Design and Analysis of a Fluid-Filled RF MEMS Switch
<p>Cross-section of the RF MEMS capacitive shunt switch.</p> "> Figure 2
<p>3D view of the RF MEMS capacitive shunt switch.</p> "> Figure 3
<p>3D schematic of the RF-MEMS capacitive switch.</p> "> Figure 4
<p>RF MEMS switch preparation process.</p> "> Figure 4 Cont.
<p>RF MEMS switch preparation process.</p> "> Figure 5
<p>The relationship curves between the deflection of the switch and the control voltage filled with different materials: (<b>a</b>) the surrounding dielectric is air; (<b>b</b>) the surrounding dielectric is glycerol; (<b>c</b>) the surrounding dielectric is silicone oil; (<b>d</b>) the surrounding dielectric is water.</p> "> Figure 5 Cont.
<p>The relationship curves between the deflection of the switch and the control voltage filled with different materials: (<b>a</b>) the surrounding dielectric is air; (<b>b</b>) the surrounding dielectric is glycerol; (<b>c</b>) the surrounding dielectric is silicone oil; (<b>d</b>) the surrounding dielectric is water.</p> "> Figure 6
<p>Curves of response time and driving voltage of different material filled switches.</p> "> Figure 7
<p>Curves of relation between impact velocity and driving voltage of different material filled switches.</p> "> Figure 8
<p>Changes in switch capacitance after RF MEMS switch was filled with different materials: (<b>a</b>) air; (<b>b</b>) glycerol; (<b>c</b>) silicone; (<b>d</b>) water.</p> "> Figure 9
<p>(<b>a</b>) Insertion loss when the switch is in the open state; (<b>b</b>) isolation when the switch is in the down state.</p> ">
Abstract
:1. Introduction
2. Analysis of the Structure and Working Principle of the Switch
2.1. The Working Process of Capacitive RF MEMS Switch
- (1)
- The initial state of the switch (up state), in which no driving voltage is applied, the switch is equivalent to two small capacitors in series, as shown below:In contrast to the classical capacitance equation, is added to calculate the capacitance, making it easier to compare the results of the simulation with the actual calculation afterwards. Where, , , and are the dielectric constants of the air, the insulating dielectric layer, and the filling medium, respectively; is the width of the cantilever beam; is the width of the central conduction strip; is the initial distance between the cantilever beam and the insulating dielectric layer; is the thickness of the insulating dielectric layer; is the dielectric constant of the insulating dielectric layer. is the edge capacitance, which usually accounts for 20–60% of the capacitance value of the parallel plate. In the state, the edge capacitance cannot be ignored. Because is small, the signal of the central guide band can be transmitted almost without attenuation during the transmission process.
- (2)
- When a certain driving voltage is applied to the cantilever beam, the switch is in a pull-down state, and the equivalent capacitance between the insulating dielectric layer and cantilever beam increases rapidly, as the same time, it is necessary to consider the effect of filling medium on capacitance, so the following is introduced:
- (3)
- When the switch is pulled down to come in contact with the insulating dielectric layer (down state), the equivalent capacitance of the cantilever beam and the insulating dielectric layer reaches the maximum in this case, it can be equivalent to a large capacitance. Considering the influence of insulating medium on capacitors, the following formula is defined:
- (4)
- After the driving voltage is removed, the electrostatic force on the cantilever beam is reduced, and the switch returns is restored to state through mechanical restoring force. At this point, the mechanical force on the switch is much larger than the viscous force of the insulating medium, so its effect can be ignored.
2.2. Calculation of RF MEMS Switch Pull-Down Voltage
2.3. Calculation of RF MEMS Switching Time
2.4. Capacitance Ratio of RF MEMS Switch
2.5. Loss of RF MEMS Switch
2.6. Isolation of RF MEMS Switch
3. Manufacturing Method of Switch
- Step 1:
- Select silicon with high resistivity as the substrate material and form an oxide layer on the substrate surface by dry-wet-dry thermal oxidation process to make the substrate have good electrical insulation and prevent current leakage. See Figure 4a below.
- Step 2:
- Forming signal lines and bottom electrodes of Cr-Au alloy by RF sputtering with positive adhesive stripping. See Figure 4b below.
- Step 3:
- Sputtering a layer of SiN bilayer dielectric film, covering the CPW central signal line as an insulating layer, the thickness is 150/50 nm. See Figure 4c below.
- Step 4:
- Evaporation of 3 μm thick AI, wet corrosion to obtain the support column. See Figure 4d below.
- Step 5:
- Rotational coating of a layer of polyamide with a thickness of 3 μm, after lithography to obtain a sacrificial layer. See Figure 4e below.
- Step6:
- Electron beam evaporation of a layer of Al for the upper electrode, wet corrosion out of the sacrificial layer release hole (small hole size of 8 × 8 μm). See Figure 4f below.
- Step 7:
- Reactive ion etching to release polyamide sacrificial layer. See Figure 4g below.
- Step 8:
- Standard supercritical dry ice treatment was used and filling medium is added. See Figure 4h below.
- Step 9:
- Finally, a package is formed on a silicon wafer. See Figure 4i below.
4. Results
4.1. Effect of Threshold Voltage Change
4.2. Effect of Change of Switch Filling Material on Response Time
4.3. Effect of Change of Switch Filling Material on Impact Velocity
4.4. Effect of Change of Switch Filling Material on Capacitance
4.5. Effect of Change of Switch Filling Material on Insertion Loss and Isolation
5. Conclusions
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
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Materials | Youngs Modulus | Poisson Ratio | Density | Length | Width | Height |
---|---|---|---|---|---|---|
Al | 69 GPa | 0.35 | 2.7 g/cm3 | 300 μm | 60 μm | 2 μm |
Air | Glycerol | Water | Silicone Oil | |
---|---|---|---|---|
CL(fF) | 37.2 | 1653 | 3868 | 83.2 |
Cs(fF) | 2794 | 4720 | 7897 | 3568 |
C(fF) | 36.8 | 1180 | 3652 | 78.9 |
ratio | 75.9 | 4.0 | 2.1 | 42.9 |
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Zhu, H.; Cui, W.; Li, Y.; Song, M. Design and Analysis of a Fluid-Filled RF MEMS Switch. Sensors 2023, 23, 2692. https://doi.org/10.3390/s23052692
Zhu H, Cui W, Li Y, Song M. Design and Analysis of a Fluid-Filled RF MEMS Switch. Sensors. 2023; 23(5):2692. https://doi.org/10.3390/s23052692
Chicago/Turabian StyleZhu, Hongyu, Wenhao Cui, Yanzhang Li, and Mingxin Song. 2023. "Design and Analysis of a Fluid-Filled RF MEMS Switch" Sensors 23, no. 5: 2692. https://doi.org/10.3390/s23052692
APA StyleZhu, H., Cui, W., Li, Y., & Song, M. (2023). Design and Analysis of a Fluid-Filled RF MEMS Switch. Sensors, 23(5), 2692. https://doi.org/10.3390/s23052692