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Search Results (23)

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Keywords = PZT sol-gel

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13 pages, 2616 KiB  
Article
Enhancement of Ion-Sensitive Field-Effect Transistors through Sol-Gel Processed Lead Zirconate Titanate Ferroelectric Film Integration and Coplanar Gate Sensing Paradigm
by Dong-Gyun Mah, Seong-Moo Oh, Jongwan Jung and Won-Ju Cho
Chemosensors 2024, 12(7), 134; https://doi.org/10.3390/chemosensors12070134 - 9 Jul 2024
Viewed by 1000
Abstract
To facilitate the utility of field effect transistor (FET)-type sensors, achieving sensitivity enhancement beyond the Nernst limit is crucial. Thus, this study proposed a novel approach for the development of ferroelectric FETs (FeFETs) using lead zirconate titanate (PZT) ferroelectric films integrated with indium–tungsten [...] Read more.
To facilitate the utility of field effect transistor (FET)-type sensors, achieving sensitivity enhancement beyond the Nernst limit is crucial. Thus, this study proposed a novel approach for the development of ferroelectric FETs (FeFETs) using lead zirconate titanate (PZT) ferroelectric films integrated with indium–tungsten oxide (IWO) channels synthesized via a cost-effective sol-gel process. The electrical properties of PZT-IWO FeFET devices were significantly enhanced through the strategic implementation of PZT film treatment by employing intentional annealing procedures. Consequently, key performance metrics, including the transfer curve on/off ratio and subthreshold swings, were improved. Moreover, unprecedented electrical stability was realized by eliminating the hysteresis effect during double sweeps. By leveraging a single-gate configuration as an FeFET transformation element, extended-gate (EG) detection methodologies for pH sensing were explored, thereby introducing a pioneering dimension to sensor architecture. A measurement paradigm inspired by plane gate work was adopted, and the proposed device exhibited significant resistive coupling, consequently surpassing the sensitivity thresholds of conventional ion-sensitive field-effect transistors. This achievement represents a substantial paradigm shift in the landscape of ion-sensing methodologies, surpassing the established Nernst limit (59.14 mV/pH). Furthermore, this study advances FeFET technology and paves the way for the realization of highly sensitive and reliable ion sensing modalities. Full article
(This article belongs to the Collection pH Sensors, Biosensors and Systems)
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<p>Formation of thin film and trap layer through thermal treatment of sol-gel PZT, and fabrication process of FeFET.</p>
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<p>Transfer characteristics (V<sub>G</sub>–I<sub>D</sub>) curves of the PZT FeFET: (<b>a</b>) double sweep, and (<b>b</b>) direction of hysteresis with respect to polarization and trapping. The inset in (<b>b</b>) illustrates the output characteristics of the PZT-FeFET. The mechanisms, depicting the relative magnitudes of polarization and trapping, are as follows: (<b>c</b>) polarization dominance, (<b>d</b>) trapping dominance, and (<b>e</b>) interaction between polarization and trapping.</p>
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<p>Comparison of electrical characteristics parameters of PZT film-based FeFETs: (<b>a</b>) field-effect mobility (µ<sub>FE</sub>) and hysteresis window (V<sub>H</sub>) and (<b>b</b>) current on/off ratio (I<sub>on/off</sub>) and subthreshold swing (SS). PZT-IGZO (bronze) [<a href="#B43-chemosensors-12-00134" class="html-bibr">43</a>] (Teng, W.; Bao, S.Y.; Hu, Y.Q.; Deng, X.; Guan, Z.; Chen, B.B.; Zhong, N.; Xiang, P.H. 2024). PZT-(Al<sub>2</sub>O<sub>3</sub>)-IGZO [<a href="#B41-chemosensors-12-00134" class="html-bibr">41</a>] (Jo, Y.; Lee, J.Y.; Park, E.; Kim, H.S.; Choi, H.J.; Mun, S.; Kim, Y.; Hur, S.; Yoon, J.H.; Jang, J.S.; et al. 2023). PZT-MoS<sub>2</sub> [<a href="#B29-chemosensors-12-00134" class="html-bibr">29</a>] (Zhou, C.; Wang, X.; Raju, S.; Lin, Z.; Villaroman, D.; Huang, B.; Chan, H.L.W.; Chan, M.; Chai, Y. 2015). PZT-IGZO (red) [<a href="#B40-chemosensors-12-00134" class="html-bibr">40</a>] (Besleaga, C.; Radu, R.; Balescu, L.M.; Stancu, V.; Costas, A.; Dumitru, V.; Stan, G.; Pintilie, L. 2019). PZT-ITO [<a href="#B42-chemosensors-12-00134" class="html-bibr">42</a>] (Tue, P.T.; Miyasako, T.; Trinh, B.N.Q.; Li, J.; Tokumitsu, E.; Shimoda, T. 2010).</p>
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<p>(<b>a</b>) Schematic illustrating the DC bias test using PZT-FeFET. (<b>b</b>) Transfer curve spanning the gate voltage range from −3 V to 6 V (with DC bias varying from 0.7 V to −0.7 V in 0.1 V steps across 15 increments). (<b>c</b>) Variation in reference voltage according to DC bias at I<sub>REF</sub> levels (0.1, 1, and 10 nA). Enlarged transfer curves corresponding to the I<sub>REF</sub> levels: (<b>d</b>) I<sub>REF</sub> = 0.1 nA, (<b>e</b>) I<sub>REF</sub> = 1 nA, and (<b>f</b>) I<sub>REF</sub> = 10 nA.</p>
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<p>(<b>a</b>) Schematic of a PZT single-gate FeFET transducer with SnO<sub>2</sub> EG sensing units. (<b>b</b>) V<sub>G</sub>–I<sub>D</sub> curves of the EG-ISFET for different pH buffer solutions. The inset in (<b>b</b>) highlights data pertaining to the I<sub>REF</sub> region. (<b>c</b>) Reference voltage shift (ΔV<sub>REF</sub>) as a function of pH value.</p>
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<p>(<b>a</b>) Schematic of the equivalent circuit demonstrating the resistive coupling effect. (<b>b</b>) Amplification of pH sensitivity corresponding to various R<sub>CG</sub>:R<sub>SG</sub> ratios. V<sub>G</sub>–I<sub>D</sub> curves illustrating the resistive coupling effect for different pH buffer solutions: (<b>c</b>) 1:1, (<b>d</b>) 3:1, and (<b>e</b>) 5:1.</p>
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<p>Comparison of non-ideal effects between single-gate (SG) mode and resistivity coupling (RC) mode. Hysteresis and drift behaviors depicted for: (<b>a</b>,<b>c</b>) SG mode and R<sub>CG</sub>:R<sub>SG</sub> = 1:1, (<b>b</b>,<b>d</b>) various R<sub>CG</sub>:R<sub>SG</sub> ratios.</p>
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11 pages, 2696 KiB  
Article
Interfacial Polarization Control Engineering and Ferroelectric PZT/Graphene Heterostructure Integrated Application
by Kaixi Bi, Shuqi Han, Jialiang Chen, Xiaoxue Bi, Xiangyu Yang, Liya Niu and Linyu Mei
Nanomaterials 2024, 14(5), 432; https://doi.org/10.3390/nano14050432 - 27 Feb 2024
Viewed by 1622
Abstract
Integration and miniaturization are the inevitable trends in the development of electronic devices. PZT and graphene are typical ferroelectric and carbon-based materials, respectively, which have been widely used in various fields. Achieving high-quality PZT/graphene heterogeneous integration and systematically studying its electrical properties is [...] Read more.
Integration and miniaturization are the inevitable trends in the development of electronic devices. PZT and graphene are typical ferroelectric and carbon-based materials, respectively, which have been widely used in various fields. Achieving high-quality PZT/graphene heterogeneous integration and systematically studying its electrical properties is of great significance. In this work, we reported the characterization of a PZT film based on the sol–gel method. Additionally, the thickness of the PZT film was pushed to the limit size (~100 nm) by optimizing the process. The test results, including the remnant and leakage current, show that the PZT film is a reliable and suitable platform for further graphene-integrated applications. The non-destructive regulation of the electrical properties of graphene has been studied based on a domain-polarized substrate and strain-polarized substrate. The domain structures in the PZT film exhibit different geometric structures with ~0.3 V surface potential. The I–V output curves of graphene integrated on the surface of the PZT film exhibited obvious rectification characteristics because of p/n-doping tuned by an interfacial polarized electric field. In contrast, a ~100 nm thick PZT film makes it easy to acquire a larger strain gradient for flexural potential. The tested results also show a rectification phenomenon, which is similar to domain polarization substrate regulation. Considering the difficulty of measuring the flexural potential, the work might provide a new approach to assessing the flexural polarized regulation effect. A thinner ferroelectric film/graphene heterojunction and the polarized regulation of graphene will provide a platform for promoting low-dimension film-integrated applications. Full article
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<p>(<b>a</b>) XRD spectrum of the PZT film prepared under different temperatures; (<b>b</b>) topographical image of PZT film with 20 µm <math display="inline"><semantics> <mrow> <mo>×</mo> </mrow> </semantics></math> 20 µm scanning area characterized by AFM equipment; (<b>c</b>,<b>d</b>) SEM cross-section images of PZT film deposited on Si/SiO<sub>2</sub>/Pt/Ti and mica substrate.</p>
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<p>P–E hysteresis loops of the PZT film with excitation voltage from −25 to 25 V.</p>
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<p>Leakage current based on the same measure equipment and sample.</p>
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<p>Capacitance–voltage characteristic tested by PFM probe on the surface of Pt/Ti/PZT film.</p>
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<p>(<b>a</b>) Image of ferroelectric domains written by PFM probe with 10 V tip voltage on the PZT film surface. Three domain structures present a ~180° contrast in phase test results; (<b>b</b>,<b>c</b>) surface potential of thin film was characterized by KFPM probe in 20 <math display="inline"><semantics> <mrow> <mo>×</mo> </mrow> </semantics></math> 20 µm<sup>2</sup> area. The potential value at the boundary is ~0.3 V.</p>
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<p>(<b>a</b>) Photograph of graphene/PZT sample on SiO<sub>2</sub>/Si substrate. The upper right image is a partial enlargement of the electrode gap area. (<b>b</b>) The gray picture displayed the structure topography based on PFM (piezo-response force microscopy) equipment. The yellow picture shows the domain structure characterization of the middle region of the electrode. (<b>c</b>) Raman spectrum of pure graphene and graphene/PZT integrated film; (<b>d</b>) Test and structure schematic diagram of graphene/PZT device; (<b>e</b>) I–V output electrical transport test curve.</p>
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<p>(<b>a</b>) Photograph of graphene/PZT sample on mica substrate. Copper electrode with 300 μm thickness was deposited on surface of PZT film by magnetron sputtering equipment. The upper right image is a sample image under bending condition. (<b>b</b>) Working diagram of graphene/PZT device; (<b>c</b>,<b>d</b>) I–V output electrical transport test curve of 1 µm and 100 nm thickness, respectively.</p>
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11 pages, 1753 KiB  
Article
Optimization of a LaNiO3 Bottom Electrode for Flexible Pb(Zr,Ti)O3 Film-Based Ferroelectric Random Access Memory Applications
by Yeong Uk Choi, Hyun Soo Ahn, Jung Ehy Hong, Dong In Yang, Hwa-Pyeong Lee, Dae-Yong Jeong, Minbaek Lee, Jong Hun Kim and Jong Hoon Jung
Crystals 2023, 13(12), 1613; https://doi.org/10.3390/cryst13121613 - 21 Nov 2023
Cited by 1 | Viewed by 1647
Abstract
The direct growth of ferroelectric films onto flexible substrates has garnered significant interest in the advancement of portable and wearable electronic devices. However, the search for an optimized bottom electrode that can provide a large and stable remnant polarization is still ongoing. In [...] Read more.
The direct growth of ferroelectric films onto flexible substrates has garnered significant interest in the advancement of portable and wearable electronic devices. However, the search for an optimized bottom electrode that can provide a large and stable remnant polarization is still ongoing. In this study, we report the optimization of an oxide-based LaNiO3 (LNO) electrode for high-quality Pb(Zr0.52Ti0.48)O3 (PZT) thick films. The surface morphology and electrical conductivity of sol-gel-grown LNO films on a fluorophlogopite mica (F-mica) substrate were optimized at a crystallization temperature of 800 °C and a film thickness of 120 nm. Our approach represents the promising potential pairing between PZT and LNO electrodes. While LNO-coated F-mica maintains stable electrical conductivity during 1.0%-strain and 104-bending cycles, the upper PZT films exhibit a nearly square-like polarization–electric field behavior under those stress conditions. After 104 cycles at 0.5% strain, the remnant polarization shows decreases as small as ~14%. Under flat (bent) conditions, the value decreases to just 81% (49%) after 1010 fatigue cycles and to 96% (85%) after 105 s of a retention test, respectively. Full article
(This article belongs to the Special Issue Ferroelectric and Multiferroic Thin Films)
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<p>(<b>a</b>) Thermogravimetric analysis and (<b>b</b>) differential scanning calorimetry results of LaNiO<sub>3</sub> (LNO) solution. The solution undergoes drying at ~285 °C and crystallization at ~377 °C, showing a step-down and a bulb in the heat flow of (<b>b</b>), respectively. The red (and blue) arrow is used to indicate the drying (crystallization) temperature in (<b>a</b>,<b>b</b>), respectively. Crystallization temperature-dependent (<b>c</b>) X-ray diffraction pattern, (<b>d</b>) surface morphology, and (<b>e</b>) electrical resistivity at room temperature of LNO films on F-mica substrate. In (<b>c</b>), the impurity peaks of La(OH)<sub>3</sub> are marked with asterisks.</p>
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<p>(<b>a</b>) Digital image of a bent LNO film on the bending stage. (<b>b</b>) Schematic diagram of the strain calculation. Here <span class="html-italic">R<sub>Mica</sub></span>, <span class="html-italic">t<sub>Mica</sub></span>, and <span class="html-italic">t<sub>LNO</sub></span> represent the bending radius of the mica, the mica thickness, and the LNO thickness, respectively. (<b>c</b>) Strain- and (<b>d</b>) bending cycle-dependent resistance of LNO.</p>
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<p>(<b>a</b>) Digital image of a Pb(Zr,Ti)O<sub>3</sub> (PZT) film bent by human fingers. (<b>b</b>) X-ray diffraction pattern, (<b>c</b>) top view of atomic force microscopy, and (<b>d</b>) side view of scanning electron microscopy images of PZT films on LNO-coated F-mica substrate. (<b>e</b>) Polarization–electric field (<span class="html-italic">P</span>–<span class="html-italic">E</span>) at 1 kHz and (<b>f</b>) dielectric constant and loss tan δ of PZT films with different thicknesses of the LNO electrode.</p>
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<p>(<b>a</b>) Bending cycle-dependent remnant polarization. (<b>b</b>) Fatigue and (<b>c</b>) retention characteristics of flexible PZT films in flat and bent (convex) conditions. To characterize the imprint properties, the left and right inset of (<b>b</b>) present the initial and the post-10<sup>10</sup> cycle P-E hysteresis loops under the flat and bent condition, respectively.</p>
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18 pages, 10009 KiB  
Article
High-Sensitivity Piezoelectric MEMS Accelerometer for Vector Hydrophones
by Shuzheng Shi, Liyong Ma, Kai Kang, Jie Zhu, Jinjiang Hu, Hong Ma, Yongjun Pang and Zhanying Wang
Micromachines 2023, 14(8), 1598; https://doi.org/10.3390/mi14081598 - 14 Aug 2023
Cited by 2 | Viewed by 1988
Abstract
In response to the growing demand for high-sensitivity accelerometers in vector hydrophones, a piezoelectric MEMS accelerometer (PMA) was proposed, which has a four-cantilever beam integrated inertial mass unit structure, with the advantages of being lightweight and highly sensitive. A theoretical energy harvesting model [...] Read more.
In response to the growing demand for high-sensitivity accelerometers in vector hydrophones, a piezoelectric MEMS accelerometer (PMA) was proposed, which has a four-cantilever beam integrated inertial mass unit structure, with the advantages of being lightweight and highly sensitive. A theoretical energy harvesting model was established for the piezoelectric cantilever beam, and the geometric dimensions and structure of the microdevice were optimized to meet the vibration pickup conditions. The sol-gel and annealing technology was employed to prepare high-quality PZT thin films on silicon substrate, and accelerometer microdevices were manufactured by using MEMS technology. Furthermore, the MEMS accelerometer was packaged for testing on a vibration measuring platform. Test results show that the PMA has a resonant frequency of 2300 Hz. In addition, there is a good linear relationship between the input acceleration and the output voltage, with V = 8.412a − 0.212. The PMA not only has high sensitivity, but also has outstanding anti-interference ability. The accelerometer structure was integrated into a vector hydrophone for testing in a calibration system. The results show that the piezoelectric vector hydrophone (PVH) has a sensitivity of –178.99 dB@1000 Hz (0 dB = 1 V/μPa) and a bandwidth of 20~1100 Hz. Meanwhile, it exhibits a good “8” shape directivity and consistency of each channel. These results demonstrate that the piezoelectric MEMS accelerometer has excellent capabilities suitable for use in vector hydrophones. Full article
(This article belongs to the Special Issue MEMS Inertial Device)
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<p>Electromechanical conversion mode of piezoelectric material: (<b>a</b>) longitudinal mode <span class="html-italic">d</span><sub>31</sub> and (<b>b</b>) transverse mode <span class="html-italic">d</span><sub>33</sub>.</p>
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<p>The electrical charges generated on the single cantilever beam.</p>
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<p>Microstructure model: (<b>a</b>) the microstructure with four cantilever beams and an inertial mass unit, (<b>b</b>) coordinates and parameters of a single cantilever beam.</p>
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<p>Microstructural model in COMSOL Multiphysics.</p>
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<p>The effects of microstructural parameters on the resonant frequency and maximum stress: (<b>a</b>) the force analysis and deflection diagram of the microstructure, (<b>b</b>) relationship of the resonant frequency on the width and thickness of the beam, (<b>c</b>) relationship of the resonant frequency on the beam length and the inertial mass unit, (<b>d</b>) relationship of the maximum stress on the width and thickness of the beam, (<b>e</b>) relationship of the maximum stress on the beam length and the inertial mass unit.</p>
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<p>Modal analysis using COMSOL Multiphysics: (<b>a</b>) the deformation and stress distribution of the microstructure, (<b>b</b>) the 1st-ordered resonance, (<b>c</b>) the 2nd-ordered resonance, and (<b>d</b>) the 3rd-ordered resonance.</p>
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<p>Fabrication scheme of the MEMS piezoelectric microstructure: (<b>a</b>) SiO<sub>2</sub> grown by thermal oxidation. (<b>b</b>) Pt/Ti sputtered onto the SiO<sub>2</sub>/Si substrate. (<b>c</b>) PZT grown by sol-gel combined with the annealing process. (<b>d</b>,<b>e</b>) PZT, Pt/Ti, and SiO<sub>2</sub> pattern produced by photolithography and IBE. (<b>f</b>) Au/Ti was sputtered, followed by a peel-off process. (<b>g</b>,<b>h</b>) Cantilever beams and mass fabrication using lithography and etching by the RIE process.</p>
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<p>Morphological characterization of the PMA: (<b>a</b>) photos of the packaging equipment, indicating the electrodes on the base and cantilever beam, respectively, and (<b>b</b>) SEM images of cantilever beam cross-section, representing different thicknesses of PZT, Pt/Ti, SiO<sub>2</sub>, and silicon wafer layers, respectively.</p>
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<p>The vibration measurement system of the PMA: (<b>a</b>) vibration measuring platform, (<b>b</b>) flow chart of measurement system.</p>
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<p>Resonant frequency curve of PMA.</p>
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<p>No-load and load output voltage curve.</p>
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<p>Output voltage curves of the PMA under different accelerations from 1 g to 5 g at (<b>a</b>) 100 Hz and (<b>b</b>) 1000 Hz.</p>
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<p>Output voltage sensitivity of the PMA at 600 Hz, ranging from −5 g to 5 g.</p>
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<p>Measuring calibration system of the PVH: (<b>a</b>) test calibration system, (<b>b</b>) schematic diagram of hydrophone calibration device.</p>
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<p>Measuring calibration system and performance of the PVH: (<b>a</b>) comparison chart of hydrophone sensitivity curve and (<b>b</b>) the “8” character directivity diagram at 800 Hz.</p>
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13 pages, 11223 KiB  
Article
Biaxial Piezoelectric MEMS Mirrors with Low Absorption Coating for 1550 nm Long-Range LIDAR
by L. Mollard, J. Riu, S. Royo, C. Dieppedale, A. Hamelin, A. Koumela, T. Verdot, L. Frey, G. Le Rhun, G. Castellan and C. Licitra
Micromachines 2023, 14(5), 1019; https://doi.org/10.3390/mi14051019 - 9 May 2023
Cited by 6 | Viewed by 1997
Abstract
This paper presents the fabrication and characterization of a biaxial MEMS (MicroElectroMechanical System) scanner based on PZT (Lead Zirconate Titanate) which incorporates a low-absorption dielectric multilayer coating, i.e., a Bragg reflector. These 2 mm square MEMS mirrors, developed on 8-inch silicon wafers using [...] Read more.
This paper presents the fabrication and characterization of a biaxial MEMS (MicroElectroMechanical System) scanner based on PZT (Lead Zirconate Titanate) which incorporates a low-absorption dielectric multilayer coating, i.e., a Bragg reflector. These 2 mm square MEMS mirrors, developed on 8-inch silicon wafers using VLSI (Very Large Scale Integration) technology are intended for long-range (>100 m) LIDAR (LIght Detection And Ranging) applications using a 2 W (average power) pulsed laser at 1550 nm. For this laser power, the use of a standard metal reflector leads to damaging overheating. To solve this problem, we have developed and optimised a physical sputtering (PVD) Bragg reflector deposition process compatible with our sol-gel piezoelectric motor. Experimental absorption measurements, performed at 1550 nm and show up to 24 times lower incident power absorption than the best metallic reflective coating (Au). Furthermore, we validated that the characteristics of the PZT, as well as the performance of the Bragg mirrors in terms of optical scanning angles, were identical to those of the Au reflector. These results open up the possibility of increasing the laser power beyond 2W for LIDAR applications or other applications requiring high optical power. Finally, a packaged 2D scanner was integrated into a LIDAR system and three-dimensional point cloud images were obtained, demonstrating the scanning stability and operability of these 2D MEMS mirrors. Full article
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<p>Modal analysis of the mirror: (<b>a</b>) First resonance mode (1.51 kHz-pumping mode); second (<b>b</b>) and third (<b>c</b>) resonance modes (2.179 and 2.18 kHz–X/Y-rotational modes)–Design variant 1.</p>
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<p>MEMS mirror top view.</p>
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<p>Evolution of absorption (%) (<b>a</b>) and reflectivity (%) (<b>b</b>) of PVD Bragg bilayer mirror vs the number of Bragg bilayer–comparison with gold reflective layer.</p>
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<p>Magnitude/optical angle (▲) and Phase shift (●) for the first (Vpp = 3 V) (<b>a</b>) and second and third (Vpp = 4 V) (<b>b</b>) resonant modes–design variant 1.</p>
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<p>2D scanning representation of MEMS mirror with Bragg (n = 2) reflector-50 point per fast axis period–(<b>a</b>) Design variant 1:25 V voltage-600Hz fast/horizontal axis and 10 Hz ramp slow/vertical axis–(<b>b</b>) Design variant 3:20 V Voltage–200 Hz fast/Horizontal axis and 4 Hz ramp slow/vertical axis.</p>
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<p>2D scanning representation of MEMS mirror with Bragg (n = 2) reflector-50 point per fast axis period–20 V voltage-200 Hz fast/horizontal axis and 4 Hz ramp slow/vertical axis-(<b>a</b>) Design variant 4; (<b>b</b>) Design variant 5.</p>
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<p>FoM values previously reported in [<a href="#B3-micromachines-14-01019" class="html-bibr">3</a>] (▲) and this work (<span class="html-fig-inline" id="micromachines-14-01019-i021"><img alt="Micromachines 14 01019 i021" src="/micromachines/micromachines-14-01019/article_deploy/html/images/micromachines-14-01019-i021.png"/></span> Bragg (n = 2) and <span class="html-fig-inline" id="micromachines-14-01019-i022"><img alt="Micromachines 14 01019 i022" src="/micromachines/micromachines-14-01019/article_deploy/html/images/micromachines-14-01019-i022.png"/></span> Gold reflector).</p>
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<p>(<b>a</b>) Mirror packaging and (<b>b</b>) integration of the MEMS scanner inside Biaxial LIDAR system (Right).</p>
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<p>(<b>a</b>) View of the scene, (<b>b</b>) reflected laser intensity at 1064 nm and (<b>c</b>) depth value image.</p>
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<p>3D representation of the scene, Point Clouds.</p>
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11 pages, 2930 KiB  
Article
PZT Composite Film Preparation and Characterization Using a Method of Sol-Gel and Electrohydrodynamic Jet Printing
by Yan Cui, Hao Yu, Zeshan Abbas, Zixiang Wang, Lunxiang Wang and Dazhi Wang
Micromachines 2023, 14(5), 918; https://doi.org/10.3390/mi14050918 - 24 Apr 2023
Cited by 5 | Viewed by 2283
Abstract
Lead zircon titanate (PZT) composite films were advantageously prepared by a novel hybrid method of sol-gel and electrohydrodynamic jet (E-jet) printing. PZT thin films with thicknesses of 362 nm, 725 nm and 1092 nm were prepared on Ti/Pt bottom electrode via Sol-gel method, [...] Read more.
Lead zircon titanate (PZT) composite films were advantageously prepared by a novel hybrid method of sol-gel and electrohydrodynamic jet (E-jet) printing. PZT thin films with thicknesses of 362 nm, 725 nm and 1092 nm were prepared on Ti/Pt bottom electrode via Sol-gel method, and then the PZT thick films were printed on the base of the PZT thin films via E-jet printing to form PZT composite films. The physical structure and electrical properties of the PZT composite films were characterized. The experimental results showed that, compared with PZT thick films prepared via single E-jet printing method, PZT composite films had fewer micro-pore defects. Moreover, the better bonding with upper and lower electrodes and higher preferred orientation of crystals were examined. The piezoelectric properties, dielectric properties and leakage currents of the PZT composite films were obviously improved. The maximum piezoelectric constant of the PZT composite film with a thickness of 725 nm was 69.4 pC/N, the maximum relative dielectric constant was 827 and the leakage current was reduced to 1.5 × 10−6A at a test voltage of 200V. This hybrid method can be widely useful to print PZT composite films for the application of micro-nano devices. Full article
(This article belongs to the Section E:Engineering and Technology)
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<p>Illustration of the schematic of fabrication route of the PZT composite films (<b>a</b>) preparation of Ti/Pt bottom electrode (<b>b</b>) PZT thin films formation by spin coating (<b>c</b>) PZT thick films by E-jet deposition (<b>d</b>) preparation of Ti/Pt top electrode.</p>
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<p>The schematic diagram of E-jet deposition equipment set-up.</p>
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<p>The cross-section SEM image of the PZT thick film structures: (<b>a</b>) cross-section of the PZT thick film and its high-magnification image (<b>b</b>).</p>
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<p>The cross-section SEM images of the PZT composite films with thin film thicknesses of (<b>a</b>) 362 nm, (<b>b</b>) 765 nm and (<b>c</b>) 1095 nm.</p>
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<p>The XRD spectra of PZT composite films and PZT thick film with different thicknesses.</p>
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<p>The leakage current curves of the PZT composite films and the PZT thick film with different thicknesses.</p>
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<p>The relative dielectric constant of the PZT composite films and the PZT thick film with different thicknesses.</p>
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<p>The dielectric loss of the PZT composite films and the PZT thick film with different thicknesses.</p>
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12 pages, 4987 KiB  
Article
Printing Formation of Flexible (001)-Oriented PZT Films on Plastic Substrates
by Tomohiko Nakajima and Yuuki Kitanaka
Materials 2023, 16(5), 2116; https://doi.org/10.3390/ma16052116 - 6 Mar 2023
Cited by 1 | Viewed by 1692
Abstract
High-quality, uniaxially oriented, and flexible PbZr0.52Ti0.48O3 (PZT) films were fabricated on flexible RbLaNb2O7/BaTiO3 (RLNO/BTO)-coated polyimide (PI) substrates. All layers were fabricated by a photo-assisted chemical solution deposition (PCSD) process using KrF laser irradiation [...] Read more.
High-quality, uniaxially oriented, and flexible PbZr0.52Ti0.48O3 (PZT) films were fabricated on flexible RbLaNb2O7/BaTiO3 (RLNO/BTO)-coated polyimide (PI) substrates. All layers were fabricated by a photo-assisted chemical solution deposition (PCSD) process using KrF laser irradiation for photocrystallization of the printed precursors. The Dion–Jacobson perovskite RLNO thin films on flexible PI sheets were employed as seed layers for the uniaxially oriented growth of PZT films. To obtain the uniaxially oriented RLNO seed layer, a BTO nanoparticle-dispersion interlayer was fabricated to avoid PI substrate surface damage under excess photothermal heating, and the RLNO has been orientedly grown only at around 40 mJ·cm−2 at 300 °C. The prepared RLNO seed layer on the BTO/PI substrate showed very high (010)-oriented growth with a very high Lotgering factor (F(010) = 1.0). By using the flexible (010)-oriented RLNO film on BTO/PI, PZT film crystal growth was possible via KrF laser irradiation of a sol–gel-derived precursor film at 50 mJ·cm−2 at 300 °C. The obtained PZT film showed highly (001)-oriented growth on the flexible plastic substrates with F(001) = 0.92 without any micro-cracks. The RLNO was only uniaxial-oriented grown at the top part of the RLNO amorphous precursor layer. The oriented grown and amorphous phases of RLNO would have two important roles for this multilayered film formation: (1) triggering orientation growth of the PZT film at the top and (2) the stress relaxation of the underneath BTO layer to suppress the micro-crack formation. This is the first time that PZT films have been crystallized directly on flexible substrates. The combined processes of photocrystallization and chemical solution deposition are a cost-effective and highly on-demand process for the fabrication of flexible devices. Full article
(This article belongs to the Section Energy Materials)
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<p>Flow chart of fabrication procedure for the PZT/RLNO/BTO/PI layer structure.</p>
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<p>(<b>a</b>) XRD pattern irradiated laser fluence dependence for RLNO films on BTO/PI substrates prepared by the PCSD process. (<b>b</b>) Schematic layers and crystal structure of RLNO. The dotted line in the inset represents the simple perovskite unit cell. (<b>c</b>) XRD 2θ-β map of an RLNO film on BTO/PI prepared at a fluence of 40 mJ·cm<sup>−2</sup>. (<b>d</b>) β-scan for the 020 reflection. The blue line indicates the fitting for full width at half maximum (FWHM) evaluation.</p>
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<p>Numerically simulated temperature maps with depth (<span class="html-italic">d</span>) and time (<span class="html-italic">t</span>) for the amorphous precursor RLNO thin film on the PI substrate irradiated by a 40-mJ·cm<sup>−2</sup> KrF laser pulse (<b>a</b>) without and (<b>b</b>) with the BTO interlayer.</p>
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<p>Optical microscope images for RLNO/BTO/PI prepared by KrF laser irradiation at (<b>a</b>) 40 mJ·cm<sup>−2</sup> and (<b>b</b>) 55 mJ·cm<sup>−2</sup>.</p>
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<p>(<b>a</b>) Numerically simulated temperature maps across depth (<span class="html-italic">d</span>) and time (<span class="html-italic">t</span>) for the amorphous precursor RLNO thin film on a BTO/PI substrate irradiated at a KrF laser fluence of 35–55 mJ·cm<sup>−2</sup>. (<b>b</b>) Time dependence at the interface between RLNO and BTO (<span class="html-italic">d</span> = 120 nm) and depth dependence (<span class="html-italic">t</span> = 90 ns) of simulated temperature for the RLNO/BTO layers irradiated at a KrF laser fluence of 35–55 mJ·cm<sup>−2</sup>.</p>
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<p>XRD patterns and 2θ-β maps for PZT films prepared by the PCSD process at 50 mJ·cm<sup>−2</sup> on BTO/PI substrates (<b>a</b>) without and (<b>b</b>) with (010)-oriented RLNO seed layers. The inset shows the β-scan for the 001 spot of the PZT and the 020 spot of the RLNO films.</p>
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<p>Optical microscope images for the PZT films prepared by the PCSD process at 50 mJ·cm<sup>−2</sup> (<b>a</b>) without and (<b>b</b>) (010)-oriented RLNO seed layers.</p>
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<p>XTEM image of the PZT/RLNO/BTO/PI and high-resolution lattice image at the interface between PZT and the (010)-oriented RLNO film surface. o- and np- represent “oriented” and “nanoparticle-derived”, respectively.</p>
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<p>Schematic illustration of the PZT/RLNO/BTO/PI layer structure with the role of each layer. o-, a-, and np- represent “oriented”, “amorphous”, and “nanoparticle-derived”, respectively.</p>
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10 pages, 1860 KiB  
Article
Enhancement of Energy-Storage Density in PZT/PZO-Based Multilayer Ferroelectric Thin Films
by Jie Zhang, Yuanyuan Zhang, Qianqian Chen, Xuefeng Chen, Genshui Wang, Xianlin Dong, Jing Yang, Wei Bai and Xiaodong Tang
Nanomaterials 2021, 11(8), 2141; https://doi.org/10.3390/nano11082141 - 22 Aug 2021
Cited by 25 | Viewed by 3773
Abstract
PbZr0.35Ti0.65O3 (PZT), PbZrO3 (PZO), and PZT/PZO ferroelectric/antiferroelectric multilayer films were prepared on a Pt/Ti/SiO2/Si substrate using the sol–gel method. Microstructures and physical properties such as the polarization behaviors, leakage current, dielectric features, and energy-storage characteristics [...] Read more.
PbZr0.35Ti0.65O3 (PZT), PbZrO3 (PZO), and PZT/PZO ferroelectric/antiferroelectric multilayer films were prepared on a Pt/Ti/SiO2/Si substrate using the sol–gel method. Microstructures and physical properties such as the polarization behaviors, leakage current, dielectric features, and energy-storage characteristics of the three films were systematically explored. All electric field-dependent phase transitions, from sharp to diffused, can be tuned by layer structure, indicated by the polarization, shift current, and dielectric properties. The leakage current behaviors suggested that the layer structure could modulate the current mechanism, including space-charge-limited bulk conduction for single layer films and Schottky emission for multilayer thin films. The electric breakdown strength of a PZT/PZO multilayer structure can be further enhanced to 1760 kV/cm, which is higher than PZT (1162 kV/cm) and PZO (1373 kV/cm) films. A recoverable energy-storage density of 21.1 J/cm3 was received in PZT/PZO multilayers due to its high electric breakdown strength. Our results demonstrate that a multilayer structure is an effective method for enhancing energy-storage capacitors. Full article
(This article belongs to the Special Issue State-of-the-Art Nanophotonics Materials and Devices in China)
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<p>Schematic diagrams of the (<b>a</b>) PZT film, the (<b>b</b>) PZO film, and the (<b>c</b>) PZT/PZO multilayers, respectively.</p>
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<p>(<b>a</b>) XRD patterns of PZT, PZO, and PZT/PZO multilayer films grown on Pt(111)/Ti/SiO2/Si with linear y-scale at room temperature; (<b>b</b>) magnified XRD patterns around 2<span class="html-italic">θ</span> = 22; cross-section images of (<b>c</b>) PZT, (<b>d</b>) PZO, and (<b>e</b>) PZT/PZO multilayer films.</p>
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<p>(<b>a</b>–<b>c</b>) Hysteresis loops of PZT, PZO, and PZT/PZO multilayer films; (<b>d</b>) the switch current with the electric fields of PZT, PZO, and PZT/PZO multilayer films at room temperature.</p>
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<p>(<b>a</b>) Weibull plot of the breakdown electric field <span class="html-italic">E<sub>BDS</sub></span>; (<b>b</b>) analysis of current density behavior for PZT, PZO, and PZT/PZO multilayer films; space-charge-limited bulk conduction; (<b>c</b>) Schottky emission; (<b>d</b>) Poole-Frenkel emission.</p>
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<p>(<b>a</b>) The recoverable energy-storage density <span class="html-italic">W<sub>rec</sub></span>; (<b>b</b>) energy-storage efficiency η of PZT, PZO, and PZT/PZO multilayer films, as measured at the different external electric fields.</p>
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<p>Dielectric properties of (<b>a</b>) PZT, (<b>b</b>) PZO, and (<b>c</b>) PZT/PZO multilayer films as a function of DC electric field at 1 kHz; (<b>d</b>) frequency dependence dielectric properties from 1 to 1000 kHz at room temperature.</p>
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19 pages, 7556 KiB  
Article
Homogeneous versus Inhomogeneous Polarization Switching in PZT Thin Films: Impact of the Structural Quality and Correlation to the Negative Capacitance Effect
by Lucian Pintilie, Georgia Andra Boni, Cristina Florentina Chirila, Viorica Stancu, Lucian Trupina, Cosmin Marian Istrate, Cristian Radu and Ioana Pintilie
Nanomaterials 2021, 11(8), 2124; https://doi.org/10.3390/nano11082124 - 20 Aug 2021
Cited by 3 | Viewed by 2880
Abstract
Polarization switching in ferroelectric films is exploited in many applications, such as non-volatile memories and negative capacitance field affect transistors. This can be inhomogeneous or homogeneous, depending on if ferroelectric domains are forming or not during the switching process. The relation between the [...] Read more.
Polarization switching in ferroelectric films is exploited in many applications, such as non-volatile memories and negative capacitance field affect transistors. This can be inhomogeneous or homogeneous, depending on if ferroelectric domains are forming or not during the switching process. The relation between the polarization switching, the structural quality of the films and the negative capacitance was not studied in depth. Here, Pb(Zr0.2Ti0.8)O3 (PZT) layers were deposited by pulse laser deposition (PLD) and sol-gel (SG) on single crystal SrTiO3 (STO) and Si substrates, respectively. The structural quality was analyzed by X-ray diffraction and transmission electron microscopy, while the electric properties were investigated by performing hysteresis, dynamic dielectric measurements, and piezo-electric force microscopy analysis. It was found that the PZT layers grown by PLD on SRO/STO substrates are epitaxial while the layers deposited by SG on Pt/Si are polycrystalline. The polarization value decreases as the structure changes from epitaxial to polycrystalline, as well as the magnitude of the leakage current and of the differential negative capacitance, while the switching changes from homogeneous to inhomogeneous. The results are explained by the compensation rate of the depolarization field during the switching process, which is much faster in epitaxial films than in polycrystalline ones. Full article
(This article belongs to the Section Synthesis, Interfaces and Nanostructures)
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<p>(<b>a</b>) TEM image at low magnification of the PZT/SRO/STO structure and (<b>b</b>) the corresponding SAED pattern from an area which includes both the substrate and the thin films, (<b>c</b>) HRTEM image of the SRO/STO and SRO/PZT interfaces.</p>
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<p>(<b>a</b>) TEM image at low magnification of the PZT/Pt/SiOx/Si structure and (<b>b</b>) the corresponding SAED pattern performed on area which include both the substrate and the thin films. See also <a href="#app1-nanomaterials-11-02124" class="html-app">Figure S1</a> in <a href="#app1-nanomaterials-11-02124" class="html-app">Supplementary Materials</a> for the PZT layer deposited by sol-gel on STO substrate.</p>
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<p>(<b>a</b>,<b>b</b>) Polarization-voltage characteristics obtained for different amplitudes of the voltage pulse. (<b>c</b>,<b>d</b>) Specific capacitance obtained from the derivative of polarization-voltage loops. (<b>e</b>,<b>f</b>) Representation of the maximum values of the specific capacitance and of the current at maximum voltage as a function of amplitude of the voltage pulses. The results from the first column are attributed to the epitaxial PZT thin films deposited from commercial target and the results from the second column are attributed to the epitaxial PZT thin films deposited from “pure” target, respectively.</p>
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<p>(<b>a</b>,<b>b</b>) Polarization-voltage characteristics obtained for different amplitudes of the voltage pulse. (<b>c</b>,<b>d</b>) Specific capacitance obtained from the derivative of polarization-voltage loops. (<b>e</b>,<b>f</b>) Representation of the maximum values of the specific capacitance and of the current at maximum voltage as a function of amplitude of the voltage pulses. The results from the first column are attributed to polycrystalline PZT film deposited by spin-coating on the SRO/STO single crystal substrate (SRO deposited by PLD) and from the second column are attributed to polycrystalline PZT film deposited by spin-coating on Pt-coated Si substrate.</p>
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<p>The dependence of the equivalent parallel resistance (R_P), total capacitance (C_total) and parallel capacitance (C_P) on the voltage pulse amplitudes. First (<b>a</b>,<b>b</b>) and second (<b>c</b>,<b>d</b>) lines are attributed to the epitaxial PZT thin films deposited from the commercial target and from “pure” target, respectively. The 3rd (<b>e</b>,<b>f</b>) and 4th (<b>g</b>,<b>h</b>) lines are attributed to the polycrystalline PZT film deposited by spin-coating on the SRO/STO single crystal substrate (SRO deposited by PLD) and on the Pt-coated Si substrate, respectively.</p>
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<p>Topography (<b>a</b>), poling map (<b>b</b>) amplitude (<b>c</b>) and phase (<b>d</b>) of the PFM signal obtained after poling in the case of the PZT films deposited from commercial targets on a single crystal STO substrate with a bottom SRO electrode. The root mean square on the topography image (RMS) was estimated to about 0.5 nm.</p>
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<p>Topography (<b>a</b>), poling map (<b>b</b>) amplitude (<b>c</b>) and phase (<b>d</b>) of the PFM signal obtained after poling in the case of the PZT films deposited by sol-gel on an Si substrate with a bottom Pt electrode. The RMS was estimated to about 15 nm.</p>
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<p>The I-V characteristics for the films investigated in this study: PZT deposited from commercial target (PZT com); PZT deposited from the in-house made, pure target (PZT pure); PZT deposited by sol-gel on STO substrate with bottom SRO electrode (PZT sgSTO); and PZT deposited by sol-gel on an Si substrate with a bottom Pt electrode (PZT sgSi).</p>
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<p>Left-homogeneous polarization switching, without domain formation (there is no nucleation phase of domains with opposite orientations of polarization; polarization merely flips from one direction to the other). Right-inhomogeneous switching, with domain formation (nuclei with opposite directions of polarization occur first, then they grow and coalesce until polarization is switched in the entire volume).</p>
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22 pages, 3743 KiB  
Review
Synthesis, Microstructure and Properties of Magnetron Sputtered Lead Zirconate Titanate (PZT) Thin Film Coatings
by Youcao Ma, Jian Song, Xubo Wang, Yue Liu and Jia Zhou
Coatings 2021, 11(8), 944; https://doi.org/10.3390/coatings11080944 - 7 Aug 2021
Cited by 26 | Viewed by 5645
Abstract
Compared to aluminum nitride (AlN) with simple stoichiometry, lead zirconate titanate thin films (PZT) are the other promising candidate in advanced micro-electro-mechanical system (MEMS) devices due to their excellent piezoelectric and dielectric properties. The fabrication of PZT thin films with a large area [...] Read more.
Compared to aluminum nitride (AlN) with simple stoichiometry, lead zirconate titanate thin films (PZT) are the other promising candidate in advanced micro-electro-mechanical system (MEMS) devices due to their excellent piezoelectric and dielectric properties. The fabrication of PZT thin films with a large area is challenging but in urgent demand. Therefore, it is necessary to establish the relationships between synthesis parameters and specific properties. Compared to sol-gel and pulsed laser deposition techniques, this review highlights a magnetron sputtering technique owing to its high feasibility and controllability. In this review, we survey the microstructural characteristics of PZT thin films, as well as synthesis parameters (such as substrate, deposition temperature, gas atmosphere, and annealing temperature, etc.) and functional proper-ties (such as dielectric, piezoelectric, and ferroelectric, etc). The dependence of these influential factors is particularly emphasized in this review, which could provide experimental guidance for researchers to acquire PZT thin films with expected properties by a magnetron sputtering technique. Full article
(This article belongs to the Special Issue Nanocomposite Thin Film and Multilayers)
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<p>Schematic process of different fabrication methods for PZT thin films; (<b>a</b>) sol-gel including spin-coating and annealing based on chemical reactions. [<a href="#B13-coatings-11-00944" class="html-bibr">13</a>]; (<b>b</b>) pulsed laser deposition based on physical interactions by laser heating. Reprinted with permission from [<a href="#B14-coatings-11-00944" class="html-bibr">14</a>] Copyright 2010 Elsevier; (<b>c</b>) magnetron sputtering technique based on physical interactions by ion bombardment. Reprinted with permission from [<a href="#B11-coatings-11-00944" class="html-bibr">11</a>] Copyright 2018 John Wiley and Sons.</p>
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<p>Schematic diagram of (<b>a</b>) RF sputtering and (<b>b</b>) DC reactive sputtering. RF sputtering usually employs ceramic targets while DC reactive sputtering often applies to metal targets.</p>
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<p>Different target designs for DC reactive sputtering. Reprinted with permission from [<a href="#B22-coatings-11-00944" class="html-bibr">22</a>] Copyright 2005 Elsevier. (<b>a</b>) Zr–Ti alloy with Pb in the center; (<b>b</b>) Zr–Ti alloy with Pb cylinders on the surface; (<b>c</b>) Zr target with Pb cylinders and Ti cylinders on the surface; (<b>d</b>) Zr–Ti alloy with flabellate distribution and Pb cylinders on the surface; (<b>e</b>) Pb target with fan-shaped Zr–Ti alloy in the center; (<b>f</b>) Zr–Ti–Pb ternary alloy target with flabellate distribution.</p>
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<p>(<b>a</b>) Orientation changes of PZT thin films deposited on different substrate; The longitudinal axis represents the relative ratio of different orientations. Reprinted with permission from [<a href="#B27-coatings-11-00944" class="html-bibr">27</a>] Copyright 1991 The Physical Society of Japan and The Japan Society of Applied Physics; (<b>b</b>) Pb/(Zr + Ti) compositional ratio in PZT thin films as a function of Ti/Pt ratio. Reprinted with permission from [<a href="#B30-coatings-11-00944" class="html-bibr">30</a>] Copyright 1991 The Physical Society of Japan and The Japan Society of Applied Physics; (<b>c</b>) models for diffusion of Ti through Pt grain boundaries in Ar (upper) and O<sub>2</sub> (lower) atmosphere. Reprinted with permission from [<a href="#B31-coatings-11-00944" class="html-bibr">31</a>] Copyright 1998 The Physical Society of Japan and The Japan Society of Applied Physics; XRD patterns of as-deposited and post-annealed PZT thin films (<b>d</b>) without and (<b>e</b>) with PZT seed layer. Reprinted with permission from [<a href="#B11-coatings-11-00944" class="html-bibr">11</a>] Copyright 2018 John Wiley and Sons.</p>
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<p>(<b>a</b>) Variation of Pb content and Zr/Ti ratio as a function of deposition temperature. Reprinted with permission from [<a href="#B39-coatings-11-00944" class="html-bibr">39</a>] Copyright 1988 AIP Publishing; (<b>b</b>) temperature dependence on the phase structure of PZT thin films. Reprinted with permission from [<a href="#B41-coatings-11-00944" class="html-bibr">41</a>] Copyright 1977 AIP Publishing; (<b>c</b>) XRD patterns of PZT thin films deposited at different temperature. Reprinted with permission from [<a href="#B45-coatings-11-00944" class="html-bibr">45</a>] Copyright 2000 Elsevier; (<b>d</b>) variation of grain size with deposition temperature. Reprinted with permission from [<a href="#B46-coatings-11-00944" class="html-bibr">46</a>] Copyright 1983 AIP Publishing.</p>
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<p>(<b>a</b>) Pressure dependence of film composition. Reprinted with permission from [<a href="#B47-coatings-11-00944" class="html-bibr">47</a>] Copyright 1997 Elsevier; (<b>b</b>) schematic phase diagram of PZT thin films as a function of pressure and deposition temperature; the inset is surface morphology of samples A–C. Reprinted with permission from [<a href="#B11-coatings-11-00944" class="html-bibr">11</a>] Copyright 2018 John Wiley and Sons; (<b>c</b>) phase structure and orientation evolutions of PZT thin film deposited at different pressure [<a href="#B49-coatings-11-00944" class="html-bibr">49</a>]; (<b>d</b>) XRD patterns of PZT thin film deposited at different O<sub>2</sub>/Ar ratios. Reprinted with permission from [<a href="#B50-coatings-11-00944" class="html-bibr">50</a>] Copyright 2000 Elsevier.</p>
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<p>(<b>a</b>) XRD patterns of PZT thin films annealed at different temperatures. Reprinted with permission from [<a href="#B45-coatings-11-00944" class="html-bibr">45</a>] Copyright 2000 Elsevier; (<b>b</b>) correlations among deposition temperature, annealing temperature and relative content of perovskite phase in total phases of the PZT thin films. Reprinted with permission from [<a href="#B45-coatings-11-00944" class="html-bibr">45</a>] Copyright 2000 Elsevier; (<b>c</b>) grain size as a function of annealing temperature for PZT thin films deposited at different temperature (25 and 200 °C). Reprinted with permission from [<a href="#B55-coatings-11-00944" class="html-bibr">55</a>] Copyright 1989 Elsevier; (<b>d</b>) XRD patterns of as-deposited (×1/2), TA treated (×10) and RTA treated (×1) PZT thin films. Reprinted with permission from [<a href="#B56-coatings-11-00944" class="html-bibr">56</a>] Copyright 1993 The Physical Society of Japan and The Japan Society of Applied Physics.</p>
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<p>(<b>a</b>) Relations of relative dielectric constant ε<sub>r</sub> and Zr/Ti ratio in PZT thin films. Reprinted with permission from [<a href="#B55-coatings-11-00944" class="html-bibr">55</a>] Copyright 1989 Elsevier; (<b>b</b>) influences of Pb content on ε<sub>r</sub>. Reprinted with permission from [<a href="#B66-coatings-11-00944" class="html-bibr">66</a>] Copyright 1992 The Physical Society of Japan and The Japan Society of Applied Physics; (<b>c</b>) dependence of orientation and film thickness on ε<sub>r</sub> [<a href="#B69-coatings-11-00944" class="html-bibr">69</a>]; (<b>d</b>) effects of ε<sub>r</sub> on the grain size and frequency. Reprinted with permission from [<a href="#B70-coatings-11-00944" class="html-bibr">70</a>] Copyright 2002 Elsevier.</p>
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<p>(<b>a</b>) Piezoelectric constant d<sub>33</sub> of PZT thin films according to the composition. Reprinted with permission from [<a href="#B73-coatings-11-00944" class="html-bibr">73</a>] Copyright 2013 Elsevier; (<b>b</b>) dependence of orientation on d<sub>33</sub> under different electric field. Reprinted with permission from [<a href="#B75-coatings-11-00944" class="html-bibr">75</a>] Copyright 2000 AIP Publishing; (<b>c</b>) relationships between grain size and piezoelectric constant d<sub>31</sub>. Reprinted with permission from [<a href="#B76-coatings-11-00944" class="html-bibr">76</a>] Copyright 1999 Taylor &amp; Francis; (<b>d</b>) dependence of d<sub>33</sub> on PZT thin film thickness. Reprinted with permission from [<a href="#B73-coatings-11-00944" class="html-bibr">73</a>] Copyright 2013 Elsevier.</p>
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<p>(<b>a</b>) Variation of P<sub>r</sub> as a function of composition (Zr/Ti ratio) and orientation. Reprinted with permission from [<a href="#B81-coatings-11-00944" class="html-bibr">81</a>] Copyright 2004 AIP Publishing; (<b>b</b>) composition and orientation dependences of E<sub>c</sub> for PZT thin films. Reprinted with permission from [<a href="#B81-coatings-11-00944" class="html-bibr">81</a>] Copyright 2004 AIP Publishing; (<b>c</b>) composition variations of P<sub>r</sub> and E<sub>c</sub> values for PZT thin films. Reprinted with permission from [<a href="#B83-coatings-11-00944" class="html-bibr">83</a>] Copyright 1997 AIP Publishing; (<b>d</b>) thickness dependence of ferroelectric properties of PZT thin films. Reprinted with permission from [<a href="#B35-coatings-11-00944" class="html-bibr">35</a>] Copyright 1999 Elsevier.</p>
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<p>(<b>a</b>) Optical absorption spectroscopies of PZT thin films with perovskite and pyrochlore structure. Reprinted with permission from [<a href="#B41-coatings-11-00944" class="html-bibr">41</a>] Copyright 1977 AIP Publishing; (<b>b</b>) variation of optical indexes of refraction (632.8 nm) with composition for PZT thin films. Reprinted with permission from [<a href="#B82-coatings-11-00944" class="html-bibr">82</a>] Copyright 1997 AIP Publishing; (<b>c</b>) dependence of film composition on pyroelectric coefficient γ. Reprinted with permission from [<a href="#B84-coatings-11-00944" class="html-bibr">84</a>] Copyright 1989 AIP Publishing; (<b>d</b>) Influences of film thickness on γ. Reprinted with permission from [<a href="#B85-coatings-11-00944" class="html-bibr">85</a>] Copyright 2003 The Physical Society of Japan and The Japan Society of Applied Physics.</p>
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<p>Relationships between fabrication, microstructure and property of PZT film. Picture in the center represents PZT thin film on 3-inch platinized silicon substrate by magnetron sputtering technique in our group.</p>
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12 pages, 4208 KiB  
Article
An Electric Field Microsensor with Mutual Shielding Electrodes
by Hucheng Lei, Shanhong Xia, Zhaozhi Chu, Biyun Ling, Chunrong Peng, Zhouwei Zhang, Jun Liu and Wei Zhang
Micromachines 2021, 12(4), 360; https://doi.org/10.3390/mi12040360 - 26 Mar 2021
Cited by 14 | Viewed by 2365
Abstract
This paper proposes an electric field microsensor (EFM) with mutual shielding electrodes. Based on the charge-induction principle, the EFM consists of fixed electrodes and piezoelectric-driving vertically-movable electrodes. All the fixed electrodes and movable electrodes work as both sensing electrodes and shielding electrodes. In [...] Read more.
This paper proposes an electric field microsensor (EFM) with mutual shielding electrodes. Based on the charge-induction principle, the EFM consists of fixed electrodes and piezoelectric-driving vertically-movable electrodes. All the fixed electrodes and movable electrodes work as both sensing electrodes and shielding electrodes. In other words, all the fixed and movable electrodes are sensing electrodes, and they are mutually shielding electrodes simultaneously. The movable electrodes are driven to periodically modulate the electric field distribution at themselves and the fixed electrodes, and the induced currents from both movable and fixed electrodes are generated simultaneously. The electrode structure adopts an interdigital structure, and the EFM has been simulated by finite element methods. Simulation results show that, since the sensing area of this EFM is doubled, the variation of induced charge is twice, and therefore the output signal of the sensor is increased. The piezoelectric material, lead zirconate titanate (PZT), is prepared by the sol–gel method, and the microsensor chip is fabricated. Full article
(This article belongs to the Section A:Physics)
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<p>Schematic view of electric field microsensor (EFM) structure.</p>
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<p>Working principle of the EFM.</p>
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<p>Electrodes setting. (<b>a</b>) Interdigital structure. (<b>b</b>) Comb-shaped structure.</p>
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<p>Simulation model. (<b>a</b>) Stationary state. (<b>b</b>) Moving state.</p>
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<p>The relationship among parameter B, g and w. (<b>a</b>) The parameter B versus the electrode gap(g) under different electrode widths. (<b>b</b>) The parameter B versus the electrode width (w) under different electrode gaps.</p>
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<p>Vector-graph of electric field distribution at the electrodes. (<b>a</b>) Stationary state. (<b>b</b>) Moving state.</p>
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<p>The variation of induced charge on electrodes versus the displacement of the movable electrodes.</p>
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<p>The lead zirconate titanate (PZT) sol.</p>
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<p>Main steps of the fabrication process. (<b>a</b>) Growing thermal SiO<sub>2</sub>. (<b>b</b>) Sputtering and patterning metal materials. (<b>c</b>) Depositing and patterning piezoelectric material. (<b>d</b>) Sputtering and patterning metal materials. (<b>e</b>) Patterning thermal SiO<sub>2</sub>. (<b>f</b>) Etching the top silicon layer. (<b>g</b>) Spin-coating protective materials. (<b>h</b>) Removing the oxides and etching the substrate silicon. (<b>i</b>) Remov-ing protective materials.</p>
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<p>X-ray diffraction (XRD) of the PZT film. The crystal orientations of the PZT film along the (110), (111) and (211) directions have diffraction intensity, while there is almost no diffraction intensity at other diffraction angles; the PZT film has the highest diffraction intensity along the (111) direction.</p>
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<p>Scanning electron micrograph (SEM) photos of the microsensor chip. The widths of the fixed and movable electrodes are both 5 μm; the gap between the fixed and movable electrodes is 5 μm.</p>
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14 pages, 4643 KiB  
Article
A Piezoelectric Wave-Energy Converter Equipped with a Geared-Linkage-Based Frequency Up-Conversion Mechanism
by Shao-En Chen, Ray-Yeng Yang, Guang-Kai Wu and Chia-Che Wu
Sensors 2021, 21(1), 204; https://doi.org/10.3390/s21010204 - 30 Dec 2020
Cited by 19 | Viewed by 4422
Abstract
In this paper, a piezoelectric wave-energy converter (PWEC), consisting of a buoy, a frequency up-conversion mechanism, and a piezoelectric power-generator component, is developed. The frequency up-conversion mechanism consists of a gear train and geared-linkage mechanism, which converted lower frequencies of wave motion into [...] Read more.
In this paper, a piezoelectric wave-energy converter (PWEC), consisting of a buoy, a frequency up-conversion mechanism, and a piezoelectric power-generator component, is developed. The frequency up-conversion mechanism consists of a gear train and geared-linkage mechanism, which converted lower frequencies of wave motion into higher frequencies of mechanical motion. The slider had a six-period displacement compared to the wave motion and was used to excite the piezoelectric power-generation component. Therefore, the operating frequency of the piezoelectric power-generation component was six times the frequency of the wave motion. The developed, flexible piezoelectric composite films of the generator component were used to generate electrical voltage. The piezoelectric film was composed of a copper/nickel foil as the substrate, lead–zirconium–titanium (PZT) material as the piezoelectric layer, and silver material as an upper-electrode layer. The sol-gel process was used to fabricate the PZT layer. The developed PWEC was tested in the wave flume at the Tainan Hydraulics Laboratory, Taiwan (THL). The maximum height and the minimum period were set to 100 mm and 1 s, respectively. The maximum voltage of the measured value was 2.8 V. The root-mean-square (RMS) voltage was 824 mV, which was measured through connection to an external 495 kΩ resistive load. The average electric power was 1.37 μW. Full article
(This article belongs to the Section Electronic Sensors)
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<p>Schematic diagrams of the piezoelectric wave-energy converter. (<b>a</b>) Piezoelectric wave-energy converter; (<b>b</b>) frequency up-conversion mechanism; (<b>c</b>) piezoelectric power-generation component.</p>
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<p>Schematic diagrams of the piezoelectric power-generation component. (<b>a</b>) Piezoelectric-power-generation component; (<b>b</b>) slider located at the equilibrium point; (<b>c</b>) slider upward; (<b>d</b>) slider downward.</p>
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<p>Schematic diagram of the frequency up-conversion mechanism.</p>
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<p>Schematic view of the experimental setup.</p>
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<p>The result of the flexible piezoelectric composite film. (<b>a</b>) The four-plate structures of piezoelectric film; (<b>b</b>) SEM image; (<b>c</b>) X-ray diffraction (XRD) results; (<b>d</b>) capacitance test.</p>
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<p>Wave height and buoy displacement.</p>
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<p>The displacement result of the slider.</p>
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<p>Spectra of the slider and buoy motion as a function of wave frequency in Case 1.</p>
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<p>The measured voltage output of the PWEC in each case.</p>
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9 pages, 6563 KiB  
Article
Energy Storage Performance of Sandwich Structured Pb(Zr0.4Ti0.6)O3/BaZr0.2Ti0.8O3/Pb(Zr0.4Ti0.6)O3 Films
by Jinxin Gu, Qiu Sun, Xiangqun Chen, Ying Song, YiLun Tang, Dongbo Wang and Ping Qu
Crystals 2019, 9(11), 575; https://doi.org/10.3390/cryst9110575 - 1 Nov 2019
Cited by 10 | Viewed by 2565
Abstract
We reported a sandwich structured Pb(Zr0.4Ti0.6)O3/BaZr0.2Ti0.8O3/Pb(Zr0.4Ti0.6)O3 (PZT/BZT/PZT) film fabricated by using the sol–gel method, which was dense and uniform with a unique perovskite structure. The PZT/BZT/PZT [...] Read more.
We reported a sandwich structured Pb(Zr0.4Ti0.6)O3/BaZr0.2Ti0.8O3/Pb(Zr0.4Ti0.6)O3 (PZT/BZT/PZT) film fabricated by using the sol–gel method, which was dense and uniform with a unique perovskite structure. The PZT/BZT/PZT films displayed high dielectric constants up to 1722.45 at the frequency of 10 kHz. Additionally, the enhanced energy storage density of 39.27 J·cm−3 was achieved at room temperature and 2.00 MV/cm, which was higher than that of the individual BaZr0.2Ti0.8O3 film (21.28 J·cm−3). Furthermore, the energy storage density and efficiency of PZT/BZT/PZT film increased slightly with the increasing temperature from −140 °C to 200 °C. This work proves the feasibility and effectiveness of a sandwich structure in improving dielectric, leakage, and energy storage performances, providing a new paradigm for high-energy–density dielectrics applications. Full article
(This article belongs to the Section Inorganic Crystalline Materials)
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<p>The low angle XRD patterns for the BZT and PZT/BZT/PZT thin films.</p>
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<p>Surface SEM images of (<b>a</b>) BZT and (<b>b</b>) PZT/BZT/PZT thin films; (<b>c</b>) and (<b>d</b>) are the corresponding cross-sectional SEM images of (<b>a</b>) and (<b>b</b>), respectively.</p>
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<p>(<b>a</b>) Temperature, (<b>b</b>) frequency, and (<b>c</b>) voltage dependence of dielectric constant ε (upper curves) and loss tanδ (lower curves).</p>
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<p>Leakage current densities for BZT and PZT/BZT/PZT films under different temperatures. (<b>a</b>) 30 °C and (<b>b</b>) 50 °C.</p>
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<p>(<b>a</b>) P–E loop of the BZT and PZT/BZT/PZT thin films under 30 °C and 2 MV∙cm<sup>−1</sup>; the maximum polarization of the BZT and PZT/BZT/PZT thin films under (<b>b</b>) different electric fields and (<b>c</b>) different temperatures.</p>
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<p>Energy storage properties of the BZT and PZT/BZT/PZT thin films under (<b>a</b>) different electric fields and (<b>b</b>) different temperatures.</p>
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10 pages, 3015 KiB  
Article
Thickness Dependence of Ferroelectric and Optical Properties in Pb(Zr0.53Ti0.47)O3 Thin Films
by Jian He, Fen Li, Xi Chen, Shuo Qian, Wenping Geng, Kaixi Bi, Jiliang Mu, Xiaojuan Hou and Xiujian Chou
Sensors 2019, 19(19), 4073; https://doi.org/10.3390/s19194073 - 20 Sep 2019
Cited by 10 | Viewed by 3499
Abstract
As a promising functional material, ferroelectric Pb(ZrxTi1−x)O3 (PZT) are widely used in many optical and electronic devices. Remarkably, as the film thickness decreases, the materials’ properties deviate gradually from those of solid materials. In this work, multilayered [...] Read more.
As a promising functional material, ferroelectric Pb(ZrxTi1−x)O3 (PZT) are widely used in many optical and electronic devices. Remarkably, as the film thickness decreases, the materials’ properties deviate gradually from those of solid materials. In this work, multilayered PZT thin films with different thicknesses are fabricated by Sol-Gel technique. The thickness effect on its microstructure, ferroelectric, and optical properties has been studied. It is found that the surface quality and the crystalline structure vary with the film thickness. Moreover, the increasing film thickness results in a significant increase in remnant polarization, due to the interfacial layer effect. Meanwhile, the dielectric loss and tunability are strongly dependent on thickness. In terms of optical properties, the refractive index of PZT films increase with the increasing thickness, and the photorefractive effect are also influenced by the thickness, which could all be related to the film density and photovoltaic effect. Besides, the band gap decreases as the film thickness increases. This work is significant for the application of PZT thin film in optical and optoelectronic devices. Full article
(This article belongs to the Section Sensor Materials)
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<p>The schematic diagram of sol-gel process of Pb(Zr<sub>0.53</sub>Ti<sub>0.47</sub>)O<sub>3</sub> film.</p>
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<p>(<b>a</b>) XRD pattern of PZT films prepared on Pt/Ti/SiO<sub>2</sub>/Si substrates with different thicknesses <span class="html-italic">a</span>. (<b>b</b>) AFM surface morphology in area of 2 μm × 2 μm of PZT-8. Top-view of (<b>c</b>) PZT-4, (<b>d</b>) PZT-6 and (<b>e</b>) PZT-8 and (<b>f</b>) cross-sectional SEM images of PZT-8. The inset of <a href="#sensors-19-04073-f002" class="html-fig">Figure 2</a>a presents the local enlargement of (111) orientation.</p>
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<p>(<b>a</b>) Hysteresis loops and (<b>b</b>) permittivity <span class="html-italic">vs</span> voltage curves of PZT film with different thicknesses. The inset of (<b>b</b>) present dielectric loss and dielectric tunability of PZT film with different thickness.</p>
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<p>Spectra of the ellipometric parameters (<b>a</b>) <span class="html-italic">Ψ</span> and (<b>b</b>) Δ at room temperature as functions of wavelength for the PZT thin films with different thickness at (<b>a</b>) 90 nm, (<b>b</b>) 164 nm and (<b>c</b>) 252 nm.</p>
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<p>(<b>a</b>) Dielectric function and (<b>b</b>) (<span class="html-italic">n</span>, <span class="html-italic">k</span>) spectra of PZT thin film with different thickness calculated from the Tauc-Lorentz model.</p>
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<p>(<b>a</b>) absorption coefficient <span class="html-italic">α</span> and (<b>b</b>) the plot of (<span class="html-italic">αhv</span>)<sup>2</sup> vs. <span class="html-italic">hv</span> for PZT film with different thickness.</p>
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16 pages, 4460 KiB  
Article
PZT/PZT and PZT/BiT Composite Piezo-Sensors in Aerospace SHM Applications: Photochemical Metal Organic + Infiltration Deposition and Characterization
by Hamidreza Hoshyarmanesh, Nafiseh Ebrahimi, Amir Jafari, Parisa Hoshyarmanesh, Minjae Kim and Hyung-Ho Park
Sensors 2019, 19(1), 13; https://doi.org/10.3390/s19010013 - 20 Dec 2018
Cited by 22 | Viewed by 6538
Abstract
The composition of fine-ground lead zirconate-titanate powder Pb(Zr0.52Ti0.48)O3, suspended in PZT and bismuth titanate (BiT) solutions, is deposited on the curved surface of IN718 and IN738 nickel-based supper alloy substrates up to 100 µm thickness. Photochemical metal [...] Read more.
The composition of fine-ground lead zirconate-titanate powder Pb(Zr0.52Ti0.48)O3, suspended in PZT and bismuth titanate (BiT) solutions, is deposited on the curved surface of IN718 and IN738 nickel-based supper alloy substrates up to 100 µm thickness. Photochemical metal organic and infiltration techniques are implemented to produce smooth, semi-dense, and crack-free random orientated thick piezoelectric films as piezo-sensors, free of any dopants or thickening polymers. Every single layer of the deposited films is heated at 200 °C with 10 wt.% excess PbO, irradiated by ultraviolet lamp (365 nm, 6 watt) for 10 min, pyrolyzed at 400 °C, and subsequently annealed at 700 °C for one hour. This process is repeated successively until reaching the desired thickness. Au and Pt thin films are deposited as the bottom and top electrodes using evaporation and sputtering methods, respectively. PZT/PZT and PZT/BiT composite films are then characterized and compared to similar PZT and BiT thick films deposited on the similar substrates. The effect of the composition and deposition process is also investigated on the crystalline phase development and microstructure morphology as well as the dielectric, ferroelectric, and piezoelectric properties of piezo-films. The maximum remnant polarization of Pr = 22.37 ± 0.01, 30.01 ± 0.01 µC/cm2, the permittivity of εr = 298 ± 3, 566 ± 5, and piezoelectric charge coefficient of d33 = 126, 148 m/V were measured versus the minimum coercive field of Ec = 50, 20 kV/cm for the PZT/PZT and PZT/BiT thick films, respectively. The thick film piezo-sensors are developed to be potentially used at frequency bandwidth of 1–5 MHz for rotary structural health monitoring and also in other industrial or medical applications as a transceiver. Full article
(This article belongs to the Special Issue Intelligent Sensors Applications in Aerospace)
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Graphical abstract
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<p>The consecutive steps of hybrid sol-gel deposition including the mixture of piezoelectric powder and precursor solution, injection, drying, ultra violet (UV) irradiation, pyrolyzing, and annealing.</p>
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<p>(<b>a</b>) 5-layer PZT/PZT on flat silicon substrate and (<b>b</b>) 5-layer PZT/bismuth titanate (BiT) composite film on curved superalloy substrate, both derived from PMOD sol-gel method.</p>
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<p>Deposition of the composite piezoelectric films on the curved surface of superalloy blades using the hybrid sol–gel-infiltration method, (<b>a</b>) JT8D L<sub>1</sub> and (<b>b</b>) Ruston-TA S<sub>5</sub>.</p>
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<p>Optical microscopic images, composite films of (<b>a</b>) PZT/PZT on S<sub>5</sub> and (<b>b</b>) PZT/BiT on L<sub>5</sub>.</p>
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<p>SEM images captured from hybrid thick films of type 5[C + 2S] (<b>a</b>,<b>b</b>) PZT/PZT of 30 μm thickness, and (<b>c</b>,<b>d</b>) PZT/BiT of 50 μm thickness.</p>
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<p>X-ray diffraction (XRD) patterns for (<b>a</b>) PZT/PZT and (<b>b</b>) PZT/BiT thick composite films.</p>
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<p>Capacitance-voltage (<span class="html-italic">C-V</span>) hysteresis loop of L<sub>1</sub>-B thick film sample according to the Sawyer-Tower method.</p>
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<p>Capacitance-temperature (<span class="html-italic">C-T</span>) variations for the PZT/BiT films at 25–420 °C, (<b>a</b>) L<sub>1</sub>-A and (<b>b</b>) L<sub>1</sub>-B.</p>
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<p>The <span class="html-italic">C-T</span> variations for the PZT/PZT films at 25–330 °C, (<b>a</b>) L<sub>3</sub>-A and (<b>b</b>) L<sub>3</sub>-B.</p>
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<p>Variation of dielectric permittivity in piezoelectric composite films of [<span class="html-italic">k</span><sub>1</sub>C + <span class="html-italic">k</span><sub>2</sub>S] structure.</p>
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<p>Ferroelectric (<span class="html-italic">P-E</span>) hysteresis loop for the composite piezo-films: (<b>a</b>) L<sub>1</sub>-A and (<b>b</b>) L<sub>1</sub>-B.</p>
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<p>Current to voltage converter circuit for the piezoelectric films undergone the <span class="html-italic">P-E</span> hysteresis loop measurement [<a href="#B41-sensors-19-00013" class="html-bibr">41</a>].</p>
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