CN105404435A - SNW conducting laminated structure and capacitive touch panel - Google Patents
SNW conducting laminated structure and capacitive touch panel Download PDFInfo
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- CN105404435A CN105404435A CN201410260434.5A CN201410260434A CN105404435A CN 105404435 A CN105404435 A CN 105404435A CN 201410260434 A CN201410260434 A CN 201410260434A CN 105404435 A CN105404435 A CN 105404435A
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Abstract
The invention relates to an SNW (Silver Nano Wires) conducting laminated structure, which comprises a substrate, an SNW conducting electrode layer and a leveling layer, wherein the SNW conducting electrode layer is arranged on the substrate; and the leveling layer is arranged on the SNW conducting electrode layer and is used for improving the flatness degree of the SNW conducting electrode layer. When SNW are used as the conducting material, an SNW tilting phenomenon exists; and by providing the leveling layer and performing certain process processing, the lap joint among the SNW becomes good, and the square resistance is reduced, so that the conductivity is effectively ensured. The invention also provides a capacitive touch panel using the SNW conducting laminated structure.
Description
[technical field]
The present invention relates to a kind of conductive laminate structure, particularly a kind of nano-silver thread conductive laminate structure and adopt the capacitance type touch-control panel of this nano-silver thread conductive laminate structure.
[background technology]
With contact panel in recent years in the rapid emergence of communications industry, flourish particularly in mobile communication industry, contact panel becomes the first-selected product of imaging display apparatus now at one stroke.Contact panel mainly electric resistance touch-control panel and the capacitance type touch-control panel that utilization rate is the highest, but user is for controllability, the consideration of ease for use and appearance, and capacitance type touch-control panel mostly can be selected as its best preferred unit.
In the capacitance type touch-control panel of traditional intelligence mobile phone, the material of conductive electrode is generally tin indium oxide (referred to as ITO).The transmittance of ITO is very high, and electric conductivity is better.But along with the progressively increase of contact panel size, when being particularly applied to the panel of more than 15 cun, the defect of ITO is more and more outstanding, wherein the most obvious defect is exactly that the surface resistance of ITO is excessive, expensive, the electric conductivity that large touch panel is good and enough sensitivity cannot be ensured, also cannot be applicable to the development trend of the continuous low priceization of electronic product.
In addition, in manufacture method, ITO originally needs vacuum chamber, higher depositing temperature and/or high annealing temperature to obtain high conductance, causes the integral manufacturing cost of ITO very expensive.And, ito thin film is very fragile, even if bending be also very easy to destroyed what running into less physical stress, under the tide of the emerging produce market therefore emerged gradually at wearable device, ITO material has been unable to cope with the demand in market as conductive electrode and has been eliminated gradually.
Just because of this, industrial community is being devoted to the equivalent material developing ITO always, to be developed gradually at present and equivalent material apply comprises nano-silver thread (SilverNanoWires, abbreviation SNW), metal grill (MetalMesh), carbon nano-tube, Organic Conductive Films and Graphene etc.
Wherein, SNW is the one that many ITO equivalent material are the most ripe at present.Nano-silver thread has the excellent electric conductivity of silver, simultaneously due to the size effect of its Nano grade, makes it have excellent light transmission and flexible resistance, therefore can be used as and preferably substitute the material of ITO as conductive electrode.
When using the material of SNW as conductive electrode, inevitably also there will be some problems, such as nano-silver thread is coated on after above base material, have no idea to tile uniformly and reasonable overlap joint, there is the phenomenon be upturned in nano-silver thread, make to lap one another between nano-silver thread bad, and larger impact is caused on conductance.And conductance weighs an important indicator of contact panel performance, therefore overcome the bad problem of conductance and become problem demanding prompt solution.
[summary of the invention]
For overcoming in nano-silver thread conductive laminate structure the problem of the harmful effect conductance that laps one another between nano-silver thread, the invention provides and a kind ofly there is the nano-silver thread conductive laminate structure of good electrical conductivity and adopt the capacitance type touch-control panel of this nano-silver thread conductive laminate structure.
The scheme that the present invention solves the problems of the technologies described above is to provide a kind of nano-silver thread conductive laminate structure.This nano-silver thread conductive laminate structure comprises: a base material, one nano-silver thread conductive electrode layer, is placed in above base material, and a levelling blanket, this levelling blanket is arranged at described nano-silver thread conductive electrode layer and differs from described base material side, for increasing the flatness of nano-silver thread conductive electrode layer.
Preferably, the thickness of described levelling blanket is 10nm-300nm.
Preferably, the thickness of described nano-silver thread conductive electrode layer is 10nm-200nm.
Preferably, the sheet resistance of described nano-silver thread conductive laminate structure is less than 100ohm/sq.
Preferably, described nano-silver thread conductive electrode layer comprises nano-silver thread and matrix, and nano-silver thread overlaps formation conductive network mutually, and wherein said nano-silver thread embeds in matrix at least partly.
Preferably, described nano-silver thread is contained in levelling blanket at least partly.
Preferably, described levelling blanket and matrix realize mutual embedding in a thickness direction.
Preferably, the material of described levelling blanket is any one or its combination in any of high molecular polymer, resin, transparent optical cement, oxide, transparent ink, class photoresistance.
Preferably, described levelling blanket is one deck blooming, and the refractive index of this blooming is 1.1-1.6.
Preferably, described levelling blanket comprises at least two-layer blooming, be formed by stacking by the mode of alternately superposition by low-refraction blooming, high index of refraction blooming, wherein the refractive index of low-refraction blooming is 1.1-1.6, and the refractive index of high index of refraction blooming is 1.8-2.7.
The another technical scheme that the present invention solves the problems of the technologies described above to be provided is: provide a kind of capacitance type touch-control panel, comprise a cover plate, one base material, one glue-line, one touch-control circuit controller and nano-silver thread conductive laminate structure, wherein, described glue-line connects any surface of cover plate and described nano-silver thread conductive laminate structure, described nano-silver thread conductive laminate structure is electrically connected at described touch-control circuit controller, realizes touch-control.
Preferably, described cover plate be polaroid, glass, tempered glass, flexible parent metal any one.
Preferably, described capacitance type touch-control panel comprises any one or its combination in any of an adhesion promoting layer, an optical match layer, a quarter-wave retardation plate further, described adhesion promoting layer is arranged between base material and nano-silver thread conductive electrode layer, described optical match layer is positioned at optional position below cover plate, and described quarter-wave retardation plate is between cover plate and nano-silver thread conductive electrode layer.
Compared with prior art, nano-silver thread conductive laminate structure of the present invention and adopt the capacitance type touch-control panel of this nano-silver thread conductive laminate structure adopt SNW substitute ITO as conductive material, electric conductivity and reaction sensitivity are improved, especially in particularly evident to the lifting of sensitivity in the middle of large-sized contact panel.And adopt nano-silver thread as after conductive electrode material, unavoidably there will be some problems, as nano-silver thread is upturned nano-silver thread conductive laminate body structure surface flatness had an impact, intermolecular force is only relied on to realize overlap joint between nano-silver thread, have overlap joint bad thus affect the problem of conductance, by providing levelling blanket and carrying out certain PROCESS FOR TREATMENT, make the overlap joint between nano-silver thread become line from original some overlap joint to overlap and/or face overlap joint, make overlap joint area increase thus conductance effectively ensured, and the surface smoothness of nano-silver thread conductive laminate structure is greatly improved.Secondly capacitance type touch-control panel preparation method of the present invention is simple, efficiency is high, cost is low.Certain technology difficulty is there is in conventional nano silver line contact panel when being coated with and forming homogeneous film, nano-silver thread of the present invention is coated with in several ways, realize inlaying of nano-silver thread, technique is more simple, and the photoelectric properties of capacitance type touch-control panel of the present invention are good, light transmission rate is more than 90%, and sheet resistance is less than 100ohm/sq.
[accompanying drawing explanation]
Fig. 1 is the cross section structure schematic diagram that nano-silver thread conductive electrode layer is distributed on base material.
Fig. 2 is the floor map that nano-silver thread conductive electrode layer is distributed on base material.
Fig. 3 is the cutting structural representation of first embodiment of the invention nano-silver thread conductive laminate structure.
Fig. 4 is the levelling blanket effect schematic diagram of the conductive laminate of nano-silver thread shown in Fig. 3 structure.
Fig. 5 is the cutting structural representation of second embodiment of the invention nano-silver thread conductive laminate structure.
Fig. 6 is the cutting structural representation of third embodiment of the invention nano-silver thread conductive laminate structure.
Fig. 7 is the cutting structural representation of fourth embodiment of the invention capacitance type touch-control panel.
Fig. 8 is the cutting structural representation of fifth embodiment of the invention capacitance type touch-control panel.
Fig. 9 is the cutting structural representation of sixth embodiment of the invention capacitance type touch-control panel.
Figure 10 is the cutting structural representation of the present invention the 7th condenser type embodiment contact panel.
Figure 11 is the cutting structural representation of eighth embodiment of the invention capacitance type touch-control panel.
Figure 12 is the cutting structural representation of ninth embodiment of the invention capacitance type touch-control panel.
Figure 13 is the touch-control display module cutting plane detonation configuration figure that tenth embodiment of the invention adopts capacitance type touch-control panel to make.
[embodiment]
For realizing making object of the present invention, technical scheme and advantage are clearly understood, below in conjunction with accompanying drawing and embodiment, are further elaborated to the present invention.Should be appreciated that specific embodiment described herein only in order to explain the present invention, be not intended to limit the present invention.
Silver is when nanoscale, and nano-silver thread has good transmittance and splendid electric conductivity, can be good at the conductive electrode applying to contact panel.
Refer to Fig. 1 and Fig. 2, it is the schematic diagram that nano-silver thread conductive electrode layer 1005 is distributed on base material 1007, it nano-silver thread conductive electrode layer 1005 comprising base material 1007 and be produced on base material 1007, the many nano-silver threads 1001 that nano-silver thread conductive electrode layer 1005 comprises matrix 1003 and is embedded in matrix 1003, nano-silver thread 1001 is arranged wherein and overlap joint forms conductive network mutually.The line length of nano-silver thread 1001 is 10um-300 μm, be preferably 20um-100 μm, its length optimum is 20um-50 μm, the wire diameter of nano-silver thread 1001 is less than 500nm, or is less than 200nm, 100nm, preferably be less than 50nm, and its length breadth ratio ratio of wire diameter (line length with) is greater than 10, is preferably greater than 50, more preferably greater than 100.Base material 1007 is generally transparent insulation material.
Nano-silver thread 1001 scatters or embeds in matrix 1003, forms conductive network.Nano-silver thread 1001 relies on matrix 1003 to form nano-silver thread conductive electrode layer 1005, and matrix 1003 can protect nano-silver thread 1001 not to be subject to the impact of the external environments such as burn into wearing and tearing.
Matrix 1003 refers to that nano-silver thread solution is being arranged on base material 1007 through methods such as coatings, after heating, drying makes volatile material volatilize, stays the non-nano silver line material on base material 1007.Nano-silver thread solution refers to, nano-silver thread 1001 is dispersed in the aaerosol solution formed in specific solvent, and this solvent can be water, aqueous solution, solion, saline solns, supercritical fluid, oil or its potpourri etc.Also can other adjuvant be contained, as spreading agent, surfactant, crosslinking chemical, stabilizing agent, wetting agent or thickening agent, but not as limit in this solvent.
In addition, by selecting suitable matrix 1003 material to adjust the optical characteristics of nano-silver thread conductive electrode layer 1005, particularly haze issues is solved.Such as, matrix 1003 can be adjusted to refractive index, component and certain thickness with expectation, can effectively reduce reflection loss, glare effects, mist degree.
The thickness of nano-silver thread conductive electrode layer 1005 is about 10nm-5 μm, and be preferably 20nm-1 μm, more excellent is 10nm-200nm.In certain embodiments, the refractive index of nano-silver thread conductive electrode layer 1005 is 1.3-2.5, and more excellent is 1.35-1.8.
But, because part nano-silver thread 1001 is not all contained in matrix 1003, cause part nano-silver thread 1001 outstanding tilting from matrix 1003.And overlap joint area between nano-silver thread 1001 is little, overlap joint may be caused bad, affect the conductance of its conductive network.
Refer to Fig. 3, first embodiment of the invention nano-silver thread conductive laminate structure 10 comprises a base material 1007, one nano-silver thread conductive electrode layer 1005, and a levelling blanket 104, wherein, base material 1007 provides support for nano-silver thread conductive laminate structure 10, nano-silver thread conductive electrode layer 1005 is arranged on base material 1007, levelling blanket 104 is arranged at above nano-silver thread conductive electrode layer 1005, described nano-silver thread conductive electrode layer 1005 comprises nano-silver thread 1001 and matrix 1003, nano-silver thread 1001 mutually overlap joint forms conductive network, wherein said nano-silver thread 1001 embeds in matrix 1003 at least partly.
Described base material 1007 can be rigid substrate, as glass, tempered glass, sapphire glass, polaroid, optical filter, quarter-wave retardation plate, preferably there is flexual flexible parent metal, described flexible parent metal is acryl, polymethylmethacrylate (PMMA), acrylic nitrile-butadiene-styrene (ABS), polybutylene terephthalate (PBT), polycarbonate (PC) PFPE (PFPE), polyetheretherketone (PEEK), polyetherimide (PEI), polyethersulfone (PES), tygon (PE), polyethylene terephthalate (PET), polyimide amylene (PMP), polypropylene (PP), polystyrene (PS), polyurethane (PU) Polyvinylchloride (PVC), polyvinyl fluoride (PVF), the combination in any of any one or they.
The thickness of described levelling blanket 104 is 10nm-300nm.
The material of described levelling blanket 104 is high molecular polymer, insulating material, resin, transparent optical cement, oxide, transparent ink, class photoresistance etc.Include but not limited to: polyacetylene, polyaniline, polyarylene, polythiophene, Graphene, pentacene, poly-(phenylenevinylene) (PPE), poly-(phenylene ethylene) (PPV), poly-(3, the fen of 4-ethylidene dioxy) (PEDOT), poly-(styrene sulfonic acid) (PSS), poly-(3-hexyl thiophene), (P3HT), poly-(3-octyl thiophene) (P3OT), poly-(aryl ether sulfone), poly-(C-61-butyric acid-methyl esters) (PCBM), poly-[2-methoxyl-5-(2-ethyl-own oxygen base)-1, 4-phenylene ethylene] (MEH-PPV), silicon nitride, silicon dioxide.
Described levelling blanket 104 is for increasing the flatness of nano-silver thread conductive electrode layer 1005, originally the nano-silver thread 1001 be upturned fallen after rise and overlaps with other nano-silver thread 1001 phase, finally making the conductance of nano-silver thread conductive electrode layer 1005 get a promotion.And the part that all nano-silver threads 1001 tilts outstanding matrix 1003 is all contained in levelling blanket 104, solves nano-silver thread 1001 and to be upturned the impact of effects on surface flatness, make nano-silver thread conductive laminate structure 10 easily and other touch control component fit.
The thickness of described nano-silver thread conductive electrode layer 1005 is 10nm-200nm, sheet resistance is less than 100ohm/sq, because the conductance of nano-silver thread conductive electrode layer 1005 is relevant with its thickness, thickness is less, sheet resistance is larger, conductance is lower, on nano-silver thread conductive electrode layer 1005 surface, one deck levelling blanket 104 is set, this levelling blanket 104 can when ensureing that nano-silver thread conductive electrode layer 1005 thickness is constant, for strengthening the overlap joint between nano-silver thread 1001, thus reduction sheet resistance, improve conductance.
Refer to Fig. 4, nano-silver thread conductive electrode layer 1005 is coated on after on base material 1007, nano-silver thread 1001 can not tile and reasonable overlap joint equably, make flatness poor, simultaneously bad owing to lapping one another between nano-silver thread 1001, there will be the phenomenon that nano-silver thread 1001 is upturned.By applying levelling blanket 104 above nano-silver thread conductive electrode layer 1005, and after certain PROCESS FOR TREATMENT, the overlap joint area between nano-silver thread 1001 can be made to increase, overlap joint between nano-silver thread 1001 becomes linear contact lay and/or face contact from point cantact, overlap joint area increases 10%-50%, thus effectively improve the conductance of nano-silver thread 1001 and reach good flatness, its conductance at least improves 10%, from sheet resistance, after adding levelling blanket 104, the sheet resistance of nano-silver thread conductive electrode layer 1005 is reduced to and is less than 100ohm/sq.
Present invention also offers the manufacture method of the first embodiment nano-silver thread conductive laminate structure 10, the method comprises the following steps:
S11 a: base material 1007 is provided;
S12: form nano-silver thread conductive electrode layer 1005 on base material 1007, and regulate uniform temperature oven dry to make it solidification;
S13: form levelling blanket 104;
S14: certain pressure is applied to levelling blanket 104;
In step s 11, base material 1007 is transparent insulation material, for whole nano-silver thread conductive laminate structure 10 provides support.
In step s 12, nano-silver thread conductive electrode layer 1005 applies with the form of nano-silver thread solution.The method of described coating comprises: ink-jet, broadcasts sowing, intaglio printing, letterpress, flexo, nano impression, serigraphy, Meyer bar or scraper for coating, and rotary coating, pin are painted (stylusplotting), and slit type is coated with, flow coat.During concrete enforcement, for slit type coating, first configure nano-silver thread solution, after nano-silver thread solution is coated on base material 1007, obtain wet nano-silver thread conductive electrode layer 1005 by adjusting the distance of the width of crack, nozzle and roller, transfer rate and pump charging.
After coated with nano silver line conductive electrode layer 1005, adjust the temperature to 140 DEG C, after nano-silver thread conductive electrode layer 1005 solidifies completely, apply levelling blanket 104 again, i.e. step S13, levelling blanket 104 can adopt the form of fluid to be coated in above nano-silver thread conductive electrode layer 1005.
Described fluid can be: water, ion or comprise the solution of ion, organic solvent, inorganic solvent or their combination in any.Include but not limited to: water, acetone, ethyl acetate, ethanol, butyl acetate, phenolics, alkyd resin, NaOH, isopropyl ether (i-propyl ether), methyl ethyl ketone (or MEK), normal butyl alcohol, octane, pentane, pentanone, sherwood oil, phenol, propyl alcohol.Surfactant, crosslinking chemical, spreading agent, stabilizing agent or bonding agent also can comprise in a fluid.
Described coating fluid is sputter, electrostatic spraying, reverse roll coating, groove type coating, Meyer rod (meyerrod) coating, spin coating, slit type coating, or their combination in any.
In step S14, applying certain pressure to levelling blanket 104 is post-processing approach, after process, makes thickness reduce 10%-60% compared with originally.
The method of process is roller roll extrusion: be placed on a platform by nano-silver thread conductive laminate structure 10 obtained above, roller rolls over, here can be adjusted the gross thickness of described nano-silver thread conductive electrode layer 1005 and levelling blanket 104 by the spacing of adjusting roller and platform and pressure, this method is not only applicable to flexible parent metal but also be applicable to rigid substrate; Roller roll extrusion also can be roll-to-roll in another embodiment, here can by regulating the gross thickness of nano-silver thread conductive electrode layer 1005 and levelling blanket 104 described in the Distance geometry pressure adjusting between cylinder and roller, and this roll extrusion is generally only suitable for flexible parent metal.
In the process of process, the temperature range of roller or platform is 50 DEG C-150 DEG C, the temperature different according to the material different choice of levelling blanket 104 or base material 1007 and different calandrias, such as, base material 1007 is PET, and what levelling blanket 104 selected is PVB film, and the roller of close PVB film so can be selected as calandria, be 60 DEG C-65 DEG C according to the softening temperature of PVB film, regulate the roller temperature to 60 DEG C-65 DEG C near PVB film.
In another kind of deformation technique, the material of levelling blanket 104 itself is shaping by the form of solid film.Levelling blanket 104 can by being directly covered in above nano-silver thread conductive electrode layer 1005 to the form of solid film heating roll extrusion, and at this moment the material of levelling blanket 104 includes but not limited to: polyvinyl butyral (PVB), polyvinyl alcohol (PVA) (PVA), polycarbonate (PC), polyethylene terephthalate (PET), polymethyl methacrylate (PMMA), viscose paper.
Refer to Fig. 5, second embodiment of the invention nano-silver thread conductive laminate structure 20 comprises a base material 1007, one nano-silver thread conductive electrode layer 1005, and a levelling blanket 204, nano-silver thread conductive electrode layer 1005 is arranged on base material 1007, and levelling blanket 204 is arranged at above nano-silver thread conductive electrode layer 1005.Described levelling blanket 204 and nano-silver thread conductive electrode layer 1005 in a thickness direction part realize mutually embedding.Nano-silver thread 1001 is interspersed in levelling blanket 204 and nano-silver thread conductive electrode layer 1005 joint, and the part that all nano-silver threads 1001 tilt outstanding matrix 1003 is all contained in levelling blanket 204.
Technique is carried out in process, and after coated with nano silver line conductive electrode layer 1005, temperature-adjustable, to 0-80 DEG C, applies levelling blanket 204 until nano-silver thread conductive electrode layer 1005 after uncured or semi-solid preparation again.The structure formed is with to apply the structure that levelling blanket 204 formed after complete curing nano silver line conductive electrode layer 1005 different, apply levelling blanket 204 after uncured or semi-solid preparation, nano-silver thread conductive electrode layer 1005 has at least part to realize the mutual embedding with levelling blanket 204 after treatment.
Refer to Fig. 6, for the nano-silver thread conductive laminate structure 30 of third embodiment of the invention comprises a base material 1007, one nano-silver thread conductive electrode layer 1005, one adhesion promoting layer 302 and a levelling blanket 304, described adhesion promoting layer 302 is arranged on base material 1007, and nano-silver thread conductive electrode layer 1005 is set thereon, levelling blanket 304 is arranged at above nano-silver thread conductive electrode layer 1005.Described adhesion promoting layer 302 is for strengthening the adhesion between nano-silver thread conductive electrode layer 1005 and base material 1007.
Refer to Fig. 7, fourth embodiment of the invention capacitance type touch-control panel 40 comprises a cover plate 409, one glue-line 408, one nano-silver thread conductive laminate structure 403 and a touch-control circuit controller (not shown), described nano-silver thread conductive laminate structure 403 comprises base material 1007, nano-silver thread conductive electrode layer 1005 and levelling blanket 4034.Described glue-line 408 connects cover plate 409 upper and lower surface either side and levelling blanket 4034 differs from nano-silver thread conductive electrode layer 1005 side, and described nano-silver thread conductive laminate structure 403 is electrically connected at described touch-control circuit controller, realizes touch-control.Wherein, described cover plate be polaroid, glass, tempered glass, flexible parent metal any one.
Refer to Fig. 8, fifth embodiment of the invention capacitance type touch-control panel 50 is substantially identical with the 4th embodiment, comprise a cover plate 509, one glue-line 508, one nano-silver thread conductive laminate structure 503 and a touch-control circuit controller (not shown), described nano-silver thread conductive laminate structure 503 comprises base material 1007, nano-silver thread conductive electrode layer 1005 and levelling blanket 5034.Difference is that described glue-line 508 connects cover plate 509 upper and lower surface either side and base material 1007 differs from nano-silver thread conductive electrode layer 1005 side.
Refer to Fig. 9, sixth embodiment of the invention capacitance type touch-control panel 60 is substantially identical with the 4th embodiment, comprise a cover plate 609, one glue-line 608, one nano-silver thread conductive laminate structure 603 and a touch-control circuit controller (not shown), difference is nano-silver thread conductive laminate similar described in described nano-silver thread conductive laminate structure 603 and the 3rd embodiment, comprises base material 1007, nano-silver thread conductive electrode layer 1005, adhesion promoting layer 6032 and levelling blanket 6034.Described glue-line 608 connects cover plate 609 upper and lower surface either side and differs from nano-silver thread conductive electrode layer 1005 side with levelling blanket 4034.
Refer to Figure 10, seventh embodiment of the invention capacitance type touch-control panel 70 is substantially identical with the 4th embodiment, comprise a cover plate 709, one glue-line 708, one nano-silver thread conductive laminate structure 703 and a touch-control circuit controller (not shown), described nano-silver thread conductive laminate structure 703 comprises base material 1007, nano-silver thread conductive electrode layer 1005 and levelling blanket 7034.Difference is that described levelling blanket 7034 is optical match layer simultaneously, has the effect of optical match layer, and it is total to two-layer blooming is formed by stacking by low-refraction blooming 97, high index of refraction blooming 99.
Described low-refraction is that refractive index is less than 1.6, and be preferably 1.1 ~ 1.6, preferred refractive index is 1.1,1.25,1.32,1.38,1.46,1.50,1.52.
Described high index of refraction is that refractive index is greater than 1.8, and be preferably 1.8 ~ 2.7, preferred refractive index is 1.8,1.85,2.0,2.2,2.4,2.7.
The gross thickness of described blooming is 1/4 wavelength odd-multiple.
In other distressed structure, described levelling blanket 7034 also can be that independent one deck low-refraction blooming 97 is formed, and to be the odd-multiple of 1/4 wavelength also can be its thickness by multilayer low-refraction blooming 97, high index of refraction blooming 99 to superpose by the mode of alternately superposition and formed.
In other distressed structure, optical match layer also can add in the middle of contact panel 70 as a functional layer separately, and its position can be optional position below cover plate 709.
Refer to Figure 11; eighth embodiment of the invention capacitance type touch-control panel 80 comprises a cover plate 809; one stickability protective seam 806; one nano-silver thread conductive laminate structure 803 and a touch-control circuit controller (not shown); nano-silver thread conductive laminate similar described in described nano-silver thread conductive laminate structure 803 and the first embodiment, comprises base material 1007, nano-silver thread conductive electrode layer 1005 and levelling blanket 8034.Described cover plate 809 bonds nano-silver thread stepped construction 803 by stickability protective seam 806, and described nano-silver thread conductive laminate structure 803 is electrically connected at touch-control circuit controller.The material of described stickability protective seam 806 comprises transparent sticky material and transparent dielectric material.Described stickability protective seam 806, for the protection of nano-silver thread conductive electrode layer 1005, prevents nano-silver thread 1001 surface oxidized and electric conductivity reduction.
The sticky material of described stickability protective seam 806 is photonasty sticker and/or thermosetting sticker.
Described dielectric material is selected from and levelling blanket 8034 or the material comparatively compatible with cover plate 809, base material 1007, can promote stickability protective seam 806 and levelling blanket 8034 or the bond strength with cover plate 809, base material 1007 to a certain extent.
Need to arrange layer of transparent optical cement below general protective seam, described stickability protective seam 806 has viscosity, without the need to arranging transparent optical cement, is more conducive to the lightening of contact panel.
Refer to Figure 12, ninth embodiment of the invention capacitance type touch-control panel 90 comprises a cover plate 909, one glue-line 908, one quarter-wave retardation plate 907, one nano-silver thread conductive laminate structure 903 and a touch-control circuit controller (not shown), nano-silver thread conductive laminate similar described in described nano-silver thread conductive laminate structure 903 and the first embodiment, comprises base material 1007, nano-silver thread conductive electrode layer 1005 and levelling blanket 9034.Described quarter-wave retardation plate 907 between glue-line 908 and levelling blanket 9034, for reducing mist degree.
By arranging quarter-wave retardation plate 907, when light is by quarter-wave retardation plate 907, produce reflection, because optical path difference postpones, incident light and reflected light are offset, thus can reduce reflected light, and the mist degree of nano-silver thread 1001 is reduced.And by arranging one deck quarter-wave retardation plate 907 above nano-silver thread conductive electrode layer 1005, the line polarisation of LCD or OLED can be changed into rotatory polarization simultaneously, thus under polarized sunglasses, watch contact panel there will not be frosting phenomenon.
When capacitance type touch-control panel 90 also has other functional layers, as above-mentioned adhesion promoting layer, optical match layer, during stickability protective seam, need guarantee quarter-wave retardation plate 907 relative to nano-silver thread conductive electrode layer 1005 and optical match layer near observer side.
Need to propose, above-mentioned adhesion promoting layer, optical match layer, quarter-wave retardation plate can optional interpolations, optional two interpolations, also can three persons' interpolations.
Should be appreciated that, the 5th embodiment mesoglea is bonded in the distressed structure that base material in cover plate upper and lower surface any surface and nano-silver thread conductive laminate structure differs from nano-silver thread conductive electrode layer side and is equally applicable to the 6th embodiment to the 9th embodiment and all distressed structures thereof.
Refer to Figure 13, capacitance type touch-control panel 40 is used as touch sensing element and is made into touch-control display module 200 by tenth embodiment of the invention in multiple device.Such as, when being used in LCD display, be disposed with polaroid 2001 in the below of contact panel, upper substrate 2003, liquid crystal layer 2005, infrabasal plate 2007, lower polaroid 2009, now goes up polaroid 2001 and serves as base material, and nano-silver thread conductive electrode layer 1005 straight forming is on it.Upper outside except being used in LCD display herein, can also be used on plasma display, on color flat panel display, on optoelectronic device and similar products.In above-mentioned electronic equipment, described contact panel fits in the upper surface of LCD display, for the I/O equipment of one of them of electronic equipment man-machine interaction.
Compared with prior art, nano-silver thread conductive laminate structure of the present invention and adopt the capacitance type touch-control panel of this nano-silver thread conductive laminate structure adopt SNW substitute ITO as conductive material, electric conductivity and reaction sensitivity are improved, especially in particularly evident to the lifting of sensitivity in the middle of large-sized contact panel.And adopt nano-silver thread as after conductive electrode material, unavoidably there will be some problems, as nano-silver thread is upturned nano-silver thread conductive laminate body structure surface flatness had an impact, intermolecular force is only relied on to realize overlap joint between nano-silver thread, have overlap joint bad thus affect the problem of conductance, by providing levelling blanket and carrying out certain PROCESS FOR TREATMENT, make the overlap joint between nano-silver thread become line from original some overlap joint to overlap and/or face overlap joint, make overlap joint area increase thus conductance effectively ensured, and the surface smoothness of nano-silver thread conductive laminate structure is greatly improved.Secondly capacitance type touch-control panel preparation method of the present invention is simple, efficiency is high, cost is low.Certain technology difficulty is there is in conventional nano silver line contact panel when being coated with and forming homogeneous film, nano-silver thread of the present invention is coated with in several ways, realize inlaying of nano-silver thread, technique is more simple, and the photoelectric properties of capacitance type touch-control panel of the present invention are good, light transmission rate is more than 90%, and sheet resistance is less than 100ohm/sq.
The foregoing is only preferred embodiment of the present invention, not in order to limit the present invention, all any amendments done within principle of the present invention, equivalent replacement and improvement etc. all should comprise within protection scope of the present invention.
Claims (13)
1. a nano-silver thread conductive laminate structure, is characterized in that, comprising: a base material,
One nano-silver thread conductive electrode layer, is arranged at described substrate surface,
One levelling blanket, is arranged at described nano-silver thread conductive electrode layer and differs from described base material side, for increasing the flatness of nano-silver thread conductive electrode layer.
2. nano-silver thread conductive laminate structure as claimed in claim 1, is characterized in that: the thickness of this levelling blanket is 10nm-300nm.
3. nano-silver thread conductive laminate structure as claimed in claim 1, is characterized in that: the thickness of described nano-silver thread conductive electrode layer is 10nm-200nm.
4. nano-silver thread conductive laminate structure as claimed in claim 1, is characterized in that: the sheet resistance of described nano-silver thread conductive electrode layer is less than 100ohm/sq.
5. nano-silver thread conductive laminate structure as claimed in claim 1, is characterized in that: described nano-silver thread conductive electrode layer comprises nano-silver thread and matrix, and nano-silver thread overlaps formation conductive network mutually, and wherein said nano-silver thread embeds in matrix at least partly.
6. nano-silver thread conductive laminate structure as claimed in claim 5, is characterized in that: described nano-silver thread is contained in levelling blanket at least partly.
7. nano-silver thread conductive laminate structure as claimed in claim 1, is characterized in that: described levelling blanket and nano-silver thread conductive electrode layer realize mutual embedding in a thickness direction.
8. nano-silver thread conductive laminate structure as claimed in claim 1, is characterized in that: the material of described levelling blanket is any one or its combination in any of high molecular polymer, resin, transparent optical cement, oxide, transparent ink, class photoresistance.
9. nano-silver thread conductive laminate structure as claimed in claim 1, it is characterized in that: described levelling blanket is one deck blooming, the refractive index of this blooming is 1.1-1.6.
10. nano-silver thread conductive laminate structure as claimed in claim 1, it is characterized in that: described levelling blanket comprises at least two-layer blooming, be formed by stacking by the mode of alternately superposition by low-refraction blooming, high index of refraction blooming, wherein the refractive index of low-refraction blooming is 1.1-1.6, and the refractive index of high index of refraction blooming is 1.8-2.7.
11. 1 kinds of capacitance type touch-control panels, is characterized in that: comprising: a cover plate,
One glue-line,
One touch-control circuit controller, and
Nano-silver thread conductive laminate structure as described in claim 1-10,
Wherein, described glue-line connects any surface of cover plate and described nano-silver thread conductive laminate structure, and described nano-silver thread conductive laminate structure is electrically connected at described touch-control circuit controller, realizes touch-control.
12. capacitance type touch-control panels as claimed in claim 11, is characterized in that: described cover plate be polaroid, glass, tempered glass, flexible parent metal any one.
13. capacitance type touch-control panels as claimed in claim 11, it is characterized in that: any one or its combination in any comprising an adhesion promoting layer, an optical match layer, a quarter-wave retardation plate further, described adhesion promoting layer is arranged between base material and nano-silver thread conductive electrode layer, described optical match layer is positioned at optional position below cover plate, and described quarter-wave retardation plate is between nano-silver thread conductive electrode layer and cover plate.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410260434.5A CN105404435A (en) | 2014-06-12 | 2014-06-12 | SNW conducting laminated structure and capacitive touch panel |
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| CN201410260434.5A CN105404435A (en) | 2014-06-12 | 2014-06-12 | SNW conducting laminated structure and capacitive touch panel |
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| CN105404435A true CN105404435A (en) | 2016-03-16 |
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| CN201410260434.5A Pending CN105404435A (en) | 2014-06-12 | 2014-06-12 | SNW conducting laminated structure and capacitive touch panel |
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Application publication date: 20160316 |