Multilayer soft lithography of perfluoropolyether based elastomer for microfluidic device fabrication

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Multilayer soft lithography of perfluoropolyether based elastomer for microfluidic device fabrication

Naga Sai Gopi Krishna Devaraju*^a and Marc Alexander Unger^a

Author affiliations

* Corresponding authors

^a Fluidigm Corporation, 7000 Shoreline Ct., Suite 100, South San Francisco, CA, U. S. A.
E-mail: naga.devaraju@fluidigm.com, marc.unger@fluidigm.com
Fax: (+1) 650-871-7152
Tel: (+1) 650-266-6075

Abstract

The compatibility of microfluidic devices with solvents and other chemicals is extremely important for many applications such as organic synthesis in microreactors and drug screening. We report the successful fabrication of microfluidic devices from a novel perfluoropolyether based polymer utilizing the Multilayer Soft Lithography™ (MSL) technique with simple, straightforward processing. The perfluorinated polymer SIFEL X-71 8115 is a highly chemically resistant elastomeric material. We demonstrate fabrication of a microfluidic device using an off-ratio bonding technique to bond multiple SIFEL layers, each patterned lithographically. The mechanical properties of the SIFEL MSL valves (including actuation pressures) are similar to PDMS MSL valves of the same geometry. Chemical compatibility tests highlight SIFEL's remarkable resistance to organic solvents, acids and alkalis.

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Article information

DOI: https://doi.org/10.1039/C0LC00274G
Article type: Paper
Submitted: 03 Aug 2010
Accepted: 23 Mar 2011
First published: 19 Apr 2011

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Lab Chip, 2011,11, 1962-1967

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