Nothing Special   »   [go: up one dir, main page]

Skip to main content

Advertisement

Log in

Defect inspection in semiconductor images using FAST-MCD method and neural network

  • ORIGINAL ARTICLE
  • Published:
The International Journal of Advanced Manufacturing Technology Aims and scope Submit manuscript

Abstract

Most defect inspection methods used in semiconductor manufacturing require design layout or golden die images. Unlike methods that require such additional information, this paper presents a method for automatic inspection of defects in semiconductor images with a single image. First, we devise a method to classify images into four types: flat, linear, patterned, and complex using a cosine similarity. For linear and patterned images, we obtain defect-free images that retain the structure. A flat image is then obtained by subtracting the defect-free image from the input image. The FAST-MCD method then estimates the parameters of the inlier distribution of the flat image and uses them to detect defects. A segmentation neural network is used to detect defects in complex images. Unlike conventional methods that only work on a specific structure, our method classifies structures and finds defects in each structure. We use 16 defective images in our experiments, where our method detects all 16 defective images, while the conventional methods detect fewer defective images.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Subscribe and save

Springer+ Basic
$34.99 /Month
  • Get 10 units per month
  • Download Article/Chapter or eBook
  • 1 Unit = 1 Article or 1 Chapter
  • Cancel anytime
Subscribe now

Buy Now

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Fig. 1
Algorithm 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5
Algorithm 2
Fig. 6
Fig. 7
Fig. 8
Fig. 9
Fig. 10
Fig. 11
Fig. 12

Similar content being viewed by others

References

  1. Aiger D, Talbot H (2010) The phase only transform for unsupervised surface defect detection. In: 2010 IEEE computer society conference on computer vision and pattern recognition, pp 295–302. https://doi.org/10.1109/CVPR.2010.5540198

  2. Alrawashdeh MJ, Sabri SRM, Ismail MT (2014) Evaluation the initial estimators using deterministic minimum covariance determinant algorithm. AIP Conference Proceedings 1605(1):894–899. https://doi.org/10.1063/1.4887708

    Article  Google Scholar 

  3. Baranwal AK, Pillai S, Nguyen T et al (2021) An SEM-based deep defect classification system for VSB mask writer that works with die-to-die and die-to-database inspection methods using multiple digital twins built with the state-of-the-art neural networks. In: Renwick SP (ed) photomask technology 2021, international society for optics and photonics, vol 11855. SPIE, https://doi.org/10.1117/12.2601004, 118550D

  4. Bret T, Hofmann T, Edinger K (2014) Industrial perspective on focused electron beam-induced processes. Applied Physics A 117(4):1607–1614. https://doi.org/10.1007/s00339-014-8601-2

    Article  Google Scholar 

  5. Butler RW, Davies PL, Jhun M (1993) Asymptotics for the minimum covariance determinant estimator. The Annals of Statistics 21(3):1385–1400. https://doi.org/10.1214/aos/1176349264

    Article  MathSciNet  MATH  Google Scholar 

  6. Chen SH, Perng DB (2011) Directional textures auto-inspection using principal component analysis. Int J Adv Manuf Technol 55(9–12):1099–1110. https://doi.org/10.1007/s00170-010-3141-1

    Article  Google Scholar 

  7. Criminisi A, Perez P, Toyama K (2004) Region filling and object removal by exemplar-based image inpainting. IEEE Trans Image Process 13(9):1200–1212. https://doi.org/10.1109/TIP.2004.833105

    Article  Google Scholar 

  8. Crum W, Camara O, Hill D (2006) Generalized overlap measures for evaluation and validation in medical image analysis. IEEE Trans Med Imaging 25(11):1451–1461. https://doi.org/10.1109/TMI.2006.880587

    Article  Google Scholar 

  9. Davy A, Ehret T, Morel JM et al (2018) Reducing anomaly detection in images to detection in noise. In: 2018 25th IEEE international conference on image rrocessing (ICIP), IEEE, pp 1058–1062, https://doi.org/10.1109/ICIP.2018.8451059

  10. Dong X, Taylor CJ, Cootes TF (2020) Defect detection and classification by training a generic convolutional neural network encoder. IEEE Trans Signal Process 68:6055–6069. https://doi.org/10.1109/TSP.2020.3031188

    Article  MathSciNet  MATH  Google Scholar 

  11. D’Urzo L, Bayana H, Vandereyken J et al (2017) Continuous improvements of defectivity rates in immersion photolithography via functionalized membranes in point-of-use photochemical filtration. In: Hohle CK (ed) Advances in patterning materials and processes XXXIV, international society for optics and photonics, vol 10146. SPIE, pp 453–461, https://doi.org/10.1117/12.2258582

  12. Ehret T, Davy A, Morel JM et al (2019) Image anomalies: a review and synthesis of detection methods. J Math Imaging Vis 61(5):710–743. https://doi.org/10.1007/s10851-019-00885-0

    Article  MathSciNet  MATH  Google Scholar 

  13. Elmanhawy W, Kwan J (2018) Layout schema generation: improving yield ramp during technology development. Solid State Technology 61(6):18–23

    Google Scholar 

  14. Fuglede B, Topsoe F (2004) Jensen-Shannon divergence and Hilbert space embedding. In: International symposium on information theory, pp 31–36. https://doi.org/10.1109/ISIT.2004.1365067

  15. Ghosh B, Bhuyan MK, Sasmal P et al (2018) Defect classification of printed circuit boards based on transfer learning. In: 2018 IEEE applied signal processing conference (ASPCON), pp 245–248, https://doi.org/10.1109/ASPCON.2018.8748670

  16. Goldberg K, Benk MP, Wojdyla A et al (2015) EUV actinic brightfield mask microscopy for predicting printed defect images. In: Photomask technology 2015, vol 9635. SPIE, pp 271–277, https://doi.org/10.1117/12.2196966

  17. Grosjean B, Moisan L (2009) A-contrario detectability of spots in textured backgrounds. J Math Imaging Vis 33(3):313–337. https://doi.org/10.1007/s10851-008-0111-4

    Article  MathSciNet  Google Scholar 

  18. Hagi H, Iwahori Y, Fukui S et al (2014) Defect classification of electronic circuit board using SVM based on random sampling. Procedia Computer Science 35:1210–1218. https://doi.org/10.1016/j.procs.2014.08.218

    Article  Google Scholar 

  19. He K, Zhang X, Ren S et al (2016) Deep residual learning for image recognition. In: 2016 IEEE conference on computer vision and pattern recognition (CVPR), pp 770–778, https://doi.org/10.1109/CVPR.2016.90

  20. Huang SH, Pan YC (2015) Automated visual inspection in the semiconductor industry: a survey. Computers in Industry 66:1–10. https://doi.org/10.1016/j.compind.2014.10.006

    Article  Google Scholar 

  21. Huang W, Wei P (2019) A PCB dataset for defects detection and classification. ArXiv:1901.08204

  22. Hubert M, Debruyne M (2010) Minimum covariance determinant. WIREs. Computational Statistics 2(1):36–43. https://doi.org/10.1002/wics.61

    Article  Google Scholar 

  23. Hubert M, Van Driessen K (2004) Fast and robust discriminant analysis. Computational Statistics & Data Analysis 45(2):301–320. https://doi.org/10.1016/S0167-9473(02)00299-2

    Article  MathSciNet  MATH  Google Scholar 

  24. Impedovo D, Pirlo G, Sarcinella L et al (2012) Analysis of stability in static signatures using cosine similarity. In: 2012 international conference on frontiers in handwriting recognition, pp 231–235, https://doi.org/10.1109/ICFHR.2012.180

  25. Iwahori Y, Futamura K, Adachi Y (2011) Discrimination of true defect and indefinite defect with visual inspection using SVM. In: International conference on knowledge-based and intelligent information and engineering systems, Springer, pp 117–125, https://doi.org/10.1007/978-3-642-23866-6_13

  26. Iwahori Y, Kumar D, Nakagawa T et al (2012) Improved defect classification of printed circuit board using SVM. In: Intelligent decision technologies. Springer, pp 355–363, https://doi.org/10.1007/978-3-642-29920-9_36

  27. Iwahori Y, Takada Y, Shiina T et al (2018) Defect classification of electronic board using dense SIFT and CNN. Procedia Computer Science 126:1673–1682. https://doi.org/10.1016/j.procs.2018.08.110

    Article  Google Scholar 

  28. Kang H (2021) SK Hynix presents various solutions to difficult challenges related to EUV lithography process. https://english.etnews.com/20210210200001

  29. Kervadec H, Bouchtiba J, Desrosiers C et al (2019) Boundary loss for highly unbalanced segmentation. In: Proceedings of the 2nd international conference on medical imaging with deep learning, proceedings of machine learning research, vol 102. PMLR, pp 285–296

  30. Kim J, Nam Y, Kang MC et al (2021) Adversarial defect detection in semiconductor manufacturing process. IEEE Trans Semicond Manuf 34(3):365–371. https://doi.org/10.1109/TSM.2021.3089869

    Article  Google Scholar 

  31. Kondo T, Ban N, Ebizuka Y et al (2021) Massive metrology and inspection solution for EUV by area inspection SEM with machine learning technology. In: Metrology, inspection, and process control for semiconductor manufacturing XXXV, international society for optics and photonics, vol 11611. SPIE, https://doi.org/10.1117/12.2583691, 1161111

  32. Lin HC, Wang LL, Yang SN (1997) Extracting periodicity of a regular texture based on autocorrelation functions. Pattern Recognition Letters 18(5):433–443. https://doi.org/10.1016/S0167-8655(97)00030-5

    Article  Google Scholar 

  33. Lin HD, Ho DC (2007) Detection of pinhole defects on chips and wafers using DCT enhancement in computer vision systems. The International Journal of Advanced Manufacturing Technology 34(5–6):567–583. https://doi.org/10.1007/s00170-006-0614-3

    Article  Google Scholar 

  34. Lu CJ, Tsai DM (2008) Independent component analysis-based defect detection in patterned liquid crystal display surfaces. Image and Vision Computing 26(7):955–970. https://doi.org/10.1016/j.imavis.2007.10.007

    Article  Google Scholar 

  35. Matsui M, Yano T, Odaka T et al (2012) Quantitative measurement of voltage contrast in scanning electron microscope images for in-line resistance inspection of incomplete contact. Journal of Micro/Nanolithography, MEMS, and MOEMS 11(2). https://doi.org/10.1117/1.JMM.11.2.023008, 023008

  36. Mochi I, Fernandez S, Nebling R et al (2019) Absorber and phase defect inspection on EUV reticles using RESCAN. In: Extreme ultraviolet (EUV) lithography X, international society for optics and photonics, vol 10957. SPIE, https://doi.org/10.1117/12.2515160, 109570W

  37. Nakagaki R, Honda T, Nakamae K (2009) Automatic recognition of defect areas on a semiconductor wafer using multiple scanning electron microscope images. Measurement Science and Technology 20. https://doi.org/10.1088/0957-0233/20/7/075503

  38. Nakagawa T, Iwahori Y, Bhuyan M (2013) Defect classification of electronic board using multiple classifiers and grid search of SVM parameters. In: Computer and information science. Springer, pp 115–127, https://doi.org/10.1007/978-3-319-00804-2_9

  39. Nam Y, Joo S, Kwak N et al (2022) Precise pattern alignment for die-to-database inspection based on the generative adversarial network. IEEE Trans Semicond Manuf 35(3):532–539. https://doi.org/10.1109/TSM.2022.3171788

    Article  Google Scholar 

  40. Nguyen HV, Bai L (2011) Cosine similarity metric learning for face verification. In: Computer vision-ACCV 2010. Springer, Berlin, Heidelberg, pp 709–720, https://doi.org/10.1007/978-3-642-19309-5_55

  41. Oberai A, Yuan JS (2017) Smart E-beam for defect identification & analysis in the nanoscale technology nodes: technical perspectives. Electronics 6. https://doi.org/10.3390/electronics6040087

  42. Ouchi M, Ishikawa M, Shinoda S et al (2020) A trainable die-to-database for fast e-beam inspection: learning normal images to detect defects. In: Metrology, inspection, and process control for microlithography XXXIV, vol 11325. SPIE, https://doi.org/10.1117/12.2551456, 113252F

  43. Paszke A, Gross S, Massa F et al (2019) PyTorch: an imperative style, high-performance deep learning library. In: Advances in neural information processing systems, pp 8024–8035. https://proceedings.neurips.cc/paper/2019/file/bdbca288fee7f92f2bfa9f7012727740-Paper.pdf

  44. Perona P, Malik J (1990) Scale-space and edge detection using anisotropic diffusion. IEEE Trans Pattern Anal Mach Intell 12(7):629–639. https://doi.org/10.1109/34.56205

    Article  Google Scholar 

  45. Ronneberger O, Fischer P, Brox T (2015) U-net: convolutional networks for biomedical image segmentation. In: Navab N, Hornegger J, Wells WM et al (eds) Medical image computing and computer-assisted intervention – MICCAI 2015. Springer International Publishing, Cham, pp 234–241, https://doi.org/10.1007/978-3-319-24574-4_28

  46. Rousseeuw PJ (1984) Least median of squares regression. J Am Stat Assoc 79(388):871–880. https://doi.org/10.1080/01621459.1984.10477105

    Article  MathSciNet  MATH  Google Scholar 

  47. Rousseeuw PJ, Driessen KV (1999) A fast algorithm for the minimum covariance determinant estimator. Technometrics 41(3):212–223. https://doi.org/10.1080/00401706.1999.10485670

  48. Sato Y, Huang SC, Maruyama K et al (2019) Edge placement error measurement in lithography process with die to database algorithm. In: Metrology, inspection, and process control for microlithography XXXIII, international society for optics and photonics, vol 10959. SPIE, https://doi.org/10.1117/12.2515143, 109590D

  49. Shenzhen Eagle Eye Online Electronic Technology (2023) Eagle eye technology: AOI technical expert. http://en.eagle-eye-online.com/solution.aspx?TypeId=62 &fid=t25:62:25

  50. Shiina T, Iwahori Y, Takada Y et al (2017) Reducing misclassification of true defects in defect classification of electronic board. In: International conference on computer and information science, Springer, pp 77–92, https://doi.org/10.1007/978-3-319-60170-0_6

  51. Shiina T, Iwahori Y, Kijsirikul B (2018) Defect classification of electronic circuit board using multi-input convolutional neural network. International Journal of Computer & Software Engineering 3. https://doi.org/10.15344/2456-4451/2018/137, 137

  52. Sikka S, Sikka K, Bhuyan MK et al (2013) Pseudo vs. true defect classification in printed circuits boards using wavelet features. ArXiv:1310.6654

  53. Stephant N, Rondeau B, Gauthier JP et al (2014) Investigation of hidden periodic structures on SEM images of opal-like materials using FFT and IFFT. Scanning 36(5):487–499. https://doi.org/10.1002/sca.21144

    Article  Google Scholar 

  54. Sudre CH, Li W, Vercauteren T et al (2017) Generalised dice overlap as a deep learning loss function for highly unbalanced segmentations. In: Deep learning in medical image analysis and multimodal learning for clinical decision support. Springer, pp 240–248, https://doi.org/10.1007/978-3-319-67558-9_28

  55. Tabernik D, Šela S, Skvarč J et al (2020) Segmentation-based deep-learning approach for surface-defect detection. J Intell Manuf 31(3):759–776. https://doi.org/10.1007/s10845-019-01476-x

    Article  Google Scholar 

  56. Takada Y, Shiina T, Usami H et al (2017) Defect detection and classification of electronic circuit boards using keypoint extraction and CNN features. In: The ninth international conferences on pervasive patterns and applications Defect, pp 113–116

  57. Tao X, Zhang D, Ma W et al (2018) Automatic metallic surface defect detection and recognition with convolutional neural networks. Applied Sciences 8(9). https://doi.org/10.3390/app8091575, 1575

  58. Tao Z, Liu H, Fu H et al (2017) Image cosegmentation via saliency-guided constrained clustering with cosine similarity. Proceedings of the AAAI conference on artificial intelligence 31(1). https://doi.org/10.1609/aaai.v31i1.11203

  59. Waiblinger M, Bret T, Jonckheere R et al (2012) Ebeam based mask repair as door opener for defect free EUV masks. In: Photomask technology 2012, vol 8522. SPIE, https://doi.org/10.1117/12.966387, 85221M

  60. Weimer D, Scholz-Reiter B, Shpitalni M (2016) Design of deep convolutional neural network architectures for automated feature extraction in industrial inspection. CIRP Annals 65(1):417–420. https://doi.org/10.1016/j.cirp.2016.04.072

  61. Welsch RE, Zhou X (2007) Application of robust statistics to asset allocation models. REVSTAT-Statistical Journal 5(1):97–114. https://doi.org/10.57805/revstat.v5i1.44

  62. Xia P, Zhang L, Li F (2015) Learning similarity with cosine similarity ensemble. Information Sciences 307:39–52. https://doi.org/10.1016/j.ins.2015.02.024

    Article  MathSciNet  MATH  Google Scholar 

  63. Xiao H, Ma E, Wang F et al (2009) Leakage study of 45nm SRAM devices with different layouts using advanced e-beam inspection systems. https://nccavs-usergroups.avs.org/wp-content/uploads/TFUG2009/2009_4xiao.pdf

  64. Yeh CH, Wu FC, Ji WL et al (2010) A wavelet-based approach in detecting visual defects on semiconductor wafer dies. IEEE Trans Semicond Manuf 23(2):284–292. https://doi.org/10.1109/TSM.2010.2046108

    Article  Google Scholar 

  65. Yin A, Fung A (2011) Effective analysis of optical inspection machines (IMPACT 2011). In: 2011 6th international microsystems, packaging, assembly and circuits technology conference (IMPACT), pp 408–410, https://doi.org/10.1109/IMPACT.2011.6117212

  66. Yu J, Han S, Lee CO (2023) Dataset for defect inspection in semiconductor images. https://github.com/Jinkyu-Yu/Image-dataset.git

  67. Zontak M, Cohen I (2009) Kernel-based detection of defects on semiconductor wafers. In: 2009 IEEE international workshop on machine learning for signal processing, pp 1–6, https://doi.org/10.1109/MLSP.2009.5306256

Download references

Funding

This work was supported by Samsung Electronics Co., Ltd. (IO201216-08216-01).

Author information

Authors and Affiliations

Authors

Contributions

All authors contributed to the study conception and design. Data collection and analysis were performed by Jinkyu Yu and Songhee Han. The first draft of the manuscript was written by Jinkyu Yu and Chang-Ock Lee. All authors commented on previous versions of the manuscript. All authors read and approved the final manuscript.

Corresponding author

Correspondence to Chang-Ock Lee.

Ethics declarations

Competing interests

The authors declare no competing interests.

Additional information

Publisher's Note

Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.

Appendix A

Appendix A

1.1 A.1 Selection of the parameter \(t_{i}\)

Here, we experimentally show the role of the parameter \(t_{i}\) used in the image classification in Sect. 3.1. We obtain the repeated region \(P_{i} = \{(x,y) \mid CS_{i}(x,y) > t_{i} \text { for } x=1,\ldots ,h \text { and } y=1,\ldots ,w\}\) using the threshold \(t_{i}\). We overlap \(P_{i}\) based on the centroid of each kernel and call it the overall repeated region \(P\subset [1, \overline{h}]\times [1, \overline{w}]\). Since the value of \(CS_{i}\) at the centroid of \(K_{i}\) is always 1, \(P_{i}\) contains the centroid of \(K_{i}\). It means that P contains the center of domain \([1, \overline{h}]\times [1, \overline{w}]\). For R, the connected region containing the center of domain, we compute the moment tensor I as

$$\begin{aligned} I = \begin{bmatrix} I_{xx} &{} I_{xy}\\ I_{yx} &{} I_{yy} \end{bmatrix}\,, \end{aligned}$$

where the components are defined as

$$\begin{aligned} I_{xx} = \int _{R}x^2dS\,,\ I_{yy} = \int _{R}y^2dS\,,\ I_{xy} = I_{yx} = \int _{R}xydS\,. \end{aligned}$$
Fig. 13
figure 13

Experiment results for various \(t_{i}\). The first column shows the input images. Columns 2 through 6 show P for \(r = 0.1\) to \(r = 0.3\). The red dot indicates the center of domain, and green region shows the connected region R containing the center of domain. The blue dots indicate the peak points

Fig. 14
figure 14

JSDs for flat and complex images. First and second columns show the input image and the MCD-solution S, respectively. Third column shows the histogram of \(d_{M}^{2}\) for the MCD-solution S and the chi-squared distribution

For the moment tensor I, we compute eigenvalues and corresponding eigenvectors. If an image has a linear structure, P has a long connected region R, with the large axis ratio defined as the ratio of large and small eigenvalues, in the dominant direction defined as the direction of the major eigenvector.

Figure 13 shows the overall repeated region P with various \(t_{i} = (1 - r) + r \min CS_{i}\) for \(r = 0.1, 0.15, 0.2, 0.25, 0.3\). The axis ratio of R is displayed at the top of each P. The maximum axis ratio of nonlinear images is 7.53, and the minimum one of linear images is 41.83. Therefore, we take the value 25 as the threshold for determination of linear images. Linear images always have an axis ratio greater than 25, regardless of \(t_{i}\) values. The peak points of the patterned images are aligned on specific lines.

Fig. 15
figure 15

Lattice points and results of GHT method and our method

1.2 A.2 Kernel size for cosine similarity

Here, we give a one-dimensional example of the cosine similarity for different kernel sizes. Consider a long vector in which (10110) is repeated. Then, the cosine similarities for the three types of one-dimensional kernels are as follows:

$$\begin{aligned}&(\cdots 101101011010110\cdots ) \text{ with } K=(101)\\&\quad \implies CS=(\cdots *1**1*1**1*1**1\cdots )\\&(\cdots 101101011010110\cdots ) \text{ with } K=(10110)\\&\quad \implies CS=(\cdots **1****1****1**\cdots )\\&(\cdots 101101011010110\cdots ) \text{ with } K=(1011010)\\&\quad \implies CS=(\cdots ***1****1****1*\cdots ) \end{aligned}$$

If the kernel does not include a pattern as in the first case, the repeated region of CS cannot find the pattern. On the other hand, if the kernel represents a pattern as in the second and third cases, the repeated region of CS finds the pattern. Therefore, we suggest small M and N values like 2, 3, and 4 so that the kernel includes the pattern.

Algorithm 3
figure c

GHT method of extracting the lattice vectors [32].

1.3 A.3 JSD between histogram and chi-squared distribution

We explain the details of the JSD between the histogram of \(d_{M}^{2}\) for the MCD-solution S and the chi-squared distribution. Let \(h_{S}(x)\) be the histogram of \(d_{M}^{2}(x_{i}, \mu , \Sigma )\) for the MCD-solution S. For a defect-free image, the maximum value of \(d_{M}^{2}\) in the MCD-solution S is close to \(\chi _{1,1-\alpha }^2\) where the quantity \(\chi _{1,p}^{2}\) is defined to satisfy \(P({X > \chi _{1,p}^{2}}) = p\) for \(X \sim \chi _{1}^{2}\). However, for defective images, the MCD-solution S appears outside the defects, and the maximum value of \(d_{M}^{2}\) in the MCD-solution S increases. The increment depends on the size of the defects. Therefore, we use a slightly modified chi-squared distribution as follows. Let \(f_{1}(x)\) be the probability density function for \(\chi _{1}^{2}\) distribution and l be the maximum value of \(d_{M}^{2}\) in the MCD-solution S. Then, the cropped probability density function \(\overline{f}_{1}(x)\) is

$$\begin{aligned} \overline{f}_{1}(x) = \frac{1}{\int _{0}^{l} f_{1}(x)dx}f_{1}(x)\,. \end{aligned}$$

In Sect. 3.1, we measure the JSD between \(h_{S}(x)\) and \(\overline{f}_{1}(x)\) to check whether \(h_{S}(x)\) is close to \(\overline{f}_{1}(x)\) or not.

Figure 14 shows the JSDs for flat and complex images. For flat images, JSD is below \(0.01 \log 2\). For complex images, JSD is greater than \(0.1 \log 2\). Therefore, we take the value \(0.05 \log 2\) as the threshold for determination of flat images.

Algorithm 4
figure d

Our method of extracting the lattice vectors.

1.4 A.4 Lattice vector extraction

In this appendix, we briefly describe how to extract the lattice vectors from the overall repeated region P in Sect. 3.2.2. Before starting, the locations of peak points are regarded as vectors originating from the center of domain [\(1, \overline{h}]\times [1, \overline{w}\)]. The main idea of the generalized Hough transform (GHT) method in [32] of extracting lattice vectors is to build a parallelogram grid with each pair of linearly independent vectors and score how close the peak points are to the grid (see Algorithm 3). The usage of \(1/\Vert {v_{i}}\Vert \) leads to a high score in L for \(v_{i}\) with small length. However, this method only uses the vectors \(v_{\hat{i}}\) and \(v_{\hat{j}}\) to determine the lattice vectors and does not use other vectors that are constant multiples of them.

We modified the method slightly to use more linearly dependent vectors to obtain the lattice vectors. We consider a straight line passing through the center of domain. As mentioned in Sect. 3.1, a straight line passing through three peak points is judged to have pattern information. If the line passes through more peak points, the pattern is better represented. To find the lattice vectors, we take two straight lines containing the largest number of peak points. If the straight lines have the same number of peak points, we take the line with the smaller distance between the points. The proposed lattice vector extraction algorithm is described in Algorithm 4. The lattice points generated from the lattice vectors extracted by our proposed algorithm are more accurate because the error is reduced by using more linearly dependent vectors. The amount of computation of our proposed extraction algorithm is also less than that of the GHT method.

Figure 15a shows the lattice points for two methods in input image. Blue dots and red dots represent the lattice points generated by the GHT method and our method, respectively. A flattened image obtained with the blue lattice points is shown in Fig. 15b. Near the boundary of the image, traces of structures remain. Figure 15c shows the flattened image obtained by our method. Compared to the GHT method, our method produces more accurate lattice points.

Rights and permissions

Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Yu, J., Han, S. & Lee, CO. Defect inspection in semiconductor images using FAST-MCD method and neural network. Int J Adv Manuf Technol 129, 1547–1565 (2023). https://doi.org/10.1007/s00170-023-12287-z

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s00170-023-12287-z

Keywords

Navigation