWI489205B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 包含不同寫入共聚單體之光聚合物調配物 |
WO2011054793A1 (de) * | 2009-11-03 | 2011-05-12 | Bayer Materialscience Ag | Verfahren zur herstellung von holographischen medien |
US9399693B2 (en) * | 2011-01-13 | 2016-07-26 | Maruzen Petrochemical Co., Ltd. | Resin composition for photoimprinting, pattern forming process and etching mask |
CN103091984A (zh) * | 2011-11-01 | 2013-05-08 | 北京理工大学 | 一种激光全息显示光致聚合物薄膜的制备 |
KR102034364B1 (ko) * | 2015-03-27 | 2019-11-08 | 도쿄 오카 고교 가부시키가이샤 | 감 에너지성 수지 조성물 |
CN107353421B (zh) * | 2017-06-08 | 2020-09-04 | 太仓市智威智能科技有限公司 | 一种抗刮痕全息存储卡的制备方法 |
CN107341535B (zh) * | 2017-06-08 | 2020-11-03 | 太仓市智威智能科技有限公司 | 一种抗刮痕全息存储卡 |
WO2019245067A1 (ko) * | 2018-06-19 | 2019-12-26 | 광운대학교 산학협력단 | 홀로그래픽 광학 장치 및 홀로그래픽 디스플레이 장치 |
CN109532203B (zh) * | 2018-10-19 | 2021-05-04 | 中丰田光电科技(珠海)有限公司 | 一种多功能全息图案光学变频拼版方法及装置 |
CN109591409A (zh) * | 2018-11-07 | 2019-04-09 | 深圳市深大极光科技有限公司 | 薄膜防伪材料及制备方法 |
CN110737173B (zh) * | 2019-11-06 | 2021-05-14 | 北京航空航天大学 | 非水溶性光致聚合组合物、材料及应用 |
CN111258199A (zh) * | 2020-01-16 | 2020-06-09 | 深圳市金质金银珠宝检验研究中心有限公司 | 基于实物干涉的反射式体全息三维防伪的实现方法 |
CN111410705B (zh) * | 2020-05-21 | 2021-07-06 | 北京航空航天大学 | 多组分光引发体系及光致聚合物材料 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3658526A (en) * | 1969-08-25 | 1972-04-25 | Du Pont | Hologram recording in photopolymerizable layers |
CN1035364A (zh) * | 1988-01-15 | 1989-09-06 | 纳幕尔杜邦公司 | 用于折射率影像的光聚合材料和元件 |
CN1050620A (zh) * | 1989-06-22 | 1991-04-10 | 纳幕尔杜邦公司 | 在光聚合物中形成反射全息图的全息光学元件 |
CN1051251A (zh) * | 1989-09-29 | 1991-05-08 | 纳幕尔杜邦公司 | 用于全息摄影的光聚合物薄膜 |
CN1416013A (zh) * | 2002-10-16 | 2003-05-07 | 上海朗创光电科技发展有限公司 | 高聚物全息感光材料的制备方法 |
Family Cites Families (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3549367A (en) * | 1968-05-24 | 1970-12-22 | Du Pont | Photopolymerizable compositions containing triarylimidazolyl dimers and p-aminophenyl ketones |
US3615454A (en) * | 1968-06-26 | 1971-10-26 | Du Pont | Process for imaging and fixing radiation-sensitive compositions by sequential irradiation |
BE788560A (fr) * | 1972-06-09 | 1973-03-08 | Du Pont | Protection contre le halo dans la formation d'images dans des photopolymeres en couches multiples |
US4592953A (en) * | 1983-12-12 | 1986-06-03 | American Hoechst Corporation | Polyester film primed with crosslinked vinyl acetate polymers |
JPH0762761B2 (ja) * | 1986-03-28 | 1995-07-05 | 富士写真フイルム株式会社 | 画像形成材料 |
US4994347A (en) * | 1988-01-15 | 1991-02-19 | E. I. Du Pont De Nemours And Company | Storage stable photopolymerizable composition and element for refractive index imaging |
US4950567A (en) * | 1988-01-15 | 1990-08-21 | E. I. Du Pont De Nemours And Company | Holographic optical combiners for head-up displays |
US5024909A (en) * | 1988-01-15 | 1991-06-18 | E. I. Du Pont De Nemours And Company | Dry film process for altering wavelength response of holograms |
DE68928586T2 (de) * | 1988-04-12 | 1998-10-29 | Dainippon Printing Co Ltd | Optisches aufzeichnungsmedium und methode zu dessen herstellung |
US5096790A (en) * | 1988-07-28 | 1992-03-17 | E. I. Du Pont De Nemours And Company | Process of forming hologram and polymeric holographic recording medium with sensitizer |
US5182303A (en) * | 1988-12-27 | 1993-01-26 | E. I. Du Pont De Nemours And Company | Substituted semicarbazone arthropodicides |
US5098804A (en) * | 1989-01-13 | 1992-03-24 | E. I. Du Pont De Nemours And Company | Multiplexer-demultiplexer for integrated optic circuit |
US4963471A (en) * | 1989-07-14 | 1990-10-16 | E. I. Du Pont De Nemours And Company | Holographic photopolymer compositions and elements for refractive index imaging |
CA2033821A1 (en) * | 1990-01-12 | 1991-07-13 | Evan D. Laganis | Photopolymerizable compositions sensitive to longer wavelength visible actinic radiation |
DE4111394A1 (de) * | 1991-04-09 | 1992-10-15 | Behringwerke Ag | Amidinophenylalaninderivate, verfahren zu deren herstellung, deren verwendung und diese enthaltende mittel |
US6610683B2 (en) * | 1996-09-12 | 2003-08-26 | Idun Pharmaceuticals, Inc. | Treatment of infectious disease using interleukin-1β-converting enzyme (ICE)/CED-3 family inhibitors |
US6524567B2 (en) * | 1997-02-10 | 2003-02-25 | Laub Biochemicals Corp. | Synthetic soil-extract materials and medicaments for hemorrhagic fever viruses based thereon |
US5904857A (en) * | 1997-04-17 | 1999-05-18 | Nalco Chemical Company | 4-alkyl and aryl semicarbazides as oxygen scavengers |
CA2370030C (en) * | 1999-04-09 | 2007-08-14 | Euro-Celtique S.A. | Sodium channel blocker compositions and the use thereof |
US20030071948A1 (en) * | 2001-10-15 | 2003-04-17 | Felder Thomas C. | Display element containing hologram and conductive layer |
US7491472B2 (en) * | 2002-07-26 | 2009-02-17 | Dai Nippon Printing Co., Ltd. | Volume hologram transfer foil |
US7737168B2 (en) * | 2003-06-20 | 2010-06-15 | Siga Technologies, Inc. | Compounds, compositions, and methods for treatment and prevention of orthopoxvirus infections and associated diseases |
US7687641B2 (en) * | 2003-06-20 | 2010-03-30 | Siga Technologies, Inc. | Chemicals, compositions, and methods for treatment and prevention of orthopoxvirus infections and associated diseases |
AU2007351866C1 (en) * | 2003-06-20 | 2013-07-25 | Siga Technologies, Inc. | Chemicals, compositions, and methods for treatment and prevention of orthopoxvirus infections and associated diseases |
AU2005314252B2 (en) * | 2004-12-06 | 2012-09-27 | Siga Technologies, Inc. | Compounds and methods for treating hemorrhagic fever viruses |
JP4753152B2 (ja) * | 2005-07-06 | 2011-08-24 | 大日本印刷株式会社 | ホログラム付透明カード、および、ホログラム付透明カード認識装置 |
CA2640687A1 (en) * | 2006-02-01 | 2007-10-25 | Siga Technologies, Inc. | Anti-arenaviral compounds |
US8148428B2 (en) * | 2006-03-02 | 2012-04-03 | Siga Technologies, Inc. | Antiviral drugs for treatment of arenavirus infection |
US7977365B2 (en) * | 2006-03-02 | 2011-07-12 | Siga Technologies, Inc. | Antiviral drugs for treatment of arenavirus infection |
WO2007103111A2 (en) * | 2006-03-02 | 2007-09-13 | Siga Technologies, Inc. | Antiviral drugs for treatment of arenavirus infection |
CN101034257B (zh) * | 2007-04-06 | 2010-09-08 | 上海复旦天臣新技术有限公司 | 用于全息记录的感光薄膜及其制备方法 |
CN101324752B (zh) * | 2008-07-21 | 2012-07-25 | 上海天臣防伪技术股份有限公司 | 可以记录反射全息的聚合物液晶感光材料制备方法 |
-
2007
- 2007-04-06 CN CN2007100392417A patent/CN101034257B/zh active Active
-
2008
- 2008-03-19 WO PCT/CN2008/070530 patent/WO2008122226A1/zh active Application Filing
- 2008-03-19 US US12/594,870 patent/US20100167180A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3658526A (en) * | 1969-08-25 | 1972-04-25 | Du Pont | Hologram recording in photopolymerizable layers |
CN1035364A (zh) * | 1988-01-15 | 1989-09-06 | 纳幕尔杜邦公司 | 用于折射率影像的光聚合材料和元件 |
CN1050620A (zh) * | 1989-06-22 | 1991-04-10 | 纳幕尔杜邦公司 | 在光聚合物中形成反射全息图的全息光学元件 |
CN1051251A (zh) * | 1989-09-29 | 1991-05-08 | 纳幕尔杜邦公司 | 用于全息摄影的光聚合物薄膜 |
CN1416013A (zh) * | 2002-10-16 | 2003-05-07 | 上海朗创光电科技发展有限公司 | 高聚物全息感光材料的制备方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2008122226A1 (fr) | 2008-10-16 |
US20100167180A1 (en) | 2010-07-01 |
CN101034257A (zh) | 2007-09-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101034257B (zh) | 用于全息记录的感光薄膜及其制备方法 | |
CN101320208B (zh) | 反射全息薄膜及其制备方法 | |
CN101324752B (zh) | 可以记录反射全息的聚合物液晶感光材料制备方法 | |
CN101059654B (zh) | 一种光刻衍射图像防伪薄膜及其制备方法 | |
JP2849021B2 (ja) | 体積ホログラム記録用感光性組成物 | |
JPH09506441A (ja) | 広帯域反射ホログラムとその乾式製造方法 | |
KR940007966B1 (ko) | 홀로 그래피 광학 소자 | |
US5725970A (en) | Broad band reflection holograms and a dry process for making same | |
JPH03116004A (ja) | 改良されたホログラフィックノッチフィルター | |
BRPI1100786A2 (pt) | Fotopolímero para gravação de holograma de volume e processo para produzi-lo | |
EP1376268A1 (en) | Composition for hologram-recording material, hologram-recording medium, and process for producing the same | |
JPH07157506A (ja) | フィルム組成物およびその組成物を含む積層構造 | |
CN103119522A (zh) | 体积全息图转印箔 | |
CN1878854B (zh) | 光聚合组合物和利用其制造的用于制造3d光存储器的光聚合记录介质 | |
JP2001125474A (ja) | 体積ホログラム記録用感光組成物およびこれから得られるホログラム | |
CN113168129B (zh) | 全息记录组合物、全息记录介质、衍射光学元件、以及使用衍射光学元件的光学装置、光学部件和图像显示装置 | |
Bruder et al. | Full-color self-processing holographic photopolymers with high sensitivity in red-the first class of instant holographic photopolymers | |
JP2003066816A (ja) | 体積型ホログラム記録用感光性組成物及びそれを用いた体積型ホログラム記録用感光性媒体 | |
JP2008275674A (ja) | 光記録用組成物、ホログラフィック記録媒体および情報記録方法 | |
JP2004318069A (ja) | 体積型ホログラム記録用感光性組成物および体積型ホログラム記録用感光性媒体 | |
JP2007034334A (ja) | 体積ホログラム記録用感光性組成物、及びそれを用いた記録媒体ならびに体積ホログラム形成方法 | |
CN1186692C (zh) | 高聚物全息感光材料的制备方法 | |
JP2002244535A (ja) | ホログラム記録用感光性組成物及び記録媒体、ホログラムとその記録方法、形成方法及び再生方法 | |
JP2009047971A (ja) | 投影用スクリーン及びその製造方法 | |
JP2010134259A (ja) | 体積ホログラム記録用感光性組成物 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: SHANGHAI TECHSUN ANTI-COUNTERFEITING TECHNOLOGY CO Free format text: FORMER NAME: TIANCHEN NEW TECHNOLOGY CO LTD, FUDAN UNIV, SHANGHAI |
|
CP01 | Change in the name or title of a patent holder |
Address after: 5, building 1, building 127, Lane 200433, Cathay Road, Yangpu District, Shanghai Patentee after: Shanghai Tiancheng Anticounterfeit Technology Co.,Ltd. Address before: 5, building 1, building 127, Lane 200433, Cathay Road, Yangpu District, Shanghai Patentee before: Tianchen New Technology Co., Ltd., Fudan Univ, Shanghai |
|
CP03 | Change of name, title or address |
Address after: Room 201, building 3, No. 518, shenzhuan Road, Songjiang District, Shanghai Patentee after: Shanghai Tianchen micro nano technology Co., Ltd Address before: 5, building 1, building 127, Lane 200433, Cathay Road, Yangpu District, Shanghai Patentee before: Shanghai Techsun Anti-Counterfeiting Technology Holding Co.,Ltd. |
|
CP03 | Change of name, title or address |