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Uesugi et al., 2018 - Google Patents

Improvement of Channel Mobility of GaN‐MOSFETs With Thermal Treatment for Recess Surface

Uesugi et al., 2018

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Document ID
4239348357869142006
Author
Uesugi K
Shindome A
Kajiwara Y
Yonehara T
Kato D
Hikosaka T
Kuraguchi M
Nunoue S
Publication year
Publication venue
physica status solidi (a)

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In this work, a thermal treatment technique under NH3 ambient for the recess surface of GaN‐ MOSFETs is developed. Immediately following the fabrication process of the recess, the bottoms of these structures have rough surfaces and step‐terrace structures cannot be …
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    • H01L29/7787Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT with wide bandgap charge-carrier supplying layer, e.g. direct single heterostructure MODFET
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