Exploration of VLSI CAD researches for early design rule evaluation
Pages 405 - 406
Abstract
Design rule has been a primary metric to link design and technology, and is likely to be considered as IC manufacturer's role for the generation due to the empirical and unsystematic in nature. Disruptive and radical changes in terms of layout style, lithography and device in the next decade require the design rule evaluation in early development stage. In this paper, we explore VLSI CAD researches for early and systematic evaluation of design rule, which will be a key technique for enhancing the competitiveness in IC market.
References
[1]
A. B. Kahng, C.-H. Park, X. Xu and H. Yao, "Layout Decomposition Approaches for Double Patterning Lithography", IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems 29(6) (2010), pp. 939--952.
[2]
K. Lucas et al., "Patterning control budgets for the 32-nm generation incorporating lithography, design, and RET variations," Proc. SPIE Conf. on Optical Microlithography, March, 2007, pp. 65200N.
[3]
M. C. Smayling, R. J. Socha, and M. V. Dusa, "22nm logic lithography in the presence of local interconnect," Proc. SPIE Conf. on Optical Microlithography, March, 2010, pp. 764019.
[4]
D. Z. Pan, J.-S. Yang, K. Yuan, and M. Cho, "CAD for Double Patterning Lithography", International Conference on IC Design and Technology (ICICDT), June, 2010, pp.
[5]
P. Gupta, K. Jeong, A. B. Kahng and C.-H. Park, "Electrical Assessment of Lithographic Gate Line-End Patterning," Microlithography, Microfabrication and Microsystems 9(2) (2010), pp. 023014.
[6]
R. S. Ghaida and P. Gupta, "A Framework for Early and Systematic Evaluation of Design Rule," Proc. ACM/IEEE Intl. Conf. on Computer-Aided 2009, pp. 615--622.
- Exploration of VLSI CAD researches for early design rule evaluation
Recommendations
An evaluation of heuristics for rule ranking
Objective: To evaluate and compare the performance of different rule-ranking algorithms for rule-based classifiers on biomedical datasets. Methodology: Empirical evaluation of five rule ranking algorithms on two biomedical datasets, with performance ...
Methodology for electromigration critical threshold design rule evaluation
We propose a methodology using nodal analysis techniques compatible with existing computer-aided design (CAD) tools for implementing critical threshold design rules for electromigration reliability. The concept underlying critical threshold design rules ...
Comments
Please enable JavaScript to view thecomments powered by Disqus.Information & Contributors
Information
Published In
January 2011
841 pages
ISBN:9781424475162
Sponsors
- IEEE
- IPSJ
- SIGDA: ACM Special Interest Group on Design Automation
- IEICE ESS: Institute of Electronics, Information and Communication Engineers, Engineering Sciences Society
- IEICE
Publisher
IEEE Press
Publication History
Published: 25 January 2011
Check for updates
Qualifiers
- Research-article
Conference
ASPDAC '11
Sponsor:
- SIGDA
- IEICE ESS
ASPDAC '11: 16th Asia and South Pacific Design Automation Conference
January 25 - 28, 2011
Yokohama, Japan
Acceptance Rates
Overall Acceptance Rate 466 of 1,454 submissions, 32%
Upcoming Conference
ASPDAC '25
- Sponsor:
- sigda
Contributors
Other Metrics
Bibliometrics & Citations
Bibliometrics
Article Metrics
- 0Total Citations
- 75Total Downloads
- Downloads (Last 12 months)0
- Downloads (Last 6 weeks)0
Reflects downloads up to 16 Nov 2024
Other Metrics
Citations
View Options
Login options
Check if you have access through your login credentials or your institution to get full access on this article.
Sign in