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"Substrate noise isolation improvement by helium-3 ion irradiation ..."

Ning Li et al. (2015)

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DOI: 10.1109/ESSDERC.2015.7324762

access: closed

type: Conference or Workshop Paper

metadata version: 2021-04-09

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  - conf/essderc/LiIHPWOSM15
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Ning Li, Takeshi Inoue, Takuichi Hirano, Jian Pang, Rui Wu, Kenichi Okada, Hitoshi Sakane, Akira Matsuzawa:
Substrate noise isolation improvement by helium-3 ion irradiation technique in a triple-well CMOS process. ESSDERC 2015: 254-257

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