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"An efficient algorithm for stencil planning and optimization in E-beam ..."

Jiabei Ge et al. (2017)

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DOI: 10.1109/ASPDAC.2017.7858350

access: closed

type: Conference or Workshop Paper

metadata version: 2023-08-16

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  - conf/aspdac/GeYZZZ17
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Jiabei Ge, Changhao Yan, Hai Zhou, Dian Zhou, Xuan Zeng:
An efficient algorithm for stencil planning and optimization in E-beam lithography. ASP-DAC 2017: 366-371

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