Alternating-Aperture Phase Shift Masking (AAPSM), a form of strong. Resolution Enhancement Technology (RET), will be used to image critical.
Fast and Area-Efficient Phase Conflict Detection and Correction in Standard-Cell Layouts. Charles Chiang, Synopsys. Andrew B. Kahng, UC San Diego. Subarna ...
A new layout modification scheme suited for correcting phase conflicts in large standard-cell blocks is also proposed. The experiments show that the ...
- Better optical resolution - Extend equipment life Alternating Aperture Phase Shift Mask (AAPSM): Phase-modulation at the mask level to increase resolution ...
Fast and efficient phase conflict detection and correction in standard-cell layouts. ICCAD '05: Proceedings of the 2005 IEEE/ACM International conference on ...
A new approach to detect a minimal set of phase conflicts, which when corrected will produce a phase-assignable layout, and a novel layout modification ...
Fast and efficient phase conflict detection and correction in standard-cell layouts. ICCAD '05: Proceedings of the 2005 IEEE/ACM International conference on ...
The invention provides systems and methods for layout decomposition to produce exposure layouts that can be used to perform double patterning lithography ...
Alternate Phase Shift Mask coloring and automatic phase shift conflict detection and resolution methods accomplish layout perturbation, i.e., increasing the ...
The experimental results indicate that without increasing the chip size, the phase conflict problem can be well tackled with minimal perturbation to the layout.