default search action

combined dblp search
author search
venue search
publication search

ask others

"Strategy to Characterize Electromigration Short Length Effects in Cu/low-k ..."

Zhenjun Zhang et al. (2021)

> Home

Details and statistics

DOI: 10.1109/IRPS46558.2021.9405161

access: closed

type: Conference or Workshop Paper

metadata version: 2022-10-02

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/irps/ZhangKHCCZG21
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/irps/ZhangKHCCZG21
Zhenjun Zhang, Matthias Kraatz, Meike Hauschildt, Seungman Choi, André Clausner, Ehrenfried Zschech, Martin Gall:
Strategy to Characterize Electromigration Short Length Effects in Cu/low-k Interconnects. IRPS 2021: 1-5

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.