Gerfin et al., 1994 - Google Patents
Growth of iridium films by metal organic chemical vapour depositionGerfin et al., 1994
- Document ID
- 2378511906698269488
- Author
- Gerfin T
- Hälg W
- Atamny F
- Dahmen K
- Publication year
- Publication venue
- Thin Solid Films
External Links
Snippet
Thin films of metallic iridium were grown by thermal metal organic chemical vapour deposition in a horizontal hot-wall reactor. The new solid compound Ir (2, 2, 6, 6-tetramethyl- 3, 5-heptadione)(1, 5-cyclooctadiene) was used as the iridium source. Evaporation rate …
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium data:image/svg+xml;base64,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 data:image/svg+xml;base64,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 [Ir] 0 title abstract description 20
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/16—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal carbonyl compounds
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F17/00—Metallocenes
- C07F17/02—Metallocenes of metals of Groups 8, 9 or 10 of the Periodic System
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/02—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen
- C01B3/22—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by decomposition of gaseous or liquid organic compounds
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B31/00—Carbon; Compounds thereof
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
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