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"An investigation of capacitance aging model for extreme low-k and high-k ..."

M. N. Chang et al. (2015)

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DOI: 10.1109/IRPS.2015.7112700

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-21

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  dblp key:
  - conf/irps/ChangLLCMW15
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M. N. Chang, Y.-H. Lee, S. Y. Lee, C. C. Chiu, D. Maji, K. Wu:
An investigation of capacitance aging model for extreme low-k and high-k dielectrics. IRPS 2015: 3

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