Anders et al., 1994 - Google Patents
Electron emission from pseudospark cathodesAnders et al., 1994
- Document ID
- 5285435492949795227
- Author
- Anders A
- Anders S
- Gundersen M
- Publication year
- Publication venue
- Journal of applied physics
External Links
Snippet
The pseudospark cathode has the remarkable property of macroscopically homogeneous electron emission at very high current density (≳ 1 kA/cm2) over a large area (some cm2). The model of electron emission presented here is based on the assumption that the …
- 210000002381 Plasma 0 abstract description 65
Classifications
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
- H01J2237/0802—Field ionization sources
- H01J2237/0807—Gas field ion sources [GFIS]
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted to the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/04—Manufacture of electrodes or electrode systems of thermionic cathodes
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J17/00—Gas-filled discharge tubes with solid cathode
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Gudmundsson et al. | Foundations of DC plasma sources | |
| Anders et al. | Electron emission from pseudospark cathodes | |
| Cuneo | The effect of electrode contamination, cleaning and conditioning on high-energy pulsed-power device performance | |
| Schoenbach et al. | Microhollow cathode discharges | |
| Lay et al. | Breakdown processes in metal halide lamps | |
| Anders et al. | Model for explosive electron emission in a pseudospark ‘‘superdense glow’’ | |
| Kazakov et al. | Broad-beam plasma-cathode electron beam source based on a cathodic arc for beam generation over a wide pulse-width range | |
| Gavrilov et al. | High-current pulse sources of broad beams of gas and metal ions for surface treatment | |
| Hawley et al. | Insulating properties of high vacuum | |
| Williams | Vacuum coating with a hollow cathode source | |
| Schaefer et al. | A review of diffuse discharge opening switches | |
| Rakhovsky | Current density per cathode spot in vacuum arcs | |
| Gundersen | Gas-phase pulsed power switches | |
| Anders | Glows, arcs, ohmic discharges: An electrode-centered review on discharge modes and the transitions between them | |
| Zouache et al. | Electrical breakdown of small gaps in vacuum | |
| Seznec et al. | Controlled electron emission and vacuum breakdown with nanosecond pulses | |
| Chernov | The powerful high-voltage glow discharge electron gun and power unit on its base | |
| Ingold | Glow discharges at DC and low frequencies | |
| Kristiansen et al. | Plasma applications | |
| Felsner et al. | Correlation of current quenching and occurrence of metal vapor in a pseudospark discharge | |
| Voiteshonok et al. | Runaway electrons beams in stationary open discharge for technological applications | |
| Hartmann et al. | Cathode-related processes in high-current density, low pressure glow discharges | |
| Miley | Voltage holding considerations for direct-collection units | |
| Zhu et al. | Study of field-induced explosive electron emission mechanisms of pseudospark superemission cathodes | |
| Baeva | Reversal of the electric field and the anode fall in DC arcs in air during contact opening |