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"Fast Lithographic Mask Optimization Considering Process Variation."

Yu-Hsuan Su et al. (2016)

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DOI: 10.1109/TCAD.2015.2514082

access: closed

type: Journal Article

metadata version: 2020-09-24

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  - journals/tcad/SuHTCB16
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  - https://dblp.org/rec/journals/tcad/SuHTCB16
Yu-Hsuan Su, Yu-Chen Huang, Liang-Chun Tsai, Yao-Wen Chang, Shayak Banerjee:
Fast Lithographic Mask Optimization Considering Process Variation. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 35(8): 1345-1357 (2016)

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