CN106940504A - A kind of array base palte, its preparation method and liquid crystal display panel, display device - Google Patents
A kind of array base palte, its preparation method and liquid crystal display panel, display device Download PDFInfo
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- CN106940504A CN106940504A CN201710309241.8A CN201710309241A CN106940504A CN 106940504 A CN106940504 A CN 106940504A CN 201710309241 A CN201710309241 A CN 201710309241A CN 106940504 A CN106940504 A CN 106940504A
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- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 63
- 238000002360 preparation method Methods 0.000 title abstract description 6
- 239000000758 substrate Substances 0.000 claims abstract description 201
- 239000011159 matrix material Substances 0.000 claims abstract description 19
- 238000004519 manufacturing process Methods 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 34
- 230000005684 electric field Effects 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 97
- 239000000463 material Substances 0.000 description 12
- 239000010409 thin film Substances 0.000 description 11
- 238000002161 passivation Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 238000000059 patterning Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 238000011161 development Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 239000004988 Nematic liquid crystal Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- -1 polyethylene naphthalate Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229920001289 polyvinyl ether Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 210000000707 wrist Anatomy 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133305—Flexible substrates, e.g. plastics, organic film
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
- G09G3/34—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
- G09G3/36—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using liquid crystals
- G09G3/3611—Control of matrices with row and column drivers
- G09G3/3648—Control of matrices with row and column drivers using an active matrix
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136222—Colour filters incorporated in the active matrix substrate
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mathematical Physics (AREA)
- Optics & Photonics (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Theoretical Computer Science (AREA)
- Liquid Crystal (AREA)
Abstract
The invention discloses a kind of array base palte, its preparation method and liquid crystal display panel, display device, including：Underlay substrate, is arranged at the data wire on underlay substrate, and be arranged at the pixel electrode layer being made up of multiple pixel electrodes on the layer of data wire place；Orthographic projection of the data wire on underlay substrate covers orthographic projection of the gap on underlay substrate between two adjacent row pixel electrodes, and width of the width more than gap between two adjacent row pixel electrodes of data wire.Due to orthographic projection of the gap on underlay substrate between two adjacent row pixel electrodes of orthographic projection covering of the data wire on underlay substrate, and the width of data wire is more than the width in gap between two adjacent row pixel electrodes, so, it can make to form the longitudinal electric field line that opposite substrate is pointed in direction by array base palte between data wire and pixel electrode, so as to the torsion by controlling liquid crystal, data wire direction light leak is prevented, simultaneously, avoid using black matrix to prevent light leak, effectively increase aperture opening ratio.
Description
Technical Field
The invention relates to the technical field of display, in particular to an array substrate, a manufacturing method of the array substrate, a liquid crystal display panel and a display device.
Background
A Liquid Crystal Display (LCD) panel has the advantages of light weight, thin thickness, low power consumption, easy driving, no harmful rays, and the like, and has been widely used in modern information devices such as televisions, notebook computers, mobile phones, personal digital assistants, and the like, and has a wide development prospect. Curved displays have a better viewing experience and display effect for an individual user than flat displays. Therefore, the curved liquid crystal display panel technology is an important development direction of the liquid crystal display panel.
A Twisted Nematic (TN) liquid crystal display panel is formed by rotating a liquid crystal by 90 degrees between an array substrate and a counter substrate. For a normally white mode lcd panel, when a black frame is displayed, the contrast of the image is reduced due to light leakage in the non-display area. The twisted nematic liquid crystal display panel can avoid light leakage in a normally white mode due to the distribution mode of liquid crystal, so that the twisted nematic liquid crystal display panel has great advantages in the aspect of curved surface display.
However, the curved liquid crystal display panel technology needs to bend the liquid crystal display panel, and during the bending process, the opposite substrate and the array substrate of the liquid crystal display panel are easily displaced, which causes the light leakage phenomenon of the liquid crystal display panel. In the prior art, the size of the black matrix is increased to prevent light leakage, which inevitably reduces the aperture ratio of the liquid crystal display panel.
Therefore, how to effectively increase the aperture ratio of the liquid crystal display panel while preventing light leakage is a technical problem that needs to be solved by those skilled in the art.
Disclosure of Invention
In view of the above, embodiments of the present invention provide an array substrate, a manufacturing method thereof, a liquid crystal display panel, and a display device, so as to solve the problem in the prior art how to effectively improve the aperture ratio of the liquid crystal display panel while preventing light leakage.
Therefore, an array substrate provided in an embodiment of the present invention includes: the liquid crystal display panel comprises a substrate base plate, a data line and a pixel electrode layer, wherein the data line is arranged on the substrate base plate; wherein,
the pixel electrode layer is composed of a plurality of mutually independent pixel electrodes;
the orthographic projection of the data line on the substrate covers the orthographic projection of a gap between two adjacent columns of the pixel electrodes on the substrate, and the width of the data line is larger than that of the gap between two adjacent columns of the pixel electrodes.
In a possible implementation manner, in the array substrate provided by the embodiment of the present invention, an orthographic projection portion of the data line on the substrate covers orthographic projections of two adjacent columns of the pixel electrodes on the substrate.
In a possible implementation manner, in the array substrate provided by the embodiment of the present invention, an overlapping area of an orthogonal projection of the data line on the substrate and an orthogonal projection of two adjacent columns of the pixel electrodes on the substrate has the same width.
In a possible implementation manner, in the array substrate provided in an embodiment of the present invention, the array substrate further includes: and the color resistance layer is arranged between the layer where the data line is located and the pixel electrode layer.
In a possible implementation manner, in the array substrate provided in an embodiment of the present invention, the array substrate further includes: and the flat layer is arranged between the color resistance layer and the pixel electrode layer.
In a possible implementation manner, in the array substrate provided in an embodiment of the present invention, the array substrate further includes: the grid line is arranged between the substrate and the layer where the data line is located, and the transverse public electrode lines and the longitudinal public electrode lines are arranged on the same layer with the grid line.
In a possible implementation manner, in the array substrate provided in the embodiment of the present invention, each of the longitudinal common electrode lines corresponds to each of the columns of the pixel electrodes one to one;
the orthographic projection of each longitudinal common electrode line on the substrate base plate is located at the center of the orthographic projection of each column of pixel electrodes on the substrate base plate.
The embodiment of the invention provides a liquid crystal display panel, which comprises the array substrate and an opposite substrate opposite to the array substrate.
In a possible implementation manner, in the liquid crystal display panel provided in an embodiment of the present invention, the liquid crystal display panel further includes: the black matrix is arranged on one side, facing the array substrate, of the opposite substrate; or,
and the black matrix is arranged on one side of the array substrate, which faces the opposite substrate, and is positioned in a gap between each color resistor in the color resistor layer.
The embodiment of the invention provides a display device which comprises the liquid crystal display panel.
The embodiment of the invention provides a manufacturing method of the array substrate, which comprises the following steps:
providing a substrate base plate;
forming a data line on the substrate;
forming a pixel electrode layer consisting of a plurality of mutually independent pixel electrodes on the layer where the data line is positioned; wherein,
the orthographic projection of the data line on the substrate covers the orthographic projection of a gap between two adjacent columns of the pixel electrodes on the substrate, and the width of the data line is larger than that of the gap between two adjacent columns of the pixel electrodes.
In a possible implementation manner, in the above manufacturing method provided in an embodiment of the present invention, before forming a pixel electrode layer composed of a plurality of mutually independent pixel electrodes on a layer where the data line is located, the method further includes:
and forming a color resistance layer on the layer where the data line is located.
In a possible implementation manner, in the manufacturing method provided in an embodiment of the present invention, before forming a pixel electrode layer composed of a plurality of mutually independent pixel electrodes on a layer where the data line is located, and after forming a color resistance layer on the layer where the data line is located, the method further includes: and forming a flat layer on the color resistance layer.
In a possible implementation manner, in the above manufacturing method provided in an embodiment of the present invention, before forming the data line on the substrate, the method further includes:
simultaneously forming a grid line, a plurality of transverse common electrode lines and a plurality of longitudinal common electrode lines on the substrate base plate;
each longitudinal public electrode wire corresponds to each row of pixel electrodes one to one;
the orthographic projection of each longitudinal common electrode line on the substrate base plate is located at the center of the orthographic projection of each column of pixel electrodes on the substrate base plate.
The invention has the following beneficial effects:
the embodiment of the invention provides an array substrate, a manufacturing method thereof, a liquid crystal display panel and a display device, which comprise the following steps: the liquid crystal display panel comprises a substrate base plate, a data line and a pixel electrode layer, wherein the data line is arranged on the substrate base plate; the pixel electrode layer is composed of a plurality of mutually independent pixel electrodes; the orthographic projection of the data line on the substrate covers the orthographic projection of a gap between two adjacent columns of pixel electrodes on the substrate, and the width of the data line is larger than that of the gap between two adjacent columns of pixel electrodes. Because the orthographic projection of the data line on the substrate covers the orthographic projection of the gap between two adjacent columns of pixel electrodes on the substrate, and the width of the data line is larger than the width of the gap between two adjacent columns of pixel electrodes, the arrangement can ensure that longitudinal electric field lines with the direction pointing to the opposite substrate from the array substrate are formed between the data line and the pixel electrodes, thereby preventing the light leakage in the direction of the data line by controlling the torsion of liquid crystal, simultaneously, the light leakage is prevented without using a black matrix, and the aperture opening ratio is effectively improved.
Drawings
Fig. 1 is a schematic structural diagram of an array substrate according to an embodiment of the present invention;
fig. 2 is a schematic diagram illustrating a relative position relationship between a vertical common electrode line and a pixel electrode in an array substrate according to an embodiment of the present invention;
fig. 3 is a flow chart illustrating a manufacturing process of an array substrate according to an embodiment of the invention;
fig. 4a to fig. 4g are schematic structural diagrams of the manufacturing method of the array substrate shown in fig. 3 after performing the steps, respectively;
fig. 5 is a schematic structural diagram of a liquid crystal display panel according to an embodiment of the invention.
Detailed Description
Embodiments of an array substrate, a method for manufacturing the array substrate, a liquid crystal display panel, and a display device according to embodiments of the present invention will be described in detail below with reference to the accompanying drawings.
The shapes and sizes of the various film layers in the drawings do not reflect the true scale of the film layers in the array substrate or the liquid crystal display panel, and are only intended to schematically illustrate the present invention.
An array substrate provided in an embodiment of the present invention is shown in fig. 1, and includes: a substrate 101, a data line 102 disposed on the substrate 101, and a pixel electrode layer 103 disposed on a layer on which the data line 102 is disposed; wherein,
the pixel electrode layer 103 is composed of a plurality of pixel electrodes 1031 independent of each other;
an orthogonal projection of the data line 102 on the substrate base plate 101 covers an orthogonal projection of a gap between two adjacent columns of pixel electrodes on the substrate base plate 101, and the width a of the data line 102 is greater than the width b of the gap between two adjacent columns of pixel electrodes.
In the array substrate provided by the embodiment of the invention, because the orthographic projection of the data line 102 on the substrate 101 covers the orthographic projection of the gap between two adjacent columns of pixel electrodes on the substrate 101, and the width a of the data line 102 is greater than the width b of the gap between two adjacent columns of pixel electrodes, a longitudinal electric field line in the direction from the array substrate to the opposite substrate can be formed between the data line 102 and the pixel electrode 1031, so that the light leakage in the direction of the data line 102 can be prevented by controlling the torsion of the liquid crystal, meanwhile, the light leakage is prevented without using a black matrix, and the aperture ratio is effectively improved.
In the array substrate provided in the embodiment of the present invention, the substrate 101 may be a flexible substrate, such as a plastic substrate made of polyvinyl ether phthalate, polyethylene naphthalate, polycarbonate, polyarylate, polyetherimide, polyethersulfone, polyimide, or the like, which has excellent heat resistance and durability; but may also be a rigid substrate, such as a glass substrate, without limitation.
Specifically, in order not to affect normal display, in the array substrate provided in the embodiment of the present invention, the orthographic projection of the data line 102 on the substrate 101 covers the orthographic projection of two adjacent columns of pixel electrodes on the substrate 101.
Moreover, in order to facilitate the manufacturing process, in the array substrate provided in the embodiment of the present invention, as shown in fig. 1, an overlapping region of an orthogonal projection of the data line 102 on the substrate base plate 101 and an orthogonal projection of two adjacent columns of pixel electrodes on the substrate base plate 101 has the same width c.
Of course, in practical implementation, the overlapping area between the orthographic projection of the data line 102 on the substrate base 101 and the orthographic projection of the pixel electrodes in two adjacent columns on the substrate base 101 may also have different widths, which is not limited herein.
Generally, voltage stabilization is needed for a period of time in the process of charging the pixel electrode 1031 by the data line 102, however, in the array substrate provided by the embodiment of the invention, since an overlapping region exists between the data line 102 and the pixel electrode 1031, a certain capacitance is formed between the data line 102 and the pixel electrode 1031 in the overlapping region, and the capacitance may cause a certain degree of interference on the stable voltage on the pixel electrode 1031, thereby affecting the display effect.
Therefore, in order to reduce the capacitance between the data line 102 and the pixel electrode 1031, the array substrate provided in the embodiment of the present invention may further include: and a color resistance layer 104 disposed between the data line 102 and the pixel electrode layer 103. In this way, the distance between the data line 102 and the pixel electrode 1031 is increased, so that the capacitance between the two is reduced, and the risk that the capacitance between the two disturbs the stable voltage on the pixel electrode 1031 is reduced. In addition, the color resist layer 104 is disposed on the array substrate, which can avoid the problem that the color resist layer 104 and the pixel electrode 1031 are not aligned strictly, thereby improving the aperture ratio of the liquid crystal display panel and increasing the brightness of the liquid crystal display panel.
Preferably, in order to further reduce the capacitance between the data line 102 and the pixel electrode 1031, the array substrate provided in the embodiment of the present invention may further include: and a planarization layer 105 disposed between the color resist layer 104 and the pixel electrode layer 103. That is, by further increasing the distance between the data line 102 and the pixel electrode 1031, a smaller capacitance between the data line 102 and the pixel electrode 1031 is achieved. Moreover, generally, the color resist layer 104 is composed of a plurality of color resists of different colors, any two adjacent color resists will generate a certain overlapping area in the manufacturing process, and then a break occurs, and the liquid crystal above the overlapping area will have a phenomenon of reverse disorder due to the break, which will seriously affect the display effect. By providing the flat layer 105 on the color resist layer 104, the cross-talk between any two adjacent color resists in the color resist layer 104 due to overlapping can be reduced, thereby improving the display quality.
The material of the planarization layer 105 may be an organic insulating material such as polyacrylic resin, polyepoxy acrylic resin, photosensitive polyimide resin, polyester acrylate, polyurethane acrylate resin, novolac epoxy acryl resin, and the like, which is not limited herein.
Generally, in the array substrate provided in the embodiment of the present invention, it is further required to include: a thin film transistor, which may be specifically a bottom gate type structure; alternatively, the structure may be a top gate structure, which is not limited herein.
Specifically, when the thin film transistors in the array substrate provided by the embodiment of the present invention are of a bottom gate type structure, as shown in fig. 4g, in each thin film transistor, the source/drain electrodes 404 are located above the active layer 403, the gate electrode 401 is located below the active layer 403, the gate insulating layer 402 is disposed between the gate electrode 401 and the active layer 403, and the passivation layer 405 is disposed on the layer where the source/drain electrodes 404 are located. Each pixel electrode 1031 is positioned above the source/drain electrode 404 in the corresponding thin film transistor, and each pixel electrode 1031 is electrically connected to the source/drain electrode 404 in the corresponding thin film transistor through a via hole penetrating the passivation layer 405, the color resist layer 104, and the planarization layer 105.
The material of the gate 401 and the source/drain 404 may be one of molybdenum, aluminum, tungsten, titanium, and copper, or an alloy combination, which is not limited herein. The material of the gate insulating layer 402 and the passivation layer 405 may be one or a combination of silicon oxide and silicon nitride, and is not limited herein. The material of the active layer 403 may be a polysilicon semiconductor material, an amorphous silicon semiconductor material, an oxide semiconductor material, or an organic semiconductor material, which is not limited herein.
In specific implementation, as shown in fig. 2, the array substrate provided in the embodiment of the present invention further includes: a gate line 106 disposed between the substrate 101 and the data line 102, and a plurality of transverse common electrode lines 107a and a plurality of longitudinal common electrode lines 107b disposed on the same layer as the gate line 106. Among them, the gate lines 106 are used to supply scanning signals to the respective pixel electrodes 1031, and the respective transverse common electrode lines 107a and the respective longitudinal common electrode lines 107b are used to supply common voltage signals to the common electrodes.
It should be noted that, in order to simplify the manufacturing process, save the manufacturing cost, and improve the production efficiency, in the array substrate provided in the embodiment of the present invention, the gate line 106, the plurality of transverse common electrode lines 107a, and the plurality of longitudinal common electrode lines 107b may be simultaneously prepared by using a single patterning process. Of course, the gate line 106, the plurality of transverse common electrode lines 107a, and the plurality of longitudinal common electrode lines 107b may also be prepared by a secondary patterning process, which is not limited herein. In addition, the material of the gate line 106, the plurality of transverse common electrode lines 107a, and the plurality of longitudinal common electrode lines 107b may be one of molybdenum, aluminum, tungsten, titanium, and copper, or an alloy combination, which is not limited herein.
In addition, in order to simplify the manufacturing process, save the manufacturing cost, and improve the production efficiency, in the array substrate provided in the embodiment of the present invention, the source/drain 404 and the data line 102 may be simultaneously prepared by using a one-step patterning process. Of course, the source/drain 404 and the data line 102 may be separately formed by a secondary patterning process, which is not limited herein. In addition, the material of the source/drain 404 and the data line 102 may be one of molybdenum, aluminum, tungsten, titanium, copper, or an alloy combination, which is not limited herein.
Specifically, in order to make the display screen of the pixel electrode 1031 uniform, in the array substrate provided in the embodiment of the present invention, each longitudinal common electrode line 107b corresponds to each column of pixel electrodes one to one; (ii) a
The orthographic projection of each longitudinal common electrode line 107b on the substrate base plate 101 is positioned at the central position of the orthographic projection of each column of pixel electrodes on the substrate base plate 101; as shown in fig. 2, a schematic diagram of a relative position relationship between an orthographic projection of any one of the longitudinal common electrode lines 107b on the substrate base 101 and an orthographic projection of any one of the pixel electrodes 1031 (not shown in the figure) in a column of the corresponding pixel electrode on the substrate base 101.
With this arrangement, the effective display area of the pixel electrode 1031 can be made symmetrical, and the uniformity of the display screen can be improved. Moreover, since the color resist layer 104 on the layer where the vertical common electrode lines 107b are located is thick, even if the orthographic projection of the vertical common electrode lines 107b on the substrate 101 is located at the center of the orthographic projection of the column pixel electrodes on the substrate 101, the vertical common electrode lines 107b are not seen on the display side of the liquid crystal display panel, that is, the aperture ratio of the liquid crystal display panel is not affected.
Accordingly, embodiments of the present invention provide a method for manufacturing the array substrate, and because a principle of the method for solving the problem is similar to a principle of the method for solving the problem of the array substrate, the implementation of the method for manufacturing the array substrate provided by embodiments of the present invention can refer to the implementation of the array substrate provided by embodiments of the present invention, and repeated details are not repeated.
Specifically, as shown in fig. 3, the method for manufacturing the array substrate according to the embodiment of the present invention may specifically include the following steps:
s301, providing a substrate base plate;
s302, forming a data line on a substrate;
s303, forming a pixel electrode layer consisting of a plurality of mutually independent pixel electrodes on the layer where the data line is positioned; wherein,
the orthographic projection of the data line on the substrate covers the orthographic projection of a gap between two adjacent columns of pixel electrodes on the substrate, and the width of the data line is larger than that of the gap between two adjacent columns of pixel electrodes.
In specific implementation, in order to reduce the capacitance between the data line and the pixel electrode, in the manufacturing method provided in the embodiment of the present invention, before forming the pixel electrode layer composed of a plurality of pixel electrodes independent of each other on the layer where the data line is located, the method may further include:
and forming a color resistance layer on the layer where the data line is located.
Specifically, in order to further reduce the capacitance between the data line and the pixel electrode, in the manufacturing method provided in the embodiment of the present invention, before forming the pixel electrode layer composed of a plurality of pixel electrodes independent of each other on the layer where the data line is located, and after forming the color resistance layer on the layer where the data line is located, the method further includes: a planarization layer is formed on the color resist layer.
Specifically, in order to improve the uniformity of the display screen of the pixel electrode, in the manufacturing method provided by the embodiment of the present invention, before forming the data line on the substrate, the method further includes:
simultaneously forming a grid line, a plurality of transverse common electrode lines and a plurality of longitudinal common electrode lines on a substrate;
each longitudinal common electrode line corresponds to each row of pixel electrodes one to one;
the orthographic projection of each longitudinal common electrode line on the substrate base plate is positioned at the central position of the orthographic projection of each column of pixel electrodes on the substrate base plate.
In order to better understand the manufacturing method provided by the embodiment of the present invention, the embodiment of the present invention further provides a schematic structural diagram of the array substrate obtained after the steps of the manufacturing method are performed, as shown in fig. 4a to 4 g.
It should be noted that the thin film transistor in the array substrate provided in the embodiment of the present invention may specifically be a bottom gate type structure; alternatively, the structure may be a top gate structure, which is not limited herein. The following description will be given taking a thin film transistor as an example of a bottom gate type structure.
Providing a substrate 101, and forming a pattern of a gate 401 and a gate line (not shown in the figure) on the substrate 101 by a one-step patterning process, as shown in fig. 4a, so that the manufacturing process of the array substrate can be simplified, and the number of masks can be reduced;
a gate insulating layer 402, an active layer 403, source/drain electrodes 404 and a data line (not shown) are sequentially formed on the substrate 101 on which the gate electrode 401 and the gate line are formed, as shown in fig. 4 b;
forming a pattern of passivation layer 405 over the layer where the source/drain electrodes 404 and the data lines are located, as shown in fig. 4 c;
forming a pattern of the color-resist layer 104 with vias on the passivation layer 405, as shown in fig. 4 d;
forming a pattern of a planarization layer 105 having via holes in communication with the via holes of the color resist layer 104 on the color resist layer 104, as shown in fig. 4 e;
forming a via hole in the passivation layer 405 on the layer where the source/drain electrode 404 and the data line are located, which is conductive to the via holes of the color-resist layer 104 and the planarization layer 105, as shown in fig. 4 f;
a pattern of the pixel electrode layer 103 is formed on the planarization layer 105, and the pixel electrode 1031 is electrically connected to the source/drain electrode 404 of the corresponding thin film transistor through via holes penetrating through the passivation layer 405, the color resist layer 104 and the planarization layer 105, as shown in fig. 4 g.
It should be noted that, in the manufacturing method provided in the fourth embodiment of the present invention, the patterning process related to forming each layer structure may include not only some or all of the processes of deposition, photoresist coating, mask masking, exposure, development, etching, and photoresist stripping, but also other processes, and specifically, a pattern to be patterned is formed in an actual manufacturing process, which is not limited herein. For example, a post-bake process may also be included after development and before etching.
The deposition process may be a chemical vapor deposition method, a plasma enhanced chemical vapor deposition method, or a physical vapor deposition method, which is not limited herein; the Mask used in the Mask process may be a Half-Tone Mask (Half Tone Mask), a semi-transparent Mask (modify Single Mask), a Single Slit diffraction Mask (Single Slit Mask) or a Gray Tone Mask (Gray Tone Mask), which is not limited herein; the etching may be dry etching or wet etching, and is not limited herein.
Based on the same inventive concept, embodiments of the present invention provide a liquid crystal display panel, and since the principle of solving the problems of the liquid crystal display panel is similar to the principle of solving the problems of the array substrate, the implementation of the liquid crystal display panel provided by embodiments of the present invention can refer to the implementation of the array substrate provided by embodiments of the present invention, and repeated details are not repeated.
An embodiment of the liquid crystal display panel of the invention, as shown in fig. 5, includes the array substrate and an opposite substrate opposite to the array substrate.
In practical implementation, in order to avoid light leakage between color resists in the color resist layer 104, as shown in fig. 5, the liquid crystal display panel according to an embodiment of the present invention further includes: a black matrix 501 disposed on a side of the opposite substrate facing the array substrate; of course, in practical implementation, the black matrix 501 may also be disposed on the side of the array substrate facing the opposite substrate, and the black matrix 501 is located at the gap between the color resists in the color resist layer 104.
The black matrix 501 can not only prevent light leakage between color resists but also increase color contrast. In general, the material of the black matrix 501 may be divided into two types, one of which is a metal thin film such as an oxide film; the other is a resin type black photoresist film, and carbon black is used as the main material. Preferably, since the metal thin film is easy to etch and has a good light shielding effect, the metal thin film may be selected as the black matrix 501 in practical applications.
It should be noted that, in the display panel provided in the embodiment of the present invention, in addition to using the metal film or the black resin as the black matrix 501, the red color resistor and the blue color resistor can be stacked and then used as the black matrix 501 to achieve the light shielding effect, which is not limited herein.
Specifically, in order to improve the anti-squeezing capability of the liquid crystal display panel, as shown in fig. 5, the liquid crystal display panel provided in the embodiment of the present invention further includes: a plurality of Photo spacers 502 (PS) disposed between the array substrate and the opposite substrate.
In specific implementation, the opposite substrate in the liquid crystal display panel provided in the embodiment of the present invention generally further includes other film layer structures such as a common electrode layer, a protection layer, and the like, and these specific structures may have various implementation manners, which are not limited herein.
The following will describe in detail the preparation process of the liquid crystal display panel by taking the preparation of the liquid crystal display panel shown in fig. 5 as an example, and the specific preparation process includes the following steps:
(1) sequentially obtaining the array substrates shown in fig. 4a to 4g by adopting the manufacturing method of the array substrate;
(2) sequentially forming a protective layer (not shown), a black matrix 501, a common electrode layer (not shown) and a photoresist spacer 502 on a substrate 503 of the opposite substrate;
(3) and performing cartridge matching processing on the substrate base plate 101 of the array base plate and the substrate base plate 503 of the opposite base plate.
It should be noted that, in the specific implementation, the steps (1) and (2) are not limited to the sequence described in the preparation process of the liquid crystal display panel, and the step (2) may be executed first, and then the step (1) is executed, which is not limited herein.
Specifically, after performing the cell aligning process on the substrate 101 of the array substrate and the substrate 503 of the opposite substrate in step (3) of the manufacturing process of the liquid crystal display panel provided by the embodiment of the present invention, liquid crystal molecules may be added to the liquid crystal display panel after the cell aligning process by soaking; alternatively, after the array substrate shown in fig. 4a to 4g is obtained in sequence by using the above array substrate manufacturing method in step (1) of the above liquid crystal display panel manufacturing process provided by the embodiment of the present invention, liquid crystal molecules may be dropped on the substrate 101 of the array substrate; alternatively, after the protective layer (not shown), the black matrix 501, the common electrode layer (not shown) and the photoresist spacer 502 are sequentially formed on the substrate 503 of the opposite substrate in the step (2) of the manufacturing process of the liquid crystal display panel provided in the embodiment of the present invention, liquid crystal molecules may be dropped on the substrate 503 of the opposite substrate, which is not limited herein.
Based on the same inventive concept, an embodiment of the present invention further provides a display device, including the liquid crystal display panel provided by the embodiment of the present invention, where the display device may be: any product or component with a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, an intelligent watch, a fitness wrist strap, and a personal digital assistant. The implementation of the display device can be seen in the above embodiments of the liquid crystal display panel, and repeated descriptions are omitted.
The array substrate, the manufacturing method thereof, the liquid crystal display panel and the display device provided by the embodiment of the invention comprise the following steps: the liquid crystal display panel comprises a substrate base plate, a data line and a pixel electrode layer, wherein the data line is arranged on the substrate base plate; the pixel electrode layer is composed of a plurality of mutually independent pixel electrodes; the orthographic projection of the data line on the substrate covers the orthographic projection of a gap between two adjacent columns of pixel electrodes on the substrate, and the width of the data line is larger than that of the gap between two adjacent columns of pixel electrodes. Because the orthographic projection of the data line on the substrate covers the orthographic projection of the gap between two adjacent columns of pixel electrodes on the substrate, and the width of the data line is larger than the width of the gap between two adjacent columns of pixel electrodes, the arrangement can ensure that longitudinal electric field lines with the direction pointing to the opposite substrate from the array substrate are formed between the data line and the pixel electrodes, thereby preventing the light leakage in the direction of the data line by controlling the torsion of liquid crystal, simultaneously, the light leakage is prevented without using a black matrix, and the aperture opening ratio is effectively improved.
It will be apparent to those skilled in the art that various changes and modifications may be made in the present invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.
Claims (14)
1. An array substrate, comprising: the liquid crystal display panel comprises a substrate base plate, a data line and a pixel electrode layer, wherein the data line is arranged on the substrate base plate; wherein,
the pixel electrode layer is composed of a plurality of mutually independent pixel electrodes;
the orthographic projection of the data line on the substrate covers the orthographic projection of a gap between two adjacent columns of the pixel electrodes on the substrate, and the width of the data line is larger than that of the gap between two adjacent columns of the pixel electrodes.
2. The array substrate of claim 1, wherein an orthographic projection part of the data line on the substrate covers orthographic projections of two adjacent columns of the pixel electrodes on the substrate.
3. The array substrate of claim 2, wherein overlapping areas of orthographic projections of the data lines on the substrate and orthographic projections of two adjacent columns of the pixel electrodes on the substrate have the same width.
4. The array substrate of claim 1, further comprising: and the color resistance layer is arranged between the layer where the data line is located and the pixel electrode layer.
5. The array substrate of claim 4, further comprising: and the flat layer is arranged between the color resistance layer and the pixel electrode layer.
6. The array substrate of claim 1, further comprising: the grid line is arranged between the substrate and the layer where the data line is located, and the transverse public electrode lines and the longitudinal public electrode lines are arranged on the same layer with the grid line.
7. The array substrate of claim 6, wherein each of the vertical common electrode lines corresponds to each of the columns of the pixel electrodes one to one;
the orthographic projection of each longitudinal common electrode line on the substrate base plate is located at the center of the orthographic projection of each column of pixel electrodes on the substrate base plate.
8. A liquid crystal display panel, comprising: the array substrate of any one of claims 1-7, and an opposing substrate disposed opposite the array substrate.
9. The liquid crystal display panel according to claim 8, further comprising: the black matrix is arranged on one side, facing the array substrate, of the opposite substrate; or,
and the black matrix is arranged on one side of the array substrate, which faces the opposite substrate, and is positioned in a gap between each color resistor in the color resistor layer.
10. A display device, comprising: a liquid crystal display panel according to claim 8 or 9.
11. A method for fabricating the array substrate according to any one of claims 1 to 7, comprising:
providing a substrate base plate;
forming a data line on the substrate;
forming a pixel electrode layer consisting of a plurality of mutually independent pixel electrodes on the layer where the data line is positioned; wherein,
the orthographic projection of the data line on the substrate covers the orthographic projection of a gap between two adjacent columns of the pixel electrodes on the substrate, and the width of the data line is larger than that of the gap between two adjacent columns of the pixel electrodes.
12. The method of claim 11, wherein before forming a pixel electrode layer comprising a plurality of independent pixel electrodes on the layer on which the data line is disposed, the method further comprises:
and forming a color resistance layer on the layer where the data line is located.
13. The method of claim 12, wherein before forming the pixel electrode layer comprising a plurality of independent pixel electrodes on the data line layer, and after forming the color resist layer on the data line layer, the method further comprises: and forming a flat layer on the color resistance layer.
14. The method of manufacturing of claim 11, further comprising, before forming a data line on the substrate base plate:
simultaneously forming a grid line, a plurality of transverse common electrode lines and a plurality of longitudinal common electrode lines on the substrate base plate;
each longitudinal public electrode wire corresponds to each row of pixel electrodes one to one;
the orthographic projection of each longitudinal common electrode line on the substrate base plate is located at the center of the orthographic projection of each column of pixel electrodes on the substrate base plate.
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| CN201710309241.8A CN106940504A (en) | 2017-05-04 | 2017-05-04 | A kind of array base palte, its preparation method and liquid crystal display panel, display device |
| PCT/CN2018/076657 WO2018201776A1 (en) | 2017-05-04 | 2018-02-13 | Array substrate and manufacturing method thereof, liquid crystal display panel and display device |
| US16/328,719 US20190196288A1 (en) | 2017-05-04 | 2018-02-13 | Array substrate and method of manufacturing the same, liquid crystal display panel and display device |
| US16/892,918 US11073734B2 (en) | 2017-05-04 | 2020-06-04 | Array substrate and method of manufacturing the same, display panel and display device |
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| Country | Link |
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| CN108873517A (en) * | 2018-06-25 | 2018-11-23 | 厦门天马微电子有限公司 | A kind of array substrate, display panel and display device |
| CN108873517B (en) * | 2018-06-25 | 2023-10-20 | 厦门天马微电子有限公司 | Array substrate, display panel and display device |
| CN110827701A (en) * | 2019-03-08 | 2020-02-21 | 友达光电股份有限公司 | Display device |
| CN110070801A (en) * | 2019-04-30 | 2019-07-30 | 武汉天马微电子有限公司 | Display panel and display device |
| WO2021012214A1 (en) * | 2019-07-24 | 2021-01-28 | 京东方科技集团股份有限公司 | Display substrate and display panel |
| CN112639598A (en) * | 2019-07-24 | 2021-04-09 | 京东方科技集团股份有限公司 | Display substrate and display panel |
| WO2022052697A1 (en) * | 2020-09-11 | 2022-03-17 | 京东方科技集团股份有限公司 | Display panel and display apparatus |
| CN113299859A (en) * | 2021-05-24 | 2021-08-24 | 合肥维信诺科技有限公司 | Display panel, display panel preparation method and display device |
| CN113299859B (en) * | 2021-05-24 | 2022-08-26 | 合肥维信诺科技有限公司 | Display panel, display panel preparation method and display device |
Also Published As
| Publication number | Publication date |
|---|---|
| US20190196288A1 (en) | 2019-06-27 |
| WO2018201776A1 (en) | 2018-11-08 |
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