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Article
Report number arXiv:2403.11245
Title Thickness effect on superconducting properties of niobium films for radio-frequency cavity applications
Author(s) Bianchi, Antonio (INFN, Milan) ; Bonura, Marco (U. Geneva (main)) ; Carlos, Carlota P.A. (U. Geneva (main) ; CERN) ; Leith, Stewart (CERN) ; Rosaz, Guillaume (CERN) ; Senatore, Carmine (U. Geneva (main)) ; Venturini Delsolaro, Walter (CERN)
Publication 2024-06-27
Imprint 2024-03-17
Number of pages 10
In: Supercond. Sci. Technol. 37 (2024) 085005
DOI 10.1088/1361-6668/ad59ce
Subject category physics.acc-ph ; Accelerators and Storage Rings
Abstract Niobium-coated copper radio-frequency cavities are cost-effective alternatives to bulk niobium cavities, given the lower material costs of copper substrates and their operation in liquid helium at around 4.2 K. However, these cavities historically exhibited a gradual degradation in performance with the accelerating field. This phenomenon, not yet fully understood, limits the application of niobium thin film cavities in accelerators where the real-estate gradient needs to be maximized. Recent studies on niobium films deposited on copper using high power impulse magnetron sputtering (HiPIMS) technique show promising results in mitigating the performance degradation of niobium thin film radio-frequency cavities. This paper examines the effect of film thickness on the superconducting properties of niobium films deposited on copper using HiPIMS. The study provides insights into how the critical temperature, transition width, lower and upper critical fields, and critical current density vary with the film thickness. Increasing the thickness of niobium films deposited through HiPIMS is found to enhance superconducting properties and reduce densities of defects and structural irregularities in the crystalline lattice. This shows potential for enhancing overall performance and potentially mitigating the observed performance degradation in niobium thin film radio-frequency cavities. Additionally, the Ivry's scaling relation among critical temperature, thickness, and sheet resistance at the normal state appears applicable to niobium films up to approximately 4 $\mu$m. This extends the previously confirmed validity for niobium films, which was limited to around 300 nm thickness.
Copyright/License preprint: (License: arXiv nonexclusive-distrib 1.0)
publication: © 2024 The Author(s) (License: CC-BY-4.0)



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 Record creato 2024-07-05, modificato l'ultima volta il 2024-07-06


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