Nothing Special   »   [go: up one dir, main page]

Choi et al., 2007 - Google Patents

Effect of Electron Beam‐Induced Deposition and Etching Under Bias

Choi et al., 2007

View PDF
Document ID
11707556212417387214
Author
Choi Y
Rack P
Frost B
Joy D
Publication year
Publication venue
Scanning: The Journal of Scanning Microscopies

External Links

Snippet

Electron‐beam‐induced deposition (EBID) and etching (EBIE) provides a simple way to fabricate or etch submicron or nanoscale structures of various materials in a direct‐write (ie nonlithographic) fashion. The growth rate or the etch rate are influenced by many factors …
Continue reading at onlinelibrary.wiley.com (PDF) (other versions)

Classifications

    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a micro-scale
    • H01J2237/3174—Etching microareas
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0802—Field ionization sources
    • H01J2237/0807—Gas field ion sources [GFIS]
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a micro-scale
    • H01J2237/3175—Lithography
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Similar Documents

Publication Publication Date Title
Silvis-Cividjian et al. Direct fabrication of nanowires in an electron microscope
Munroe The application of focused ion beam microscopy in the material sciences
EP2530700B1 (en) Method for preparing thin samples for TEM imaging
US8853078B2 (en) Method of depositing material
US9111720B2 (en) Method for preparing samples for imaging
US20150330877A1 (en) Method for preparing samples for imaging
US8835880B2 (en) Charged particle-beam processing using a cluster source
EP1955351B1 (en) Sample manipulator, ion sources, systems and methods of use
US8822921B2 (en) Method for preparing samples for imaging
US11377740B2 (en) Nanofabrication using a new class of electron beam induced surface processing techniques
US12059698B2 (en) Systems and methods of electron beam induced processing
Ocola et al. High-resolution direct-write patterning using focused ion beams
Choi et al. Effect of Electron Beam‐Induced Deposition and Etching Under Bias
Hernández-Saz et al. A methodology for the fabrication by FIB of needle-shape specimens around sub-surface features at the nanometre scale
Alkemade et al. Deposition, milling, and etching with a focused helium ion beam
Wilhelmi et al. Rapid prototyping of nanostructured materials with a focused ion beam
CN113403572A (en) Method and equipment for processing workpiece by charged particle beam
Hari et al. A study of the reproducibility of electron beam induced deposition for sub-20 nm lithography
Roediger et al. Focused electron beam induced etching of silicon using chlorine
Liu et al. A dynamic Monte Carlo study of the in situ growth of a substance deposited using electron-beam-induced deposition
Mote et al. Focused Ion Beam (FIB) nanofinishing for ultra-thin TEM sample preparation
WO2023036911A1 (en) Method and apparatus for determining a beam tail of a focused particle beam
Donev et al. Nanoscale Deposition and Etching of Materials Using Focused Electron Beams and Liquid Reactants
Lukasczyk Generation of pure iron nanostructures via electron-beam induced deposition in UHV
BEAM THE HISTORICAL DEVELOPMENT OF ELECTRON B AM INDUCED POSITION AND ETCHING