ホーム > Study of LOR5B resist for the Fabrication of Hard X-ray Zone Plates by E-beam Lithography and ICP |
Article | |
Title | Study of LOR5B resist for the Fabrication of Hard X-ray Zone Plates by E-beam Lithography and ICP |
Author(s) | Chen, Y T ; Lin, I K ; Lo, T N ; Su, C I ; Liu, C J ; Je, J H ; Margaritondo, G ; Hwu, Y |
Publication | 2007 |
In: | AIP Conf. Proc. 879 (2007) pp.1516-1519 |
In: | 9th International Conference On Synchrotron Radiation Instrumentation, Daegu, Korea, 28 May - 2 Jun 2006, pp.1516-1519 |