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The proposed method comprises of an inductive coupled plasma (ICP) deep etching and a two-step anisotropic wet etching. A nanopore array with an average feature ...
The proposed method comprises of an inductive coupled plasma (ICP) deep etching and a two-step anisotropic wet etching. A nanopore array with an average feature ...
Nov 8, 2012 · This paper presents a novel method for the fabrication of silicon nanopore arrays. The proposed method is based on inductive coupled plasma ...
PDF | This paper presents a novel method for the fabrication of silicon nanopore arrays. The proposed method is based on inductive coupled plasma (ICP).
Dec 30, 2016 · An improved three-step wet etching method was demonstrated to fabricate Si nanopore arrays. •. The shape of the nanopore can be easily tuned ...
Missing: novel | Show results with:novel
T. Deng, C. Zhao, J. Chen, Zewen Liu: A novel method to fabricate silicon nanopore arrays. NEMS 2013: 714-717. manage site settings.
The proposed method is based on inductive coupled plasma (ICP) etching and a two-step anisotropic wet etching, and can be used to fabricate individual nanopores ...
This paper presents a novel method for the fabrication of silicon nanopore arrays. The proposed method is based on inductive coupled plasma (ICP) etching ...
Abstract. Solid-state nanopore arrays are realized with a well-controlled, three-step, anisotropic wet etching process with different KOH bath temperatures.
Missing: novel | Show results with:novel
This paper presents a novel method for fabrication of silicon nanopore arrays. The proposed method comprises of an inductive coupled plasma (ICP) deep etching ...