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Ennen et al., 1985 - Google Patents

1.54‐μm electroluminescence of erbium‐doped silicon grown by molecular beam epitaxy

Ennen et al., 1985

Document ID
4122140729217368767
Author
Ennen H
Pomrenke G
Axmann A
Eisele K
Haydl W
Schneider J
Publication year
Publication venue
Applied Physics Letters

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Snippet

The feasibility of producing erbium‐doped silicon light‐emitting diodes by molecular beam epitaxy is demonstrated. The p‐n junctions are formed by growing an erbium‐doped p‐type epitaxial silicon layer on an n‐type silicon substrate. When the diodes are biased in the …
Continue reading at pubs.aip.org (other versions)

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    • H01L31/08Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
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