default search action

combined dblp search
author search
venue search
publication search

ask others

"DTCO for DSA-MP Hybrid Lithography with Double-BCP Materials in Sub-7nm Node."

Jiaojiao Ou et al. (2017)

> Home

Details and statistics

DOI: 10.1109/ICCD.2017.70

access: closed

type: Conference or Workshop Paper

metadata version: 2023-03-23

- view
  authority control:
- export record
  dblp key:
  - conf/iccd/OuXCYP17
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/iccd/OuXCYP17
Jiaojiao Ou, Xiaoqing Xu, Brian Cline, Greg Yeric, David Z. Pan:
DTCO for DSA-MP Hybrid Lithography with Double-BCP Materials in Sub-7nm Node. ICCD 2017: 403-410

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.