Abstract

We present a novel waveguide geometry for enhancing and confining light in a nanometer-wide low-index material. Light enhancement and confinement is caused by large discontinuity of the electric field at high-index-contrast interfaces. We show that by use of such a structure the field can be confined in a 50-nm-wide low-index region with a normalized intensity of $20 \mathit{\mu }{\mathrm{m}}^{-2}$. This intensity is approximately 20 times higher than what can be achieved in ${\mathrm{SiO}}_2$ with conventional rectangular waveguides.

© 2004 Optical Society of America

Experimental demonstration of guiding and confining light in nanometer-size low-refractive-index material

Qianfan Xu, Vilson R. Almeida, Roberto R. Panepucci, and Michal Lipson
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Eliminating the birefringence in silicon-on-insulator ridge waveguides by use of cladding stress

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Zoned microstructure fiber for low-dispersion waveguiding and coupling to photonic crystals

Makiko Hisatomi, Michael C. Parker, and Stuart D. Walker
Opt. Lett. 29(10) 1054-1056 (2004)