Grummon et al., 2001 - Google Patents
Stress in Sputtered Films of Near‐Equiatomic TiNiX on (100) Si: Intrinsic and Extrinsic Stresses and Their Modification by Thermally Activated MechanismsGrummon et al., 2001
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- 17190886495546943765
- Author
- Grummon D
- Zhang J
- Publication year
- Publication venue
- physica status solidi (a)
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The development of intrinsic and extrinsic stresses in TiNi and TiNiHf thin films, and their relaxation during isochronal and isothermal annealing, has been studied in both crystalline and amorphous materials sputtered onto (100) silicon. The development of intrinsic …
- 230000035882 stress 0 title abstract description 201
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